WO2012007527A3 - Methods and systems for detecting, setting, monitoring, determining, storing and compensating the spatial situation of a mobile unit - Google Patents
Methods and systems for detecting, setting, monitoring, determining, storing and compensating the spatial situation of a mobile unit Download PDFInfo
- Publication number
- WO2012007527A3 WO2012007527A3 PCT/EP2011/061997 EP2011061997W WO2012007527A3 WO 2012007527 A3 WO2012007527 A3 WO 2012007527A3 EP 2011061997 W EP2011061997 W EP 2011061997W WO 2012007527 A3 WO2012007527 A3 WO 2012007527A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mobile unit
- setting
- spatial situation
- compensating
- monitoring
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70816—Bearings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
A method and system for setting the spatial situation of a mobile unit is provided. The mobile unit is moving with respect to a movement surface by means of at least one air pad (5, 6) and/or a motorized support structure, and the system (1A, 1B) comprises means (8, 9, 10) for setting an air feeding parameter of at least one such air pad (5, 6) or at least on position parameter for a motorized support structure, when the mobile unit (2) holds a position for which a spatial situation error is detected with respect to a predefined reference spatial situation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP11745504.8A EP2593841A2 (en) | 2010-07-15 | 2011-07-13 | Methods and systems for detecting, setting, monitoring, determining, storing and compensating the spatial situation of a mobile unit |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE1050803 | 2010-07-15 | ||
SE1050803-4 | 2010-07-15 | ||
US36498910P | 2010-07-16 | 2010-07-16 | |
US61/364,989 | 2010-07-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012007527A2 WO2012007527A2 (en) | 2012-01-19 |
WO2012007527A3 true WO2012007527A3 (en) | 2012-05-18 |
Family
ID=44630441
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2011/061997 WO2012007527A2 (en) | 2010-07-15 | 2011-07-13 | Methods and systems for detecting, setting, monitoring, determining, storing and compensating the spatial situation of a mobile unit |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP2593841A2 (en) |
WO (1) | WO2012007527A2 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6094255A (en) * | 1997-02-04 | 2000-07-25 | Nikon Corporation | Projection exposure apparatus and method that floats a plate |
US6151100A (en) * | 1996-12-12 | 2000-11-21 | Canon Kabushiki Kaisha | Positioning system |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58116735A (en) * | 1981-12-29 | 1983-07-12 | Canon Inc | Projection printing apparatus |
US5121256A (en) * | 1991-03-14 | 1992-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | Lithography system employing a solid immersion lens |
KR101289979B1 (en) * | 2003-06-19 | 2013-07-26 | 가부시키가이샤 니콘 | Exposure device and device producing method |
-
2011
- 2011-07-13 EP EP11745504.8A patent/EP2593841A2/en not_active Ceased
- 2011-07-13 WO PCT/EP2011/061997 patent/WO2012007527A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6151100A (en) * | 1996-12-12 | 2000-11-21 | Canon Kabushiki Kaisha | Positioning system |
US6094255A (en) * | 1997-02-04 | 2000-07-25 | Nikon Corporation | Projection exposure apparatus and method that floats a plate |
Non-Patent Citations (2)
Title |
---|
See also references of EP2593841A2 * |
SHIMOKOHBE A ET AL: "An active air bearing: a controlled-type bearing with ultra-precision, infinite static stiffness, high damping capability and new functions", NANOTECHNOLOGY, IOP, BRISTOL, GB, vol. 2, no. 1, 1 January 1991 (1991-01-01), pages 64 - 71, XP020067186, ISSN: 0957-4484, DOI: 10.1088/0957-4484/2/1/009 * |
Also Published As
Publication number | Publication date |
---|---|
WO2012007527A2 (en) | 2012-01-19 |
EP2593841A2 (en) | 2013-05-22 |
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