WO2012144762A3 - Uv 회전 몰딩기를 이용한 도전성 회로 인쇄 방법 - Google Patents

Uv 회전 몰딩기를 이용한 도전성 회로 인쇄 방법 Download PDF

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Publication number
WO2012144762A3
WO2012144762A3 PCT/KR2012/002733 KR2012002733W WO2012144762A3 WO 2012144762 A3 WO2012144762 A3 WO 2012144762A3 KR 2012002733 W KR2012002733 W KR 2012002733W WO 2012144762 A3 WO2012144762 A3 WO 2012144762A3
Authority
WO
WIPO (PCT)
Prior art keywords
conductive circuit
printing
molding machine
rotational molding
roll
Prior art date
Application number
PCT/KR2012/002733
Other languages
English (en)
French (fr)
Other versions
WO2012144762A2 (ko
Inventor
조명구
허지원
최철훈
유지강
김새미
Original Assignee
(주)뉴옵틱스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)뉴옵틱스 filed Critical (주)뉴옵틱스
Publication of WO2012144762A2 publication Critical patent/WO2012144762A2/ko
Publication of WO2012144762A3 publication Critical patent/WO2012144762A3/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G03F5/20—Screening processes; Screens therefor using screens for gravure printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1275—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by other printing techniques, e.g. letterpress printing, intaglio printing, lithographic printing, offset printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/0143—Using a roller; Specific shape thereof; Providing locally adhesive portions thereon

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Printing Methods (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

본 발명은 UV 회전 몰딩기를 이용한 도전성 회로 인쇄 방법에 관한 것으로서, 더욱 상세하게는 도전성 회로 인쇄 시, UV 임프린트와 그라비아 옵셋 공정을 롤투롤(Roll to Roll) 방식으로 수행함으로써 고밀도 및 고집적의 패턴 형성이 가능하고, 저가에 대량생산이 가능한 기술에 관한 것이다.
PCT/KR2012/002733 2011-04-21 2012-04-10 Uv 회전 몰딩기를 이용한 도전성 회로 인쇄 방법 WO2012144762A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110037401A KR101354972B1 (ko) 2011-04-21 2011-04-21 Ｕｖ 회전 몰딩기를 이용한 도전성 회로 인쇄 방법
KR10-2011-0037401 2011-04-21

Publications (2)

Publication Number Publication Date
WO2012144762A2 WO2012144762A2 (ko) 2012-10-26
WO2012144762A3 true WO2012144762A3 (ko) 2013-03-07

Family

ID=47042019

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/002733 WO2012144762A2 (ko) 2011-04-21 2012-04-10 Uv 회전 몰딩기를 이용한 도전성 회로 인쇄 방법

Country Status (2)

Country Link
KR (1) KR101354972B1 (ko)
WO (1) WO2012144762A2 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101582510B1 (ko) * 2015-04-16 2016-01-06 (주) 파루 롤투롤 그라비아 인쇄방식을 이용한 병렬 구조 투명발열체 제조 방법
KR101692066B1 (ko) 2016-06-03 2017-01-04 한국기계연구원 입체패턴 프린팅 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100645646B1 (ko) * 2005-04-12 2006-11-14 삼성전기주식회사 임프린트법을 이용한 인쇄회로기판의 제조방법
KR100957622B1 (ko) * 2009-09-07 2010-05-13 한국기계연구원 열형 롤 임프린팅과 패턴된 제판을 이용하는 인쇄장치, 이를 이용한 마이크로 마이크로 유체소자 및 센서용 필름 라미네이팅 장치 및 인쇄 방법
KR20100123973A (ko) * 2009-05-18 2010-11-26 삼성전자주식회사 컬러 필터, 그 제조 장치 및 그 제조 방법
KR101022015B1 (ko) * 2010-04-09 2011-03-16 한국기계연구원 열형 롤 임프린팅과 블레이드 코팅을 이용하는 필름제품 제조방법, 이를 이용한 보안 필름 및 필름 일체형 전기 소자

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101051447B1 (ko) 2010-10-26 2011-07-22 한국기계연구원 인쇄기반 금속 배선을 이용한 투명전극 제조 장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100645646B1 (ko) * 2005-04-12 2006-11-14 삼성전기주식회사 임프린트법을 이용한 인쇄회로기판의 제조방법
KR20100123973A (ko) * 2009-05-18 2010-11-26 삼성전자주식회사 컬러 필터, 그 제조 장치 및 그 제조 방법
KR100957622B1 (ko) * 2009-09-07 2010-05-13 한국기계연구원 열형 롤 임프린팅과 패턴된 제판을 이용하는 인쇄장치, 이를 이용한 마이크로 마이크로 유체소자 및 센서용 필름 라미네이팅 장치 및 인쇄 방법
KR101022015B1 (ko) * 2010-04-09 2011-03-16 한국기계연구원 열형 롤 임프린팅과 블레이드 코팅을 이용하는 필름제품 제조방법, 이를 이용한 보안 필름 및 필름 일체형 전기 소자

Also Published As

Publication number Publication date
KR20120119462A (ko) 2012-10-31
WO2012144762A2 (ko) 2012-10-26
KR101354972B1 (ko) 2014-02-20

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