WO2012141761A1 - Methods of making and using palladium alloys - Google Patents
Methods of making and using palladium alloys Download PDFInfo
- Publication number
- WO2012141761A1 WO2012141761A1 PCT/US2012/000088 US2012000088W WO2012141761A1 WO 2012141761 A1 WO2012141761 A1 WO 2012141761A1 US 2012000088 W US2012000088 W US 2012000088W WO 2012141761 A1 WO2012141761 A1 WO 2012141761A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- atomic percent
- gas
- alloy
- metal
- concentration
- Prior art date
Links
- 229910001252 Pd alloy Inorganic materials 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims description 54
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 44
- 239000007789 gas Substances 0.000 claims abstract description 43
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims abstract description 32
- 229910052805 deuterium Inorganic materials 0.000 claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 229910052796 boron Inorganic materials 0.000 claims abstract description 20
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 14
- 239000001301 oxygen Substances 0.000 claims abstract description 14
- 230000005684 electric field Effects 0.000 claims abstract description 6
- 230000005284 excitation Effects 0.000 claims abstract description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 27
- 239000000956 alloy Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 24
- 238000000576 coating method Methods 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 claims description 12
- 239000011888 foil Substances 0.000 claims description 12
- 239000003792 electrolyte Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-DYCDLGHISA-N deuterium hydrogen oxide Chemical compound [2H]O XLYOFNOQVPJJNP-DYCDLGHISA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 67
- 229910052739 hydrogen Inorganic materials 0.000 description 38
- 239000001257 hydrogen Substances 0.000 description 38
- 229910052763 palladium Inorganic materials 0.000 description 29
- 239000012528 membrane Substances 0.000 description 25
- 230000008569 process Effects 0.000 description 23
- 239000000463 material Substances 0.000 description 14
- 239000011162 core material Substances 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000005275 alloying Methods 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 7
- 239000010949 copper Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 238000001513 hot isostatic pressing Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000007772 electroless plating Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910000521 B alloy Inorganic materials 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000005098 hot rolling Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- -1 304S Chemical compound 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 229910002666 PdCl2 Inorganic materials 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 239000000292 calcium oxide Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 2
- 238000005097 cold rolling Methods 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005242 forging Methods 0.000 description 2
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000000462 isostatic pressing Methods 0.000 description 2
- 238000005372 isotope separation Methods 0.000 description 2
- 238000005272 metallurgy Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002940 palladium Chemical class 0.000 description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- 229910001948 sodium oxide Inorganic materials 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000001960 triggered effect Effects 0.000 description 2
- 239000010963 304 stainless steel Substances 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-VVKOMZTBSA-N Dideuterium Chemical compound [2H][2H] UFHFLCQGNIYNRP-VVKOMZTBSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910000655 Killed steel Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000979 O alloy Inorganic materials 0.000 description 1
- 229910021078 Pd—O Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- RZJQYRCNDBMIAG-UHFFFAOYSA-N [Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Zn].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn] Chemical class [Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Cu].[Zn].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Ag].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn].[Sn] RZJQYRCNDBMIAG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010622 cold drawing Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 150000001975 deuterium Chemical class 0.000 description 1
- 125000004431 deuterium atom Chemical group 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000016507 interphase Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000012771 pancakes Nutrition 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0223—Group 8, 9 or 10 metals
- B01D71/02231—Palladium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
- C01B3/503—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
- C01B3/505—Membranes containing palladium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
- C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
- C01B2203/0405—Purification by membrane separation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
Definitions
- the invention relates to energy generation using various palladium alloys and methods of making the palladium alloys.
- the alloys can also be used as hydrogen gas purification membrane and electrodes for electrochemical processes.
- a palladium alloy In a hydrogen gas purification membrane, a palladium alloy is used due to its high diffusivity and solubility of hydrogen. With impure hydrogen at the high pressure (P-high) side, hydrogen gas will diffuse through the palladium alloy membrane with area A to the low pressure (P-low) side.
- P-high high pressure
- P-low low pressure
- Permeation rate DxS[(P-high) l/2 -(P-low) l/2 ]/t equation A where t is the thickness of the membrane, and D and S are, respectively, the diffusion coefficient and the solubility of hydrogen atoms in the palladium alloy. Hydrogen gas dissolves in the metal as atoms according to the following equation:
- the typical operation temperature of the Pd membrane is between 350 to 550 degrees C to get high permeability of hydrogen or its isotopes. Other gases either dissolve very little or diffuse slowly in the membrane. They thus will be separated from the hydrogen by the membrane.
- the workhorse of the membrane material has been palladium with 23-25% silver by weight. This material exists as a single phase from room temperature to the highest operation temperature.
- US patents 6,764,561 and 7,381,368 disclose a two-phase palladium-boron alloy for this purpose. This material will undergo phase changes if operated between room temperature and 450 degrees C. Because different Pd-B phases have different lattice spacing, cycling between room temperature and high temperature will cause lattice misfit to grow and stress between the phases which will eventually leads to cracks of the membrane. This material can operate at lower temperature, say below 400 to 410 degrees C to avoid phase transformation, but this will lower its permeation rate, because the diffusion rate of hydrogen nucleus lowers with temperature, which lowers the membrane's efficiency. Furthermore, because of the concentration gradient of the hydrogen in the membrane from the high pressure side to the low pressure side, the relative amount of the two phases will vary across the thickness of the membrane. This causes additional stresses at the interphase of the two phases which may leads to cracks. Therefore, its usefulness as a hydrogen membrane material is limited.
- US patent 5,518,556 discloses a single phase boron-containing palladium or platinum alloy, but it was made by a chemical vapor deposition process and used as a hard coating for wear resistance purpose. It is not useful as a hydrogen permeation membrane.
- Patterson discloses an energy producing device using nickel coated on palladium on a plastic ball as a cathode in an electrolytic cell.
- the cell operates between room temperature and near 100 degrees C.
- Patterson claimed a nuclear reaction driven by a chemical process. It had at least two substantial deficiencies, namely:
- Hagelstein et al discloses an apparatus using deuterium and/or hydrogen deuterium in material such as palladium to generate energy from nuclear reaction. No palladium alloy composition is disclosed.
- the palladium alloys used in this invention are palladium added with boron, carbon, or oxygen, singly or in combination.
- concentration of oxygen as an alloying element in palladium ranges from about 0.01 atomic percent to about 1.0 atomic percent, and with a more preferred range from about 0.1 atomic percent to about 0.6 atomic percent.
- concentration of carbon as an alloying element in palladium ranges from 0.01 atomic percent to about 10.0 atomic percent, and with a more preferred range from about 0.1 atomic percent to about 5.0 atomic percent.
- the concentration of boron as an alloying element in palladium ranges from 0.01 atomic percent to about 20 atomic percent, and with a more preferred range from about 0.1 atomic percent to about 18 atomic percent.
- the preferred operating pressure is from about 0.1 atmospheres to about 1000 atmospheres, with a more preferred range of about 1 atmospheres to about 100 atmospheres at the operating condition.
- the preferred operating temperature for Pd- B, Pd-C and Pd-0 alloys are from about 400 to about 1065 degrees C, with a more preferred temperature range from about 450 to about 750 degrees C. These alloys all exist as single phase alloys at these operating temperatures and pressures.
- These alloys can be prepared as a coating on a suitable substrate by typical physical vapor deposition processes such as sputtering, ion plating, thermal evaporation techniques, and so on. It is preferred that the substrate have an orientation of the ⁇ 100 ⁇ plane being parallel to the substrate surface, so that the coating will also have the same preferred orientation.
- a wrought form of the alloys can be made by power metallurgy technique by first mixing powders of the various elements and going through a pressing, isostatic pressing and sintering process or a hot isostatic pressing process. This is followed by various metal-shaping processes such as hot forging or hot rolling. The alloys are then preferably annealed in a vacuum and quenched to room temperature.
- a suitable rolling schedule can be developed to produce foils with a preferred orientation of the ⁇ 100 ⁇ plane being parallel to the surface and the (100) direction being parallel to the rolling direction.
- the above mentioned palladium materials can be further alloyed with various oxides such as alumina, silicate, sodium oxide, calcium oxide, and so on. They are mechanically alloyed in powder form, then pressed and lightly sintered in a vacuum, or in hydrogen or deuterium gas, to achieve a porous structure of less than full density.
- the above mentioned palladium alloys in coating, foil or porous form can be used as the core material to generate energy or heat in a pressurized chamber filled with deuterium (D2) gas, hydrogen (H2) gas or their isotope (HD), singly or in combination, at the above mentioned pressure and temperature. Excess energy or heat can be generated and triggered by the application of electric field, magnetic field, ultrasonic excitation etc. to the core material.
- D2 deuterium
- H2 hydrogen
- HD isotope
- These palladium alloys in various forms can also be used as hydrogen permeation membranes, hydrogen isotope separation membrane, or electrodes in various forms.
- Excess heat or energy can also be generated by using the palladium alloys in various forms as a cathode with a counter electrode as an anode.
- the electrodes are placed in an electrolyte of deuterium water or heavy water (D20), or semi-heavy water (HDO).
- the electrolyte includes an ionic solution with substantial electrical conductivity.
- a voltage is applied across the electrodes to electrolyze the solution and generate deuterium or HD gases. These gasses dissolve into the palladium electrode and cause the electrode to generate excess heat or excess energy.
- a palladium and/or palladium alloys of this invention can be coated by electroplating, or by an electroless plating process, onto a wire core.
- the core may be of copper, a copper alloy such as CDA 725, or an austenitic stainless steel such as 304S, 309S or 316S.
- the wire core Before coating, the wire core is hard drawn to more than 90% reduction in diameter and then annealed to promote (100) fiber texture. After electroplating or electroless plating, the material is annealed in a vacuum at a suitable temperature to
- the palladium or palladium alloy should have a thickness of 1 or 2 microns, with (100) fibrous texture.
- FIG. 1 is a hydrogen permeation device.
- FIG. 2 is a deuterium gas charging and energy generation device.
- the palladium alloys used in this invention are palladium added with boron, carbon, or oxygen, singly or in combination.
- concentration of oxygen as an alloying element in palladium ranges from about 0.01 atomic percent to about 1.0 atomic percent, with a more preferred range from about 0.1 atomic percent to about 0.6 atomic percent.
- concentration of carbon as an alloying element in palladium ranges from 0.001 atomic percent to about 5.0 atomic percent, with a more preferred range from about 0.001 atomic percent to about 1.5 atomic percent.
- concentration of boron as an alloying element in palladium ranges from 0.01 atomic percent to about 20 atomic percent and with a more preferred range from about 0.1 atomic percent to about 18 atomic percent.
- the preferred operating pressure is from about 0.1 atmospheres to about 1000 atmospheres, with a more preferred range of about 1 atmospheres to about 100 atmospheres.
- the preferred operating temperature for Pd-B, Pd-C and Pd-O alloys are from about 400 to about 1065 degrees C, with a more preferred temperature range from about 450 to about 750 degrees C.
- the alloys all exist as a single phase at these operating temperatures and pressures.
- These alloys can be prepared as a coating on a suitable substrate by typical physical vapor deposition processes such as sputtering, ion plating, thermal evaporation techniques, and so on. It is preferred that the substrate have an orientation of the ⁇ 100 ⁇ plane being parallel to the substrate surface so that the coating will also have the same preferred orientation.
- a wrought form of the alloys can be made by power metallurgy technique by first mixing powders of the various elements and going through a pressing, isostatic pressing and sintering process or a hot isostatic pressing process. This is followed by various metal-shaping process such as hot forging or hot rolling. The alloys are then preferably annealed in a vacuum and quenched to room temperature.
- a suitable rolling schedule can be developed to produce foils with a preferred orientation of the ⁇ 100 ⁇ plane being parallel to the surface and the (100) direction being parallel to the rolling direction.
- the above mentioned palladium materials can be further alloyed with various oxides such as alumina, silicate, sodium oxide, calcium oxide, and so on. They are mechanically alloyed in powder form, then pressed and lightly sintered in a vacuum, or in hydrogen or deuterium gas, to achieve a porous structure of less than full density.
- oxides such as alumina, silicate, sodium oxide, calcium oxide, and so on. They are mechanically alloyed in powder form, then pressed and lightly sintered in a vacuum, or in hydrogen or deuterium gas, to achieve a porous structure of less than full density.
- the above mentioned palladium alloys in coating, foil or porous form can be used as the core material to generate energy or heat in a pressurized chamber filled with deuterium (D2) gas, hydrogen (H2) gas or their isotope (HD), singly or in combination at the above mentioned pressure and temperature. Excess energy or heat can be generated and triggered by the application of electric field, magnetic field, ultrasonic excitation etc. to the core material.
- D2 gas deuterium
- H2 gas or their isotope (HD) singly or in combination at the above mentioned pressure and temperature. Excess energy or heat can be generated and triggered by the application of electric field, magnetic field, ultrasonic excitation etc. to the core material.
- These palladium alloys in various forms can also be used as hydrogen permeation membranes, hydrogen isotope separation membranes, or electrodes in
- Excess heat or energy can also be generated by using the palladium alloys in various forms as a cathode with a counter electrode as an anode.
- the electrodes are placed in an electrolyte of deuterium water or heavy water (D20), or semi-heavy water (HDO).
- the electrolyte includes an ionic solution with substantial electrical conductivity.
- a voltage is applied across the electrodes to electrolyze the solution and generate deuterium or HD gases. These gasses dissolve into the palladium electrode and cause the electrode to generate excess heat or excess energy.
- the palladium and/or palladium alloys of this invention can be coated by electroplating, or by an electroless plating process, onto a wire core.
- the core may be of copper, a copper alloy such as CDA 725, 99.99% purity nickel, nickel 200, or an austenitic stainless steel such as 304S, 309S or 316S.
- the wire core is hard drawn to more than 90% reduction in diameter and then annealed to promote (100) fiber texture. After electroplating or electroless plating, the material is annealed in a vacuum at a suitable temperature to
- the palladium or palladium alloy should have a thickness of 1 or 2 microns, with (100) fibrous texture.
- the wrought form of the palladium alloy of the current invention one can use a powder metallurgy technique such as pressing and sintering.
- a more preferred method is hot isostatic pressing using powders of the alloying elements of 99.99% purity.
- Oxygen can be added as oxide, such as the oxides of boron, silicon, aluminum, sodium, calcium, and so on.
- the powders are first thoroughly mixed in a vacuum at 100 to 200 degrees C. They are then put in a can and sealed.
- the can is made from 1010 plain carbon steel, extra low carbon killed steel, or 304 stainless steel.
- Hot Isostatic Pressing (HIP) is done by argon at a pressure of 10,000 to 30,000 psi and a temperature of 1100 to 1200 degrees C for one hour, or until full density and homogeneous microstructure is achieved.
- the typical shape is either a billet form for rolling into foil, a rod form for drawing into wires, or a pancake form for a sputtering target.
- the HIPed ingot goes through a series of hot rolling and cold rolling process, with more than 90% thickness reduction in the cold rolling process preferred, followed by final anneal at 900 to 1000 degrees C for an hour in a vacuum.
- the ingot is then quenched to room temperature, with the resulting foil having a (100) preferred orientation and a single phase.
- the resulting foil has high mechanical strength because of the alloying content. This offers the opportunity to produce a foil of reduced thickness for use as a hydrogen purification membrane.
- the hydrogen permeation rate is higher, according to equation A before.
- impure hydrogen gas is the feed material. It has a pressure in the 3 to 7 bar range and an operating temperature of 300 to 600 degrees C.
- the standard membrane material is palladium with 23 to 25 % by weight of silver.
- the membrane has a thickness of about 25 microns. Too thick a membrane will reduce the permeation rate at any given temperature. Too thin a layer will be too fragile to withstand the pressure differential and is liable to facture.
- Palladium with boron, oxygen and carbon at low concentration is the preferred way to strengthen the membrane, because solid solution strengthening by interstitial atoms is much more effective than a substitutional solid solution hardening alloy (such as Pd-23 to25 % Ag). Further, a single phase alloy operating at 410 degrees C or above is preferred. This avoids phase changes at the operating temperature and the resulting stress generated due to different lattice spacing for different phases.
- cold argon or nitrogen is used to flush the hydrogen out of the gas tubes and to quench the Pd membrane to room temperature.
- Suitable substrates include oxygen free high conductivity copper, 99.99% purity nickel, nickel 200, cupronickel 70/30, tin bronzes (CDA902 through 917), aluminum bronze (CDA952 through 958), stainless steel 304S, 309S and 316S, and so on, provided that the substrates are made with a (100) preferred orientation.
- the substrate is in a strip form with one or 2 cm in width. It is
- the sputtering process can be further improved by a reactive sputtering process.
- deuterium gas and/or deuterium hydrogen gas is fed into the sputtering chamber at a partial pressure of 0.1 to 5x10 "3 torr.
- Argon is present with a partial pressure at 1 to 3xl0 "3 torr.
- the residual gas pressure is 5xl0 "5 torr.
- the preferred thickness of the coating is from 0.5 to about 3 microns, with a more preferred range of 1 to 2 microns.
- the preferred deposition rate is 0.5 nm/sec or less, with a deposition rate of 0.3 microns/sec or less more preferred.
- the palladium alloy coating will take on the preferred orientation (100) of the substrate.
- the same substrate mentioned above can also be used as a substrate for thermal evaporation of palladium and boron simultaneously in a vacuum chamber.
- the chamber is equipped with a high temperature effusion cell to evaporate palladium onto the substrate. It also is equipped with an electron gun to evaporate the boron onto the substrate.
- a flux monitor can be used to feedback control the effusion cell and the electron gun energy for the proper ratio of boron and palladium on the substrate.
- the substrate can be further heated by a boron nitride heater to a temperature of 800 to 900 degrees C.
- the temperature of the substrate can be monitored by an optical pyrometer.
- the typical vacuum pressure is between 10 "7 to 10 "9 torr.
- the preferred deposition rate is 0.1 nm/sec.
- the preferred thickness is from about 0.1 to about 5 microns, with a more preferred thickness of 1 to 3 microns.
- Deuterium and or deuterium hydrogen gases can be fed into the chamber during deposition.
- the gas can be in molecular form or in atomic form.
- Atomic form is produced by first feeding molecular gas through a hot tungsten filament to dissociate the deuterium molecule. The deuterium atoms are then directed at the substrate.
- partial pressure of the atomic deuterium can be between 10 " to 10 " torr.
- the substrate can be rotating at between 1 to 60 rpm , with 20 to 30 rpm preferred.
- the substrate is quenched with nitrogen or argon to cool the coated part to room temperature rapidly.
- a staring material of 99.99% purity copper is melted in a vacuum furnace and cast into a water-chilled graphite mold to make a copper bar of 9 mm in diameter.
- This bar is machined to 8 mm diameter and sent through a multi-pass drawing process to reduce its diameter to 0.4 mm or 400 microns, followed by an anneal at 450 degrees C for half an hour in a vacuum.
- X-ray diffraction done on the 0.4 mm diameter copper wire shows a major fiber texture of (200) with a minor texture of (1 11) near the middle of the wire.
- This wire is further degreased, cleaned and pickled in dilute hydrochloric acid, and then rinsed in DI water and dried by filtered hot air. It then is immersed in electroplating bath of the following composition: 3.7 gm/1 of PdCl 2 , 100 gm/1 of Na 2 HP0 4 12H 2 0, 20 gm/1 of (NH 4 ) 2 HP0 4 and 2.5 gm 1 of benzoic acid with balance D 2 0 or heavy water. After dissolving the salts, the bath is heated up to the boiling point to form the palladium complex. The pH of the bath is adjusted with
- ammonium hydroxide to between 6 - 7.
- the copper wire is made into a cathode, with a DC power supply and a current density of 10 mA per cm 2 , to plate 5 microns thickness of palladium at 40 to 50 degrees C.
- X-ray diffraction of the Pd coated Cu wire shows (200) as the dominant peak of Pd. This indicates that the electroplated Pd has a major texture in (200).
- the wire is further draw down through successive smaller diameter dies to a final gauge of 25 microns in diameter, followed by cleaning, degreasing and acid pickling. It is then annealed at 450 degrees C for half an hour, then at 850 degrees C for one hour, in a vacuum.
- This Pd coated wire is put into a pressure chamber.
- the chamber is filled with deuterium gas at 50 bars. Electric voltage is applied at two ends of the wire to pass sufficient current to heat up the wire to 450 degrees C. Heat is generated at a rate substantially higher than the resistance heating by the current passed through the wire.
- copper wire is made to a final gage of 50 microns, then cleaned and annealed in a vacuum at 450 degrees C for half an hour. It is then electroless palladium plated in a bath of the following composition: PdCl 2 4.0gm/liter, NH 4 OH 0.6M, Trimethyamine borate 2.5gm/liter,
- Mercaptobenzothiazole 3.5 mg/liter, with the balance of deuterium oxide or heavy water with pH at 1 1 and temperature 45 degrees C.
- the bath has a plating rate of 1.6 to 1.8 microns per hour. Plating time is approximately one hour.
- the Pd coated wire is then put into a chamber pressurized to 50 bar with a 50:50 mixture of deuterium gas(D 2 ) and HD.
- An electric current is then passed through the wire to heat up the wire, at a heating rate not more than 15 degrees C per minute, to 900 degrees C.
- the wire stays at 900 degrees C for one hour.
- the electric current is then reduced to cool the wire to 500 degrees C.
- the current is feed-back controlled by a temperature sensing device to keep the temperature of the wire between 500 and 650 degrees C. Heat is generated at a rate substantially higher than the resistant heating by the electrical current passed through the wire.
- This example is similar to Examples 1 and 2, but the starting wire material is 316SVM.
- This is an austenitic grade stainless steel. It has a typical composition in weight % as follows: Carbon 0.03% max, Manganese 2.0%, Chromium 16 to 18%, Nickel 10 to 14%, Molybdenum 2 to 3%.
- a clean grade is preferred, preferably using VIM (vacuum induction melting) or ESR (electroslag remelt) to minimize sulfur and phosphorus content.
- the ingot is in bar form. It goes through successive wire drawing process with cold reduction of 90% or higher to a final gauge of 50 microns.
- An intermediate anneal before the last cold drawing is acceptable. Both the intermediate anneal and the final anneal are done at 1 150 degrees C for an hour in a vacuum, followed by a quench to room temperature to preserve the austenitic micro structure and the face centered cubic lattice with dominant (100) fibrous texture.
- the same process of Examples 1 and 2 can be followed to electroplate palladium to 2 microns thickness, with (100) preferred orientation.
- 0.5 micron of electroless deposition may be accomplished with a borated bath with a palladium- boron alloy, having a boron content of about 10 atomic %.
- Example 1 and 2 The same procedure as in Example 1 and 2 is then used.
- the Pa coated stainless steel wire is pressurized in deuterium or deuterium hydrogen (HD) gas at 500 to 650 degrees C while a DC electric field of about 100 volts is applied across the 10 cm long wire with about 4 amperes of current flowing through the wire. Heat is generated at a substantially higher rate than the resistant heating by the applied voltage and the resultant current.
- HD deuterium or deuterium hydrogen
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
A gas, comprising deuterium gas (D2), hydrogen gas (H2), or a gas of their isotope (HD), singly or in combination, is dissolved into a metal comprising an alloy of palladium with boron, carbon, oxygen, or any combination thereof. The temperature is about 400°C to about 1065°C, and the gas pressure is about 0.1 atmospheres to about 1000 atmospheres. The metal consists of a single phase. An electric field, magnetic field, or ultrasonic excitation is applied to the metal.
Description
METHODS OF MAKING AND USING PALLADIUM ALLOYS
BACKGROUND OF THE INVENTION
The invention relates to energy generation using various palladium alloys and methods of making the palladium alloys. The alloys can also be used as hydrogen gas purification membrane and electrodes for electrochemical processes.
In a hydrogen gas purification membrane, a palladium alloy is used due to its high diffusivity and solubility of hydrogen. With impure hydrogen at the high pressure (P-high) side, hydrogen gas will diffuse through the palladium alloy membrane with area A to the low pressure (P-low) side. The following equation describes the permeation phenomenon:
Permeation rate = DxS[(P-high)l/2-(P-low)l/2]/t equation A where t is the thickness of the membrane, and D and S are, respectively, the diffusion coefficient and the solubility of hydrogen atoms in the palladium alloy. Hydrogen gas dissolves in the metal as atoms according to the following equation:
H2 --> 2H+ + 2e~ equation B where a hydrogen molecule dissociates in metal into two hydrogen nuclei (each a proton with a nuclear spin of quantum number 1) and two electrons, which join the valance electrons of the host lattice. The same equations also apply to other hydrogen isotopes such as deuterium and tritium.
The typical operation temperature of the Pd membrane is between 350 to 550 degrees C to get high permeability of hydrogen or its isotopes. Other gases either dissolve very little or diffuse slowly in the membrane. They thus will be separated from the hydrogen by the membrane.
The workhorse of the membrane material has been palladium with 23-25% silver by weight. This material exists as a single phase from room temperature to the highest operation temperature.
US patents 6,764,561 and 7,381,368 disclose a two-phase palladium-boron alloy for this purpose. This material will undergo phase changes if operated between room temperature and 450 degrees C. Because different Pd-B phases have different lattice spacing, cycling between room temperature and high temperature will cause lattice misfit to grow and stress between the phases which will eventually leads to cracks of the membrane. This material can operate at lower temperature, say below 400 to 410 degrees C to avoid phase transformation, but this will lower its permeation rate, because the diffusion rate of hydrogen nucleus lowers with temperature, which lowers the membrane's efficiency. Furthermore, because of the concentration gradient of the hydrogen in the membrane from the high pressure side to the low pressure side, the relative amount of the two phases will vary across the thickness of the membrane. This causes additional stresses at the interphase of the two phases which may leads to cracks. Therefore, its usefulness as a hydrogen membrane material is limited.
US patent 5,518,556 discloses a single phase boron-containing palladium or platinum alloy, but it was made by a chemical vapor deposition process and used as a hard coating for wear resistance purpose. It is not useful as a hydrogen permeation membrane.
In WO 98/03699, Patterson discloses an energy producing device using nickel coated on palladium on a plastic ball as a cathode in an electrolytic cell. The cell operates between room temperature and near 100 degrees C. Patterson claimed a nuclear reaction driven by a chemical process. It had at least two substantial deficiencies, namely:
1) The coefficient of thermal expansion between the plastic and the metal coatings are at least an order of magnitude different. This causes stresses between
the coating layers and the core of plastic ball. Repeated temperature changes of the metal coated ball will cause the coating to flake off and will stop the energy generation process.
2) The electrolytic process was done in aqueous solutions. This limits its temperature to about the boiling point of the solution, or about 100 degrees C. A chemical process normally is a function of temperature: the higher the temperature, the higher the reaction rate. Limiting the operating temperature to about 100 degrees C means a low reaction rate and low efficiency system.
In US 2003/0230481 Al, Miley discloses an improved version of the above mentioned WO 98/03699 by Patterson, but the essential deficiencies of WO
98/03699 were still there.
In US 2009/0086877 Al, Hagelstein et al discloses an apparatus using deuterium and/or hydrogen deuterium in material such as palladium to generate energy from nuclear reaction. No palladium alloy composition is disclosed.
SUMMARY OF THE INVENTION
The palladium alloys used in this invention are palladium added with boron, carbon, or oxygen, singly or in combination. The concentration of oxygen as an alloying element in palladium ranges from about 0.01 atomic percent to about 1.0 atomic percent, and with a more preferred range from about 0.1 atomic percent to about 0.6 atomic percent. The concentration of carbon as an alloying element in palladium ranges from 0.01 atomic percent to about 10.0 atomic percent, and with a more preferred range from about 0.1 atomic percent to about 5.0 atomic percent. The concentration of boron as an alloying element in palladium ranges from 0.01 atomic percent to about 20 atomic percent, and with a more preferred range from about 0.1 atomic percent to about 18 atomic percent.
The preferred operating pressure is from about 0.1 atmospheres to about 1000 atmospheres, with a more preferred range of about 1 atmospheres to about 100 atmospheres at the operating condition. The preferred operating temperature for Pd- B, Pd-C and Pd-0 alloys are from about 400 to about 1065 degrees C, with a more preferred temperature range from about 450 to about 750 degrees C. These alloys all exist as single phase alloys at these operating temperatures and pressures.
By applying an electric potential across the palladium alloy in various forms in the presence of deuterium gas, deuterium hydrogen or other deuterium isotope gases at the above mentioned temperature and pressure, substantial heat is generated in addition to the energy generated by resistance heating caused by an electric current passing through the alloy.
These alloys can be prepared as a coating on a suitable substrate by typical physical vapor deposition processes such as sputtering, ion plating, thermal evaporation techniques, and so on. It is preferred that the substrate have an orientation of the { 100} plane being parallel to the substrate surface, so that the coating will also have the same preferred orientation.
A wrought form of the alloys can be made by power metallurgy technique by first mixing powders of the various elements and going through a pressing, isostatic pressing and sintering process or a hot isostatic pressing process. This is followed by various metal-shaping processes such as hot forging or hot rolling. The alloys are then preferably annealed in a vacuum and quenched to room temperature.
For palladium alloys of a foil form, a suitable rolling schedule can be developed to produce foils with a preferred orientation of the { 100} plane being parallel to the surface and the (100) direction being parallel to the rolling direction. The above mentioned palladium materials can be further alloyed with various oxides such as alumina, silicate, sodium oxide, calcium oxide, and so on. They are mechanically alloyed in powder form, then pressed and lightly sintered in a vacuum,
or in hydrogen or deuterium gas, to achieve a porous structure of less than full density.
The above mentioned palladium alloys in coating, foil or porous form can be used as the core material to generate energy or heat in a pressurized chamber filled with deuterium (D2) gas, hydrogen (H2) gas or their isotope (HD), singly or in combination, at the above mentioned pressure and temperature. Excess energy or heat can be generated and triggered by the application of electric field, magnetic field, ultrasonic excitation etc. to the core material.
These palladium alloys in various forms can also be used as hydrogen permeation membranes, hydrogen isotope separation membrane, or electrodes in
electrochemical cells.
Excess heat or energy can also be generated by using the palladium alloys in various forms as a cathode with a counter electrode as an anode. The electrodes are placed in an electrolyte of deuterium water or heavy water (D20), or semi-heavy water (HDO). The electrolyte includes an ionic solution with substantial electrical conductivity. A voltage is applied across the electrodes to electrolyze the solution and generate deuterium or HD gases. These gasses dissolve into the palladium electrode and cause the electrode to generate excess heat or excess energy.
Furthermore, a palladium and/or palladium alloys of this invention can be coated by electroplating, or by an electroless plating process, onto a wire core. The core may be of copper, a copper alloy such as CDA 725, or an austenitic stainless steel such as 304S, 309S or 316S.
Before coating, the wire core is hard drawn to more than 90% reduction in diameter and then annealed to promote (100) fiber texture. After electroplating or electroless plating, the material is annealed in a vacuum at a suitable temperature to
recrystallize the grain. It is then further hard drawn to gauge with more than 90% reduction. A final wire diameter of 25 to about 50 microns is preferred. The
palladium or palladium alloy should have a thickness of 1 or 2 microns, with (100) fibrous texture.
BRIEF DESCRIPION OF THE DRAWINGS FIG. 1 is a hydrogen permeation device.
FIG. 2 is a deuterium gas charging and energy generation device.
DETAILED DESCRIPTION
The palladium alloys used in this invention are palladium added with boron, carbon, or oxygen, singly or in combination. The concentration of oxygen as an alloying element in palladium ranges from about 0.01 atomic percent to about 1.0 atomic percent, with a more preferred range from about 0.1 atomic percent to about 0.6 atomic percent. The concentration of carbon as an alloying element in palladium ranges from 0.001 atomic percent to about 5.0 atomic percent, with a more preferred range from about 0.001 atomic percent to about 1.5 atomic percent. The
concentration of boron as an alloying element in palladium ranges from 0.01 atomic percent to about 20 atomic percent and with a more preferred range from about 0.1 atomic percent to about 18 atomic percent.
The preferred operating pressure is from about 0.1 atmospheres to about 1000 atmospheres, with a more preferred range of about 1 atmospheres to about 100 atmospheres. The preferred operating temperature for Pd-B, Pd-C and Pd-O alloys are from about 400 to about 1065 degrees C, with a more preferred temperature range from about 450 to about 750 degrees C. The alloys all exist as a single phase at these operating temperatures and pressures. By applying an electric potential across the palladium alloy in various forms in the presence of deuterium gas, deuterium hydrogen or other deuterium isotope gases at
the above mentioned temperature and pressure, substantial heat is generated in addition to the energy generated by resistance heating.
These alloys can be prepared as a coating on a suitable substrate by typical physical vapor deposition processes such as sputtering, ion plating, thermal evaporation techniques, and so on. It is preferred that the substrate have an orientation of the { 100} plane being parallel to the substrate surface so that the coating will also have the same preferred orientation.
A wrought form of the alloys can be made by power metallurgy technique by first mixing powders of the various elements and going through a pressing, isostatic pressing and sintering process or a hot isostatic pressing process. This is followed by various metal-shaping process such as hot forging or hot rolling. The alloys are then preferably annealed in a vacuum and quenched to room temperature.
For palladium alloys of a foil form, a suitable rolling schedule can be developed to produce foils with a preferred orientation of the { 100} plane being parallel to the surface and the (100) direction being parallel to the rolling direction.
The above mentioned palladium materials can be further alloyed with various oxides such as alumina, silicate, sodium oxide, calcium oxide, and so on. They are mechanically alloyed in powder form, then pressed and lightly sintered in a vacuum, or in hydrogen or deuterium gas, to achieve a porous structure of less than full density.
The above mentioned palladium alloys in coating, foil or porous form can be used as the core material to generate energy or heat in a pressurized chamber filled with deuterium (D2) gas, hydrogen (H2) gas or their isotope (HD), singly or in combination at the above mentioned pressure and temperature. Excess energy or heat can be generated and triggered by the application of electric field, magnetic field, ultrasonic excitation etc. to the core material.
These palladium alloys in various forms can also be used as hydrogen permeation membranes, hydrogen isotope separation membranes, or electrodes in
electrochemical cells.
Excess heat or energy can also be generated by using the palladium alloys in various forms as a cathode with a counter electrode as an anode. The electrodes are placed in an electrolyte of deuterium water or heavy water (D20), or semi-heavy water (HDO). The electrolyte includes an ionic solution with substantial electrical conductivity. A voltage is applied across the electrodes to electrolyze the solution and generate deuterium or HD gases. These gasses dissolve into the palladium electrode and cause the electrode to generate excess heat or excess energy.
Furthermore, the palladium and/or palladium alloys of this invention can be coated by electroplating, or by an electroless plating process, onto a wire core. The core may be of copper, a copper alloy such as CDA 725, 99.99% purity nickel, nickel 200, or an austenitic stainless steel such as 304S, 309S or 316S. Before coating, the wire core is hard drawn to more than 90% reduction in diameter and then annealed to promote (100) fiber texture. After electroplating or electroless plating, the material is annealed in a vacuum at a suitable temperature to
recrystallize the grain. It is then further hard drawn to gauge with more than 90% reduction. The final wire diameter of 25 to about 50 microns is preferred. The palladium or palladium alloy should have a thickness of 1 or 2 microns, with (100) fibrous texture.
To make the wrought form of the palladium alloy of the current invention, one can use a powder metallurgy technique such as pressing and sintering. A more preferred method is hot isostatic pressing using powders of the alloying elements of 99.99% purity. Oxygen can be added as oxide, such as the oxides of boron, silicon, aluminum, sodium, calcium, and so on.
The powders are first thoroughly mixed in a vacuum at 100 to 200 degrees C. They are then put in a can and sealed. The can is made from 1010 plain carbon steel, extra
low carbon killed steel, or 304 stainless steel. Hot Isostatic Pressing (HIP) is done by argon at a pressure of 10,000 to 30,000 psi and a temperature of 1100 to 1200 degrees C for one hour, or until full density and homogeneous microstructure is achieved. The typical shape is either a billet form for rolling into foil, a rod form for drawing into wires, or a pancake form for a sputtering target.
For foils, the HIPed ingot goes through a series of hot rolling and cold rolling process, with more than 90% thickness reduction in the cold rolling process preferred, followed by final anneal at 900 to 1000 degrees C for an hour in a vacuum. The ingot is then quenched to room temperature, with the resulting foil having a (100) preferred orientation and a single phase. The resulting foil has high mechanical strength because of the alloying content. This offers the opportunity to produce a foil of reduced thickness for use as a hydrogen purification membrane. The hydrogen permeation rate is higher, according to equation A before.
In a typical hydrogen purification membrane as depicted in FIG. 1 , impure hydrogen gas is the feed material. It has a pressure in the 3 to 7 bar range and an operating temperature of 300 to 600 degrees C. The standard membrane material is palladium with 23 to 25 % by weight of silver. The membrane has a thickness of about 25 microns. Too thick a membrane will reduce the permeation rate at any given temperature. Too thin a layer will be too fragile to withstand the pressure differential and is liable to facture.
Palladium with boron, oxygen and carbon at low concentration is the preferred way to strengthen the membrane, because solid solution strengthening by interstitial atoms is much more effective than a substitutional solid solution hardening alloy (such as Pd-23 to25 % Ag). Further, a single phase alloy operating at 410 degrees C or above is preferred. This avoids phase changes at the operating temperature and the resulting stress generated due to different lattice spacing for different phases.
During shut down of the hydrogen purification device, cold argon or nitrogen is used to flush the hydrogen out of the gas tubes and to quench the Pd membrane to room temperature.
The same HIP process described in the previous paragraph can also be used to make sputtering targets and to coat the palladium alloy onto suitable substrates. Suitable substrates include oxygen free high conductivity copper, 99.99% purity nickel, nickel 200, cupronickel 70/30, tin bronzes (CDA902 through 917), aluminum bronze (CDA952 through 958), stainless steel 304S, 309S and 316S, and so on, provided that the substrates are made with a (100) preferred orientation. Preferably, the substrate is in a strip form with one or 2 cm in width. It is
continuously fed into a sputtering machine through a series of load locks, and palladium alloys are continuously sputtered onto the substrate.
The sputtering process can be further improved by a reactive sputtering process. In this reactive sputtering process, deuterium gas and/or deuterium hydrogen gas is fed into the sputtering chamber at a partial pressure of 0.1 to 5x10"3 torr. Argon is present with a partial pressure at 1 to 3xl0"3 torr. The residual gas pressure is 5xl0"5 torr.
The preferred thickness of the coating is from 0.5 to about 3 microns, with a more preferred range of 1 to 2 microns. The preferred deposition rate is 0.5 nm/sec or less, with a deposition rate of 0.3 microns/sec or less more preferred. The palladium alloy coating will take on the preferred orientation (100) of the substrate.
The same substrate mentioned above can also be used as a substrate for thermal evaporation of palladium and boron simultaneously in a vacuum chamber. The chamber is equipped with a high temperature effusion cell to evaporate palladium onto the substrate. It also is equipped with an electron gun to evaporate the boron onto the substrate. A flux monitor can be used to feedback control the effusion cell and the electron gun energy for the proper ratio of boron and palladium on the substrate.
The substrate can be further heated by a boron nitride heater to a temperature of 800 to 900 degrees C. The temperature of the substrate can be monitored by an optical pyrometer. The typical vacuum pressure is between 10"7 to 10"9 torr. The preferred deposition rate is 0.1 nm/sec. The preferred thickness is from about 0.1 to about 5 microns, with a more preferred thickness of 1 to 3 microns.
Deuterium and or deuterium hydrogen gases can be fed into the chamber during deposition. The gas can be in molecular form or in atomic form. Atomic form is produced by first feeding molecular gas through a hot tungsten filament to dissociate the deuterium molecule. The deuterium atoms are then directed at the substrate. The
8 3
partial pressure of the atomic deuterium can be between 10" to 10" torr.
The substrate can be rotating at between 1 to 60 rpm , with 20 to 30 rpm preferred.
After deposition, the substrate is quenched with nitrogen or argon to cool the coated part to room temperature rapidly.
It is understood that whenever the word " hydrogen" or "deuterium", it means hydrogen nucleus, atom, or molecules or deuterium nucleus, atom or molecules or their isotopes as the case may be.
EXAMPLES
Example 1
A process to make palladium coated copper wire will be described here first.
A staring material of 99.99% purity copper is melted in a vacuum furnace and cast into a water-chilled graphite mold to make a copper bar of 9 mm in diameter. This bar is machined to 8 mm diameter and sent through a multi-pass drawing process to reduce its diameter to 0.4 mm or 400 microns, followed by an anneal at 450 degrees
C for half an hour in a vacuum. X-ray diffraction done on the 0.4 mm diameter copper wire shows a major fiber texture of (200) with a minor texture of (1 11) near the middle of the wire.
This wire is further degreased, cleaned and pickled in dilute hydrochloric acid, and then rinsed in DI water and dried by filtered hot air. It then is immersed in electroplating bath of the following composition: 3.7 gm/1 of PdCl2, 100 gm/1 of Na2HP04 12H20, 20 gm/1 of (NH4)2HP04 and 2.5 gm 1 of benzoic acid with balance D20 or heavy water. After dissolving the salts, the bath is heated up to the boiling point to form the palladium complex. The pH of the bath is adjusted with
ammonium hydroxide to between 6 - 7.
The copper wire is made into a cathode, with a DC power supply and a current density of 10 mA per cm2, to plate 5 microns thickness of palladium at 40 to 50 degrees C. X-ray diffraction of the Pd coated Cu wire shows (200) as the dominant peak of Pd. This indicates that the electroplated Pd has a major texture in (200). The wire is further draw down through successive smaller diameter dies to a final gauge of 25 microns in diameter, followed by cleaning, degreasing and acid pickling. It is then annealed at 450 degrees C for half an hour, then at 850 degrees C for one hour, in a vacuum.
This Pd coated wire is put into a pressure chamber. The chamber is filled with deuterium gas at 50 bars. Electric voltage is applied at two ends of the wire to pass sufficient current to heat up the wire to 450 degrees C. Heat is generated at a rate substantially higher than the resistance heating by the current passed through the wire.
Example 2
In the same process as in Example 1, copper wire is made to a final gage of 50 microns, then cleaned and annealed in a vacuum at 450 degrees C for half an hour. It
is then electroless palladium plated in a bath of the following composition: PdCl2 4.0gm/liter, NH4OH 0.6M, Trimethyamine borate 2.5gm/liter,
Mercaptobenzothiazole 3.5 mg/liter, with the balance of deuterium oxide or heavy water with pH at 1 1 and temperature 45 degrees C. The bath has a plating rate of 1.6 to 1.8 microns per hour. Plating time is approximately one hour.
The Pd coated wire is then put into a chamber pressurized to 50 bar with a 50:50 mixture of deuterium gas(D2) and HD. An electric current is then passed through the wire to heat up the wire, at a heating rate not more than 15 degrees C per minute, to 900 degrees C. The wire stays at 900 degrees C for one hour. The electric current is then reduced to cool the wire to 500 degrees C. The current is feed-back controlled by a temperature sensing device to keep the temperature of the wire between 500 and 650 degrees C. Heat is generated at a rate substantially higher than the resistant heating by the electrical current passed through the wire.
Example 3
This example is similar to Examples 1 and 2, but the starting wire material is 316SVM. This is an austenitic grade stainless steel. It has a typical composition in weight % as follows: Carbon 0.03% max, Manganese 2.0%, Chromium 16 to 18%, Nickel 10 to 14%, Molybdenum 2 to 3%. A clean grade is preferred, preferably using VIM (vacuum induction melting) or ESR (electroslag remelt) to minimize sulfur and phosphorus content.
The ingot is in bar form. It goes through successive wire drawing process with cold reduction of 90% or higher to a final gauge of 50 microns. An intermediate anneal before the last cold drawing is acceptable. Both the intermediate anneal and the final anneal are done at 1 150 degrees C for an hour in a vacuum, followed by a quench to room temperature to preserve the austenitic micro structure and the face centered cubic lattice with dominant (100) fibrous texture.
Subsequently, the same process of Examples 1 and 2 can be followed to electroplate palladium to 2 microns thickness, with (100) preferred orientation. 0.5 micron of electroless deposition may be accomplished with a borated bath with a palladium- boron alloy, having a boron content of about 10 atomic %. An amorphous structure is produced. This is followed by an anneal at 950 degrees C for one hour in a vacuum to homogenize and recrystallize into a single phase, followed by a quench to room temperature. This produces a single phase Pd-B alloy.
The same procedure as in Example 1 and 2 is then used. The Pa coated stainless steel wire is pressurized in deuterium or deuterium hydrogen (HD) gas at 500 to 650 degrees C while a DC electric field of about 100 volts is applied across the 10 cm long wire with about 4 amperes of current flowing through the wire. Heat is generated at a substantially higher rate than the resistant heating by the applied voltage and the resultant current.
REFERENCES CITED
U.S. PATENT DOCUMENTS
5,518, 556 5/1996 Weber et al.
2003/0159922 A 1 8/2003 Miley 2003/0230481 Al 12/2003 Miley .
6,764,561 7/2004 Miles et al
7,381 ,368 6/2008 Miles et al.
2009/0086877 Al 4/2009 Hagelstein et al.
FOREIGN PATENT DOCUMENTS
WO 99/19881 4/1999 Patterson et al.
OTHER PUBLICATIONS G. Alefeld and J. Volkl (editors), Hydrogen in Metals, Part I: Basic Properties, Springer- Verlag, 1978
G. Alefeld and J. Volkl (editors), Hydrogen in Metals, part II: Application-Oriented Properties, Springer- Verlag, 1978
G. Alefeld and J. Volkl (editors), Hydrogen in Metals, Part III: Properties and Applications, Springer- Verlag, 1997
Y. Fukai, The Metal-Hydrogen System: Basic Bulk Properties, 2nd Edition, Springer,
2010
Edmund Storms, The Science of Low Energy Nuclear Reaction: a Comprehensive Compilation of Evidence and Explanation About Cold Fusion, World Scientific,
2007
Jan Marwan and Steven Krivit (editors), Low-Energy Nuclear Reactions
Sourcebook, American Chemical Society Symposium Series 998, 2008, Oxford University Press
Jan Marwan and Steven Krivit (editors), Low-Energy Nuclear Reactions and New Energy Technologies Sourcebook Vol. 2, American Chemical Society Series 1029, 2009, Oxford University Press
Claims
(1) the gas or the metal has a temperature of about 450°C to about
750°C; and
(2) the gas has a pressure of about 0.1 atmospheres to about 1000
atmospheres; and
iii) applying an electric field, magnetic field, or ultrasonic excitation to the metal. 9) The method of Claim 8, wherein boron is present in the alloy in a concentration of about 0.01 atomic percent to about 20 atomic percent.
10) The method of Claim 8, wherein carbon is present in the alloy a concentration of about 0.01 atomic percent to about 10 atomic percent.
1 1) The method of Claim 8, wherein oxygen is present in the alloy in a concentration of about 0.01 atomic percent to about 1.0 atomic percent.
12) The method of Claim 8, wherein boron is present in the alloy in a concentration of about 0.1 atomic percent to about 18 atomic percent;
13) The method of Claim 8, wherein carbon is present in the alloy a concentration of about 0.1 atomic percent to about 5.0 atomic percent. 14) The method of Claim 8, wherein oxygen is present in the alloy in a concentration of about 0.1 atomic percent to about 0.6 atomic percent.
15) The method of any of Claims 1 to 14, wherein the metal comprises:
a) a foil; or
b) a porous structure of less than full density.
16) The method of any of Claims 1 to 14, wherein the metal comprises a coating on a substrate.
17) The method of Claim 16, wherein:
a) the substrate comprises a wire having a diameter of about 25 microns to about 50 microns;
b) the coating has a thickness of about 1 micron to about 2 microns
c) the coating has (100) fibrous texture. 18) A method of electrolyzing an electrolyte, wherein:
a) the electrolyte comprises:
i) heavy water (D20), water (H20), or semi-heavy water (HDO), singly or in combination; and
ii) an ionic solution with substantial electrical conductivity; and wherein b) the method comprises:
i) placing the metal of any of Claims 1 to 4, as a cathode, in the electrolyte; ii) providing a counter electrode as an anode; and
iii) applying a voltage across the electrodes.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161463489P | 2011-02-16 | 2011-02-16 | |
US61/463,489 | 2011-02-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012141761A1 true WO2012141761A1 (en) | 2012-10-18 |
Family
ID=47009625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2012/000088 WO2012141761A1 (en) | 2011-02-16 | 2012-02-15 | Methods of making and using palladium alloys |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW201250058A (en) |
WO (1) | WO2012141761A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3766997A1 (en) * | 2019-07-18 | 2021-01-20 | The Swatch Group Research and Development Ltd | Method for manufacturing precious metal alloys and precious metal alloys thus obtained |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3709810A (en) * | 1970-09-30 | 1973-01-09 | Gen Electric | Hydrogen ion selective sensor and electrode therefor |
US6426158B1 (en) * | 2000-07-20 | 2002-07-30 | Motorola, Inc. | Method of diluting hydrogen gas exhausted from a fuel cell |
US6682817B1 (en) * | 1999-06-02 | 2004-01-27 | Saes Getters S.P.A. | Composite materials capable of hydrogen sorption comprising palladium and methods for the production thereof |
US20040036168A1 (en) * | 1996-10-15 | 2004-02-26 | Bedinger John M. | Hydrogen gettering system |
US6764561B1 (en) * | 2000-05-19 | 2004-07-20 | The United States Of America As Represented By The Secretary Of The Navy | Palladium-boron alloys and methods for making and using such alloys |
US20060024193A1 (en) * | 2004-07-30 | 2006-02-02 | General Electric Company | Material for storage and production of hydrogen, and related methods and apparatus |
US20060088138A1 (en) * | 2004-04-07 | 2006-04-27 | Andre Jouanneau | Method and apparatus for the generation and the utilization of plasma solid |
US20060108457A1 (en) * | 2002-08-16 | 2006-05-25 | Pratt Allin S | Reactive milling process for the manufacture of a hydrogen storage alloy |
-
2012
- 2012-02-15 WO PCT/US2012/000088 patent/WO2012141761A1/en active Application Filing
- 2012-02-15 TW TW101104871A patent/TW201250058A/en unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3709810A (en) * | 1970-09-30 | 1973-01-09 | Gen Electric | Hydrogen ion selective sensor and electrode therefor |
US20040036168A1 (en) * | 1996-10-15 | 2004-02-26 | Bedinger John M. | Hydrogen gettering system |
US6682817B1 (en) * | 1999-06-02 | 2004-01-27 | Saes Getters S.P.A. | Composite materials capable of hydrogen sorption comprising palladium and methods for the production thereof |
US6764561B1 (en) * | 2000-05-19 | 2004-07-20 | The United States Of America As Represented By The Secretary Of The Navy | Palladium-boron alloys and methods for making and using such alloys |
US6426158B1 (en) * | 2000-07-20 | 2002-07-30 | Motorola, Inc. | Method of diluting hydrogen gas exhausted from a fuel cell |
US20060108457A1 (en) * | 2002-08-16 | 2006-05-25 | Pratt Allin S | Reactive milling process for the manufacture of a hydrogen storage alloy |
US20060088138A1 (en) * | 2004-04-07 | 2006-04-27 | Andre Jouanneau | Method and apparatus for the generation and the utilization of plasma solid |
US20060024193A1 (en) * | 2004-07-30 | 2006-02-02 | General Electric Company | Material for storage and production of hydrogen, and related methods and apparatus |
Also Published As
Publication number | Publication date |
---|---|
TW201250058A (en) | 2012-12-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Cheng et al. | Corrosion-resistant high-entropy alloy coatings: a review | |
Safizadeh et al. | Electrocatalysis developments for hydrogen evolution reaction in alkaline solutions–a review | |
Rajak et al. | Critical overview of coatings technology for metal matrix composites | |
Guo et al. | The evolution of microstructure and electrical performance in doped Mn-Co and Cu-Mn oxide layers with the extended oxidation time | |
Ma et al. | Hot corrosion of a novel NiO/NiFe2O4 composite coating thermally converted from the electroplated Ni–Fe alloy | |
Qi et al. | Characteristics of tungsten coatings deposited by molten salt electro-deposition and thermal fatigue properties of electrodeposited tungsten coatings | |
WO1990015415A1 (en) | Improvements in materials | |
Lu et al. | Corrosion mechanism of Ni deposits on magnets by pulse current electro-deposition | |
CN112592183B (en) | Preparation method of Zr-Al-C series MAX phase ceramic powder product | |
CN107130242B (en) | The surface treatment method of the based high-temperature alloy containing ferrochrome and the part of based high-temperature alloy containing ferrochrome | |
Wang et al. | Hydrogen interaction characteristics of a Cr2O3Y2O3 coating formed on stainless steel in an ultra-low oxygen environment | |
WO2012141761A1 (en) | Methods of making and using palladium alloys | |
Zhong et al. | Enhanced degradability of Mg-2Gd alloy by alloying Cu | |
CN109778251B (en) | Preparation method of composite coating structure and composite coating structure obtained by same | |
CN109385566B (en) | High-strength high-wear-resistance multi-principal-element alloy coating material for PVD (physical vapor deposition) and preparation method thereof | |
NO166541B (en) | MATERIAL FOR REVERSIBLE HYDROGEN STORAGE. | |
CN102673040B (en) | Cu-Ni functionally gradient material and preparation method thereof | |
US6764561B1 (en) | Palladium-boron alloys and methods for making and using such alloys | |
Dou et al. | Electrochemical preparation of the Fe-Ni36 Invar alloy from a mixed oxides precursor in molten carbonates | |
Chen et al. | Recent progress of thick tungsten coating prepared by chemical vapor deposition as the plasma-facing material | |
CN112176372B (en) | Method for preparing cobalt-tantalum alloy coating at low temperature by taking cobalt dichloride and tantalum pentachloride as raw materials | |
Cui et al. | Preparation of iridium‑hafnium intermetallic compound coatings in molten salts | |
CN114808041A (en) | Preparation and activation regeneration method of Pb-based pseudomorphic stable anode for manganese electrodeposition | |
CN114015903A (en) | Preparation method of high-porosity black porous metal film | |
Chen et al. | Electrolytic reduction of Gd2O3-ZnO in NaCl-CaCl2 Molten Salt |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12771175 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 12771175 Country of ref document: EP Kind code of ref document: A1 |