WO2012044042A3 - Method for preparing fatty acid alkyl esters - Google Patents

Method for preparing fatty acid alkyl esters Download PDF

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Publication number
WO2012044042A3
WO2012044042A3 PCT/KR2011/007106 KR2011007106W WO2012044042A3 WO 2012044042 A3 WO2012044042 A3 WO 2012044042A3 KR 2011007106 W KR2011007106 W KR 2011007106W WO 2012044042 A3 WO2012044042 A3 WO 2012044042A3
Authority
WO
WIPO (PCT)
Prior art keywords
alkyl esters
fatty acid
acid alkyl
preparing fatty
fat
Prior art date
Application number
PCT/KR2011/007106
Other languages
French (fr)
Korean (ko)
Other versions
WO2012044042A2 (en
Inventor
이무호
김인기
김일남
곽진원
황승준
박남수
김종원
권은숙
Original Assignee
삼성석유화학(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020100093474A external-priority patent/KR101072674B1/en
Application filed by 삼성석유화학(주) filed Critical 삼성석유화학(주)
Publication of WO2012044042A2 publication Critical patent/WO2012044042A2/en
Publication of WO2012044042A3 publication Critical patent/WO2012044042A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/03—Preparation of carboxylic acid esters by reacting an ester group with a hydroxy group
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/08—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11C—FATTY ACIDS FROM FATS, OILS OR WAXES; CANDLES; FATS, OILS OR FATTY ACIDS BY CHEMICAL MODIFICATION OF FATS, OILS, OR FATTY ACIDS OBTAINED THEREFROM
    • C11C3/00—Fats, oils, or fatty acids by chemical modification of fats, oils, or fatty acids obtained therefrom
    • C11C3/04—Fats, oils, or fatty acids by chemical modification of fats, oils, or fatty acids obtained therefrom by esterification of fats or fatty oils
    • C11C3/10—Ester interchange
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/10—Magnesium; Oxides or hydroxides thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/02—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the alkali- or alkaline earth metals or beryllium
    • B01J23/04—Alkali metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Fats And Perfumes (AREA)

Abstract

The present invention relates to a method for preparing fatty acid alkyl esters, comprising a step of esterifying and transesterifying oil, fat, or a mixture thereof, wherein the oil, fat, or the mixture thereof contains free fatty acids and has an acid value of 2 to 200, in the presence of one or more catalysts selected from a low-carbon, i.e. C1 to C5, alcohol, MgO and Mg(OH)2, under the conditions of 150 to 250°C and 5 to 100 atmospheric pressures.
PCT/KR2011/007106 2010-09-27 2011-09-27 Method for preparing fatty acid alkyl esters WO2012044042A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020100093474A KR101072674B1 (en) 2010-09-27 2010-09-27 Process for the preparation of aliphatic alkylester
KR10-2010-0093474 2010-09-27
KR10-2010-0093472 2010-09-27
KR20100093472 2010-09-27

Publications (2)

Publication Number Publication Date
WO2012044042A2 WO2012044042A2 (en) 2012-04-05
WO2012044042A3 true WO2012044042A3 (en) 2012-06-07

Family

ID=45893636

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/007106 WO2012044042A2 (en) 2010-09-27 2011-09-27 Method for preparing fatty acid alkyl esters

Country Status (1)

Country Link
WO (1) WO2012044042A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10542773B2 (en) 2013-07-19 2020-01-28 Philip Morris Products S.A. Hydrophobic paper

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6228754B1 (en) * 1999-01-05 2001-05-08 Advanced Micro Devices, Inc. Method for forming semiconductor seed layers by inert gas sputter etching
US20060014378A1 (en) * 2004-07-14 2006-01-19 Sanjeev Aggarwal System and method to form improved seed layer
US20060030151A1 (en) * 2004-08-09 2006-02-09 Applied Materials, Inc. Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement
US7585760B2 (en) * 2006-06-23 2009-09-08 Intel Corporation Method for forming planarizing copper in a low-k dielectric

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6228754B1 (en) * 1999-01-05 2001-05-08 Advanced Micro Devices, Inc. Method for forming semiconductor seed layers by inert gas sputter etching
US20060014378A1 (en) * 2004-07-14 2006-01-19 Sanjeev Aggarwal System and method to form improved seed layer
US20060030151A1 (en) * 2004-08-09 2006-02-09 Applied Materials, Inc. Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement
US7585760B2 (en) * 2006-06-23 2009-09-08 Intel Corporation Method for forming planarizing copper in a low-k dielectric

Also Published As

Publication number Publication date
WO2012044042A2 (en) 2012-04-05

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