WO2011156534A3 - Multiple frequency power for plasma chamber electrode - Google Patents

Multiple frequency power for plasma chamber electrode Download PDF

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Publication number
WO2011156534A3
WO2011156534A3 PCT/US2011/039689 US2011039689W WO2011156534A3 WO 2011156534 A3 WO2011156534 A3 WO 2011156534A3 US 2011039689 W US2011039689 W US 2011039689W WO 2011156534 A3 WO2011156534 A3 WO 2011156534A3
Authority
WO
WIPO (PCT)
Prior art keywords
power signals
plasma chamber
center
connection points
electrode
Prior art date
Application number
PCT/US2011/039689
Other languages
French (fr)
Other versions
WO2011156534A2 (en
Inventor
Edward P. Hammond, Iv
Tsutomu Tanaka
Christopher Boitnott
Jozef Kudela
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/005,526 external-priority patent/US20110192349A1/en
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Publication of WO2011156534A2 publication Critical patent/WO2011156534A2/en
Publication of WO2011156534A3 publication Critical patent/WO2011156534A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)

Abstract

First through fifth RF power signals are respectively coupled to first through fifth RF connection points on an electrode of a plasma chamber. The first, second and third RF power signals have distinct first, second and third frequencies, respectively. The second and fourth RF power signals have the same frequency and opposite phase. The third and fifth RF power signals have the same frequency and opposite phase. The second through fifth RF connection points are geometrically arranged as four successive vertices of a quadrilateral convex polygon. The first RF connection point is closer to the center of the electrode. The center strong spatial distribution of the electric field produced by the first RF power signal is offset by the center weak spatial distribution of the electric field produced by the second through fifth RF power signals. An alternative embodiment omits the third and fifth RF power signals and the third and fifth RF connection points.
PCT/US2011/039689 2010-06-08 2011-06-08 Multiple frequency power for plasma chamber electrode WO2011156534A2 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US35281710P 2010-06-08 2010-06-08
US61/352,817 2010-06-08
US13/005,526 US20110192349A1 (en) 2010-01-12 2011-01-12 Phase-Modulated RF Power for Plasma Chamber Electrode
US13/005,526 2011-01-12
US201113156328A 2011-06-08 2011-06-08
US13/156,328 2011-06-08

Publications (2)

Publication Number Publication Date
WO2011156534A2 WO2011156534A2 (en) 2011-12-15
WO2011156534A3 true WO2011156534A3 (en) 2012-04-19

Family

ID=45098657

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2011/039689 WO2011156534A2 (en) 2010-06-08 2011-06-08 Multiple frequency power for plasma chamber electrode

Country Status (1)

Country Link
WO (1) WO2011156534A2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003524895A (en) * 2000-02-25 2003-08-19 東京エレクトロン株式会社 Multi-zone RF electrode for capacitive plasma source
JP2006332709A (en) * 2006-09-05 2006-12-07 Masayoshi Murata Method of supplying power to electrode, plasma surface treatment method using this power supplying method and plasma surface treatment apparatus
US20090202741A1 (en) * 2008-01-31 2009-08-13 Applied Materials, Inc. Multiple Phase RF Power for Electrode of Plasma Chamber
KR20100029464A (en) * 2008-09-08 2010-03-17 삼성전자주식회사 Plasma processing apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003524895A (en) * 2000-02-25 2003-08-19 東京エレクトロン株式会社 Multi-zone RF electrode for capacitive plasma source
JP2006332709A (en) * 2006-09-05 2006-12-07 Masayoshi Murata Method of supplying power to electrode, plasma surface treatment method using this power supplying method and plasma surface treatment apparatus
US20090202741A1 (en) * 2008-01-31 2009-08-13 Applied Materials, Inc. Multiple Phase RF Power for Electrode of Plasma Chamber
KR20100029464A (en) * 2008-09-08 2010-03-17 삼성전자주식회사 Plasma processing apparatus

Also Published As

Publication number Publication date
WO2011156534A2 (en) 2011-12-15

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