WO2012169494A1 - El element, sheet for el emission pattern, and method for manufacturing el element - Google Patents

El element, sheet for el emission pattern, and method for manufacturing el element Download PDF

Info

Publication number
WO2012169494A1
WO2012169494A1 PCT/JP2012/064467 JP2012064467W WO2012169494A1 WO 2012169494 A1 WO2012169494 A1 WO 2012169494A1 JP 2012064467 W JP2012064467 W JP 2012064467W WO 2012169494 A1 WO2012169494 A1 WO 2012169494A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
light emitting
pattern
base material
liquid
Prior art date
Application number
PCT/JP2012/064467
Other languages
French (fr)
Japanese (ja)
Inventor
今西　秀樹
一男 中野
和憲 大橋
一裕 東
山本　康夫
Original Assignee
理想科学工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2011130436A external-priority patent/JP2014157655A/en
Priority claimed from JP2011233641A external-priority patent/JP2014157656A/en
Priority claimed from JP2011283082A external-priority patent/JP2014157657A/en
Application filed by 理想科学工業株式会社 filed Critical 理想科学工業株式会社
Publication of WO2012169494A1 publication Critical patent/WO2012169494A1/en

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/221—Static displays, e.g. displaying permanent logos

Definitions

  • the present invention relates to an EL (electroluminescence) element that emits light, an EL light emission pattern sheet, and a method for manufacturing the EL element.
  • an inorganic EL element when an alternating voltage is applied between a pair of electrodes, a light emitting layer disposed between the electrodes emits light.
  • a plate is required to pattern the electrode and the light emitting layer. Such patterning is performed by a specialist, and cannot be easily performed.
  • the present invention has been made in view of the above, and an object of the present invention is to provide an EL element, an EL light emitting pattern sheet, and a method for manufacturing the EL element, in which a light emission pattern can be easily formed.
  • the first feature of the EL device is that a pair of planar electrodes and a gap that is disposed between the pair of electrodes and that can penetrate liquid are used.
  • a second feature of the EL element according to the present invention is a first contact layer made of a dielectric material disposed between the permeable substrate and the light emitting layer and in close contact with the permeable substrate and the light emitting layer, And at least one of a second contact layer made of a dielectric or a conductor disposed between the permeable substrate and the other electrode and in close contact with the permeable substrate and the other electrode.
  • the first feature of the EL light emitting pattern sheet according to the present invention is that it comprises an permeable base material made of an insulator and capable of penetrating a liquid, and a contact layer made of a dielectric formed on the permeable base material. And the dielectric forming the contact layer penetrates into a part of the permeable substrate in the thickness direction.
  • the second feature of the EL light emitting pattern sheet according to the present invention is that it further includes a liquid blocking layer disposed on the contact layer and blocking the passage of liquid.
  • the first feature of the method for manufacturing an EL element according to the present invention is that a light emitting layer containing a phosphor is formed on a front electrode layer, and a phosphor sheet is manufactured.
  • a step of forming a contact layer by applying a dielectric paste on a permeable substrate to produce an EL light emitting pattern sheet, the light emitting layer of the phosphor sheet, and the contact layer of the EL light emitting pattern sheet Adhering and adhering together, and penetrating liquid made of a dielectric or conductor having a dielectric constant larger than that of the permeable substrate into the permeable substrate of the EL light emitting pattern sheet, and
  • the second feature of the method for manufacturing an EL element according to the present invention is that a light emitting layer containing a phosphor is formed on the front electrode layer, and a phosphor sheet is manufactured.
  • a dielectric paste is applied to form a first contact layer, a liquid blocking layer for blocking the passage of liquid is formed on the first contact layer, and the liquid blocking layer is formed on the liquid blocking layer.
  • Shaped pattern A step of, after the step of forming the pattern is to include a step of forming a back electrode layer on the permeable substrate.
  • the third feature of the method for manufacturing an EL element according to the present invention is that a step of forming a light emitting layer containing a phosphor on a front electrode layer, and a penetrating layer made of an insulator on the light emitting layer, the penetrating layer.
  • the pattern formed of the penetrating liquid on the permeable substrate becomes a light emission pattern, the light emission pattern can be easily formed.
  • the permeable group and the permeable substrate are provided. Air can be prevented from entering in at least one of the material and the other electrode, and uneven emission of the light emitting layer can be reduced.
  • the light emitting pattern of the EL element can be easily formed by allowing the penetrating liquid to permeate the permeable base material. Moreover, the damage of a permeable base material can be suppressed because the dielectric has osmose
  • blocking layer can be prevented.
  • a light emission pattern is formed by infiltrating a penetrating liquid into a permeable base material.
  • the light emission pattern of the EL element can be easily formed.
  • the dielectric paste on the permeable substrate to produce an EL light emitting pattern sheet the dielectric can be infiltrated into the permeable substrate to reinforce the permeable substrate and The arrival of the penetrant can be reduced.
  • the phosphor sheet can be removed from the EL element in a reusable state.
  • a light emission pattern is formed by infiltrating a penetrating liquid into a permeable base material.
  • the light emission pattern of the EL element can be easily formed.
  • the dielectric paste on the permeable substrate to produce an EL light emitting pattern sheet the dielectric can be infiltrated into the permeable substrate to reinforce the permeable substrate and The arrival of the penetrant can be reduced.
  • the phosphor sheet can be removed from the EL element in a reusable state.
  • the liquid blocking layer it is possible to prevent the penetrant from reaching the light emitting layer and the front electrode layer in the EL element. As a result, it is possible to prevent the light emitting layer from becoming dirty, the occurrence of a short circuit failure in the EL element, and the reduction of the lifetime.
  • a pattern layer is formed in which the permeation solution that has permeated the permeation layer forms a light emission pattern.
  • the light emission pattern of the EL element can be easily formed.
  • air can enter the boundary portion between the penetrant liquid and the light emitting layer of the pattern layer. Can be prevented. Thereby, uniform light emission can be realized.
  • FIG. 2 is a partial cross-sectional view of an EL element taken along line AA in FIG. It is a fragmentary sectional view of an EL element for explaining light emission. It is a fragmentary sectional view of the EL element concerning the modification of a 1st embodiment. It is a fragmentary sectional view of the EL element concerning a 2nd embodiment. It is a fragmentary sectional view of the EL element concerning the modification of a 2nd embodiment. It is a fragmentary sectional view of the EL element concerning a 3rd embodiment. It is a fragmentary sectional view of the EL element concerning modification 1 of a 3rd embodiment.
  • (A) is a plan view of a container enclosing an EL element
  • (b) is a sectional view taken along line BB in (a). It is a fragmentary sectional view of the EL element concerning a 5th embodiment.
  • FIG. 4C is an explanatory diagram of a process for forming a sheet
  • FIG. 3C is an explanatory diagram of a process of forming a pattern
  • FIG. 4D is an explanatory diagram of a process of forming a back electrode layer.
  • FIG. 4C is an explanatory diagram of a process for forming a sheet
  • FIG. 3C is an explanatory diagram of a process of forming a pattern
  • FIG. 4D is an explanatory diagram of a process of forming a back electrode layer.
  • FIG. 1 is an overall perspective view of a light-emitting panel including an EL element according to the first embodiment
  • FIG. 2 is a partial cross-sectional view of the EL element along the line AA in FIG.
  • the vertical direction in FIG. 1 is an overall perspective view of a light-emitting panel including an EL element according to the first embodiment
  • FIG. 2 is a partial cross-sectional view of the EL element along the line AA in FIG.
  • the light emitting panel 1 includes an EL element 2, a pair of protective plates 3A and 3B, a fixed frame 4, and connecting portions 5A and 5B.
  • the EL element 2 emits light.
  • the EL element 2 is composed of a dispersion-type inorganic EL element. As shown in FIG. 2, the EL element 2 includes a front electrode layer 21, a light emitting layer 22, a permeable base material 23, and a back electrode layer 24.
  • the front electrode layer 21 constitutes a pair of planar electrodes opposed to the back electrode layer 24.
  • the front electrode layer 21 is light transmissive and allows light from the light emitting layer 22 to pass therethrough.
  • the front electrode layer 21 includes a transparent substrate 31 and a transparent conductive layer 32.
  • the transparent substrate 31 is made of PET (polyethylene terephthalate) resin, PEN (polyethylene naphthalate) resin, glass or the like, and has optical transparency.
  • the transparent conductive layer 32 is made of ITO (indium tin oxide), a conductive polymer, etc., and has conductivity and light transmittance.
  • the transparent conductive layer 32 is formed on the lower surface of the transparent substrate 31.
  • the light emitting layer 22 has a phosphor, and when an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, a portion corresponding to the pattern 41 formed on the permeable base material 23 (pattern 41). The upper area emits light.
  • the light emitting layer 22 is disposed on the surface (lower surface) of the front electrode layer 21 on the permeable substrate 23 side.
  • the light emitting layer 22 is formed by applying a phosphor paste to the lower surface of the transparent conductive layer 32 of the front electrode layer 21 and drying.
  • the phosphor paste is applied to the front electrode layer 21 by, for example, a screen printing method.
  • the light emitting layer 22 is formed with a thickness of about 30 to 60 ⁇ m, for example.
  • the light emitting layer 22 is translucent.
  • the phosphor paste is obtained by dispersing phosphor particles in a binder.
  • the phosphor is obtained by adding a small amount of a luminescent center element to an inorganic composition as a base material.
  • a luminescent center element for example, a metal element such as Cu or Mn is used.
  • the light emission color of the light emitting layer 22 is determined by the combination of the inorganic composition and the light emission center element.
  • the binder of the phosphor paste consists of a high dielectric constant resin and a solvent.
  • a high dielectric constant resin cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, nitrile rubber, chloroprene rubber, polyurethane, fluorosilicone, or the like can be used.
  • All solvents are desirably volatilized, and such solvents include cyclohexanone, methyl ethyl ketone, acetone, acetonitrile, nitromethane, N, N-dimethylformamide (DMF), N-methyl-2-pyrrolidone, ⁇ -butyllactone, carbonic acid.
  • DMF N-dimethylformamide
  • ⁇ -butyllactone N-methyl-2-pyrrolidone
  • carbonic acid ethylene
  • Propylene, toluene, xylene and the like can be used.
  • the permeable base material 23 is formed with a pattern 41 for causing the light emitting layer 22 to emit light.
  • the permeable base material 23 is disposed between the light emitting layer 22 and the back electrode layer 24.
  • the permeable base material 23 has liquid permeability.
  • the permeable base material 23 has a structure having a void in which a liquid can permeate therein.
  • a pattern 41 shown in FIG. 1 is formed on the permeable base material 23 by penetrating a penetrating liquid 42, which is a liquid used for forming the pattern 41, between the front and back (upper and lower) surfaces.
  • a shape (region) in a plan view of a portion (a portion indicated by dot hatching in FIG. 2) where the penetrating liquid 42 has permeated into the permeable base material 23 is a pattern 41.
  • the permeable base material 23 is made of an insulator (dielectric material).
  • the permeable base material 23 is preferably made of a low dielectric constant material having a dielectric constant of less than 5.
  • a pattern 41 is formed in the permeable base material 23 by the penetration of a dielectric material having a dielectric constant higher than that of the insulator (dielectric material) constituting the permeable base material 23 or a penetrating liquid 42 made of a conductor.
  • the permeable substrate 23 is made of paper such as plain paper, recycled paper, and Japanese paper.
  • the dielectric constant of paper is about 3.
  • the penetrating liquid 42 penetrates into the gaps between the fibers.
  • a resin fiber woven fabric, a resin fiber non-woven fabric, or a resin mesh may be used as the permeable base material 23 as long as the dielectric constant is similar to that of paper or the like.
  • a porous material having a low dielectric constant insulator (dielectric material) and having a large number of holes through which the osmotic liquid can permeate may be used as the permeable base material 23.
  • the shape, size, arrangement, and the like of the holes in the porous material are not particularly limited. However, since the hole portion that holds the permeating liquid 42 emits light, the hole size and the opening that do not impair the resolution of the desired light emission pattern It is desirable to have rate, pitch, and alignment.
  • the thickness of the permeable base material 23 is not particularly limited, and it is desirable that the used penetrating solution reaches from one side to the other side (back through) and can penetrate between the front and back surfaces.
  • a liquid that is a conductor can be used as the penetrating liquid 42 used for forming the pattern 41.
  • a non-pure water such as soapy water, a mixed solution of soapy water and glycerin, a water-based ink, an emulsion ink, or a conductive ink such as a conductive ink can be used as the penetrating liquid 42.
  • a dielectric having a dielectric constant larger than that of the permeable base material 23 can be used as the osmotic liquid 42.
  • the dielectric used as the penetrating liquid 42 is desirably a high dielectric constant material having a dielectric constant of 10 or more.
  • a high dielectric constant solvent such as propylene carbonate or an ink containing the same can be used.
  • the ink here may contain a color material such as a pigment or a dye.
  • the back electrode layer 24 constitutes a pair of planar electrodes opposed to the front electrode layer 21.
  • the back electrode layer 24 is disposed on the lowermost side of the EL element 2.
  • the back electrode layer 24 is made of, for example, a metal plate such as an aluminum alloy or a stainless alloy or a metal foil.
  • the back electrode layer 24 may be a resin plate formed with a thin film such as Al or Ag, or a metal mesh.
  • the same material as the front electrode layer 21 may be used as the back electrode layer 24 reflects a part of the light emitted from the light emitting layer 22. This reflected light passes through the permeable base material 23 and the front electrode layer 21 and is emitted to the outside (upper side). Therefore, the back electrode layer 24 is preferably a metal plate, metal foil or the like that easily reflects light.
  • the pair of protective plates 3 ⁇ / b> A and 3 ⁇ / b> B are for protecting the EL element 2 with the EL element 2 interposed therebetween, and for bringing the permeable substrate 23 of the EL element 2 into close contact with the light emitting layer 22 and the back electrode layer 24.
  • the upper protection plate 3A is made of a light-transmitting resin or the like.
  • the lower protective plate 3B may be the same as the upper protective plate 3A, or may be a resin plate or the like that does not have optical transparency.
  • the fixing frame 4 fixes the EL element 2 between the pair of protective plates 3A and 3B in a state where a force for compressing in the vertical direction is applied. Thereby, the permeable base material 23 of the EL element 2 is in close contact with the light emitting layer 22 and the back electrode layer 24. Further, the fixed frame 4 is configured to be disassembled, and the permeable base material 23 of the EL element 2 is detachable.
  • the connecting portions 5A and 5B are for connecting the EL element 2 to an external power source.
  • the connecting portions 5A and 5B are installed on the fixed frame 4.
  • the connecting portions 5A and 5B are electrically connected to the front electrode layer 21 and the back electrode layer 24, respectively.
  • an AC power source is connected between the connecting portions 5A and 5B.
  • the AC voltage applied to the EL element 2 by the AC power supply is no particular limitation on the AC voltage applied to the EL element 2 by the AC power supply, but from the viewpoint of light emission luminance, efficiency, life, etc., for example, the range of effective value 50 V to 700 V and frequency 50 Hz to 3 kHz is suitable. .
  • the pattern corresponding portion 43 in the light emitting layer 22 is a region on the penetrating liquid 42 in the permeable base material 23. That is, the pattern corresponding portion 43 is a region on the pattern 41 formed by the penetrating liquid 42. Since the penetrant 42 constituting the pattern 41 is a conductor or a dielectric having a high dielectric constant, when an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, an electric field is generated in the pattern corresponding portion 43. Is formed. In the pattern corresponding portion 43, the internal electrons are accelerated by the electric field and collide with the emission center. At this time, the emission center is excited and emits light when returning to the ground state. In portions other than the pattern corresponding portion 43, the low-permittivity permeable base material 23 and the air inside thereof are interposed between the front electrode layer 21 and the back electrode layer 24. A sufficiently strong electric field is not formed, and no light emission occurs.
  • the region within the pattern 41 is visually recognized by the light emission of the pattern corresponding portion 43 of the light emitting layer 22.
  • the user can disassemble the fixed frame 4, remove the permeable base material 23 from the EL element 2, and replace it with a new permeable base material 23 in which a different pattern 41 is formed. it can.
  • the permeable substrate 23 can be disposable.
  • the formation of the pattern 41 can be performed, for example, by printing on paper as the permeable substrate 23 with a printing apparatus using water-based ink as the osmotic liquid 42.
  • a printing apparatus using water-based ink as the osmotic liquid 42.
  • an ink jet method, a stencil printing method, a screen printing method, or the like can be used.
  • an ink jet printing apparatus is preferable because it is inexpensive and widely used as a means for discharging water-based ink.
  • the pattern 41 can be formed by a user drawing a pattern with a brush in which water (not pure water) as the penetrating liquid 42 is contained in paper as the permeable base material 23.
  • various methods can be adopted depending on the combination of the permeable base material 23 and the penetrating liquid 42.
  • the pattern 41 is formed on the permeable substrate 23 with the penetrating liquid 42. Formation of the pattern 41 on the permeable base material 23 can be easily performed by a user printing the paper as the permeable base material 23 with water-based ink using a printing apparatus. Then, the user simply inserts the permeable substrate 23 on which the pattern 41 is formed between the front electrode layer 21 and the back electrode layer 24 on which the light emitting layer 22 is formed, so that the light emission pattern of the EL element 2 is obtained. Can be formed. Therefore, according to the EL element 2, it is easy to form a light emission pattern.
  • the pattern 41 can be changed by replacing only the permeable base material 23. For this reason, according to the EL element 2, the light emission pattern can be easily changed at low cost.
  • a dielectric layer containing barium titanate powder may be provided between the front electrode layer 21 and the light emitting layer 22. Thereby, the dielectric breakdown resistance may be improved.
  • FIG. 4 is a partial cross-sectional view of an EL element according to a modification of the first embodiment.
  • the EL element 2A according to this modification is different from the EL element 2 of the first embodiment shown in FIG. 2 in that the arrangement of the light emitting layer 22 is changed and the back electrode layer 24 penetrates.
  • the light emitting layer 22 is formed on the surface (upper surface) on the conductive substrate 23 side.
  • the pattern corresponding portion 43 in the light emitting layer 22 is a region immediately below the penetrating liquid 42 in the permeable base material 23. That is, the pattern corresponding portion 43 is a region immediately below the pattern 41 formed by the penetrating liquid 42.
  • the EL element 2A when an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, light is emitted from the pattern corresponding portion 43 in the light emitting layer 22 as in the EL element 2 shown in FIG. Arise.
  • the upward light L of the light generated in the pattern corresponding portion 43 passes through the front electrode layer 21 through the portion (pattern 41) into which the penetrating liquid 42 in the permeable base material 23 has permeated. Radiated.
  • the light L emitted to the outside includes light emitted downward from the pattern corresponding portion 43 and reflected by the back electrode layer 24. Thereby, it visually recognizes as the area
  • the penetrating liquid 42 that easily transmits the light L is used. Is desirable. For example, if ink containing a coloring material is used as the penetrating liquid 42, the ink coloring material absorbs a part of the emission spectrum, so that the ink color easily transmits the emission color of the light emitting layer 22. It is desirable to choose.
  • a dielectric layer containing barium titanate powder may be provided between the light emitting layer 22 and the back electrode layer 24. Thereby, the dielectric breakdown resistance may be improved.
  • FIG. 5 is a partial cross-sectional view of an EL element according to the second embodiment.
  • the EL element 2B according to the second embodiment has a configuration in which a contact layer 51 is added to the EL element 2 of the first embodiment shown in FIG.
  • the contact layer 51 is disposed between the permeable base material 23 and the back electrode layer 24 and adheres (adheres) to the permeable base material 23 and the back electrode layer 24. That is, the contact layer 51 bonds the permeable base material 23 and the back electrode layer 24 together.
  • the contact layer 51 is made of a dielectric or conductor that adheres (adheres) to the permeable substrate 23 and the back electrode layer 24.
  • the contact layer 51 is formed with a thickness of about 10 ⁇ m, for example.
  • the contact layer 51 is made of a dielectric material
  • a dielectric material having a dielectric constant of 5 or higher, more preferably 10 or higher is used. Thereby, the division
  • a material that is an adhesive is applied to the permeable base material 23 or the back electrode layer 24, and the permeable base material 23 and the back electrode layer 24 are pasted through the applied material. It is formed by being put together.
  • Examples of the material of the contact layer 51 include cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane, conductive adhesive, conductive grease, conductive paste, conductive gel, and the like. Can be used. These can be used alone or as a mixture of two or more. Further, it is more desirable to improve the tackiness by adding a tackifier to the material of the contact layer 51.
  • the material of the contact layer 51 When the material of the contact layer 51 is dissolved or dispersed in a solvent, it can be easily applied to the permeable substrate 23 or the back electrode layer 24.
  • This material may be liquid, gel, gel, or solid, but if the fluidity is too high to penetrate into the permeable substrate 23, the part other than the intended light emission pattern will also emit light. Therefore, it is important not to penetrate the permeable base material 23.
  • the EL element 2B Since the EL element 2B has the contact layer 51 in close contact with the permeable base material 23 and the back electrode layer 24, air can be prevented from entering between the back electrode layer 24 and the permeable base material 23.
  • air enters between the back electrode layer 24 and the penetrating liquid 42 in the permeable base material 23 a region where the electric field is weak is generated in the pattern corresponding portion 43, and the emission luminance may be lowered. For this reason, the entry of air between the back electrode layer 24 and the permeable base material 23 causes a light emission unevenness of the light emitting layer 22. According to the EL element 2B, such light emission unevenness can be reduced.
  • the contact layer 51 when configured by a conductor having a sufficiently small electric resistance, the back electrode layer 24 can be omitted.
  • the contact layer 51 constitutes a pair of electrodes with the front electrode layer 21.
  • the electrical resistance of the contact layer 51 is large, it becomes difficult for electricity to flow in the in-plane direction (area direction) of the contact layer 51, power consumption is increased, or the light emitting layer 22 is separated from the connection portions 5A and 5B.
  • the back electrode layer 24 is necessary because the light emission luminance may decrease.
  • the contact layer 51 is formed of a conductor
  • the contact layer 51 is formed of a conductive material that contains water and conducts electricity through the water.
  • a conductive acrylic gel can be used.
  • FIG. 6 is a partial cross-sectional view of an EL element according to a modification of the second embodiment.
  • the EL element 2C according to this modification has a configuration in which a contact layer 51 is added to the EL element 2A according to the modification of the first embodiment shown in FIG.
  • the contact layer 51 is disposed between the front electrode layer 21 and the permeable base material 23 and adheres (adheres) to the front electrode layer 21 and the permeable base material 23.
  • the contact layer 51 is made of a dielectric or conductor having optical transparency.
  • a conductive acrylic gel can be used as the contact layer 51.
  • FIG. 7 is a partial cross-sectional view of an EL element according to the third embodiment. As shown in FIG. 7, the EL element 2D according to the third embodiment replaces the back electrode layer 24 of the EL element 2 of the first embodiment shown in FIG. 53 is added.
  • the conductive layer 52 is adhered and fixed to substantially the entire lower surface of the permeable base material 23 and constitutes a pair of electrodes facing the front electrode layer 21.
  • the conductive layer 52 is formed in a planar shape by applying conductive ink to one surface of the permeable substrate 23 and drying.
  • conductive ink for example, an ink in which metal or carbon particles are dispersed, or an ink in which a conductive polymer is dispersed or dissolved can be used.
  • Application of the conductive ink to the permeable base material 23 is performed by, for example, a screen printing method.
  • the conductive layer 52 is formed to a thickness of about 10 ⁇ m.
  • the contact layer 53 is disposed between the light emitting layer 22 and the permeable base material 23 and is in close contact (adhesion) with the light emitting layer 22 and the permeable base material 23. That is, the contact layer 53 bonds the light emitting layer 22 and the permeable base material 23 together.
  • the contact layer 53 is light transmissive.
  • the contact layer 53 is made of a dielectric material having a dielectric constant of 5 or more, more preferably 10 or more. Thereby, the division
  • the contact layer 53 is formed with a thickness of about 10 ⁇ m, for example.
  • a material that is an adhesive (adhesive) is applied to the light-emitting layer 22 or the permeable base material 23, and the light-emitting layer 22 and the permeable base material 23 are bonded to each other through the applied material. Is formed.
  • cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane and the like can be used.
  • the material of the contact layer 53 When the material of the contact layer 53 is dissolved or dispersed in a solvent, it can be easily applied to the light emitting layer 22 or the permeable substrate 23.
  • This material may be liquid, gel, gel, or solid, but if the fluidity is too high and it penetrates deep inside the permeable substrate 23, the part other than the intended light emission pattern also emits light. Therefore, it is important not to penetrate deep inside the permeable base material 23.
  • the user applies the material of the contact layer 53 to the permeable base material 23 or the light emitting layer 22 with the conductive layer 52 on which the pattern 41 is formed, and through the applied material.
  • the light emitting layer 22 and the permeable base material 23 are bonded together. Thereby, a light emission pattern is easily formed.
  • the conductive layer 52 is fixed to the permeable base material 23, and the light emitting layer 22 formed on the front electrode layer 21 and the permeable base material 23 are bonded via the contact layer 53. This prevents air from entering between the permeable substrate 23 and the conductive layer 52 and between the permeable substrate 23 and the light emitting layer 22. As a result, according to the EL element 2D, the light emission unevenness of the light emitting layer 22 can be reduced.
  • the EL element 2D can be laminated with a laminate film, and a light-emitting panel provided with a power connection portion exposed outside the laminate film can be configured.
  • the structure of the light emission panel can be simplified.
  • the light emitting layer 22 and the contact layer 53 can be peeled off.
  • the composition of the phosphor paste it is possible to form the light emitting layer 22 that is easily peeled off from the contact layer 53.
  • the light emitting layer 22 and the contact layer 53 can be easily separated by forming the light emitting layer 22 using a phosphor paste containing a fluorine-based resin such as vinylidene fluoride as a binder.
  • a FLUOROPOLYMER- binder manufactured by UNITEC can be used as the binder containing the fluororesin.
  • the permeable base material 23 is made of a paper whose main raw material is natural fiber such as pulp
  • a paper strength enhancer to the surface of the paper to be bonded to the contact layer 53 in advance.
  • the paper strength enhancer a method of applying a liquid dissolved in a rubber or resin dispersion or a solvent is suitable.
  • the permeable base material 23 can be replaced. Thereby, it is easy to change the pattern 41 of the EL element 2D. Further, the front electrode layer 21 and the light emitting layer 22 can be used repeatedly.
  • the permeable base material 23 on which the conductive layer 52 is formed is a consumable item. With such a sheet including the permeable base material 23 and the conductive layer 52, it is possible to easily form and change a light emission pattern in the EL element.
  • FIG. 8 is a partial cross-sectional view of an EL element according to Modification 1 of the third embodiment.
  • the EL element 2E according to the first modification has a configuration in which a contact layer 51 is added to the EL element 2D of the third embodiment shown in FIG.
  • the contact layer 51 is disposed between the permeable base material 23 and the conductive layer 52 and adheres (adheres) to the permeable base material 23 and the conductive layer 52.
  • the contact layer 51 is made of a dielectric having a high dielectric constant similar to the contact layer 53.
  • the contact layer 51 is formed by applying a material that is an adhesive (adhesive) to one surface of the permeable substrate 23. Thereafter, conductive ink is applied on the contact layer 51 and dried to form the conductive layer 52.
  • the pattern 41 can be formed by the osmotic liquid 42 in a state where the contact layer 51 and the conductive layer 52 are formed. Then, the laminate of the permeable base material 23, the contact layer 51, and the conductive layer 52 on which the pattern 41 is formed is bonded to the light emitting layer 22 through the contact layer 53, whereby the EL element 2E is completed.
  • the front electrode layer of the conductive layer 52 corresponds to the fine irregularities on the surface of the permeable substrate 23.
  • the surface (upper surface) facing 21 is uneven.
  • a liquid containing water such as a water-based ink having a higher electrical resistance than the conductive layer 52 is used as the penetrating liquid 42, if the conductive layer 52 has irregularities corresponding to the irregularities on the surface of the permeable substrate 23, a concave shape is formed.
  • the electric field is weaker in the pattern corresponding portion 43 of the light emitting layer 22 than in the convex portion (the portion close to the front electrode layer 21). For this reason, when there is a difference in resistance between the penetrating liquid 42 and the conductive layer 52 that is an electrode, light emission unevenness of the light emitting layer 22 occurs due to the unevenness of the surface of the conductive layer 52 facing the front electrode layer 21.
  • the conductive layer 52 is formed on the permeable base material 23 with the contact layer 51 interposed.
  • the surface (surface on the side of the permeable base material 23) facing the front electrode layer 21 of the conductive layer 52 can be a surface with less unevenness that is not affected by the permeable base material 23.
  • the EL element 2E can suppress unevenness in the strength of the electric field in the light emitting layer 22 and reduce unevenness in light emission.
  • FIG. 9 is a partial cross-sectional view of an EL element according to Modification 2 of the third embodiment.
  • the EL element 2F according to the second modification has a configuration in which a contact layer 53 is added to the EL element 2C according to the modification of the second embodiment shown in FIG.
  • the front electrode layer 21 and the permeable base material 23 are bonded via the contact layer 51, and the permeable base material 23 and the light emitting layer 22 are bonded via the contact layer 53. This prevents air from entering between the front electrode layer 21 and the permeable substrate 23 and between the permeable substrate 23 and the light emitting layer 22. As a result, according to the EL element 2F, the light emission unevenness of the light emitting layer 22 can be reduced.
  • the light emitting layer 22 is formed using a phosphor paste containing a fluorine-based resin such as vinylidene fluoride so that the light emitting layer 22 and the contact layer 53 can be peeled, the light emitting layer 22 and the back electrode layer 24 are formed. Can be used repeatedly.
  • the permeable base material 23 is made of paper made mainly of natural fibers such as pulp, a paper strength enhancer is applied in advance to the surface to be bonded to the contact layer 53 of the paper. Is preferred.
  • FIG. 10 is a partial cross-sectional view of an EL element according to the fourth embodiment.
  • the EL element 2G according to the fourth embodiment replaces the permeable base material 23 with a permeation layer 61 with respect to the EL element 2 of the first embodiment shown in FIG. In this configuration, a contact layer 51 is added.
  • the permeation layer 61 is formed with a pattern 41 for causing the light emitting layer 22 to emit light.
  • the osmotic layer 61 has liquid permeability.
  • the permeation layer 61 is made of an insulator (dielectric).
  • the osmotic layer 61 is made of a particulate material such as silica and a film-like material containing a binder component that holds the particulate material, and has a structure having a void that allows liquid to penetrate.
  • the permeation layer 61 is formed in close contact with the lower surface of the light emitting layer 22.
  • the penetration of the penetrating liquid 42 between the upper and lower surfaces of the penetrating layer 61 forms the pattern 41.
  • a shape (region) in a plan view of a portion where the penetrating liquid 42 has permeated the penetrating layer 61 is a pattern 41.
  • the contact layer 51 adheres the permeation layer 61 and the back electrode layer 24.
  • the contact layer 51 is made of a dielectric or conductor that adheres (adheres) to the permeation layer 61 and the back electrode layer 24.
  • a dielectric having a high dielectric constant of 5 or more, more preferably 10 or more is used.
  • FIG. 11 is a schematic diagram for explaining a method of manufacturing the EL element 2G according to the fourth embodiment.
  • FIG. 11 for convenience of explanation, the top and bottom of FIG. 10 are reversed.
  • a transparent conductive layer 32 is formed on one surface of a transparent substrate 31.
  • an ITO sol paste is applied to the transparent substrate 31 by a screen printing method, and this is heated and dried. Thereby, the front electrode layer 21 is obtained.
  • the thickness of the transparent substrate 31 is, for example, about 10 to 500 ⁇ m.
  • the thickness of the transparent conductive layer 32 is, for example, about 0.1 to 10 ⁇ m.
  • a light emitting layer 22 is formed on the front electrode layer 21. Specifically, after applying the above-described phosphor paste on the transparent conductive layer 32 by a screen printing method, a doctor blade method, a bar coating method, or the like, this is heated and dried. Thereby, the light emitting layer 22 is formed. As described above, the thickness of the light emitting layer 22 is about 30 to 60 ⁇ m.
  • the permeation layer 61 is formed on the light emitting layer 22. Specifically, after a solution for forming the osmotic layer is applied on the light emitting layer 22, it is heated and dried. Thereby, the osmosis
  • the thickness of the osmotic layer 61 is, for example, about 1 to 50 ⁇ m.
  • the solution for forming the osmotic layer includes a particulate material, a binder component for holding the particulate material, a solvent such as water, a dispersant such as polyacrylate and polyphosphate, and carboxymethylated cellulose. (CMC) and the like, and a mixture containing a lubricant, a water-proofing agent, a colorant, a printability improving agent for making a bulky structure, and the like.
  • a lubricant silica, titanium dioxide, or the like can be used.
  • polyvinyl alcohol PVA
  • latex starch
  • polyacrylate dextrin
  • gelatin agar
  • polyethylene oxide polyacrylamide
  • methylcellulose sorbitol
  • xylitol methylcellulose
  • sorbitol xylitol
  • erythritol erythritol
  • mannitol mannitol
  • lactitol oligosaccharide alcohol
  • Maltitol reduced starch hydrolyzate
  • fructose glucose
  • oligosaccharide trehalose
  • glycine betaine glycine betaine
  • the solution for permeation layer formation contains the component which functions as a moisturizing agent.
  • the component which functions as a moisturizing agent For example, it is preferable to use PVA having a function as a humectant as the binder component, or using a polyacrylate having a function as a humectant as the dispersant.
  • dampness, gelatin, agar, polyethylene oxide, methylcellulose, etc. can be used to improve moisture retention.
  • the liquid containing water such as aqueous ink
  • the permeation liquid 42 is permeated between the upper and lower surfaces of the permeation layer 61 to form a pattern layer including the permeation layer 61 in which the pattern 41 is formed.
  • printing is performed on the penetrating layer 61 side with the water-based ink as the penetrating liquid 42 using the EL light-emitting sheet 62 as a printing medium by using a printing apparatus such as an inkjet method.
  • the application amount of the water-based ink by the printing apparatus is set so that the water-based ink permeates between the upper and lower surfaces of the permeation layer 61.
  • printing is performed with water-based ink from the upper side of the permeation layer 61 in FIG. 11D.
  • the pattern 41 may be formed by the user drawing a pattern with a brush in which water (water that is not pure water) as the penetrating liquid 42 is included in the penetrating layer 61 of the EL light emitting sheet 62.
  • Various other methods can be employed as a method of forming the pattern 41.
  • an adhesive as a material of the contact layer 51 is applied on one surface of a metal plate such as an aluminum alloy constituting the back electrode layer 24, and the back electrode layer 24, the contact layer 51, To obtain a laminate.
  • a metal plate such as an aluminum alloy constituting the back electrode layer 24, and the back electrode layer 24, the contact layer 51, To obtain a laminate.
  • the material of the contact layer 51 include cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane, conductive adhesive, conductive grease, conductive paste, conductive gel, and the like. Can be used. These can be used alone or as a mixture of two or more.
  • a tackifier to the material of the contact layer 51.
  • the material of the contact layer 51 is dissolved or dispersed in a solvent, the application to the back electrode layer 24 is easy.
  • This material may be liquid, gel, gel, or solid, but if the fluidity is too high and penetrates into the permeation layer 61, it will also emit light other than the intended light emission pattern, It is important that the penetration layer 61 does not penetrate.
  • the laminate of the back electrode layer 24 and the contact layer 51 penetrates from the contact layer 51 side to the side opposite to the light emitting layer 22 (upper side in FIG. 11E). Paste on layer 61. Thereby, the EL element 2G is completed.
  • the laminate of the back electrode layer 24 and the contact layer 51 it is preferable to attach the laminate of the back electrode layer 24 and the contact layer 51 as soon as possible after impregnating the penetrating liquid 42 into the EL light emitting sheet 62.
  • the contact layer 51 has a thickness of about 0.1 to 50 ⁇ m, for example. Further, the thickness of the back electrode layer 24 is, for example, about 50 to 100 ⁇ m.
  • the EL element 2G is preferably sealed in a container or the like in order to prevent an electric shock during driving.
  • a container enclosing the EL element 2G will be described.
  • this container can be used also for the EL element of other embodiment.
  • FIG. 12 (a) is a plan view of a container enclosing the EL element 2G
  • FIG. 12 (b) is a cross-sectional view taken along the line BB in FIG. 12 (a).
  • the container 71 includes a cover plate 72 and a storage bag 73.
  • the cover plate 72 protects the EL element 2G.
  • the cover plate 72 is made of a hard plate having light transmission properties, for example, an acrylic plate.
  • the storage bag 73 stores the EL element 2G.
  • the storage bag 73 is made of a flexible film having optical transparency.
  • the storage bag 73 is fixed to substantially the entire one surface of the cover plate 72.
  • an opening 73a is formed in a part of the outer periphery.
  • the opening 73a is for taking the EL element 2G into and out of the storage bag 73.
  • a fastener 73b for closing the opening 73a is disposed in the vicinity of the opening 73a.
  • the storage bag 73 is provided with a deaeration port 73 c for extracting air from the storage bag 73.
  • the deaeration port 73 c is provided with a check valve (not shown) that prevents the inflow of air from the outside to the inside of the storage bag 73.
  • the EL element 2G is put into the storage bag 73 from the opening 73a. At this time, the upper side (front electrode layer 21 side) of the EL element 2G is directed to the cover plate 72 side.
  • the storage bag 73 has holes (not shown) through which the cords 76 and 77 are passed. This hole is sealed with a rubber adhesive or the like after passing through the cords 76 and 77.
  • the deaeration pump is connected to the deaeration port 73c, and the storage bag 73 is evacuated.
  • the storage bag 73 is in close contact with the EL element 2G, and the EL element 2G is fixed.
  • the EL element 2G is sealed in the container 71. Due to the hard cover plate 72, no wrinkles of the storage bag 73 occur on the front electrode layer 21 of the EL element 2G. For this reason, the container 71 does not deteriorate the image quality of the EL element 2G.
  • the container 71 By enclosing the EL element 2G in the container 71 as described above, a failure due to an electric shock or the like can be prevented. Moreover, according to the container 71, it can respond to the EL element 2G of a large size compared with a lamination process.
  • a coil may be provided in the container 71 and the EL element 2G may be driven by non-contact power feeding.
  • the permeation liquid 42 that has permeated the permeation layer 61 forms the pattern layer 41.
  • the light emission pattern of the EL element 2G can be easily formed by printing or the like.
  • the back electrode layer 24 is formed on the pattern layer via the contact layer 51 after the step of forming the pattern layer (the permeation layer 61 on which the pattern 41 is formed) on the light emitting layer 22.
  • the process of forming is performed. Thereby, it is possible to prevent air (bubbles) from entering the boundary portion between the penetrating liquid 42 of the pattern layer and the light emitting layer 22. As a result, unevenness in light emission of the light emitting layer 22 can be suppressed and uniform light emission can be realized.
  • the light emitting layer A permeation layer 61 made of a membranous material is formed on 22. Since the permeation layer 61 is formed by applying a solution for forming the permeation layer onto the light emitting layer 22, the light emitting layer 22 and the permeation layer 61 are in close contact with each other. Then, the permeating liquid 42 is applied to the permeation layer 61 and permeated between both surfaces of the permeation layer 61 to form the pattern 41. Thereby, the penetration liquid 42 in the penetration layer 61 in which the pattern 41 is formed and the light emitting layer 22 are in close contact with each other, and bubbles can be reliably prevented from entering the boundary portion.
  • the region above the bubbles is sufficient for light emission in the light emitting layer 22.
  • a strong electric field is not formed.
  • the light emitting layer 22 does not emit light in the region above the bubbles, and uneven light emission occurs.
  • air bubbles can be prevented from entering the boundary portion between the penetrating liquid 42 of the pattern layer and the light emitting layer 22 as described above, so that uniform light emission can be obtained in the light emitting layer 22.
  • the pattern 41 is formed by the penetrating liquid 42 on the EL light emitting sheet 62 on which the penetrating layer 61 is formed, the pattern 41 can be easily formed by a user using a printing device or the like. Then, the user can easily complete the EL element 2G by attaching the back electrode layer 24 to the EL light emitting sheet 62 on which the pattern 41 is formed, using an adhesive or the like that becomes the contact layer 51. it can.
  • the laminate in which the material of the contact layer 51 is applied to the back electrode layer 24 made of a metal plate or the like is attached to the permeation layer 61.
  • the back electrode layer 24 may be formed by forming the contact layer 51 on the substrate, and then applying a conductive paste, a conductive polymer or the like to the contact layer 51 and drying it.
  • the back electrode layer 24 may be formed by directly applying a conductive paste, a conductive polymer, or the like to the permeation layer 61 without using the contact layer 51 and drying it.
  • the conductive paste or the like penetrates too deeply into the osmotic layer 61, light may be emitted up to a portion where the osmotic solution 42 is absent depending on driving conditions such as voltage. Therefore, when the back electrode layer 24 is formed by applying a conductive paste or the like, it should be noted that the penetration depth of the conductive paste or the like to the penetration layer 61 and the thickness of the penetration layer 61 are appropriately selected. is necessary.
  • FIG. 13 is a partial cross-sectional view of an EL element according to the fifth embodiment.
  • the EL element 2H according to the fifth embodiment has a configuration in which a contact layer 53 is added to the EL element 2B according to the second embodiment shown in FIG.
  • the contact layer 53 is made of a dielectric having a high dielectric constant, and adheres the light emitting layer 22 and the permeable base material 23.
  • FIG. 14 is a schematic diagram for explaining a method for manufacturing the EL element 2H according to the fifth embodiment.
  • the top and bottom of FIG. 13 are reversed.
  • a laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed by the same procedure as in the fourth embodiment.
  • an adhesive as a material of the contact layer 53 is applied on the light emitting layer 22, and a permeable base material 23 as an osmotic layer is pasted thereon. wear.
  • a high pressure is uniformly applied to the entire surface of the permeable base material 23.
  • a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction.
  • the thickness of the contact layer 53 is, for example, about 0.1 to 20 ⁇ m, and this value is an average thickness after being applied on the light emitting layer 22 having an uneven surface and dried.
  • cyanoethyl pullulan cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane and the like can be used as the material of the contact layer 53.
  • a material that adheres strongly to the permeable base material 23 it is preferable to use cyanoethyl cellulose or the like.
  • the front electrode layer 21, the light emitting layer 22, the contact layer 53, and the permeable base material 23 are provided.
  • an EL light emitting sheet 62A is formed.
  • the permeation liquid 42 is permeated between the upper and lower surfaces of the permeable base material 23 to form a pattern layer made of the permeable base material 23 on which the pattern 41 is formed.
  • printing is performed on the permeable base material 23 side with water-based ink as the penetrating liquid 42 using the EL light emitting sheet 62A as a printing medium, using a printing apparatus. It should be noted that various other methods can be adopted as in the fourth embodiment.
  • the laminated body of the back electrode layer 24 and the contact layer 51 is affixed on the permeable base material 23 from the contact layer 51 side. Thereby, the EL element 2H is completed.
  • the laminate of the back electrode layer 24 and the contact layer 51 is quickly attached to the penetrating substrate 23 after the penetrating liquid 42 has been permeated into the EL light emitting sheet 62A. .
  • the pattern layer (the permeable substrate 23 on which the pattern 41 is formed) is formed on the light emitting layer 22 through the contact layer 53. Therefore, the pattern 41 can be easily formed by using various members such as paper having no adhesion as the permeable base material 23.
  • the pattern layer is formed on the back electrode layer 24 side, and then the laminate is not attached to the light emitting layer 22 via the contact layer 53.
  • the permeable base material 23 is attached via the contact layer 53.
  • the pattern layer is formed by applying the penetrating liquid 42 to the permeable base material 23 and allowing it to penetrate between both surfaces of the permeable base material 23. Thereby, the penetration liquid 42 and the light emitting layer 22 in the permeable base material 23 are in close contact with each other, and bubbles can be reliably prevented from entering the boundary portion. As a result, uniform light emission is obtained in the light emitting layer 22.
  • Modification of the fifth embodiment The modification of the fifth embodiment is obtained by changing a part of the manufacturing method of the EL element 2H of the fifth embodiment described above.
  • FIG. 15 is a schematic diagram for explaining a method of manufacturing the EL element 2H according to the modification of the fifth embodiment. 15 is upside down from FIG. 13 as in FIG.
  • the laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed, and then the contact layer 53 is formed on the light emitting layer 22.
  • the adhesive (adhesive) used as a material is applied. In this way, a laminate of the front electrode layer 21, the light emitting layer 22, and the contact layer 53 is prepared.
  • an adhesive as a material for the contact layer 51 is applied on one surface of a metal plate or the like constituting the back electrode layer 24 to prepare a laminate of the back electrode layer 24 and the contact layer 51.
  • a penetrating liquid 42 is infiltrated into the permeable base material 23 by printing or the like to prepare a pattern layer made of the permeable base material 23 on which the pattern 41 is formed.
  • the permeable base material 23 (pattern layer) in which the pattern 41 was formed is affixed on the contact layer 53. At this time, a high pressure is uniformly applied to the entire surface of the permeable base material 23. For example, with the permeable base material 23 facing upward, a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction.
  • the permeable base material 23 on which the pattern 41 is formed is attached to the back electrode layer 24 via the contact layer 51 and then attached to the contact layer 53, the osmotic liquid 42 in the permeable base material 23 Bubbles formed at the boundary with the light emitting layer 22 have no escape route and remain there.
  • the permeable base material 23 infiltrated with the permeating liquid 42 is pasted on the contact layer 53 with a high pressure.
  • the air passes through the permeable base material 23 and escapes outside. For this reason, no bubbles remain at the boundary between the penetrant 42 and the light emitting layer 22 in the permeable substrate 23.
  • the back electrode layer 24 is attached to the permeable base material 23 via the contact layer 51. Thereby, it can prevent reliably that a bubble enters into the boundary part of the penetration liquid 42 in the permeable base material 23, and the light emitting layer 22.
  • FIG. As a result, uniform light emission is obtained in the light emitting layer 22.
  • the light emitting layer 22 is also formed using a phosphor paste containing a fluorine-based resin such as vinylidene fluoride so that the light emitting layer 22 and the contact layer 53 can be peeled off. It is desirable to form.
  • a paper strength enhancer is applied in advance to the surface to be bonded to the contact layer 53 of the paper. Is preferred.
  • the contact layer 51 is formed on the permeable base material 23 on which the pattern 41 is formed, and then a conductive paste, a conductive polymer, or the like is applied to the contact layer 51. Then, the back electrode layer 24 may be formed by drying. Alternatively, the back electrode layer 24 may be formed by applying a conductive paste, a conductive polymer, or the like directly to the permeable base material 23 without using the contact layer 51 and drying it. However, if the conductive paste or the like penetrates too deeply into the permeable base material 23, light may be emitted to a portion where the penetrating liquid 42 is not present depending on driving conditions such as voltage. For this reason, when the back electrode layer 24 is formed by applying a conductive paste or the like, the penetration depth of the conductive paste or the like to the permeable base material 23 and the thickness of the permeable base material 23 are appropriately selected. It should be noted.
  • FIG. 16 is a partial cross-sectional view of an EL element according to the sixth embodiment. As shown in FIG. 16, the EL element 2I according to the sixth embodiment is different from the EL element 2H according to the fifth embodiment shown in FIG. The permeation layer 23a is formed.
  • the dielectric permeation layer 23 a is formed by permeating a part of the permeable base material 23 in the thickness direction with the dielectric forming the contact layer 53.
  • a pattern 41 is formed in the permeable base material 23 by penetrating the penetrating liquid 42 between the lower surface and the dielectric penetrating layer 23a.
  • a shape (region) in a plan view of a portion where the penetrating liquid 42 has permeated the permeable base material 23 is a pattern 41.
  • FIG. 17 is a schematic diagram for explaining a method of manufacturing the EL element 2I according to the sixth embodiment.
  • a laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed by the same procedure as in the fourth embodiment.
  • a contact layer 53 is formed on the permeable base material 23 to produce an EL light emission pattern sheet 81.
  • the contact layer 53 is formed by applying a dielectric paste on the permeable substrate 23.
  • a dielectric paste is applied on the permeable base material 23
  • a dielectric (high dielectric constant resin) penetrates the permeable base material 23, and a dielectric permeation layer 23a is formed.
  • the contact layer 53 has a thickness of about 0.1 to 20 ⁇ m, for example. This value is the average thickness after coating on the permeable substrate 23 and drying.
  • the dielectric paste is made of a high dielectric constant resin and a solvent.
  • a high dielectric constant resin used for the dielectric paste cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane and the like can be used.
  • a resin having fluidity for example, cyanoethyl PVA.
  • cyclohexanone or the like can be used as cyclohexanone or the like.
  • the light emitting layer 22 of the phosphor sheet 82 which is a laminate of the front electrode layer 21 and the light emitting layer 22, and the EL light emitting pattern.
  • the contact layer 53 of the sheet 81 is adhered and bonded together.
  • the contact layer 53 acts as an adhesive.
  • a high pressure is uniformly applied to the entire surface of the phosphor sheet 82 and the EL light emission pattern sheet 81.
  • a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction.
  • the solvent is removed from the contact layer 53.
  • Volatilization causes the fluidity of the contact layer 53 to decrease.
  • the fluidity of the contact layer 53 is lowered, it becomes difficult to remove bubbles formed at the boundary when the light emitting layer 22 and the contact layer 53 are overlapped.
  • the EL light emitting pattern sheet 81 is preferably sealed and held in a container. Thereby, volatilization of the solvent from the contact layer 53 can be suppressed, and a decrease in fluidity of the contact layer 53 can be suppressed.
  • the contact layer 53 is formed using a resin that can recover the fluidity by heating even if the fluidity decreases
  • the EL layer emits light after the contact layer 53 that has decreased fluidity is heated to the softening point.
  • the pattern sheet 81 and the phosphor sheet 82 may be bonded together. Thereby, it is possible to reduce bubbles remaining between the light emitting layer 22 and the contact layer 53.
  • the permeation liquid 42 is infiltrated into the permeable substrate 23 of the EL light-emitting sheet 83 produced by bonding the phosphor sheet 82 and the EL light-emitting pattern sheet 81, A pattern 41 is formed.
  • printing is performed on the permeable base material 23 side with the water-based ink as the penetrating liquid 42 using the EL light-emitting sheet 83 as a printing medium, using the printing apparatus. It should be noted that various other methods can be adopted as in the fourth embodiment.
  • the laminated body of the back electrode layer 24 and the contact layer 51 is affixed on the permeable base material 23 of the light emitting sheet 83 for EL from the contact layer 51 side.
  • the back electrode layer 24 is formed on the permeable base material 23 via the contact layer 51.
  • the EL element 2I is completed.
  • the permeable base material 23 is allowed to permeate the penetrating liquid 42 and then a laminate of the back electrode layer 24 and the contact layer 51 is quickly attached to the permeable base material 23. .
  • the phosphor sheet 82 is removed from the EL element 2I.
  • the dielectric penetrates into the permeable substrate 23 to form the dielectric permeable layer 23a.
  • the permeable base material 23 is made of paper
  • the convergence force of the paper fibers is reinforced by the dielectric material that has penetrated the paper.
  • the penetration depth of the penetrating liquid 42 is limited by the dielectric penetrating layer 23a, a region where the paper fiber convergence force is lowered by the penetrating liquid 42 is suppressed to a small size.
  • the paper as the permeable base material 23 is torn, and a part of the paper adheres to the light emitting layer 22 of the phosphor sheet 82 together with a part of the contact layer 53. It can suppress that it will be in the state.
  • the dielectric permeation layer 23 a since the dielectric permeation layer 23 a is formed, it is possible to reduce the penetration of the penetrating liquid 42 to the light emitting layer 22. Accordingly, for example, when ink is used as the penetrating liquid 42, it is possible to reduce the ink remaining in the light emitting layer 22 of the phosphor sheet 82 peeled from the EL element 2I. As described above, the EL element 2I Then, since the dielectric permeation layer 23a is formed inside the permeable base material 23, the phosphor sheet 82 can be removed from the EL element 2I in a reusable state.
  • the phosphor layer 82 can be reused from the EL element 2I by facilitating the separation of the light emitting layer 22 and the contact layer 53. Easy to remove.
  • the phosphor sheet 82 When the phosphor sheet 82 is removed from the EL element 2I, a new EL light emission pattern sheet 81 is attached to the phosphor sheet 82, and a new EL light emission sheet 83 is produced. Then, after forming a new pattern 41 on the EL light emitting sheet 83 with the penetrating liquid 42, the back electrode layer 24 is formed. Thereby, the EL element 2I in which the content of the pattern 41 is changed is manufactured. Thus, the phosphor sheet 82 is reused.
  • the pattern 41 is formed by infiltrating the penetrating liquid 42 into the permeable base material 23 of the EL light emitting pattern sheet 81. For this reason, the light emission pattern of the EL element 2I can be easily formed by printing or the like.
  • the contact paste 53 is formed by applying a dielectric paste on the permeable substrate 23, and the dielectric permeable layer 23a is formed in the permeable substrate 23.
  • a light emitting pattern sheet 81 is produced.
  • the permeable base material 23 is strengthened by the dielectric permeation layer 23a.
  • the dielectric permeation layer 23a can reduce contamination of the light emitting layer 22 when the penetrating liquid 42 reaches the light emitting layer 22.
  • the phosphor sheet 82 can be removed from the EL element 2I in a reusable state.
  • the pattern 41 is formed by the penetrating liquid 42 and then the back electrode layer 24 is formed.
  • the permeating liquid 42 is infiltrated into the permeable base material 23 (surface opposite to the dielectric permeable layer 23a) of the light emitting pattern sheet 81 to form the pattern 41 and the back electrode layer 24, the phosphor sheet 82 is formed. May be attached to the EL light emission pattern sheet 81.
  • the contact layer 51 is formed on the permeable substrate 23 on which the pattern 41 is formed, and then a conductive paste, a conductive polymer is formed. Etc. may be applied to the contact layer 51 and dried to form the back electrode layer 24.
  • the back electrode layer 24 may be formed by applying a conductive paste, a conductive polymer, or the like directly to the permeable base material 23 without using the contact layer 51 and drying it.
  • FIG. 18 is a partial cross-sectional view of an EL element according to the seventh embodiment. As shown in FIG. 18, in the EL element 2J according to the seventh embodiment, a liquid blocking layer 91 and a contact layer 92 are added to the EL element 2I according to the sixth embodiment shown in FIG. This is the configuration.
  • the liquid blocking layer 91 is a layer that does not allow the penetrating liquid 42 that is a liquid to pass through.
  • the liquid blocking layer 91 is made of a light transmissive insulator.
  • the liquid blocking layer 91 is made of PET resin, PEN resin, silicone resin film, glass, or the like.
  • the liquid blocking layer 91 is disposed on the contact layer 53.
  • the thickness of the liquid blocking layer 91 is, for example, 5 ⁇ m or less. The higher the dielectric constant and the smaller the thickness of the liquid blocking layer 91, the more preferable it is because the division of the applied voltage can be reduced.
  • the contact layer 92 bonds the liquid blocking layer 91 and the light emitting layer 22 together.
  • the contact layer 92 is made of a dielectric material having a dielectric constant of 5 or more, more preferably 10 or more.
  • FIG. 19 is a schematic diagram for explaining a method of manufacturing the EL element 2J according to the seventh embodiment.
  • a laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed by the same procedure as in the fourth embodiment.
  • the contact layer 53 is formed on the permeable base material 23
  • the liquid blocking layer 91 is formed on the contact layer 53
  • the contact layer 92 is further formed on the liquid blocking layer 91.
  • the EL light emitting pattern sheet 81A is manufactured.
  • the process of forming the contact layer 53 on the permeable base material 23 is the same as that of the above-mentioned sixth embodiment.
  • the liquid blocking layer 91 is formed on the contact layer 53 by, for example, attaching a PET resin film.
  • the liquid blocking layer 91 is not formed by dissolving a PET resin or the like in a solvent and applying it on the contact layer 53, but is formed by attaching a pre-formed film or the like on the contact layer 53. This is because pinholes may be formed in a layer (film) formed by dissolving PET resin or the like in a solvent and applying the solution on the contact layer 53, and there is a possibility that liquid may pass therethrough.
  • a contact layer 92 is formed by applying a dielectric paste on the liquid blocking layer 91. Thereby, the EL light emission pattern sheet 81A is completed.
  • the dielectric paste used for forming the contact layer 92 the same paste as that described in the sixth embodiment can be used.
  • a resin having a high dielectric constant in the dielectric paste used for forming the contact layer 92 in order to prevent bubbles from being formed at the boundary with the light emitting layer 22 when the contact layer 92 is bonded to the light emitting layer 22, fluidity is provided. It is preferable to use a resin having In the seventh embodiment, a resin having a low fluidity is preferable as the high dielectric constant resin used for forming the contact layer 53.
  • the light emission layer 22 of the phosphor sheet 82 which is a laminate of the front electrode layer 21 and the light emission layer 22, and the EL light emission pattern.
  • the contact layer 92 of the sheet 81 ⁇ / b> A is adhered and bonded together.
  • a high pressure is uniformly applied to the entire surface of the phosphor sheet 82 and the EL light emission pattern sheet 81A.
  • a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction.
  • the EL light emitting pattern sheet 81A when a long time elapses after the EL light emitting pattern sheet 81A is produced and bonded to the phosphor sheet 82, the EL light emitting pattern sheet 81A is enclosed in a container. Therefore, it is preferable to suppress a decrease in fluidity of the contact layer 92.
  • the contact layer 92 is formed using a resin that can recover the fluidity by heating even if the fluidity decreases, the EL layer emits light after the contact layer 92 that has decreased fluidity is heated to the softening point.
  • the pattern sheet 81A and the phosphor sheet 82 may be bonded together.
  • the penetrating liquid 42 is infiltrated into the permeable base material 23 of the EL light emitting sheet 83A produced by bonding the phosphor sheet 82 and the EL light emitting pattern sheet 81A.
  • a pattern 41 is formed.
  • printing is performed on the permeable base material 23 side with the water-based ink as the penetrating liquid 42 using the EL light-emitting sheet 83A as a printing medium, using the printing apparatus. It should be noted that various other methods can be adopted as in the fourth embodiment.
  • the laminated body of the back electrode layer 24 and the contact layer 51 is affixed on the permeable base material 23 of the light emission sheet 83A for EL from the contact layer 51 side. Thereby, the EL element 2J is completed.
  • the permeable base material 23 is allowed to permeate the penetrating liquid 42 and then a laminate of the back electrode layer 24 and the contact layer 51 is quickly attached to the permeable base material 23. .
  • the phosphor sheet 82 When changing the content of the pattern 41 in the EL element 2J, the phosphor sheet 82 is removed from the EL element 2J.
  • a new EL light emission pattern sheet 81A is attached to the phosphor sheet 82 to produce a new EL light emission sheet 83A.
  • a new pattern 41 is formed on the EL light-emitting sheet 83 ⁇ / b> A with the penetrating liquid 42, and then the back electrode layer 24 is formed. Thereby, the EL element 2J in which the content of the pattern 41 is changed is manufactured.
  • the phosphor sheet 82 is reused.
  • the phosphor sheet 82 can be easily peeled off.
  • pinholes may exist in the light emitting layer 22, the dielectric permeation layer 23a, and the contact layers 51, 53, and 92. In a layer where pinholes are present, there is a risk of liquid penetration.
  • the liquid blocking layer 91 can prevent the penetrating liquid 42 from reaching the light emitting layer 22 and the front electrode layer 21.
  • the penetrating liquid 42 may become dirty and the phosphor sheet 82 may not be reused.
  • the penetrating liquid 42 reaches the front electrode layer 21, there is a risk of causing a short circuit failure or shortening the life of the EL element 2J.
  • the EL element 2J can prevent these disadvantages.
  • the penetrating liquid 42 is applied to the penetrating base material 23 (surface opposite to the dielectric penetrating layer 23a) of the EL light emission pattern sheet 81A. After the penetration, the pattern 41 is formed, and the back electrode layer 24 is formed, the phosphor sheet 82 may be attached to the EL light emission pattern sheet 81A.
  • the contact layer 51 is formed on the permeable substrate 23 on which the pattern 41 is formed, and then a conductive paste, a conductive polymer is formed. Etc. may be applied to the contact layer 51 and dried to form the back electrode layer 24.
  • the back electrode layer 24 may be formed by applying a conductive paste, a conductive polymer, or the like directly to the permeable base material 23 without using the contact layer 51 and drying it.
  • the dispersion-type inorganic EL element has been described.
  • the present invention can also be applied to a thin-film inorganic EL element.
  • the EL elements 2 and 2A to 2J of each embodiment can be configured not only in a planar shape but also in a curved surface shape or a flexible shape.
  • the permeable base material 23 in the first to third and fifth to seventh embodiments paper or the like previously printed with oil-based ink may be used. Even if printing with oil-based ink is performed, the penetrating liquid 42 can penetrate the permeable base material 23. Since the oil-based ink has high insulation and has a dielectric constant similar to that of the permeable base material 23, even if an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, An electric field is not formed in the light emitting layer 22 on the print area of the oil-based ink, and no light emission occurs. Therefore, only the region where the pattern 41 by the penetrating liquid 42 is formed in the design of the entire permeable base material 23 can be caused to emit light.
  • a humectant may be held on the permeable base material 23.
  • the humectant include PVA, polyacrylate, starch, dextrin, gelatin, agar, polyethylene oxide, polyacrylamide, methylcellulose, sorbit, xylitol, erythritol, mannitol, lactitol, oligosaccharide alcohol, maltitol, reduced starch hydrolyzed Degradation products, fructose, glucose, oligosaccharides, trehalose, and glycine betaine can be used. These humectants can be used alone or as a mixture of two or more.
  • the pattern 41 may be formed by using a plurality of types of liquids having different conductivities as the penetrating liquid 42.
  • a plurality of types of liquids having different conductivities For example, by adjusting the conductivity of the water-based ink with a water-soluble organic solvent, an ink set composed of a plurality of types of water-based inks having different conductivity is prepared.
  • a plurality of patterns 41 are formed with various water-based inks by printing with a printing apparatus equipped with this ink set.
  • the light emission luminance of the pattern corresponding portion 43 corresponding to the pattern 41 increases as the conductivity of the water-based ink increases. Therefore, by using a plurality of types of liquids having different conductivities as the penetrating liquid 42, it is possible to diversify the display contents of the EL elements 2, 2A to 2J.
  • a dielectric layer containing barium titanate powder may be provided between the light emitting layer 22 and the contact layer 92 of the EL element 2J.
  • a dielectric layer containing barium titanate powder is formed on the light emitting layer 22 of the phosphor sheet 82 which is a laminate of the front electrode layer 21 and the light emitting layer 22.
  • a dielectric layer containing barium titanate powder is formed by applying a paste in which barium titanate powder is dispersed in a binder containing a fluorine-based resin such as vinylidene fluoride on the light emitting layer 22. .
  • an EL light emission pattern sheet 81A is bonded onto the dielectric layer containing the barium titanate powder.
  • FIGS. 19C and 19D are performed.
  • the phosphor sheet 82 can be more easily separated from the EL element 2J.
  • the EL element 2D to 2F of the third embodiment and its modifications 1 and 2 the EL element 2H of the fifth embodiment, and the EL element 2I of the sixth embodiment, contact with the light emitting layer 22 A dielectric layer containing barium titanate powder may be provided between the layer 53 and the layer 53. Thereby, the light emitting layer 22 and the contact layer 53 can be more easily peeled off.
  • an aging process for intentionally degrading the light emitting layer 22 may be performed at the time of manufacturing the EL elements 2, 2A to 2J of the respective embodiments.
  • the aging process is performed on the phosphor sheet 82 before the EL light emitting pattern sheet 81A is attached to the phosphor sheet 82.
  • a back electrode layer for aging treatment made of a metal plate or the like is prepared, and a dielectric layer is formed on the back electrode layer. Similar to the contact layer 92 of the EL element 2J, this dielectric layer is made of a high dielectric constant dielectric material having fluidity.
  • a laminate of the back electrode layer for aging treatment and the dielectric layer is attached to the light emitting layer 22 of the phosphor sheet 82 from the dielectric layer side.
  • air bubbles between the light emitting layer 22 and the dielectric layer are removed and the thickness of the dielectric layer is made uniform. .
  • an AC voltage is applied between the front electrode layer 21 of the phosphor sheet 82 and the back electrode layer for aging treatment.
  • the light emitting layer 22 emits light.
  • the application of the AC voltage is terminated.
  • an aging process is complete
  • the back electrode layer and the dielectric layer for aging process are removed from the phosphor sheet 82.
  • the dielectric layer containing the barium titanate powder is formed on the light emitting layer 22 of the phosphor sheet 82, the back electrode layer and the dielectric layer for aging treatment can be removed cleanly. it can.
  • the back electrode layer 24 and the contact layer 51 for products may be used as the back electrode layer and the dielectric layer for aging treatment.
  • the back electrode layer for aging treatment to the light emitting layer 22 through the dielectric layer having fluidity, the light emission unevenness of the light emitting layer 22 during the aging treatment is suppressed, and the light emitting layer is uniformly formed. 22 can be deteriorated.
  • the pattern corresponding portion 43 is deteriorated from the other portions.
  • the pattern 41 is changed later, there is a possibility that the light emission becomes non-uniform due to an afterimage of the past pattern 41.
  • By performing the aging process it is possible to suppress non-uniform light emission when the pattern 41 is changed.

Abstract

An emission pattern for EL elements is easily formed. An EL element (2) is provided with: a pair of planer electrodes (21, 24); a permeable base (23) that is arranged between the pair of electrodes (21, 24), has a pore through which a liquid is able to permeate, is formed of an insulating material, and is provided with a pattern (41) which is formed by permeation of a penetrant liquid (42) that is composed of a dielectric material having higher dielectric constant than the insulating material or a conductive material; and a light emitting layer (22) that is arranged on a permeable base (23)-side surface of one of the pair of electrodes (21, 24), contains a phosphor, and emits light in portions corresponding to the pattern (41).

Description

ＥＬ素子、ＥＬ発光パターン用シート、およびＥＬ素子の製造方法EL element, EL light emitting pattern sheet, and method of manufacturing EL element
　本発明は、光を発するＥＬ（エレクトロルミネッセンス）素子、ＥＬ発光パターン用シート、およびＥＬ素子の製造方法に関する。 The present invention relates to an EL (electroluminescence) element that emits light, an EL light emission pattern sheet, and a method for manufacturing the EL element.
　無機ＥＬ素子では、一対の電極間に交流電圧が印加されることにより、電極間に配置された発光層が発光する。 In an inorganic EL element, when an alternating voltage is applied between a pair of electrodes, a light emitting layer disposed between the electrodes emits light.
　従来、無機ＥＬ素子の発光のパターンを形成するために、電極または発光層をパターニングしていた（例えば、特許文献１，２参照）。 Conventionally, in order to form a light emission pattern of an inorganic EL element, an electrode or a light emitting layer has been patterned (for example, see Patent Documents 1 and 2).
特開平２－３３８８９号公報JP-A-2-33889 特開平３－２７６５９３号公報JP-A-3-276593
　しかしながら、電極や発光層をパターニングするには、版が必要である。このようなパターニングは専門業者が行っており、容易に行えるものではなかった。 However, a plate is required to pattern the electrode and the light emitting layer. Such patterning is performed by a specialist, and cannot be easily performed.
　本発明は上記に鑑みてなされたもので、発光のパターンの形成が容易なＥＬ素子、ＥＬ発光パターン用シート、およびＥＬ素子の製造方法を提供することを目的とする。 The present invention has been made in view of the above, and an object of the present invention is to provide an EL element, an EL light emitting pattern sheet, and a method for manufacturing the EL element, in which a light emission pattern can be easily formed.
　上記目的を達成するため、本発明に係るＥＬ素子の第１の特徴は、面状の一対の電極と、前記一対の電極間に配置され、液体が浸透可能な空隙を有し、絶縁体からなり、当該絶縁体よりも誘電率が大きい誘電体または導体からなる浸透液が浸透することによりパターンが形成された浸透性基材と、前記一対の電極のうちの一方の電極の前記浸透性基材側の面上に配置され、蛍光体を有し、前記パターンに対応する部分が発光する発光層とを備えることにある。 In order to achieve the above object, the first feature of the EL device according to the present invention is that a pair of planar electrodes and a gap that is disposed between the pair of electrodes and that can penetrate liquid are used. A permeable base material on which a pattern is formed by permeation of a penetrating liquid made of a dielectric or conductor having a dielectric constant greater than that of the insulator, and the permeable group of one of the pair of electrodes It is provided on the surface of the material side, has a phosphor, and has a light emitting layer in which a portion corresponding to the pattern emits light.
　本発明に係るＥＬ素子の第２の特徴は、前記浸透性基材と前記発光層との間に配置され前記浸透性基材および前記発光層と密着する誘電体からなる第１のコンタクト層、および前記浸透性基材と他方の電極との間に配置され前記浸透性基材および前記他方の電極と密着する誘電体または導体からなる第２のコンタクト層の少なくともいずれか一方を備えることにある。 A second feature of the EL element according to the present invention is a first contact layer made of a dielectric material disposed between the permeable substrate and the light emitting layer and in close contact with the permeable substrate and the light emitting layer, And at least one of a second contact layer made of a dielectric or a conductor disposed between the permeable substrate and the other electrode and in close contact with the permeable substrate and the other electrode. .
　本発明に係るＥＬ発光パターン用シートの第１の特徴は、絶縁体からなり、液体が浸透可能な浸透性基材と、前記浸透性基材上に形成された誘電体からなるコンタクト層とを備え、前記コンタクト層を形成する誘電体が前記浸透性基材の厚さ方向の一部に浸透していることにある。 The first feature of the EL light emitting pattern sheet according to the present invention is that it comprises an permeable base material made of an insulator and capable of penetrating a liquid, and a contact layer made of a dielectric formed on the permeable base material. And the dielectric forming the contact layer penetrates into a part of the permeable substrate in the thickness direction.
　本発明に係るＥＬ発光パターン用シートの第２の特徴は、前記コンタクト層上に配置された、液体の通過を遮断する液体遮断層をさらに備えることにある。 The second feature of the EL light emitting pattern sheet according to the present invention is that it further includes a liquid blocking layer disposed on the contact layer and blocking the passage of liquid.
　本発明に係るＥＬ素子の製造方法の第１の特徴は、前面電極層上に蛍光体を含む発光層を形成し、蛍光体シートを作製する工程と、絶縁体からなり、液体が浸透可能な浸透性基材上に、誘電体ペーストを塗布してコンタクト層を形成し、ＥＬ発光パターン用シートを作製する工程と、前記蛍光体シートの前記発光層と前記ＥＬ発光パターン用シートの前記コンタクト層とを密着させて貼り合わせる工程と、前記ＥＬ発光パターン用シートの前記浸透性基材に、前記浸透性基材より誘電率が大きい誘電体または導体からなる浸透液を浸透させて前記発光層の発光のパターンを形成する工程と、前記パターンを形成する工程の後に、前記浸透性基材上に背面電極層を形成する工程とを含むことにある。 The first feature of the method for manufacturing an EL element according to the present invention is that a light emitting layer containing a phosphor is formed on a front electrode layer, and a phosphor sheet is manufactured. A step of forming a contact layer by applying a dielectric paste on a permeable substrate to produce an EL light emitting pattern sheet, the light emitting layer of the phosphor sheet, and the contact layer of the EL light emitting pattern sheet Adhering and adhering together, and penetrating liquid made of a dielectric or conductor having a dielectric constant larger than that of the permeable substrate into the permeable substrate of the EL light emitting pattern sheet, and There is a step of forming a light emitting pattern and a step of forming a back electrode layer on the permeable substrate after the step of forming the pattern.
　本発明に係るＥＬ素子の製造方法の第２の特徴は、前面電極層上に蛍光体を含む発光層を形成し、蛍光体シートを作製する工程と、絶縁体からなり、液体が浸透可能な浸透性基材上に、誘電体ペーストを塗布して第１のコンタクト層を形成し、前記第１のコンタクト層上に液体の通過を遮断する液体遮断層を形成し、前記液体遮断層上に誘電体ペーストを塗布して第２のコンタクト層を形成し、ＥＬ発光パターン用シートを作製する工程と、前記蛍光体シートの前記発光層と前記ＥＬ発光パターン用シートの前記第２のコンタクト層とを密着させて貼り合わせる工程と、前記ＥＬ発光パターン用シートの前記浸透性基材に、前記浸透性基材より誘電率が大きい誘電体または導体からなる浸透液を浸透させて前記発光層の発光のパターンを形成する工程と、前記パターンを形成する工程の後に、前記浸透性基材上に背面電極層を形成する工程とを含むことにある。 The second feature of the method for manufacturing an EL element according to the present invention is that a light emitting layer containing a phosphor is formed on the front electrode layer, and a phosphor sheet is manufactured. On the permeable substrate, a dielectric paste is applied to form a first contact layer, a liquid blocking layer for blocking the passage of liquid is formed on the first contact layer, and the liquid blocking layer is formed on the liquid blocking layer. Applying a dielectric paste to form a second contact layer to produce an EL light-emitting pattern sheet; the light-emitting layer of the phosphor sheet; and the second contact layer of the EL light-emitting pattern sheet; And the step of adhering and adhering, and the penetrating substrate of the EL light emitting pattern sheet is infiltrated with a penetrating liquid composed of a dielectric or a conductor having a dielectric constant larger than that of the penetrating substrate to emit light from the light emitting layer. Shaped pattern A step of, after the step of forming the pattern is to include a step of forming a back electrode layer on the permeable substrate.
　本発明に係るＥＬ素子の製造方法の第３の特徴は、前面電極層上に、蛍光体を含む発光層を形成する工程と、前記発光層上に、絶縁体からなる浸透層に前記浸透層より誘電率が大きい誘電体または導体からなる浸透液が浸透することにより前記発光層の発光のパターンが形成されたパターン層を形成する工程と、前記パターン層を形成する工程の後に、前記発光層とは反対側の前記パターン層上に背面電極層を形成する工程とを含むことにある。 The third feature of the method for manufacturing an EL element according to the present invention is that a step of forming a light emitting layer containing a phosphor on a front electrode layer, and a penetrating layer made of an insulator on the light emitting layer, the penetrating layer. A step of forming a pattern layer in which a light emission pattern of the light emitting layer is formed by permeation of a dielectric material or a conductor having a higher dielectric constant, and the step of forming the pattern layer; And a step of forming a back electrode layer on the pattern layer on the opposite side.
　本発明に係るＥＬ素子の第１の特徴によれば、浸透性基材に浸透液で形成されたパターンが発光のパターンとなるので、発光のパターンの形成が容易である。 According to the first feature of the EL element according to the present invention, since the pattern formed of the penetrating liquid on the permeable substrate becomes a light emission pattern, the light emission pattern can be easily formed.
　本発明に係るＥＬ素子の第２の特徴によれば、第１のコンタクト層および第２のコンタクト層の少なくともいずれか一方を備えるので、浸透性基材と発光層との間、および浸透性基材と他方の電極との間の少なくともいずれか一方において、空気が入ることを防止でき、発光層の発光ムラを軽減できる。 According to the second feature of the EL element of the present invention, since at least one of the first contact layer and the second contact layer is provided, the permeable group and the permeable substrate are provided. Air can be prevented from entering in at least one of the material and the other electrode, and uneven emission of the light emitting layer can be reduced.
　本発明に係るＥＬ発光パターン用シートの第１の特徴によれば、浸透性基材に浸透液を浸透させることにより、ＥＬ素子の発光のパターンを容易に形成できる。また、誘電体が浸透性基材に浸透していることで、浸透性基材の損傷を抑制できる。これにより、ＥＬ素子においてＥＬ発光パターン用シートと貼り合わされる蛍光体シートを再利用可能な状態で取り外すことが可能となる。 According to the first feature of the EL light emitting pattern sheet according to the present invention, the light emitting pattern of the EL element can be easily formed by allowing the penetrating liquid to permeate the permeable base material. Moreover, the damage of a permeable base material can be suppressed because the dielectric has osmose | permeated the permeable base material. Thereby, it becomes possible to remove the phosphor sheet bonded to the EL light emission pattern sheet in the EL element in a reusable state.
　本発明に係るＥＬ発光パターン用シートの第２の特徴によれば、液体遮断層により、ＥＬ発光パターン用シートと貼り合わされる蛍光体シートの発光層や前面電極層に浸透液が到達することを防止できる。これにより、発光層が汚れることや、ＥＬ素子におけるショート故障の発生や寿命の低下を防止できる。 According to the 2nd characteristic of the sheet | seat for EL light emission patterns which concerns on this invention, a penetration liquid reaches | attains the light emitting layer and front electrode layer of the fluorescent substance sheet bonded together with the sheet | seat for EL light emission patterns by a liquid interruption | blocking layer. Can be prevented. As a result, it is possible to prevent the light emitting layer from becoming dirty, the occurrence of a short circuit failure in the EL element, and the reduction of the lifetime.
　本発明に係るＥＬ素子の製造方法の第１の特徴によれば、浸透性基材に浸透液を浸透させることにより発光のパターンを形成する。これにより、ＥＬ素子の発光のパターンを容易に形成できる。また、浸透性基材上に誘電体ペーストを塗布してＥＬ発光パターン用シートを作製する工程により、浸透性基材内に誘電体を浸透させ、浸透性基材を強化できるとともに、発光層に浸透液が到達することを低減できる。これにより、ＥＬ素子から蛍光体シートを取り外す際に浸透性基材が損傷することを抑制するとともに、浸透液により発光層が汚れることを低減できる。この結果、ＥＬ素子から蛍光体シートを再利用可能な状態で取り外すことが可能となる。 According to the first feature of the method for manufacturing an EL element according to the present invention, a light emission pattern is formed by infiltrating a penetrating liquid into a permeable base material. Thereby, the light emission pattern of the EL element can be easily formed. In addition, by applying a dielectric paste on the permeable substrate to produce an EL light emitting pattern sheet, the dielectric can be infiltrated into the permeable substrate to reinforce the permeable substrate and The arrival of the penetrant can be reduced. Thereby, when removing a fluorescent substance sheet from an EL element, while suppressing that a permeable base material is damaged, it can reduce that a light emitting layer gets dirty with a osmotic solution. As a result, the phosphor sheet can be removed from the EL element in a reusable state.
　本発明に係るＥＬ素子の製造方法の第２の特徴によれば、浸透性基材に浸透液を浸透させることにより発光のパターンを形成する。これにより、ＥＬ素子の発光のパターンを容易に形成できる。また、浸透性基材上に誘電体ペーストを塗布してＥＬ発光パターン用シートを作製する工程により、浸透性基材内に誘電体を浸透させ、浸透性基材を強化できるとともに、発光層に浸透液が到達することを低減できる。これにより、ＥＬ素子から蛍光体シートを取り外す際に浸透性基材が損傷することを抑制するとともに、浸透液により発光層が汚れることを低減できる。この結果、ＥＬ素子から蛍光体シートを再利用可能な状態で取り外すことが可能となる。また、液体遮断層を形成することにより、ＥＬ素子において発光層や前面電極層に浸透液が到達することを防止できる。これにより、発光層が汚れることや、ＥＬ素子におけるショート故障の発生や寿命の低下を防止できる。 According to the second feature of the method for manufacturing an EL element according to the present invention, a light emission pattern is formed by infiltrating a penetrating liquid into a permeable base material. Thereby, the light emission pattern of the EL element can be easily formed. In addition, by applying a dielectric paste on the permeable substrate to produce an EL light emitting pattern sheet, the dielectric can be infiltrated into the permeable substrate to reinforce the permeable substrate and The arrival of the penetrant can be reduced. Thereby, when removing a fluorescent substance sheet from an EL element, while suppressing that a permeable base material is damaged, it can reduce that a light emitting layer gets dirty with a osmotic solution. As a result, the phosphor sheet can be removed from the EL element in a reusable state. Moreover, by forming the liquid blocking layer, it is possible to prevent the penetrant from reaching the light emitting layer and the front electrode layer in the EL element. As a result, it is possible to prevent the light emitting layer from becoming dirty, the occurrence of a short circuit failure in the EL element, and the reduction of the lifetime.
　本発明に係るＥＬ素子の製造方法の第３の特徴によれば、浸透層に浸透した浸透液が発光のパターンとなるパターン層を形成する。これにより、ＥＬ素子の発光のパターンを容易に形成できる。また、パターン層上に背面電極層を形成する工程より前に、発光層上にパターン層を形成する工程を行うことで、パターン層の浸透液と発光層との境界部に空気が入ることを防止できる。これにより、均一な発光を実現できる。 According to the third feature of the method for manufacturing an EL element according to the present invention, a pattern layer is formed in which the permeation solution that has permeated the permeation layer forms a light emission pattern. Thereby, the light emission pattern of the EL element can be easily formed. In addition, by performing the step of forming the pattern layer on the light emitting layer before the step of forming the back electrode layer on the pattern layer, air can enter the boundary portion between the penetrant liquid and the light emitting layer of the pattern layer. Can be prevented. Thereby, uniform light emission can be realized.
第１の実施の形態に係るＥＬ素子を備える発光パネルの全体斜視図である。It is a whole perspective view of a light emission panel provided with the EL element concerning a 1st embodiment. 図１におけるＡ－Ａ線に沿ったＥＬ素子の部分断面図である。FIG. 2 is a partial cross-sectional view of an EL element taken along line AA in FIG. 発光を説明するためのＥＬ素子の部分断面図である。It is a fragmentary sectional view of an EL element for explaining light emission. 第１の実施の形態の変形例に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning the modification of a 1st embodiment. 第２の実施の形態に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning a 2nd embodiment. 第２の実施の形態の変形例に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning the modification of a 2nd embodiment. 第３の実施の形態に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning a 3rd embodiment. 第３の実施の形態の変形例１に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning modification 1 of a 3rd embodiment. 第３の実施の形態の変形例２に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning modification 2 of a 3rd embodiment. 第４の実施の形態に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning a 4th embodiment. 第４の実施の形態に係るＥＬ素子の製造方法を説明するための模式図であって、（ａ）は、前面電極層を作製する工程の説明図、（ｂ）は、発光層を形成する工程の説明図、（ｃ）は、浸透層を形成する工程の説明図、（ｄ）は、パターンを形成する工程の説明図、（ｅ）は、背面電極層を形成する工程の説明図である。It is a schematic diagram for demonstrating the manufacturing method of the EL element which concerns on 4th Embodiment, (a) is explanatory drawing of the process of producing a front electrode layer, (b) forms a light emitting layer. Explanatory drawing of a process, (c) is explanatory drawing of the process of forming a osmosis | permeation layer, (d) is explanatory drawing of the process of forming a pattern, (e) is explanatory drawing of the process of forming a back electrode layer. is there. （ａ）は、ＥＬ素子を封入する容器の平面図、（ｂ）は、（ａ）におけるＢ－Ｂ線に沿った断面図である。(A) is a plan view of a container enclosing an EL element, and (b) is a sectional view taken along line BB in (a). 第５の実施の形態に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning a 5th embodiment. 第５の実施の形態に係るＥＬ素子の製造方法を説明するための模式図であって、（ａ）は、コンタクト層を形成し浸透性基材を貼り付ける工程の説明図、（ｂ）は、ＥＬ用発光シートを示す図、（ｃ）は、パターンを形成する工程の説明図、（ｄ）は、背面電極層を形成する工程の説明図である。It is a schematic diagram for demonstrating the manufacturing method of the EL element which concerns on 5th Embodiment, (a) is explanatory drawing of the process of forming a contact layer and sticking a permeable base material, (b) is The figure which shows the light emission sheet for EL, (c) is explanatory drawing of the process of forming a pattern, (d) is explanatory drawing of the process of forming a back electrode layer. 第５の実施の形態の変形例におけるＥＬ素子の製造方法を説明するための模式図である。It is a schematic diagram for demonstrating the manufacturing method of the EL element in the modification of 5th Embodiment. 第６の実施の形態に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning a 6th embodiment. 第６の実施の形態に係るＥＬ素子の製造方法を説明するための模式図であって、（ａ）は、ＥＬ発光パターン用シートを作製する工程の説明図、（ｂ）は、ＥＬ用発光シートを作製する工程の説明図、（ｃ）は、パターンを形成する工程の説明図、（ｄ）は、背面電極層を形成する工程の説明図である。It is a schematic diagram for demonstrating the manufacturing method of the EL element which concerns on 6th Embodiment, (a) is explanatory drawing of the process of producing the sheet | seat for EL light emission patterns, (b) is light emission for EL. FIG. 4C is an explanatory diagram of a process for forming a sheet, FIG. 3C is an explanatory diagram of a process of forming a pattern, and FIG. 4D is an explanatory diagram of a process of forming a back electrode layer. 第７の実施の形態に係るＥＬ素子の部分断面図である。It is a fragmentary sectional view of the EL element concerning a 7th embodiment. 第７の実施の形態に係るＥＬ素子の製造方法を説明するための模式図であって、（ａ）は、ＥＬ発光パターン用シートを作製する工程の説明図、（ｂ）は、ＥＬ用発光シートを作製する工程の説明図、（ｃ）は、パターンを形成する工程の説明図、（ｄ）は、背面電極層を形成する工程の説明図である。It is a schematic diagram for demonstrating the manufacturing method of the EL element which concerns on 7th Embodiment, (a) is explanatory drawing of the process of producing the sheet | seat for EL light emission patterns, (b) is light emission for EL. FIG. 4C is an explanatory diagram of a process for forming a sheet, FIG. 3C is an explanatory diagram of a process of forming a pattern, and FIG. 4D is an explanatory diagram of a process of forming a back electrode layer.
　以下、本発明の実施の形態について、図面を参照して説明する。各図面を通じて同一もしくは同等の部位や構成要素には、同一もしくは同等の符号を付している。ただし、図面は模式的なものであり、現実のものとは異なることに留意すべきである。また、図面相互間においても互いの寸法の関係や比率が異なる部分が含まれていることはもちろんである。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. Throughout the drawings, the same or equivalent parts and components are denoted by the same or equivalent reference numerals. However, it should be noted that the drawings are schematic and different from the actual ones. Moreover, it is a matter of course that portions having different dimensional relationships and ratios are included between the drawings.
　また、以下に示す実施の形態は、この発明の技術的思想を具体化するための装置等を例示するものであって、この発明の技術的思想は、各構成部品の配置等を下記のものに特定するものでない。この発明の技術的思想は、特許請求の範囲において、種々の変更を加えることができる。 Further, the embodiment described below exemplifies an apparatus or the like for embodying the technical idea of the present invention, and the technical idea of the present invention is to arrange the components and the like as follows. It is not something specific. The technical idea of the present invention can be variously modified within the scope of the claims.
［第１の実施の形態］
　図１は、第１の実施の形態に係るＥＬ素子を備える発光パネルの全体斜視図、図２は、図１におけるＡ－Ａ線に沿ったＥＬ素子の部分断面図である。以下の説明において、特に記述がない場合、図１における上下を上下方向とする。 [First Embodiment]
FIG. 1 is an overall perspective view of a light-emitting panel including an EL element according to the first embodiment, and FIG. 2 is a partial cross-sectional view of the EL element along the line AA in FIG. In the following description, unless otherwise specified, the vertical direction in FIG.
　図１に示すように、第１の実施の形態に係る発光パネル１は、ＥＬ素子２と、一対の保護板３Ａ，３Ｂと、固定枠４と、接続部５Ａ，５Ｂとを備える。 As shown in FIG. 1, the light emitting panel 1 according to the first embodiment includes an EL element 2, a pair of protective plates 3A and 3B, a fixed frame 4, and connecting portions 5A and 5B.
　ＥＬ素子２は、光を発するものである。ＥＬ素子２は、分散型無機ＥＬ素子からなる。図２に示すように、ＥＬ素子２は、前面電極層２１と、発光層２２と、浸透性基材２３と、背面電極層２４とを備える。 The EL element 2 emits light. The EL element 2 is composed of a dispersion-type inorganic EL element. As shown in FIG. 2, the EL element 2 includes a front electrode layer 21, a light emitting layer 22, a permeable base material 23, and a back electrode layer 24.
　前面電極層２１は、背面電極層２４と互いに対向する面状の一対の電極を構成する。前面電極層２１は、光透過性を有し、発光層２２からの光が透過するようになっている。前面電極層２１は、透明基材３１と、透明導電層３２とを備える。 The front electrode layer 21 constitutes a pair of planar electrodes opposed to the back electrode layer 24. The front electrode layer 21 is light transmissive and allows light from the light emitting layer 22 to pass therethrough. The front electrode layer 21 includes a transparent substrate 31 and a transparent conductive layer 32.
　透明基材３１は、ＰＥＴ（ポリエチレンテレフタレート）樹脂、ＰＥＮ（ポリエチレンナフタレート）樹脂、ガラス等からなり、光透過性を有する。 The transparent substrate 31 is made of PET (polyethylene terephthalate) resin, PEN (polyethylene naphthalate) resin, glass or the like, and has optical transparency.
　透明導電層３２は、ＩＴＯ（インジウム錫酸化物）、導電性ポリマー等からなり、導電性および光透過性を有する。透明導電層３２は、透明基材３１の下側の面上に形成されている。なお、金属メッシュにより透明導電層３２を構成してもよい。 The transparent conductive layer 32 is made of ITO (indium tin oxide), a conductive polymer, etc., and has conductivity and light transmittance. The transparent conductive layer 32 is formed on the lower surface of the transparent substrate 31. In addition, you may comprise the transparent conductive layer 32 with a metal mesh.
　発光層２２は、蛍光体を有し、前面電極層２１と背面電極層２４との間に交流電圧が印加されると、浸透性基材２３に形成されたパターン４１に対応する部分（パターン４１上の領域）が発光する。発光層２２は、前面電極層２１の浸透性基材２３側の面（下面）上に配置されている。 The light emitting layer 22 has a phosphor, and when an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, a portion corresponding to the pattern 41 formed on the permeable base material 23 (pattern 41). The upper area emits light. The light emitting layer 22 is disposed on the surface (lower surface) of the front electrode layer 21 on the permeable substrate 23 side.
　発光層２２は、蛍光体ペーストが前面電極層２１の透明導電層３２の下面に塗布され乾燥することで形成される。蛍光体ペーストの前面電極層２１への塗布は、例えば、スクリーン印刷法により行われる。発光層２２は、例えば、３０～６０μｍ程度の厚さに形成される。発光層２２は半透明である。 The light emitting layer 22 is formed by applying a phosphor paste to the lower surface of the transparent conductive layer 32 of the front electrode layer 21 and drying. The phosphor paste is applied to the front electrode layer 21 by, for example, a screen printing method. The light emitting layer 22 is formed with a thickness of about 30 to 60 μm, for example. The light emitting layer 22 is translucent.
　蛍光体ペーストは、蛍光体粒子をバインダーに分散させたものである。蛍光体は、母体となる無機組成物に微量の発光中心元素を添加したものである。無機組成物としては、ＺｎＳ、ＣａＳ等が用いられる。発光中心元素としては、例えば、Ｃｕ、Ｍｎ等の金属元素が用いられる。無機組成物と発光中心元素との組み合わせにより、発光層２２の発光色が決まる。 The phosphor paste is obtained by dispersing phosphor particles in a binder. The phosphor is obtained by adding a small amount of a luminescent center element to an inorganic composition as a base material. As the inorganic composition, ZnS, CaS or the like is used. As the luminescent center element, for example, a metal element such as Cu or Mn is used. The light emission color of the light emitting layer 22 is determined by the combination of the inorganic composition and the light emission center element.
　蛍光体ペーストのバインダーは、高誘電率の樹脂と溶剤とからなる。高誘電率の樹脂としては、シアノエチルプルラン、シアノエチルＰＶＡ、シアノエチルサッカロース、シアノエチルセルロース、フッ化ビニリデン、ニトリルゴム、クロロプレンゴム、ポリウレタン、フロロシリコーン等を用いることができる。溶剤は、すべて揮発することが望ましく、このような溶剤として、シクロヘキサノン、メチルエチルケトン、アセトン、アセトニトリル、ニトロメタン、Ｎ，Ｎ－ジメチルホルムアミド（ＤＭＦ）、Ｎ－メチル－２－ピロリドン、γ－ブチルラクトン、炭酸プロピレン、トルエン、キシレン等を用いることができる。 The binder of the phosphor paste consists of a high dielectric constant resin and a solvent. As the high dielectric constant resin, cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, nitrile rubber, chloroprene rubber, polyurethane, fluorosilicone, or the like can be used. All solvents are desirably volatilized, and such solvents include cyclohexanone, methyl ethyl ketone, acetone, acetonitrile, nitromethane, N, N-dimethylformamide (DMF), N-methyl-2-pyrrolidone, γ-butyllactone, carbonic acid. Propylene, toluene, xylene and the like can be used.
　浸透性基材２３は、発光層２２を発光させるパターン４１が形成されるものである。浸透性基材２３は、発光層２２と背面電極層２４との間に配置される。浸透性基材２３は、液体の浸透性を有する。具体的には、浸透性基材２３は、液体が浸透可能な空隙を内部に有する構造になっている。浸透性基材２３には、パターン４１の形成に用いられる液体である浸透液４２が表裏（上下）両面間に浸透することにより、図１に示すパターン４１が形成される。浸透性基材２３に浸透液４２が浸透した部分（図２にドットハッチングで示した部分）の平面視における形状（領域）がパターン４１となる。 The permeable base material 23 is formed with a pattern 41 for causing the light emitting layer 22 to emit light. The permeable base material 23 is disposed between the light emitting layer 22 and the back electrode layer 24. The permeable base material 23 has liquid permeability. Specifically, the permeable base material 23 has a structure having a void in which a liquid can permeate therein. A pattern 41 shown in FIG. 1 is formed on the permeable base material 23 by penetrating a penetrating liquid 42, which is a liquid used for forming the pattern 41, between the front and back (upper and lower) surfaces. A shape (region) in a plan view of a portion (a portion indicated by dot hatching in FIG. 2) where the penetrating liquid 42 has permeated into the permeable base material 23 is a pattern 41.
　浸透性基材２３は、絶縁体（誘電体）からなる。浸透性基材２３は、誘電率が５未満の低誘電率の物質からなることが望ましい。浸透性基材２３には、浸透性基材２３を構成する絶縁体（誘電体）よりも誘電率が大きい誘電体、または導体からなる浸透液４２が浸透することによりパターン４１が形成される。 The permeable base material 23 is made of an insulator (dielectric material). The permeable base material 23 is preferably made of a low dielectric constant material having a dielectric constant of less than 5. A pattern 41 is formed in the permeable base material 23 by the penetration of a dielectric material having a dielectric constant higher than that of the insulator (dielectric material) constituting the permeable base material 23 or a penetrating liquid 42 made of a conductor.
　例えば、浸透性基材２３は、普通紙、再生紙、和紙等の紙からなる。紙の誘電率は３程度である。紙では、繊維の隙間に浸透液４２が浸透する。また、誘電率が紙などと同程度であれば、樹脂繊維製織り布、樹脂繊維製不織布、樹脂メッシュを浸透性基材２３として用いることもできる。また、浸透性基材２３として、低誘電率の絶縁体（誘電体）で、浸透液が浸透可能な多数の孔を有する多孔質材料を用いてもよい。例えば、多孔質の樹脂フィルムを浸透性基材２３として用いてもよい。多孔質材料における孔の形状、大きさ、配置等は特に限定されないが、浸透液４２を保持する孔部分が発光するため、所望の発光パターンの解像度を損ねない程度の孔の大きさ、開孔率、ピッチ、配列を有することが望ましい。浸透性基材２３の厚さは、特に限定されず、使用される浸透液が一方の面から他方の面まで到達（裏抜け）し、表裏両面間にわたって浸透可能であることが望ましい。 For example, the permeable substrate 23 is made of paper such as plain paper, recycled paper, and Japanese paper. The dielectric constant of paper is about 3. In the paper, the penetrating liquid 42 penetrates into the gaps between the fibers. In addition, a resin fiber woven fabric, a resin fiber non-woven fabric, or a resin mesh may be used as the permeable base material 23 as long as the dielectric constant is similar to that of paper or the like. Further, as the permeable base material 23, a porous material having a low dielectric constant insulator (dielectric material) and having a large number of holes through which the osmotic liquid can permeate may be used. For example, a porous resin film may be used as the permeable base material 23. The shape, size, arrangement, and the like of the holes in the porous material are not particularly limited. However, since the hole portion that holds the permeating liquid 42 emits light, the hole size and the opening that do not impair the resolution of the desired light emission pattern It is desirable to have rate, pitch, and alignment. The thickness of the permeable base material 23 is not particularly limited, and it is desirable that the used penetrating solution reaches from one side to the other side (back through) and can penetrate between the front and back surfaces.
　パターン４１の形成に用いられる浸透液４２としては、導体である液体を用いることができる。具体的には、石鹸水等の純水ではない水、石鹸水とグリセリンとの混合液、水性インク、エマルションインク、導電性インク等の導体を浸透液４２として用いることができる。また、浸透性基材２３よりも誘電率が大きい誘電体を浸透液４２として用いることもできる。具体的には、浸透液４２として用いられる誘電体は、誘電率が１０以上の高誘電率の物質であることが望ましい。例えば、炭酸プロピレン等の高誘電率溶剤や、これを含むインクを用いることができる。ここで言うインクは、顔料や染料といった色材を含んでいてもよい。 As the penetrating liquid 42 used for forming the pattern 41, a liquid that is a conductor can be used. Specifically, a non-pure water such as soapy water, a mixed solution of soapy water and glycerin, a water-based ink, an emulsion ink, or a conductive ink such as a conductive ink can be used as the penetrating liquid 42. Further, a dielectric having a dielectric constant larger than that of the permeable base material 23 can be used as the osmotic liquid 42. Specifically, the dielectric used as the penetrating liquid 42 is desirably a high dielectric constant material having a dielectric constant of 10 or more. For example, a high dielectric constant solvent such as propylene carbonate or an ink containing the same can be used. The ink here may contain a color material such as a pigment or a dye.
　背面電極層２４は、前面電極層２１と互いに対向する面状の一対の電極を構成する。背面電極層２４は、ＥＬ素子２の最も下側に配置される。背面電極層２４は、例えば、アルミニウム合金、ステンレス合金等の金属板または金属箔からなる。また、背面電極層２４は、樹脂板上にＡｌ、Ａｇ等の薄膜が形成されたものや、金属メッシュでもよい。また、背面電極層２４として、前面電極層２１と同様のものを用いてもよい。ここで、背面電極層２４は、発光層２２が発した光の一部を反射する。この反射光は、浸透性基材２３、前面電極層２１を通過して外部（上側）へと放射される。したがって、背面電極層２４は、光を反射しやすい金属板、金属箔等であることが好ましい。 The back electrode layer 24 constitutes a pair of planar electrodes opposed to the front electrode layer 21. The back electrode layer 24 is disposed on the lowermost side of the EL element 2. The back electrode layer 24 is made of, for example, a metal plate such as an aluminum alloy or a stainless alloy or a metal foil. The back electrode layer 24 may be a resin plate formed with a thin film such as Al or Ag, or a metal mesh. Further, as the back electrode layer 24, the same material as the front electrode layer 21 may be used. Here, the back electrode layer 24 reflects a part of the light emitted from the light emitting layer 22. This reflected light passes through the permeable base material 23 and the front electrode layer 21 and is emitted to the outside (upper side). Therefore, the back electrode layer 24 is preferably a metal plate, metal foil or the like that easily reflects light.
　一対の保護板３Ａ，３Ｂは、ＥＬ素子２を挟んで保護するとともに、ＥＬ素子２の浸透性基材２３を発光層２２および背面電極層２４と密着させるためのものである。上側の保護板３Ａは、光透過性を有する樹脂等からなる。下側の保護板３Ｂは、上側の保護板３Ａと同様のものでもよいし、光透過性を有していない樹脂板等でもよい。 The pair of protective plates 3 </ b> A and 3 </ b> B are for protecting the EL element 2 with the EL element 2 interposed therebetween, and for bringing the permeable substrate 23 of the EL element 2 into close contact with the light emitting layer 22 and the back electrode layer 24. The upper protection plate 3A is made of a light-transmitting resin or the like. The lower protective plate 3B may be the same as the upper protective plate 3A, or may be a resin plate or the like that does not have optical transparency.
　固定枠４は、一対の保護板３Ａ，３Ｂの間にＥＬ素子２を、上下方向に圧縮する力を加えた状態で固定する。これにより、ＥＬ素子２の浸透性基材２３が発光層２２および背面電極層２４と密着する。また、固定枠４は、分解可能に構成され、ＥＬ素子２の浸透性基材２３が着脱可能になっている。 The fixing frame 4 fixes the EL element 2 between the pair of protective plates 3A and 3B in a state where a force for compressing in the vertical direction is applied. Thereby, the permeable base material 23 of the EL element 2 is in close contact with the light emitting layer 22 and the back electrode layer 24. Further, the fixed frame 4 is configured to be disassembled, and the permeable base material 23 of the EL element 2 is detachable.
　接続部５Ａ，５Ｂは、ＥＬ素子２を外部の電源に接続するためのものである。接続部５Ａ，５Ｂは、固定枠４に設置されている。接続部５Ａ，５Ｂは、それぞれ前面電極層２１、背面電極層２４に電気的に接続されている。 The connecting portions 5A and 5B are for connecting the EL element 2 to an external power source. The connecting portions 5A and 5B are installed on the fixed frame 4. The connecting portions 5A and 5B are electrically connected to the front electrode layer 21 and the back electrode layer 24, respectively.
　次に、ＥＬ素子２を備える発光パネル１の作用について説明する。 Next, the operation of the light emitting panel 1 including the EL element 2 will be described.
　発光パネル１の使用時には、接続部５Ａ，５Ｂ間に交流電源が接続される。交流電源によりＥＬ素子２に印加される交流電圧に特に制約はないが、発光輝度や効率、寿命等の観点から、例えば、実効値が５０Ｖ～７００Ｖ、周波数が５０Ｈｚ～３ｋＨｚの範囲が適している。 When the light emitting panel 1 is used, an AC power source is connected between the connecting portions 5A and 5B. There is no particular limitation on the AC voltage applied to the EL element 2 by the AC power supply, but from the viewpoint of light emission luminance, efficiency, life, etc., for example, the range of effective value 50 V to 700 V and frequency 50 Hz to 3 kHz is suitable. .
　接続部５Ａ，５Ｂ間に交流電源が接続されることにより、前面電極層２１と背面電極層２４との間に交流電圧が印加される。これにより、図３に示すように、発光層２２内のドットハッチングで示したパターン対応部分４３において発光が生じ、上方向への光Ｌが前面電極層２１を透過して外部へと放射される。外部へと放射される光Ｌには、パターン対応部分４３から下方向に放射されて背面電極層２４で反射された光も含まれる。 When an AC power source is connected between the connecting portions 5A and 5B, an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24. As a result, as shown in FIG. 3, light emission occurs in the pattern corresponding portion 43 indicated by dot hatching in the light emitting layer 22, and the upward light L is transmitted through the front electrode layer 21 and emitted to the outside. . The light L emitted to the outside includes light emitted downward from the pattern corresponding portion 43 and reflected by the back electrode layer 24.
　発光層２２内のパターン対応部分４３は、浸透性基材２３内の浸透液４２上の領域である。すなわち、パターン対応部分４３は、浸透液４２により形成されるパターン４１上の領域である。パターン４１を構成する浸透液４２が、導体または高誘電率の誘電体であるため、前面電極層２１と背面電極層２４との間に交流電圧が印加されると、パターン対応部分４３内に電界が形成される。パターン対応部分４３内では、電界により内部の電子が加速されて発光中心に衝突する。このとき、発光中心が励起され、基底状態に戻る際に発光する。パターン対応部分４３以外の部分では、前面電極層２１と背面電極層２４との間に低誘電率の浸透性基材２３およびその内部の空気が介在しているため、発光層２２内において発光に十分な強さの電界が形成されず、発光は生じない。 The pattern corresponding portion 43 in the light emitting layer 22 is a region on the penetrating liquid 42 in the permeable base material 23. That is, the pattern corresponding portion 43 is a region on the pattern 41 formed by the penetrating liquid 42. Since the penetrant 42 constituting the pattern 41 is a conductor or a dielectric having a high dielectric constant, when an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, an electric field is generated in the pattern corresponding portion 43. Is formed. In the pattern corresponding portion 43, the internal electrons are accelerated by the electric field and collide with the emission center. At this time, the emission center is excited and emits light when returning to the ground state. In portions other than the pattern corresponding portion 43, the low-permittivity permeable base material 23 and the air inside thereof are interposed between the front electrode layer 21 and the back electrode layer 24. A sufficiently strong electric field is not formed, and no light emission occurs.
　発光層２２のパターン対応部分４３の発光により、パターン４１内の領域が発光しているように視認される。 The region within the pattern 41 is visually recognized by the light emission of the pattern corresponding portion 43 of the light emitting layer 22.
　パターン４１の内容を変更したい場合、ユーザは、固定枠４を分解し、ＥＬ素子２から浸透性基材２３を取り外し、異なるパターン４１が形成された新たな浸透性基材２３に交換することができる。浸透性基材２３は使い捨てにできる。 When it is desired to change the contents of the pattern 41, the user can disassemble the fixed frame 4, remove the permeable base material 23 from the EL element 2, and replace it with a new permeable base material 23 in which a different pattern 41 is formed. it can. The permeable substrate 23 can be disposable.
　パターン４１の形成は、例えば、浸透性基材２３としての紙に、浸透液４２としての水性インクを用いて印刷装置で印刷することにより行うことができる。印刷装置としては、インクジェット方式、孔版印刷方式、スクリーン印刷方式等の印刷装置を用いることができる。中でも、インクジェット方式の印刷装置は、水性インクを吐出する手段としては、安価で数多く普及しているので好適である。また、例えば、浸透性基材２３としての紙に、浸透液４２としての水（純水ではない水）を含ませた筆でユーザが模様を描くことによりパターン４１を形成することもできる。パターン４１を形成する方法としては、浸透性基材２３および浸透液４２の組み合わせに応じて、さまざまな方法を採用することができる。 The formation of the pattern 41 can be performed, for example, by printing on paper as the permeable substrate 23 with a printing apparatus using water-based ink as the osmotic liquid 42. As the printing device, an ink jet method, a stencil printing method, a screen printing method, or the like can be used. Among them, an ink jet printing apparatus is preferable because it is inexpensive and widely used as a means for discharging water-based ink. In addition, for example, the pattern 41 can be formed by a user drawing a pattern with a brush in which water (not pure water) as the penetrating liquid 42 is contained in paper as the permeable base material 23. As a method for forming the pattern 41, various methods can be adopted depending on the combination of the permeable base material 23 and the penetrating liquid 42.
　以上説明したように、ＥＬ素子２では、浸透性基材２３に浸透液４２でパターン４１が形成される。浸透性基材２３へのパターン４１の形成は、ユーザが印刷装置を用いて浸透性基材２３としての紙に水性インクで印刷すること等により簡単に行える。そして、ユーザが、パターン４１が形成された浸透性基材２３を、発光層２２が形成された前面電極層２１と背面電極層２４との間に挿入するだけで、ＥＬ素子２の発光のパターンを形成できる。したがって、ＥＬ素子２によれば、発光のパターンの形成が容易である。 As described above, in the EL element 2, the pattern 41 is formed on the permeable substrate 23 with the penetrating liquid 42. Formation of the pattern 41 on the permeable base material 23 can be easily performed by a user printing the paper as the permeable base material 23 with water-based ink using a printing apparatus. Then, the user simply inserts the permeable substrate 23 on which the pattern 41 is formed between the front electrode layer 21 and the back electrode layer 24 on which the light emitting layer 22 is formed, so that the light emission pattern of the EL element 2 is obtained. Can be formed. Therefore, according to the EL element 2, it is easy to form a light emission pattern.
　また、ＥＬ素子２では、浸透性基材２３のみの交換でパターン４１を変更できる。このため、ＥＬ素子２によれば、発光のパターンの変更を低コストで容易に行うことができる。 In the EL element 2, the pattern 41 can be changed by replacing only the permeable base material 23. For this reason, according to the EL element 2, the light emission pattern can be easily changed at low cost.
　なお、前面電極層２１と発光層２２との間に、チタン酸バリウム粉末を含む誘電体層を設けてもよい。これにより耐絶縁破壊性が向上することがある。 A dielectric layer containing barium titanate powder may be provided between the front electrode layer 21 and the light emitting layer 22. Thereby, the dielectric breakdown resistance may be improved.
（第１の実施の形態の変形例）
　図４は、第１の実施の形態の変形例に係るＥＬ素子の部分断面図である。図４に示すように、本変形例に係るＥＬ素子２Ａは、図２に示した第１の実施の形態のＥＬ素子２に対し、発光層２２の配置を変更し、背面電極層２４の浸透性基材２３側の面（上面）上に発光層２２を形成したものである。 (Modification of the first embodiment)
FIG. 4 is a partial cross-sectional view of an EL element according to a modification of the first embodiment. As shown in FIG. 4, the EL element 2A according to this modification is different from the EL element 2 of the first embodiment shown in FIG. 2 in that the arrangement of the light emitting layer 22 is changed and the back electrode layer 24 penetrates. The light emitting layer 22 is formed on the surface (upper surface) on the conductive substrate 23 side.
　ＥＬ素子２Ａでは、図４に示すように、発光層２２内のパターン対応部分４３は、浸透性基材２３内の浸透液４２の直下の領域である。すなわち、パターン対応部分４３は、浸透液４２により形成されるパターン４１の直下の領域である。 In the EL element 2 </ b> A, as shown in FIG. 4, the pattern corresponding portion 43 in the light emitting layer 22 is a region immediately below the penetrating liquid 42 in the permeable base material 23. That is, the pattern corresponding portion 43 is a region immediately below the pattern 41 formed by the penetrating liquid 42.
　ＥＬ素子２Ａにおいて、前面電極層２１と背面電極層２４との間に交流電圧が印加されると、図２に示したＥＬ素子２と同様に、発光層２２内のパターン対応部分４３において発光が生じる。そして、パターン対応部分４３で発生した光のうち上方向への光Ｌが、浸透性基材２３内の浸透液４２が浸透した部分（パターン４１）、前面電極層２１を通過して外部へと放射される。外部へと放射される光Ｌには、パターン対応部分４３から下方向に放射されて背面電極層２４で反射された光も含まれる。これにより、パターン４１内の領域が発光しているように視認される。 In the EL element 2A, when an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, light is emitted from the pattern corresponding portion 43 in the light emitting layer 22 as in the EL element 2 shown in FIG. Arise. The upward light L of the light generated in the pattern corresponding portion 43 passes through the front electrode layer 21 through the portion (pattern 41) into which the penetrating liquid 42 in the permeable base material 23 has permeated. Radiated. The light L emitted to the outside includes light emitted downward from the pattern corresponding portion 43 and reflected by the back electrode layer 24. Thereby, it visually recognizes as the area | region in the pattern 41 is light-emitting.
　このような本変形例のＥＬ素子２Ａによっても、上述した第１の実施の形態のＥＬ素子２と同様の効果が得られる。 The same effect as that of the EL element 2 of the first embodiment described above can be obtained by the EL element 2A of this modification.
　なお、本変形例では、パターン対応部分４３が、浸透性基材２３内の浸透液４２が浸透した部分（パターン４１）の下に位置するため、光Ｌが透過しやすい浸透液４２を用いることが望ましい。例えば、浸透液４２として色材を含むインクを用いる場合であれば、インクの色材が発光スペクトルの一部を吸収するため、インクの色は、発光層２２の発光色を透過しやすいものを選択することが望ましい。 In this modification, since the pattern corresponding portion 43 is located under the portion (pattern 41) in which the penetrating liquid 42 penetrates in the permeable base material 23, the penetrating liquid 42 that easily transmits the light L is used. Is desirable. For example, if ink containing a coloring material is used as the penetrating liquid 42, the ink coloring material absorbs a part of the emission spectrum, so that the ink color easily transmits the emission color of the light emitting layer 22. It is desirable to choose.
　また、発光層２２と背面電極層２４との間に、チタン酸バリウム粉末を含む誘電体層を設けてもよい。これにより耐絶縁破壊性が向上することがある。 Further, a dielectric layer containing barium titanate powder may be provided between the light emitting layer 22 and the back electrode layer 24. Thereby, the dielectric breakdown resistance may be improved.
［第２の実施の形態］
　図５は、第２の実施の形態に係るＥＬ素子の部分断面図である。図５に示すように、第２の実施の形態に係るＥＬ素子２Ｂは、図２に示した第１の実施の形態のＥＬ素子２に対し、コンタクト層５１を追加した構成である。 [Second Embodiment]
FIG. 5 is a partial cross-sectional view of an EL element according to the second embodiment. As shown in FIG. 5, the EL element 2B according to the second embodiment has a configuration in which a contact layer 51 is added to the EL element 2 of the first embodiment shown in FIG.
　コンタクト層５１は、浸透性基材２３と背面電極層２４との間に配置され、浸透性基材２３および背面電極層２４と密着（粘着）する。すなわち、コンタクト層５１は、浸透性基材２３と背面電極層２４とを接着している。コンタクト層５１は、浸透性基材２３および背面電極層２４と密着（粘着）する誘電体または導体からなる。コンタクト層５１は、例えば、１０μｍ程度の厚さに形成される。 The contact layer 51 is disposed between the permeable base material 23 and the back electrode layer 24 and adheres (adheres) to the permeable base material 23 and the back electrode layer 24. That is, the contact layer 51 bonds the permeable base material 23 and the back electrode layer 24 together. The contact layer 51 is made of a dielectric or conductor that adheres (adheres) to the permeable substrate 23 and the back electrode layer 24. The contact layer 51 is formed with a thickness of about 10 μm, for example.
　誘電体によりコンタクト層５１を構成する場合、誘電率が５以上、より望ましくは１０以上の高誘電率の誘電体が用いられる。これにより、コンタクト層５１への印加電圧の分割分を少なくすることができ、消費電力を抑えるとともに、発光層２２の発光輝度の低下を抑えることができる。 When the contact layer 51 is made of a dielectric material, a dielectric material having a dielectric constant of 5 or higher, more preferably 10 or higher is used. Thereby, the division | segmentation part of the applied voltage to the contact layer 51 can be decreased, and while suppressing power consumption, the fall of the light emission luminance of the light emitting layer 22 can be suppressed.
　コンタクト層５１は、接着剤（粘着剤）である材料が、浸透性基材２３または背面電極層２４に塗布され、塗布された材料を介して浸透性基材２３と背面電極層２４とが貼り合わされることにより形成される。 In the contact layer 51, a material that is an adhesive (adhesive) is applied to the permeable base material 23 or the back electrode layer 24, and the permeable base material 23 and the back electrode layer 24 are pasted through the applied material. It is formed by being put together.
　コンタクト層５１の材料としては、例えば、シアノエチルプルラン、シアノエチルＰＶＡ、シアノエチルサッカロース、シアノエチルセルロース、フッ化ビニリデン、フロロシリコーン、ニトリルゴム、クロロプレンゴム、ポリウレタン、導電接着剤、導電グリース、導電ペースト、導電ゲル等を用いることができる。これらは、単独あるいは２種以上の混合物として使用できる。また、コンタクト層５１の材料に粘着付与剤を添加して粘着性を向上させるとより望ましい。コンタクト層５１の材料は、溶剤に溶解されているか、分散されていると、浸透性基材２３または背面電極層２４への塗布が容易である。この材料は、液状、ジェル状、ゲル状、固体状のいずれでもよいが、流動性が高すぎて浸透性基材２３に浸透してしまうと、意図する発光パターン以外の部分も発光してしまうため、浸透性基材２３に浸透しないことが重要である。 Examples of the material of the contact layer 51 include cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane, conductive adhesive, conductive grease, conductive paste, conductive gel, and the like. Can be used. These can be used alone or as a mixture of two or more. Further, it is more desirable to improve the tackiness by adding a tackifier to the material of the contact layer 51. When the material of the contact layer 51 is dissolved or dispersed in a solvent, it can be easily applied to the permeable substrate 23 or the back electrode layer 24. This material may be liquid, gel, gel, or solid, but if the fluidity is too high to penetrate into the permeable substrate 23, the part other than the intended light emission pattern will also emit light. Therefore, it is important not to penetrate the permeable base material 23.
　ＥＬ素子２Ｂは、浸透性基材２３および背面電極層２４と密着するコンタクト層５１を有するので、背面電極層２４と浸透性基材２３との間に空気が入ることを防止できる。背面電極層２４と浸透性基材２３内の浸透液４２との間に空気が入ると、パターン対応部分４３内において電界が弱い領域が生じ、発光輝度が低下することがある。このため、背面電極層２４と浸透性基材２３との間に空気が入ることは、発光層２２の発光ムラの要因となる。ＥＬ素子２Ｂによれば、このような発光ムラを軽減できる。 Since the EL element 2B has the contact layer 51 in close contact with the permeable base material 23 and the back electrode layer 24, air can be prevented from entering between the back electrode layer 24 and the permeable base material 23. When air enters between the back electrode layer 24 and the penetrating liquid 42 in the permeable base material 23, a region where the electric field is weak is generated in the pattern corresponding portion 43, and the emission luminance may be lowered. For this reason, the entry of air between the back electrode layer 24 and the permeable base material 23 causes a light emission unevenness of the light emitting layer 22. According to the EL element 2B, such light emission unevenness can be reduced.
　なお、電気抵抗が十分に小さい導体によりコンタクト層５１を構成する場合、背面電極層２４を省略可能である。この場合、コンタクト層５１が、前面電極層２１と一対の電極を構成する。コンタクト層５１の電気抵抗が大きい場合は、コンタクト層５１の面内方向（面積方向）に電気が流れにくくなり、消費電力が増したり、接続部５Ａ，５Ｂから離間した場所での発光層２２の発光輝度が低下したりするおそれがあるため、背面電極層２４が必要である。 In addition, when the contact layer 51 is configured by a conductor having a sufficiently small electric resistance, the back electrode layer 24 can be omitted. In this case, the contact layer 51 constitutes a pair of electrodes with the front electrode layer 21. When the electrical resistance of the contact layer 51 is large, it becomes difficult for electricity to flow in the in-plane direction (area direction) of the contact layer 51, power consumption is increased, or the light emitting layer 22 is separated from the connection portions 5A and 5B. The back electrode layer 24 is necessary because the light emission luminance may decrease.
　また、浸透液４２として水性インク等の水分を含む液体を用いる場合において、導体によりコンタクト層５１を構成する場合、水分を含有し、水分によって電気を通す導電性材料によりコンタクト層５１を構成することもできる。例えば、導電性アクリルゲルを用いることができる。 Further, in the case of using a liquid containing water such as water-based ink as the penetrating liquid 42, when the contact layer 51 is formed of a conductor, the contact layer 51 is formed of a conductive material that contains water and conducts electricity through the water. You can also. For example, a conductive acrylic gel can be used.
（第２の実施の形態の変形例）
　図６は、第２の実施の形態の変形例に係るＥＬ素子の部分断面図である。図６に示すように、本変形例に係るＥＬ素子２Ｃは、図４に示した第１の実施の形態の変形例のＥＬ素子２Ａに対し、コンタクト層５１を追加した構成である。 (Modification of the second embodiment)
FIG. 6 is a partial cross-sectional view of an EL element according to a modification of the second embodiment. As shown in FIG. 6, the EL element 2C according to this modification has a configuration in which a contact layer 51 is added to the EL element 2A according to the modification of the first embodiment shown in FIG.
　コンタクト層５１は、前面電極層２１と浸透性基材２３との間に配置され、前面電極層２１および浸透性基材２３と密着（粘着）する。ＥＬ素子２Ｃでは、コンタクト層５１は、光透過性を有する誘電体または導体からなる。例えば、コンタクト層５１として、導電性アクリルゲルを用いることができる。 The contact layer 51 is disposed between the front electrode layer 21 and the permeable base material 23 and adheres (adheres) to the front electrode layer 21 and the permeable base material 23. In the EL element 2 </ b> C, the contact layer 51 is made of a dielectric or conductor having optical transparency. For example, a conductive acrylic gel can be used as the contact layer 51.
　このような本変形例のＥＬ素子２Ｃによれば、前面電極層２１および浸透性基材２３と密着するコンタクト層５１を有するので、前面電極層２１と浸透性基材２３との間に空気が入ることを防止できる。これにより、上述した第２の実施の形態のＥＬ素子２Ｂと同様の作用効果が得られる。 According to the EL element 2 </ b> C of this modification example, since the contact layer 51 is in close contact with the front electrode layer 21 and the permeable base material 23, air is interposed between the front electrode layer 21 and the permeable base material 23. Can be prevented from entering. Thereby, the same effect as the EL element 2B of the second embodiment described above can be obtained.
［第３の実施の形態］
　図７は、第３の実施の形態に係るＥＬ素子の部分断面図である。図７に示すように、第３の実施の形態に係るＥＬ素子２Ｄは、図２に示した第１の実施の形態のＥＬ素子２の背面電極層２４を導電層５２に置き換えるとともに、コンタクト層５３を追加した構成である。 [Third Embodiment]
FIG. 7 is a partial cross-sectional view of an EL element according to the third embodiment. As shown in FIG. 7, the EL element 2D according to the third embodiment replaces the back electrode layer 24 of the EL element 2 of the first embodiment shown in FIG. 53 is added.
　導電層５２は、浸透性基材２３の下面の略全面に密着して固着され、前面電極層２１と互いに対向する一対の電極を構成するものである。導電層５２は、導電性インクが浸透性基材２３の一方の面に塗布され乾燥することにより面状に形成される。導電性インクとしては、例えば、金属またはカーボンの粒子を分散させたインク、導電性ポリマーを分散または溶解させたインクを用いることができる。導電性インクの浸透性基材２３への塗布は、例えば、スクリーン印刷法により行われる。導電層５２は、１０μｍ程度の厚さに形成される。 The conductive layer 52 is adhered and fixed to substantially the entire lower surface of the permeable base material 23 and constitutes a pair of electrodes facing the front electrode layer 21. The conductive layer 52 is formed in a planar shape by applying conductive ink to one surface of the permeable substrate 23 and drying. As the conductive ink, for example, an ink in which metal or carbon particles are dispersed, or an ink in which a conductive polymer is dispersed or dissolved can be used. Application of the conductive ink to the permeable base material 23 is performed by, for example, a screen printing method. The conductive layer 52 is formed to a thickness of about 10 μm.
　浸透性基材２３には、導電層５２が形成された状態で、浸透液４２によるパターン４１の形成が可能である。 It is possible to form the pattern 41 with the penetrating liquid 42 in the state where the conductive layer 52 is formed on the permeable base material 23.
　コンタクト層５３は、発光層２２と浸透性基材２３との間に配置され、発光層２２および浸透性基材２３と密着（粘着）するものである。すなわち、コンタクト層５３は、発光層２２と浸透性基材２３とを接着している。コンタクト層５３は、光透過性を有する。コンタクト層５３は、誘電率が５以上、より望ましくは１０以上の高誘電率の誘電体からなる。これにより、コンタクト層５３への印加電圧の分割分を少なくすることができ、消費電力を抑えるとともに、発光層２２の発光輝度の低下を抑えることができる。コンタクト層５３は、例えば、１０μｍ程度の厚さに形成される。 The contact layer 53 is disposed between the light emitting layer 22 and the permeable base material 23 and is in close contact (adhesion) with the light emitting layer 22 and the permeable base material 23. That is, the contact layer 53 bonds the light emitting layer 22 and the permeable base material 23 together. The contact layer 53 is light transmissive. The contact layer 53 is made of a dielectric material having a dielectric constant of 5 or more, more preferably 10 or more. Thereby, the division | segmentation part of the voltage applied to the contact layer 53 can be decreased, and while suppressing power consumption, the fall of the light emission luminance of the light emitting layer 22 can be suppressed. The contact layer 53 is formed with a thickness of about 10 μm, for example.
　コンタクト層５３は、接着剤（粘着剤）である材料が、発光層２２または浸透性基材２３に塗布され、塗布された材料を介して発光層２２と浸透性基材２３とが貼り合わされることにより形成される。コンタクト層５３の材料としては、シアノエチルプルラン、シアノエチルＰＶＡ、シアノエチルサッカロース、シアノエチルセルロース、フッ化ビニリデン、フロロシリコーン、ニトリルゴム、クロロプレンゴム、ポリウレタン等を用いることができる。コンタクト層５３の材料は、溶剤に溶解されているか、分散されていると、発光層２２または浸透性基材２３への塗布が容易である。この材料は、液状、ジェル状、ゲル状、固体状のいずれでもよいが、流動性が高すぎて浸透性基材２３の内部深くまで浸透してしまうと、意図する発光パターン以外の部分も発光してしまうため、浸透性基材２３の内部深くまで浸透しないことが重要である。 In the contact layer 53, a material that is an adhesive (adhesive) is applied to the light-emitting layer 22 or the permeable base material 23, and the light-emitting layer 22 and the permeable base material 23 are bonded to each other through the applied material. Is formed. As a material for the contact layer 53, cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane and the like can be used. When the material of the contact layer 53 is dissolved or dispersed in a solvent, it can be easily applied to the light emitting layer 22 or the permeable substrate 23. This material may be liquid, gel, gel, or solid, but if the fluidity is too high and it penetrates deep inside the permeable substrate 23, the part other than the intended light emission pattern also emits light. Therefore, it is important not to penetrate deep inside the permeable base material 23.
　上記のようなＥＬ素子２Ｄでは、ユーザが、コンタクト層５３の材料を、パターン４１が形成された導電層５２付きの浸透性基材２３または発光層２２に塗布し、塗布された材料を介して発光層２２と浸透性基材２３とを貼り合わせる。これにより、容易に発光のパターンが形成される。 In the EL element 2D as described above, the user applies the material of the contact layer 53 to the permeable base material 23 or the light emitting layer 22 with the conductive layer 52 on which the pattern 41 is formed, and through the applied material. The light emitting layer 22 and the permeable base material 23 are bonded together. Thereby, a light emission pattern is easily formed.
　ＥＬ素子２Ｄでは、導電層５２が浸透性基材２３に固着され、前面電極層２１上に形成された発光層２２と浸透性基材２３とがコンタクト層５３を介して接着されている。これにより、浸透性基材２３と導電層５２との間および浸透性基材２３と発光層２２との間に空気が入ることが回避される。この結果、ＥＬ素子２Ｄによれば、発光層２２の発光ムラを軽減できる。 In the EL element 2D, the conductive layer 52 is fixed to the permeable base material 23, and the light emitting layer 22 formed on the front electrode layer 21 and the permeable base material 23 are bonded via the contact layer 53. This prevents air from entering between the permeable substrate 23 and the conductive layer 52 and between the permeable substrate 23 and the light emitting layer 22. As a result, according to the EL element 2D, the light emission unevenness of the light emitting layer 22 can be reduced.
　また、各部が貼り合わされているため、ＥＬ素子２Ｄでは、図１に示した保護板３Ａ，３Ｂおよび固定枠４を用いて圧縮力を加えて固定する必要はない。例えば、ＥＬ素子２Ｄをラミネートフィルムによりラミネート処理し、ラミネートフィルム外に露出した電源接続部を設けた発光パネルを構成できる。このように、ＥＬ素子２Ｄによれば、発光パネルの構成を簡略化できる。 Further, since the respective parts are bonded together, it is not necessary to fix the EL element 2D by applying a compressive force using the protective plates 3A and 3B and the fixed frame 4 shown in FIG. For example, the EL element 2D can be laminated with a laminate film, and a light-emitting panel provided with a power connection portion exposed outside the laminate film can be configured. Thus, according to EL element 2D, the structure of the light emission panel can be simplified.
　なお、ＥＬ素子２Ｄにおいて、発光層２２とコンタクト層５３とが剥離可能であることが望ましい。蛍光体ペーストの組成により、コンタクト層５３と剥離しやすい発光層２２を形成することが可能となる。例えば、バインダーにフッ化ビニリデン等のフッ素系樹脂を含む蛍光体ペーストを用いて発光層２２を形成することで、発光層２２とコンタクト層５３とを剥離しやすくすることができる。フッ素系樹脂を含むバインダーとして、具体的には、例えば、有限会社ユナイテック製ＦＬＵＯＲＯＰＯＬＹＭＥＲＥＬ－バインダーを用いることができる。 In the EL element 2D, it is desirable that the light emitting layer 22 and the contact layer 53 can be peeled off. By the composition of the phosphor paste, it is possible to form the light emitting layer 22 that is easily peeled off from the contact layer 53. For example, the light emitting layer 22 and the contact layer 53 can be easily separated by forming the light emitting layer 22 using a phosphor paste containing a fluorine-based resin such as vinylidene fluoride as a binder. Specifically, for example, a FLUOROPOLYMER- binder manufactured by UNITEC can be used as the binder containing the fluororesin.
　浸透性基材２３がパルプなどの天然繊維を主原料とする紙からなる場合には、この紙のコンタクト層５３に接着させる面に、事前に、紙力増強剤を塗布しておくことが好ましい。これにより、紙が破れにくくなり、きれいに剥離することができる。紙力増強剤としては、ゴムや樹脂の分散液や溶剤に溶かした液を塗布する方法が適している。 When the permeable base material 23 is made of a paper whose main raw material is natural fiber such as pulp, it is preferable to apply a paper strength enhancer to the surface of the paper to be bonded to the contact layer 53 in advance. . Thereby, it becomes difficult to tear paper, and it can peel cleanly. As the paper strength enhancer, a method of applying a liquid dissolved in a rubber or resin dispersion or a solvent is suitable.
　発光層２２とコンタクト層５３とが剥離可能であることにより、浸透性基材２３が交換可能である。これにより、ＥＬ素子２Ｄのパターン４１の変更が容易である。また、前面電極層２１および発光層２２を繰り返し使用できる。導電層５２が形成された浸透性基材２３は消耗品とする。このような浸透性基材２３と導電層５２とを備えるシートにより、ＥＬ素子における発光のパターンの形成および変更を容易にできる。 Since the light emitting layer 22 and the contact layer 53 can be peeled, the permeable base material 23 can be replaced. Thereby, it is easy to change the pattern 41 of the EL element 2D. Further, the front electrode layer 21 and the light emitting layer 22 can be used repeatedly. The permeable base material 23 on which the conductive layer 52 is formed is a consumable item. With such a sheet including the permeable base material 23 and the conductive layer 52, it is possible to easily form and change a light emission pattern in the EL element.
（第３の実施の形態の変形例１）
　図８は、第３の実施の形態の変形例１に係るＥＬ素子の部分断面図である。図８に示すように、本変形例１に係るＥＬ素子２Ｅは、図７に示した第３の実施の形態のＥＬ素子２Ｄに対し、コンタクト層５１を追加した構成である。 (Modification 1 of 3rd Embodiment)
FIG. 8 is a partial cross-sectional view of an EL element according to Modification 1 of the third embodiment. As shown in FIG. 8, the EL element 2E according to the first modification has a configuration in which a contact layer 51 is added to the EL element 2D of the third embodiment shown in FIG.
　コンタクト層５１は、浸透性基材２３と導電層５２との間に配置され、浸透性基材２３および導電層５２と密着（粘着）する。ＥＬ素子２Ｅでは、コンタクト層５１は、コンタクト層５３と同様の高誘電率の誘電体からなる。 The contact layer 51 is disposed between the permeable base material 23 and the conductive layer 52 and adheres (adheres) to the permeable base material 23 and the conductive layer 52. In the EL element 2E, the contact layer 51 is made of a dielectric having a high dielectric constant similar to the contact layer 53.
　ＥＬ素子２Ｅにおいて、コンタクト層５１は、接着剤（粘着剤）である材料が、浸透性基材２３の一方の面に塗布されることにより形成される。その後、導電性インクがコンタクト層５１上に塗布され乾燥することにより導電層５２が形成される。浸透性基材２３には、コンタクト層５１および導電層５２が形成された状態で、浸透液４２によるパターン４１の形成が可能である。そして、パターン４１が形成された浸透性基材２３、コンタクト層５１、導電層５２の積層物がコンタクト層５３を介して発光層２２に貼り合わされることにより、ＥＬ素子２Ｅが完成する。 In the EL element 2E, the contact layer 51 is formed by applying a material that is an adhesive (adhesive) to one surface of the permeable substrate 23. Thereafter, conductive ink is applied on the contact layer 51 and dried to form the conductive layer 52. On the permeable base material 23, the pattern 41 can be formed by the osmotic liquid 42 in a state where the contact layer 51 and the conductive layer 52 are formed. Then, the laminate of the permeable base material 23, the contact layer 51, and the conductive layer 52 on which the pattern 41 is formed is bonded to the light emitting layer 22 through the contact layer 53, whereby the EL element 2E is completed.
　図７に示したＥＬ素子２Ｄのように、浸透性基材２３に直接、導電層５２を形成すると、浸透性基材２３の表面の細かな凹凸に対応して、導電層５２の前面電極層２１に対向する面（上面）に凹凸ができる。浸透液４２として、導電層５２より電気抵抗が大きい水性インク等の水分を含む液体を用いた場合、浸透性基材２３の表面の凹凸に対応して導電層５２に凹凸があると、凹の部分（前面電極層２１から遠い部分）では、凸の部分（前面電極層２１に近い部分）よりも、発光層２２のパターン対応部分４３内において電界が弱くなる。このようなことから、浸透液４２と電極である導電層５２とで抵抗に差がある場合、導電層５２の前面電極層２１に対向する面の凹凸により、発光層２２の発光ムラが生じる。 When the conductive layer 52 is formed directly on the permeable substrate 23 as in the EL element 2D shown in FIG. 7, the front electrode layer of the conductive layer 52 corresponds to the fine irregularities on the surface of the permeable substrate 23. The surface (upper surface) facing 21 is uneven. When a liquid containing water such as a water-based ink having a higher electrical resistance than the conductive layer 52 is used as the penetrating liquid 42, if the conductive layer 52 has irregularities corresponding to the irregularities on the surface of the permeable substrate 23, a concave shape is formed. In the portion (the portion far from the front electrode layer 21), the electric field is weaker in the pattern corresponding portion 43 of the light emitting layer 22 than in the convex portion (the portion close to the front electrode layer 21). For this reason, when there is a difference in resistance between the penetrating liquid 42 and the conductive layer 52 that is an electrode, light emission unevenness of the light emitting layer 22 occurs due to the unevenness of the surface of the conductive layer 52 facing the front electrode layer 21.
　これに対し、ＥＬ素子２Ｅでは、コンタクト層５１を介在させて浸透性基材２３に導電層５２を形成している。これにより、導電層５２の前面電極層２１に対向する面（浸透性基材２３側の面）を、浸透性基材２３の影響を受けない凹凸の少ない面とすることができる。この結果、ＥＬ素子２Ｅは、浸透液４２と導電層５２とで電気抵抗に差がある場合でも、発光層２２における電界の強さにムラが生じることを抑え、発光のムラを軽減できる。 In contrast, in the EL element 2E, the conductive layer 52 is formed on the permeable base material 23 with the contact layer 51 interposed. Thereby, the surface (surface on the side of the permeable base material 23) facing the front electrode layer 21 of the conductive layer 52 can be a surface with less unevenness that is not affected by the permeable base material 23. As a result, even if there is a difference in electrical resistance between the penetrant 42 and the conductive layer 52, the EL element 2E can suppress unevenness in the strength of the electric field in the light emitting layer 22 and reduce unevenness in light emission.
（第３の実施の形態の変形例２）
　図９は、第３の実施の形態の変形例２に係るＥＬ素子の部分断面図である。図９に示すように、本変形例２に係るＥＬ素子２Ｆは、図６に示した第２の実施の形態の変形例のＥＬ素子２Ｃに対し、コンタクト層５３を追加した構成である。 (Modification 2 of the third embodiment)
FIG. 9 is a partial cross-sectional view of an EL element according to Modification 2 of the third embodiment. As shown in FIG. 9, the EL element 2F according to the second modification has a configuration in which a contact layer 53 is added to the EL element 2C according to the modification of the second embodiment shown in FIG.
　ＥＬ素子２Ｆでは、前面電極層２１と浸透性基材２３とがコンタクト層５１を介して接着され、浸透性基材２３と発光層２２とがコンタクト層５３を介して接着されている。これにより、前面電極層２１と浸透性基材２３との間および浸透性基材２３と発光層２２との間に空気が入ることが回避される。この結果、ＥＬ素子２Ｆによれば、発光層２２の発光ムラを軽減できる。 In the EL element 2F, the front electrode layer 21 and the permeable base material 23 are bonded via the contact layer 51, and the permeable base material 23 and the light emitting layer 22 are bonded via the contact layer 53. This prevents air from entering between the front electrode layer 21 and the permeable substrate 23 and between the permeable substrate 23 and the light emitting layer 22. As a result, according to the EL element 2F, the light emission unevenness of the light emitting layer 22 can be reduced.
　また、発光層２２とコンタクト層５３とが剥離可能となるように、フッ化ビニリデン等のフッ素系樹脂を含む蛍光体ペーストを用いて発光層２２を形成すれば、発光層２２および背面電極層２４を繰り返し使用できる。また、浸透性基材２３がパルプなどの天然繊維を主原料とする紙からなる場合には、この紙のコンタクト層５３に接着させる面に、事前に、紙力増強剤を塗布しておくことが好ましい。 Further, if the light emitting layer 22 is formed using a phosphor paste containing a fluorine-based resin such as vinylidene fluoride so that the light emitting layer 22 and the contact layer 53 can be peeled, the light emitting layer 22 and the back electrode layer 24 are formed. Can be used repeatedly. In addition, when the permeable base material 23 is made of paper made mainly of natural fibers such as pulp, a paper strength enhancer is applied in advance to the surface to be bonded to the contact layer 53 of the paper. Is preferred.
［第４の実施の形態］
　図１０は、第４の実施の形態に係るＥＬ素子の部分断面図である。図１０に示すように、第４の実施の形態に係るＥＬ素子２Ｇは、図２に示した第１の実施の形態のＥＬ素子２に対し、浸透性基材２３を浸透層６１に置き換え、コンタクト層５１を追加した構成である。 [Fourth Embodiment]
FIG. 10 is a partial cross-sectional view of an EL element according to the fourth embodiment. As shown in FIG. 10, the EL element 2G according to the fourth embodiment replaces the permeable base material 23 with a permeation layer 61 with respect to the EL element 2 of the first embodiment shown in FIG. In this configuration, a contact layer 51 is added.
　浸透層６１は、発光層２２を発光させるパターン４１が形成されるものである。浸透層６１は、液体の浸透性を有する。また、浸透層６１は、絶縁体（誘電体）からなる。具体的には、浸透層６１は、シリカ等の粒子状物質およびこの粒子状物質を保持するバインダー成分を含む膜状物質からなり、液体が浸透可能な空隙を有する構造になっている。浸透層６１は、発光層２２の下側の面上に密着して形成されている。浸透液４２が浸透層６１の上下両面間に浸透することにより、パターン４１が形成される。浸透層６１に浸透液４２が浸透した部分の平面視における形状（領域）が、パターン４１となる。 The permeation layer 61 is formed with a pattern 41 for causing the light emitting layer 22 to emit light. The osmotic layer 61 has liquid permeability. The permeation layer 61 is made of an insulator (dielectric). Specifically, the osmotic layer 61 is made of a particulate material such as silica and a film-like material containing a binder component that holds the particulate material, and has a structure having a void that allows liquid to penetrate. The permeation layer 61 is formed in close contact with the lower surface of the light emitting layer 22. The penetration of the penetrating liquid 42 between the upper and lower surfaces of the penetrating layer 61 forms the pattern 41. A shape (region) in a plan view of a portion where the penetrating liquid 42 has permeated the penetrating layer 61 is a pattern 41.
　コンタクト層５１は、浸透層６１と背面電極層２４とを接着している。ＥＬ素子２Ｇにおいて、コンタクト層５１は、浸透層６１および背面電極層２４と密着（粘着）する誘電体または導体からなる。誘電体によりコンタクト層５１を構成する場合、誘電率が５以上、より望ましくは１０以上の高誘電率の誘電体が用いられる。 The contact layer 51 adheres the permeation layer 61 and the back electrode layer 24. In the EL element 2 </ b> G, the contact layer 51 is made of a dielectric or conductor that adheres (adheres) to the permeation layer 61 and the back electrode layer 24. When the contact layer 51 is formed of a dielectric, a dielectric having a high dielectric constant of 5 or more, more preferably 10 or more is used.
　次に、ＥＬ素子２Ｇの製造方法について説明する。 Next, a method for manufacturing the EL element 2G will be described.
　図１１は、第４の実施の形態に係るＥＬ素子２Ｇの製造方法を説明するための模式図である。なお、図１１では、説明の便宜上、図１０とは上下を逆にしている。 FIG. 11 is a schematic diagram for explaining a method of manufacturing the EL element 2G according to the fourth embodiment. In FIG. 11, for convenience of explanation, the top and bottom of FIG. 10 are reversed.
　まず、図１１（ａ）に示すように、透明基材３１の一方の面上に、透明導電層３２を形成する。例えば、ＩＴＯの透明導電層３２を形成する場合、ＩＴＯゾルペーストをスクリーン印刷法により透明基材３１に塗布し、これを加熱して乾燥させる。これにより、前面電極層２１が得られる。透明基材３１の厚さは、例えば、１０～５００μｍ程度である。また、透明導電層３２の厚さは、例えば、０．１～１０μｍ程度である。 First, as shown in FIG. 11A, a transparent conductive layer 32 is formed on one surface of a transparent substrate 31. For example, when forming the ITO transparent conductive layer 32, an ITO sol paste is applied to the transparent substrate 31 by a screen printing method, and this is heated and dried. Thereby, the front electrode layer 21 is obtained. The thickness of the transparent substrate 31 is, for example, about 10 to 500 μm. The thickness of the transparent conductive layer 32 is, for example, about 0.1 to 10 μm.
　次いで、図１１（ｂ）に示すように、前面電極層２１上に発光層２２を形成する。具体的には、透明導電層３２上に、スクリーン印刷法、ドクターブレード法、バーコート法等により、前述の蛍光体ペーストを塗布した後、これを加熱して乾燥させる。これにより、発光層２２が形成される。発光層２２の厚さは、前述のように、３０～６０μｍ程度である。 Next, as shown in FIG. 11B, a light emitting layer 22 is formed on the front electrode layer 21. Specifically, after applying the above-described phosphor paste on the transparent conductive layer 32 by a screen printing method, a doctor blade method, a bar coating method, or the like, this is heated and dried. Thereby, the light emitting layer 22 is formed. As described above, the thickness of the light emitting layer 22 is about 30 to 60 μm.
　次いで、図１１（ｃ）に示すように、発光層２２上に浸透層６１を形成する。具体的には、浸透層形成用の溶液を発光層２２上に塗布した後、これを加熱して乾燥させる。これにより、浸透層６１が形成される。この結果、前面電極層２１、発光層２２、浸透層６１からなるＥＬ用発光シート６２が形成される。浸透層６１の厚さは、例えば、１～５０μｍ程度である。 Next, as shown in FIG. 11C, the permeation layer 61 is formed on the light emitting layer 22. Specifically, after a solution for forming the osmotic layer is applied on the light emitting layer 22, it is heated and dried. Thereby, the osmosis | permeation layer 61 is formed. As a result, an EL light emitting sheet 62 including the front electrode layer 21, the light emitting layer 22, and the permeation layer 61 is formed. The thickness of the osmotic layer 61 is, for example, about 1 to 50 μm.
　浸透層形成用の溶液は、粒子状物質と、この粒子状物質を保持するためのバインダー成分と、水等の溶剤とに、ポリアクリル酸塩、ポリリン酸塩等の分散剤、カルボキシメチル化セルロース（ＣＭＣ）等の粘度調整剤、潤滑剤、耐水化剤、色材、かさ高い構造を作るための印刷適性改良剤等を加えた混合物からなる。粒子状物質としては、シリカ、二酸化チタン等を用いることができる。また、バインダー成分としては、ポリビニルアルコール（ＰＶＡ）、ラテックス、でんぷん、ポリアクリル酸塩、デキストリン、ゼラチン、寒天、ポリエチレンオキシド、ポリアクリルアミド、メチルセルロース、ソルビット、キシリトール、エリスリトール、マンニトール、ラクチトール、オリゴ糖アルコール、マルチトール、還元澱粉加水分解物、果糖、ブドウ糖、オリゴ糖、トレハロース、グリシンベタイン等を用いることができる。 The solution for forming the osmotic layer includes a particulate material, a binder component for holding the particulate material, a solvent such as water, a dispersant such as polyacrylate and polyphosphate, and carboxymethylated cellulose. (CMC) and the like, and a mixture containing a lubricant, a water-proofing agent, a colorant, a printability improving agent for making a bulky structure, and the like. As the particulate material, silica, titanium dioxide, or the like can be used. In addition, as a binder component, polyvinyl alcohol (PVA), latex, starch, polyacrylate, dextrin, gelatin, agar, polyethylene oxide, polyacrylamide, methylcellulose, sorbitol, xylitol, erythritol, mannitol, lactitol, oligosaccharide alcohol, Maltitol, reduced starch hydrolyzate, fructose, glucose, oligosaccharide, trehalose, glycine betaine and the like can be used.
　なお、浸透層形成用の溶液は、保湿剤として機能する成分を含むことが好ましい。例えば、バインダー成分として、保湿剤としての機能を有するＰＶＡを用いたり、分散剤として、保湿剤としての機能を有するポリアクリル酸塩を用いたりすることが好ましい。また、その他に、デキストリン、ゼラチン、寒天、ポリエチレンオキシド、メチルセルロースなどを用いて保湿性を向上させることもできる。これにより、浸透液４２として水性インク等の水分を含む液体を用いた場合に、浸透層６１内の浸透液４２の乾燥を防止できる。この結果、発光層２２の発光輝度の低下を防止できる。 In addition, it is preferable that the solution for permeation layer formation contains the component which functions as a moisturizing agent. For example, it is preferable to use PVA having a function as a humectant as the binder component, or using a polyacrylate having a function as a humectant as the dispersant. In addition, dampness, gelatin, agar, polyethylene oxide, methylcellulose, etc. can be used to improve moisture retention. Thereby, when the liquid containing water, such as aqueous ink, is used as the penetrating liquid 42, it is possible to prevent the penetrating liquid 42 in the penetrating layer 61 from drying. As a result, it is possible to prevent the emission luminance of the light emitting layer 22 from being lowered.
　次いで、図１１（ｄ）に示すように、浸透層６１の上下両面間に浸透液４２を浸透させることにより、パターン４１が形成された浸透層６１からなるパターン層を形成する。具体的には、インクジェット方式等の印刷装置を用い、ＥＬ用発光シート６２を印刷媒体として、浸透液４２としての水性インクにより浸透層６１側に印刷を行う。ここで、水性インクが浸透層６１の上下両面間に浸透するように、印刷装置による水性インクの付与量を設定する。ここで、図１１（ｄ）における浸透層６１の上側から水性インクで印刷を行うが、これにより形成されるパターン４１を前面電極層２１側（図１０における上側）から見ると、印刷画像に対して鏡像反転されたものとなる。このため、ここでは、ＥＬ素子２Ｇで表示したい画像に対して鏡像反転した画像を印刷する。 Next, as shown in FIG. 11 (d), the permeation liquid 42 is permeated between the upper and lower surfaces of the permeation layer 61 to form a pattern layer including the permeation layer 61 in which the pattern 41 is formed. Specifically, printing is performed on the penetrating layer 61 side with the water-based ink as the penetrating liquid 42 using the EL light-emitting sheet 62 as a printing medium by using a printing apparatus such as an inkjet method. Here, the application amount of the water-based ink by the printing apparatus is set so that the water-based ink permeates between the upper and lower surfaces of the permeation layer 61. Here, printing is performed with water-based ink from the upper side of the permeation layer 61 in FIG. 11D. When the pattern 41 formed thereby is viewed from the front electrode layer 21 side (upper side in FIG. 10), the print image is displayed. The mirror image is reversed. For this reason, here, an image that is mirror-inverted with respect to the image to be displayed by the EL element 2G is printed.
　なお、例えば、ＥＬ用発光シート６２の浸透層６１に、浸透液４２としての水（純水ではない水）を含ませた筆でユーザが模様を描くことによりパターン４１を形成することもできる。パターン４１を形成する方法としては、この他にもさまざまな方法を採用することができる。 In addition, for example, the pattern 41 may be formed by the user drawing a pattern with a brush in which water (water that is not pure water) as the penetrating liquid 42 is included in the penetrating layer 61 of the EL light emitting sheet 62. Various other methods can be employed as a method of forming the pattern 41.
　一方で、背面電極層２４を構成するアルミニウム合金等の金属板等の一方の面上に、コンタクト層５１の材料となる接着剤（粘着剤）を塗布し、背面電極層２４とコンタクト層５１との積層物を得る。コンタクト層５１の材料としては、例えば、シアノエチルプルラン、シアノエチルＰＶＡ、シアノエチルサッカロース、シアノエチルセルロース、フッ化ビニリデン、フロロシリコーン、ニトリルゴム、クロロプレンゴム、ポリウレタン、導電接着剤、導電グリース、導電ペースト、導電ゲル等を用いることができる。これらは、単独あるいは２種以上の混合物として使用できる。また、コンタクト層５１の材料に粘着付与剤を添加して粘着性を向上させるとより望ましい。コンタクト層５１の材料は、溶剤に溶解されているか、分散されていると、背面電極層２４への塗布が容易である。この材料は、液状、ジェル状、ゲル状、固体状のいずれでもよいが、流動性が高すぎて浸透層６１に浸透してしまうと、意図する発光パターン以外の部分も発光してしまうため、浸透層６１に浸透しないことが重要である。 On the other hand, an adhesive (adhesive) as a material of the contact layer 51 is applied on one surface of a metal plate such as an aluminum alloy constituting the back electrode layer 24, and the back electrode layer 24, the contact layer 51, To obtain a laminate. Examples of the material of the contact layer 51 include cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane, conductive adhesive, conductive grease, conductive paste, conductive gel, and the like. Can be used. These can be used alone or as a mixture of two or more. Further, it is more desirable to improve the tackiness by adding a tackifier to the material of the contact layer 51. When the material of the contact layer 51 is dissolved or dispersed in a solvent, the application to the back electrode layer 24 is easy. This material may be liquid, gel, gel, or solid, but if the fluidity is too high and penetrates into the permeation layer 61, it will also emit light other than the intended light emission pattern, It is important that the penetration layer 61 does not penetrate.
　そして、図１１（ｅ）に示すように、背面電極層２４とコンタクト層５１との積層物を、コンタクト層５１側から、発光層２２とは反対側（図１１（ｅ）における上側）の浸透層６１上に貼り付ける。これにより、ＥＬ素子２Ｇが完成する。浸透液４２の乾燥を防ぐため、ＥＬ用発光シート６２に浸透液４２を浸透させた後、できるだけ早く背面電極層２４とコンタクト層５１との積層物を貼り付けることが好ましい。コンタクト層５１の厚さは、例えば、０．１～５０μｍ程度である。また、背面電極層２４の厚さは、例えば、５０～１００μｍ程度である。 Then, as shown in FIG. 11E, the laminate of the back electrode layer 24 and the contact layer 51 penetrates from the contact layer 51 side to the side opposite to the light emitting layer 22 (upper side in FIG. 11E). Paste on layer 61. Thereby, the EL element 2G is completed. In order to prevent the penetration of the penetrating liquid 42, it is preferable to attach the laminate of the back electrode layer 24 and the contact layer 51 as soon as possible after impregnating the penetrating liquid 42 into the EL light emitting sheet 62. The contact layer 51 has a thickness of about 0.1 to 50 μm, for example. Further, the thickness of the back electrode layer 24 is, for example, about 50 to 100 μm.
　ＥＬ素子２Ｇは、駆動時における感電防止等のために、容器等に封入することが好ましい。ＥＬ素子２Ｇを封入する容器の一例について説明する。なお、この容器は、他の実施の形態のＥＬ素子にも用いることができるものである。 The EL element 2G is preferably sealed in a container or the like in order to prevent an electric shock during driving. An example of a container enclosing the EL element 2G will be described. In addition, this container can be used also for the EL element of other embodiment.
　図１２（ａ）は、ＥＬ素子２Ｇを封入する容器の平面図、図１２（ｂ）は、図１２（ａ）におけるＢ－Ｂ線に沿った断面図である。 12 (a) is a plan view of a container enclosing the EL element 2G, and FIG. 12 (b) is a cross-sectional view taken along the line BB in FIG. 12 (a).
　図１２（ａ），（ｂ）に示すように、容器７１は、カバー板７２と、収納袋７３とを備える。 12 (a) and 12 (b), the container 71 includes a cover plate 72 and a storage bag 73.
　カバー板７２は、ＥＬ素子２Ｇを保護するものである。カバー板７２は、光透過性を有する硬質の板からなり、例えば、アクリル板からなる。 The cover plate 72 protects the EL element 2G. The cover plate 72 is made of a hard plate having light transmission properties, for example, an acrylic plate.
　収納袋７３は、ＥＬ素子２Ｇを収納するものである。収納袋７３は、光透過性を有する柔軟なフィルムからなる。収納袋７３は、カバー板７２の一方の面の略全面に固着されている。収納袋７３には、外周の一部に開口部７３ａが形成されている。開口部７３ａは、ＥＬ素子２Ｇを収納袋７３に出し入れするためのものである。開口部７３ａの近傍には、開口部７３ａを閉じるためのファスナー７３ｂが配置されている。また、収納袋７３には、収納袋７３内から空気を抜くための脱気口７３ｃが設けられている。脱気口７３ｃには、収納袋７３の外部から内部への空気の流入を防止する逆止弁（図示せず）が設けられている。 The storage bag 73 stores the EL element 2G. The storage bag 73 is made of a flexible film having optical transparency. The storage bag 73 is fixed to substantially the entire one surface of the cover plate 72. In the storage bag 73, an opening 73a is formed in a part of the outer periphery. The opening 73a is for taking the EL element 2G into and out of the storage bag 73. A fastener 73b for closing the opening 73a is disposed in the vicinity of the opening 73a. Further, the storage bag 73 is provided with a deaeration port 73 c for extracting air from the storage bag 73. The deaeration port 73 c is provided with a check valve (not shown) that prevents the inflow of air from the outside to the inside of the storage bag 73.
　次に、容器７１の使用方法について説明する。 Next, how to use the container 71 will be described.
　まず、ＥＬ素子２Ｇを開口部７３ａから収納袋７３に入れる。この際、ＥＬ素子２Ｇの上側（前面電極層２１側）をカバー板７２側に向ける。 First, the EL element 2G is put into the storage bag 73 from the opening 73a. At this time, the upper side (front electrode layer 21 side) of the EL element 2G is directed to the cover plate 72 side.
　次いで、ＥＬ素子２Ｇの前面電極層２１および背面電極層２４を、コード７６，７７を介して外部の交流電源７８に接続する。収納袋７３には、コード７６，７７を通す穴（図示せず）が形成されている。この穴は、コード７６，７７を通した後、ゴム系の接着剤等で封止される。 Next, the front electrode layer 21 and the back electrode layer 24 of the EL element 2G are connected to an external AC power supply 78 via cords 76 and 77. The storage bag 73 has holes (not shown) through which the cords 76 and 77 are passed. This hole is sealed with a rubber adhesive or the like after passing through the cords 76 and 77.
　そして、ファスナー７３ｂにより開口部７３ａを閉じた後、脱気用ポンプを脱気口７３ｃに接続して収納袋７３の真空引きを行う。これにより、収納袋７３がＥＬ素子２Ｇに密着し、ＥＬ素子２Ｇが固定される。この結果、ＥＬ素子２Ｇが容器７１内に封入される。硬質のカバー板７２により、ＥＬ素子２Ｇの前面電極層２１上には収納袋７３の皺は生じない。このため、容器７１は、ＥＬ素子２Ｇの画質を低下させない。 Then, after the opening 73a is closed by the fastener 73b, the deaeration pump is connected to the deaeration port 73c, and the storage bag 73 is evacuated. Thereby, the storage bag 73 is in close contact with the EL element 2G, and the EL element 2G is fixed. As a result, the EL element 2G is sealed in the container 71. Due to the hard cover plate 72, no wrinkles of the storage bag 73 occur on the front electrode layer 21 of the EL element 2G. For this reason, the container 71 does not deteriorate the image quality of the EL element 2G.
　上記のようにＥＬ素子２Ｇを容器７１に封入することで、感電等による故障を防止できる。また、容器７１によれば、ラミネート加工と比較して、大きなサイズのＥＬ素子２Ｇに対応できる。 By enclosing the EL element 2G in the container 71 as described above, a failure due to an electric shock or the like can be prevented. Moreover, according to the container 71, it can respond to the EL element 2G of a large size compared with a lamination process.
　なお、ＥＬ素子２Ｇをコード７６，７７により外部の交流電源７８に接続するかわりに、容器７１内にコイルを設け、非接触給電によりＥＬ素子２Ｇを駆動させるようにしてもよい。 It should be noted that instead of connecting the EL element 2G to the external AC power supply 78 by the cords 76 and 77, a coil may be provided in the container 71 and the EL element 2G may be driven by non-contact power feeding.
　以上説明したように、第４の実施の形態に係るＥＬ素子２Ｇの製造方法によれば、浸透層６１に浸透した浸透液４２がパターン４１となるパターン層を形成する。このため、ＥＬ素子２Ｇの発光のパターンを印刷等により容易に形成できる。 As described above, according to the method for manufacturing the EL element 2G according to the fourth embodiment, the permeation liquid 42 that has permeated the permeation layer 61 forms the pattern layer 41. For this reason, the light emission pattern of the EL element 2G can be easily formed by printing or the like.
　また、第４の実施の形態では、発光層２２上にパターン層（パターン４１が形成された浸透層６１）を形成する工程の後で、パターン層上にコンタクト層５１を介して背面電極層２４を形成する工程を行う。これにより、パターン層の浸透液４２と発光層２２との境界部に空気（気泡）が入ることを防止できる。この結果、発光層２２の発光のムラを抑制し、均一な発光を実現できる。 In the fourth embodiment, the back electrode layer 24 is formed on the pattern layer via the contact layer 51 after the step of forming the pattern layer (the permeation layer 61 on which the pattern 41 is formed) on the light emitting layer 22. The process of forming is performed. Thereby, it is possible to prevent air (bubbles) from entering the boundary portion between the penetrating liquid 42 of the pattern layer and the light emitting layer 22. As a result, unevenness in light emission of the light emitting layer 22 can be suppressed and uniform light emission can be realized.
　具体的には、背面電極層２４側にパターン層を形成してからその積層物を発光層２２上に配置するのではなく、発光層２２上にパターン層を形成するために、まず、発光層２２上に膜状物質からなる浸透層６１を形成する。浸透層形成用の溶液を発光層２２上に塗布することにより浸透層６１を形成するので、発光層２２と浸透層６１とは密着している。そして、浸透液４２を浸透層６１に付与し、浸透層６１の両面間に浸透させることによりパターン４１を形成する。これにより、パターン４１が形成された浸透層６１内の浸透液４２と発光層２２とが密着し、その境界部に気泡が入ることを確実に防止できる。 Specifically, in order to form the pattern layer on the light emitting layer 22 instead of forming the pattern layer on the back electrode layer 24 side and then placing the laminate on the light emitting layer 22, first, the light emitting layer A permeation layer 61 made of a membranous material is formed on 22. Since the permeation layer 61 is formed by applying a solution for forming the permeation layer onto the light emitting layer 22, the light emitting layer 22 and the permeation layer 61 are in close contact with each other. Then, the permeating liquid 42 is applied to the permeation layer 61 and permeated between both surfaces of the permeation layer 61 to form the pattern 41. Thereby, the penetration liquid 42 in the penetration layer 61 in which the pattern 41 is formed and the light emitting layer 22 are in close contact with each other, and bubbles can be reliably prevented from entering the boundary portion.
　パターン層（パターン４１が形成された浸透層６１）内の浸透液４２と発光層２２との境界部に気泡が形成されると、その気泡上の領域では、発光層２２内において発光に十分な強さの電界が形成されない。このため、気泡上の領域では発光層２２が発光せず、発光のムラが生じる。第４の実施の形態では、上述のようにパターン層の浸透液４２と発光層２２との境界部に気泡が入ることを回避できるので、発光層２２において均一な発光が得られる。 When bubbles are formed at the boundary between the penetrating liquid 42 and the light emitting layer 22 in the pattern layer (the penetrating layer 61 on which the pattern 41 is formed), the region above the bubbles is sufficient for light emission in the light emitting layer 22. A strong electric field is not formed. For this reason, the light emitting layer 22 does not emit light in the region above the bubbles, and uneven light emission occurs. In the fourth embodiment, air bubbles can be prevented from entering the boundary portion between the penetrating liquid 42 of the pattern layer and the light emitting layer 22 as described above, so that uniform light emission can be obtained in the light emitting layer 22.
　また、浸透層６１が形成されたＥＬ用発光シート６２に対して、浸透液４２によりパターン４１を形成するので、ユーザにおいて印刷装置等を用いて容易にパターン４１を形成できる。そして、ユーザが、パターン４１が形成されたＥＬ用発光シート６２に対し、コンタクト層５１となる接着剤等を用いて背面電極層２４を貼り付けることで、容易にＥＬ素子２Ｇを完成させることができる。 Further, since the pattern 41 is formed by the penetrating liquid 42 on the EL light emitting sheet 62 on which the penetrating layer 61 is formed, the pattern 41 can be easily formed by a user using a printing device or the like. Then, the user can easily complete the EL element 2G by attaching the back electrode layer 24 to the EL light emitting sheet 62 on which the pattern 41 is formed, using an adhesive or the like that becomes the contact layer 51. it can.
　なお、第４の実施の形態では、金属板等からなる背面電極層２４にコンタクト層５１の材料を塗布した積層物を浸透層６１に貼り付けたが、パターン４１が形成された浸透層６１上にコンタクト層５１を形成し、その後、導電性ペースト、導電性ポリマー等をコンタクト層５１に塗布して乾燥させることで、背面電極層２４を形成してもよい。また、コンタクト層５１を介さずに、浸透層６１に直接、導電性ペースト、導電性ポリマー等を塗布して乾燥させることで、背面電極層２４を形成してもよい。ただし、導電性ペースト等が浸透層６１に深く浸透しすぎると、電圧などの駆動条件によっては、浸透液４２がない部分まで発光する場合がある。このため、導電性ペースト等を塗布して背面電極層２４を形成する場合は、浸透層６１への導電性ペースト等の浸透深さおよび浸透層６１の厚さを適切に選択することに留意が必要である。 In the fourth embodiment, the laminate in which the material of the contact layer 51 is applied to the back electrode layer 24 made of a metal plate or the like is attached to the permeation layer 61. On the permeation layer 61 on which the pattern 41 is formed. The back electrode layer 24 may be formed by forming the contact layer 51 on the substrate, and then applying a conductive paste, a conductive polymer or the like to the contact layer 51 and drying it. Alternatively, the back electrode layer 24 may be formed by directly applying a conductive paste, a conductive polymer, or the like to the permeation layer 61 without using the contact layer 51 and drying it. However, if the conductive paste or the like penetrates too deeply into the osmotic layer 61, light may be emitted up to a portion where the osmotic solution 42 is absent depending on driving conditions such as voltage. Therefore, when the back electrode layer 24 is formed by applying a conductive paste or the like, it should be noted that the penetration depth of the conductive paste or the like to the penetration layer 61 and the thickness of the penetration layer 61 are appropriately selected. is necessary.
［第５の実施の形態］
　図１３は、第５の実施の形態に係るＥＬ素子の部分断面図である。図１３に示すように、第５の実施の形態に係るＥＬ素子２Ｈは、図５に示した第２の実施の形態のＥＬ素子２Ｂに対し、コンタクト層５３を追加した構成である。コンタクト層５３は、高誘電率の誘電体からなり、発光層２２と浸透性基材２３とを接着している。 [Fifth Embodiment]
FIG. 13 is a partial cross-sectional view of an EL element according to the fifth embodiment. As shown in FIG. 13, the EL element 2H according to the fifth embodiment has a configuration in which a contact layer 53 is added to the EL element 2B according to the second embodiment shown in FIG. The contact layer 53 is made of a dielectric having a high dielectric constant, and adheres the light emitting layer 22 and the permeable base material 23.
　次に、ＥＬ素子２Ｈの製造方法について説明する。 Next, a method for manufacturing the EL element 2H will be described.
　図１４は、第５の実施の形態に係るＥＬ素子２Ｈの製造方法を説明するための模式図である。なお、図１４では、説明の便宜上、図１３とは上下を逆にしている。 FIG. 14 is a schematic diagram for explaining a method for manufacturing the EL element 2H according to the fifth embodiment. In FIG. 14, for the convenience of explanation, the top and bottom of FIG. 13 are reversed.
　まず、第４の実施の形態と同様の手順により、図１１（ｂ）に示した前面電極層２１と発光層２２との積層物を形成する。 First, a laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed by the same procedure as in the fourth embodiment.
　次いで、図１４（ａ）に示すように、発光層２２上に、コンタクト層５３の材料となる接着剤（粘着剤）を塗布し、その上から、浸透層としての浸透性基材２３を貼り付ける。この際、浸透性基材２３の全面に均一に高圧力を付与する。例えば、浸透性基材２３を上にして、５ｍｍ程度の径の円柱棒を上に当てて、ゆっくり一方向に力を加えながら転がすとよい。これにより、コンタクト層５３と浸透性基材２３とを重ねたときにその境界部に空気（気泡）があったとしても、その空気が浸透性基材２３を通過して外に抜ける。コンタクト層５３の厚さは、例えば、０．１～２０μｍ程度であるが、この値は、表面に凹凸のある発光層２２上に塗布して乾燥した後の、平均厚さである。 Next, as shown in FIG. 14 (a), an adhesive (adhesive) as a material of the contact layer 53 is applied on the light emitting layer 22, and a permeable base material 23 as an osmotic layer is pasted thereon. wear. At this time, a high pressure is uniformly applied to the entire surface of the permeable base material 23. For example, with the permeable base material 23 facing upward, a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction. Thus, even when air (bubbles) is present at the boundary when the contact layer 53 and the permeable base material 23 are overlapped, the air passes through the permeable base material 23 and escapes outside. The thickness of the contact layer 53 is, for example, about 0.1 to 20 μm, and this value is an average thickness after being applied on the light emitting layer 22 having an uneven surface and dried.
　コンタクト層５３の材料としては、前述のように、例えば、シアノエチルプルラン、シアノエチルＰＶＡ、シアノエチルサッカロース、シアノエチルセルロース、フッ化ビニリデン、フロロシリコーン、ニトリルゴム、クロロプレンゴム、ポリウレタン等を用いることができる。ただし、浸透性基材２３との境界部に気泡が形成されないようにするため、浸透性基材２３と強く密着する材料を用いることが好ましく、例えば、シアノエチルセルロース等を用いることが好ましい。 As described above, for example, cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane and the like can be used as the material of the contact layer 53. However, in order to prevent bubbles from forming at the boundary with the permeable base material 23, it is preferable to use a material that adheres strongly to the permeable base material 23. For example, it is preferable to use cyanoethyl cellulose or the like.
　発光層２２上にコンタクト層５３を介して浸透性基材２３を接着することで、図１４（ｂ）に示すように、前面電極層２１、発光層２２、コンタクト層５３、浸透性基材２３からなるＥＬ用発光シート６２Ａが形成される。 By adhering the permeable base material 23 to the light emitting layer 22 via the contact layer 53, as shown in FIG. 14B, the front electrode layer 21, the light emitting layer 22, the contact layer 53, and the permeable base material 23 are provided. Thus, an EL light emitting sheet 62A is formed.
　次いで、図１４（ｃ）に示すように、浸透性基材２３の上下両面間に浸透液４２を浸透させることにより、パターン４１が形成された浸透性基材２３からなるパターン層を形成する。具体的には、第４の実施の形態と同様に、印刷装置を用い、ＥＬ用発光シート６２Ａを印刷媒体として、浸透液４２としての水性インクにより浸透性基材２３側に印刷を行う。なお、第４の実施の形態と同様に、この他にもさまざまな方法を採用することができる。 Next, as shown in FIG. 14 (c), the permeation liquid 42 is permeated between the upper and lower surfaces of the permeable base material 23 to form a pattern layer made of the permeable base material 23 on which the pattern 41 is formed. Specifically, as in the fourth embodiment, printing is performed on the permeable base material 23 side with water-based ink as the penetrating liquid 42 using the EL light emitting sheet 62A as a printing medium, using a printing apparatus. It should be noted that various other methods can be adopted as in the fourth embodiment.
　そして、図１４（ｄ）に示すように、背面電極層２４とコンタクト層５１との積層物を、コンタクト層５１側から浸透性基材２３に貼り付ける。これにより、ＥＬ素子２Ｈが完成する。浸透液４２の乾燥を防ぐため、ＥＬ用発光シート６２Ａに浸透液４２を浸透させた後、迅速に背面電極層２４とコンタクト層５１との積層物を浸透性基材２３に貼り付けることが好ましい。 And as shown in FIG.14 (d), the laminated body of the back electrode layer 24 and the contact layer 51 is affixed on the permeable base material 23 from the contact layer 51 side. Thereby, the EL element 2H is completed. In order to prevent the penetration of the penetrating liquid 42, it is preferable that the laminate of the back electrode layer 24 and the contact layer 51 is quickly attached to the penetrating substrate 23 after the penetrating liquid 42 has been permeated into the EL light emitting sheet 62A. .
　以上説明したように、第５の実施の形態に係るＥＬ素子２Ｈの製造方法によれば、コンタクト層５３を介して発光層２２上にパターン層（パターン４１が形成された浸透性基材２３）を形成するので、浸透性基材２３として密着力のない紙等のさまざまな部材を用いて容易にパターン４１を形成することが可能となる。 As described above, according to the method for manufacturing the EL element 2H according to the fifth embodiment, the pattern layer (the permeable substrate 23 on which the pattern 41 is formed) is formed on the light emitting layer 22 through the contact layer 53. Therefore, the pattern 41 can be easily formed by using various members such as paper having no adhesion as the permeable base material 23.
　また、第５の実施の形態では、背面電極層２４側にパターン層を形成してからその積層物をコンタクト層５３を介して発光層２２に貼り付けるのではなく、まず、発光層２２上にコンタクト層５３を介して浸透性基材２３を貼り付ける。そして、浸透液４２を浸透性基材２３に付与し、浸透性基材２３の両面間に浸透させることによりパターン層を形成する。これにより、浸透性基材２３内の浸透液４２と発光層２２とが密着し、その境界部に気泡が入ることを確実に防止できる。この結果、発光層２２において均一な発光が得られる。 In the fifth embodiment, the pattern layer is formed on the back electrode layer 24 side, and then the laminate is not attached to the light emitting layer 22 via the contact layer 53. The permeable base material 23 is attached via the contact layer 53. Then, the pattern layer is formed by applying the penetrating liquid 42 to the permeable base material 23 and allowing it to penetrate between both surfaces of the permeable base material 23. Thereby, the penetration liquid 42 and the light emitting layer 22 in the permeable base material 23 are in close contact with each other, and bubbles can be reliably prevented from entering the boundary portion. As a result, uniform light emission is obtained in the light emitting layer 22.
（第５の実施の形態の変形例）
　第５の実施の形態の変形例は、上述した第５の実施の形態のＥＬ素子２Ｈの製造方法の一部を変更したものである。 (Modification of the fifth embodiment)
The modification of the fifth embodiment is obtained by changing a part of the manufacturing method of the EL element 2H of the fifth embodiment described above.
　図１５は、第５の実施の形態の変形例におけるＥＬ素子２Ｈの製造方法を説明するための模式図である。なお、図１５では、図１４と同様に、図１３とは上下を逆にしている。 FIG. 15 is a schematic diagram for explaining a method of manufacturing the EL element 2H according to the modification of the fifth embodiment. 15 is upside down from FIG. 13 as in FIG.
　まず、上述の第５の実施の形態と同様に、図１１（ｂ）に示した前面電極層２１と発光層２２との積層物を形成し、その後、発光層２２上に、コンタクト層５３の材料となる接着剤（粘着剤）を塗布する。このようにして、前面電極層２１と発光層２２とコンタクト層５３との積層物を準備する。 First, similarly to the above-described fifth embodiment, the laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed, and then the contact layer 53 is formed on the light emitting layer 22. The adhesive (adhesive) used as a material is applied. In this way, a laminate of the front electrode layer 21, the light emitting layer 22, and the contact layer 53 is prepared.
　また、背面電極層２４を構成する金属板等の一方の面上に、コンタクト層５１の材料となる接着剤を塗布し、背面電極層２４とコンタクト層５１との積層物を準備する。 Also, an adhesive as a material for the contact layer 51 is applied on one surface of a metal plate or the like constituting the back electrode layer 24 to prepare a laminate of the back electrode layer 24 and the contact layer 51.
　一方で、浸透性基材２３に、印刷等により浸透液４２を浸透させて、パターン４１が形成された浸透性基材２３からなるパターン層を準備する。 On the other hand, a penetrating liquid 42 is infiltrated into the permeable base material 23 by printing or the like to prepare a pattern layer made of the permeable base material 23 on which the pattern 41 is formed.
　そして、図１５に示すように、コンタクト層５３上に、パターン４１が形成された浸透性基材２３（パターン層）を貼り付ける。この際、浸透性基材２３の全面に均一に高圧力を付与する。例えば、浸透性基材２３を上にして、５ｍｍ程度の径の円柱棒を上に当てて、ゆっくり一方向に力を加えながら転がすとよい。 And as shown in FIG. 15, the permeable base material 23 (pattern layer) in which the pattern 41 was formed is affixed on the contact layer 53. At this time, a high pressure is uniformly applied to the entire surface of the permeable base material 23. For example, with the permeable base material 23 facing upward, a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction.
　その後、第５の実施の形態で説明した図１４（ｄ）に示すように、背面電極層２４とコンタクト層５１との積層物を、コンタクト層５１側から浸透性基材２３に貼り付ける。これにより、ＥＬ素子２Ｈが完成する。浸透液４２の乾燥を防ぐため、浸透性基材２３に浸透液４２を浸透させると、その後の工程は迅速に行うことが望ましい。 Thereafter, as shown in FIG. 14D described in the fifth embodiment, a laminate of the back electrode layer 24 and the contact layer 51 is attached to the permeable substrate 23 from the contact layer 51 side. Thereby, the EL element 2H is completed. In order to prevent the penetration of the penetrating liquid 42, it is desirable that the subsequent steps be performed quickly when the penetrating liquid 42 is infiltrated into the permeable base material 23.
　もしも、パターン４１が形成された浸透性基材２３を、コンタクト層５１を介して背面電極層２４に貼り付けた後に、コンタクト層５３に貼り付けると、浸透性基材２３内の浸透液４２と発光層２２との境界部に形成された気泡は抜け道がなく、そこに残留してしまう。 If the permeable base material 23 on which the pattern 41 is formed is attached to the back electrode layer 24 via the contact layer 51 and then attached to the contact layer 53, the osmotic liquid 42 in the permeable base material 23 Bubbles formed at the boundary with the light emitting layer 22 have no escape route and remain there.
　これに対し、本変形例では、上記説明のように、浸透液４２を浸透させた浸透性基材２３をコンタクト層５３上に高圧力で貼り付ける。これにより、コンタクト層５３と浸透性基材２３とを重ねたときにその境界部に空気（気泡）があったとしても、その空気が浸透性基材２３を通過して外に抜ける。このため、浸透性基材２３内の浸透液４２と発光層２２との境界部に気泡が残らない。この後で、コンタクト層５１を介して背面電極層２４を浸透性基材２３に貼り付ける。これにより、浸透性基材２３内の浸透液４２と発光層２２との境界部に気泡が入ることを確実に防止できる。この結果、発光層２２において均一な発光が得られる。 On the other hand, in this modification, as described above, the permeable base material 23 infiltrated with the permeating liquid 42 is pasted on the contact layer 53 with a high pressure. Thus, even when air (bubbles) is present at the boundary when the contact layer 53 and the permeable base material 23 are overlapped, the air passes through the permeable base material 23 and escapes outside. For this reason, no bubbles remain at the boundary between the penetrant 42 and the light emitting layer 22 in the permeable substrate 23. Thereafter, the back electrode layer 24 is attached to the permeable base material 23 via the contact layer 51. Thereby, it can prevent reliably that a bubble enters into the boundary part of the penetration liquid 42 in the permeable base material 23, and the light emitting layer 22. FIG. As a result, uniform light emission is obtained in the light emitting layer 22.
　なお、第５の実施の形態およびその変形例においても、発光層２２とコンタクト層５３とが剥離可能となるように、フッ化ビニリデン等のフッ素系樹脂を含む蛍光体ペーストを用いて発光層２２を形成することが望ましい。また、浸透性基材２３がパルプなどの天然繊維を主原料とする紙からなる場合には、この紙のコンタクト層５３に接着させる面に、事前に、紙力増強剤を塗布しておくことが好ましい。 In the fifth embodiment and its modifications, the light emitting layer 22 is also formed using a phosphor paste containing a fluorine-based resin such as vinylidene fluoride so that the light emitting layer 22 and the contact layer 53 can be peeled off. It is desirable to form. In addition, when the permeable base material 23 is made of paper made mainly of natural fibers such as pulp, a paper strength enhancer is applied in advance to the surface to be bonded to the contact layer 53 of the paper. Is preferred.
　また、第５の実施の形態およびその変形例において、パターン４１が形成された浸透性基材２３上にコンタクト層５１を形成し、その後、導電性ペースト、導電性ポリマー等をコンタクト層５１に塗布して乾燥させることで、背面電極層２４を形成してもよい。また、コンタクト層５１を介さずに、浸透性基材２３に直接、導電性ペースト、導電性ポリマー等を塗布して乾燥させることで、背面電極層２４を形成してもよい。ただし、導電性ペースト等が浸透性基材２３に深く浸透しすぎると、電圧などの駆動条件によっては、浸透液４２がない部分まで発光する場合がある。このため、導電性ペースト等を塗布して背面電極層２４を形成する場合は、浸透性基材２３への導電性ペースト等の浸透深さおよび浸透性基材２３の厚さを適切に選択することに留意が必要である。 In the fifth embodiment and its modifications, the contact layer 51 is formed on the permeable base material 23 on which the pattern 41 is formed, and then a conductive paste, a conductive polymer, or the like is applied to the contact layer 51. Then, the back electrode layer 24 may be formed by drying. Alternatively, the back electrode layer 24 may be formed by applying a conductive paste, a conductive polymer, or the like directly to the permeable base material 23 without using the contact layer 51 and drying it. However, if the conductive paste or the like penetrates too deeply into the permeable base material 23, light may be emitted to a portion where the penetrating liquid 42 is not present depending on driving conditions such as voltage. For this reason, when the back electrode layer 24 is formed by applying a conductive paste or the like, the penetration depth of the conductive paste or the like to the permeable base material 23 and the thickness of the permeable base material 23 are appropriately selected. It should be noted.
［第６の実施の形態］
　図１６は、第６の実施の形態に係るＥＬ素子の部分断面図である。図１６に示すように、第６の実施の形態に係るＥＬ素子２Ｉが、図１３に示した第５の実施の形態のＥＬ素子２Ｈと異なる点は、浸透性基材２３の上部に誘電体浸透層２３ａが形成されている点である。 [Sixth Embodiment]
FIG. 16 is a partial cross-sectional view of an EL element according to the sixth embodiment. As shown in FIG. 16, the EL element 2I according to the sixth embodiment is different from the EL element 2H according to the fifth embodiment shown in FIG. The permeation layer 23a is formed.
　誘電体浸透層２３ａは、コンタクト層５３を形成する誘電体が浸透性基材２３の厚さ方向の一部に浸透して形成されたものである。浸透性基材２３には、浸透液４２が、下面と誘電体浸透層２３ａとの間に浸透することにより、パターン４１が形成される。浸透性基材２３に浸透液４２が浸透した部分の平面視における形状（領域）が、パターン４１となる。 The dielectric permeation layer 23 a is formed by permeating a part of the permeable base material 23 in the thickness direction with the dielectric forming the contact layer 53. A pattern 41 is formed in the permeable base material 23 by penetrating the penetrating liquid 42 between the lower surface and the dielectric penetrating layer 23a. A shape (region) in a plan view of a portion where the penetrating liquid 42 has permeated the permeable base material 23 is a pattern 41.
　次に、ＥＬ素子２Ｉの製造方法について説明する。 Next, a method for manufacturing the EL element 2I will be described.
　図１７は、第６の実施の形態に係るＥＬ素子２Ｉの製造方法を説明するための模式図である。 FIG. 17 is a schematic diagram for explaining a method of manufacturing the EL element 2I according to the sixth embodiment.
　まず、第４の実施の形態と同様の手順により、図１１（ｂ）に示した前面電極層２１と発光層２２との積層物を形成する。 First, a laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed by the same procedure as in the fourth embodiment.
　また、図１７（ａ）に示すように、浸透性基材２３上にコンタクト層５３を形成し、ＥＬ発光パターン用シート８１を作製する。具体的には、浸透性基材２３上に誘電体ペーストを塗布することにより、コンタクト層５３を形成する。浸透性基材２３上に誘電体ペーストを塗布すると、浸透性基材２３に誘電体（高誘電率の樹脂）が浸透し、誘電体浸透層２３ａが形成される。コンタクト層５３の厚さは、例えば、０．１～２０μｍ程度である。この値は、浸透性基材２３上に塗布して乾燥した後の平均厚さである。 Further, as shown in FIG. 17A, a contact layer 53 is formed on the permeable base material 23 to produce an EL light emission pattern sheet 81. Specifically, the contact layer 53 is formed by applying a dielectric paste on the permeable substrate 23. When a dielectric paste is applied on the permeable base material 23, a dielectric (high dielectric constant resin) penetrates the permeable base material 23, and a dielectric permeation layer 23a is formed. The contact layer 53 has a thickness of about 0.1 to 20 μm, for example. This value is the average thickness after coating on the permeable substrate 23 and drying.
　誘電体ペーストは、高誘電率の樹脂と溶剤とからなる。誘電体ペーストに用いる高誘電率の樹脂としては、シアノエチルプルラン、シアノエチルＰＶＡ、シアノエチルサッカロース、シアノエチルセルロース、フッ化ビニリデン、フロロシリコーン、ニトリルゴム、クロロプレンゴム、ポリウレタン等を用いることができる。ただし、発光層２２に接着したときに発光層２２との境界部に気泡が形成されないようにするため、流動性を有する樹脂を用いることが好ましく、例えば、シアノエチルＰＶＡを用いることが好ましい。誘電体ペーストに用いる溶剤としては、シクロヘキサノン等を用いることができる。 The dielectric paste is made of a high dielectric constant resin and a solvent. As the high dielectric constant resin used for the dielectric paste, cyanoethyl pullulan, cyanoethyl PVA, cyanoethyl saccharose, cyanoethyl cellulose, vinylidene fluoride, fluorosilicone, nitrile rubber, chloroprene rubber, polyurethane and the like can be used. However, in order to prevent bubbles from forming at the boundary with the light emitting layer 22 when bonded to the light emitting layer 22, it is preferable to use a resin having fluidity, for example, cyanoethyl PVA. As a solvent used for the dielectric paste, cyclohexanone or the like can be used.
　ＥＬ発光パターン用シート８１を所定時間乾燥させた後、図１７（ｂ）に示すように、前面電極層２１と発光層２２との積層物である蛍光体シート８２の発光層２２とＥＬ発光パターン用シート８１のコンタクト層５３とを密着させて貼り合わせる。コンタクト層５３は接着剤として作用する。この際、蛍光体シート８２およびＥＬ発光パターン用シート８１の全面に均一に高圧力を付与する。例えば、浸透性基材２３を上にして、５ｍｍ程度の径の円柱棒を上に当てて、ゆっくり一方向に力を加えながら転がすとよい。これにより、発光層２２とコンタクト層５３とを重ねたときにその境界部に気泡があったとしても、その気泡が外に抜ける。これにより、発光層２２とコンタクト層５３との間に形成された気泡により発光層２２の発光が不均一になることを抑制できる。 After the EL light emitting pattern sheet 81 is dried for a predetermined time, as shown in FIG. 17B, the light emitting layer 22 of the phosphor sheet 82, which is a laminate of the front electrode layer 21 and the light emitting layer 22, and the EL light emitting pattern. The contact layer 53 of the sheet 81 is adhered and bonded together. The contact layer 53 acts as an adhesive. At this time, a high pressure is uniformly applied to the entire surface of the phosphor sheet 82 and the EL light emission pattern sheet 81. For example, with the permeable base material 23 facing upward, a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction. Thereby, even if there is a bubble at the boundary portion when the light emitting layer 22 and the contact layer 53 are overlapped, the bubble escapes to the outside. Thereby, it is possible to suppress non-uniform light emission of the light emitting layer 22 due to bubbles formed between the light emitting layer 22 and the contact layer 53.
　ここで、ＥＬ発光パターン用シート８１を作製してから（浸透性基材２３上にコンタクト層５３形成用の誘電体ペーストを塗布してから）の時間の経過にともない、コンタクト層５３から溶剤が揮発し、これによりコンタクト層５３の流動性が低下する。コンタクト層５３の流動性が低下すると、発光層２２とコンタクト層５３とを重ねたときにその境界部に形成された気泡を取り除きにくくなる。 Here, as the time elapses after the EL light emitting pattern sheet 81 is produced (after the dielectric paste for forming the contact layer 53 is applied on the permeable base material 23), the solvent is removed from the contact layer 53. Volatilization causes the fluidity of the contact layer 53 to decrease. When the fluidity of the contact layer 53 is lowered, it becomes difficult to remove bubbles formed at the boundary when the light emitting layer 22 and the contact layer 53 are overlapped.
　そこで、ＥＬ発光パターン用シート８１を作製してから、蛍光体シート８２と貼り合わせるまでに長時間が経過する場合、ＥＬ発光パターン用シート８１を容器に封入して保持することが好ましい。これにより、コンタクト層５３からの溶剤の揮発を抑制し、コンタクト層５３の流動性の低下を抑えることができる。 Therefore, when a long time elapses after the EL light emitting pattern sheet 81 is produced and bonded to the phosphor sheet 82, the EL light emitting pattern sheet 81 is preferably sealed and held in a container. Thereby, volatilization of the solvent from the contact layer 53 can be suppressed, and a decrease in fluidity of the contact layer 53 can be suppressed.
　また、流動性が低下しても、加熱により流動性を回復可能な樹脂を用いてコンタクト層５３を形成した場合は、流動性が低下したコンタクト層５３を軟化点まで加熱してから、ＥＬ発光パターン用シート８１と蛍光体シート８２とを貼り合わせるようにすればよい。これにより、発光層２２とコンタクト層５３との間に気泡が残ることを低減できる。 Further, when the contact layer 53 is formed using a resin that can recover the fluidity by heating even if the fluidity decreases, the EL layer emits light after the contact layer 53 that has decreased fluidity is heated to the softening point. The pattern sheet 81 and the phosphor sheet 82 may be bonded together. Thereby, it is possible to reduce bubbles remaining between the light emitting layer 22 and the contact layer 53.
　次いで、図１７（ｃ）に示すように、蛍光体シート８２とＥＬ発光パターン用シート８１とを貼り合わせて作製されたＥＬ用発光シート８３の浸透性基材２３に浸透液４２を浸透させ、パターン４１を形成する。具体的には、第４の実施の形態と同様に、印刷装置を用い、ＥＬ用発光シート８３を印刷媒体として、浸透液４２としての水性インクにより浸透性基材２３側に印刷を行う。なお、第４の実施の形態と同様に、この他にもさまざまな方法を採用することができる。 Next, as shown in FIG. 17 (c), the permeation liquid 42 is infiltrated into the permeable substrate 23 of the EL light-emitting sheet 83 produced by bonding the phosphor sheet 82 and the EL light-emitting pattern sheet 81, A pattern 41 is formed. Specifically, as in the fourth embodiment, printing is performed on the permeable base material 23 side with the water-based ink as the penetrating liquid 42 using the EL light-emitting sheet 83 as a printing medium, using the printing apparatus. It should be noted that various other methods can be adopted as in the fourth embodiment.
　そして、図１７（ｄ）に示すように、背面電極層２４とコンタクト層５１との積層物を、コンタクト層５１側からＥＬ用発光シート８３の浸透性基材２３に貼り付ける。これにより、コンタクト層５１を介して浸透性基材２３上に背面電極層２４が形成される。この結果、ＥＬ素子２Ｉが完成する。浸透液４２の乾燥を防ぐため、浸透性基材２３に浸透液４２を浸透させた後、迅速に背面電極層２４とコンタクト層５１との積層物を浸透性基材２３に貼り付けることが好ましい。 And as shown in FIG.17 (d), the laminated body of the back electrode layer 24 and the contact layer 51 is affixed on the permeable base material 23 of the light emitting sheet 83 for EL from the contact layer 51 side. Thereby, the back electrode layer 24 is formed on the permeable base material 23 via the contact layer 51. As a result, the EL element 2I is completed. In order to prevent drying of the penetrating liquid 42, it is preferable that the permeable base material 23 is allowed to permeate the penetrating liquid 42 and then a laminate of the back electrode layer 24 and the contact layer 51 is quickly attached to the permeable base material 23. .
　ＥＬ素子２Ｉにおいて、パターン４１の内容を変更する場合、ＥＬ素子２Ｉから蛍光体シート８２を取り外す。 When changing the content of the pattern 41 in the EL element 2I, the phosphor sheet 82 is removed from the EL element 2I.
　ここで、ＥＬ素子２Ｉでは、浸透性基材２３内部に誘電体が浸透して誘電体浸透層２３ａが形成されている。例えば、浸透性基材２３が紙で構成されている場合、紙に浸透した誘電体により、紙繊維の収束力が強化される。また、誘電体浸透層２３ａにより浸透液４２の浸透深さが制限されるので、浸透液４２により紙繊維の収束力が低下する領域が小さく抑えられる。これにより、ＥＬ素子２Ｉから蛍光体シート８２を剥がす際に、浸透性基材２３としての紙が破れて、紙の一部がコンタクト層５３の一部とともに蛍光体シート８２の発光層２２に付着した状態となることを抑制できる。 Here, in the EL element 2I, the dielectric penetrates into the permeable substrate 23 to form the dielectric permeable layer 23a. For example, when the permeable base material 23 is made of paper, the convergence force of the paper fibers is reinforced by the dielectric material that has penetrated the paper. Further, since the penetration depth of the penetrating liquid 42 is limited by the dielectric penetrating layer 23a, a region where the paper fiber convergence force is lowered by the penetrating liquid 42 is suppressed to a small size. Thus, when the phosphor sheet 82 is peeled from the EL element 2I, the paper as the permeable base material 23 is torn, and a part of the paper adheres to the light emitting layer 22 of the phosphor sheet 82 together with a part of the contact layer 53. It can suppress that it will be in the state.
　また、誘電体浸透層２３ａが形成されていることにより、浸透液４２が発光層２２にまで到達することを低減することができる。これにより、例えば、浸透液４２としてインクを用いた場合に、ＥＬ素子２Ｉから剥がした蛍光体シート８２の発光層２２にインクが付着した状態で残ることを低減できる
　上記のように、ＥＬ素子２Ｉでは、浸透性基材２３内部に誘電体浸透層２３ａが形成されていることで、蛍光体シート８２をＥＬ素子２Ｉから再利用可能な状態で取り外すことが可能となる。 In addition, since the dielectric permeation layer 23 a is formed, it is possible to reduce the penetration of the penetrating liquid 42 to the light emitting layer 22. Accordingly, for example, when ink is used as the penetrating liquid 42, it is possible to reduce the ink remaining in the light emitting layer 22 of the phosphor sheet 82 peeled from the EL element 2I. As described above, the EL element 2I Then, since the dielectric permeation layer 23a is formed inside the permeable base material 23, the phosphor sheet 82 can be removed from the EL element 2I in a reusable state.
　また、蛍光体ペーストのバインダーとしてフッ素系樹脂を含むものを用いて、発光層２２とコンタクト層５３とを剥離しやすくすることで、より蛍光体シート８２をＥＬ素子２Ｉから再利用可能な状態で取り外しやすくすることができる。 In addition, by using a phosphor paste containing a fluororesin as a binder for the phosphor paste, the phosphor layer 82 can be reused from the EL element 2I by facilitating the separation of the light emitting layer 22 and the contact layer 53. Easy to remove.
　ＥＬ素子２Ｉから蛍光体シート８２を取り外すと、この蛍光体シート８２に対し、新たなＥＬ発光パターン用シート８１を貼り付け、新たなＥＬ用発光シート８３を作製する。そして、浸透液４２によりＥＬ用発光シート８３に新たなパターン４１を形成した後、背面電極層２４を形成する。これにより、パターン４１の内容が変更されたＥＬ素子２Ｉが作製される。このように、蛍光体シート８２が再利用される。 When the phosphor sheet 82 is removed from the EL element 2I, a new EL light emission pattern sheet 81 is attached to the phosphor sheet 82, and a new EL light emission sheet 83 is produced. Then, after forming a new pattern 41 on the EL light emitting sheet 83 with the penetrating liquid 42, the back electrode layer 24 is formed. Thereby, the EL element 2I in which the content of the pattern 41 is changed is manufactured. Thus, the phosphor sheet 82 is reused.
　以上説明したように、第６の実施の形態によれば、ＥＬ発光パターン用シート８１の浸透性基材２３に浸透液４２を浸透させることによりパターン４１を形成する。このため、ＥＬ素子２Ｉの発光のパターンを印刷等により容易に形成できる。 As described above, according to the sixth embodiment, the pattern 41 is formed by infiltrating the penetrating liquid 42 into the permeable base material 23 of the EL light emitting pattern sheet 81. For this reason, the light emission pattern of the EL element 2I can be easily formed by printing or the like.
　また、第６の実施の形態では、浸透性基材２３上に誘電体ペーストを塗布することにより、コンタクト層５３を形成するとともに、浸透性基材２３内に誘電体浸透層２３ａを形成したＥＬ発光パターン用シート８１を作製する。これにより、浸透性基材２３が誘電体浸透層２３ａにより強化される。これにより、蛍光体シート８２をＥＬ素子２Ｉから取り外す際に、浸透性基材２３が損傷して蛍光体シート８２にコンタクト層５３および浸透性基材２３の断片が付着すること等を抑制できる。また、誘電体浸透層２３ａにより、発光層２２に浸透液４２が到達して発光層２２が汚れることを低減できる。この結果、蛍光体シート８２をＥＬ素子２Ｉから再利用可能な状態で取り外すことが可能となる。 In the sixth embodiment, the contact paste 53 is formed by applying a dielectric paste on the permeable substrate 23, and the dielectric permeable layer 23a is formed in the permeable substrate 23. A light emitting pattern sheet 81 is produced. Thereby, the permeable base material 23 is strengthened by the dielectric permeation layer 23a. Thereby, when removing the fluorescent substance sheet 82 from the EL element 2I, it can suppress that the permeable base material 23 is damaged and the contact layer 53 and the fragment | piece of the permeable base material 23 adhere to the fluorescent substance sheet 82, etc. In addition, the dielectric permeation layer 23a can reduce contamination of the light emitting layer 22 when the penetrating liquid 42 reaches the light emitting layer 22. As a result, the phosphor sheet 82 can be removed from the EL element 2I in a reusable state.
　なお、第６の実施の形態では、蛍光体シート８２とＥＬ発光パターン用シート８１とを貼り合わせた後、浸透液４２によりパターン４１を形成し、その後、背面電極層２４を形成したが、ＥＬ発光パターン用シート８１の浸透性基材２３（誘電体浸透層２３ａの反対側の面）に浸透液４２を浸透させてパターン４１を形成し、背面電極層２４を形成した後、蛍光体シート８２をＥＬ発光パターン用シート８１に貼り付けてもよい。 In the sixth embodiment, after the phosphor sheet 82 and the EL light emission pattern sheet 81 are bonded together, the pattern 41 is formed by the penetrating liquid 42 and then the back electrode layer 24 is formed. After the permeating liquid 42 is infiltrated into the permeable base material 23 (surface opposite to the dielectric permeable layer 23a) of the light emitting pattern sheet 81 to form the pattern 41 and the back electrode layer 24, the phosphor sheet 82 is formed. May be attached to the EL light emission pattern sheet 81.
　また、第６の実施の形態においても、第５の実施の形態と同様に、パターン４１が形成された浸透性基材２３上にコンタクト層５１を形成し、その後、導電性ペースト、導電性ポリマー等をコンタクト層５１に塗布して乾燥させることで、背面電極層２４を形成してもよい。また、コンタクト層５１を介さずに、浸透性基材２３に直接、導電性ペースト、導電性ポリマー等を塗布して乾燥させることで、背面電極層２４を形成してもよい。 Also in the sixth embodiment, as in the fifth embodiment, the contact layer 51 is formed on the permeable substrate 23 on which the pattern 41 is formed, and then a conductive paste, a conductive polymer is formed. Etc. may be applied to the contact layer 51 and dried to form the back electrode layer 24. Alternatively, the back electrode layer 24 may be formed by applying a conductive paste, a conductive polymer, or the like directly to the permeable base material 23 without using the contact layer 51 and drying it.
［第７の実施の形態］
　図１８は、第７の実施の形態に係るＥＬ素子の部分断面図である。図１８に示すように、第７の実施の形態に係るＥＬ素子２Ｊは、図１８に示した第６の実施の形態のＥＬ素子２Ｉに対し、液体遮断層９１と、コンタクト層９２とを追加した構成である。 [Seventh Embodiment]
FIG. 18 is a partial cross-sectional view of an EL element according to the seventh embodiment. As shown in FIG. 18, in the EL element 2J according to the seventh embodiment, a liquid blocking layer 91 and a contact layer 92 are added to the EL element 2I according to the sixth embodiment shown in FIG. This is the configuration.
　液体遮断層９１は、液体である浸透液４２を通過させない層である。液体遮断層９１は、光透過性を有する絶縁体からなる。例えば、液体遮断層９１は、ＰＥＴ樹脂、ＰＥＮ樹脂、シリコーン樹脂のフィルムや、ガラス等からなる。液体遮断層９１は、コンタクト層５３上に配置されている。液体遮断層９１の厚さは、例えば、５μｍ以下である。液体遮断層９１は、誘電率が高いほど、また、厚さが小さいほど、印加電圧の分割分を少なくすることができるので好ましい。 The liquid blocking layer 91 is a layer that does not allow the penetrating liquid 42 that is a liquid to pass through. The liquid blocking layer 91 is made of a light transmissive insulator. For example, the liquid blocking layer 91 is made of PET resin, PEN resin, silicone resin film, glass, or the like. The liquid blocking layer 91 is disposed on the contact layer 53. The thickness of the liquid blocking layer 91 is, for example, 5 μm or less. The higher the dielectric constant and the smaller the thickness of the liquid blocking layer 91, the more preferable it is because the division of the applied voltage can be reduced.
　コンタクト層９２は、液体遮断層９１と発光層２２とを接着している。コンタクト層９２は、誘電率が５以上、より望ましくは１０以上の高誘電率の誘電体からなる。 The contact layer 92 bonds the liquid blocking layer 91 and the light emitting layer 22 together. The contact layer 92 is made of a dielectric material having a dielectric constant of 5 or more, more preferably 10 or more.
　次に、ＥＬ素子２Ｊの製造方法について説明する。 Next, a method for manufacturing the EL element 2J will be described.
　図１９は、第７の実施の形態に係るＥＬ素子２Ｊの製造方法を説明するための模式図である。 FIG. 19 is a schematic diagram for explaining a method of manufacturing the EL element 2J according to the seventh embodiment.
　まず、第４の実施の形態と同様の手順により、図１１（ｂ）に示した前面電極層２１と発光層２２との積層物を形成する。 First, a laminate of the front electrode layer 21 and the light emitting layer 22 shown in FIG. 11B is formed by the same procedure as in the fourth embodiment.
　また、図１９（ａ）に示すように、浸透性基材２３上にコンタクト層５３を形成し、コンタクト層５３上に液体遮断層９１を形成し、さらに、液体遮断層９１上にコンタクト層９２を形成して、ＥＬ発光パターン用シート８１Ａを作製する。 19A, the contact layer 53 is formed on the permeable base material 23, the liquid blocking layer 91 is formed on the contact layer 53, and the contact layer 92 is further formed on the liquid blocking layer 91. The EL light emitting pattern sheet 81A is manufactured.
　浸透性基材２３上にコンタクト層５３を形成する工程は、前述の第６の実施の形態と同様である。浸透性基材２３上にコンタクト層５３を形成した後、コンタクト層５３上に、例えばＰＥＴ樹脂のフィルムを貼り付けることにより、液体遮断層９１を形成する。 The process of forming the contact layer 53 on the permeable base material 23 is the same as that of the above-mentioned sixth embodiment. After the contact layer 53 is formed on the permeable substrate 23, the liquid blocking layer 91 is formed on the contact layer 53 by, for example, attaching a PET resin film.
　ここで、液体遮断層９１は、ＰＥＴ樹脂等を溶剤に溶かしてコンタクト層５３上に塗布して形成するのではなく、予め成型されたフィルム等をコンタクト層５３上に貼り付けることにより形成する。ＰＥＴ樹脂等を溶剤に溶かしてコンタクト層５３上に塗布して形成した層（膜）にはピンホールが形成されることがあり、そこを液体が通過するおそれがあるからである。 Here, the liquid blocking layer 91 is not formed by dissolving a PET resin or the like in a solvent and applying it on the contact layer 53, but is formed by attaching a pre-formed film or the like on the contact layer 53. This is because pinholes may be formed in a layer (film) formed by dissolving PET resin or the like in a solvent and applying the solution on the contact layer 53, and there is a possibility that liquid may pass therethrough.
　液体遮断層９１の形成後、液体遮断層９１上に誘電体ペーストを塗布することにより、コンタクト層９２を形成する。これにより、ＥＬ発光パターン用シート８１Ａが完成する。 After the liquid blocking layer 91 is formed, a contact layer 92 is formed by applying a dielectric paste on the liquid blocking layer 91. Thereby, the EL light emission pattern sheet 81A is completed.
　コンタクト層９２の形成に用いる誘電体ペーストとしては、第６の実施の形態で説明したものと同様のものを用いることができる。コンタクト層９２の形成に用いる誘電体ペーストにおける高誘電率の樹脂としては、コンタクト層９２を発光層２２に接着したときに発光層２２との境界部に気泡が形成されないようにするため、流動性を有する樹脂を用いることが好ましい。なお、第７の実施の形態では、コンタクト層５３の形成に用いる高誘電率の樹脂としては、流動性が小さいものが好ましい。 As the dielectric paste used for forming the contact layer 92, the same paste as that described in the sixth embodiment can be used. As a resin having a high dielectric constant in the dielectric paste used for forming the contact layer 92, in order to prevent bubbles from being formed at the boundary with the light emitting layer 22 when the contact layer 92 is bonded to the light emitting layer 22, fluidity is provided. It is preferable to use a resin having In the seventh embodiment, a resin having a low fluidity is preferable as the high dielectric constant resin used for forming the contact layer 53.
　ＥＬ発光パターン用シート８１Ａを所定時間乾燥させた後、図１９（ｂ）に示すように、前面電極層２１と発光層２２との積層物である蛍光体シート８２の発光層２２とＥＬ発光パターン用シート８１Ａのコンタクト層９２とを密着させて貼り合わせる。 After the EL light emission pattern sheet 81A is dried for a predetermined time, as shown in FIG. 19B, the light emission layer 22 of the phosphor sheet 82, which is a laminate of the front electrode layer 21 and the light emission layer 22, and the EL light emission pattern. The contact layer 92 of the sheet 81 </ b> A is adhered and bonded together.
　この際、前述の第６の実施の形態における蛍光体シート８２とＥＬ発光パターン用シート８１とを貼り合わせる場合と同様に、蛍光体シート８２およびＥＬ発光パターン用シート８１Ａの全面に均一に高圧力を付与する。例えば、浸透性基材２３を上にして、５ｍｍ程度の径の円柱棒を上に当てて、ゆっくり一方向に力を加えながら転がすとよい。これにより、発光層２２とコンタクト層９２とを重ねたときにその境界部に気泡があったとしても、その気泡が外に抜ける。 At this time, similarly to the case where the phosphor sheet 82 and the EL light emission pattern sheet 81 are bonded together in the sixth embodiment, a high pressure is uniformly applied to the entire surface of the phosphor sheet 82 and the EL light emission pattern sheet 81A. Is granted. For example, with the permeable base material 23 facing upward, a cylindrical rod having a diameter of about 5 mm may be placed on the top and rolled while slowly applying a force in one direction. Thereby, even if there is a bubble at the boundary when the light emitting layer 22 and the contact layer 92 are overlapped, the bubble escapes to the outside.
　また、第６の実施の形態と同様に、ＥＬ発光パターン用シート８１Ａを作製してから、蛍光体シート８２と貼り合わせるまでに長時間が経過する場合、ＥＬ発光パターン用シート８１Ａを容器に封入して保持することで、コンタクト層９２の流動性の低下を抑えるようにすることが好ましい。また、流動性が低下しても、加熱により流動性を回復可能な樹脂を用いてコンタクト層９２を形成した場合は、流動性が低下したコンタクト層９２を軟化点まで加熱してから、ＥＬ発光パターン用シート８１Ａと蛍光体シート８２とを貼り合わせるようにすればよい。 Similarly to the sixth embodiment, when a long time elapses after the EL light emitting pattern sheet 81A is produced and bonded to the phosphor sheet 82, the EL light emitting pattern sheet 81A is enclosed in a container. Therefore, it is preferable to suppress a decrease in fluidity of the contact layer 92. In addition, when the contact layer 92 is formed using a resin that can recover the fluidity by heating even if the fluidity decreases, the EL layer emits light after the contact layer 92 that has decreased fluidity is heated to the softening point. The pattern sheet 81A and the phosphor sheet 82 may be bonded together.
　次いで、図１９（ｃ）に示すように、蛍光体シート８２とＥＬ発光パターン用シート８１Ａとを貼り合わせて作製されたＥＬ用発光シート８３Ａの浸透性基材２３に浸透液４２を浸透させ、パターン４１を形成する。具体的には、第４の実施の形態と同様に、印刷装置を用い、ＥＬ用発光シート８３Ａを印刷媒体として、浸透液４２としての水性インクにより浸透性基材２３側に印刷を行う。なお、第４の実施の形態と同様に、この他にもさまざまな方法を採用することができる。 Next, as shown in FIG. 19 (c), the penetrating liquid 42 is infiltrated into the permeable base material 23 of the EL light emitting sheet 83A produced by bonding the phosphor sheet 82 and the EL light emitting pattern sheet 81A. A pattern 41 is formed. Specifically, as in the fourth embodiment, printing is performed on the permeable base material 23 side with the water-based ink as the penetrating liquid 42 using the EL light-emitting sheet 83A as a printing medium, using the printing apparatus. It should be noted that various other methods can be adopted as in the fourth embodiment.
　そして、図１９（ｄ）に示すように、背面電極層２４とコンタクト層５１との積層物を、コンタクト層５１側からＥＬ用発光シート８３Ａの浸透性基材２３に貼り付ける。これにより、ＥＬ素子２Ｊが完成する。浸透液４２の乾燥を防ぐため、浸透性基材２３に浸透液４２を浸透させた後、迅速に背面電極層２４とコンタクト層５１との積層物を浸透性基材２３に貼り付けることが好ましい。 And as shown in FIG.19 (d), the laminated body of the back electrode layer 24 and the contact layer 51 is affixed on the permeable base material 23 of the light emission sheet 83A for EL from the contact layer 51 side. Thereby, the EL element 2J is completed. In order to prevent drying of the penetrating liquid 42, it is preferable that the permeable base material 23 is allowed to permeate the penetrating liquid 42 and then a laminate of the back electrode layer 24 and the contact layer 51 is quickly attached to the permeable base material 23. .
　ＥＬ素子２Ｊにおいて、パターン４１の内容を変更する場合、ＥＬ素子２Ｊから蛍光体シート８２を取り外す。ＥＬ素子２Ｊから蛍光体シート８２を取り外すと、この蛍光体シート８２に対し、新たなＥＬ発光パターン用シート８１Ａを貼り付け、新たなＥＬ用発光シート８３Ａを作製する。そして、浸透液４２によりＥＬ用発光シート８３Ａに新たなパターン４１を形成した後、背面電極層２４を形成する。これにより、パターン４１の内容が変更されたＥＬ素子２Ｊが作製される。このように、蛍光体シート８２が再利用される。 When changing the content of the pattern 41 in the EL element 2J, the phosphor sheet 82 is removed from the EL element 2J. When the phosphor sheet 82 is removed from the EL element 2J, a new EL light emission pattern sheet 81A is attached to the phosphor sheet 82 to produce a new EL light emission sheet 83A. Then, a new pattern 41 is formed on the EL light-emitting sheet 83 </ b> A with the penetrating liquid 42, and then the back electrode layer 24 is formed. Thereby, the EL element 2J in which the content of the pattern 41 is changed is manufactured. Thus, the phosphor sheet 82 is reused.
　第７の実施の形態のＥＬ素子２Ｊでは、浸透性基材２３にコンタクト層５３を介して液体遮断層９１を貼り付けているので、ＥＬ発光パターン用シート８１Ａの強度が大きくなっている。このため、パターン４１の内容を変更するためにＥＬ素子２Ｊから蛍光体シート８２を取り外す際、すなわち、ＥＬ素子２Ｊを蛍光体シート８２とＥＬ発光パターン用シート８１Ａとを分離する際、蛍光体シート８２の剥離が容易になる。 In the EL element 2J of the seventh embodiment, since the liquid blocking layer 91 is attached to the permeable base material 23 via the contact layer 53, the strength of the EL light emission pattern sheet 81A is increased. For this reason, when removing the phosphor sheet 82 from the EL element 2J in order to change the contents of the pattern 41, that is, when separating the EL element 2J from the phosphor sheet 82 and the EL light emission pattern sheet 81A, the phosphor sheet. 82 can be easily peeled off.
　ところで、発光層２２、誘電体浸透層２３ａ、コンタクト層５１，５３，９２には、ピンホールが存在していることがある。ピンホールが存在している層では、液体が浸透するおそれがある。 Incidentally, pinholes may exist in the light emitting layer 22, the dielectric permeation layer 23a, and the contact layers 51, 53, and 92. In a layer where pinholes are present, there is a risk of liquid penetration.
　これに対し、ＥＬ素子２Ｊでは、液体遮断層９１により、浸透液４２が発光層２２や前面電極層２１に到達することを防止できる。浸透液４２が発光層２２に到達すると、発光層２２が汚れ、蛍光体シート８２が再利用できなくなるおそれがある。また、浸透液４２が前面電極層２１にまで到達すると、ＥＬ素子２Ｊにおけるショート故障の発生や寿命の低下を招くおそれがある。ＥＬ素子２Ｊでは、これらの不都合を防止できる。 On the other hand, in the EL element 2J, the liquid blocking layer 91 can prevent the penetrating liquid 42 from reaching the light emitting layer 22 and the front electrode layer 21. When the penetrating liquid 42 reaches the light emitting layer 22, the light emitting layer 22 may become dirty and the phosphor sheet 82 may not be reused. Further, when the penetrating liquid 42 reaches the front electrode layer 21, there is a risk of causing a short circuit failure or shortening the life of the EL element 2J. The EL element 2J can prevent these disadvantages.
　なお、第７の実施の形態においても、第６の実施の形態と同様に、ＥＬ発光パターン用シート８１Ａの浸透性基材２３（誘電体浸透層２３ａの反対側の面）に浸透液４２を浸透させてパターン４１を形成し、背面電極層２４を形成した後、蛍光体シート８２をＥＬ発光パターン用シート８１Ａに貼り付けてもよい。 Also in the seventh embodiment, as in the sixth embodiment, the penetrating liquid 42 is applied to the penetrating base material 23 (surface opposite to the dielectric penetrating layer 23a) of the EL light emission pattern sheet 81A. After the penetration, the pattern 41 is formed, and the back electrode layer 24 is formed, the phosphor sheet 82 may be attached to the EL light emission pattern sheet 81A.
　また、第７の実施の形態においても、第５の実施の形態と同様に、パターン４１が形成された浸透性基材２３上にコンタクト層５１を形成し、その後、導電性ペースト、導電性ポリマー等をコンタクト層５１に塗布して乾燥させることで、背面電極層２４を形成してもよい。また、コンタクト層５１を介さずに、浸透性基材２３に直接、導電性ペースト、導電性ポリマー等を塗布して乾燥させることで、背面電極層２４を形成してもよい。 Also in the seventh embodiment, as in the fifth embodiment, the contact layer 51 is formed on the permeable substrate 23 on which the pattern 41 is formed, and then a conductive paste, a conductive polymer is formed. Etc. may be applied to the contact layer 51 and dried to form the back electrode layer 24. Alternatively, the back electrode layer 24 may be formed by applying a conductive paste, a conductive polymer, or the like directly to the permeable base material 23 without using the contact layer 51 and drying it.
［その他の実施の形態］
　上記のように、本発明は第１～第７の実施の形態によって記載したが、この開示の一部をなす論述および図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施の形態、実施例および運用技術が明らかとなろう。 [Other embodiments]
As described above, the present invention has been described according to the first to seventh embodiments. However, it should not be understood that the description and drawings constituting a part of this disclosure limit the present invention. From this disclosure, various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art.
　上述の各実施の形態では、分散型無機ＥＬ素子について説明したが、薄膜型無機ＥＬ素子にも本発明は適用可能である。 In each of the above-described embodiments, the dispersion-type inorganic EL element has been described. However, the present invention can also be applied to a thin-film inorganic EL element.
　また、各実施の形態のＥＬ素子２，２Ａ～２Ｊは、平面状に限らず、曲面状や、フレキシブルな形態に構成することができる。 In addition, the EL elements 2 and 2A to 2J of each embodiment can be configured not only in a planar shape but also in a curved surface shape or a flexible shape.
　また、第１～第３、第５～第７の実施の形態における浸透性基材２３として、油性インクにより予め印刷が施された紙等を用いてもよい。油性インクによる印刷が施されていても、浸透液４２は浸透性基材２３に浸透可能である。油性インクは絶縁性が高く、誘電率が浸透性基材２３と同程度であるため、前面電極層２１と背面電極層２４との間に交流電圧を印加しても、浸透性基材２３の油性インクによる印刷領域上では発光層２２内に電界が形成されず、発光は生じない。したがって、浸透性基材２３全体の図柄の中で、浸透液４２によるパターン４１が形成された領域のみを発光させることができる。 Further, as the permeable base material 23 in the first to third and fifth to seventh embodiments, paper or the like previously printed with oil-based ink may be used. Even if printing with oil-based ink is performed, the penetrating liquid 42 can penetrate the permeable base material 23. Since the oil-based ink has high insulation and has a dielectric constant similar to that of the permeable base material 23, even if an AC voltage is applied between the front electrode layer 21 and the back electrode layer 24, An electric field is not formed in the light emitting layer 22 on the print area of the oil-based ink, and no light emission occurs. Therefore, only the region where the pattern 41 by the penetrating liquid 42 is formed in the design of the entire permeable base material 23 can be caused to emit light.
　また、浸透性基材２３に保湿剤を保持させてもよい。保湿剤としては、例えば、ＰＶＡ、ポリアクリル酸塩、でんぷん、デキストリン、ゼラチン、寒天、ポリエチレンオキシド、ポリアクリルアミド、メチルセルロース、ソルビット、キシリトール、エリスリトール、マンニトール、ラクチトール、オリゴ糖アルコール、マルチトール、還元澱粉加水分解物、果糖、ブドウ糖、オリゴ糖、トレハロース、グリシンベタインを用いることができる。これらの保湿剤は、単独あるいは２種類以上の混合物として使用することができる。浸透性基材２３に保湿剤を保持させることで、浸透液４２として水性インク等の水分を含む液体を用いた場合に、浸透液４２の乾燥を防止できる。これにより、発光層２２の発光輝度の低下を防止できる。 Further, a humectant may be held on the permeable base material 23. Examples of the humectant include PVA, polyacrylate, starch, dextrin, gelatin, agar, polyethylene oxide, polyacrylamide, methylcellulose, sorbit, xylitol, erythritol, mannitol, lactitol, oligosaccharide alcohol, maltitol, reduced starch hydrolyzed Degradation products, fructose, glucose, oligosaccharides, trehalose, and glycine betaine can be used. These humectants can be used alone or as a mixture of two or more. By holding the moisturizing agent on the permeable base material 23, it is possible to prevent the penetration of the osmotic liquid 42 when a liquid containing water such as aqueous ink is used as the osmotic liquid 42. Thereby, the fall of the light emission luminance of the light emitting layer 22 can be prevented.
　また、各実施の形態のＥＬ素子２，２Ａ～２Ｊにおいて、導電率の異なる複数種類の液体を浸透液４２として用いてパターン４１を形成するようにしてもよい。例えば、水性インクの導電率を水溶性有機溶剤により調整して、導電率が互いに異なる複数種類の水性インクからなるインクセットを用意する。このインクセットを搭載した印刷装置による印刷により、各種の水性インクで複数のパターン４１を形成する。水性インクの導電率が大きいほど、パターン４１に対応するパターン対応部分４３の発光輝度が大きくなる。したがって、導電率の異なる複数種類の液体を浸透液４２として用いることで、ＥＬ素子２，２Ａ～２Ｊにおける表示内容の表現を多様化できる。 Further, in the EL elements 2, 2A to 2J of the respective embodiments, the pattern 41 may be formed by using a plurality of types of liquids having different conductivities as the penetrating liquid 42. For example, by adjusting the conductivity of the water-based ink with a water-soluble organic solvent, an ink set composed of a plurality of types of water-based inks having different conductivity is prepared. A plurality of patterns 41 are formed with various water-based inks by printing with a printing apparatus equipped with this ink set. The light emission luminance of the pattern corresponding portion 43 corresponding to the pattern 41 increases as the conductivity of the water-based ink increases. Therefore, by using a plurality of types of liquids having different conductivities as the penetrating liquid 42, it is possible to diversify the display contents of the EL elements 2, 2A to 2J.
　また、第７の実施の形態において、ＥＬ素子２Ｊの発光層２２とコンタクト層９２との間に、チタン酸バリウム粉末を含む誘電体層を設けてもよい。この場合、前面電極層２１と発光層２２との積層物である蛍光体シート８２の発光層２２上に、チタン酸バリウム粉末を含む誘電体層を形成する。具体的には、フッ化ビニリデン等のフッ素系樹脂を含むバインダーにチタン酸バリウム粉末を分散させたペーストを、発光層２２上に塗布することにより、チタン酸バリウム粉末を含む誘電体層を形成する。そして、図１９（ｂ）に示した工程において、チタン酸バリウム粉末を含む誘電体層上に、ＥＬ発光パターン用シート８１Ａを貼り付ける。その後、図１９（ｃ），（ｄ）の工程を行う。 In the seventh embodiment, a dielectric layer containing barium titanate powder may be provided between the light emitting layer 22 and the contact layer 92 of the EL element 2J. In this case, a dielectric layer containing barium titanate powder is formed on the light emitting layer 22 of the phosphor sheet 82 which is a laminate of the front electrode layer 21 and the light emitting layer 22. Specifically, a dielectric layer containing barium titanate powder is formed by applying a paste in which barium titanate powder is dispersed in a binder containing a fluorine-based resin such as vinylidene fluoride on the light emitting layer 22. . Then, in the step shown in FIG. 19B, an EL light emission pattern sheet 81A is bonded onto the dielectric layer containing the barium titanate powder. Thereafter, the steps of FIGS. 19C and 19D are performed.
　上記のように蛍光体シート８２の発光層２２上にチタン酸バリウム粉末を含む誘電体層を設けることで、ＥＬ素子２Ｊから蛍光体シート８２をより剥離しやすくすることができる。 As described above, by providing the dielectric layer containing the barium titanate powder on the light emitting layer 22 of the phosphor sheet 82, the phosphor sheet 82 can be more easily separated from the EL element 2J.
　また、第３の実施の形態およびその変形例１，２のＥＬ素子２Ｄ～２Ｆ、第５の実施の形態のＥＬ素子２Ｈ、第６の実施の形態のＥＬ素子２Ｉにおいて、発光層２２とコンタクト層５３との間に、チタン酸バリウム粉末を含む誘電体層を設けてもよい。これにより、発光層２２とコンタクト層５３とをより剥離しやすくすることができる。 Further, in the EL element 2D to 2F of the third embodiment and its modifications 1 and 2, the EL element 2H of the fifth embodiment, and the EL element 2I of the sixth embodiment, contact with the light emitting layer 22 A dielectric layer containing barium titanate powder may be provided between the layer 53 and the layer 53. Thereby, the light emitting layer 22 and the contact layer 53 can be more easily peeled off.
　また、各実施の形態のＥＬ素子２，２Ａ～２Ｊの製造時において、発光層２２を意図的に劣化させるエージング処理を行ってもよい。 Further, an aging process for intentionally degrading the light emitting layer 22 may be performed at the time of manufacturing the EL elements 2, 2A to 2J of the respective embodiments.
　例えば、第７の実施の形態のＥＬ素子２Ｊの製造時において、蛍光体シート８２にＥＬ発光パターン用シート８１Ａを貼りつける前に、蛍光体シート８２に対してエージング処理を行う。具体的には、金属板等からなるエージング処理用の背面電極層を用意し、この背面電極層上に、誘電体層を形成する。この誘電体層は、ＥＬ素子２Ｊのコンタクト層９２と同様に、流動性を有する高誘電率の誘電体からなる。そして、エージング処理用の背面電極層と誘電体層との積層物を、誘電体層側から蛍光体シート８２の発光層２２に貼り付ける。この際、蛍光体シート８２および背面電極層の全面に均一に高圧力を付与することで、発光層２２と誘電体層との間の気泡を抜くとともに、誘電体層の厚さを均一にする。 For example, at the time of manufacturing the EL element 2J of the seventh embodiment, the aging process is performed on the phosphor sheet 82 before the EL light emitting pattern sheet 81A is attached to the phosphor sheet 82. Specifically, a back electrode layer for aging treatment made of a metal plate or the like is prepared, and a dielectric layer is formed on the back electrode layer. Similar to the contact layer 92 of the EL element 2J, this dielectric layer is made of a high dielectric constant dielectric material having fluidity. Then, a laminate of the back electrode layer for aging treatment and the dielectric layer is attached to the light emitting layer 22 of the phosphor sheet 82 from the dielectric layer side. At this time, by uniformly applying a high pressure to the entire surface of the phosphor sheet 82 and the back electrode layer, air bubbles between the light emitting layer 22 and the dielectric layer are removed and the thickness of the dielectric layer is made uniform. .
　その後、蛍光体シート８２の前面電極層２１とエージング処理用の背面電極層との間に交流電圧を印加する。これにより、発光層２２が発光する。発光層２２の輝度が所望のレベルまで低下すると、交流電圧の印加を終了する。これにより、エージング処理が終了する。 Thereafter, an AC voltage is applied between the front electrode layer 21 of the phosphor sheet 82 and the back electrode layer for aging treatment. Thereby, the light emitting layer 22 emits light. When the luminance of the light emitting layer 22 decreases to a desired level, the application of the AC voltage is terminated. Thereby, an aging process is complete | finished.
　エージング処理が終了すると、エージング処理用の背面電極層および誘電体層を蛍光体シート８２から取り外す。なお、前述のように、蛍光体シート８２の発光層２２上に、チタン酸バリウム粉末を含む誘電体層を形成しておくと、エージング処理用の背面電極層および誘電体層をきれいに取り外すことができる。 When the aging process is completed, the back electrode layer and the dielectric layer for aging process are removed from the phosphor sheet 82. As described above, when the dielectric layer containing the barium titanate powder is formed on the light emitting layer 22 of the phosphor sheet 82, the back electrode layer and the dielectric layer for aging treatment can be removed cleanly. it can.
　その後、図１９（ｂ）～（ｄ）の工程を行うことで、ＥＬ素子２Ｊが完成する。なお、エージング処理用の背面電極層および誘電体層として、製品用の背面電極層２４およびコンタクト層５１を用いてもよい。 Thereafter, the EL element 2J is completed by performing the steps of FIGS. 19B to 19D. The back electrode layer 24 and the contact layer 51 for products may be used as the back electrode layer and the dielectric layer for aging treatment.
　上述のように、流動性を有する誘電体層を介してエージング処理用の背面電極層を発光層２２に貼り付けることで、エージング処理時の発光層２２の発光ムラが抑えられ、均一に発光層２２を劣化させることができる。 As described above, by sticking the back electrode layer for aging treatment to the light emitting layer 22 through the dielectric layer having fluidity, the light emission unevenness of the light emitting layer 22 during the aging treatment is suppressed, and the light emitting layer is uniformly formed. 22 can be deteriorated.
　エージング処理を行わずに、発光層２２をパターン４１に応じて発光させると、パターン対応部分４３が他の部分より劣化した状態となる。この場合、後にパターン４１を変更したときに、過去のパターン４１の残像により、発光が不均一になるおそれがある。エージング処理を行うことで、パターン４１を変更した場合に発光が不均一になることを抑制できる。 When the light emitting layer 22 is caused to emit light according to the pattern 41 without performing the aging process, the pattern corresponding portion 43 is deteriorated from the other portions. In this case, when the pattern 41 is changed later, there is a possibility that the light emission becomes non-uniform due to an afterimage of the past pattern 41. By performing the aging process, it is possible to suppress non-uniform light emission when the pattern 41 is changed.
　本発明はここでは記載していない様々な実施の形態等を含むことは勿論である。したがって、本発明の技術的範囲は上記の説明から妥当な特許請求の範囲に係る発明特定事項によってのみ定められるものである。 Of course, the present invention includes various embodiments not described herein. Therefore, the technical scope of the present invention is defined only by the invention specifying matters according to the scope of claims reasonable from the above description.

Claims (7)

  1. 　面状の一対の電極と、
    　前記一対の電極間に配置され、液体が浸透可能な空隙を有し、絶縁体からなり、当該絶縁体よりも誘電率が大きい誘電体または導体からなる浸透液が浸透することによりパターンが形成された浸透性基材と、
    　前記一対の電極のうちの一方の電極の前記浸透性基材側の面上に配置され、蛍光体を有し、前記パターンに対応する部分が発光する発光層と
    　を備えることを特徴とするＥＬ素子。     A pair of planar electrodes;
    A pattern is formed by penetrating a penetrating liquid, which is disposed between the pair of electrodes, has a gap through which liquid can permeate, is made of an insulator, and has a dielectric constant or a conductor having a higher dielectric constant than the insulator. A permeable substrate,
    An EL device, comprising: a light emitting layer disposed on a surface of the one of the pair of electrodes on the permeable substrate side, having a phosphor, and a portion corresponding to the pattern emitting light. element.
  2. 　前記浸透性基材と前記発光層との間に配置され前記浸透性基材および前記発光層と密着する誘電体からなる第１のコンタクト層、および前記浸透性基材と他方の電極との間に配置され前記浸透性基材および前記他方の電極と密着する誘電体または導体からなる第２のコンタクト層の少なくともいずれか一方を備えることを特徴とする請求項１に記載のＥＬ素子。 A first contact layer made of a dielectric material disposed between the permeable substrate and the light emitting layer and in close contact with the permeable substrate and the light emitting layer, and between the permeable substrate and the other electrode 2. The EL device according to claim 1, further comprising at least one of a second contact layer made of a dielectric or a conductor disposed in contact with the permeable base and the other electrode.
  3. 　絶縁体からなり、液体が浸透可能な浸透性基材と、
    　前記浸透性基材上に形成された誘電体からなるコンタクト層とを備え、
    　前記コンタクト層を形成する誘電体が前記浸透性基材の厚さ方向の一部に浸透していることを特徴とするＥＬ発光パターン用シート。     A permeable substrate made of an insulator and permeable to liquid;
    A contact layer made of a dielectric formed on the permeable substrate,
    An EL light emitting pattern sheet, wherein the dielectric forming the contact layer penetrates a part of the permeable substrate in the thickness direction.
  4. 　前記コンタクト層上に配置された、液体の通過を遮断する液体遮断層をさらに備えることを特徴とする請求項３に記載のＥＬ発光パターン用シート。 4. The EL light emitting pattern sheet according to claim 3, further comprising a liquid blocking layer disposed on the contact layer for blocking the passage of liquid.
  5. 　前面電極層上に蛍光体を含む発光層を形成し、蛍光体シートを作製する工程と、
    　絶縁体からなり、液体が浸透可能な浸透性基材上に、誘電体ペーストを塗布してコンタクト層を形成し、ＥＬ発光パターン用シートを作製する工程と、
    　前記蛍光体シートの前記発光層と前記ＥＬ発光パターン用シートの前記コンタクト層とを密着させて貼り合わせる工程と、
    　前記ＥＬ発光パターン用シートの前記浸透性基材に、前記浸透性基材より誘電率が大きい誘電体または導体からなる浸透液を浸透させて前記発光層の発光のパターンを形成する工程と、
    　前記パターンを形成する工程の後に、前記浸透性基材上に背面電極層を形成する工程と
    　を含むことを特徴とするＥＬ素子の製造方法。     Forming a light emitting layer containing a phosphor on the front electrode layer, and producing a phosphor sheet;
    A step of forming a contact layer by applying a dielectric paste on a permeable base material made of an insulator and allowing liquid to permeate, and producing an EL light emission pattern sheet;
    Attaching the light emitting layer of the phosphor sheet and the contact layer of the EL light emitting pattern sheet in close contact with each other;
    Infiltrating a penetrating liquid made of a dielectric or conductor having a dielectric constant larger than that of the permeable base material into the permeable base material of the EL light emitting pattern sheet to form a light emission pattern of the light emitting layer;
    And a step of forming a back electrode layer on the permeable substrate after the step of forming the pattern.
  6. 　前面電極層上に蛍光体を含む発光層を形成し、蛍光体シートを作製する工程と、
    　絶縁体からなり、液体が浸透可能な浸透性基材上に、誘電体ペーストを塗布して第１のコンタクト層を形成し、前記第１のコンタクト層上に液体の通過を遮断する液体遮断層を形成し、前記液体遮断層上に誘電体ペーストを塗布して第２のコンタクト層を形成し、ＥＬ発光パターン用シートを作製する工程と、
    　前記蛍光体シートの前記発光層と前記ＥＬ発光パターン用シートの前記第２のコンタクト層とを密着させて貼り合わせる工程と、
    　前記ＥＬ発光パターン用シートの前記浸透性基材に、前記浸透性基材より誘電率が大きい誘電体または導体からなる浸透液を浸透させて前記発光層の発光のパターンを形成する工程と、
    　前記パターンを形成する工程の後に、前記浸透性基材上に背面電極層を形成する工程と
    を含むことを特徴とするＥＬ素子の製造方法。     Forming a light emitting layer containing a phosphor on the front electrode layer, and producing a phosphor sheet;
    A liquid blocking layer that is made of an insulator and forms a first contact layer by applying a dielectric paste on a permeable base material into which liquid can permeate, and blocks the passage of liquid on the first contact layer. Forming a second contact layer by applying a dielectric paste on the liquid blocking layer to produce an EL light emitting pattern sheet;
    Attaching the light emitting layer of the phosphor sheet and the second contact layer of the EL light emitting pattern sheet in close contact with each other;
    Infiltrating a penetrating liquid made of a dielectric or conductor having a dielectric constant larger than that of the permeable base material into the permeable base material of the EL light emitting pattern sheet to form a light emission pattern of the light emitting layer;
    And a step of forming a back electrode layer on the permeable substrate after the step of forming the pattern.
  7. 　前面電極層上に、蛍光体を含む発光層を形成する工程と、
    　前記発光層上に、絶縁体からなる浸透層に前記浸透層より誘電率が大きい誘電体または導体からなる浸透液が浸透することにより前記発光層の発光のパターンが形成されたパターン層を形成する工程と、
    　前記パターン層を形成する工程の後に、前記発光層とは反対側の前記パターン層上に背面電極層を形成する工程と
    　を含むことを特徴とするＥＬ素子の製造方法。     Forming a light emitting layer containing a phosphor on the front electrode layer;
    On the light emitting layer, a pattern layer in which a light emitting pattern of the light emitting layer is formed by penetrating a penetrating liquid made of a dielectric or a conductor having a higher dielectric constant than the penetrating layer into the penetrating layer made of an insulator. Process,
    And a step of forming a back electrode layer on the pattern layer opposite to the light emitting layer after the step of forming the pattern layer.
PCT/JP2012/064467 2011-06-10 2012-06-05 El element, sheet for el emission pattern, and method for manufacturing el element WO2012169494A1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2011130436A JP2014157655A (en) 2011-06-10 2011-06-10 El element, el light-emitting device, and sheet
JP2011-130436 2011-06-10
JP2011-233641 2011-10-25
JP2011233641A JP2014157656A (en) 2011-10-25 2011-10-25 Method for manufacturing el element and light-emitting sheet for el
JP2011283082A JP2014157657A (en) 2011-12-26 2011-12-26 Method of manufacturing el element, and sheet for el light-emitting pattern
JP2011-283082 2011-12-26

Publications (1)

Publication Number Publication Date
WO2012169494A1 true WO2012169494A1 (en) 2012-12-13

Family

ID=47296057

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2012/064467 WO2012169494A1 (en) 2011-06-10 2012-06-05 El element, sheet for el emission pattern, and method for manufacturing el element

Country Status (1)

Country Link
WO (1) WO2012169494A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5666674B1 (en) * 2013-10-16 2015-02-12 株式会社Ｍｏデバイス Light emitting device, paper containing polyacid and method for producing the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197379A (en) * 2001-12-27 2003-07-11 Print Labo Kk Conductive material holding sheet and el light emitting device using it

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197379A (en) * 2001-12-27 2003-07-11 Print Labo Kk Conductive material holding sheet and el light emitting device using it

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5666674B1 (en) * 2013-10-16 2015-02-12 株式会社Ｍｏデバイス Light emitting device, paper containing polyacid and method for producing the same

Similar Documents

Publication Publication Date Title
TWI375845B (en) Electrophoresis display panel, method of manufacturing a electrophoresis display panel, and electrophoresis display unit
JP2007526389A5 (en)
JP4547433B2 (en) Electrophoretic display device and electronic apparatus
US20130143009A1 (en) Perspective film and preparing method thereof
CN103481587B (en) A kind of manufacture method of two-way perspective film
CN103348284A (en) Electrophoretic display device and method for producing same
EP1990207A1 (en) Printing method, printing apparatus, and printed document
WO2012169494A1 (en) El element, sheet for el emission pattern, and method for manufacturing el element
JP2006212501A (en) Liquid drop delivery apparatus, wiping method in liquid drop delivery apparatus, production method for electric optical apparatus, electric optical apparatus and electronic equipment
JP4912228B2 (en) Electronic device laminate
JP2014157657A (en) Method of manufacturing el element, and sheet for el light-emitting pattern
JP2014157656A (en) Method for manufacturing el element and light-emitting sheet for el
TW201408738A (en) Ink for inkjet and color filter and manufacturing method therefor, and color reflective display and manufacturing method therefor
JP2014157655A (en) El element, el light-emitting device, and sheet
JP2010276986A (en) Transparent substrate with color filter, information display panel with color filter, and method for manufacturing the substrate and the panel
JP2015194535A (en) Method for manufacturing reflection type display device
WO2006084081A3 (en) Display with self-illuminatable image and method for making the display substrate and for making the image
JP5757823B2 (en) Electrophoretic display sheet and electrophoretic display medium using the same
US20050133153A1 (en) Poster as well as methods and materials for its manufacturing
CN201784205U (en) Perspective sticker capable of displaying picture on both sides
JP5136614B2 (en) Microcapsule type electrophoretic display panel and manufacturing method thereof
JP2000193922A (en) Electronic device and its production
CN204870135U (en) Digital air brushing printing consumables
CN207946987U (en) A kind of three layer of five face label
US20070046197A1 (en) Customizable electroluminescent displays

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12796378

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12796378

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP