WO2011146432A3 - Controlled vaporization system and method for surface priming in semiconductor manufacturing - Google Patents

Controlled vaporization system and method for surface priming in semiconductor manufacturing Download PDF

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Publication number
WO2011146432A3
WO2011146432A3 PCT/US2011/036746 US2011036746W WO2011146432A3 WO 2011146432 A3 WO2011146432 A3 WO 2011146432A3 US 2011036746 W US2011036746 W US 2011036746W WO 2011146432 A3 WO2011146432 A3 WO 2011146432A3
Authority
WO
WIPO (PCT)
Prior art keywords
contactor
gas stream
chemical solvent
semiconductor manufacturing
vaporization system
Prior art date
Application number
PCT/US2011/036746
Other languages
French (fr)
Other versions
WO2011146432A2 (en
Inventor
Yanan Annie Xia
Isamu Funahashi
Seiji Haraguchi
Raul Ramirez
Original Assignee
Entegris, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris, Inc. filed Critical Entegris, Inc.
Publication of WO2011146432A2 publication Critical patent/WO2011146432A2/en
Publication of WO2011146432A3 publication Critical patent/WO2011146432A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/24—Dialysis ; Membrane extraction
    • B01D61/246—Membrane extraction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/36—Pervaporation; Membrane distillation; Liquid permeation
    • B01D61/362—Pervaporation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/02—Hollow fibre modules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2313/00—Details relating to membrane modules or apparatus
    • B01D2313/60—Specific sensors or sensor arrangements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2313/00—Details relating to membrane modules or apparatus
    • B01D2313/90—Additional auxiliary systems integrated with the module or apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2313/00—Details relating to membrane modules or apparatus
    • B01D2313/90—Additional auxiliary systems integrated with the module or apparatus
    • B01D2313/903—Integrated control or detection device

Abstract

A method and corresponding system for a contactor used to introduce a chemical solvent to a gas stream are described. The chemical solvent is directed onto a first side of the contactor and the gas stream is directed onto a second side of the contactor. The first side of the contactor is chemical solvent permeable. The chemical solvent diffuses through the first side of the contactor onto the second side and creates a mixture with the gas stream. The mixture may be used to prime substrate surfaces in photolithography applications to enhance transfer of patterns to substrate surfaces. The flow, concentration, and temperature of the gas stream and adhesion parameter may be controlled.
PCT/US2011/036746 2010-05-18 2011-05-17 Controlled vaporization system and method for surface priming in semiconductor manufacturing WO2011146432A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34589710P 2010-05-18 2010-05-18
US61/345,897 2010-05-18

Publications (2)

Publication Number Publication Date
WO2011146432A2 WO2011146432A2 (en) 2011-11-24
WO2011146432A3 true WO2011146432A3 (en) 2012-04-05

Family

ID=44992283

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2011/036746 WO2011146432A2 (en) 2010-05-18 2011-05-17 Controlled vaporization system and method for surface priming in semiconductor manufacturing

Country Status (2)

Country Link
TW (1) TW201203317A (en)
WO (1) WO2011146432A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109962026B (en) * 2017-12-26 2022-04-19 无锡华润上华科技有限公司 Pretreatment method and photoetching method of wafer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5641541A (en) * 1995-09-29 1997-06-24 Taiwan Semiconductor Manufacturing Company Process to apply photoresist printer to a wafer
US20030192428A1 (en) * 1999-01-29 2003-10-16 Mykrolis Corporation Hollow fiber membrane contactor
US20100068366A1 (en) * 2004-10-01 2010-03-18 Anna Lee Tonkovich Multiphase mixing process using microchannel process technology

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5641541A (en) * 1995-09-29 1997-06-24 Taiwan Semiconductor Manufacturing Company Process to apply photoresist printer to a wafer
US20030192428A1 (en) * 1999-01-29 2003-10-16 Mykrolis Corporation Hollow fiber membrane contactor
US20100068366A1 (en) * 2004-10-01 2010-03-18 Anna Lee Tonkovich Multiphase mixing process using microchannel process technology

Also Published As

Publication number Publication date
WO2011146432A2 (en) 2011-11-24
TW201203317A (en) 2012-01-16

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