WO2011148690A1 - Liquid crystal display panel - Google Patents

Liquid crystal display panel Download PDF

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Publication number
WO2011148690A1
WO2011148690A1 PCT/JP2011/055259 JP2011055259W WO2011148690A1 WO 2011148690 A1 WO2011148690 A1 WO 2011148690A1 JP 2011055259 W JP2011055259 W JP 2011055259W WO 2011148690 A1 WO2011148690 A1 WO 2011148690A1
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WO
WIPO (PCT)
Prior art keywords
switch
substrate
electrode
liquid crystal
display panel
Prior art date
Application number
PCT/JP2011/055259
Other languages
French (fr)
Japanese (ja)
Inventor
山岸慎治
木田和寿
阿比留学
Original Assignee
シャープ株式会社
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Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Publication of WO2011148690A1 publication Critical patent/WO2011148690A1/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/045—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes

Definitions

  • the present invention relates to a liquid crystal display panel having a touch sensor function for detecting position information on a display screen.
  • liquid crystal display panels have been widely used in various devices such as personal computers, mobile phones, PDAs and game machines.
  • a liquid crystal display panel that detects positional information on a display screen by arranging a touch panel on the liquid crystal display panel is also known.
  • a touch panel position detection method for example, a resistance film method and a capacitance method are generally known.
  • the resistive film type touch panel has a substrate and a film facing each other through a slight gap.
  • Transparent conductive films are formed on surfaces of the substrate and the film that face each other.
  • Such a touch panel is attached to the display panel so that the substrate is on the display panel side. And when the said film is pressed with a finger, a touch pen, etc., a film will bend to a board
  • a cylindrical portion is provided so as to connect the pixel electrode of the active substrate and the common electrode formed on the color filter layer of the counter substrate.
  • the cylindrical portion has a hollow cylindrical shape having a height equal to a gap (that is, a cell gap) between the active substrate and the counter substrate, and is made of an elastically deformable material. Inside the cylindrical portion, a conductive material is injected leaving a slight gap on the counter substrate side (upper end side).
  • the conductive material is electrically connected to the pixel electrode.
  • the cylindrical portion is compressed and deformed, the upper end of the conductive material in the inside comes into contact with the common electrode of the counter substrate, and the common electrode and the pixel electrode are electrically connected. By detecting this, the touch position can be detected.
  • the conventional liquid crystal display panel with an in-cell touch sensor function described in Patent Document 1 has a structure in which the touch pressure applied to the counter substrate is supported by the cylindrical portion, and thus the touch pressure is repeatedly applied. And the cylindrical part may be destroyed.
  • the color filter layer in which the cylindrical part is formed is generally made of a resin material and has low mechanical strength, so the color filter layer may be destroyed in the vicinity of the boundary between the cylindrical part and the color filter layer. It was.
  • An object of the present invention is to solve the above-mentioned conventional problems and to provide a liquid crystal display panel with an in-cell type touch sensor function that has improved durability against repeated pressing.
  • the liquid crystal display panel of the present invention includes a first substrate, a second substrate facing the first substrate, a liquid crystal layer between the first substrate and the second substrate, the first substrate or the second substrate.
  • a touch switch that is electrically conductive when the substrate is pressed and a distance between the first substrate and the second substrate is reduced.
  • the touch switch includes a switch electrode formed on the second substrate, a plurality of switch protrusions formed on the first substrate protruding toward one common switch electrode, and tips of the plurality of switch protrusions And electrodes that are electrically connected to each other.
  • a plurality of switch protrusions face one common switch electrode, and the electrodes formed at the tips of the plurality of switch protrusions are electrically connected to each other.
  • FIG. 1 is a schematic cross-sectional view of a liquid crystal display panel according to Embodiment 1 of the present invention.
  • FIG. 2 is a plan view schematically showing the color filter layer formed on the counter substrate constituting the liquid crystal display panel according to Embodiment 1 of the present invention.
  • FIG. 3 is a plan view schematically showing a plurality of pixels formed on the active substrate constituting the liquid crystal display panel according to Embodiment 1 of the present invention.
  • FIG. 4 is an enlarged plan view showing one pixel formed on the active substrate in the first embodiment of the present invention.
  • FIG. 5 is a cross-sectional view of the liquid crystal display panel according to Embodiment 1 of the present invention taken along the line VV in FIG. FIG.
  • FIG. 6 is a circuit diagram of one pixel including a TFT and a touch switch of the liquid crystal display panel according to Embodiment 1 of the present invention.
  • 7A to 7E are cross-sectional views showing one manufacturing process of the counter substrate constituting the liquid crystal display panel according to Embodiment 1 of the present invention.
  • FIG. 8 is a schematic cross-sectional view of a liquid crystal display panel according to a comparative example.
  • FIG. 9 is an enlarged cross-sectional view of a touch switch of a liquid crystal display panel according to a comparative example.
  • FIG. 10A is an enlarged cross-sectional view of a touch switch of a liquid crystal display panel according to Embodiment 2 of the present invention.
  • FIG. 10B is a cross-sectional view taken along line XB-XB in FIG. 10A.
  • FIG. 11 is an enlarged cross-sectional view of another touch switch of the liquid crystal display panel according to Embodiment 2 of the present invention.
  • FIG. 12A is a schematic plan view showing an arrangement of color filter layers and touch switches in a liquid crystal display panel according to Embodiment 3 of the present invention.
  • 12B is a cross-sectional view of the liquid crystal display panel taken along the line XIIB-XIIB in FIG. 12A.
  • 12C is a cross-sectional view of the liquid crystal display panel taken along the line XIIC-XIIC in FIG. 12A.
  • FIG. 13 is a schematic plan view showing another arrangement of the color filter layer and the touch switch in the liquid crystal display panel according to Embodiment 3 of the present invention.
  • FIG. 14 is a schematic plan view showing still another arrangement of the color filter layer and the touch switch in the liquid crystal display panel according to Embodiment 3 of the present invention.
  • the switch electrode is preferably formed on a protrusion having a convex curved surface formed on the second substrate.
  • the first substrate is a counter substrate on which a color filter layer is formed
  • the second substrate is an active substrate on which a plurality of pixel electrodes and a plurality of TFTs for driving the plurality of pixel electrodes are formed. preferable.
  • FIG. 1 is a schematic cross-sectional view of a liquid crystal display panel 1 according to Embodiment 1 of the present invention.
  • FIG. 2 is a plan view schematically showing the color filter layer 26 formed on the counter substrate 11 constituting the liquid crystal display panel 1.
  • FIG. 3 is a plan view schematically showing a plurality of pixels 5 formed on the active substrate 12 constituting the liquid crystal display panel 1.
  • FIG. 4 is an enlarged plan view showing one pixel 5 formed on the active substrate 12.
  • FIG. 5 is a cross-sectional view of the liquid crystal display panel 1 taken along the line VV in FIG.
  • FIG. 6 is a circuit diagram of one pixel including the TFT 16 and the touch switch 50 of the liquid crystal display panel 1.
  • the liquid crystal display panel 1 of Embodiment 1 is, for example, a transmissive liquid crystal display panel that performs at least transmissive display.
  • the liquid crystal display panel 1 includes a counter substrate 11 as a first substrate, an active substrate 12 as a second substrate facing the counter substrate 11, and the counter substrate 11 and the active substrate 12. And a liquid crystal layer 10 therebetween.
  • An illuminating device (backlight) for illuminating the liquid crystal display panel 1 can be arranged on the side of the active substrate 12 opposite to the liquid crystal layer 10 to constitute a liquid crystal display device.
  • the liquid crystal display panel 1 has, for example, a rectangular display area and a frame area that is a non-display area formed in a frame shape around the display area.
  • the counter substrate 11 is formed with a color filter layer 26 and a switch protrusion 51
  • the active substrate 12 is formed with a plurality of pixel electrodes 15 and a switch electrode 52.
  • three switch protrusions 51 face one switch electrode 52.
  • An electrode (common electrode 27 in FIG. 5) is formed at the tip of the switch protrusion 51.
  • the switch protrusion 51, the electrode formed at the tip thereof, and the switch electrode 52 constitute a touch switch 50.
  • the counter substrate 11 includes a glass substrate 25 as an insulating translucent substrate and a color filter layer 26 formed on the surface of the glass substrate 25 facing the active substrate 12.
  • the glass substrate 25 is formed with a thickness of 0.7 mm or less, for example.
  • a polarizing plate (not shown) is attached to the surface of the glass substrate 25 opposite to the active substrate 12.
  • FIG. 2 is a plan view of the color filter layer 26 seen through from the glass substrate 25 side.
  • the color filter layer 26 includes colored layers 26R, 26G, and 26B, and a light-shielding layer (black matrix) 26M having a light shielding property, disposed between the adjacent colored layers 26R, 26G, and 26B.
  • the colored layer 26R selectively transmits light in the red wavelength band
  • the colored layer 26G selectively transmits light in the green wavelength band
  • the colored layer 26B selectively transmits light in the blue wavelength band.
  • the colored layers 26R, 26G, and 26B are arranged in an array in the vertical and horizontal directions within the display area of the glass substrate 25.
  • the coloring layers 26R, 26G, and 26B and the light shielding layer 26M are not particularly limited, and can be formed by a known method using a known material.
  • a spacer 33 and a switch protrusion 51 protruding toward the active substrate 12 are formed on the counter substrate 11.
  • the spacer 33 is a so-called photo spacer, and defines an interval (so-called cell gap) between the counter substrate 11 and the active substrate 12.
  • both the spacer 33 and the switch protrusion 51 are formed on the light shielding layer 26M.
  • a common electrode 27 (see FIG. 5) made of a transparent conductive material such as ITO (Indium) TinideOxide) is continuously formed so as to cover the color filter layer 26 and the switch protrusion 51. Further, an alignment film (not shown) made of polyimide or the like is formed so as to cover the color filter layer 26, the spacer 33, and the switch protrusion 51 (excluding the tip of the switch protrusion 51).
  • the tip of the spacer 33 is in contact with the surface of the active substrate 12.
  • the tip of the switch protrusion 51 is separated from the surface of the active substrate 12 when the counter substrate 11 is not pressed.
  • the height of the spacer 33 (that is, the cell gap) can be 3 ⁇ m, for example, and the height of the switch protrusion 51 can be 2.5 ⁇ m, for example.
  • the active substrate 12 is a so-called active matrix substrate, and has a glass substrate 35 as an insulating translucent substrate.
  • the glass substrate 35 is formed to a thickness of 0.7 mm or less, for example.
  • a plurality of gate wirings 13 parallel to each other and a plurality of source wirings 14 parallel to each other are formed on the glass substrate 35.
  • the plurality of gate lines 13 and the plurality of source lines 14 intersect with each other to form a lattice pattern.
  • a pixel 5 is formed in each rectangular region partitioned by a plurality of gate wirings 13 and a plurality of source wirings 14.
  • a pixel electrode 15 facing the common electrode formed on the counter substrate 11 and a TFT (Thin-FilmTransistor) 16 that is a switching element for switching and driving the voltage of the pixel electrode 15 are formed.
  • the pixel electrode 15 is formed at a position facing the colored layers 26R, 26G, and 26B of the counter substrate 11 on a one-to-one basis.
  • the TFT 16 is disposed in the upper right corner portion of the pixel 5 and connected to the gate wiring 13 and the source wiring 14.
  • the TFT 16 includes a gate electrode 17, a source electrode 18, and a drain electrode 19, and a semiconductor layer 34 is interposed between the gate electrode 17, the source electrode 18, and the drain electrode 19.
  • the gate electrode 17 is connected to the gate wiring 13
  • the source electrode 18 is connected to the source wiring 14, and the drain electrode 19 is connected to the pixel electrode 15.
  • the drain electrode 19 is covered with an interlayer insulating film (not shown), and as shown in FIG. 4, a contact hole 23 is formed through the interlayer insulating film.
  • the drain electrode 19 and the pixel electrode 15 are connected via the contact hole 23.
  • Image display is performed as follows. A signal voltage is applied to the source line 14 in a state where the scanning voltage is applied to the gate electrode 17 via the gate line 13. The signal voltage is supplied to the pixel electrode 15 through the source electrode 18 and the drain electrode 19. As a result, the liquid crystal layer 10 of the pixel 5 including the pixel electrode 15 is driven according to the potential difference between the pixel electrode 15 and the common electrode. A desired image is displayed by sequentially switching (scanning) the gate wirings 13 to which the scanning voltage is applied among the plurality of gate wirings 13 (scanning).
  • a plurality of capacitor wirings 20 parallel to each other are formed in the same direction as the gate wiring 13 so as to face a substantially central portion of the pixel electrode 15.
  • An interlayer insulating film (not shown) is interposed between the capacitor wiring 20 and the pixel electrode 15, thereby forming a capacitor element 21 also called an auxiliary capacitor.
  • the capacitive element 21 is formed in each pixel 5 and has a function of maintaining the display voltage in each pixel 5 substantially constant.
  • An alignment film (not shown) made of polyimide or the like is formed on the surface of the active substrate 12 on the liquid crystal layer 10 side so as to cover the pixel electrode 15.
  • a switch electrode 52 is further formed on the active substrate 12 in a region where the pixel electrode 15 is not formed in the lower right corner portion of each pixel 5.
  • the switch electrode 52 is made of, for example, ITO and can be formed in the same process as the pixel electrode 15.
  • a detection TFT 53 for detecting the pressed position is connected to the switch electrode 52.
  • FIG. 5 is a cross-sectional view of the liquid crystal display panel 1 taken along the line VV of FIG. 4 passing through the switch electrode 52 and the detection TFT 53.
  • the detection TFT 53 includes a gate electrode 55, a source electrode 56, and a drain electrode that is the switch electrode 52.
  • a gate electrode 55 is formed on the glass substrate 35, and a gate insulating film 36 is formed so as to cover the gate electrode 55.
  • a semiconductor layer 57 is formed on the surface of the gate insulating film 36 so as to cover the gate electrode 55.
  • a source electrode 56 and a switch electrode 52 are formed so as to cover a part of the surface of the semiconductor layer 57.
  • the source electrode 56 and the semiconductor layer 57 are covered with an interlayer insulating film 37.
  • the interlayer insulating film 37 is made of, for example, a resin having translucency (preferably having transparency).
  • the upper surface of the switch electrode 52 is not covered with the interlayer insulating film 37 but exposed toward the counter substrate 11.
  • the three switch protrusions 51 described above are formed on the counter substrate 11 so as to protrude toward the common switch electrode 52.
  • the detection TFT 53 is for detecting a conduction state between the common electrode 27 formed on the surface of the switch protrusion 51 and the switch electrode 52.
  • the gate electrode 55 is connected to the detection wiring 43, and the source electrode 56 is connected to the source wiring 14.
  • a plurality of detection wirings 43 are formed on the active substrate 12 in parallel with the gate wirings 13.
  • the detection TFT 53 is used to detect the conduction state between the common electrode 27 formed on the surface of the switch protrusion 51 and the switch electrode 52 and detect the touch position.
  • the touch position detection method will be described below.
  • the above operation is performed to detect a two-dimensional position of the touch position in the display area. it can.
  • the TFT 16 and the detection TFT 53 are connected to the source wiring 14.
  • a source wiring that connects the source electrode 56 of the detection TFT 53 may be provided separately from the source wiring 14. In this case, since the touch position can be detected independently of the image display control, the detection accuracy can be improved.
  • one touch switch 50 is provided for one pixel 5, but the present invention is not limited to this.
  • one touch switch 50 may be provided for one color pixel including the red, blue, and green pixels 5.
  • one touch switch 50 may be provided for an arbitrary number of pixels 5.
  • the manufacturing method of the liquid crystal display panel 1 of the present embodiment includes a first step of creating the counter substrate 11, a second step of creating the active substrate 12, and a third step of bonding the counter substrate 11 and the active substrate 12 together. Including. Either the first step or the second step may be performed first.
  • a first step of creating the counter substrate 11 will be described with reference to FIGS. 7A to 7E.
  • a light shielding layer 26 ⁇ / b> M having a predetermined pattern is formed on the glass substrate 25.
  • the light shielding layer 26M can be formed by applying a black resin material on the glass substrate 25 and then removing the unnecessary black resin material by photolithography.
  • colored layers 26R, 26G, and 26B are formed in the non-formation region of the light shielding layer 26M on the glass substrate 25.
  • the colored layers 26R, 26G, and 26B can be formed as follows. First, a color resist including a coloring layer material is applied on the glass substrate 25. Next, the color resist is cured and insolubilized by irradiating with ultraviolet rays through a photomask having openings of a predetermined pattern. Next, an uncured unnecessary color resist is removed with a developer. Finally, the color resist is baked and cured. The above steps are performed for the three color layers of red, green, and blue to form the color layers 26R, 26G, and 26B.
  • a switch protrusion 51 is formed on the light shielding layer 26M.
  • the switch protrusion 51 can be formed as follows. First, a resist for the switch protrusion 51 is applied on the glass substrate 25. Next, the resist is cured by being irradiated with ultraviolet rays through a photomask having openings of a predetermined pattern, and insolubilized. Next, the uncured unnecessary resist is removed with a developer. Finally, the resist is baked and cured. Thus, the switch protrusion 51 can be formed.
  • the switch protrusion 51 is formed at the same time as the process for forming the color layers 26R, 26G, and 26B (FIG. 7B). Good. In that case, a halftone mask is preferably used as the photomask.
  • the common electrode 27 is formed so as to cover the color filter layer 26 and the switch protrusion 51.
  • the common electrode 27 can be obtained by forming an ITO thin film by sputtering.
  • a spacer 33 is formed on the light shielding layer 26M.
  • the spacer 33 can be formed as follows. First, a resist for the spacer 33 is applied on the glass substrate 25. Next, the resist is cured by being irradiated with ultraviolet rays through a photomask having openings of a predetermined pattern, and insolubilized. Next, the uncured unnecessary resist is removed with a developer. Finally, the resist is baked and cured. Thus, the spacer 33 can be formed.
  • the common electrode 27 formed at the tip of the switch protrusion 51 is not covered with the alignment film.
  • a method for realizing this is not particularly limited, but can be as follows, for example.
  • the first method is as follows. That is, an alignment film is formed on the entire surface of the counter substrate 11, then a resist is formed on the alignment film, then the resist at the tip of the switch protrusion 51 is removed, and then the exposed alignment film on the switch protrusion 51 is removed. The resist is removed by ashing and finally the resist is washed away.
  • the tip of the switch protrusion 51 is formed into a convex curved surface shape (for example, a round dome shape) in the same manner as the resin base material 77 having a convex curved surface shape according to the second embodiment described later.
  • the surface shape of the common electrode 27 formed thereon is also a convex curved surface shape reflecting the tip shape of the switch protrusion 51.
  • the alignment film material solution is applied thereon, the alignment film material solution is repelled and not applied at the top of the convex curved surface and in the vicinity thereof. Thereafter, when the alignment film material is cured by baking, the common electrode 27 can be exposed at the tip of the switch protrusion 51.
  • This second method is advantageous in that the number of steps is small because the step of removing the alignment film in a predetermined region after forming the alignment film, which is necessary in the first method, is unnecessary.
  • the above method for preventing the common electrode 27 at the tip of the switch protrusion 51 from being covered with the alignment film is merely an example, and the present invention may use a method other than the above.
  • the second step of creating the active substrate 12 will be described.
  • the TFT 16, the detection TFT 53, the pixel electrode 15, the switch electrode 52, and the like are formed by a known method using photolithography.
  • the detection TFT 53 can be formed simultaneously in the same process as the TFT 16. Thereafter, an alignment film is formed on the entire surface of the active substrate 12.
  • the switch electrode 52 is not covered with the alignment film.
  • a method for realizing this is not particularly limited, but can be as follows, for example. That is, an alignment film is formed on the entire surface of the active substrate 12, then a resist is formed on the alignment film, then the resist on the switch electrode 52 is removed, and then the exposed alignment film on the switch electrode 52 is ashed. Finally, the resist is removed by washing.
  • the switch electrode 52 may not be covered with the alignment film by other methods.
  • the third step is performed.
  • the surface of the counter substrate 11 on which the color filter layer 26 is formed and the surface of the active substrate 12 on which the pixel electrode 15, the switch electrode 52, and the like are formed are opposed to each other. And the active substrate 12 are bonded together.
  • the liquid crystal layer 10 is sealed between the counter substrate 11 and the active substrate 12.
  • a plurality (three in the above embodiment) of switch protrusions 51 are opposed to a common switch electrode 52. Therefore, when a touch pressure is applied to the counter substrate 11, the load is distributed to the plurality of switch protrusions 51. That is, the load applied to one switch protrusion 51 becomes small. Thereby, the possibility that the switch protrusion 51 itself and the light shielding layer 26M under the switch protrusion 51 are destroyed is reduced. In addition, even if one switch protrusion 51 of the plurality of switch protrusions 51 facing one switch electrode 52 is destroyed and no longer functions due to the repeatedly applied touch pressure, the remaining switch protrusion 51 touches the switch electrode 51. The sensor function is continuously secured. As described above, in this embodiment, a liquid crystal display panel with an in-cell type touch sensor function with improved durability against repeated pressing can be realized by the distribution of the touch pressure and the redundant design.
  • three switch protrusions 51 are formed for one switch electrode 52, but the present invention is not limited to this.
  • the number of switch protrusions 51 for one common switch electrode 52 may be two or more. In general, as the number of the switch protrusions 51 with respect to one switch electrode 52 increases, the durability against repeated pressing of the touch sensor is improved.
  • the switch protrusion 51 is formed on the light shielding layer 26M, but may be formed on the colored layers 26R, 26G, and 26B.
  • the liquid crystal display panel 1 of Embodiment 1 described with reference to FIGS. 1 to 7 was created.
  • liquid crystal display panel 1 ′ shown in FIGS. 8 and 9 was prepared for comparison.
  • This liquid crystal display panel 1 ′ is different from the liquid crystal display panel 1 of the present embodiment in that one switch protrusion 51 is formed for one switch electrode 52.
  • the liquid crystal display of the present embodiment is the same. Same as panel 1.
  • a load of 2.5 N is applied to the display surface of the liquid crystal display panel 1 of the first embodiment (product of the present invention) and the liquid crystal display panel 1 ′ (conventional product) shown in FIGS. was applied repeatedly at 5 Hz to evaluate the durability of the touch sensor function. The results are shown in Table 1.
  • the touch position detection function was not impaired even after one million hits.
  • the liquid crystal display panel 2 of the second embodiment is different from the liquid crystal display panel 1 of the first embodiment in the configuration of the touch switch.
  • the liquid crystal display panel 2 of the present embodiment will be described focusing on differences from the first embodiment.
  • FIG. 10A is an enlarged cross-sectional view showing the touch switch 70 of the liquid crystal display panel 2 according to Embodiment 2 of the present invention in the same manner as FIG. 10B is a cross-sectional view taken along line XB-XB in FIG. 10A.
  • the same members as those shown in the first embodiment are denoted by the same reference numerals, and description thereof is omitted.
  • the upper surface of the switch electrode 52 was substantially flat.
  • the switch electrode 72 constituting the touch switch 70 is formed on a resin base material 77 having a convex curved surface (for example, a substantially semi-cylindrical surface), and the surface shape of the switch electrode 72 is also the same.
  • a convex curved surface for example, a substantially semi-cylindrical surface reflecting the surface shape of the resin base material 77.
  • the resin base 77 can be formed simultaneously with the interlayer insulating film 37 by using, for example, the same resin as the interlayer insulating film 37.
  • the switch electrode 72 is connected to the drain electrode of the detection TFT 53 via a through hole (not shown) formed in the resin base material 77, for example.
  • the liquid crystal display panel 2 of the second embodiment is substantially the same as the liquid crystal display panel 1 of the first embodiment except for the above.
  • the production method of the active substrate 12 of the second embodiment is substantially the same as that of the first embodiment, but the method of forming the switch electrode 72 is different. That is, as in the first embodiment, the TFT 16 and the detection TFT 53 are formed on the glass substrate 35 by a known method using photolithography, and the TFT 16 and the detection TFT 53 are covered with a resist. Next, the resist in the boundary region between the interlayer insulating film 37 and the resin base material 77 to be formed is removed. This resist removing step can be performed simultaneously with the step of forming the contact hole 23 (see FIG. 4) for connecting the drain electrode 19 of the TFT 16 and the pixel electrode 15. Next, the active substrate 12 is heat-treated.
  • the resist is softened and deformed by heating, and the outer peripheral edge thereof is gently rounded as shown in FIGS. 10A and 10B, so that the interlayer insulating film 37 and the resin base material 77 are formed.
  • the switch electrode 72 is formed on the resin base material 77.
  • the switch electrode 72 can be formed simultaneously with the pixel electrode 15 by forming a thin film of ITO, for example, using a sputtering method.
  • the connection between the switch electrode 72 and the drain electrode of the detection TFT 53 can be made, for example, through a through hole (not shown) formed in the resin base material 77.
  • an alignment film material solution is applied to the entire surface of the active substrate 12.
  • the alignment film material solution is repelled at the top of the convex curved surface of the switch electrode 72 and in the vicinity thereof and is not applied. Thereafter, baking is performed to cure the alignment film material. Since the alignment film material solution is not applied, the tip of the switch electrode 72 is exposed without being covered with the alignment film.
  • the method of creating the counter substrate 11 is the same as that of the first embodiment.
  • the active substrate 12 and the counter substrate 11 obtained as described above are bonded in the same manner as in the first embodiment, and the liquid crystal layer 10 is encapsulated to obtain the liquid crystal display panel 2 of the present embodiment.
  • the switch electrode 72 is formed on the convex curved surface of the resin base material 77, the surface shape of the switch electrode 72 is also a convex curved surface. Thereafter, if an alignment film is formed on the entire surface of the active substrate 12 in the same manner as a normal alignment film forming method, the tip of the switch electrode 72 can be exposed without being covered with the alignment film as described above.
  • a process of removing the alignment film on the switch electrode 52 after forming the alignment film is necessary.
  • the process of removing this alignment film is unnecessary. Therefore, the method for forming the alignment film on the active substrate 12 is simplified.
  • the top of the switch electrode 72 can be reliably exposed by such a simple method, the contact stability between the switch electrode 72 and the common electrode 27 formed at the tip of the switch protrusion 51 facing the switch electrode 72 is stable. Improves the reliability of the touch sensor.
  • a step of removing the resist in the boundary region between the interlayer insulating film 37 and the resin base material 77 is necessary. This is the contact hole 23 necessary in the first embodiment. (See FIG. 4).
  • the switch electrode 72 can be formed at the same time as the pixel electrode 15 is formed. Therefore, compared with Embodiment 1, the process newly required in this embodiment is only a process of performing heat treatment so that the surface of the resin base material 77 is rounded. Therefore, as a whole, the manufacturing process of the active substrate 12 can be simplified and the cost can be reduced as compared with the first embodiment.
  • a plurality of switch protrusions 51 are opposed to a common switch electrode 72. Therefore, as in the first embodiment, it is possible to realize a liquid crystal display panel with an in-cell type touch sensor function with improved durability against repeated pressing by distributing the touch pressure and using a redundant design.
  • one bowl-shaped resin base material 77 that is opposed to the three switch protrusions 51 and that is continuous in the arrangement direction of the three switch protrusions 51 is formed.
  • the present invention is not limited to this.
  • three resin bases 77 may be formed so as to face the three switch protrusions 51.
  • the surface of each resin substrate 77 has a gentle convex curved surface (for example, a substantially spherical surface).
  • the switch electrode 72 is continuously formed on the three resin base materials 77.
  • the resin base material 77 By forming the resin base material 77 independently so as to face the switch protrusions 51 in this way, the radius of curvature of the tip of each resin base material 77 is reduced in any direction.
  • the switch electrode 72 is less likely to adhere to the top of the convex curved surface and the vicinity thereof. Accordingly, the contact stability between the switch electrode 72 and the common electrode 27 formed at the tip of the switch protrusion 51 facing the switch electrode 72 is further improved, and the reliability of the touch sensor is further increased.
  • the liquid crystal display panel 3 of the third embodiment is different from the liquid crystal display panel 2 of the second embodiment in the configuration and arrangement of touch switches.
  • the liquid crystal display panel 3 of the present embodiment will be described focusing on differences from the second embodiment.
  • FIG. 12A is a schematic plan view showing the arrangement of the color filter layer and the touch switch 80 when the liquid crystal display panel 3 according to Embodiment 3 of the present invention is viewed from the counter substrate side.
  • 12B is a cross-sectional view of the liquid crystal display panel 3 taken along line XIIB-XIIB in FIG. 12A
  • FIG. 12C is a cross-sectional view of the liquid crystal display panel 3 taken along line XIIC-XIIC in FIG.
  • the same members as those shown in the first and second embodiments are denoted by the same reference numerals, and description thereof is omitted.
  • one touch switch 70 is formed for one pixel.
  • one touch switch 80 is formed for six pixels.
  • one detection TFT is arranged for one touch switch 80.
  • one touch switch 80 is formed for six pixels.
  • the present invention is not limited to this, and the number of pixels for one touch switch 80 may be more or less than six. Also good.
  • the switch electrode 82 constituting the touch switch 80 has a convex curved surface (for example, a substantially semi-cylindrical surface) like the switch electrode 72 shown in FIGS. 10A and 10B of the second embodiment. It is formed on the resin base material 87 having. As a result, the surface shape of the switch electrode 82 also has a convex curved surface (for example, a substantially semi-cylindrical surface) reflecting the surface shape of the resin base material 87.
  • the switch electrode 82 is connected to the drain electrode of the detection TFT through a through hole (not shown) formed in the resin base material 87, for example.
  • a plurality of switch protrusions 81 are formed on the counter substrate 11 so as to face the switch electrode 82 extending in a bowl shape. 12A and 12C, 11 switch protrusions 81 are opposed to one switch electrode 82, but the number of switch protrusions 81 may be two or more, and may be more or less than 11.
  • the plurality of switch protrusions 81 are arranged side by side along the longitudinal direction of the switch electrode 82.
  • Each switch protrusion 81 is substantially plate-shaped, and its main surface is orthogonal to the longitudinal direction of the switch electrode 82. As shown in FIG.
  • the tip of the switch protrusion 81 extends linearly in a direction parallel to the counter substrate 11 and perpendicular to the longitudinal direction of the switch electrode 82 (the left-right direction in FIG. 12B). . This linear tip faces the top of the switch electrode 82.
  • the touch switch 80 of the present embodiment can be formed in the same manner as the touch switch 70 of the second embodiment.
  • a liquid crystal display panel with an in-cell touch sensor function with improved durability against repeated pressing can be realized by distributing the touch pressure and using a redundant design.
  • the switch electrode 82 Since the surface shape of the switch electrode 82 has a convex curved surface, the switch electrode 82 can be exposed without being covered with the alignment film by a simple method as in the second embodiment.
  • the switch protrusion 81 has a linear tip extending in a direction perpendicular to the longitudinal direction of the bowl-shaped switch electrode 82. This tip is opposed to the top of the switch electrode 82. Further, a plurality of switch protrusions 81 each having such a tip are arranged along the longitudinal direction of the switch electrode 82. Accordingly, an allowable range for misalignment between the counter substrate 11 and the active substrate 12 is increased. Therefore, the productivity of the liquid crystal display panel 3 is improved.
  • one touch switch 80 is arranged for a plurality of pixels. Therefore, the size of the touch switch 80 can be set without being restricted by the pixel size. For example, it is possible to easily increase the size of the touch switch 80 compared to the first and second embodiments. In such a case, the allowable range for misalignment between the counter substrate 11 and the active substrate 12 is further expanded.
  • the plurality of switch protrusions 81 need not be aligned in a line along the longitudinal direction of the switch electrode 82, as shown in FIG. 12A.
  • a plurality of substantially cylindrical switch protrusions 81 may be staggered with respect to the switch electrode 82.
  • the configuration of the switch electrode 82 in FIG. 13 is the same as that in FIGS. 12A to 12C.
  • the configuration of FIG. 13 also has the same effect as the configuration of FIGS. 12A to 12C.
  • the resin base 87 may be formed independently so as to face each of the plurality of switch protrusions 81.
  • An example is shown in FIG. A plurality of resin bases 87 are arranged in a line in the left-right direction on the paper surface of FIG. 14, and each resin base 87 extends in a bowl shape in the vertical direction.
  • the switch electrode 82 is continuously formed on the plurality of resin bases 87.
  • the allowable range for the misalignment between the counter substrate 11 and the active substrate 12 is slightly smaller than the configurations of FIGS. 12A to 12C, particularly in the left-right direction of the paper surface of FIG. In FIG.
  • substantially cylindrical switch protrusions 81 are arranged in a staggered manner as in FIG. 13, but the present invention is not limited to this, and substantially plate-like switch protrusions 81 are arranged in a line as in FIG. 12A. May be.
  • the shape of the switch protrusion 81 does not have to be a plate shape or a columnar shape as in the above embodiment, and may be an arbitrary shape. Further, the tip of the switch protrusion 81 does not have to be linear, and may have an arbitrary shape such as a substantially hemispherical surface.
  • the upper surface of the switch electrode 82 does not need to be a convex curved surface, and may be a flat surface like the switch electrode 52 of the first embodiment.
  • the plurality of switch protrusions are formed on the counter substrate 11 and the switch electrodes are formed on the active substrate 12, but the present invention is not limited to this.
  • a plurality of switch protrusions may be formed on the active substrate 12 and the switch electrode may be formed on the counter substrate 11.
  • the present invention can also be applied to a liquid crystal display panel having a so-called “Color Filter on Array” structure in which the color filter layer is formed on the active substrate 11 on which the TFT 16 and the pixel electrode 15 are formed.
  • the application field of the present invention is not particularly limited, and can be widely used for various liquid crystal display devices that require a touch sensor function.
  • a touch switch is incorporated in the liquid crystal cell, it is thin and has a good display quality, and is excellent in durability against repeated pressing, so that it is particularly preferably used for small information terminals such as mobile phones and PDAs. it can.

Abstract

A touch switch (50) includes: a switch electrode (52) that is formed on a second substrate (12); a plurality of switch projections (51) that are formed on a first substrate (11) so as to protrude toward the one common switch electrode; and electrodes (27) that are respectively formed on the front ends of the plurality of switch projections and electrically connected with each other. Since a plurality of switch projections face one switch electrode, decentralization of the touching pressure and redundant design become possible, thereby improving durability with respect to repeated pressing.

Description

液晶表示パネルLCD panel
　本発明は、表示画面上の位置情報を検出するタッチセンサ機能を備えた液晶表示パネルに関する。 The present invention relates to a liquid crystal display panel having a touch sensor function for detecting position information on a display screen.
　近年、液晶表示パネルは、パーソナルコンピュータ、携帯電話、ＰＤＡ及びゲーム機器等の種々の機器に広く用いられている。また、タッチパネルを液晶表示パネルに重ねて配置することにより、表示画面上の位置情報を検出する液晶表示パネルも知られている。タッチパネルの位置検出方式としては、例えば、抵抗膜方式や静電容量方式等が、一般に知られている。 In recent years, liquid crystal display panels have been widely used in various devices such as personal computers, mobile phones, PDAs and game machines. A liquid crystal display panel that detects positional information on a display screen by arranging a touch panel on the liquid crystal display panel is also known. As a touch panel position detection method, for example, a resistance film method and a capacitance method are generally known.
　抵抗膜方式のタッチパネルは、僅かな隙間を介して対向する基板及びフィルムを有する。基板及びフィルムの互いに対向する面には透明導電膜がそれぞれ形成されている。このようなタッチパネルを、基板が表示パネル側となるように、表示パネルに貼り付ける。そして、指やタッチペン等で上記フィルムを押圧すると、フィルムが基板側へ撓んで透明導電膜同士が接触して導通する。このとき、両透明導電膜間の電流の変化を測定することにより、押された位置を検出することができる。 The resistive film type touch panel has a substrate and a film facing each other through a slight gap. Transparent conductive films are formed on surfaces of the substrate and the film that face each other. Such a touch panel is attached to the display panel so that the substrate is on the display panel side. And when the said film is pressed with a finger, a touch pen, etc., a film will bend to a board | substrate side and transparent conductive films will contact and will be conducted. At this time, the pressed position can be detected by measuring the change in current between the two transparent conductive films.
　しかし、表示パネルにタッチパネルを重ねて配置すると、表示パネルの表面、タッチパネルの裏面、タッチパネルの内部、及びタッチパネルの表面から反射光が生じるため、表示のコントラストが低下してしまう問題がある。 However, when the touch panel is placed over the display panel, reflected light is generated from the front surface of the display panel, the back surface of the touch panel, the inside of the touch panel, and the surface of the touch panel, so that there is a problem in that the display contrast is lowered.
　また、上記各反射光が互いに干渉することによってモワレが生じる結果、表示品位が低下する問題もある。さらに、表示パネルとタッチパネルとを積層するために、表示装置全体が厚くなる問題もある。 Also, there is a problem that display quality is deteriorated as a result of moire caused by interference between the reflected lights. Furthermore, since the display panel and the touch panel are stacked, there is a problem that the entire display device becomes thick.
　そこで、液晶表示パネルと抵抗膜方式のタッチパネルとを一体化した所謂インセル型のタッチセンサ機能付き液晶表示パネルが従来より提案されている。 Therefore, a so-called in-cell type liquid crystal display panel with a touch sensor function in which a liquid crystal display panel and a resistive film type touch panel are integrated has been proposed.
　例えば特許文献１の液晶表示パネルでは、画素電極を駆動するＴＦＴ（薄膜トランジスタ）がアレイ状に配置されたアクティブ基板と、共通電極及びカラーフィルター層が形成された対向基板とが液晶層を挟んで対向配置されている。アクティブ基板の画素電極と、対向基板のカラーフィルター層上に形成された共通電極とを繋ぐように、筒状部が設けられている。筒状部は、アクティブ基板と対向基板との間隙（即ち、セルギャップ）と等しい高さを有する中空筒形状を有し、弾性変形可能な材料からなる。筒状部の内部には、対向基板側（上端側）に僅かな隙間を残して、導電性材料が注入されている。導電性材料は、画素電極と導通している。指等の圧力によって対向基板が局所的に変形すると、筒状部が圧縮変形され、その内部の導電性材料の上端が対向基板の共通電極と接触し、共通電極と画素電極とが導通する。これを検知することで、タッチ位置を検出することができる。 For example, in the liquid crystal display panel of Patent Document 1, an active substrate in which TFTs (thin film transistors) for driving pixel electrodes are arranged in an array and a counter substrate on which a common electrode and a color filter layer are formed face each other with a liquid crystal layer interposed therebetween. Has been placed. A cylindrical portion is provided so as to connect the pixel electrode of the active substrate and the common electrode formed on the color filter layer of the counter substrate. The cylindrical portion has a hollow cylindrical shape having a height equal to a gap (that is, a cell gap) between the active substrate and the counter substrate, and is made of an elastically deformable material. Inside the cylindrical portion, a conductive material is injected leaving a slight gap on the counter substrate side (upper end side). The conductive material is electrically connected to the pixel electrode. When the counter substrate is locally deformed by the pressure of a finger or the like, the cylindrical portion is compressed and deformed, the upper end of the conductive material in the inside comes into contact with the common electrode of the counter substrate, and the common electrode and the pixel electrode are electrically connected. By detecting this, the touch position can be detected.
特開２００７－５８０７１号公報JP 2007-58071 A
　特許文献１に記載された上記の従来のインセル型タッチセンサ機能付き液晶表示パネルでは、対向基板に印加されたタッチ圧を筒状部で支持する構造であるので、繰り返してタッチ圧が印加されると筒状部が破壊されてしまうことがあった。また、筒状部が形成されているカラーフィルター層は一般に樹脂材料からなり、機械的強度が低いので、筒状部とカラーフィルター層との境界近傍でカラーフィルター層が破壊されてしまうこともあった。 The conventional liquid crystal display panel with an in-cell touch sensor function described in Patent Document 1 has a structure in which the touch pressure applied to the counter substrate is supported by the cylindrical portion, and thus the touch pressure is repeatedly applied. And the cylindrical part may be destroyed. In addition, the color filter layer in which the cylindrical part is formed is generally made of a resin material and has low mechanical strength, so the color filter layer may be destroyed in the vicinity of the boundary between the cylindrical part and the color filter layer. It was.
　このように筒状部又はカラーフィルター層が一旦破壊されてしまうと、タッチ圧によって対向基板を変形させても、筒状部内の導電性材料と共通基板とを導通させることができなくなるので、当該位置ではタッチセンサ機能が完全に消失してしまうというという問題があった。 As described above, once the cylindrical portion or the color filter layer is destroyed, even if the counter substrate is deformed by the touch pressure, the conductive material in the cylindrical portion cannot be electrically connected to the common substrate. There is a problem that the touch sensor function is completely lost at the position.
　本発明は、上記の従来の問題を解決し、繰り返し押しに対する耐久性が向上したインセル型タッチセンサ機能付き液晶表示パネルを提供することを目的とする。 An object of the present invention is to solve the above-mentioned conventional problems and to provide a liquid crystal display panel with an in-cell type touch sensor function that has improved durability against repeated pressing.
　本発明の液晶表示パネルは、第１基板と、前記第１基板に対向する第２基板と、前記第１基板と前記第２基板との間の液晶層と、前記第１基板又は前記第２基板が押圧されて前記第１基板と前記第２基板との間隔が狭くなったときに電気的に導通するタッチスイッチとを備える。前記タッチスイッチは、前記第２基板に形成されたスイッチ電極と、共通する１つの前記スイッチ電極に向かって突出して前記第１基板に形成された複数のスイッチ突起と、前記複数のスイッチ突起の先端に形成された、互いに電気的に接続された電極とを含むことを特徴とする。 The liquid crystal display panel of the present invention includes a first substrate, a second substrate facing the first substrate, a liquid crystal layer between the first substrate and the second substrate, the first substrate or the second substrate. A touch switch that is electrically conductive when the substrate is pressed and a distance between the first substrate and the second substrate is reduced. The touch switch includes a switch electrode formed on the second substrate, a plurality of switch protrusions formed on the first substrate protruding toward one common switch electrode, and tips of the plurality of switch protrusions And electrodes that are electrically connected to each other.
　本発明では、共通する１つのスイッチ電極に向かって複数のスイッチ突起が対向し、複数のスイッチ突起の先端に形成された電極が互いに電気的に接続されている。これにより、複数のスイッチ突起のそれぞれに印加される荷重が小さくなるので、スイッチ突起やその下層が破壊される可能性が小さくなる。また、複数のスイッチ突起のいずれかが破壊されても、その全てが破壊されるまではタッチセンサ機能は維持される。このように、本発明によれば、タッチ圧の分散化と冗長設計が可能となるので、繰り返し押しに対する耐久性が向上したインセル型タッチセンサ機能付き液晶表示パネルを実現することができる。 In the present invention, a plurality of switch protrusions face one common switch electrode, and the electrodes formed at the tips of the plurality of switch protrusions are electrically connected to each other. Thereby, since the load applied to each of the plurality of switch protrusions is reduced, the possibility that the switch protrusion and the lower layer thereof are destroyed is reduced. Further, even if any of the plurality of switch protrusions is destroyed, the touch sensor function is maintained until all of them are destroyed. As described above, according to the present invention, it is possible to disperse the touch pressure and to perform a redundant design. Therefore, it is possible to realize a liquid crystal display panel with an in-cell touch sensor function with improved durability against repeated pressing.
図１は、本発明の実施形態１に係る液晶表示パネルの概略断面図である。FIG. 1 is a schematic cross-sectional view of a liquid crystal display panel according to Embodiment 1 of the present invention. 図２は、本発明の実施形態１に係る液晶表示パネルを構成する対向基板に形成されたカラーフィルター層を模式的に示した平面図である。FIG. 2 is a plan view schematically showing the color filter layer formed on the counter substrate constituting the liquid crystal display panel according to Embodiment 1 of the present invention. 図３は、本発明の実施形態１に係る液晶表示パネルを構成するアクティブ基板に形成された複数の画素を模式的に示した平面図である。FIG. 3 is a plan view schematically showing a plurality of pixels formed on the active substrate constituting the liquid crystal display panel according to Embodiment 1 of the present invention. 図４は、本発明の実施形態１においてアクティブ基板に形成された１つの画素を拡大して示した平面図である。FIG. 4 is an enlarged plan view showing one pixel formed on the active substrate in the first embodiment of the present invention. 図５は、図４のＶ－Ｖ線に沿った、本発明の実施形態１に係る液晶表示パネルの矢視断面図である。FIG. 5 is a cross-sectional view of the liquid crystal display panel according to Embodiment 1 of the present invention taken along the line VV in FIG. 図６は、本発明の実施形態１に係る液晶表示パネルのＴＦＴ及びタッチスイッチを含む一画素の回路図である。FIG. 6 is a circuit diagram of one pixel including a TFT and a touch switch of the liquid crystal display panel according to Embodiment 1 of the present invention. 図７Ａ～図７Ｅは、本発明の実施形態１に係る液晶表示パネルを構成する対向基板の一製造工程を示した断面図である。7A to 7E are cross-sectional views showing one manufacturing process of the counter substrate constituting the liquid crystal display panel according to Embodiment 1 of the present invention. 図８は、比較例に係る液晶表示パネルの概略断面図である。FIG. 8 is a schematic cross-sectional view of a liquid crystal display panel according to a comparative example. 図９は、比較例に係る液晶表示パネルのタッチスイッチの拡大断面図である。FIG. 9 is an enlarged cross-sectional view of a touch switch of a liquid crystal display panel according to a comparative example. 図１０Ａは、本発明の実施形態２に係る液晶表示パネルのタッチスイッチの拡大断面図である。FIG. 10A is an enlarged cross-sectional view of a touch switch of a liquid crystal display panel according to Embodiment 2 of the present invention. 図１０Ｂは、図１０ＡのXＢ－XＢ線に沿った矢視断面図である。10B is a cross-sectional view taken along line XB-XB in FIG. 10A. 図１１は、本発明の実施形態２に係る液晶表示パネルの別のタッチスイッチの拡大断面図である。FIG. 11 is an enlarged cross-sectional view of another touch switch of the liquid crystal display panel according to Embodiment 2 of the present invention. 図１２Ａは、本発明の実施形態３に係る液晶表示パネルにおいて、カラーフィルター層及びタッチスイッチの配置を示した模式的平面図である。FIG. 12A is a schematic plan view showing an arrangement of color filter layers and touch switches in a liquid crystal display panel according to Embodiment 3 of the present invention. 図１２Ｂは、図１２ＡのXIIＢ－XIIＢ線に沿った液晶表示パネルの矢視断面図である。12B is a cross-sectional view of the liquid crystal display panel taken along the line XIIB-XIIB in FIG. 12A. 図１２Ｃは、図１２ＡのXIIＣ－XIIＣ線に沿った液晶表示パネルの矢視断面図である。12C is a cross-sectional view of the liquid crystal display panel taken along the line XIIC-XIIC in FIG. 12A. 図１３は、本発明の実施形態３に係る液晶表示パネルにおいて、カラーフィルター層及びタッチスイッチの別の配置を示した模式的平面図である。FIG. 13 is a schematic plan view showing another arrangement of the color filter layer and the touch switch in the liquid crystal display panel according to Embodiment 3 of the present invention. 図１４は、本発明の実施形態３に係る液晶表示パネルにおいて、カラーフィルター層及びタッチスイッチの更に別の配置を示した模式的平面図である。FIG. 14 is a schematic plan view showing still another arrangement of the color filter layer and the touch switch in the liquid crystal display panel according to Embodiment 3 of the present invention.
　上記の本発明の液晶表示パネルにおいて、前記スイッチ電極は、前記第２基板に形成された凸曲面を有する突起上に形成されていることが好ましい。これにより、第２基板の製造工程を簡単化することができるので、製造コストを低減することができる。 In the liquid crystal display panel of the present invention, the switch electrode is preferably formed on a protrusion having a convex curved surface formed on the second substrate. Thereby, since the manufacturing process of the second substrate can be simplified, the manufacturing cost can be reduced.
　前記第１基板が、カラーフィルター層が形成された対向基板であり、前記第２基板が、複数の画素電極及び前記複数の画素電極を駆動する複数のＴＦＴが形成されたアクティブ基板であることが好ましい。 The first substrate is a counter substrate on which a color filter layer is formed, and the second substrate is an active substrate on which a plurality of pixel electrodes and a plurality of TFTs for driving the plurality of pixel electrodes are formed. preferable.
　以下、本発明を好適な実施形態を示しながら詳細に説明する。但し、本発明は以下の実施形態に限定されないことはいうまでもない。以下の説明において参照する各図は、説明の便宜上、本発明の実施形態の構成部材のうち、本発明を説明するために必要な主要部材のみを簡略化して示したものである。従って、本発明は以下の各図に示されていない任意の構成部材を備え得る。また、以下の各図中の部材の寸法は、実際の構成部材の寸法および各部材の寸法比率等を忠実に表したものではない。 Hereinafter, the present invention will be described in detail while showing preferred embodiments. However, it goes without saying that the present invention is not limited to the following embodiments. For convenience of explanation, the drawings referred to in the following description show only the main members necessary for explaining the present invention in a simplified manner among the constituent members of the embodiment of the present invention. Therefore, the present invention can include arbitrary components not shown in the following drawings. In addition, the dimensions of the members in the following drawings do not faithfully represent the actual dimensions of the constituent members and the dimensional ratios of the members.
　（実施形態１）
　図１は、本発明の実施形態１に係る液晶表示パネル１の概略断面図である。図２は、液晶表示パネル１を構成する対向基板１１に形成されたカラーフィルター層２６を模式的に示した平面図である。図３は、液晶表示パネル１を構成するアクティブ基板１２に形成された複数の画素５を模式的に示した平面図である。図４は、アクティブ基板１２に形成された１つの画素５を拡大して示した平面図である。図５は、図４のＶ－Ｖ線に沿った液晶表示パネル１の矢視断面図である。図６は、液晶表示パネル１のＴＦＴ１６及びタッチスイッチ５０を含む一画素の回路図である。 (Embodiment 1)
FIG. 1 is a schematic cross-sectional view of a liquid crystal display panel 1 according to Embodiment 1 of the present invention. FIG. 2 is a plan view schematically showing the color filter layer 26 formed on the counter substrate 11 constituting the liquid crystal display panel 1. FIG. 3 is a plan view schematically showing a plurality of pixels 5 formed on the active substrate 12 constituting the liquid crystal display panel 1. FIG. 4 is an enlarged plan view showing one pixel 5 formed on the active substrate 12. FIG. 5 is a cross-sectional view of the liquid crystal display panel 1 taken along the line VV in FIG. FIG. 6 is a circuit diagram of one pixel including the TFT 16 and the touch switch 50 of the liquid crystal display panel 1.
　－液晶表示パネルの構成－
　本実施形態１の液晶表示パネル１は、例えば、少なくとも透過表示を行う透過型の液晶表示パネルである。液晶表示パネル１は、図１に示すように、第１基板としての対向基板１１と、対向基板１１に対向する、第２基板としてのアクティブ基板１２と、これら対向基板１１とアクティブ基板１２との間の液晶層１０とを備える。アクティブ基板１２の液晶層１０とは反対側に、液晶表示パネル１を照明する照明装置（バックライト）を配置して、液晶表示装置を構成することができる。 -Composition of liquid crystal display panel-
The liquid crystal display panel 1 of Embodiment 1 is, for example, a transmissive liquid crystal display panel that performs at least transmissive display. As shown in FIG. 1, the liquid crystal display panel 1 includes a counter substrate 11 as a first substrate, an active substrate 12 as a second substrate facing the counter substrate 11, and the counter substrate 11 and the active substrate 12. And a liquid crystal layer 10 therebetween. An illuminating device (backlight) for illuminating the liquid crystal display panel 1 can be arranged on the side of the active substrate 12 opposite to the liquid crystal layer 10 to constitute a liquid crystal display device.
　液晶表示パネル１は、図示を省略するが、例えば矩形状の表示領域と、この表示領域の周囲に枠状に形成された非表示領域である額縁領域とを有している。 Although not shown, the liquid crystal display panel 1 has, for example, a rectangular display area and a frame area that is a non-display area formed in a frame shape around the display area.
　表示領域内において、対向基板１１には、カラーフィルター層２６と、スイッチ突起５１とが形成され、アクティブ基板１２には、複数の画素電極１５と、スイッチ電極５２とが形成されている。本実施形態では、１つのスイッチ電極５２に対して３つのスイッチ突起５１が対向している。スイッチ突起５１の先端には、電極（図５の共通電極２７）が形成されている。スイッチ突起５１と、その先端に形成された電極と、スイッチ電極５２とはタッチスイッチ５０を構成する。対向基板１１が押圧されて対向基板１１が局所的に湾曲し、対向基板１１とアクティブ基板１２との間隔が狭くなると、スイッチ突起５１の先端に形成された電極とスイッチ電極５２とが接触し、タッチスイッチ５０が電気的に導通する。これにより押圧位置（タッチ位置）を検出することができる。 In the display area, the counter substrate 11 is formed with a color filter layer 26 and a switch protrusion 51, and the active substrate 12 is formed with a plurality of pixel electrodes 15 and a switch electrode 52. In the present embodiment, three switch protrusions 51 face one switch electrode 52. An electrode (common electrode 27 in FIG. 5) is formed at the tip of the switch protrusion 51. The switch protrusion 51, the electrode formed at the tip thereof, and the switch electrode 52 constitute a touch switch 50. When the counter substrate 11 is pressed to locally curve the counter substrate 11 and the distance between the counter substrate 11 and the active substrate 12 becomes narrow, the electrode formed at the tip of the switch protrusion 51 and the switch electrode 52 come into contact with each other, The touch switch 50 is electrically connected. Thereby, a pressing position (touch position) can be detected.
　－対向基板の構成－
　対向基板１１の構成を説明する。 -Configuration of counter substrate-
The configuration of the counter substrate 11 will be described.
　対向基板１１は、図１に示すように、絶縁性透光性基板としてのガラス基板２５と、ガラス基板２５のアクティブ基板１２に対向する面に形成されたカラーフィルター層２６とを有する。 As shown in FIG. 1, the counter substrate 11 includes a glass substrate 25 as an insulating translucent substrate and a color filter layer 26 formed on the surface of the glass substrate 25 facing the active substrate 12.
　ガラス基板２５は、例えば０．７ｍｍ以下の厚みに形成されている。ガラス基板２５のアクティブ基板１２とは反対側の表面には偏光板（図示せず）が貼付されている。 The glass substrate 25 is formed with a thickness of 0.7 mm or less, for example. A polarizing plate (not shown) is attached to the surface of the glass substrate 25 opposite to the active substrate 12.
　図２はガラス基板２５側から透視したカラーフィルター層２６の平面図である。カラーフィルター層２６は、着色層２６Ｒ，２６Ｇ，２６Ｂと、隣り合う着色層２６Ｒ，２６Ｇ，２６Ｂ間に配置された、遮光性を有する遮光層（ブラックマトリクス）２６Ｍとを備える。着色層２６Ｒは赤色の波長帯域の光を選択的に透過させ、着色層２６Ｇは緑色の波長帯域の光を選択的に透過させ、着色層２６Ｂは青色の波長帯域の光を選択的に透過させる。着色層２６Ｒ，２６Ｇ，２６Ｂは、ガラス基板２５の表示領域内に縦横方向にアレイ状に配置されている。着色層２６Ｒ，２６Ｇ，２６Ｂ及び遮光層２６Ｍは、特に制限はなく、公知の材料を用いて、公知の方法で形成することができる。 FIG. 2 is a plan view of the color filter layer 26 seen through from the glass substrate 25 side. The color filter layer 26 includes colored layers 26R, 26G, and 26B, and a light-shielding layer (black matrix) 26M having a light shielding property, disposed between the adjacent colored layers 26R, 26G, and 26B. The colored layer 26R selectively transmits light in the red wavelength band, the colored layer 26G selectively transmits light in the green wavelength band, and the colored layer 26B selectively transmits light in the blue wavelength band. . The colored layers 26R, 26G, and 26B are arranged in an array in the vertical and horizontal directions within the display area of the glass substrate 25. The coloring layers 26R, 26G, and 26B and the light shielding layer 26M are not particularly limited, and can be formed by a known method using a known material.
　図１に示されているように、対向基板１１には、アクティブ基板１２に向かって突出したスペーサ３３及びスイッチ突起５１が形成されている。スペーサ３３は、いわゆるフォトスペーサであり、対向基板１１とアクティブ基板１２との間隔（いわゆるセルギャップ）を規定する。図１及び図２に示されているように、スペーサ３３及びスイッチ突起５１はいずれも遮光層２６Ｍ上に形成されている。 As shown in FIG. 1, a spacer 33 and a switch protrusion 51 protruding toward the active substrate 12 are formed on the counter substrate 11. The spacer 33 is a so-called photo spacer, and defines an interval (so-called cell gap) between the counter substrate 11 and the active substrate 12. As shown in FIGS. 1 and 2, both the spacer 33 and the switch protrusion 51 are formed on the light shielding layer 26M.
　対向基板１１には、カラーフィルター層２６及びスイッチ突起５１を覆うように、ＩＴＯ（Indium Tin Oxide）などの透明導電性材料からなる共通電極２７（図５参照）が連続的に形成されている。更に、カラーフィルター層２６、スペーサ３３、スイッチ突起５１（スイッチ突起５１の先端を除く）を覆うように、例えばポリイミド等からなる配向膜（図示せず）が形成されている。 On the counter substrate 11, a common electrode 27 (see FIG. 5) made of a transparent conductive material such as ITO (Indium） TinideOxide) is continuously formed so as to cover the color filter layer 26 and the switch protrusion 51. Further, an alignment film (not shown) made of polyimide or the like is formed so as to cover the color filter layer 26, the spacer 33, and the switch protrusion 51 (excluding the tip of the switch protrusion 51).
　スペーサ３３の先端は、アクティブ基板１２の表面に接触している。一方、スイッチ突起５１の先端は、対向基板１１が押圧されない状態では、アクティブ基板１２の表面から離間している。スペーサ３３の高さ（即ち、セルギャップ）は例えば３μｍ、スイッチ突起５１の高さは例えば２．５μｍにすることができる。 The tip of the spacer 33 is in contact with the surface of the active substrate 12. On the other hand, the tip of the switch protrusion 51 is separated from the surface of the active substrate 12 when the counter substrate 11 is not pressed. The height of the spacer 33 (that is, the cell gap) can be 3 μm, for example, and the height of the switch protrusion 51 can be 2.5 μm, for example.
　－アクティブ基板の構成－
　アクティブ基板１２の構成を説明する。 -Configuration of active substrate-
The configuration of the active substrate 12 will be described.
　アクティブ基板１２は、いわゆるアクティブマトリクス基板であって、絶縁性透光性基板としてのガラス基板３５を有している。ガラス基板３５は、例えば０．７ｍｍ以下の厚みに形成されている。 The active substrate 12 is a so-called active matrix substrate, and has a glass substrate 35 as an insulating translucent substrate. The glass substrate 35 is formed to a thickness of 0.7 mm or less, for example.
　ガラス基板３５には、図３、図４に示すように、互いに平行な複数のゲート配線１３と、互いに平行な複数のソース配線１４とが形成されている。複数のゲート配線１３と複数のソース配線１４とは互いに交差して、格子状パターンを形成している。 As shown in FIGS. 3 and 4, a plurality of gate wirings 13 parallel to each other and a plurality of source wirings 14 parallel to each other are formed on the glass substrate 35. The plurality of gate lines 13 and the plurality of source lines 14 intersect with each other to form a lattice pattern.
　複数のゲート配線１３と複数のソース配線１４とで区画された矩形状の各領域内に、画素５が形成される。画素５には、対向基板１１に形成された共通電極に対向する画素電極１５と、画素電極１５の電圧をスイッチング駆動するスイッチング素子であるＴＦＴ（Thin-Film Transistor）１６とが形成されている。画素電極１５は、対向基板１１の着色層２６Ｒ，２６Ｇ，２６Ｂに一対一に対向する位置に形成される。 A pixel 5 is formed in each rectangular region partitioned by a plurality of gate wirings 13 and a plurality of source wirings 14. In the pixel 5, a pixel electrode 15 facing the common electrode formed on the counter substrate 11, and a TFT (Thin-FilmTransistor) 16 that is a switching element for switching and driving the voltage of the pixel electrode 15 are formed. The pixel electrode 15 is formed at a position facing the colored layers 26R, 26G, and 26B of the counter substrate 11 on a one-to-one basis.
　本実施形態では、図３、図４に示すように、ＴＦＴ１６は、画素５の右上隅部分に配置され、ゲート配線１３及びソース配線１４と接続されている。ＴＦＴ１６は、ゲート電極１７と、ソース電極１８と、ドレイン電極１９とを備え、ゲート電極１７とソース電極１８及びドレイン電極１９との間には半導体層３４が介在している。ゲート電極１７はゲート配線１３に接続され、ソース電極１８はソース配線１４に接続され、ドレイン電極１９は画素電極１５に接続されている。 In this embodiment, as shown in FIGS. 3 and 4, the TFT 16 is disposed in the upper right corner portion of the pixel 5 and connected to the gate wiring 13 and the source wiring 14. The TFT 16 includes a gate electrode 17, a source electrode 18, and a drain electrode 19, and a semiconductor layer 34 is interposed between the gate electrode 17, the source electrode 18, and the drain electrode 19. The gate electrode 17 is connected to the gate wiring 13, the source electrode 18 is connected to the source wiring 14, and the drain electrode 19 is connected to the pixel electrode 15.
　ドレイン電極１９は、層間絶縁膜（図示せず）によって覆われており、図４に示すように、その層間絶縁膜にはコンタクトホール２３が貫通形成されている。そして、コンタクトホール２３を介してドレイン電極１９と画素電極１５とが接続されている。 The drain electrode 19 is covered with an interlayer insulating film (not shown), and as shown in FIG. 4, a contact hole 23 is formed through the interlayer insulating film. The drain electrode 19 and the pixel electrode 15 are connected via the contact hole 23.
　画像表示は以下のようにして行われる。走査電圧がゲート配線１３を介してゲート電極１７に印加された状態で、信号電圧がソース配線１４に印加される。信号電圧は、ソース電極１８及びドレイン電極１９を介して画素電極１５へ供給される。その結果、画素電極１５と共通電極との間の電位差に応じて、当該画素電極１５を含む画素５の液晶層１０が駆動される。複数のゲート配線１３のうち走査電圧を印加するゲート配線１３を順次切り替えて（走査）上記の動作を行うことで、所望の画像が表示される。 Image display is performed as follows. A signal voltage is applied to the source line 14 in a state where the scanning voltage is applied to the gate electrode 17 via the gate line 13. The signal voltage is supplied to the pixel electrode 15 through the source electrode 18 and the drain electrode 19. As a result, the liquid crystal layer 10 of the pixel 5 including the pixel electrode 15 is driven according to the potential difference between the pixel electrode 15 and the common electrode. A desired image is displayed by sequentially switching (scanning) the gate wirings 13 to which the scanning voltage is applied among the plurality of gate wirings 13 (scanning).
　アクティブ基板１２には、図４に示すように、互いに平行な複数の容量配線２０が画素電極１５の略中央部分と対向するように、ゲート配線１３と同じ方向に形成されている。容量配線２０と画素電極１５との間には層間絶縁膜（図示せず）が介在しており、これらによって補助容量とも称される容量素子２１が形成される。容量素子２１は、各画素５に形成されており、各画素５における表示電圧を略一定に維持する機能を有する。 On the active substrate 12, as shown in FIG. 4, a plurality of capacitor wirings 20 parallel to each other are formed in the same direction as the gate wiring 13 so as to face a substantially central portion of the pixel electrode 15. An interlayer insulating film (not shown) is interposed between the capacitor wiring 20 and the pixel electrode 15, thereby forming a capacitor element 21 also called an auxiliary capacitor. The capacitive element 21 is formed in each pixel 5 and has a function of maintaining the display voltage in each pixel 5 substantially constant.
　アクティブ基板１２の液晶層１０側表面には、画素電極１５を覆うように、例えばポリイミド等からなる配向膜（図示せず）が形成されている。 An alignment film (not shown) made of polyimide or the like is formed on the surface of the active substrate 12 on the liquid crystal layer 10 side so as to cover the pixel electrode 15.
　スペーサ３３及びスイッチ突起５１の位置を図３、図４に破線で示している。 The positions of the spacer 33 and the switch protrusion 51 are indicated by broken lines in FIGS.
　－タッチスイッチの構成－
　アクティブ基板１２には、図３、図４に示すように、各画素５の右下隅部分の画素電極１５が形成されていない領域にスイッチ電極５２が更に形成されている。スイッチ電極５２は、例えばＩＴＯにより構成され、画素電極１５と同じ工程で形成することができる。スイッチ電極５２には、押圧位置を検出するための検出用ＴＦＴ５３が接続されている。 -Touch switch configuration-
As shown in FIGS. 3 and 4, a switch electrode 52 is further formed on the active substrate 12 in a region where the pixel electrode 15 is not formed in the lower right corner portion of each pixel 5. The switch electrode 52 is made of, for example, ITO and can be formed in the same process as the pixel electrode 15. A detection TFT 53 for detecting the pressed position is connected to the switch electrode 52.
　図５は、スイッチ電極５２及び検出用ＴＦＴ５３を通る図４のＶ－Ｖ線に沿った液晶表示パネル１の矢視断面図である。図５に示されているように、検出用ＴＦＴ５３は、ゲート電極５５と、ソース電極５６と、スイッチ電極５２であるドレイン電極とを備える。ガラス基板３５上にゲート電極５５が形成され、ゲート電極５５を覆うようにゲート絶縁膜３６が形成されている。ゲート絶縁膜３６の表面には、ゲート電極５５を覆うように半導体層５７が形成されている。さらに、半導体層５７の一部の表面を覆うように、ソース電極５６及びスイッチ電極５２が形成されている。ソース電極５６及び半導体層５７は層間絶縁膜３７で覆われている。層間絶縁膜３７は、例えば透光性を有する（好ましくは透明性を有する）樹脂からなる。一方、スイッチ電極５２の上面は層間絶縁膜３７に覆われずに、対向基板１１に向かって露出している。上述の３つのスイッチ突起５１は、共通するスイッチ電極５２に向かって突出するように対向基板１１に形成されている。検出用ＴＦＴ５３は、スイッチ突起５１の表面に形成された共通電極２７とスイッチ電極５２との導通状態を検出するためのものである。 FIG. 5 is a cross-sectional view of the liquid crystal display panel 1 taken along the line VV of FIG. 4 passing through the switch electrode 52 and the detection TFT 53. As shown in FIG. 5, the detection TFT 53 includes a gate electrode 55, a source electrode 56, and a drain electrode that is the switch electrode 52. A gate electrode 55 is formed on the glass substrate 35, and a gate insulating film 36 is formed so as to cover the gate electrode 55. A semiconductor layer 57 is formed on the surface of the gate insulating film 36 so as to cover the gate electrode 55. Further, a source electrode 56 and a switch electrode 52 are formed so as to cover a part of the surface of the semiconductor layer 57. The source electrode 56 and the semiconductor layer 57 are covered with an interlayer insulating film 37. The interlayer insulating film 37 is made of, for example, a resin having translucency (preferably having transparency). On the other hand, the upper surface of the switch electrode 52 is not covered with the interlayer insulating film 37 but exposed toward the counter substrate 11. The three switch protrusions 51 described above are formed on the counter substrate 11 so as to protrude toward the common switch electrode 52. The detection TFT 53 is for detecting a conduction state between the common electrode 27 formed on the surface of the switch protrusion 51 and the switch electrode 52.
　図４に示されているように、ゲート電極５５は検出用配線４３に接続され、ソース電極５６はソース配線１４に接続されている。検出用配線４３は、ゲート配線１３と平行にアクティブ基板１２上に複数本形成されている。 As shown in FIG. 4, the gate electrode 55 is connected to the detection wiring 43, and the source electrode 56 is connected to the source wiring 14. A plurality of detection wirings 43 are formed on the active substrate 12 in parallel with the gate wirings 13.
　－タッチ位置の検出方法－
　本実施形態の液晶表示パネル１では、検出用ＴＦＴ５３を用いて、スイッチ突起５１の表面に形成された共通電極２７とスイッチ電極５２との導通状態を検出し、タッチ位置を検出する。以下に、タッチ位置の検出方法を説明する。 -Touch position detection method-
In the liquid crystal display panel 1 of the present embodiment, the detection TFT 53 is used to detect the conduction state between the common electrode 27 formed on the surface of the switch protrusion 51 and the switch electrode 52 and detect the touch position. The touch position detection method will be described below.
　図５及び図６において、ある検出用配線４３に所定の走査電圧が印加されると、当該検出用配線４３に接続されている検出用ＴＦＴ５３がＯＮ状態となり、ドレイン電極であるスイッチ電極５２とソース電極５６とが導通する。このとき、使用者が対向基板１１をタッチすると、対向基板１１が撓み、対向基板１１上のスイッチ突起５１の先端に形成された共通電極２７と、アクティブ基板１２上のスイッチ電極５２とが接触して、共通電極２７とスイッチ電極５２とが導通し、共通電極２７に印加されている電圧（共通電圧）に応じた電流がソース配線１４に流れる。ソース配線１４を通じて、この電流を検知することによって、検出用配線４３と平行な方向におけるタッチ位置（押圧位置）を検出することができる。共通するスイッチ電極５２に対向する３つのスイッチ突起５１のうち、少なくとも１つのスイッチ突起５１の先端に形成された共通電極２７がスイッチ電極５２に接触すれば、タッチ位置を検出することができる。 5 and 6, when a predetermined scanning voltage is applied to a certain detection wiring 43, the detection TFT 53 connected to the detection wiring 43 is turned on, and the switch electrode 52 that is the drain electrode and the source The electrode 56 is electrically connected. At this time, when the user touches the counter substrate 11, the counter substrate 11 bends, and the common electrode 27 formed at the tip of the switch protrusion 51 on the counter substrate 11 and the switch electrode 52 on the active substrate 12 come into contact with each other. Thus, the common electrode 27 and the switch electrode 52 are brought into conduction, and a current corresponding to the voltage (common voltage) applied to the common electrode 27 flows through the source wiring 14. By detecting this current through the source wiring 14, the touch position (pressing position) in the direction parallel to the detection wiring 43 can be detected. The touch position can be detected when the common electrode 27 formed at the tip of at least one of the three switch protrusions 51 facing the common switch electrode 52 contacts the switch electrode 52.
　一方、対向基板１１がタッチされていないと、共通電極２７とスイッチ電極５２とが導通せず、ソース配線１４には電流が流れない。したがって、この場合には、タッチ位置（押圧位置）が検出されず、非接触であると検出される。 On the other hand, if the counter substrate 11 is not touched, the common electrode 27 and the switch electrode 52 do not conduct, and no current flows through the source wiring 14. Therefore, in this case, the touch position (pressed position) is not detected, and it is detected that it is non-contact.
　複数の検出用配線４３のうち走査電圧を印加する検出用配線４３を順次切り替えて（走査）上記の動作を行うことで、タッチ位置の表示領域内での二次元的な位置を検出することができる。 By sequentially switching (scanning) the detection wiring 43 to which the scanning voltage is applied among the plurality of detection wirings 43, the above operation is performed to detect a two-dimensional position of the touch position in the display area. it can.
　本実施形態では、ＴＦＴ１６と検出用ＴＦＴ５３とをソース配線１４に接続したが、例えば検出用ＴＦＴ５３のソース電極５６を接続するソース配線をソース配線１４とは別に設けてもよい。この場合には、画像表示の制御とは独立してタッチ位置検出を行うことができるので、検出精度を高めることが可能となる。 In the present embodiment, the TFT 16 and the detection TFT 53 are connected to the source wiring 14. However, for example, a source wiring that connects the source electrode 56 of the detection TFT 53 may be provided separately from the source wiring 14. In this case, since the touch position can be detected independently of the image display control, the detection accuracy can be improved.
　本実施形態では、１つの画素５に対して１つのタッチスイッチ５０を設けたが、本発明はこれに限定されない。例えば、赤、青、緑の各画素５からなる１つのカラー画素に対して１つのタッチスイッチ５０を設けてもよい。あるいは、任意の数の画素５に対して１つのタッチスイッチ５０を設けてもよい。 In the present embodiment, one touch switch 50 is provided for one pixel 5, but the present invention is not limited to this. For example, one touch switch 50 may be provided for one color pixel including the red, blue, and green pixels 5. Alternatively, one touch switch 50 may be provided for an arbitrary number of pixels 5.
　－液晶表示パネルの製造方法－
　上記の液晶表示パネル１の製造方法を説明する。 -Manufacturing method of liquid crystal display panel-
A method for manufacturing the liquid crystal display panel 1 will be described.
　本実施形態の液晶表示パネル１の製造方法は、対向基板１１を作成する第１工程と、アクティブ基板１２を作成する第２工程と、上記対向基板１１とアクティブ基板１２とを貼り合わせる第３工程とを含む。第１工程及び第２工程は、どちらを先に行っても構わない。 The manufacturing method of the liquid crystal display panel 1 of the present embodiment includes a first step of creating the counter substrate 11, a second step of creating the active substrate 12, and a third step of bonding the counter substrate 11 and the active substrate 12 together. Including. Either the first step or the second step may be performed first.
　対向基板１１を作成する第１工程を図７Ａ～図７Ｅを用いて説明する。 A first step of creating the counter substrate 11 will be described with reference to FIGS. 7A to 7E.
　最初に、図７Ａに示すように、ガラス基板２５上に所定パターンの遮光層２６Ｍを形成する。遮光層２６Ｍの形成方法は特に制限はなく、例えば公知の方法を用いることができる。例えば、黒色樹脂材料をガラス基板２５上に塗布し、次いでフォトリソグラフィにより不要部分の黒色樹脂材料を除去することで遮光層２６Ｍを形成することができる。 First, as shown in FIG. 7A, a light shielding layer 26 </ b> M having a predetermined pattern is formed on the glass substrate 25. There is no restriction | limiting in particular in the formation method of the light shielding layer 26M, For example, a well-known method can be used. For example, the light shielding layer 26M can be formed by applying a black resin material on the glass substrate 25 and then removing the unnecessary black resin material by photolithography.
　次いで、図７Ｂに示すように、ガラス基板２５上の遮光層２６Ｍの非形成領域に着色層２６Ｒ，２６Ｇ，２６Ｂを形成する。着色層２６Ｒ，２６Ｇ，２６Ｂは以下のように形成することができる。最初に、ガラス基板２５上に着色層材料を含むカラーレジストを塗布する。次いで、所定パターンの開口を有するフォトマスクを介して紫外線照射してカラーレジストを硬化させ、不溶化させる。次いで、現像液により未硬化の不要なカラーレジストを除去する。最後に、カラーレジストをベークして硬化させる。以上の工程を、赤、緑、青の３色の着色層材料について用いて行い、着色層２６Ｒ，２６Ｇ，２６Ｂを形成する。 Next, as shown in FIG. 7B, colored layers 26R, 26G, and 26B are formed in the non-formation region of the light shielding layer 26M on the glass substrate 25. The colored layers 26R, 26G, and 26B can be formed as follows. First, a color resist including a coloring layer material is applied on the glass substrate 25. Next, the color resist is cured and insolubilized by irradiating with ultraviolet rays through a photomask having openings of a predetermined pattern. Next, an uncured unnecessary color resist is removed with a developer. Finally, the color resist is baked and cured. The above steps are performed for the three color layers of red, green, and blue to form the color layers 26R, 26G, and 26B.
　次いで、図７Ｃに示すように、遮光層２６Ｍ上にスイッチ突起５１を形成する。スイッチ突起５１は以下のように形成することができる。最初に、ガラス基板２５上にスイッチ突起５１用のレジストを塗布する。次いで、所定パターンの開口を有するフォトマスクを介して紫外線照射してレジストを硬化させ、不溶化させる。次いで、現像液により未硬化の不要なレジストを除去する。最後に、レジストをベークして硬化させる。かくして、スイッチ突起５１を形成することができる。 Next, as shown in FIG. 7C, a switch protrusion 51 is formed on the light shielding layer 26M. The switch protrusion 51 can be formed as follows. First, a resist for the switch protrusion 51 is applied on the glass substrate 25. Next, the resist is cured by being irradiated with ultraviolet rays through a photomask having openings of a predetermined pattern, and insolubilized. Next, the uncured unnecessary resist is removed with a developer. Finally, the resist is baked and cured. Thus, the switch protrusion 51 can be formed.
　なお、スイッチ突起５１用レジストとして着色層２６Ｒ，２６Ｇ，２６Ｂ用のいずれかのカラーレジストを用いて、着色層２６Ｒ，２６Ｇ，２６Ｂの形成工程（図７Ｂ）と同時にスイッチ突起５１を形成してもよい。その場合には、フォトマスクとしてハーフトーンマスクを用いることが好ましい。 Even if the color protrusions 26R, 26G, and 26B are used as the resist for the switch protrusion 51, the switch protrusion 51 is formed at the same time as the process for forming the color layers 26R, 26G, and 26B (FIG. 7B). Good. In that case, a halftone mask is preferably used as the photomask.
　次いで、図７Ｄに示すように、カラーフィルター層２６及びスイッチ突起５１を覆うように共通電極２７を形成する。例えばスパッタリング法を用いてＩＴＯの薄膜を形成して共通電極２７を得ることができる。 Next, as shown in FIG. 7D, the common electrode 27 is formed so as to cover the color filter layer 26 and the switch protrusion 51. For example, the common electrode 27 can be obtained by forming an ITO thin film by sputtering.
　次いで、図７Ｅに示すように、遮光層２６Ｍ上にスペーサ３３を形成する。スペーサ３３は以下のように形成することができる。最初に、ガラス基板２５上にスペーサ３３用のレジストを塗布する。次いで、所定パターンの開口を有するフォトマスクを介して紫外線照射してレジストを硬化させ、不溶化させる。次いで、現像液により未硬化の不要なレジストを除去する。最後に、レジストをベークして硬化させる。かくして、スペーサ３３を形成することができる。 Next, as shown in FIG. 7E, a spacer 33 is formed on the light shielding layer 26M. The spacer 33 can be formed as follows. First, a resist for the spacer 33 is applied on the glass substrate 25. Next, the resist is cured by being irradiated with ultraviolet rays through a photomask having openings of a predetermined pattern, and insolubilized. Next, the uncured unnecessary resist is removed with a developer. Finally, the resist is baked and cured. Thus, the spacer 33 can be formed.
　その後、対向基板１１の全面に配向膜を形成する。 Thereafter, an alignment film is formed on the entire surface of the counter substrate 11.
　但し、スイッチ突起５１の先端に形成された共通電極２７が配向膜で覆われないようにすることが好ましい。これを実現する方法としては、特に制限はないが例えば以下のようにすることができる。 However, it is preferable that the common electrode 27 formed at the tip of the switch protrusion 51 is not covered with the alignment film. A method for realizing this is not particularly limited, but can be as follows, for example.
　第１の方法は以下の通りである。即ち、対向基板１１の全面に配向膜を形成し、次いで、配向膜上にレジストを形成し、次いで、スイッチ突起５１の先端のレジストを除去し、次いで、スイッチ突起５１上の露出した配向膜をアッシングして除去し、最後にレジストを洗浄除去する。 The first method is as follows. That is, an alignment film is formed on the entire surface of the counter substrate 11, then a resist is formed on the alignment film, then the resist at the tip of the switch protrusion 51 is removed, and then the exposed alignment film on the switch protrusion 51 is removed. The resist is removed by ashing and finally the resist is washed away.
　第２の方法では、後述する実施形態２の凸曲面形状を有する樹脂基材７７と同様に、スイッチ突起５１の先端を凸曲面形状（例えば丸いドーム形状）にする。この上に形成された共通電極２７の表面形状も、スイッチ突起５１の先端形状が反映された凸曲面形状となる。この上に、配向膜材料溶液を塗布すると、凸曲面形状の頂部及びその近傍では配向膜材料溶液は弾かれて塗布されない。その後、焼成を行い配向膜材料を硬化させると、スイッチ突起５１の先端において共通電極２７を露出させることができる。この第２の方法は、第１の方法で必要な、配向膜を形成後に所定領域の配向膜を除去する工程が不要であるので、工程数が少ない点で有利である。 In the second method, the tip of the switch protrusion 51 is formed into a convex curved surface shape (for example, a round dome shape) in the same manner as the resin base material 77 having a convex curved surface shape according to the second embodiment described later. The surface shape of the common electrode 27 formed thereon is also a convex curved surface shape reflecting the tip shape of the switch protrusion 51. When the alignment film material solution is applied thereon, the alignment film material solution is repelled and not applied at the top of the convex curved surface and in the vicinity thereof. Thereafter, when the alignment film material is cured by baking, the common electrode 27 can be exposed at the tip of the switch protrusion 51. This second method is advantageous in that the number of steps is small because the step of removing the alignment film in a predetermined region after forming the alignment film, which is necessary in the first method, is unnecessary.
　スイッチ突起５１の先端の共通電極２７が配向膜で覆われないようにする上記の方法は例示に過ぎず、本発明は上記以外の方法を用いてもよい。 The above method for preventing the common electrode 27 at the tip of the switch protrusion 51 from being covered with the alignment film is merely an example, and the present invention may use a method other than the above.
　アクティブ基板１２を作成する第２工程を説明する。ガラス基板３５上に、ＴＦＴ１６及び検出用ＴＦＴ５３、画素電極１５及びスイッチ電極５２等を、フォトリソグラフィを用いた公知の方法で形成する。検出用ＴＦＴ５３は、ＴＦＴ１６と同じ工程で同時に形成することができる。その後、アクティブ基板１２の全面に配向膜を形成する。 The second step of creating the active substrate 12 will be described. On the glass substrate 35, the TFT 16, the detection TFT 53, the pixel electrode 15, the switch electrode 52, and the like are formed by a known method using photolithography. The detection TFT 53 can be formed simultaneously in the same process as the TFT 16. Thereafter, an alignment film is formed on the entire surface of the active substrate 12.
　但し、スイッチ電極５２が配向膜で覆われないようにすることが好ましい。これを実現する方法としては、特に制限はないが例えば以下のようにすることができる。即ち、アクティブ基板１２の全面に配向膜を形成し、次いで、配向膜上にレジストを形成し、次いで、スイッチ電極５２上のレジストを除去し、次いで、スイッチ電極５２上の露出した配向膜をアッシングして除去し、最後にレジストを洗浄除去する。もちろん、これ以外の方法でスイッチ電極５２を配向膜で覆われないようにしてもよい。 However, it is preferable that the switch electrode 52 is not covered with the alignment film. A method for realizing this is not particularly limited, but can be as follows, for example. That is, an alignment film is formed on the entire surface of the active substrate 12, then a resist is formed on the alignment film, then the resist on the switch electrode 52 is removed, and then the exposed alignment film on the switch electrode 52 is ashed. Finally, the resist is removed by washing. Of course, the switch electrode 52 may not be covered with the alignment film by other methods.
　最後に、第３工程を行う。第３工程では、対向基板１１のカラーフィルター層２６が形成された側の面と、アクティブ基板１２の画素電極１５及びスイッチ電極５２等が形成された側の面とを対向させて、対向基板１１とアクティブ基板１２とを貼り合わせる。次いで、対向基板１１とアクティブ基板１２との間に液晶層１０を封入する。かくして、上記の本実施形態の液晶表示パネル１が得られる。 Finally, the third step is performed. In the third step, the surface of the counter substrate 11 on which the color filter layer 26 is formed and the surface of the active substrate 12 on which the pixel electrode 15, the switch electrode 52, and the like are formed are opposed to each other. And the active substrate 12 are bonded together. Next, the liquid crystal layer 10 is sealed between the counter substrate 11 and the active substrate 12. Thus, the liquid crystal display panel 1 of the present embodiment is obtained.
　－実施形態１の効果－
　本実施形態では、タッチスイッチ５０において、共通する１つのスイッチ電極５２に対して複数（上記実施形態では３つ）のスイッチ突起５１が対向している。従って、対向基板１１にタッチ圧が付与されると、その荷重は複数のスイッチ突起５１に分散される。即ち、１つのスイッチ突起５１に印加される荷重が小さくなる。これにより、スイッチ突起５１自身やその下の遮光層２６Ｍが破壊される可能性が低減する。また、仮に、１つのスイッチ電極５２に対向する複数のスイッチ突起５１のうちの１つのスイッチ突起５１が繰り返して印加されるタッチ圧によって破壊され機能しなくなったとしても、残りのスイッチ突起５１によってタッチセンサ機能が継続して確保される。このように、本実施形態では、タッチ圧の分散化と冗長設計とによって、繰り返し押しに対する耐久性が向上したインセル型タッチセンサ機能付き液晶表示パネルを実現することができる。 -Effect of Embodiment 1-
In the present embodiment, in the touch switch 50, a plurality (three in the above embodiment) of switch protrusions 51 are opposed to a common switch electrode 52. Therefore, when a touch pressure is applied to the counter substrate 11, the load is distributed to the plurality of switch protrusions 51. That is, the load applied to one switch protrusion 51 becomes small. Thereby, the possibility that the switch protrusion 51 itself and the light shielding layer 26M under the switch protrusion 51 are destroyed is reduced. In addition, even if one switch protrusion 51 of the plurality of switch protrusions 51 facing one switch electrode 52 is destroyed and no longer functions due to the repeatedly applied touch pressure, the remaining switch protrusion 51 touches the switch electrode 51. The sensor function is continuously secured. As described above, in this embodiment, a liquid crystal display panel with an in-cell type touch sensor function with improved durability against repeated pressing can be realized by the distribution of the touch pressure and the redundant design.
　上記の実施形態では、１つのスイッチ電極５２に対して３つのスイッチ突起５１を形成したが、本発明はこれに限定されない。共通する１つのスイッチ電極５２に対するスイッチ突起５１の数は、２以上であればよい。一般には、１つのスイッチ電極５２に対するスイッチ突起５１の数が増えれば増えるほど、タッチセンサの繰り返し押しに対する耐久性は向上する。 In the above embodiment, three switch protrusions 51 are formed for one switch electrode 52, but the present invention is not limited to this. The number of switch protrusions 51 for one common switch electrode 52 may be two or more. In general, as the number of the switch protrusions 51 with respect to one switch electrode 52 increases, the durability against repeated pressing of the touch sensor is improved.
　上記の実施形態では、スイッチ突起５１を遮光層２６Ｍ上に形成したが、着色層２６Ｒ，２６Ｇ，２６Ｂ上に形成してもよい。 In the above embodiment, the switch protrusion 51 is formed on the light shielding layer 26M, but may be formed on the colored layers 26R, 26G, and 26B.
　本実施形態の効果を確認するための実験を行った。 An experiment was conducted to confirm the effect of this embodiment.
　図１～図７で説明した本実施形態１の液晶表示パネル１を作成した。 The liquid crystal display panel 1 of Embodiment 1 described with reference to FIGS. 1 to 7 was created.
　更に、比較のために、図８、図９に示す液晶表示パネル１’を作成した。この液晶表示パネル１’は、１つのスイッチ電極５２に対して１つのスイッチ突起５１が形成されている点で、本実施形態の液晶表示パネル１と異なり、これ以外は、本実施形態の液晶表示パネル１と同じである。 Furthermore, a liquid crystal display panel 1 ′ shown in FIGS. 8 and 9 was prepared for comparison. This liquid crystal display panel 1 ′ is different from the liquid crystal display panel 1 of the present embodiment in that one switch protrusion 51 is formed for one switch electrode 52. Other than this, the liquid crystal display of the present embodiment is the same. Same as panel 1.
　本実施形態１の液晶表示パネル１（本発明品）及び図８、図９に示す液晶表示パネル１’（従来品）の表示面に、タッチペンの半径０．８ｍｍの先端で２．５Ｎの荷重を５Ｈｚで繰り返して印加する打撃試験を行い、タッチセンサ機能の耐久性を評価した。結果を表１に示す。 A load of 2.5 N is applied to the display surface of the liquid crystal display panel 1 of the first embodiment (product of the present invention) and the liquid crystal display panel 1 ′ (conventional product) shown in FIGS. Was applied repeatedly at 5 Hz to evaluate the durability of the touch sensor function. The results are shown in Table 1.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
　表１に示すように、従来品では、５千回の打撃でタッチ位置を検出できない領域が発生し始め、１万回の打撃で表示領域の全領域でタッチ位置を検出できなくなった。 As shown in Table 1, in the conventional product, an area where the touch position could not be detected started after 5,000 hits, and the touch position could not be detected in the entire display area after 10,000 hits.
　これに対して、本発明品では、１００万回の打撃を行っても、タッチ位置の検出機能が損なわれることはなかった。 On the other hand, in the product of the present invention, the touch position detection function was not impaired even after one million hits.
　よって、本実施形態により、繰り返し押しに対する耐久性が向上することが分かった。 Therefore, it was found that the durability against repeated pressing is improved by this embodiment.
　（実施形態２）
　本実施形態２の液晶表示パネル２は、タッチスイッチの構成において実施形態１の液晶表示パネル１と異なる。以下、実施形態１と異なる点を中心に本実施形態の液晶表示パネル２を説明する。 (Embodiment 2)
The liquid crystal display panel 2 of the second embodiment is different from the liquid crystal display panel 1 of the first embodiment in the configuration of the touch switch. Hereinafter, the liquid crystal display panel 2 of the present embodiment will be described focusing on differences from the first embodiment.
　－タッチスイッチの構成－
　図１０Ａは、本発明の実施形態２に係る液晶表示パネル２のタッチスイッチ７０を図５と同様に示した拡大断面図である。図１０Ｂは、図１０ＡのXＢ－XＢ線に沿った矢視断面図である。実施形態１に示した部材と同じ部材には同一の符号を付して、それらの説明を省略する。 -Touch switch configuration-
FIG. 10A is an enlarged cross-sectional view showing the touch switch 70 of the liquid crystal display panel 2 according to Embodiment 2 of the present invention in the same manner as FIG. 10B is a cross-sectional view taken along line XB-XB in FIG. 10A. The same members as those shown in the first embodiment are denoted by the same reference numerals, and description thereof is omitted.
　実施形態１では、図５に示すように、スイッチ電極５２の上面はほぼ平坦であった。これに対して、本実施形態では、タッチスイッチ７０を構成するスイッチ電極７２は、凸曲面（例えば略半円筒面）を有する樹脂基材７７上に形成されており、スイッチ電極７２の表面形状も、樹脂基材７７の表面形状が反映された凸曲面（例えば略半円筒面）を有している。樹脂基材７７は、例えば層間絶縁膜３７と同じ樹脂を用いて、層間絶縁膜３７と同時に形成することができる。 In Embodiment 1, as shown in FIG. 5, the upper surface of the switch electrode 52 was substantially flat. In contrast, in the present embodiment, the switch electrode 72 constituting the touch switch 70 is formed on a resin base material 77 having a convex curved surface (for example, a substantially semi-cylindrical surface), and the surface shape of the switch electrode 72 is also the same. And a convex curved surface (for example, a substantially semi-cylindrical surface) reflecting the surface shape of the resin base material 77. The resin base 77 can be formed simultaneously with the interlayer insulating film 37 by using, for example, the same resin as the interlayer insulating film 37.
　スイッチ電極７２は、例えば樹脂基材７７に形成されたスルーホール（図示せず）を介して、検出用ＴＦＴ５３のドレイン電極に接続されている。 The switch electrode 72 is connected to the drain electrode of the detection TFT 53 via a through hole (not shown) formed in the resin base material 77, for example.
　本実施形態２の液晶表示パネル２は、上記以外は実施形態１の液晶表示パネル１と概略同じである。 The liquid crystal display panel 2 of the second embodiment is substantially the same as the liquid crystal display panel 1 of the first embodiment except for the above.
　－液晶表示パネルの製造方法－
　最初に、アクティブ基板１２の作成方法を説明する。 -Manufacturing method of liquid crystal display panel-
First, a method for producing the active substrate 12 will be described.
　本実施形態２のアクティブ基板１２の作成方法は、実施形態１のそれと概略同じであるが、スイッチ電極７２の形成方法が異なる。即ち、実施形態１と同様に、ガラス基板３５上にＴＦＴ１６及び検出用ＴＦＴ５３等をフォトリソグラフィを用いた公知の方法で形成し、ＴＦＴ１６及び検出用ＴＦＴ５３をレジストで覆う。次いで、形成しようとする層間絶縁膜３７と樹脂基材７７との境界領域のレジストを除去する。このレジスト除去工程は、ＴＦＴ１６のドレイン電極１９と画素電極１５とを接続するためのコンタクトホール２３（図４参照）の形成工程と同時に行うことができる。次いで、アクティブ基板１２を熱処理する。レジストは、加熱により軟化し変形して、図１０Ａ及び図１０Ｂに示すようにその外周端がなだらかな丸みを帯び、層間絶縁膜３７及び樹脂基材７７が形成される。次いで、樹脂基材７７上に、スイッチ電極７２を形成する。スイッチ電極７２は、例えばスパッタリング法を用いてＩＴＯの薄膜を形成することにより、画素電極１５と同時に形成することができる。スイッチ電極７２と検出用ＴＦＴ５３のドレイン電極との接続は、例えば樹脂基材７７に形成したスルーホール（図示せず）を介して行うことができる。次いで、アクティブ基板１２の全面に配向膜材料溶液を塗布する。配向膜材料溶液は、スイッチ電極７２の凸曲面形状の頂部及びその近傍では弾かれて塗布されない。その後、焼成を行い配向膜材料を硬化させる。スイッチ電極７２の先端は、配向膜材料溶液が塗布されていないので、配向膜で覆われることなく露出する。 The production method of the active substrate 12 of the second embodiment is substantially the same as that of the first embodiment, but the method of forming the switch electrode 72 is different. That is, as in the first embodiment, the TFT 16 and the detection TFT 53 are formed on the glass substrate 35 by a known method using photolithography, and the TFT 16 and the detection TFT 53 are covered with a resist. Next, the resist in the boundary region between the interlayer insulating film 37 and the resin base material 77 to be formed is removed. This resist removing step can be performed simultaneously with the step of forming the contact hole 23 (see FIG. 4) for connecting the drain electrode 19 of the TFT 16 and the pixel electrode 15. Next, the active substrate 12 is heat-treated. The resist is softened and deformed by heating, and the outer peripheral edge thereof is gently rounded as shown in FIGS. 10A and 10B, so that the interlayer insulating film 37 and the resin base material 77 are formed. Next, the switch electrode 72 is formed on the resin base material 77. The switch electrode 72 can be formed simultaneously with the pixel electrode 15 by forming a thin film of ITO, for example, using a sputtering method. The connection between the switch electrode 72 and the drain electrode of the detection TFT 53 can be made, for example, through a through hole (not shown) formed in the resin base material 77. Next, an alignment film material solution is applied to the entire surface of the active substrate 12. The alignment film material solution is repelled at the top of the convex curved surface of the switch electrode 72 and in the vicinity thereof and is not applied. Thereafter, baking is performed to cure the alignment film material. Since the alignment film material solution is not applied, the tip of the switch electrode 72 is exposed without being covered with the alignment film.
　対向基板１１の作成方法は、実施形態１のそれと同じである。 The method of creating the counter substrate 11 is the same as that of the first embodiment.
　上記のようにして得られたアクティブ基板１２と対向基板１１とを実施形態１と同様に貼り合わせ、液晶層１０を封入して、本実施形態の液晶表示パネル２が得られる。 The active substrate 12 and the counter substrate 11 obtained as described above are bonded in the same manner as in the first embodiment, and the liquid crystal layer 10 is encapsulated to obtain the liquid crystal display panel 2 of the present embodiment.
　－実施形態２の効果－
　本実施形態では、樹脂基材７７の凸曲面上にスイッチ電極７２を形成したことにより、スイッチ電極７２の表面形状も凸曲面となる。その後、通常の配向膜の形成方法と同様にアクティブ基板１２の全面に配向膜を形成すれば、上述したようにスイッチ電極７２の先端を配向膜に覆われることなく露出させることができる。実施形態１では、スイッチ電極５２を露出させるために、配向膜を形成した後、スイッチ電極５２上の配向膜を除去する工程が必要であった。これに対して、本実施形態では、この配向膜を除去する工程が不要である。従って、アクティブ基板１２上の配向膜の形成方法が簡単となる。また、このような簡単な方法でスイッチ電極７２の頂部を確実に露出させることができるので、スイッチ電極７２と、これに対向するスイッチ突起５１の先端に形成された共通電極２７との接触安定性が向上し、タッチセンサの信頼性が増す。 -Effect of Embodiment 2-
In the present embodiment, since the switch electrode 72 is formed on the convex curved surface of the resin base material 77, the surface shape of the switch electrode 72 is also a convex curved surface. Thereafter, if an alignment film is formed on the entire surface of the active substrate 12 in the same manner as a normal alignment film forming method, the tip of the switch electrode 72 can be exposed without being covered with the alignment film as described above. In the first embodiment, in order to expose the switch electrode 52, a process of removing the alignment film on the switch electrode 52 after forming the alignment film is necessary. On the other hand, in this embodiment, the process of removing this alignment film is unnecessary. Therefore, the method for forming the alignment film on the active substrate 12 is simplified. Further, since the top of the switch electrode 72 can be reliably exposed by such a simple method, the contact stability between the switch electrode 72 and the common electrode 27 formed at the tip of the switch protrusion 51 facing the switch electrode 72 is stable. Improves the reliability of the touch sensor.
　本実施形態のアクティブ基板１２の製造では、層間絶縁膜３７と樹脂基材７７との境界領域のレジストを除去する工程が必要であるが、これは、実施形態１でも必要であったコンタクトホール２３（図４参照）の形成工程と同時に行うことができる。また、スイッチ電極７２の形成は、画素電極１５の形成と同時に行うことができる。従って、実施形態１に比べて、本実施形態で新たに必要となる工程は、樹脂基材７７の表面が丸みを帯びるように熱処理する工程だけである。従って、全体としてみれば、実施形態１に比べて、アクティブ基板１２の製造工程を簡単化することができ、コストの低減を図ることができる。 In the production of the active substrate 12 according to the present embodiment, a step of removing the resist in the boundary region between the interlayer insulating film 37 and the resin base material 77 is necessary. This is the contact hole 23 necessary in the first embodiment. (See FIG. 4). The switch electrode 72 can be formed at the same time as the pixel electrode 15 is formed. Therefore, compared with Embodiment 1, the process newly required in this embodiment is only a process of performing heat treatment so that the surface of the resin base material 77 is rounded. Therefore, as a whole, the manufacturing process of the active substrate 12 can be simplified and the cost can be reduced as compared with the first embodiment.
　本実施形態では、実施形態１と同様に、共通する１つのスイッチ電極７２に対して複数のスイッチ突起５１が対向している。従って、実施形態１と同様に、タッチ圧の分散化と冗長設計とによって、繰り返し押しに対する耐久性が向上したインセル型タッチセンサ機能付き液晶表示パネルを実現することができる。 In the present embodiment, as in the first embodiment, a plurality of switch protrusions 51 are opposed to a common switch electrode 72. Therefore, as in the first embodiment, it is possible to realize a liquid crystal display panel with an in-cell type touch sensor function with improved durability against repeated pressing by distributing the touch pressure and using a redundant design.
　－実施形態２の変更例－
　図１０Ａ及び図１０Ｂでは、３つのスイッチ突起５１に対向して、３つのスイッチ突起５１の配列方向に連続する１つの畝状の樹脂基材７７が形成されていた。しかしながら、本発明はこれに限定されず、例えば図１１に示すように、３つのスイッチ突起５１にそれぞれ対向するように３つの樹脂基材７７を形成してもよい。各樹脂基材７７の表面はなだらかな凸曲面（例えば略球面）を有している。スイッチ電極７２は、３つの樹脂基材７７上に連続して形成されている。このように樹脂基材７７を各スイッチ突起５１に対向するように独立して形成することにより、各樹脂基材７７の先端の曲率半径がいずれの方向においても小さくなるので、配向膜材料溶液は、スイッチ電極７２の凸曲面形状の頂部及びその近傍により付着しにくくなる。従って、スイッチ電極７２と、これに対向するスイッチ突起５１の先端に形成された共通電極２７との接触安定性が更に向上し、タッチセンサの信頼性が更に増す。 -Modification of Embodiment 2-
In FIG. 10A and FIG. 10B, one bowl-shaped resin base material 77 that is opposed to the three switch protrusions 51 and that is continuous in the arrangement direction of the three switch protrusions 51 is formed. However, the present invention is not limited to this. For example, as shown in FIG. 11, three resin bases 77 may be formed so as to face the three switch protrusions 51. The surface of each resin substrate 77 has a gentle convex curved surface (for example, a substantially spherical surface). The switch electrode 72 is continuously formed on the three resin base materials 77. By forming the resin base material 77 independently so as to face the switch protrusions 51 in this way, the radius of curvature of the tip of each resin base material 77 is reduced in any direction. The switch electrode 72 is less likely to adhere to the top of the convex curved surface and the vicinity thereof. Accordingly, the contact stability between the switch electrode 72 and the common electrode 27 formed at the tip of the switch protrusion 51 facing the switch electrode 72 is further improved, and the reliability of the touch sensor is further increased.
　（実施形態３）
　本実施形態３の液晶表示パネル３は、タッチスイッチの構成及び配置において実施形態２の液晶表示パネル２と異なる。以下、実施形態２と異なる点を中心に本実施形態の液晶表示パネル３を説明する。 (Embodiment 3)
The liquid crystal display panel 3 of the third embodiment is different from the liquid crystal display panel 2 of the second embodiment in the configuration and arrangement of touch switches. Hereinafter, the liquid crystal display panel 3 of the present embodiment will be described focusing on differences from the second embodiment.
　－タッチスイッチの構成－
　図１２Ａは、本発明の実施形態３に係る液晶表示パネル３を対向基板側から見たときのカラーフィルター層及びタッチスイッチ８０の配置を示した模式的平面図である。図面を簡略化するために、カラーフィルター層を構成する着色層２６Ｒ，２６Ｇ，２６Ｂ及び遮光層２６Ｍと、タッチスイッチ８０を構成するスイッチ突起８１及びスイッチ電極８２、スペーサ３３のみを図示している。図１２Ｂは図１２ＡのXIIＢ－XIIＢ線に沿った液晶表示パネル３の矢視断面図、図１２Ｃは図１２ＡのXIIＣ－XIIＣ線に沿った液晶表示パネル３の矢視断面図である。実施形態１，２に示した部材と同じ部材には同一の符号を付して、それらの説明を省略する。 -Touch switch configuration-
FIG. 12A is a schematic plan view showing the arrangement of the color filter layer and the touch switch 80 when the liquid crystal display panel 3 according to Embodiment 3 of the present invention is viewed from the counter substrate side. In order to simplify the drawing, only the colored layers 26R, 26G, and 26B and the light shielding layer 26M that constitute the color filter layer, the switch protrusion 81 and the switch electrode 82 that constitute the touch switch 80, and the spacer 33 are illustrated. 12B is a cross-sectional view of the liquid crystal display panel 3 taken along line XIIB-XIIB in FIG. 12A, and FIG. 12C is a cross-sectional view of the liquid crystal display panel 3 taken along line XIIC-XIIC in FIG. The same members as those shown in the first and second embodiments are denoted by the same reference numerals, and description thereof is omitted.
　実施形態２では、１つの画素に対して１つのタッチスイッチ７０が形成されていた。これに対して、本実施形態３では、図１２Ａに示すように、６つの画素に対して１つのタッチスイッチ８０が形成されている。図示を省略するが、１つのタッチスイッチ８０に対しして１つの検出用ＴＦＴが配置される。なお、図１２Ａでは６つの画素に対して１つのタッチスイッチ８０が形成されているが、本発明はこれに限定されず、１つのタッチスイッチ８０に対する画素数は、６つより多くても少なくてもよい。 In the second embodiment, one touch switch 70 is formed for one pixel. On the other hand, in the third embodiment, as shown in FIG. 12A, one touch switch 80 is formed for six pixels. Although not shown, one detection TFT is arranged for one touch switch 80. In FIG. 12A, one touch switch 80 is formed for six pixels. However, the present invention is not limited to this, and the number of pixels for one touch switch 80 may be more or less than six. Also good.
　図１２Ｂ及び図１２Ｃに示すように、タッチスイッチ８０を構成するスイッチ電極８２は、実施形態２の図１０Ａ及び図１０Ｂに示したスイッチ電極７２と同様に、凸曲面（例えば略半円筒面）を有する樹脂基材８７上に形成されている。その結果、スイッチ電極８２の表面形状も、樹脂基材８７の表面形状が反映された凸曲面（例えば略半円筒面）を有している。スイッチ電極８２は、例えば樹脂基材８７に形成されたスルーホール（図示せず）を介して、検出用ＴＦＴのドレイン電極に接続されている。 As shown in FIGS. 12B and 12C, the switch electrode 82 constituting the touch switch 80 has a convex curved surface (for example, a substantially semi-cylindrical surface) like the switch electrode 72 shown in FIGS. 10A and 10B of the second embodiment. It is formed on the resin base material 87 having. As a result, the surface shape of the switch electrode 82 also has a convex curved surface (for example, a substantially semi-cylindrical surface) reflecting the surface shape of the resin base material 87. The switch electrode 82 is connected to the drain electrode of the detection TFT through a through hole (not shown) formed in the resin base material 87, for example.
　図１２Ａ及び図１２Ｃに示すように、畝状に延びるスイッチ電極８２に対向して複数のスイッチ突起８１が対向基板１１に形成されている。図１２Ａ及び図１２Ｃでは、１つのスイッチ電極８２に１１個のスイッチ突起８１が対向しているが、スイッチ突起８１の数は２以上であればよく、１１個より多くても少なくてもよい。複数のスイッチ突起８１は、スイッチ電極８２の長手方向に沿って並んで配置されている。各スイッチ突起８１は略板状であり、その主面はスイッチ電極８２の長手方向と直交している。図１２Ｂに示すように、スイッチ突起８１の先端は、対向基板１１と平行に、且つ、スイッチ電極８２の長手方向と直交する方向（図１２Ｂの紙面の左右方向）に、直線状に延びている。この直線状の先端が、スイッチ電極８２の頂部と対向している。 12A and 12C, a plurality of switch protrusions 81 are formed on the counter substrate 11 so as to face the switch electrode 82 extending in a bowl shape. 12A and 12C, 11 switch protrusions 81 are opposed to one switch electrode 82, but the number of switch protrusions 81 may be two or more, and may be more or less than 11. The plurality of switch protrusions 81 are arranged side by side along the longitudinal direction of the switch electrode 82. Each switch protrusion 81 is substantially plate-shaped, and its main surface is orthogonal to the longitudinal direction of the switch electrode 82. As shown in FIG. 12B, the tip of the switch protrusion 81 extends linearly in a direction parallel to the counter substrate 11 and perpendicular to the longitudinal direction of the switch electrode 82 (the left-right direction in FIG. 12B). . This linear tip faces the top of the switch electrode 82.
　本実施形態のタッチスイッチ８０は、実施形態２のタッチスイッチ７０と同様に形成することができる。 The touch switch 80 of the present embodiment can be formed in the same manner as the touch switch 70 of the second embodiment.
　－実施形態３の効果－
　本実施形態においても、共通する１つのスイッチ電極８２に対して複数のスイッチ突起８１が対向している。従って、実施形態１，２と同様に、タッチ圧の分散化と冗長設計とによって、繰り返し押しに対する耐久性が向上したインセル型タッチセンサ機能付き液晶表示パネルを実現することができる。 -Effect of Embodiment 3-
Also in this embodiment, a plurality of switch protrusions 81 are opposed to one common switch electrode 82. Therefore, as in the first and second embodiments, a liquid crystal display panel with an in-cell touch sensor function with improved durability against repeated pressing can be realized by distributing the touch pressure and using a redundant design.
　スイッチ電極８２の表面形状が凸曲面を有しているので、実施形態２と同様に、簡単な方法でスイッチ電極８２を配向膜に覆われることなく露出させることができる。 Since the surface shape of the switch electrode 82 has a convex curved surface, the switch electrode 82 can be exposed without being covered with the alignment film by a simple method as in the second embodiment.
　本実施形態では、スイッチ突起８１は、畝状のスイッチ電極８２の長手方向と直交する方向に延びた直線状の先端を有している。この先端が、スイッチ電極８２の頂部と対向している。更に、それぞれがこのような先端を有する複数のスイッチ突起８１がスイッチ電極８２の長手方向に沿って並んでいる。従って、対向基板１１とアクティブ基板１２とを貼り合わせる際の両者の位置合わせズレに対する許容範囲が拡大する。従って、液晶表示パネル３の生産性が向上する。 In this embodiment, the switch protrusion 81 has a linear tip extending in a direction perpendicular to the longitudinal direction of the bowl-shaped switch electrode 82. This tip is opposed to the top of the switch electrode 82. Further, a plurality of switch protrusions 81 each having such a tip are arranged along the longitudinal direction of the switch electrode 82. Accordingly, an allowable range for misalignment between the counter substrate 11 and the active substrate 12 is increased. Therefore, the productivity of the liquid crystal display panel 3 is improved.
　本実施形態では、複数の画素に対して１つのタッチスイッチ８０を配置している。従って、画素寸法による制約を受けることなく、タッチスイッチ８０の寸法を設定することができる。例えば、実施形態１，２に比べてタッチスイッチ８０の寸法を大きくすることは容易に可能である。このような場合には、対向基板１１とアクティブ基板１２との位置合わせズレに対する許容範囲は更に拡大する。 In this embodiment, one touch switch 80 is arranged for a plurality of pixels. Therefore, the size of the touch switch 80 can be set without being restricted by the pixel size. For example, it is possible to easily increase the size of the touch switch 80 compared to the first and second embodiments. In such a case, the allowable range for misalignment between the counter substrate 11 and the active substrate 12 is further expanded.
　－実施形態３の変更例－
　複数のスイッチ突起８１は、図１２Ａに示したように、スイッチ電極８２の長手方向に沿って一列に並んでいる必要はない。例えば、図１３に示すように、複数の略円柱状のスイッチ突起８１をスイッチ電極８２に対して千鳥配置してもよい。図１３のスイッチ電極８２の構成は、図１２Ａ～図１２Ｃと同じである。図１３の構成も、図１２Ａ～図１２Ｃの構成と同様の効果を奏する。 -Modification of Embodiment 3-
The plurality of switch protrusions 81 need not be aligned in a line along the longitudinal direction of the switch electrode 82, as shown in FIG. 12A. For example, as shown in FIG. 13, a plurality of substantially cylindrical switch protrusions 81 may be staggered with respect to the switch electrode 82. The configuration of the switch electrode 82 in FIG. 13 is the same as that in FIGS. 12A to 12C. The configuration of FIG. 13 also has the same effect as the configuration of FIGS. 12A to 12C.
　また、図１１に示した樹脂基材７７と同様に、複数のスイッチ突起８１のそれぞれに対向するように樹脂基材８７を独立して形成してもよい。図１４にその一例を示す。複数の樹脂基材８７が図１４の紙面の左右方向に一列に配置され、各樹脂基材８７は上下方向に畝状に延設されている。スイッチ電極８２は、複数の樹脂基材８７上に連続して形成されている。図１４の構成では、対向基板１１とアクティブ基板１２との位置合わせズレに対する許容範囲は、特に図１４の紙面の左右方向において、図１２Ａ～図１２Ｃの構成に比べてやや小さくなる。図１４では図１３と同様に略円柱状のスイッチ突起８１が千鳥配置されているが、本発明はこれに限定されず、図１２Ａと同様に略板状のスイッチ突起８１を一列に並んで配置してもよい。 Further, similarly to the resin base 77 shown in FIG. 11, the resin base 87 may be formed independently so as to face each of the plurality of switch protrusions 81. An example is shown in FIG. A plurality of resin bases 87 are arranged in a line in the left-right direction on the paper surface of FIG. 14, and each resin base 87 extends in a bowl shape in the vertical direction. The switch electrode 82 is continuously formed on the plurality of resin bases 87. In the configuration of FIG. 14, the allowable range for the misalignment between the counter substrate 11 and the active substrate 12 is slightly smaller than the configurations of FIGS. 12A to 12C, particularly in the left-right direction of the paper surface of FIG. In FIG. 14, substantially cylindrical switch protrusions 81 are arranged in a staggered manner as in FIG. 13, but the present invention is not limited to this, and substantially plate-like switch protrusions 81 are arranged in a line as in FIG. 12A. May be.
　スイッチ突起８１の形状は、上記の実施形態のような板状や円柱状である必要はなく、任意の形状であってもよい。また、スイッチ突起８１の先端が直線状である必要はなく、例えば略半球面などの任意の形状を有していてもよい。 The shape of the switch protrusion 81 does not have to be a plate shape or a columnar shape as in the above embodiment, and may be an arbitrary shape. Further, the tip of the switch protrusion 81 does not have to be linear, and may have an arbitrary shape such as a substantially hemispherical surface.
　スイッチ電極８２の上面は凸曲面である必要はなく、実施形態１のスイッチ電極５２と同様に平坦面であってもよい。 The upper surface of the switch electrode 82 does not need to be a convex curved surface, and may be a flat surface like the switch electrode 52 of the first embodiment.
　（変更実施形態）
　上記の実施形態１～３では、複数のスイッチ突起が対向基板１１に形成され、スイッチ電極がアクティブ基板１２に形成されていたが、本発明はこれに限定されない。例えば、複数のスイッチ突起がアクティブ基板１２に形成され、スイッチ電極が対向基板１１に形成されていてもよい。 (Modified embodiment)
In the above first to third embodiments, the plurality of switch protrusions are formed on the counter substrate 11 and the switch electrodes are formed on the active substrate 12, but the present invention is not limited to this. For example, a plurality of switch protrusions may be formed on the active substrate 12 and the switch electrode may be formed on the counter substrate 11.
　また、本発明は、カラーフィルター層が、ＴＦＴ１６や画素電極１５が形成されたアクティブ基板１１に形成される、いわゆる"Color Filter on Array"構造の液晶表示パネルに適用することもできる。 The present invention can also be applied to a liquid crystal display panel having a so-called “Color Filter on Array” structure in which the color filter layer is formed on the active substrate 11 on which the TFT 16 and the pixel electrode 15 are formed.
　以上に説明した実施形態は、いずれもあくまでも本発明の技術的内容を明らかにする意図のものであって、本発明はこのような具体例にのみ限定して解釈されるものではなく、その発明の精神と請求の範囲に記載する範囲内でいろいろと変更して実施することができ、本発明を広義に解釈すべきである。 Each of the embodiments described above is intended to clarify the technical contents of the present invention, and the present invention is not construed as being limited to such specific examples. The present invention should be construed broadly, with various modifications within the spirit and scope of the appended claims.
　本発明の利用分野は特に制限はなく、タッチセンサ機能が要求される各種液晶表示装置に広範囲に利用することができる。特に、液晶セル内にタッチスイッチが組み込まれているので薄型で表示品位が良好であり、更に、繰り返し押しに対する耐久性に優れるので、携帯電話やＰＤＡなどの小型情報端末に特に好ましく利用することができる。 The application field of the present invention is not particularly limited, and can be widely used for various liquid crystal display devices that require a touch sensor function. In particular, since a touch switch is incorporated in the liquid crystal cell, it is thin and has a good display quality, and is excellent in durability against repeated pressing, so that it is particularly preferably used for small information terminals such as mobile phones and PDAs. it can.
１，２　液晶表示パネル
１０　液晶
１１　対向基板
１２　アクティブ基板
１５　画素電極
１６　ＴＦＴ
２５　ガラス基板
２６　カラーフィルター層
２６Ｒ，２６Ｇ，２６Ｂ　着色層
２６Ｍ　遮光層
２７　共通電極
３３　スペーサ
３５　ガラス基板
５０，７０，８０　タッチスイッチ
５１，８１　スイッチ突起
５２　スイッチ電極
５３　検出用ＴＦＴ
７２，８２　スイッチ電極
７７，８７　樹脂基材 1, 2 Liquid crystal display panel 10 Liquid crystal 11 Counter substrate 12 Active substrate 15 Pixel electrode 16 TFT
25 Glass substrate 26 Color filter layer 26R, 26G, 26B Colored layer 26M Light shielding layer 27 Common electrode 33 Spacer 35 Glass substrate 50, 70, 80 Touch switch 51, 81 Switch protrusion 52 Switch electrode 53 Detection TFT
72, 82 Switch electrodes 77, 87 Resin base material

Claims (3)

  1. 　第１基板と、
    　前記第１基板に対向する第２基板と、
    　前記第１基板と前記第２基板との間の液晶層と、
    　前記第１基板又は前記第２基板が押圧されて前記第１基板と前記第２基板との間隔が狭くなったときに電気的に導通するタッチスイッチとを備えた液晶表示パネルであって、
    　前記タッチスイッチは、前記第２基板に形成されたスイッチ電極と、共通する１つの前記スイッチ電極に向かって突出して前記第１基板に形成された複数のスイッチ突起と、前記複数のスイッチ突起の先端に形成された、互いに電気的に接続された電極とを含むことを特徴とする液晶表示パネル。     A first substrate;
    A second substrate facing the first substrate;
    A liquid crystal layer between the first substrate and the second substrate;
    A liquid crystal display panel comprising a touch switch that is electrically conductive when the first substrate or the second substrate is pressed and a distance between the first substrate and the second substrate is reduced;
    The touch switch includes a switch electrode formed on the second substrate, a plurality of switch protrusions formed on the first substrate protruding toward the common switch electrode, and tips of the plurality of switch protrusions And an electrode electrically connected to each other formed on the liquid crystal display panel.
  2. 　前記スイッチ電極は、前記第２基板に形成された凸曲面を有する突起上に形成されている請求項１に記載の液晶表示パネル。 The liquid crystal display panel according to claim 1, wherein the switch electrode is formed on a protrusion having a convex curved surface formed on the second substrate.
  3. 　前記第１基板が、カラーフィルター層が形成された対向基板であり、
    　前記第２基板が、複数の画素電極及び前記複数の画素電極を駆動する複数のＴＦＴが形成されたアクティブ基板である請求項１に記載の液晶表示パネル。     The first substrate is a counter substrate on which a color filter layer is formed;
    2. The liquid crystal display panel according to claim 1, wherein the second substrate is an active substrate on which a plurality of pixel electrodes and a plurality of TFTs for driving the plurality of pixel electrodes are formed.
PCT/JP2011/055259 2010-05-24 2011-03-07 Liquid crystal display panel WO2011148690A1 (en)

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JP2013186632A (en) * 2012-03-07 2013-09-19 Toppan Printing Co Ltd Film-like touch panel sensor and manufacturing method thereof
JP2013214185A (en) * 2012-04-02 2013-10-17 Toppan Printing Co Ltd Touch panel sensor and manufacturing method of the same

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JP2010039302A (en) * 2008-08-06 2010-02-18 Sony Corp Liquid crystal display device and manufacturing method for the same

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Publication number Priority date Publication date Assignee Title
JPH08235963A (en) * 1995-03-01 1996-09-13 Alps Electric Co Ltd Tablet
JP2002287902A (en) * 2001-01-17 2002-10-04 Seiko Epson Corp Touch panel and electronic equipment
JP2010039302A (en) * 2008-08-06 2010-02-18 Sony Corp Liquid crystal display device and manufacturing method for the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013186632A (en) * 2012-03-07 2013-09-19 Toppan Printing Co Ltd Film-like touch panel sensor and manufacturing method thereof
JP2013214185A (en) * 2012-04-02 2013-10-17 Toppan Printing Co Ltd Touch panel sensor and manufacturing method of the same

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