WO2012092689A1 - 铁电分析装置及其调节铁电畴极化反转速度的方法 - Google Patents

铁电分析装置及其调节铁电畴极化反转速度的方法 Download PDF

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WO2012092689A1
WO2012092689A1 PCT/CN2011/000578 CN2011000578W WO2012092689A1 WO 2012092689 A1 WO2012092689 A1 WO 2012092689A1 CN 2011000578 W CN2011000578 W CN 2011000578W WO 2012092689 A1 WO2012092689 A1 WO 2012092689A1
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ferroelectric
polarization inversion
variable resistor
voltage
polarization
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French (fr)
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江安全
刘骁兵
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Fudan University
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Fudan University
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Priority to US13/387,044 priority patent/US9354192B2/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/041Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • G01R27/26Measuring inductance or capacitance; Measuring quality factor, e.g. by using the resonance method; Measuring loss factor; Measuring dielectric constants ; Measuring impedance or related variables
    • G01R27/2617Measuring dielectric properties, e.g. constants
    • G01R27/2623Measuring-systems or electronic circuits

Definitions

  • the invention belongs to the technical field of solid point dielectric performance testing, and relates to a ferroelectric analysis device for a ferroelectric thin film, and a method for adjusting a ferroelectric domain polarization reversal speed using the ferroelectric analysis device. Background technique
  • the dielectric is characterized by the action and influence of the external electric field signal transmitted, stored or recorded in an electrode-forming manner in which the center of gravity of the positive and negative charges does not coincide. Therefore, the dielectric constant is the most basic parameter characterizing the dielectric.
  • Ferroelectrics are a special class of dielectric materials with large dielectric constants, strong nonlinear effects, high spontaneous polarization, and significant temperature dependence and frequency dependence. Ferroelectric thin films based on ferroelectric materials have been widely used in recent years in ferroelectric random read memories (FeRAM), dynamic random read memories (DRAM), uncooled infrared detectors, thin film dielectric capacitors, electric field modulated microwave devices, AC electroluminescent devices and film sensors.
  • a ferroelectric thin film for example, in a ferroelectric capacitor formed based on a ferroelectric thin film, when an applied electric field direction is different from a domain direction, if a voltage at which the applied electric field is generated is larger than a coercive voltage (V c ) of the ferroelectric thin film, iron The domain will move, that is, the polarization of the ferroelectric domain is reversed, and the velocity of the ferroelectric domain reflects the rate of polarization inversion, which is proportional to the polarization inversion current.
  • V c coercive voltage
  • an applied electric field is achieved by a voltage pulse.
  • Prior art ferroelectric analyzers are capable of testing various performance parameters of ferroelectric thin films, such as residual polarization charge and polarization inversion speed.
  • it is usually achieved by changing the height of the voltage pulse (i.e., the magnitude of the voltage biased on the ferroelectric film). This is because during the polarization inversion process, the required charge is equal to the integration of the current flowing through the ferroelectric shield film over time, and the voltage change causes the current to change, which in turn leads to a cumulative change in the required charge, thereby adjusting the iron. Domain polarization inversion speed.
  • the method for adjusting the polarization reversal speed of the ferroelectric domain of the existing ferroelectric analyzer needs to constantly change the shape of the voltage pulse during the adjustment process, the process is complicated and the voltage pulse generating device of the ferroelectric analyzer is required. At the same time, since the range of variation of the voltage pulse is easily limited by the instrument and equipment, it is difficult to achieve a wide range of adjustment of the polarization inversion of the ferroelectric domain.
  • One of the objects of the present invention is to provide a ferroelectric analyzer and a method thereof in which the ferroelectric domain polarization inversion speed is easily adjusted.
  • Another object of the present invention is to adjust the coercive voltage while adjusting the polarization inversion speed.
  • a ferroelectric analysis apparatus comprising: a voltage pulse generator for generating a square wave voltage pulse signal, the square wave voltage pulse The signal is biased on the ferroelectric thin film to cause polarization inversion of the ferroelectric domain, and the ferroelectric analysis device further includes a variable resistor connected in series with the ferroelectric thin film, the variable resistor being used for adjusting the pole The current is reversed to achieve adjustment of the polarization inversion of the ferroelectric domain.
  • the ferroelectric analysis apparatus further includes signal acquisition means for collecting signals from both ends of the variable resistor.
  • the signal acquisition device is an oscilloscope.
  • the acquired signal includes a voltage platform height biased on the variable resistor during the polarization inversion and/or a time during which the polarization is reversed.
  • variable resistor has a resistance range of substantially 1 ohm to 10 9 ohms.
  • the polarization inversion current is calculated by the following relation:
  • I sw is the polarization inversion current
  • V is the voltage height of the square wave voltage pulse
  • V e is the coercive voltage
  • R t is the total resistance of the loop
  • R 2 is the resistance of the variable resistor R is a resistor in series with R 2 including the internal resistance of the voltage pulse generator.
  • the charge required for the polarization inversion is calculated by the following relationship: where 1 is the polarization inversion current and Q sw is the charge required for the polarization inversion.
  • the ferroelectric thin film is before the square wave voltage pulse signal is biased
  • the pre-polarization of the ferroelectric domain is achieved by biasing the preset pulse signal.
  • the preset pulse signal is opposite in polarity to the square wave voltage pulse signal.
  • the polarization inversion current is calculated by the following relationship:
  • 1 is the polarization inversion current
  • V is the voltage height of the square wave voltage pulse
  • V e is the coercive voltage
  • R t is the total resistance of the loop
  • R 2 is the resistance of the variable resistor.
  • R 2 is a resistor in series with R 2 including the internal resistance of the voltage pulse generator.
  • the ferroelectric analysis apparatus further includes a signal acquisition device for acquiring signals from both ends of the variable resistor;
  • the signal acquired by the signal acquisition device includes a voltage platform height biased on the variable resistor during the polarization inversion and/or a time at which the polarization is reversed.
  • the polarization inversion current l sw is calculated by dividing the height of the voltage platform on the variable resistor by the resistance of the variable resistor, and further, the coercive voltage of the ferroelectric thin film passes The following relationship is calculated:
  • 1 is the polarization inversion current
  • V is the voltage height of the square wave voltage pulse
  • V e is the coercive voltage
  • R t is the total resistance of the loop
  • R 2 is the resistance of the variable resistor. , the resistor in series with the internal resistance of the voltage pulse generator.
  • the technical effect of the present invention is to adjust the polarization inversion current by increasing the variable resistance, thereby adjusting the movement speed of the ferroelectric domain, that is, the speed of polarization inversion; and adjusting the polarization speed
  • the coercive voltage V c of the ferroelectric shield film can also be adjusted; therefore, the ferroelectric analyzer provided by the present invention does not depend on the voltage pulse signal generating device when adjusting the polarization inversion of the ferroelectric domain. Easy to adjust continuously and wide adjustment range, reliable test data.
  • FIG. 1 is a schematic structural view of a ferroelectric analysis device according to an embodiment of the present invention
  • FIG. 2 is a schematic view showing another structural example of the ferroelectric analysis device shown in FIG. 1 in a specific application;
  • Fig. 3 is a view showing the result of a change in the polarization inversion speed of the device shown in Fig. 2 as a function of the resistance of the variable resistor.
  • FIG. 1 is a schematic structural diagram of the ferroelectric analyzing apparatus according to an embodiment of the provided embodiment of the invention.
  • the ferroelectric thin film forms a ferroelectric capacitor 300 as shown in Fig.
  • the ferroelectric capacitor 300 may be a sample of Pt/Ir0 2 /Pb ( Zr 0 . 4 Ti 0 . 6 ) 0 3 (PZT)/Ir0 2 /Pt/Si structure, ferroelectric thin film (Pb (Zro)
  • the thickness of 4 Tio.6 ) 0 3 ) is about 140 nm, and the electrode area is about l.Ox lO— 4 cm 2 .
  • the ferroelectric analysis apparatus 100 mainly includes a voltage pulse generation module U0 and a variable resistor 130 connected in series to an input terminal or an output terminal of the voltage pulse generation module 110 (in this example, 1 1 1 is an output terminal, 1 13 For the input, the variable resistor 130 is connected in series to the input).
  • the voltage pulse generating module 110 is configured to generate a square wave voltage pulse signal. When the voltage pulse signal is biased to the ferroelectric capacitor, the ferroelectric thin film can be subjected to polarization inversion of the ferroelectric domain under the electric field generated by the voltage pulse. .
  • the specific shape of the voltage pulse signal is not limited by the embodiment of the present invention.
  • the voltage height of the square wave voltage pulse signal, the voltage platform width, the voltage polarity and the like may be set according to predetermined requirements.
  • the voltage The pulse generation module 1 10 can use an Agilent 81 150A arbitrary waveform generator that can be programmed to generate voltage pulses of a predetermined shape.
  • the ferroelectric capacitor 300 to be tested is electrically connected in series between the input terminal and the output terminal of the voltage pulse generating module 110. Therefore, the output voltage pulse signal can be biased to the iron of the ferroelectric capacitor 300.
  • a variable resistor 130 is also connected in series between the ferroelectric capacitor 300 and the voltage pulse generating module 110. Therefore, the voltage pulse signal is simultaneously biased on the variable resistor 130 and the ferroelectric capacitor 300.
  • the variable resistor 130 and the ferroelectric capacitor 300 form an RC circuit.
  • the voltage pulse signal is also biased to its internal resistance.
  • the initially formed ferroelectric capacitor 300 has been subjected to a preset pulse to form a ferroelectric domain (for example, when it is applied to ferroelectric storage, it has been preprogrammed to a "0" state or a "1" state), and is variable.
  • the set resistance value of the resistor 130 is.
  • the square wave voltage pulse generating module 110 outputs a voltage pulse signal (for example, the voltage height is V, and the voltage platform width is T).
  • the voltage V is greater than the coercive voltage V c of the ferroelectric thin film and The polarity is opposite to the preset pulse.
  • the integral of the required charge is equal to, that is: Current.
  • I sw is the polarization inversion current
  • V is the voltage amplitude of the square wave voltage pulse
  • v c is the coercive voltage
  • R t is the total resistance of the loop.
  • R t is the sum of the internal resistance of the variable resistor R 2 and the voltage pulse generating module.
  • the RC circuit can also be connected with other resistance basic fixed resistors or equivalent resistors in series, it also represents the sum of the internal resistance of the voltage pulse generating module and other series resistances.
  • the charge Q sw required for the ferroelectric domain polarization inversion of the ferroelectric thin film is substantially constant. Therefore, when 1 ⁇ changes, it can be known from the relation (1) that the time required for polarization inversion can be changed, that is, the speed of polarization inversion can be changed.
  • I sw can be adjusted to adjust the ferroelectric domain polarization inversion of the ferroelectric capacitor.
  • Speed for the same square wave voltage pulse, the same R 2 value, in polarization
  • the coercive voltage V c during the inversion is substantially constant).
  • the variable resistor 300 can be continuously adjusted within a certain resistance range, the polarization inversion speed can also be continuously adjusted, that is, the continuous adjustment of the ferroelectric domain motion speed is realized.
  • the resistance of the variable resistor 300 may range from about 1 ohm to about 10 9 ohms.
  • the ferroelectric analysis device can further determine P sw by the following relation (3):
  • P sw is the polarization inversion value
  • S is the ferroelectric capacitance area, that is, the area of the ferroelectric thin film
  • Q sw is the charge required for polarization inversion
  • FIG. 2 is a schematic view showing still another structural example of the ferroelectric analysis device shown in FIG. 1 in a specific application.
  • a signal acquisition device for collecting electrical signals from both ends of the variable resistor 130 is added.
  • the signal acquisition device is At the oscilloscope 150, at this time, the relationship (2) is still substantially equal to the internal resistance of the voltage pulse generating module 110 (because the internal resistance of the oscilloscope 150 is much larger than R 2 ).
  • the oscilloscope 150 is connected in parallel to both ends of the variable resistor 130, so that the voltage across the variable resistor during the test can be recorded, and the polarization of the voltage waveform can be acquired or read out by recognizing the change of the height of the voltage waveform before and after the polarization inversion is completed.
  • the height of the voltage platform placed on the variable resistor 130 during the inversion process (ie, (V - VJ minus the voltage biased by the internal resistance of the system), and can be read by biasing the voltage biased across the variable resistor 130
  • the width of the voltage step generated during the movement of the domain over time identifies the polarization inversion time or the domain motion time t (in some ferroelectric capacitance samples, the polarization inversion time is calculated by t Therefore, 1 ⁇ in relation (2) is obtained by dividing the height of the collected voltage platform by its resistance value (R 2 ).
  • the polarization inversion time t obtained by the acquisition is applied. The calculated 1 ⁇ can be calculated.
  • Fig. 3 is a view showing the result of a change in the polarization inversion speed of the device shown in Fig. 2 as a function of the resistance of the variable resistor.
  • the variable resistor 300 has a curve obtained by varying 100 ohms, kilo ohms, 10,000 ohms, 100,000 ohms, 1 million ohms, and 10 million ohms.
  • the voltage across the variable resistor 300 is at a residence time t 2 of about 0.5 V, that is, the time of polarization inversion is t 2 ;
  • Square wave voltage pulse shape The shape is fixed, and the resistance value of the variable resistor is constant at 1 kilo ohm. Therefore, the coercive voltage V c does not change; the voltage across the variable resistor 300 (0.5 V ) is divided by the resistance of the variable resistor 300.
  • the value (1 kohm) can basically obtain the polarization inversion current I sw ; further through the relation (2), the corresponding V c can be obtained at this time.
  • variable resistor 300 When the variable resistor 300 is otherwise, the corresponding polarization inversion currents I sw and V c can be obtained in the same manner. Thus, not only it can be seen from the figure as the variable resistor 300 increases, the polarization inversion slow, but may also find V c changes. From this, it can be seen that by adjusting the resistance of the variable resistor, not only the polarization inversion speed but also the coercive voltage V c of the ferroelectric thin film can be adjusted.
  • the adjustment range of the resistor can be set large (for example, spanning 9 orders of magnitude), unlike the height of the square wave voltage pulse, the range of the height is easily limited by the pulse generator (the height of the pulse should not be too large), The polarization inversion speed can be adjusted in a wider range.
  • the ferroelectric analysis device has a large measuring range and reliable test data.
  • the ferroelectric analysis device of the present invention can realize continuous adjustment of the polarization inversion speed of the ferroelectric domain, that is, by adjusting the resistance value of the variable resistor, the polarization inversion speed of the ferroelectric domain can be adjusted and simultaneously
  • the coercive voltage V c of the ferroelectric thin film is adjusted, and the specific adjustment method is as follows.
  • the voltage pulse generating module 110 generates a preset pulse, so that a preset ferroelectric domain (that is, pre-polarization of the ferroelectric domain) is formed in the ferroelectric capacitor 300, and the voltage of the preset pulse is generated.
  • the height may be the same as the voltage height of the square wave voltage pulse applied by the polarization inversion, but the polarity is opposite, and the voltage platform width of the preset pulse is wide enough to fully complete the inversion of the ferroelectric domain, for example, a preset voltage
  • the pulse voltage is -5V and the voltage platform width is 100 milliseconds.
  • the voltage pulse generating module 110 generates a square wave voltage pulse signal for polarization inversion of the ferroelectric domain.
  • the voltage of the square wave voltage pulse signal may be 5V, and the voltage platform width may be 5 milliseconds.
  • the square wave voltage pulse biased to the ferroelectric capacitor 300, adjusting the variable resistance value can be achieved continuously adjustable polarization inversion speed while adjusting the coercive supply voltage V c can be achieved. Therefore, the waveform of the square wave voltage pulse signal does not need to be changed, and the polarization inversion speed can be easily adjusted.
  • the variable resistance value R 2 can be adjusted to a suitable value to obtain a predetermined desired polarization inversion velocity value, which is simple in structure and easy to adjust.
  • Adjusting the polarization inversion speed of the ferroelectric domain by the ferroelectric analysis device of the present invention The practical application value. Taking the ferroelectric film applied to the ferroelectric memory of 1T1C structure as an example, the above test can be used to know the polarization inversion current I sw and polarization of the ferroelectric capacitor ( C ) when the total resistance R t of the loop is at a certain value.
  • the application range of the ferroelectric thin film is not limited to the above case, and the practical application value of the ferroelectric analysis device of the present invention for adjusting the polarization inversion speed of the ferroelectric domain is not described in various applications.
  • ferroelectric analysis device provided by the above embodiments may further include other functional components known to those skilled in the art, which will not be described herein.

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Description

铁电分折装置及其调节铁电畴极化反转速度的方法 技术领域
本发明属于固态点介质性能测试技术领域, 涉及铁电介质薄膜的 铁电分析装置、 使用该铁电分析装置调节其铁电畴(domain )极化反 转 ( polarization reversal ) 速度的方法。 背景技术
电介质的特征是以正、 负电荷重心不重合的电极化方式传递、 存储或 记录外部电场信号的作用和影响, 因此介电常数是表征电介质最基本 的参量。 铁电体是一类特殊的电介质材料, 其介电常数大、 非线性效 应强、 自发极化强度大, 并有显著的温度依赖性和频率依赖性。 基于 铁电体材料的铁电介质薄膜近年来开始广泛应用于铁电随机读取存 储器 (FeRAM ) 、 动态随机读取存储器 (DRAM ) 、 非制冷红外探测 器、 薄膜介质电容器、 电场调制的微波器件、 AC 电致发光器和薄膜 传感器等。
铁电介质薄膜中, 例如, 基于铁电介质薄膜形成的铁电电容中, 在外加电场方向与电畴方向不同时, 如果产生该外加电场的电压大于 铁电介质薄膜的矫顽电压 (Vc ) , 铁电畴将发生运动, 即铁电畴发生 极化反转, 铁电畴的运动速度即反映极化反转速度, 其正比于极化反 转电流。 通常地, 外加电场通过电压脉冲实现。
现有技术的铁电分析仪能对铁电介质薄膜的各种性能参数进行测 试, 例如, 剩余极化电荷、 极化反转速度。 其在需要调节铁电畴极化 反转速度时, 通常是通过改变电压脉冲的高度(也即偏置于铁电介质薄 膜上的电压大小)来实现的。 这是由于在极化反转过程, 所需电荷等于 流经铁电介盾薄膜的电流随时间的积分, 电压变化会导致该电流变 化, 进而导致累计所需电荷的时间变化, 从而可以调节铁电畴极化反 转速度。
明显地,现有铁电分析仪的调节铁电畴极化反转速度的方法在调节 过程中, 需要不断地改变电压脉冲的形状, 过程复杂且对铁电分析仪的 电压脉冲发生装置要求较高; 同时, 由于电压脉冲的变化范围容易受到 仪器设备的限制, 难以实现铁电畴极化反转速度的大范围调节。
确 认 本 发明内容
本发明的目的之一在于, 提出一种铁电畴极化反转速度易于调节 的铁电分析仪及其方法。
本发明的目的之二在于, 在调节极化反转速度的同时并可调节其 矫顽电压。
本发明的上述目的或者其它目的通过以下技术方案实现: 按照本发明的一个方面, 提供一种铁电分析装置, 包括用于生成 方波电压脉冲信号的电压脉冲发生器, 所述方波电压脉冲信号偏置于 铁电介质薄膜上以使其铁电畴发生极化反转, 所述铁电分析装置还包 括与所述铁电介质薄膜串联连接的可变电阻, 所述可变电阻用于调节 极化反转电流以实现铁电畴极化反转速度的调节。
按照本发明提供的铁电分析装置的一实施例, 所述铁电分析装置 还包括用于从所述可变电阻的两端采集信号的信号采集装置。
较佳地, 所述信号采集装置为示波器。
较佳地, 所述采集的信号包括所述极化反转过程中偏置于所述可 变电阻上的电压平台高度和 /或所述极化反转的时间。
较佳地, 所述可变电阻的阻值范围基本为 1欧姆至 109欧姆。 根据本发明提供的铁电分析装置, 所述极化反转电流通过以下关 系式计算:
ISw= ( V - Vc ) /Rt= ( V - Vc ) / ( R,+R2 )
其中, Isw为所述极化反转电流, V为所述方波电压脉冲的电压高 度, Ve为矫顽电压, Rt为回路总电阻, R2为所述可变电阻的阻值, R,为包括所述电压脉冲发生器的内阻的与 R2串联的电阻。
所述极化反转所需电荷通过以下关系式计算: 其中, 1^为所述极化反转电流, Qsw为所述极化反转所需电荷。 按照本发明的又一方面, 提供一种以上所提供的铁电分析装置调 节铁电畴极化反转速度的方法, 该方法中, 在铁电介质薄膜上偏置所 述方波电压脉冲信号, 通过调节所述可变电阻的阻值实现铁电畴极化 反转速度的调节。
较佳地, 在偏置所述方波电压脉冲信号之前, 所述铁电介质薄膜 通过偏置预置脉冲信号以实现铁电畴的预极化。
较佳地, 所述预置脉沖信号与所述方波电压脉沖信号极性相反。 按照本发明提供的调节铁电畴极化反转速度的方法, 其中, 通过 的调节。
按照本发明提供的调节铁电畴极化反转速度的方法的一实施例, 所述极化反转电流通过以下关系式计算:
Isw= ( V - Vc ) /Rt= ( V - Vc ) / ( R!+R2 )
其中, 1^为所述极化反转电流, V为所述方波电压脉冲的电压高 度, Ve为矫顽电压, Rt为回路总电阻, R2为所述可变电阻的阻值, ,为包括所述电压脉冲发生器的内阻的与 R2串联的电阻。
所述极化反转所需电荷通 算:
Figure imgf000005_0001
其中, 1^为所述极化反转电流, Qsw为所述极化反转所需电荷。 按照本发明提供的调节铁电畴极化反转速度的方法的又一实施 例, 所述铁电分析装置还包括用于从所述可变电阻的两端采集信号的 信号采集装置; 所述信号采集装置所采集的信号包括所述极化反转过 程中偏置于所述可变电阻上的电压平台高度和 /或所述极化反转的时 间。
较佳地, 所述极化反转电流 lsw通过所述可变电阻上的电压平台 高度除以所述可变电阻的阻值计算得出, 进一步, 所述铁电介质薄膜 的矫顽电压通过以下关系式计算:
Isw- ( V - Vc ) /Rt= ( V - Vc ) / ( R!+R2 )
其中, 1^为所述极化反转电流, V为所述方波电压脉沖的电压高 度, Ve为矫顽电压, Rt为回路总电阻, R2为所述可变电阻的阻值, 为所述包括电压脉冲发生器的内阻的与 串联的电阻。
本发明的技术效果是, 通过增加可变电阻的方式实现对极化反转 电流的调节, 从而调节铁电畴运动速度, 也即极化反转的速度; 并且 在调节极化^^转速度的同时, 还可以调节铁电介盾薄膜的矫顽电压 Vc; 因此, 本发明提供的铁电分析仪在调节铁电畴极化反转速度时, 其不依赖于电压脉冲信号发生装置, 易于连续调节且调节范围广, 测 试数据可靠。 附图说明
从结合附图的以下详细说明中, 将会使本发明的上述和其它目的 及优点更加完全清楚,其中,相同或相似的要素采用相同的标号表示。
图 1是按照本发明一实施例提供的铁电分析装置的结构示意图; 图 2是图 1所示铁电分析装置在具体应用时的又一结构实例示意 图;
图 3所示为图 2所示装置中极化反转速度随可变电阻的阻值变化 而变化的结果示意图。 具体实施方式
下面介绍的是本发明的多个可能实施例中的一些, 旨在提供对本发 明的基本了解, 并不旨在确认本发明的关键或决定性的要素或限定所要 保护的范围。 容易理解, 根据本发明的技术方案, 在不变更本发明的实 质精神下, 本领域的一般技术人员可以提出可相互替换的其它实现方 式。 因此, 以下具体实施方式以及附图仅是对本发明的技术方案的示例 或限制。 、 ; , ' , S、 、 , . , . 图 1所示为按照本发明一实施例提供的铁电分析装置的结构示意 图。 在该实施例中, 铁电介质薄膜形成如图 1 所示的铁电电容 300, 铁电分析装置 100用于分析测试该铁电电容。 在该实例中, 铁电电容 300可以为 Pt/Ir02/Pb ( Zr0.4Ti0.6 ) 03(PZT)/Ir02/Pt/Si结构的样品, 铁 电介质薄膜 (Pb ( Zro.4Tio.6 ) 03 ) 的厚度约为 140 nm左右, 电极面积 为 l .Ox lO—4 cm2左右。
参阅图 1 , 铁电分析装置 100主要地包括电压脉冲生成模块 U0 以及串联于电压脉冲生成模块 110的输入端或输出端的可变电阻 130 (在该实例中, 1 1 1 为输出端、 1 13 为输入端, 可变电阻 130 串联于 输入端) 。 电压脉冲生成模块 110用于产生方波电压脉冲信号, 该电 压脉沖信号偏置于铁电电容时, 可以使其中的铁电介质薄膜在电压脉 沖产生的电场作用下发生铁电畴的极化反转。 该电压脉冲信号的具体 形状不受本发明实施例限制, 例如方波电压脉冲信号的电压高度、 电 压平台宽度、 电压极性等参数可以根据预定要求设置。 具体地, 电压 脉冲生成模块 1 10可以使用 Agilent 81 150A任意波形发生器, 对其编 辑可以生成预定形状要求的电压脉冲。
继续参阅图 1 , 被测试的铁电电容 300 串联电性连接于电压脉冲 生成模块 1 10的输入端和输出端之间, 因此, 其输出的电压脉沖信号 可以偏置于铁电电容 300的铁电介质薄膜上。本发明中,铁电电容 300 和电压脉冲生成模块 110之间的回路上, 还串联有可变电阻 130, 因 此, 电压脉冲信号是同时偏置于可变电阻 130、 铁电电容 300上, 可 变电阻 130、 铁电电容 300形成 RC电路。 当然, 如果电压脉冲生成 模块 110的存在内阻 , 电压脉沖信号还同时偏置于其内阻 上。
假设初始形成的铁电电容 300已经被预置脉冲作用而形成铁电畴 (例如, 其应用于铁电存储时, 其已经被预置编程为 "0" 状态或者 " 1 " 状态) , 可变电阻 130的所设定的电阻值为 。 方波电压脉冲 生成模块 110输出电压脉冲信号 (例如电压高度为 V、 电压平台宽度 为 T ) , 为使铁电电容被极化反转, 电压 V大于铁电介质薄膜的矫顽 电压 Vc且其极性与预置脉冲相反。 在铁电电容极化反转过程中, 所 需电荷等于 的积分, 也即: 其中,
Figure imgf000007_0001
电流。
在图 1所示形成的回路中, 1^即为回路电流, 由于在极化反转过 程中, 铁电电容上的电压等于其矫顽电压 Vc, 因此:
Isw= ( V - Vc ) /Rt= ( V - Vc ) / ( R!+R2 ) ( 2 ) 其中, Isw为极化反转电流, V 为方波电压脉冲的电压幅值, vc 为矫顽电压, Rt为回路总电阻, 在该实施例中, Rt为可变电阻 R2与 电压脉冲生成模块的内阻 之和。 同时需要说明的是, 在其它实例 中, 当 RC电路上还可以串联有其它阻值基本固定电阻或者等效电阻 时, 还表示电压脉冲生成模块的内阻与其它串联电阻的和。
铁电介质薄膜的铁电畴极化反转所需电荷 Qsw是基本固定不变 的。 因此, 在 1^变化时, 由关系式 ( 1 ) 可知, 极化反转所需的时间 即可以发生改变, 也即极化反转的速度可以变化。
因此, 在本发明中, 如关系式 (2 ) , 通过调节可变电阻 300 的 电阻值 (也即 R2发生变化) , 可以调节 Isw, 从而调节铁电电容的铁 电畴极化反转速度 (对于同一的方波电压脉沖、 同一 R2值, 在极化 反转过程中的矫顽电压 Vc是基本保持不变的) 。 并且, 由于可变电 阻 300是在一定阻值范围内可以连续调节的, 因此, 极化反转速度也 可以连续调节, 也即实现了铁电畴运动速度的连续可调。 在该实施例 中, 可变电阻 300的阻值范围可以为约 1欧姆至约 109欧姆。
需要说明的是, 在铁电电容 300的面积 S和 Qsw已知的情况下, 该铁电分析装置进一步可以通过以下关系式 (3 ) 求出 Psw
Figure imgf000008_0001
其中, Psw为极化反转值, S为铁电电容面积, 也即铁电介质薄膜 的面积, Qsw为极化反转所需电荷。
图 2所示为图 1所示铁电分析装置在具体应用时的又一结构实例 示意图。 相比于图 1所示结构, 图 2所示的铁电分析装置 200中, 增 加了用于从可变电阻 130的两端采集电信号的信号采集装置, 在该实 例中, 信号采集装置为示波器 150 , 此时, 关系式 (2 ) 中的 仍基 本等于电压脉沖生成模块 1 10的内阻(因为示波器 150的内阻远远大 于 R2 )。 示波器 150并联连接于可变电阻 130的两端, 从而可以对测 试过程中可变电阻两端的电压进行记录, 通过识别极化反转完成前后 电压波形高度的变化, 可以采集或读出在极化反转过程中侷置于可变 电阻 130上的电压平台高度(即 (V - VJ 再减去系统内阻所偏置的 电压) , 而且可以通过读出偏置于可变电阻 130上的电压在电畴运动 过程中所产生的电压台阶随时间的宽度, 识别出极化反转时间或电畴 运动时间 t (在某些铁电电容样品中, 是通过计算得出极化反转时间 t ) 。 因此, 关系式(2 ) 中的 1^是通过采集的电压平台高度除以其电 阻值 (R2 ) 得出, 在计算 Qsw时, 应用采集得到的极化反转时间 t以 及所计算的 1^即可计算得出。
需要说明的是, 信号采集装置的具体形式不受本实施例限制。 图 3所示为图 2所示装置中极化反转速度随可变电阻的阻值变化 而变化的结果示意图。 如图 3所示, 可变电阻 300从 100欧姆、 】 千 欧姆、 1万欧姆、 10万欧姆、 100万欧姆至 1000万欧姆变化所得的曲 线。 从图 3中可看出, 每条曲线中存在一个平台阶段, 此平台阶段所 维持的时间长度即为极化反转时间。 例如, 对于可变电阻 300被调节 为 1 千欧姆时, 其对应曲线中, 在可变电阻 300 两端的电压在 0.5V 左右停留时间 t2, 也即极化反转的时间为 t2; 此时, 方波电压脉冲形 状固定不变、 且可变电阻的电阻值恒定在 1千欧姆, 因此, 矫顽电压 Vc也是不发生变化的; 可变电阻 300两端的电压(0.5V )除以可变电 阻 300的阻值( 1千欧姆) 即可基本得出极化反转电流 Isw; 进一步通 过关系式 (2 ) , 可以求出此时相应的 Vc
对于可变电阻 300为其它情形时, 同样可以求出相应的极化反转 电流 Isw、 以及 Vc。 因此, 不但从图中可以看出随着可变电阻 300的 增大, 极化反转速度变慢, 同时也可以发现 Vc也是随之变化。 由此 可知, 通过调节可变电阻的阻值, 不但可以调节极化反转速度、 而且 可以调节铁电介质薄膜的矫顽电压 Vc。 并且, 由于电阻的调节范围可 以设置较大(例如跨越 9个数量级) , 而不像方波电压脉冲的高度, 其高度的范围容易受脉沖发生器的限制 (脉冲的高度不宜过大) , 因 此, 极化反转速度可以在更大范围内调节, 该铁电分析装置测量范围 大, 测试数据可靠。
由上述可知, 本发明的铁电分析装置可以实现对铁电畴极化反转 速度的连续调节, 即通过调节可变电阻的电阻值, 可以调节铁电畴的 极化反转速度并可以同时调节铁电介质薄膜的矫顽电压 Vc,具体调节 方法过程如以下所述。
首先, 如图 2所示, 电压脉冲生成模块 1 10生成预置脉沖, 从而 使铁电电容 300中形成预置铁电畴(也即实现铁电畴的预极化) , 预 置脉冲的电压高度可以与极化反转所加的方波电压脉冲的电压高度 相同, 但是极性相反, 并且, 预置脉冲的电压平台宽度足够宽以充分 完成铁电畴的反转, 例如, 预置电压脉沖的电压为 -5V、 电压平台宽 度为 100毫秒。
然后, 电压脉冲生成模块 1 10生成用于铁电畴极化反转的方波电 压脉沖信号, 具体地, 方波电压脉沖信号的电压可以为 5V、 电压平 台宽度可以为 5毫秒。在此方波电压脉冲信号偏置于铁电电容 300时, 调节可变电阻值即可实现极化反转速度的连续可调, 同时可以实现矫 顽电压 Vc的调节。 因此, 不需要改变方波电压脉冲信号的波形, 即 可方便地实现极化反转速度的可调。 在具体应用时, 可以将可变电阻 值 R2调至合适值以得到预定所需的极化反转速度值, 结构简单且易 于调节。
通过本发明的铁电分析装置调节铁电畴极化反转速度, 具有较大 的实际应用价值。 以铁电介质薄膜应用于 1T1C结构的铁电存储器为 例,通过以上测试可以得知回路总电阻 Rt在某一值时该铁电电容( C ) 的极化反转电流 Isw、 极化反转时间 t、 以及矫顽电压 Vc, 因此, 在对 该存储器进行擦写操作时, 设置编程的回路的总电阻等于 Rt、 设置擦 写电流大于或等于极化反转电流 I s w、设置擦写时间大于或等于极化反 转时间 t、 设置擦写电压大于或等于矫顽电压 Ve, 则易于成功实现擦 写操作。 并且还可以根据擦写电压、 擦写电流等要求 (例如电压脉冲 高度的限制、 电流大小的限制) , 来调节回路总电阻(也即调节可变 电阻) , 从而在编程装置输出的特定方波电压脉冲波形的偏置下, 易 于实现对存储器的擦写操作。
需要说明的是, 铁电介质薄膜的应用范围不限于以上情形, 在各 种应用情况下, 本发明的铁电分析装置调节铁电畴极化反转速度的具 体实际应用价值不再 描述。
本领域技术人员应当理解的是, 以上实施例提供的铁电分析装置 还可能包括本领域技术人员所公知的其它功能部件, 在此不再一一描 述。
以上例子主要说明了本发明的铁电分析装置以及使用该铁电分 析装置调节铁电畴极化反转速度的方法。 尽管只对其中一些本发明的 实施方式进行了描述, 但是本领域普通技术人员应当了解, 本发明可 以在不偏离其主旨与范围内以许多其他的形式实施。 因此, 所展示的 例子与实施方式被视为示意性的而非限制性的, 在不脱离如所附各权 利要求所定义的本发明精神及范围的情况下, 本发明可能涵盖各种的 修改与替换。

Claims

权 利 要 求
1. 一种铁电分析装置, 包括用于生成方波电压脉冲信号的电压 脉冲发生器, 所述方波电压脉沖信号偏置于铁电介廣薄膜上以使其铁 电畴发生极化反转, 其特征在于, 所迷铁电分析装置还包括与所述铁 电介质薄膜串联连接的可变电阻, 所述可变电阻用于调节极化反转电 流以实现铁电畴极化反转速度的调节。
2. 如权利要求 1 所述的铁电分析装置, 其特征在于, 所述铁电 分析装置还包括用于从所述可变电阻的两端采集信号的信号采集装 置。
3. 如权利要求 2 所述的铁电分析装置, 其特征在于, 所述信号 采集装置为示波器.。
4. 如权利要求 2 所述的铁电分析装置, 其特征在于, 所述采集 的信号包括所述极化反转过程中偏置于所述可变电阻上的电压平台 高度和 /或所述极化反转的时间。
5. 如权利要求 1 所述的铁电分析装置, 其特征在于, 所述可变 电阻的阻值范围基本为 1欧姆至 109欧姆。
6. 如权利要求 1 所述的铁电分析装置, 其特征在于, 所述极化 反转电流通过以下关系式计算:
Figure imgf000011_0001
其中, 1^为所述极化反转电流, V为所述方波电压脉冲的电压高 度, Ve为矫顽电压, Rt为回路总电阻, R2为所述可变电阻的阻值, R!为包括所述电压脉冲发生器的内阻的与 R2串联的电阻。
7. 如权利要求 6 所述的铁电分析装置, 其特征在于, 所述极化 反转所需电荷通过以下关系式计算: 其中, 1^为所述极化反转电流, Qsw为所述极化反转所需电荷,
8. 一种使用权利要求 1 所述的铁电分析装置调节铁电畴极化反 转速度的方法, 其特征在于, 在铁电介质薄膜上偏置所述方波电压脉
9. 如权利要求 8 所述调节铁电畴极化反转速度的方法, 其特征 在于, 在偏置所述方波电压脉冲信号之前, 所述铁电介质薄膜通过偏 置预置脉冲信号以实现铁电畴的预极化。
10. 如权利要求 9所述调节铁电畴极化反转速度的方法, 其特征 在于, 所述预置脉冲信号与所述方波电压脉冲信号极性相反。
1 1. 如权利要求 8所述调节铁电畴极化反转速度的方法, 其特征 矫顽电压的调节。
12. 如权利要求 8所述调节铁电畴极化反转速度的方法, 其特征 在于, 所述极化反转电流通过以下关系式计算:
Isw= ( V - Vc ) /Rt= ( V - Vc ) / ( R!+R2 )
其中, Isw为所述极化反转电流, V为所述方波电压脉冲的电压高 度, Vc为矫顽电压, Rt为回路总电阻, R2为所述可变电阻的阻值, R,为包括所述电压脉冲发生器的内阻的与 R 2串联的电阻。
13. 如权利要求 12 所述调节铁电畴极化反转速度的方法, 其特 征在于, 所述极化反转所需电荷通过以下关系式计算: 其中, 1^为所述极化反转电流, Qsw为所述极化反转所需电荷。
14. 如权利要求 8所述调节铁电畴极化反转速度的方法, 其特征 在于, 所述铁电分析装置还包括用于从所述可变电阻的两端采集信号 的信号采集装置; 所述信号采集装置所采集的信号包括所述极化反转 过程中偏置于所述可变电阻上的电压平台高度和 /或所述极化反转的 时间。
15. 如权利要求 14 所述调节铁电畴极化反转速度的方法, 其特 征在于, 所述极化反转电流 1^通过所述可变电阻上的电压平台高度 除以所述可变电阻的阻值计算得出, 进一步, 所述铁电介质薄膜的矫 顽电压通过以下关系式计算:
Figure imgf000013_0001
其中, 1^为所述极化反转电流, V为所述方波电压脉沖的电压高 度, Ve为矫顽电压, Rt为回路总电阻, R2为所述可变电阻的阻值, 为所述包括电压脉冲发生器的内阻的与 R2串联的电阻。
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