WO2011142123A1 - Light sources, illumination optical system and reflection property measurement apparatus - Google Patents

Light sources, illumination optical system and reflection property measurement apparatus Download PDF

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Publication number
WO2011142123A1
WO2011142123A1 PCT/JP2011/002601 JP2011002601W WO2011142123A1 WO 2011142123 A1 WO2011142123 A1 WO 2011142123A1 JP 2011002601 W JP2011002601 W JP 2011002601W WO 2011142123 A1 WO2011142123 A1 WO 2011142123A1
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Prior art keywords
light
light source
optical system
illumination optical
distribution
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PCT/JP2011/002601
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French (fr)
Japanese (ja)
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健二 井村
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コニカミノルタセンシング株式会社
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Priority to JP2012514712A priority Critical patent/JPWO2011142123A1/en
Publication of WO2011142123A1 publication Critical patent/WO2011142123A1/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts

Definitions

  • the present invention relates to a light source, an illumination optical system including the light source, and a reflection characteristic measuring apparatus including the illumination optical system.
  • FIG. 6 is a configuration diagram of the illumination optical system 2 described in Patent Document 1.
  • the white LED 21 is a light source of Lambert light distribution disposed on the optical axis 28.
  • the concave mirror 22 and the toroidal mirror 23 guide the radiated light from the white LED 21 from all directions to the sample surface 24 in the direction of 45 degrees from the optical axis 28.
  • the objective lens 25 converges the component in the normal direction of the reflected light from the sample surface 24 to the incident end of the optical fiber 26.
  • the optical fiber 26 guides incident light to a not-shown spectroscopic means.
  • the illumination optical system 2 is configured as an illumination optical system having a 45 ° a: 0 ° geometry that is not easily affected by the inclination of the sample surface 24 and the surface properties by the radiated light of the white LED 21.
  • the white LED 21 has almost no intensity in the short wavelength band of 400-430 nm.
  • the illumination optical system 2 includes a purple LED 27 arranged upstream of the toroidal mirror 23. The emitted light of the purple LED 27 is guided by the toroidal mirror 23 from one position to the sample surface 24 in the direction of 45 degrees from the normal line of the sample surface 24.
  • the illumination optical system 2 includes the purple LED 27.
  • the purple LED 27 illuminates the sample surface 24 at one position. Therefore, the illumination optical system 2 configures a 45 ° x: 0 ° geometry that is easily affected by the inclination of the sample surface 24 and the surface properties in the short wavelength band.
  • the influence of the inclination of the sample surface 24 and the surface properties vary depending on the wavelength band. Further, in the illumination optical system 2, the influence when the position of the sample surface 24 is changed varies depending on the wavelength band.
  • the measurement error of the spectral reflection characteristic of the sample obtained from the output of the spectroscopic means varies depending on the wavelength band.
  • Such a measurement error having a wavelength dependency is amplified when the color difference position is calculated from the spectral reflection characteristics, and a large color value error occurs.
  • this illumination optical system 2 does not strictly satisfy the 45 ° a: 0 ° or 45 ° c: 0 ° geometry required by some standards. Further, since the purple LED 27 is arranged in the light flux of the white LED 21, the configuration is complicated. Further, since the purple LED 27 is arranged on the right side of the center of the sample surface 24, the illumination on the right side in the sample surface 24 becomes high with respect to the illumination by the purple LED 27, and there is a large difference in illumination distribution within the sample surface 24. There is also a problem that arises.
  • the object of the present invention is to provide a light source that has sufficient intensity in all wavelength bands without complicating the configuration of the illumination optical system, and can suppress variations in illuminance change due to distance fluctuations to the sample surface for each wavelength band,
  • An illumination optical system including the light source and a reflection characteristic measuring apparatus including the illumination optical system are provided.
  • a light source includes a main light source that emits light from a predetermined light emission region, and one or more sub-light sources that have a spectral distribution different from the spectral distribution of the main light source and illuminate the light emission region.
  • the light emitting area reflects light emitted from the sub-light source.
  • An illumination optical system receives a combined light of the light source, the light emitted from the main light source, and the light emitted from the sub-light source reflected by the light emitting area. And an optical system that illuminates the sample surface as light.
  • a reflection characteristic measuring apparatus includes the illumination optical system described above and a light receiving optical system that receives light reflected from the sample surface.
  • Embodiment 1 of this invention It is a block diagram of the reflection characteristic measuring apparatus by Embodiment 1 of this invention. It is a block diagram of the light source shown in FIG. This is a spectral distribution of light emitted from a light source. It is a block diagram of the light source in Embodiment 2 of this invention. It is a spectral distribution of the light radiated
  • FIG. 1 is a configuration diagram of a reflection characteristic measuring apparatus according to Embodiment 1 of the present invention, (A) is a configuration diagram from a side view, (B) is an arrangement of a plane mirror 3 from a top view, (C) is a block diagram when paying attention to one plane mirror 3.
  • the reflection characteristic measuring apparatus includes a sample surface 1, a light source 2, a plane mirror 3, a reflecting mirror 4, a light receiving optical system 5, and a spectroscopic unit 6.
  • the light source 2 and the plane mirror 3 constitute an illumination optical system.
  • the sample surface 1 has a flat shape, and a sample such as a printed matter on which a color sample is printed is arranged.
  • the light source 2 includes a main light source 12 that emits light from the light emission area S (see FIG. 2), and a sub light source 22 that has a spectral distribution different from the spectral distribution of the main light source and illuminates the light emission area S.
  • FIG. 2 is a configuration diagram of the light source 2.
  • the main light source 12 is formed of, for example, a white LED, and includes an LED chip 12c, a resin 12r, and a package 12p.
  • the LED chip 12c is composed of, for example, a blue LED, and emits blue light L_b (see FIG. 3).
  • the LED chip 12c emits blue light L_b having a half width of about 20 nm centered at 450 nm, for example.
  • the resin 12r is applied to the surface of the LED chip 12c and includes a powdery fluorescent material.
  • the resin 12r is excited by the blue light L_b and emits fluorescence LF_y (see FIG. 3) having a half-value width of about 150 nm centered at 600 nm. Further, the resin 12r diffuses the blue light L_b and emits it from the light emitting region S. Note that the symbols L_b and LF_y are not shown in FIG.
  • the main light source 12 is configured by a white LED that emits white light LW (see FIG. 3) composed of blue light L_b and fluorescence LF_y excited by the blue light L_b.
  • the package 12p is made of a transparent member, and the LED chip 12c is arranged inside.
  • the secondary light source 22 is configured by, for example, a purple LED provided facing the light emission area S of the main light source 12, and emits purple light L_v toward the light emission area S to illuminate the light emission area S.
  • the violet light L_v is diffusely reflected by the fluorescent material contained in the resin 12r, and becomes diffused violet light LD_v (see FIG. 3) of the light distribution 22d, and is re-radiated from the light emitting area S.
  • both the blue light L_b and the fluorescence LF_y are diffused and emitted from the resin 12r. Therefore, the white light LW having the light distribution 12d is radiated from the light emitting area S.
  • the purple light L_v is diffusely reflected by the resin 12r. Therefore, from the light emission region S, diffused violet light LD_v having a light distribution 22d is emitted.
  • titanium oxide powder or the like as the resin 12r from the viewpoint of increasing scattering properties.
  • FIG. 3 shows the spectral distribution of light emitted from the light source 2, wherein the vertical axis indicates relative intensity and the horizontal axis indicates wavelength (nm).
  • the light source 2 mainly emits white light LW including blue light L_b and fluorescence LF_y and diffuse violet light LD_v.
  • the diffuse violet light LD_v is light having a wavelength band of 430 nm or less that is not covered by the white light LW.
  • LF_v is the purple fluorescence of the resin 12r excited by the purple light L_v.
  • the spectral distribution of the radiated light emitted from the light source 2 covers the entire wavelength band of visible light (400 to 700 nm). 2 is a light distribution of the combined light of the white light LW and the diffused violet light LD_v by the violet light L_v.
  • a plurality of plane mirrors 3 are arranged between the sample surface 1 and the light source 2 in an axisymmetric manner with the normal 1n as an axis of symmetry (FIG. 1 (B)).
  • a ring-shaped mirror may be employed instead of the plurality of plane mirrors 3.
  • the normal 3n is a normal of the sample surface 1 passing through the center O3 of the plane mirror 3.
  • the plane mirror 3 has an arrangement of the light source image 2 ′ with respect to the normal 2n of the sample surface 1 passing through the light source image 2 ′ of the light source 2 by the reflection surface 3a.
  • the optical main axis 2′x is arranged so as to be inclined by a predetermined offset angle ⁇ .
  • the offset angle ⁇ is a light distribution change rate of the light distribution 2d_max that maximizes the bias to the light distribution main axis at an angle of 45 ° ⁇ with respect to the light distribution main axis 2′x.
  • the predetermined angle is set to be substantially equal to the light distribution change rate at an angle of 45 ° with respect to the main axis.
  • the light flux component 2a is guided from a plurality of directions with respect to the center O so that the change in illuminance at the center O is minimized with respect to the distance variation between the illumination optical system and the sample surface 1. Become. As a result, an illumination optical system having a 45 ° c: 0 ° geometry (c: circumferential) is realized.
  • the reflecting mirror 4 is disposed on the normal line 1n and at a predetermined position between the light source 2 and the center O, and changes the optical path of the normal component 1a of the reflected light on the sample surface 1 by approximately 90 °.
  • the reflected light is incident on the spectroscopic unit 6 through the light receiving optical system 5, the spectral characteristics are measured, and output to an arithmetic processing unit (not shown).
  • the arithmetic processing unit obtains the spectral reflectance coefficient and the color value of the sample surface 1 from the spectral characteristics measured by the spectroscopic unit 6 using a known method.
  • the offset angle ⁇ is close to zero.
  • the light distribution can be approximated in the entire wavelength band of visible light. Therefore, when the light source 2 is arranged as shown in FIG. 1, it is possible to suppress variation in illuminance change due to a variation in the distance between the illumination optical system and the sample surface 1 with respect to light in all visible wavelength bands.
  • the offset angle ⁇ is set so that the change in illuminance at the center O of the light beam component 2a due to the distance variation between the illumination optical system and the sample surface 1 is minimized. For example, the change in illuminance can be minimized with respect to the luminous flux in all wavelength bands of visible light.
  • the plane mirror 3 may be arranged at the offset angle ⁇ set for the light distribution with the maximum deviation to the light distribution main axis.
  • the actually set offset angle ⁇ deviates from the optimum offset angle ⁇ of a certain light distribution, the light distribution change rate at the angle ⁇ with respect to the light distribution main axis of the light distribution and the light distribution main axis of the Lambert light distribution
  • the deviation from the light distribution change rate at an angle with respect to 45 ° is larger as the light distribution is more biased toward the light distribution main axis.
  • the light distribution change rate dP1 / d ⁇ of the light distribution P1 ( ⁇ ) tends to increase as the angle ⁇ increases. Therefore, if the offset angle ⁇ set for the light source 2 is smaller than the optimum offset angle ⁇ _op1 of the light distribution P1 ( ⁇ ), the angle ⁇ of the light distribution P1 ( ⁇ ) with respect to the light distribution main axis becomes large.
  • the optimum offset angle ⁇ _opx of the light distribution PX ( ⁇ ) having the largest deviation to the light distribution main axis is the largest. Therefore, when the offset angle ⁇ of the light source 2 is set to ⁇ _opx, the angle ⁇ of the other light distribution PY ( ⁇ ) with respect to the light distribution main axis is the same as that when the optimum offset angle ⁇ _opy is set with respect to the light distribution PY ( ⁇ ). It becomes smaller than the angle ⁇ _y with respect to the light distribution main axis.
  • FIG. 4 is a configuration diagram of the light source 2 according to Embodiment 2 of the present invention. As shown in FIG. 4, the light source 2 further includes a sub light source 32 in addition to the main light source 12 and the sub light source 22. In addition, in this Embodiment, the same thing as Embodiment 1 attaches
  • the sub-light source 32 is configured by, for example, a UV LED that radiates ultraviolet light L_uv, which is provided adjacent to the sub-light source 22 and facing the light-emitting area S, and emits ultraviolet light L_uv toward the light-emitting area S. Then, the light emitting area S is illuminated.
  • the ultraviolet light L_uv is diffused and reflected by the fluorescent material contained in the resin 12r to become diffused ultraviolet light LD_uv and re-radiated from the light emitting region S. That is, in this embodiment, the violet light L_v and the ultraviolet light L_uv are re-radiated from the light emission region S as the diffused violet light LD_v and the diffused ultraviolet light LD_uv.
  • the diffused ultraviolet light LD_uv having the light distribution 32d is further emitted from the light emission region S.
  • the fluorescence LF_v is the fluorescence of the resin 12r excited by the purple light L_v
  • the fluorescence LF_uv is excited by the ultraviolet light L_uv.
  • the light distribution 42f in FIG. 4 is a light distribution of the combined light of the white light LW, the fluorescence LF_v due to the purple light L_v, and the fluorescence LF_uv due to the ultraviolet light L_uv.
  • FIG. 5 shows the spectral distribution of light emitted from the light source 2, the vertical axis shows the relative intensity, and the horizontal axis shows the wavelength (nm).
  • the light emitted from the main light source 12 mainly includes white light LW, diffuse violet light LD_v, and diffuse ultraviolet light LD_uv.
  • the spectral distribution of the light emitted from the light source 2 covers the entire wavelength band of visible light (400-700 nm), and the diffused ultraviolet light LD_uv is emitted, thereby enabling measurement of the fluorescent whitening sample.
  • the white light LW, the diffuse violet light LD_v, and the diffuse ultraviolet light LD_uv are diffused and radiated from the resin 12r, respective light distributions can be approximated. Therefore, it is possible to suppress variation in illuminance change due to a variation in the distance between the illumination optical system and the sample surface 1 for light in all wavelengths of visible light. Therefore, when this light source is used as the light source of the illumination optical system of FIG. 1, if an optimal offset angle ⁇ is set for a certain light distribution, the change in illuminance is minimized for light in all visible wavelength bands. Can do.
  • the main light source 12 and the sub light sources 22 and 32 are turned on at the same time.
  • the sub light source is intermittently driven by controlling ON / OFF of the sub light source 32 constituted by UVLEDs, Japanese Patent Laying-Open No. 2006-292510. As shown in the publication, it is possible to measure fluorescent whitening samples.
  • the number of sub-light sources is two.
  • the present invention is not limited to this, and may be three or more, such as three, four, and five.
  • the auxiliary light source 32 is configured by UVLEDs, but is not limited thereto, and may be configured by LEDs such as red LEDs and blue LEDs, or by infrared LEDs that emit infrared light. It may be configured.
  • the light source 2 in FIG. 2 or 4 may be replaced with the light source 21 of the illumination optical system in FIG. Thereby, since the purple LED 27 can be removed, a 45 ° a / 0 ° geometry that illuminates from all directions with a simple configuration can be realized.
  • the light emission region of the main light source is a resin.
  • a phosphor-dispersed glass obtained by dispersing a predetermined phosphor and sintering it, and further containing bubbles of a predetermined size at a certain density. And phosphor dispersion glass with improved uniformity of light dispersion.
  • the light source includes a main light source that emits light from a predetermined light emission region, and one or more auxiliary light sources that have a spectral distribution different from the spectral distribution of the main light source and illuminate the light emission region.
  • the light emitting area reflects light emitted from the sub-light source.
  • the light emission area of the main light source functions as a point light source that emits light having a spectral distribution obtained by combining both the spectral distributions of the light from the main light source and the light from the sub light source. Therefore, according to this light source, a point light source that can cover the entire wavelength band of visible light can be realized.
  • this light source functions as one point light source, as shown in Patent Document 1, it is not necessary to arrange another light source on the optical path of one light source, and the configuration of the illumination optical system can be simplified. can do.
  • this light source functions as a point light source with a light emitting area, the illuminance when the distance between the sample surface and the light source fluctuates as compared with a configuration in which the light source is provided at a completely different position as in Patent Document 1. It is possible to suppress variation for each wavelength band of change.
  • the light emitting area diffusely radiates light emitted from the main light source and diffusely reflects light emitted from the sub-light source.
  • both the light emitted from the main light source and the light emitted from the sub-light source are both diffused and radiated from the light emitting region, so that the light distribution of the light emitted from both light sources is approximated to emit light. Can be emitted from the area. Therefore, for example, when this light source is applied to an illumination optical system, even if the effect of suppressing the change in illuminance due to the variation in distance between the illumination optical system and the sample surface is dependent on the light distribution, it is not easily affected by each distribution. Variations in the illuminance change of light can be suppressed.
  • the main light source is a white LED, and at least one of the sub-light sources is a purple LED.
  • an illumination optical system that covers the visible range of 400 to 700 nm can be configured, and the color value of the sample surface can be accurately measured.
  • the main light source is a white LED
  • at least one of the sub-light sources is a UV LED (Ultra Violet Light Emitting Diode).
  • UV light is emitted from the light emitting region, it is possible to measure a fluorescent whitening sample excited by the UV light.
  • the light emitted from the UV LED is emitted from the same light emitting region as that of the white LED, the light distribution between the white light and the UV light approximates, and when this light source is used as the light source of the illumination optical system, illumination is performed. Variations in illumination distribution due to variations in distance between the optical system and the sample surface for each light distribution can be suppressed, and the fluorescent whitening sample can be measured with high accuracy.
  • the illumination optical system is a sample in which the combined light of the light source, the light emitted from the main light source, and the light emitted from the sub-light source reflected by the light emitting region is incident light. And an optical system for illuminating the surface. According to this structure, an illumination optical system provided with said light source can be provided.
  • the light emitting area is arranged on a normal line passing through the center of the sample surface, and the optical system has at least a part of the combined light as incident light and is omnidirectional or plural in a direction of 45 ° from the normal line. It is preferable to illuminate the center of the sample surface from the orientation.
  • an illumination optical system having a 45 ° c: 0 ° geometry or a 45 ° a: 0 ° geometry that covers a desired wavelength band can be configured, and the illumination optical system has low cost, low power consumption, and low heat generation. Can be provided.
  • the reflection characteristic measuring apparatus includes the illumination optical system and a light receiving optical system that receives light reflected from the sample surface.

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Abstract

A primary light source (12) is configured from a white LED, and includes an LED chip (12c), a resin (12r) and a package (12p). The LED chip (12c) is configured from, for example, a blue LED and emits blue light (L_b). The resin (12r) contains a powdered fluorescent substance that is excited by the blue light (L_b) and emits fluorescent light (LF_y). In addition, the resin (12r) diffuses the blue light (L_b) and emits this light from a light-emitting region (S). A secondary light source (22) is configured from a violet LED, and emits violet light (L_v) to the light-emitting region (S). The resin (12r) reflects and diffuses the violet light (L_v).

Description

光源、照明光学系、及び反射特性測定装置Light source, illumination optical system, and reflection characteristic measuring device
　本発明は、光源、その光源を備える照明光学系、及びその照明光学系を備える反射特性測定装置に関するものである。 The present invention relates to a light source, an illumination optical system including the light source, and a reflection characteristic measuring apparatus including the illumination optical system.
　図６は、特許文献１に記載された照明光学系２の構成図である。白色ＬＥＤ２１は、光軸２８上に配置されたランベルト配光の光源である。凹面鏡２２及びトロイダル鏡２３は、白色ＬＥＤ２１からの放射光を、光軸２８から４５度の方向で全方位から試料面２４へと導く。対物レンズ２５は、試料面２４の反射光の法線方向の成分を、光学ファイバー２６の入射端に収束させる。光学ファイバー２６は、入射光を図略の分光手段へと導く。 FIG. 6 is a configuration diagram of the illumination optical system 2 described in Patent Document 1. The white LED 21 is a light source of Lambert light distribution disposed on the optical axis 28. The concave mirror 22 and the toroidal mirror 23 guide the radiated light from the white LED 21 from all directions to the sample surface 24 in the direction of 45 degrees from the optical axis 28. The objective lens 25 converges the component in the normal direction of the reflected light from the sample surface 24 to the incident end of the optical fiber 26. The optical fiber 26 guides incident light to a not-shown spectroscopic means.
　このようにして、照明光学系２は、白色ＬＥＤ２１の放射光による試料面２４の傾きや表面性状の影響を受けにくい４５°ａ：０°ジオメトリの照明光学系として構成されている。 In this way, the illumination optical system 2 is configured as an illumination optical system having a 45 ° a: 0 ° geometry that is not easily affected by the inclination of the sample surface 24 and the surface properties by the radiated light of the white LED 21.
　白色ＬＥＤ２１は４００－４３０ｎｍの短波長帯において殆ど強度をもたない。これを補うべく、照明光学系２は、トロイダル鏡２３の上流に配置された紫色ＬＥＤ２７を備えている。この紫色ＬＥＤ２７の放射光は、トロイダル鏡２３によって、試料面２４の法線から４５度の方向で一方位から試料面２４へと導かれる。 The white LED 21 has almost no intensity in the short wavelength band of 400-430 nm. In order to compensate for this, the illumination optical system 2 includes a purple LED 27 arranged upstream of the toroidal mirror 23. The emitted light of the purple LED 27 is guided by the toroidal mirror 23 from one position to the sample surface 24 in the direction of 45 degrees from the normal line of the sample surface 24.
　このように、照明光学系２は、紫色ＬＥＤ２７を備えているが、この紫色ＬＥＤ２７は、一方位で試料面２４を照明している。そのため、照明光学系２は、短波長帯において、試料面２４の傾きや表面性状の影響を受けやすい４５°ｘ：０°ジオメトリを構成することになる。 As described above, the illumination optical system 2 includes the purple LED 27. The purple LED 27 illuminates the sample surface 24 at one position. Therefore, the illumination optical system 2 configures a 45 ° x: 0 ° geometry that is easily affected by the inclination of the sample surface 24 and the surface properties in the short wavelength band.
　したがって、この照明光学系２では、試料面２４の傾きや表面性状の影響が波長帯によって異なってしまう。また、この照明光学系２では、試料面２４の位置が変化した場合の影響も波長帯によって異なってしまう。 Therefore, in this illumination optical system 2, the influence of the inclination of the sample surface 24 and the surface properties vary depending on the wavelength band. Further, in the illumination optical system 2, the influence when the position of the sample surface 24 is changed varies depending on the wavelength band.
　よって、この照明光学系２では、分光手段の出力から求められる試料の分光反射特性の測定誤差が波長帯によって異なってしまう。このような波長依存性のある測定誤差は、分光反射特性から色差位置を算出した際に増幅され、大きな色彩値誤差が生じてしまう。 Therefore, in this illumination optical system 2, the measurement error of the spectral reflection characteristic of the sample obtained from the output of the spectroscopic means varies depending on the wavelength band. Such a measurement error having a wavelength dependency is amplified when the color difference position is calculated from the spectral reflection characteristics, and a large color value error occurs.
　さらに、この照明光学系２は、一部の規格が要求する４５°ａ：０°あるいは４５°ｃ：０°ジオメトリを厳密には満たしていない。また、紫色ＬＥＤ２７が白色ＬＥＤ２１の光束中に配置されているため、構成が複雑になる。更に、紫色ＬＥＤ２７は、試料面２４の中心よりも右側に配置されているため、紫色ＬＥＤ２７による照明について、試料面２４内の右側の照度が高くなり、試料面２４内で大きな照度分布の差が生じるという問題もある。 Furthermore, this illumination optical system 2 does not strictly satisfy the 45 ° a: 0 ° or 45 ° c: 0 ° geometry required by some standards. Further, since the purple LED 27 is arranged in the light flux of the white LED 21, the configuration is complicated. Further, since the purple LED 27 is arranged on the right side of the center of the sample surface 24, the illumination on the right side in the sample surface 24 becomes high with respect to the illumination by the purple LED 27, and there is a large difference in illumination distribution within the sample surface 24. There is also a problem that arises.
特開２０１０－６０５２５号公報JP 2010-60525 A
　本発明の目的は、照明光学系の構成を複雑化することなく全波長帯において十分な強度を持ち、試料面までの距離変動による照度変化の波長帯ごとのばらつきを抑制することができる光源、その光源を備える照明光学系、及びその照明光学系を備える反射特性測定装置を提供することである。 The object of the present invention is to provide a light source that has sufficient intensity in all wavelength bands without complicating the configuration of the illumination optical system, and can suppress variations in illuminance change due to distance fluctuations to the sample surface for each wavelength band, An illumination optical system including the light source and a reflection characteristic measuring apparatus including the illumination optical system are provided.
　本発明の一局面による光源は、所定の発光域から光を放射する主光源と、前記主光源の分光分布とは異なる分光分布をもち、前記発光域を照明する１つ以上の副光源とを備え、前記発光域は、前記副光源から放射された光を反射させる。 A light source according to an aspect of the present invention includes a main light source that emits light from a predetermined light emission region, and one or more sub-light sources that have a spectral distribution different from the spectral distribution of the main light source and illuminate the light emission region. The light emitting area reflects light emitted from the sub-light source.
　本発明の別の一局面による照明光学系は、上記の光源と、前記主光源から放射される光と、前記発光域で反射される前記副光源から放射された光との合成光を、入射光として試料面を照明する光学系とを備える。 An illumination optical system according to another aspect of the present invention receives a combined light of the light source, the light emitted from the main light source, and the light emitted from the sub-light source reflected by the light emitting area. And an optical system that illuminates the sample surface as light.
　本発明の更に別の一局面による反射特性測定装置は、上記の照明光学系と、前記試料面から反射された光を受光する受光光学系とを備える。 A reflection characteristic measuring apparatus according to another aspect of the present invention includes the illumination optical system described above and a light receiving optical system that receives light reflected from the sample surface.
本発明の実施の形態１による反射特性測定装置の構成図である。It is a block diagram of the reflection characteristic measuring apparatus by Embodiment 1 of this invention. 図１に示す光源の構成図である。It is a block diagram of the light source shown in FIG. 光源から放射される光の分光分布である。This is a spectral distribution of light emitted from a light source. 本発明の実施の形態２における光源の構成図である。It is a block diagram of the light source in Embodiment 2 of this invention. 図４に示す光源から放射される光の分光分布である。It is a spectral distribution of the light radiated | emitted from the light source shown in FIG. 特許文献１に記載された照明光学系の構成図である。It is a block diagram of the illumination optical system described in Patent Document 1.
　（実施の形態１）
　図１は、本発明の実施の形態１による反射特性測定装置の構成図であり、（Ａ）は側面視からの構成図であり、（Ｂ）は上面視からの平面鏡３の配置であり、（Ｃ）は１つの平面鏡３に注目した場合の構成図である。 (Embodiment 1)
FIG. 1 is a configuration diagram of a reflection characteristic measuring apparatus according to Embodiment 1 of the present invention, (A) is a configuration diagram from a side view, (B) is an arrangement of a plane mirror 3 from a top view, (C) is a block diagram when paying attention to one plane mirror 3.
　この反射特性測定装置は、試料面１、光源２、平面鏡３、反射鏡４、受光光学系５、及び分光部６を備えている。なお、光源２及び平面鏡３により照明光学系が構成される。試料面１は、平面状であり、色サンプルが印刷された印刷物等の試料が配置される。光源２は、発光域Ｓ（図２参照）から光を放射する主光源１２、及び主光源の分光分布とは異なる分光分布をもち、発光域Ｓを照明する副光源２２を備えている。図２は、光源２の構成図である。 The reflection characteristic measuring apparatus includes a sample surface 1, a light source 2, a plane mirror 3, a reflecting mirror 4, a light receiving optical system 5, and a spectroscopic unit 6. The light source 2 and the plane mirror 3 constitute an illumination optical system. The sample surface 1 has a flat shape, and a sample such as a printed matter on which a color sample is printed is arranged. The light source 2 includes a main light source 12 that emits light from the light emission area S (see FIG. 2), and a sub light source 22 that has a spectral distribution different from the spectral distribution of the main light source and illuminates the light emission area S. FIG. 2 is a configuration diagram of the light source 2.
　主光源１２は、例えば白色ＬＥＤにより構成され、ＬＥＤチップ１２ｃ、レジン１２ｒ、及びパッケージ１２ｐを含む。ＬＥＤチップ１２ｃは、例えば青色ＬＥＤによりより構成され、青色光Ｌ＿ｂ（図３参照）を放射する。本実施の形態では、ＬＥＤチップ１２ｃは、例えば４５０ｎｍを中心とする半値幅２０ｎｍ程度の青色光Ｌ＿ｂを放射する。 The main light source 12 is formed of, for example, a white LED, and includes an LED chip 12c, a resin 12r, and a package 12p. The LED chip 12c is composed of, for example, a blue LED, and emits blue light L_b (see FIG. 3). In the present embodiment, the LED chip 12c emits blue light L_b having a half width of about 20 nm centered at 450 nm, for example.
　レジン１２ｒは、ＬＥＤチップ１２ｃの表面に塗布され、粉末状の蛍光物質を含む。そして、レジン１２ｒは、青色光Ｌ＿ｂで励起され、６００ｎｍを中心とする半値幅１５０ｎｍ程度の蛍光ＬＦ＿ｙ（図３参照）を放射する。また、レジン１２ｒは青色光Ｌ＿ｂを拡散させて発光域Ｓから放射させる。なお、符号、Ｌ＿ｂ，ＬＦ＿ｙは図２では図示を省略している。 The resin 12r is applied to the surface of the LED chip 12c and includes a powdery fluorescent material. The resin 12r is excited by the blue light L_b and emits fluorescence LF_y (see FIG. 3) having a half-value width of about 150 nm centered at 600 nm. Further, the resin 12r diffuses the blue light L_b and emits it from the light emitting region S. Note that the symbols L_b and LF_y are not shown in FIG.
　つまり、主光源１２は、青色光Ｌ＿ｂと、この青色光Ｌ＿ｂで励起される蛍光ＬＦ＿ｙとからなる白色光ＬＷ（図３参照）を放射する白色ＬＥＤにより構成されている。パッケージ１２ｐは、透明の部材から構成され、内部にＬＥＤチップ１２ｃが配置されている。 That is, the main light source 12 is configured by a white LED that emits white light LW (see FIG. 3) composed of blue light L_b and fluorescence LF_y excited by the blue light L_b. The package 12p is made of a transparent member, and the LED chip 12c is arranged inside.
　副光源２２は、主光源１２の発光域Ｓに対向して設けられた、例えば紫色ＬＥＤにより構成され、発光域Ｓに向けて紫色光Ｌ＿ｖを放射して、発光域Ｓを照明する。この紫色光Ｌ＿ｖは、レジン１２ｒに含まれる蛍光物質により拡散反射され、配光２２ｄの拡散紫色光ＬＤ＿ｖ（図３参照）となって、発光域Ｓから再放射される。 The secondary light source 22 is configured by, for example, a purple LED provided facing the light emission area S of the main light source 12, and emits purple light L_v toward the light emission area S to illuminate the light emission area S. The violet light L_v is diffusely reflected by the fluorescent material contained in the resin 12r, and becomes diffused violet light LD_v (see FIG. 3) of the light distribution 22d, and is re-radiated from the light emitting area S.
　また、青色光Ｌ＿ｂ及び蛍光ＬＦ＿ｙは共にレジン１２ｒから拡散放射される。そのため、発光域Ｓからは、配光１２ｄを持つ白色光ＬＷが放射される。 Also, both the blue light L_b and the fluorescence LF_y are diffused and emitted from the resin 12r. Therefore, the white light LW having the light distribution 12d is radiated from the light emitting area S.
　また、紫色光Ｌ＿ｖもレジン１２ｒにより拡散反射される。そのため、発光域Ｓからは、配光２２ｄを持つ拡散紫色光ＬＤ＿ｖが放射される。 Also, the purple light L_v is diffusely reflected by the resin 12r. Therefore, from the light emission region S, diffused violet light LD_v having a light distribution 22d is emitted.
　なお、散乱性を上げるという観点から、レジン１２ｒとしては、酸化チタン粉末等を添加することが好ましい。 In addition, it is preferable to add titanium oxide powder or the like as the resin 12r from the viewpoint of increasing scattering properties.
　図３は、光源２から放射される光の分光分布であり、縦軸は相対強度を示し、横軸は波長（ｎｍ）を示している。図３に示すように光源２からは、主に、青色光Ｌ＿ｂ及び蛍光ＬＦ＿ｙを含む白色光ＬＷと、拡散紫色光ＬＤ＿ｖとが放射されている。拡散紫色光ＬＤ＿ｖは、白色光ＬＷではカバーされていない、４３０ｎｍ以下の波長帯の光である。なお、ＬＦ＿ｖは、紫色光Ｌ＿ｖによって励起されたレジン１２ｒの紫色蛍光である。これにより、光源２から放射される放射光の分光分布は可視光の全波長帯（４００－７００ｎｍ）をカバーする。また、図２の配光１２ｆは、白色光ＬＷと、紫色光Ｌ＿ｖによる拡散紫色光ＬＤ＿ｖとの合算光の配光である。 FIG. 3 shows the spectral distribution of light emitted from the light source 2, wherein the vertical axis indicates relative intensity and the horizontal axis indicates wavelength (nm). As shown in FIG. 3, the light source 2 mainly emits white light LW including blue light L_b and fluorescence LF_y and diffuse violet light LD_v. The diffuse violet light LD_v is light having a wavelength band of 430 nm or less that is not covered by the white light LW. Note that LF_v is the purple fluorescence of the resin 12r excited by the purple light L_v. Thereby, the spectral distribution of the radiated light emitted from the light source 2 covers the entire wavelength band of visible light (400 to 700 nm). 2 is a light distribution of the combined light of the white light LW and the diffused violet light LD_v by the violet light L_v.
　図１（Ａ）に戻り、平面鏡３は、試料面１と光源２との間に法線１ｎを対称軸として軸対称に複数配置されている（図１（Ｂ））。なお、試料面１を全方位から照射する場合は、複数の平面鏡３に代えて、リング状の鏡を採用すればよい。 Referring back to FIG. 1 (A), a plurality of plane mirrors 3 are arranged between the sample surface 1 and the light source 2 in an axisymmetric manner with the normal 1n as an axis of symmetry (FIG. 1 (B)). When the sample surface 1 is irradiated from all directions, a ring-shaped mirror may be employed instead of the plurality of plane mirrors 3.
　平面鏡３は、光源２から放射される白色光ＬＷ及び拡散紫色光ＬＤ＿ｖの配光の異なる全てのφ＝４５°－δの光束成分を反射して、θ＝４５°で試料を照明するので、法線１ｎに対する角度φ（＝４５°－δ）の光束成分２ａを反射し、反射した光束成分２ａが法線１ｎに対してθ（＝４５°）の角度で試料面１の中心Ｏに導かれるように法線３ｎに対して所定の角度δ／２傾斜されて配置されている。なお、法線３ｎは、平面鏡３の中心Ｏ３を通る試料面１の法線である。 Since the plane mirror 3 reflects all the light flux components of φ = 45 ° −δ having different light distributions of the white light LW and the diffuse violet light LD_v emitted from the light source 2 and illuminates the sample at θ = 45 °, The light beam component 2a having an angle φ (= 45 ° −δ) with respect to the normal line 1n is reflected, and the reflected light beam component 2a is guided to the center O of the sample surface 1 at an angle θ (= 45 °) with respect to the normal line 1n. As shown, it is disposed at a predetermined angle δ / 2 with respect to the normal 3n. The normal 3n is a normal of the sample surface 1 passing through the center O3 of the plane mirror 3.
　具体的には、図１（Ｃ）に示すように、平面鏡３は、その反射面３ａによる光源２の光源像２´を通る試料面１の法線２ｎに対して、光源像２´の配光主軸２´ｘが所定のオフセット角δだけ傾くように配置されている。 Specifically, as shown in FIG. 1C, the plane mirror 3 has an arrangement of the light source image 2 ′ with respect to the normal 2n of the sample surface 1 passing through the light source image 2 ′ of the light source 2 by the reflection surface 3a. The optical main axis 2′x is arranged so as to be inclined by a predetermined offset angle δ.
　ここで、オフセット角δは、配光主軸２´ｘに対して４５°－δの角度における配光主軸への偏りが最大となる配光２ｄ＿ｍａｘの配光変化率が、ランベルト配光の配光主軸に対して４５°の角度における配光変化率に実質的に等しくなるような所定の角度に設定されている。 Here, the offset angle δ is a light distribution change rate of the light distribution 2d_max that maximizes the bias to the light distribution main axis at an angle of 45 ° −δ with respect to the light distribution main axis 2′x. The predetermined angle is set to be substantially equal to the light distribution change rate at an angle of 45 ° with respect to the main axis.
　これにより、照明光学系と試料面１との間の距離変動に対して中心Ｏでの照度の変化が最小となるように、中心Ｏに対して複数の方位から光束成分２ａが導かれることになる。これにより、４５°ｃ：０°ジオメトリ（ｃ：ｃｉｒｃｕｍｆｅｒｅｎｔｉａｌ）の照明光学系が実現されることになる。 Thereby, the light flux component 2a is guided from a plurality of directions with respect to the center O so that the change in illuminance at the center O is minimized with respect to the distance variation between the illumination optical system and the sample surface 1. Become. As a result, an illumination optical system having a 45 ° c: 0 ° geometry (c: circumferential) is realized.
　反射鏡４は、法線１ｎ上であって、光源２と中心Ｏとの間の所定の位置に配置され、試料面１の反射光の法線成分１ａの光路をほぼ９０°変更する。反射光は受光光学系５を経て分光部６に入射し分光特性が測定され、図略の演算処理部に出力される。演算処理部は、分光部６により測定された分光特性から、公知の方法を用いて試料面１の分光反射率係数及び色彩値を求める。 The reflecting mirror 4 is disposed on the normal line 1n and at a predetermined position between the light source 2 and the center O, and changes the optical path of the normal component 1a of the reflected light on the sample surface 1 by approximately 90 °. The reflected light is incident on the spectroscopic unit 6 through the light receiving optical system 5, the spectral characteristics are measured, and output to an arithmetic processing unit (not shown). The arithmetic processing unit obtains the spectral reflectance coefficient and the color value of the sample surface 1 from the spectral characteristics measured by the spectroscopic unit 6 using a known method.
　図２に示す光源２では、白色光ＬＷ及び拡散紫色光ＬＤ＿ｖは、共にレジン１２ｒにより拡散放射される光であるため、配光１２ｄと、拡散紫色光ＬＤ＿ｖの配光２２ｄとは、近似し、ランベルト配光に近いのでオフセット角δは０に近くなる。 In the light source 2 shown in FIG. 2, since the white light LW and the diffuse violet light LD_v are both light diffused and radiated by the resin 12r, the light distribution 12d and the light distribution 22d of the diffuse violet light LD_v are approximated, Since it is close to the Lambert light distribution, the offset angle δ is close to zero.
　このように、光源２からは、可視光の全波長帯の光がレジン１２ｒから拡散放射されているため、可視光の全波長帯において配光を近似させることができる。そのため、光源２を図１に示すように配置した場合、可視光の全波長帯の光について照明光学系と試料面１との間の距離変動による照度変化のバラツキを抑制することができる。そして、配光１２ｄ、２２ｄのどちらかにおいて、照明光学系と試料面１との間の距離変動に伴う光束成分２ａの中心Ｏでの照度変化が最小となるように、オフセット角δを設定すれば、可視光の全波長帯の光束について照度変化を最小にすることができる。 Thus, since light in the entire wavelength band of visible light is diffused and emitted from the resin 12r from the light source 2, the light distribution can be approximated in the entire wavelength band of visible light. Therefore, when the light source 2 is arranged as shown in FIG. 1, it is possible to suppress variation in illuminance change due to a variation in the distance between the illumination optical system and the sample surface 1 with respect to light in all visible wavelength bands. In either of the light distributions 12d and 22d, the offset angle δ is set so that the change in illuminance at the center O of the light beam component 2a due to the distance variation between the illumination optical system and the sample surface 1 is minimized. For example, the change in illuminance can be minimized with respect to the luminous flux in all wavelength bands of visible light.
　また、１つの光源２を用いて４５°ｃ：０°ジオメトリが構成されているため、高効率化かつ低コストな反射特性測定装置を提供することができる。 Also, since a 45 ° c: 0 ° geometry is configured using one light source 2, it is possible to provide a highly efficient and low-cost reflection characteristic measuring device.
　なお、上記では、白色ＬＥＤにおいて、青色光Ｌ＿ｂと蛍光ＬＦ＿ｙとの配光の差を無視して白色光ＬＷの配光１２ｄとし、白色光ＬＷ及び拡散紫色光ＬＤ＿ｖの配光が近似しているとしたが、これらの配光が異なる場合、配光主軸への偏りが最大の配光について設定したオフセット角δで平面鏡３を配置すればよい。これにより、可視光の全ての波長帯に亘って、光源２及び試料面１間の距離変動に対する中心Ｏ３での照度変化を最小にすることができる。これは、以下の２点で説明される。 In the above, in the white LED, the light distribution difference of the blue light L_b and the fluorescence LF_y is ignored to obtain the light distribution 12d of the white light LW, and the light distribution of the white light LW and the diffuse violet light LD_v is approximated. However, when these light distributions are different, the plane mirror 3 may be arranged at the offset angle δ set for the light distribution with the maximum deviation to the light distribution main axis. Thereby, the illuminance change at the center O3 with respect to the distance fluctuation between the light source 2 and the sample surface 1 can be minimized over the entire wavelength band of visible light. This is explained in the following two points.
　（１）実際に設定したオフセット角δが、各配光の最適なオフセット角δに近い場合、どの配光においても、配光主軸に対する角度φ（＝４５°－δ）での配光変化率は、ランベルト配光の配光主軸に対する角度が４５度の配光変化率に近似するため、問題はない。しかしながら、実際に設定したオフセット角δが、ある配光の最適なオフセット角δから外れた場合、その配光の配光主軸に対する角度φでの配光変化率と、ランベルト配光の配光主軸に対する角度が４５°の配光変化率との乖離は、配光主軸への偏りが大きい配光ほど大きくなる。 (1) When the actually set offset angle δ is close to the optimum offset angle δ for each light distribution, the light distribution change rate at an angle φ (= 45 ° −δ) with respect to the light distribution main axis in any light distribution Since the angle of the Lambert light distribution with respect to the light distribution main axis approximates a light distribution change rate of 45 degrees, there is no problem. However, when the actually set offset angle δ deviates from the optimum offset angle δ of a certain light distribution, the light distribution change rate at the angle φ with respect to the light distribution main axis of the light distribution and the light distribution main axis of the Lambert light distribution The deviation from the light distribution change rate at an angle with respect to 45 ° is larger as the light distribution is more biased toward the light distribution main axis.
　（２）実際に設定したオフセット角δが、ある配光Ｐ１（φ）の最適なオフセット角δ＿ｏｐ１よりも小さい場合（δ＜δ＿ｏｐ１）、配光Ｐ１（φ）の配光主軸に対する角度φ（＝４５°－δ）は大きくなる。また、光源２に対して設定したオフセット角δが配光Ｐ１（φ）の最適なオフセット角δ＿ｏｐ１よりも大きい場合（δ＞δ＿ｏｐ１）、配光Ｐ１（φ）の配光主軸に対する角度φは小さくなる。 (2) When the actually set offset angle δ is smaller than the optimum offset angle δ_op1 of a certain light distribution P1 (φ) (δ <δ_op1), the angle φ (= 45 ° −δ) increases. Further, when the offset angle δ set for the light source 2 is larger than the optimum offset angle δ_op1 of the light distribution P1 (φ) (δ> δ_op1), the angle φ of the light distribution P1 (φ) with respect to the light distribution main axis is small. Become.
　配光Ｐ１（φ）の配光変化率ｄＰ１／ｄφは、角度φが大きくなるにつれて増大する傾向にある。したがって、光源２に対して設定したオフセット角δが、配光Ｐ１（φ）の最適なオフセット角δ＿ｏｐ１より小さいと、配光Ｐ１（φ）の配光主軸に対する角度φが大きくなるため、配光Ｐ１（φ）の配光変化率ｄＰ１／ｄφが、ランベルト配光ＰＬ（θ＝４５°）での配光変化率ｄＰＬ／ｄθから大きく乖離する。 The light distribution change rate dP1 / dφ of the light distribution P1 (φ) tends to increase as the angle φ increases. Therefore, if the offset angle δ set for the light source 2 is smaller than the optimum offset angle δ_op1 of the light distribution P1 (φ), the angle φ of the light distribution P1 (φ) with respect to the light distribution main axis becomes large. The light distribution change rate dP1 / dφ of P1 (φ) greatly deviates from the light distribution change rate dPL / dθ in the Lambert light distribution PL (θ = 45 °).
　一方、実際に設定したオフセット角δが配光Ｐ１（φ）の最適なオフセット角δ＿ｏｐ１より大きいと、配光主軸に対する角度φが小さくなるため、配光Ｐ１（φ）の配光変化率ｄＰ１／ｄφがランベルト配光ＰＬ（θ＝４５°）の配光変化率ｄＰＬ／ｄθから大きく乖離しない。 On the other hand, when the actually set offset angle δ is larger than the optimum offset angle δ_op1 of the light distribution P1 (φ), the angle φ with respect to the light distribution main axis becomes small, and therefore the light distribution change rate dP1 / of the light distribution P1 (φ). dφ does not greatly deviate from the light distribution change rate dPL / dθ of the Lambert light distribution PL (θ = 45 °).
　複数の配光の中で、配光主軸への偏りが最も大きい配光ＰＸ（φ）の最適なオフセット角δ＿ｏｐｘは最も大きい。そのため、光源２のオフセット角δをδ＿ｏｐｘに設定すると、他の配光ＰＹ（φ）の配光主軸に対する角度φは、配光ＰＹ（φ）に対して最適なオフセット角δ＿ｏｐｙを設定した場合の配光主軸に対する角度φ＿ｙよりも小さくなる。 Among the plurality of light distributions, the optimum offset angle δ_opx of the light distribution PX (φ) having the largest deviation to the light distribution main axis is the largest. Therefore, when the offset angle δ of the light source 2 is set to δ_opx, the angle φ of the other light distribution PY (φ) with respect to the light distribution main axis is the same as that when the optimum offset angle δ_opy is set with respect to the light distribution PY (φ). It becomes smaller than the angle φ_y with respect to the light distribution main axis.
　そのため、複数の配光のうち、配光主軸への偏りが最も大きい配光ＰＸ（Ｘ）の最適なオフセット角δ＿ｏｐｘで実際のオフセット角δを設定することが好ましい。 Therefore, it is preferable to set the actual offset angle δ with the optimum offset angle δ_opx of the light distribution PX (X) having the largest deviation from the light distribution main axis among the plurality of light distributions.
　（実施の形態２）
　実施の形態２による反射特性測定装置は、副光源の個数を２つにしたことを特徴としている。図４は、本発明の実施の形態２における光源２の構成図である。図４に示すように、光源２は、主光源１２及び副光源２２に加えて、更に副光源３２を備えている。なお、本実施の形態において実施の形態１と同一のものは同一の符号を付し、説明を省略する。 (Embodiment 2)
The reflection characteristic measuring apparatus according to Embodiment 2 is characterized in that the number of sub-light sources is two. FIG. 4 is a configuration diagram of the light source 2 according to Embodiment 2 of the present invention. As shown in FIG. 4, the light source 2 further includes a sub light source 32 in addition to the main light source 12 and the sub light source 22. In addition, in this Embodiment, the same thing as Embodiment 1 attaches | subjects the same code | symbol, and abbreviate | omits description.
　副光源３２は、副光源２２に隣接し、かつ、発光域Ｓに対向して設けられた、例えば、紫外光Ｌ＿ｕｖを放射するＵＶＬＥＤにより構成され、発光域Ｓに向けて紫外光Ｌ＿ｕｖを放射して、発光域Ｓを照明する。この紫外光Ｌ＿ｕｖは、レジン１２ｒに含まれる蛍光物質により拡散反射され拡散紫外光ＬＤ＿ｕｖとなって、発光域Ｓから再放射される。つまり、本実施の形態では、紫色光Ｌ＿ｖ及び紫外光Ｌ＿ｕｖが、拡散紫色光ＬＤ＿ｖ及び拡散紫外光ＬＤ＿ｕｖになって発光域Ｓから再放射される。 The sub-light source 32 is configured by, for example, a UV LED that radiates ultraviolet light L_uv, which is provided adjacent to the sub-light source 22 and facing the light-emitting area S, and emits ultraviolet light L_uv toward the light-emitting area S. Then, the light emitting area S is illuminated. The ultraviolet light L_uv is diffused and reflected by the fluorescent material contained in the resin 12r to become diffused ultraviolet light LD_uv and re-radiated from the light emitting region S. That is, in this embodiment, the violet light L_v and the ultraviolet light L_uv are re-radiated from the light emission region S as the diffused violet light LD_v and the diffused ultraviolet light LD_uv.
　したがって、発光域Ｓからは、配光１２ｄを持つ白色光ＬＷ、及び配光２２ｄを持つ拡散紫色光ＬＤ＿ｖに加えて、更に、配光３２ｄを持つ拡散紫外光ＬＤ＿ｕｖが放射される。なお、蛍光ＬＦ＿ｖは紫色光Ｌ＿ｖによって、蛍光ＬＦ＿ｕｖは紫外光Ｌ＿ｕｖによって励起されたレジン１２ｒの蛍光である。また、図４の配光４２ｆは、白色光ＬＷと、紫色光Ｌ＿ｖによる蛍光ＬＦ＿ｖと、紫外光Ｌ＿ｕｖによる蛍光ＬＦ＿ｕｖとの合算光の配光である。 Therefore, in addition to the white light LW having the light distribution 12d and the diffuse violet light LD_v having the light distribution 22d, the diffused ultraviolet light LD_uv having the light distribution 32d is further emitted from the light emission region S. The fluorescence LF_v is the fluorescence of the resin 12r excited by the purple light L_v, and the fluorescence LF_uv is excited by the ultraviolet light L_uv. The light distribution 42f in FIG. 4 is a light distribution of the combined light of the white light LW, the fluorescence LF_v due to the purple light L_v, and the fluorescence LF_uv due to the ultraviolet light L_uv.
　図５は、光源２から放射される光の分光分布を示し、縦軸は相対強度を示し、横軸は波長（ｎｍ）を示している。図５に示すように主光源１２から放射される光には、主に、白色光ＬＷ、拡散紫色光ＬＤ＿ｖ、及び拡散紫外光ＬＤ＿ｕｖが含まれていることが分かる。 FIG. 5 shows the spectral distribution of light emitted from the light source 2, the vertical axis shows the relative intensity, and the horizontal axis shows the wavelength (nm). As shown in FIG. 5, it can be seen that the light emitted from the main light source 12 mainly includes white light LW, diffuse violet light LD_v, and diffuse ultraviolet light LD_uv.
　これにより、光源２から放射される光の分光分布は可視光の全波長帯（４００－７００ｎｍ）をカバーするとともに、拡散紫外光ＬＤ＿ｕｖが放射されているため、蛍光増白試料の測定が可能になる。 As a result, the spectral distribution of the light emitted from the light source 2 covers the entire wavelength band of visible light (400-700 nm), and the diffused ultraviolet light LD_uv is emitted, thereby enabling measurement of the fluorescent whitening sample. Become.
　また、図４に示す光源２では、白色光ＬＷ、拡散紫色光ＬＤ＿ｖ、及び拡散紫外光ＬＤ＿ｕｖはレジン１２ｒから拡散放射されているため、それぞれの配光を近似させることができる。そのため、可視光の全波長帯の光について照明光学系と試料面１と間の距離変動による照度変化のバラツキを抑制することができる。したがって、この光源を図１の照明光学系の光源とする場合、ある１つの配光について、最適なオフセット角δを設定すれば、可視光の全波長帯の光について照度変化を最小にすることができる。 Further, in the light source 2 shown in FIG. 4, since the white light LW, the diffuse violet light LD_v, and the diffuse ultraviolet light LD_uv are diffused and radiated from the resin 12r, respective light distributions can be approximated. Therefore, it is possible to suppress variation in illuminance change due to a variation in the distance between the illumination optical system and the sample surface 1 for light in all wavelengths of visible light. Therefore, when this light source is used as the light source of the illumination optical system of FIG. 1, if an optimal offset angle δ is set for a certain light distribution, the change in illuminance is minimized for light in all visible wavelength bands. Can do.
　ここで、主光源１２、副光源２２，３２は、同時に点灯されるが、ＵＶＬＥＤにより構成される副光源３２のＯＮ／ＯＦＦを制御し、副光源を間欠駆動すれば、特開２００６－２９２５１０号公報に示すように蛍光増白試料の測定が可能になる。 Here, the main light source 12 and the sub light sources 22 and 32 are turned on at the same time. However, if the sub light source is intermittently driven by controlling ON / OFF of the sub light source 32 constituted by UVLEDs, Japanese Patent Laying-Open No. 2006-292510. As shown in the publication, it is possible to measure fluorescent whitening samples.
　なお、実施の形態２では、副光源の個数を２つとしたが、本発明はこれに限定されず、３つ、４つ、５つ等の３つ以上にしてもよい。また、実施の形態２では、副光源３２をＵＶＬＥＤにより構成したが、これに限定されず、赤色ＬＥＤ、青色ＬＥＤ等のＬＥＤにより構成してもよいし、赤外光を放射する赤外ＬＥＤにより構成してもよい。 In the second embodiment, the number of sub-light sources is two. However, the present invention is not limited to this, and may be three or more, such as three, four, and five. In the second embodiment, the auxiliary light source 32 is configured by UVLEDs, but is not limited thereto, and may be configured by LEDs such as red LEDs and blue LEDs, or by infrared LEDs that emit infrared light. It may be configured.
　また、図２或いは図４の光源２を図６の照明光学系の光源２１に置き換えても良い。これにより、紫色ＬＥＤ２７を除去できるので、簡単な構成で全方位から照明する４５°ａ／０°ジオメトリが実現できる。 Further, the light source 2 in FIG. 2 or 4 may be replaced with the light source 21 of the illumination optical system in FIG. Thereby, since the purple LED 27 can be removed, a 45 ° a / 0 ° geometry that illuminates from all directions with a simple configuration can be realized.
　また、実施の形態１及び２では、主光源における発光域をレジンとしたが、所定の蛍光体分散させて焼結した蛍光体分散ガラスや、更に所定の大きさの気泡をある密度で含有させて光の分散の均一性を向上させた蛍光体分散ガラスであってもよい。 In the first and second embodiments, the light emission region of the main light source is a resin. However, a phosphor-dispersed glass obtained by dispersing a predetermined phosphor and sintering it, and further containing bubbles of a predetermined size at a certain density. And phosphor dispersion glass with improved uniformity of light dispersion.
　上記の実施の形態による技術的特徴をまとめると下記のようになる。 The technical features according to the above embodiment are summarized as follows.
　（１）上記の光源は、所定の発光域から光を放射する主光源と、前記主光源の分光分布とは異なる分光分布をもち、前記発光域を照明する１つ以上の副光源とを備え、前記発光域は、前記副光源から放射された光を反射させる。 (1) The light source includes a main light source that emits light from a predetermined light emission region, and one or more auxiliary light sources that have a spectral distribution different from the spectral distribution of the main light source and illuminate the light emission region. The light emitting area reflects light emitted from the sub-light source.
　この構成によれば、主光源の発光域からは、主光源が放射する光と、副光源が放射した光の反射光とが放射される。そのため、主光源の発光域は、主光源の光及び副光源の光の両分光分布を合わせた分光分布をもつ光を放射する点光源として機能する。したがって、この光源によれば、可視光の全波長帯をカバーすることができる点光源を実現することができる。 According to this configuration, light emitted from the main light source and reflected light of light emitted from the sub-light source are emitted from the light emission area of the main light source. Therefore, the light emission area of the main light source functions as a point light source that emits light having a spectral distribution obtained by combining both the spectral distributions of the light from the main light source and the light from the sub light source. Therefore, according to this light source, a point light source that can cover the entire wavelength band of visible light can be realized.
　そして、この光源の発光域は１つの点光源として機能するため、特許文献１に示すように、一方の光源の光路上に他の光源を配置する必要がなく、照明光学系の構成を簡便にすることができる。また、この光源は、発光域が１つの点光源として機能するため、特許文献１のように光源を全く異なる位置に設ける構成に比べ、試料面と光源との間の距離が変動したときの照度変化の波長帯ごとのバラツキを抑制することがきる。 And since the light emission area of this light source functions as one point light source, as shown in Patent Document 1, it is not necessary to arrange another light source on the optical path of one light source, and the configuration of the illumination optical system can be simplified. can do. In addition, since this light source functions as a point light source with a light emitting area, the illuminance when the distance between the sample surface and the light source fluctuates as compared with a configuration in which the light source is provided at a completely different position as in Patent Document 1. It is possible to suppress variation for each wavelength band of change.
　（２）前記発光域は、前記主光源から放射された光を拡散放射し、かつ、前記副光源から放射された光を拡散反射することが好ましい。 (2) It is preferable that the light emitting area diffusely radiates light emitted from the main light source and diffusely reflects light emitted from the sub-light source.
　この構成によれば、主光源から放射された光と副光源から放射された光とが、ともに発光域から拡散放射されるため、両光源から放射された光の配光を近似させて、発光域から放射させることができる。そのため、例えばこの光源を照明光学系に適用した場合、照明光学系と試料面との間の距離変動による照度変化の抑制効果に配光依存性があっても、その影響を受けにくく、各配光の照度変化のバラツキを抑制することができる。 According to this configuration, both the light emitted from the main light source and the light emitted from the sub-light source are both diffused and radiated from the light emitting region, so that the light distribution of the light emitted from both light sources is approximated to emit light. Can be emitted from the area. Therefore, for example, when this light source is applied to an illumination optical system, even if the effect of suppressing the change in illuminance due to the variation in distance between the illumination optical system and the sample surface is dependent on the light distribution, it is not easily affected by each distribution. Variations in the illuminance change of light can be suppressed.
　（３）前記主光源は、白色ＬＥＤであり、前記副光源は、少なくとも１つが紫色ＬＥＤであることが好ましい。 (3) Preferably, the main light source is a white LED, and at least one of the sub-light sources is a purple LED.
　この構成によれば、４００－７００ｎｍの可視域をカバーする照明光学系を構成でき、試料面の色彩値を精度よく測定できる。 According to this configuration, an illumination optical system that covers the visible range of 400 to 700 nm can be configured, and the color value of the sample surface can be accurately measured.
　（４）前記主光源は、白色ＬＥＤであり、前記副光源は、少なくとも１つがＵＶＬＥＤ（Ultra　Violet　Light　Emitting　Diode）であることが好ましい。 (4) Preferably, the main light source is a white LED, and at least one of the sub-light sources is a UV LED (Ultra Violet Light Emitting Diode).
　この構成によれば、発光域からはＵＶ光が放射されるため、ＵＶ光によって励起される蛍光増白試料の測定が可能になる。また、ＵＶＬＥＤから放射された光は、白色ＬＥＤと同一の発光域から放射されるため、白色光とＵＶ光との配光が近似し、この光源を照明光学系の光源とした場合に、照明光学系と試料面との間の距離変動による照度変化の配光ごとのバラツキを抑制することができ、蛍光増白試料を高精度で測定することができる。 According to this configuration, since UV light is emitted from the light emitting region, it is possible to measure a fluorescent whitening sample excited by the UV light. In addition, since the light emitted from the UV LED is emitted from the same light emitting region as that of the white LED, the light distribution between the white light and the UV light approximates, and when this light source is used as the light source of the illumination optical system, illumination is performed. Variations in illumination distribution due to variations in distance between the optical system and the sample surface for each light distribution can be suppressed, and the fluorescent whitening sample can be measured with high accuracy.
　（５）上記の照明光学系は、上記の光源と、前記主光源から放射される光と、前記発光域で反射される前記副光源から放射された光との合成光を、入射光として試料面を照明する光学系とを備える。この構成によれば、上記の光源を備える照明光学系を提供することができる。 (5) The illumination optical system is a sample in which the combined light of the light source, the light emitted from the main light source, and the light emitted from the sub-light source reflected by the light emitting region is incident light. And an optical system for illuminating the surface. According to this structure, an illumination optical system provided with said light source can be provided.
　（６）前記発光域は、試料面の中心を通る法線上に配置され、前記光学系は、前記合成光の少なくとも一部を入射光として、前記法線から４５°の方向で全方位又は複数の方位から前記試料面の中心を照明することが好ましい。 (6) The light emitting area is arranged on a normal line passing through the center of the sample surface, and the optical system has at least a part of the combined light as incident light and is omnidirectional or plural in a direction of 45 ° from the normal line. It is preferable to illuminate the center of the sample surface from the orientation.
　この構成によれば、所望の波長帯をカバーする４５°ｃ：０°ジオメトリあるいは４５°ａ：０°ジオメトリの照明光学系を構成でき、低コスト、低消費電力、及び低発熱の照明光学系を提供することができる。 According to this configuration, an illumination optical system having a 45 ° c: 0 ° geometry or a 45 ° a: 0 ° geometry that covers a desired wavelength band can be configured, and the illumination optical system has low cost, low power consumption, and low heat generation. Can be provided.
　（７）上記の反射特性測定装置は、上記照明光学系と、前記試料面から反射された光を受光する受光光学系とを備える。 (7) The reflection characteristic measuring apparatus includes the illumination optical system and a light receiving optical system that receives light reflected from the sample surface.
　この構成によれば、上記の照明光学系を備える反射特性測定装置を提供することができる。 According to this configuration, it is possible to provide a reflection characteristic measuring apparatus including the illumination optical system described above.

Claims (7)

  1. 　所定の発光域から光を放射する主光源と、
    　前記主光源の分光分布とは異なる分光分布をもち、前記発光域を照明する１つ以上の副光源とを備え、
    　前記発光域は、前記副光源から放射された光を反射させる光源。     A main light source that emits light from a predetermined emission region;
    One or more sub-light sources having a spectral distribution different from the spectral distribution of the main light source and illuminating the light emitting area;
    The light emitting area is a light source that reflects light emitted from the sub-light source.
  2. 　前記発光域は、前記主光源から放射された光を拡散放射し、かつ、前記副光源から放射された光を拡散反射する請求項１記載の光源。 The light source according to claim 1, wherein the light emitting area diffuses and radiates light emitted from the main light source and diffusely reflects light emitted from the sub-light source.
  3. 　前記主光源は、白色LED（Ｌｉｇｈｔ　Ｅｍｉｔｔｉｎｇ　Ｄｉｏｄｅ）であり、
    　前記副光源は、少なくとも１つが紫色ＬＥＤである請求項１記載の光源。     The main light source is a white LED (Light Emitting Diode),
    The light source according to claim 1, wherein at least one of the auxiliary light sources is a purple LED.
  4. 　前記主光源は、白色ＬＥＤであり、
    　前記副光源は、少なくとも１つがＵＶＬＥＤ（Ultra　Violet　Light　Emitting　Diode）である請求項１記載の光源。     The main light source is a white LED,
    The light source according to claim 1, wherein at least one of the sub light sources is a UV LED (Ultra Violet Light Emitting Diode).
  5. 　請求項１記載の光源と、
    　前記主光源から放射される光と、前記発光域で反射される前記副光源から放射された光との合成光を、入射光として試料面を照明する光学系とを備える照明光学系。     A light source according to claim 1;
    An illumination optical system comprising: an optical system that illuminates the sample surface with combined light of light emitted from the main light source and light emitted from the sub-light source reflected from the light emission area as incident light.
  6. 　前記発光域は、試料面の中心を通る法線上に配置され、
    　前記光学系は、前記合成光の少なくとも一部を入射光として、前記法線から４５°の方向で全方位又は複数の方位から前記試料面の中心を照明する請求項５記載の照明光学系。     The emission region is arranged on a normal passing through the center of the sample surface,
    The illumination optical system according to claim 5, wherein the optical system illuminates the center of the sample surface from all directions or a plurality of directions in a direction of 45 ° from the normal with at least part of the combined light as incident light.
  7. 　請求項５記載の照明光学系と、
    　前記試料面から反射された光を受光する受光光学系とを備える反射特性測定装置。     The illumination optical system according to claim 5;
    A reflection characteristic measuring apparatus comprising: a light receiving optical system that receives light reflected from the sample surface.
PCT/JP2011/002601 2010-05-14 2011-05-10 Light sources, illumination optical system and reflection property measurement apparatus WO2011142123A1 (en)

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