WO2012092689A1 - 铁电分析装置及其调节铁电畴极化反转速度的方法 - Google Patents
铁电分析装置及其调节铁电畴极化反转速度的方法 Download PDFInfo
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- WO2012092689A1 WO2012092689A1 PCT/CN2011/000578 CN2011000578W WO2012092689A1 WO 2012092689 A1 WO2012092689 A1 WO 2012092689A1 CN 2011000578 W CN2011000578 W CN 2011000578W WO 2012092689 A1 WO2012092689 A1 WO 2012092689A1
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- ferroelectric
- polarization inversion
- variable resistor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/26—Measuring inductance or capacitance; Measuring quality factor, e.g. by using the resonance method; Measuring loss factor; Measuring dielectric constants ; Measuring impedance or related variables
- G01R27/2617—Measuring dielectric properties, e.g. constants
- G01R27/2623—Measuring-systems or electronic circuits
Definitions
- the invention belongs to the technical field of solid point dielectric performance testing, and relates to a ferroelectric analysis device for a ferroelectric thin film, and a method for adjusting a ferroelectric domain polarization reversal speed using the ferroelectric analysis device. Background technique
- the dielectric is characterized by the action and influence of the external electric field signal transmitted, stored or recorded in an electrode-forming manner in which the center of gravity of the positive and negative charges does not coincide. Therefore, the dielectric constant is the most basic parameter characterizing the dielectric.
- Ferroelectrics are a special class of dielectric materials with large dielectric constants, strong nonlinear effects, high spontaneous polarization, and significant temperature dependence and frequency dependence. Ferroelectric thin films based on ferroelectric materials have been widely used in recent years in ferroelectric random read memories (FeRAM), dynamic random read memories (DRAM), uncooled infrared detectors, thin film dielectric capacitors, electric field modulated microwave devices, AC electroluminescent devices and film sensors.
- a ferroelectric thin film for example, in a ferroelectric capacitor formed based on a ferroelectric thin film, when an applied electric field direction is different from a domain direction, if a voltage at which the applied electric field is generated is larger than a coercive voltage (V c ) of the ferroelectric thin film, iron The domain will move, that is, the polarization of the ferroelectric domain is reversed, and the velocity of the ferroelectric domain reflects the rate of polarization inversion, which is proportional to the polarization inversion current.
- V c coercive voltage
- an applied electric field is achieved by a voltage pulse.
- Prior art ferroelectric analyzers are capable of testing various performance parameters of ferroelectric thin films, such as residual polarization charge and polarization inversion speed.
- it is usually achieved by changing the height of the voltage pulse (i.e., the magnitude of the voltage biased on the ferroelectric film). This is because during the polarization inversion process, the required charge is equal to the integration of the current flowing through the ferroelectric shield film over time, and the voltage change causes the current to change, which in turn leads to a cumulative change in the required charge, thereby adjusting the iron. Domain polarization inversion speed.
- the method for adjusting the polarization reversal speed of the ferroelectric domain of the existing ferroelectric analyzer needs to constantly change the shape of the voltage pulse during the adjustment process, the process is complicated and the voltage pulse generating device of the ferroelectric analyzer is required. At the same time, since the range of variation of the voltage pulse is easily limited by the instrument and equipment, it is difficult to achieve a wide range of adjustment of the polarization inversion of the ferroelectric domain.
- One of the objects of the present invention is to provide a ferroelectric analyzer and a method thereof in which the ferroelectric domain polarization inversion speed is easily adjusted.
- Another object of the present invention is to adjust the coercive voltage while adjusting the polarization inversion speed.
- a ferroelectric analysis apparatus comprising: a voltage pulse generator for generating a square wave voltage pulse signal, the square wave voltage pulse The signal is biased on the ferroelectric thin film to cause polarization inversion of the ferroelectric domain, and the ferroelectric analysis device further includes a variable resistor connected in series with the ferroelectric thin film, the variable resistor being used for adjusting the pole The current is reversed to achieve adjustment of the polarization inversion of the ferroelectric domain.
- the ferroelectric analysis apparatus further includes signal acquisition means for collecting signals from both ends of the variable resistor.
- the signal acquisition device is an oscilloscope.
- the acquired signal includes a voltage platform height biased on the variable resistor during the polarization inversion and/or a time during which the polarization is reversed.
- variable resistor has a resistance range of substantially 1 ohm to 10 9 ohms.
- the polarization inversion current is calculated by the following relation:
- I sw is the polarization inversion current
- V is the voltage height of the square wave voltage pulse
- V e is the coercive voltage
- R t is the total resistance of the loop
- R 2 is the resistance of the variable resistor R is a resistor in series with R 2 including the internal resistance of the voltage pulse generator.
- the charge required for the polarization inversion is calculated by the following relationship: where 1 is the polarization inversion current and Q sw is the charge required for the polarization inversion.
- the ferroelectric thin film is before the square wave voltage pulse signal is biased
- the pre-polarization of the ferroelectric domain is achieved by biasing the preset pulse signal.
- the preset pulse signal is opposite in polarity to the square wave voltage pulse signal.
- the polarization inversion current is calculated by the following relationship:
- 1 is the polarization inversion current
- V is the voltage height of the square wave voltage pulse
- V e is the coercive voltage
- R t is the total resistance of the loop
- R 2 is the resistance of the variable resistor.
- R 2 is a resistor in series with R 2 including the internal resistance of the voltage pulse generator.
- the ferroelectric analysis apparatus further includes a signal acquisition device for acquiring signals from both ends of the variable resistor;
- the signal acquired by the signal acquisition device includes a voltage platform height biased on the variable resistor during the polarization inversion and/or a time at which the polarization is reversed.
- the polarization inversion current l sw is calculated by dividing the height of the voltage platform on the variable resistor by the resistance of the variable resistor, and further, the coercive voltage of the ferroelectric thin film passes The following relationship is calculated:
- 1 is the polarization inversion current
- V is the voltage height of the square wave voltage pulse
- V e is the coercive voltage
- R t is the total resistance of the loop
- R 2 is the resistance of the variable resistor. , the resistor in series with the internal resistance of the voltage pulse generator.
- the technical effect of the present invention is to adjust the polarization inversion current by increasing the variable resistance, thereby adjusting the movement speed of the ferroelectric domain, that is, the speed of polarization inversion; and adjusting the polarization speed
- the coercive voltage V c of the ferroelectric shield film can also be adjusted; therefore, the ferroelectric analyzer provided by the present invention does not depend on the voltage pulse signal generating device when adjusting the polarization inversion of the ferroelectric domain. Easy to adjust continuously and wide adjustment range, reliable test data.
- FIG. 1 is a schematic structural view of a ferroelectric analysis device according to an embodiment of the present invention
- FIG. 2 is a schematic view showing another structural example of the ferroelectric analysis device shown in FIG. 1 in a specific application;
- Fig. 3 is a view showing the result of a change in the polarization inversion speed of the device shown in Fig. 2 as a function of the resistance of the variable resistor.
- FIG. 1 is a schematic structural diagram of the ferroelectric analyzing apparatus according to an embodiment of the provided embodiment of the invention.
- the ferroelectric thin film forms a ferroelectric capacitor 300 as shown in Fig.
- the ferroelectric capacitor 300 may be a sample of Pt/Ir0 2 /Pb ( Zr 0 . 4 Ti 0 . 6 ) 0 3 (PZT)/Ir0 2 /Pt/Si structure, ferroelectric thin film (Pb (Zro)
- the thickness of 4 Tio.6 ) 0 3 ) is about 140 nm, and the electrode area is about l.Ox lO— 4 cm 2 .
- the ferroelectric analysis apparatus 100 mainly includes a voltage pulse generation module U0 and a variable resistor 130 connected in series to an input terminal or an output terminal of the voltage pulse generation module 110 (in this example, 1 1 1 is an output terminal, 1 13 For the input, the variable resistor 130 is connected in series to the input).
- the voltage pulse generating module 110 is configured to generate a square wave voltage pulse signal. When the voltage pulse signal is biased to the ferroelectric capacitor, the ferroelectric thin film can be subjected to polarization inversion of the ferroelectric domain under the electric field generated by the voltage pulse. .
- the specific shape of the voltage pulse signal is not limited by the embodiment of the present invention.
- the voltage height of the square wave voltage pulse signal, the voltage platform width, the voltage polarity and the like may be set according to predetermined requirements.
- the voltage The pulse generation module 1 10 can use an Agilent 81 150A arbitrary waveform generator that can be programmed to generate voltage pulses of a predetermined shape.
- the ferroelectric capacitor 300 to be tested is electrically connected in series between the input terminal and the output terminal of the voltage pulse generating module 110. Therefore, the output voltage pulse signal can be biased to the iron of the ferroelectric capacitor 300.
- a variable resistor 130 is also connected in series between the ferroelectric capacitor 300 and the voltage pulse generating module 110. Therefore, the voltage pulse signal is simultaneously biased on the variable resistor 130 and the ferroelectric capacitor 300.
- the variable resistor 130 and the ferroelectric capacitor 300 form an RC circuit.
- the voltage pulse signal is also biased to its internal resistance.
- the initially formed ferroelectric capacitor 300 has been subjected to a preset pulse to form a ferroelectric domain (for example, when it is applied to ferroelectric storage, it has been preprogrammed to a "0" state or a "1" state), and is variable.
- the set resistance value of the resistor 130 is.
- the square wave voltage pulse generating module 110 outputs a voltage pulse signal (for example, the voltage height is V, and the voltage platform width is T).
- the voltage V is greater than the coercive voltage V c of the ferroelectric thin film and The polarity is opposite to the preset pulse.
- the integral of the required charge is equal to, that is: Current.
- I sw is the polarization inversion current
- V is the voltage amplitude of the square wave voltage pulse
- v c is the coercive voltage
- R t is the total resistance of the loop.
- R t is the sum of the internal resistance of the variable resistor R 2 and the voltage pulse generating module.
- the RC circuit can also be connected with other resistance basic fixed resistors or equivalent resistors in series, it also represents the sum of the internal resistance of the voltage pulse generating module and other series resistances.
- the charge Q sw required for the ferroelectric domain polarization inversion of the ferroelectric thin film is substantially constant. Therefore, when 1 ⁇ changes, it can be known from the relation (1) that the time required for polarization inversion can be changed, that is, the speed of polarization inversion can be changed.
- I sw can be adjusted to adjust the ferroelectric domain polarization inversion of the ferroelectric capacitor.
- Speed for the same square wave voltage pulse, the same R 2 value, in polarization
- the coercive voltage V c during the inversion is substantially constant).
- the variable resistor 300 can be continuously adjusted within a certain resistance range, the polarization inversion speed can also be continuously adjusted, that is, the continuous adjustment of the ferroelectric domain motion speed is realized.
- the resistance of the variable resistor 300 may range from about 1 ohm to about 10 9 ohms.
- the ferroelectric analysis device can further determine P sw by the following relation (3):
- P sw is the polarization inversion value
- S is the ferroelectric capacitance area, that is, the area of the ferroelectric thin film
- Q sw is the charge required for polarization inversion
- FIG. 2 is a schematic view showing still another structural example of the ferroelectric analysis device shown in FIG. 1 in a specific application.
- a signal acquisition device for collecting electrical signals from both ends of the variable resistor 130 is added.
- the signal acquisition device is At the oscilloscope 150, at this time, the relationship (2) is still substantially equal to the internal resistance of the voltage pulse generating module 110 (because the internal resistance of the oscilloscope 150 is much larger than R 2 ).
- the oscilloscope 150 is connected in parallel to both ends of the variable resistor 130, so that the voltage across the variable resistor during the test can be recorded, and the polarization of the voltage waveform can be acquired or read out by recognizing the change of the height of the voltage waveform before and after the polarization inversion is completed.
- the height of the voltage platform placed on the variable resistor 130 during the inversion process (ie, (V - VJ minus the voltage biased by the internal resistance of the system), and can be read by biasing the voltage biased across the variable resistor 130
- the width of the voltage step generated during the movement of the domain over time identifies the polarization inversion time or the domain motion time t (in some ferroelectric capacitance samples, the polarization inversion time is calculated by t Therefore, 1 ⁇ in relation (2) is obtained by dividing the height of the collected voltage platform by its resistance value (R 2 ).
- the polarization inversion time t obtained by the acquisition is applied. The calculated 1 ⁇ can be calculated.
- Fig. 3 is a view showing the result of a change in the polarization inversion speed of the device shown in Fig. 2 as a function of the resistance of the variable resistor.
- the variable resistor 300 has a curve obtained by varying 100 ohms, kilo ohms, 10,000 ohms, 100,000 ohms, 1 million ohms, and 10 million ohms.
- the voltage across the variable resistor 300 is at a residence time t 2 of about 0.5 V, that is, the time of polarization inversion is t 2 ;
- Square wave voltage pulse shape The shape is fixed, and the resistance value of the variable resistor is constant at 1 kilo ohm. Therefore, the coercive voltage V c does not change; the voltage across the variable resistor 300 (0.5 V ) is divided by the resistance of the variable resistor 300.
- the value (1 kohm) can basically obtain the polarization inversion current I sw ; further through the relation (2), the corresponding V c can be obtained at this time.
- variable resistor 300 When the variable resistor 300 is otherwise, the corresponding polarization inversion currents I sw and V c can be obtained in the same manner. Thus, not only it can be seen from the figure as the variable resistor 300 increases, the polarization inversion slow, but may also find V c changes. From this, it can be seen that by adjusting the resistance of the variable resistor, not only the polarization inversion speed but also the coercive voltage V c of the ferroelectric thin film can be adjusted.
- the adjustment range of the resistor can be set large (for example, spanning 9 orders of magnitude), unlike the height of the square wave voltage pulse, the range of the height is easily limited by the pulse generator (the height of the pulse should not be too large), The polarization inversion speed can be adjusted in a wider range.
- the ferroelectric analysis device has a large measuring range and reliable test data.
- the ferroelectric analysis device of the present invention can realize continuous adjustment of the polarization inversion speed of the ferroelectric domain, that is, by adjusting the resistance value of the variable resistor, the polarization inversion speed of the ferroelectric domain can be adjusted and simultaneously
- the coercive voltage V c of the ferroelectric thin film is adjusted, and the specific adjustment method is as follows.
- the voltage pulse generating module 110 generates a preset pulse, so that a preset ferroelectric domain (that is, pre-polarization of the ferroelectric domain) is formed in the ferroelectric capacitor 300, and the voltage of the preset pulse is generated.
- the height may be the same as the voltage height of the square wave voltage pulse applied by the polarization inversion, but the polarity is opposite, and the voltage platform width of the preset pulse is wide enough to fully complete the inversion of the ferroelectric domain, for example, a preset voltage
- the pulse voltage is -5V and the voltage platform width is 100 milliseconds.
- the voltage pulse generating module 110 generates a square wave voltage pulse signal for polarization inversion of the ferroelectric domain.
- the voltage of the square wave voltage pulse signal may be 5V, and the voltage platform width may be 5 milliseconds.
- the square wave voltage pulse biased to the ferroelectric capacitor 300, adjusting the variable resistance value can be achieved continuously adjustable polarization inversion speed while adjusting the coercive supply voltage V c can be achieved. Therefore, the waveform of the square wave voltage pulse signal does not need to be changed, and the polarization inversion speed can be easily adjusted.
- the variable resistance value R 2 can be adjusted to a suitable value to obtain a predetermined desired polarization inversion velocity value, which is simple in structure and easy to adjust.
- Adjusting the polarization inversion speed of the ferroelectric domain by the ferroelectric analysis device of the present invention The practical application value. Taking the ferroelectric film applied to the ferroelectric memory of 1T1C structure as an example, the above test can be used to know the polarization inversion current I sw and polarization of the ferroelectric capacitor ( C ) when the total resistance R t of the loop is at a certain value.
- the application range of the ferroelectric thin film is not limited to the above case, and the practical application value of the ferroelectric analysis device of the present invention for adjusting the polarization inversion speed of the ferroelectric domain is not described in various applications.
- ferroelectric analysis device provided by the above embodiments may further include other functional components known to those skilled in the art, which will not be described herein.
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201180002911.2A CN102687029B (zh) | 2011-01-05 | 2011-04-04 | 铁电分析装置及其调节铁电畴极化反转速度的方法 |
| US13/387,044 US9354192B2 (en) | 2011-01-05 | 2011-04-04 | Ferroelectric analyzing device and method for adjusting ferroelectric domain switching speed |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110000987.3 | 2011-01-05 | ||
| CN201110000987.3A CN102116789B (zh) | 2011-01-05 | 2011-01-05 | 一种铁电畴运动速度可调的脉冲电压测量法 |
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| WO2012092689A1 true WO2012092689A1 (zh) | 2012-07-12 |
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| PCT/CN2011/000578 Ceased WO2012092689A1 (zh) | 2011-01-05 | 2011-04-04 | 铁电分析装置及其调节铁电畴极化反转速度的方法 |
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| US (1) | US9354192B2 (zh) |
| CN (2) | CN102116789B (zh) |
| WO (1) | WO2012092689A1 (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111624533A (zh) * | 2020-05-26 | 2020-09-04 | 中国人民解放军国防科技大学 | 利用tmr磁传感器的磁性薄膜电调特性测试系统及方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102279308A (zh) * | 2011-07-20 | 2011-12-14 | 复旦大学 | 一种绝缘/漏电铁电薄膜电畴反转电流测量与转换为电滞回线的方法 |
| CN102590669B (zh) * | 2012-02-21 | 2014-07-09 | 复旦大学 | 铁电薄膜电畴区域运动速度与矫顽电场关系的测量方法 |
| CN114217156A (zh) * | 2021-12-15 | 2022-03-22 | 中国人民解放军陆军装甲兵学院 | 一种铁电畴运动速度可调的脉冲电压测量法 |
| CN117233666B (zh) * | 2023-09-20 | 2024-05-03 | 哈尔滨工业大学 | 一种铁电材料测试系统及其测试方法 |
| CN120812949B (zh) * | 2025-09-12 | 2025-12-05 | 西安电子科技大学杭州研究院 | 基于rram+fcm结构的非易失存储器制备方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6466039B1 (en) * | 1999-06-24 | 2002-10-15 | Sony Corporation | Ferroelectric film property measuring device, measuring method therefor and measuring method for semiconductor memory units |
| CN1547036A (zh) * | 2003-12-01 | 2004-11-17 | 中国科学技术大学 | 铁电薄膜材料介电性能多频率自动测试方法及装置 |
| CN2747587Y (zh) * | 2004-07-26 | 2005-12-21 | 深圳华中科技大学研究院 | 铁电材料参数测试仪 |
| CN101158712A (zh) * | 2007-09-17 | 2008-04-09 | 西安交通大学 | 一种铁电材料电滞回线的测量装置及测量方法 |
| CN101718810A (zh) * | 2009-11-26 | 2010-06-02 | 复旦大学 | 一种测量漏电铁电薄膜电滞回线的方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69531917T2 (de) * | 1994-08-31 | 2004-08-19 | Matsushita Electric Industrial Co., Ltd., Kadoma | Verfahren zur Herstellung von invertierten Domänen und eines optischen Wellenlängenkonverters mit denselben |
| CN1045639C (zh) * | 1994-12-09 | 1999-10-13 | 南京大学 | 室温制备具有周期电畴的lt、掺杂ln晶体的极化方法 |
| JPH11195370A (ja) * | 1998-01-07 | 1999-07-21 | Toshiba Electronic Engineering Corp | 電子管用陰極構体および電子管 |
| JP3689838B2 (ja) * | 1998-04-13 | 2005-08-31 | 株式会社リコー | 強誘電体特性評価装置 |
| FR2845160B1 (fr) * | 2002-09-27 | 2004-12-10 | Centre Nat Rech Scient | Procede et dispositif pour caracteriser des materiaux ferroelectriques |
| US7230753B2 (en) * | 2002-11-25 | 2007-06-12 | Matsushita Electric Industrial Co., Ltd. | Method for forming domain-inverted structure and optical element with domain-inverted structure |
-
2011
- 2011-01-05 CN CN201110000987.3A patent/CN102116789B/zh not_active Expired - Fee Related
- 2011-04-04 WO PCT/CN2011/000578 patent/WO2012092689A1/zh not_active Ceased
- 2011-04-04 US US13/387,044 patent/US9354192B2/en not_active Expired - Fee Related
- 2011-04-04 CN CN201180002911.2A patent/CN102687029B/zh active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6466039B1 (en) * | 1999-06-24 | 2002-10-15 | Sony Corporation | Ferroelectric film property measuring device, measuring method therefor and measuring method for semiconductor memory units |
| CN1547036A (zh) * | 2003-12-01 | 2004-11-17 | 中国科学技术大学 | 铁电薄膜材料介电性能多频率自动测试方法及装置 |
| CN2747587Y (zh) * | 2004-07-26 | 2005-12-21 | 深圳华中科技大学研究院 | 铁电材料参数测试仪 |
| CN101158712A (zh) * | 2007-09-17 | 2008-04-09 | 西安交通大学 | 一种铁电材料电滞回线的测量装置及测量方法 |
| CN101718810A (zh) * | 2009-11-26 | 2010-06-02 | 复旦大学 | 一种测量漏电铁电薄膜电滞回线的方法 |
Non-Patent Citations (3)
| Title |
|---|
| SHU, QING ET AL., FERROELECTRIC SWITCH CURRENT MEASURE SYSTEM, vol. 22, no. 4, April 1999 (1999-04-01), pages 240 - 245 * |
| XU, XIAOHUI ET AL.: "Research on Dielectric Measurement for PZT Thin Film", PIEZOELECTRICS & ACOUSTOOPTICS, vol. 32, no. 2, April 2010 (2010-04-01), pages 293 - 296 * |
| ZENG, YIKE ET AL.: "Measurement for Switching Characteristics of Ferroelectric Thin Films", JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY, vol. 27, no. 6, June 1999 (1999-06-01), pages 10 - 12 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111624533A (zh) * | 2020-05-26 | 2020-09-04 | 中国人民解放军国防科技大学 | 利用tmr磁传感器的磁性薄膜电调特性测试系统及方法 |
| CN111624533B (zh) * | 2020-05-26 | 2022-06-14 | 中国人民解放军国防科技大学 | 利用tmr磁传感器的磁性薄膜电调特性测试方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US9354192B2 (en) | 2016-05-31 |
| CN102687029A (zh) | 2012-09-19 |
| CN102116789A (zh) | 2011-07-06 |
| CN102687029B (zh) | 2014-08-27 |
| US20140074417A1 (en) | 2014-03-13 |
| CN102116789B (zh) | 2014-04-02 |
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