WO2012177663A3 - Autofocus system with reference configuration - Google Patents

Autofocus system with reference configuration Download PDF

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Publication number
WO2012177663A3
WO2012177663A3 PCT/US2012/043186 US2012043186W WO2012177663A3 WO 2012177663 A3 WO2012177663 A3 WO 2012177663A3 US 2012043186 W US2012043186 W US 2012043186W WO 2012177663 A3 WO2012177663 A3 WO 2012177663A3
Authority
WO
WIPO (PCT)
Prior art keywords
assembly
redirector
work piece
measurement
reference configuration
Prior art date
Application number
PCT/US2012/043186
Other languages
French (fr)
Other versions
WO2012177663A2 (en
Inventor
Michael R. Sogard
Daniel Gene Smith
Eric Peter Goodwin
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of WO2012177663A2 publication Critical patent/WO2012177663A2/en
Publication of WO2012177663A3 publication Critical patent/WO2012177663A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/70—Determining position or orientation of objects or cameras
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Abstract

A system (222) for measuring the position of a work piece (200) includes a redirector assembly (244), a light source assembly (240), a detector assembly (242), and a control system (224). The redirector assembly (244) is positioned near and spaced apart from the working surface (200A). The light source assembly (240) directs a measurement beam (246A) and a reference beam (246B) at the redirector assembly (244). The detector assembly (242) detects the measurement beam (246A) reflected off of the work piece (200) and generates a measurement signal, and detects the reference beam (246B) reflected off of the redirector assembly (244) and generates a reference signal. The control system (24) uses the measurement signal and the reference signal to determine the position of the work piece (200).
PCT/US2012/043186 2011-06-23 2012-06-19 Autofocus system with reference configuration WO2012177663A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161500521P 2011-06-23 2011-06-23
US61/500,521 2011-06-23

Publications (2)

Publication Number Publication Date
WO2012177663A2 WO2012177663A2 (en) 2012-12-27
WO2012177663A3 true WO2012177663A3 (en) 2014-05-01

Family

ID=47423180

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2012/043186 WO2012177663A2 (en) 2011-06-23 2012-06-19 Autofocus system with reference configuration

Country Status (1)

Country Link
WO (1) WO2012177663A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9030668B2 (en) 2012-05-15 2015-05-12 Nikon Corporation Method for spatially multiplexing two or more fringe projection signals on a single detector
US9243901B2 (en) 2012-08-15 2016-01-26 Nikon Corporation Rules for reducing the sensitivity of fringe projection autofocus to air temperature changes
US9977343B2 (en) 2013-09-10 2018-05-22 Nikon Corporation Correction of errors caused by ambient non-uniformities in a fringe-projection autofocus system in absence of a reference mirror
US10078269B2 (en) 2015-10-02 2018-09-18 Nikon Corporation Array of encoders for alignment measurement
US10712671B2 (en) 2016-05-19 2020-07-14 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US10295911B2 (en) 2016-05-19 2019-05-21 Nikon Corporation Extreme ultraviolet lithography system that utilizes pattern stitching
US10890849B2 (en) 2016-05-19 2021-01-12 Nikon Corporation EUV lithography system for dense line patterning
US11067900B2 (en) 2016-05-19 2021-07-20 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US11934105B2 (en) 2017-04-19 2024-03-19 Nikon Corporation Optical objective for operation in EUV spectral region
US11054745B2 (en) 2017-04-26 2021-07-06 Nikon Corporation Illumination system with flat 1D-patterned mask for use in EUV-exposure tool
US11300884B2 (en) 2017-05-11 2022-04-12 Nikon Corporation Illumination system with curved 1d-patterned mask for use in EUV-exposure tool

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090135437A1 (en) * 2007-11-28 2009-05-28 Nikon Corporation Autofocus system with error compensation
US20100067021A1 (en) * 2008-09-16 2010-03-18 Mitutoyo Corporation Method of detecting a movement of a measuring probe and measuring instrument
US20100245829A1 (en) * 2009-03-31 2010-09-30 Nikon Corporation System and method for compensating instability in an autofocus system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090135437A1 (en) * 2007-11-28 2009-05-28 Nikon Corporation Autofocus system with error compensation
US20100067021A1 (en) * 2008-09-16 2010-03-18 Mitutoyo Corporation Method of detecting a movement of a measuring probe and measuring instrument
US20100245829A1 (en) * 2009-03-31 2010-09-30 Nikon Corporation System and method for compensating instability in an autofocus system

Also Published As

Publication number Publication date
WO2012177663A2 (en) 2012-12-27

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