WO2011030390A1

WO2011030390A1 - Sheet df test machine

Info

Publication number: WO2011030390A1
Application number: PCT/JP2009/004579
Authority: WO
Inventors: 片野敏弘; 河野弘幸; 平野明男; 佐々忠; 石塚克己; 安藤雅敏; 河崎博行
Original assignee: フォイトパテントゲゼルシャフトミットベシュレンクテルハフツング
Priority date: 2009-09-14
Filing date: 2009-09-14
Publication date: 2011-03-17
Also published as: JPWO2011030390A1

Abstract

Provided is a sheet DF test machine wherein a coating test can be carried out with a small quantity of paper or paint. A sheet DF test machine, which forms a coating experimentally by supplying paint to be applied in the shape of a curtain film and passing a base (81) for forming a coating through the curtain film, comprises a guide mechanism (20) for guiding a sample plate (80), where the base (81) is fixed to a transport plate (82), from the upstream side to the downstream side, a chute pulley (30) located on the upstream side of the guide mechanism (20) and moving the sample plate (80) toward the downstream side while accelerating, and a brake mechanism (40) located on the downstream side of the chute pulley (30) and decelerating the sample plate (80) passed through the curtain film.

Description

Single wafer DF testing machine

The present invention relates to a single wafer DF testing machine for supplying a coating material for coating to a base material to form a coating film on a test basis.

Conventionally, a DF (Direct Fountain) coater for forming a coating film on a tape-like substrate such as paper has been known. This DF coater smoothly guides the defoamed paint supplied to the DF head to the nozzle without stagnation, and the flow of the paint is evenly rectified in the width direction at this nozzle to allow the paint to flow out from the nozzle tip. A curtain film having a stable flow rate is formed, and the curtain film is stretched at the same speed as the base material at the moment when the curtain film is applied to the base material, so that the base material is uniformly coated (for example, see Patent Document 1). ).

JP 2000-210607 A

However, when an attempt is made to perform a coating test in which a coating film is formed on a base material using a DF coater on a trial basis, the DF coater is a large production line and it is difficult to test a multi-level / small lot. Specifically, the paper used for the test needs to have a total length of about 2000 to 15000 m and a width of about 0.5 to 1 m. Also, at least several hundred liters of paint to be used is necessary. Therefore, enormous costs and preparations were required to perform the test.

The present invention has been made in view of the above-described circumstances, and is intended to provide a single wafer DF testing machine capable of performing a coating test with a small amount of paper or paint.

In order to solve the above-mentioned problems, the present invention is to supply a coating material for coating in the form of a curtain film, and to form a coating film on a trial basis by passing a substrate for forming the coating film through the curtain film. A single-wafer DF testing machine, a guide mechanism that guides a sample plate with the substrate attached to a transport plate from an upstream side to a downstream side, and an upstream side of the guide mechanism, and the sample plate on the downstream side A chute pulley for accelerating and moving, and a brake mechanism that is positioned downstream of the chute pulley and decelerates or stops the sample plate that has passed through the curtain film.

Further, the chute pulley may include an upper roller and a lower roller, and the conveyance plate may be sandwiched between the upper roller and the lower roller to be accelerated.

Furthermore, the brake mechanism may be provided with a brake plate that can be moved up and down by a link mechanism, and the sample plate may be decelerated or stopped by pressing the transport plate with the brake plate.

Furthermore, a dryer for drying the coating film can be provided on the downstream side of the brake mechanism.

Further, the chute pulley and the brake mechanism may be controlled to automatically operate based on a signal from a control device.

On the other hand, an air cut device for reducing the amount of entrained air provided by the traveling sample plate may be provided upstream of the curtain film.

Furthermore, a curtain stopper device is provided which has a DF head for forming the curtain film, covers the lower side of the DF head during coating standby, and opens the lower side of the DF head during coating. You can also.

Furthermore, an edge guide device for guiding the coating liquid flowing down from the DF head to the center side can be provided.

In the single wafer DF testing machine according to the present invention, a guide mechanism that guides the sample plate with the substrate attached to the transport plate from the upstream side to the downstream side, and the upstream side of the guide mechanism, the sample plate is located downstream. A shoot pulley that accelerates toward the side, and a brake mechanism that is positioned downstream of the shoot pulley and decelerates or stops the sample plate that has passed through the curtain film. Leaf paper can be used as a substrate. As a result, it is not necessary to use long test paper, and a multi-level / small lot test can be performed, thereby reducing the cost required for the test.

In addition, by accelerating the sample plate with a chute pulley, the substrate can be passed through the curtain film at the speed of paper feed when coating with an actual machine, and the coating was performed under almost the same conditions as the actual machine. State test results can be obtained. Furthermore, since the brake mechanism is provided, the accelerated sample plate can be surely decelerated or stopped. As a result, the distance required for acceleration / deceleration can be minimized, and the overall length of the single-wafer DF testing machine 1 can be suppressed to the minimum necessary length.

It is a schematic diagram of the single wafer DF testing machine concerning the present invention. It is the perspective view which looked at the chute pulley from the upstream side, Comprising: It is a figure which shows the state which put the sample board. It is an enlarged view of a chute pulley, and is a perspective view showing portions of an upper roller and a lower roller. It is a schematic diagram which shows a curtain stopper apparatus, Comprising: (a) is the state in coating standby, (b) shows the state in coating. It is a schematic diagram which shows an edge guide apparatus, Comprising: (a) is the state in coating standby, (b) shows the state in coating. It is a schematic diagram which shows the state which operated the brake mechanism. It is a schematic diagram which shows the state which open | released the brake mechanism.

DESCRIPTION OF SYMBOLS 1 Single wafer DF testing machine 3 Base 10 Curtain coater device 11 Paint supply cylinder 12 DF head 12a Lip part 13 Curtain film 14 Air cut device 15 Plate-like member 16 Curtain stopper device 17 Air cylinder 17a Telescopic rod 18 Rotating fulcrum 19 Stopper 20 Sample plate guide mechanism 21 Sample plate guide portion 21a Guide groove 22 Upper plate 23 Lower plate 24 Side plate 30 Chute pulley 31 Upper roller 32 Lower roller 33 Rotating shaft 34 Drive shaft 35 V belt 36 Drive device 40 Brake mechanism 41 Brake plate 41a Upstream End 41b Downstream end 42 Link mechanism 42a Upper link plate 42b Lower link plate 43 Air cylinder 43a Rod 44 Hinge 45 Support base 50

Controller

51, 52, 53, 54 Wiring 60 Dryer 70 Sample plate discharge unit 80 samples plate 81 base material 82 conveyed plate 82a side portions 90 edge guide device 91 the air cylinder 91a telescopic rod 92 the edge guide plates 92a guide surface

Hereinafter, a single wafer DF testing machine according to an embodiment of the present invention will be described in detail with reference to FIGS. In the following description, descriptions in the vertical direction, the horizontal direction, and the depth direction (width direction of the single wafer DF tester 1) are based on FIG. Further, the upstream side refers to the left side in FIG. 1, and the downstream side refers to the right side in FIG.

The sheet-fed DF testing machine 1 includes a curtain coater device 10 located at the center in FIG. 1 and a sample plate guide mechanism 20 located below the curtain coater device 10 and extending to the left and right in FIG. A chute pulley 30 located on the left side (upstream side) of the curtain coater device 10, a brake mechanism 40 located on the right side (downstream side) of the curtain coater device 10, and a further downstream side of the brake mechanism 40. And a dryer 60 to be used. These

mechanisms

10, 20, 30, 40, 60 are respectively mounted on the gantry 3 constituting the lower part of the single wafer DF testing machine 1.

Further, these

mechanisms

10, 30, 40, 60 are electrically connected to the control device 50 by

wirings

51, 52, 53, 54, and a power source for power and a control signal are transmitted from the control device 50 to each mechanism. To be sent to.

As shown in FIG. 1, a sample plate 80 is supplied to the single-wafer DF testing machine 1 from the left end, which is the upstream side. In this sample plate 80, a base material 81 on which a coating film is to be formed is attached on a transport plate 82. The transport plate 82 is formed of an aluminum plate having a certain degree of rigidity. The base material 81 is a cut sheet having a size of about A4 size, for example. On the transport plate 82, the base material 81 can be freely arranged except for both side portions 82a (both side portions in the depth direction of the paper in FIG. 1). The both side portions 82a come into contact with respective portions of the sample plate guide mechanism 20, the chute pulley 30, and the brake mechanism 40, which will be described in detail later.

The sample plate 80 is supplied from the upstream side of the single wafer DF testing machine 1, guided by the sample plate guide mechanism 20, and discharged from the sample plate discharge portion 70 located on the downstream side.

The curtain coater apparatus 10 includes a paint supply cylinder 11 and a DF head 12 that is disposed below the paint supply cylinder 11 and extends in the paper surface depth direction (width direction of the sheet DF tester 1) in FIG. I have. The length in the width direction of the DF head 12 is configured to be longer than the length in the width direction of the base material 81 described above so that the entire surface of the base material 81 can be coated. Even when the width of the base material 81 is longer than the width of the DF head 12, the coating can be applied to the central portion of the base material 81.

In this curtain coater apparatus 10, after the paint supplied in the paint supply cylinder 11 is defoamed by a defoaming machine (not shown), it is smoothly guided to the DF head 12 without staying. The flow of the paint is uniformly rectified in the width direction by the nozzle portion 12a located at the lower end of the DF head 12, and flows out from the tip of the nozzle portion 12a to form the curtain film 13 having a uniform and stable flow rate.

The curtain film 13 is stretched at the same speed in the direction in which the base material 81 is fed at the moment when it hits the base material 81 of the sample plate 80, and is uniformly coated on the base material 81. Since all the coating material supplied on the base material 81 is applied, the coating amount can be adjusted with high accuracy by adjusting the supply amount of the coating material.

The paint sent from the paint supply cylinder 11 to the DF head 12 is sent out by a piston pump (not shown). The feed rate of the piston pump can be arbitrarily set by the control device 50 described above, and the paint supply amount can be controlled. Thereby, the waste of the paint used for the test is reduced by controlling to form the curtain film 13 only during the test.

Further, an air cut device 14 is provided on the upstream side of the curtain coater device 10 and in the vicinity of the curtain film 13. The air cut device 14 is for reducing the amount of entrained air that is brought about when the sample plate 80 fed at a high speed passes through the curtain film 13. The air cut device 14 includes a plate-like member 15 that comes into contact with the upper surface of the sample plate 80 that is sent. The plate-like member 15 is provided over the entire width direction of the single-wafer DF testing machine 1 and is inclined obliquely downward toward the traveling direction of the sample plate 80 as shown in FIG. It is attached. Thereby, the entrained air brought about by the travel of the sample plate 80 is guided obliquely upward and upward by the plate-like member 15, and the amount of the entrained air that enters the curtain film 13 together with the sample plate 80 is reduced. This prevents coating defects caused by

The plate-like member 15 may have a brush shape, and the brush portion may come into contact with the upper surface of the sample plate 80 to reduce the amount of entrained air. This can also prevent coating defects.

In addition to the contact-type air cut device 14 described above, a non-contact type air-cut device can also be used. For example, air may be blown in the direction opposite to the traveling direction of the sample plate 80 sent at high speed, and the amount of entrained air may be reduced by this air pressure. Thus, if it is a non-contact type, since a gap (non-contact) of about 1 to 5 mm can be opened between the air cut device and the sample plate 80, the upper surface of the sample plate 80 is not damaged. .

Furthermore, a curtain stopper device 16 is provided in the vicinity of the downstream side of the curtain coater device 10 as shown in FIGS. 4 (a) and 4 (b). The curtain stopper device 16 is for opening and closing the lip tip portion 12 a located at the lower end of the DF head 12. That is, in the single wafer DF testing machine 1, only when the sample plate 80 passes, the curtain stopper device 16 is operated in an open state, and the paint is pushed out from the piston pump previously filled with the paint, thereby the curtain film 13. By forming, intermittent operation of coating becomes possible, and coating can be performed with a small amount of paint.

The curtain stopper device 16 includes an air cylinder 17 and a stopper 19 rotatably connected to the tip of the telescopic rod 17a of the air cylinder 17. The stopper 19 is rotatable about the rotation fulcrum 18.

With this configuration, as shown in FIG. 4A, the stopper 19 covers the lip tip 12a of the DF head 12 from below when the telescopic rod 17a of the air cylinder 17 projects (see FIG. 4A). Waiting for coating). On the other hand, as shown in FIG. 4B, the stopper 19 rotates counterclockwise around the rotation fulcrum 18 and does not cover the lip tip 12a (see FIG. 4B). The lower side of the DF head 12 is opened) (during coating).

Note that the curtain stopper device 16 is connected to the control device 50 described above by wiring (not shown), and a power source for power and a control signal are sent from the control device 50 to each mechanism.

Also, edge guide devices 90 are provided on both sides of the curtain coater device 10 (both sides in the depth direction of FIG. 1). The edge guide device 90 is intended to stabilize the edge portion of the curtain film 13 and to easily form the curtain film 13 by bringing the end of the curtain film 13 to the center from both sides. For example, when the flow rate of the paint from the DF head 12 is about 5 liters / minute or less, the uniform curtain film 13 is not formed, but is in an interdigital state (a state where a gap is opened in the coating liquid to be dropped, or the paint is not used). Although the liquid drops in a uniform state, by using the edge guide device 90, the uniform curtain film 13 can be easily formed. As a result, the coating can be performed even at a low flow rate with a small supply amount of the coating liquid, so that the coating can be performed with a small amount of paint.

As shown in FIGS. 5A and 5B, the edge guide device 90 is attached to an air cylinder 91 attached with a slight inclination, and a distal end portion of the telescopic rod 91 a of the air cylinder 91. And an edge guide plate 92. The edge guide plate 92 linearly moves in a tilted upper side while the telescopic rod 91a expands and contracts. In addition, the edge guide plate 92 is in contact with the side portion of the curtain film 13 to form a guide surface 92a for guiding the coating liquid.

As shown in FIG. 5A, the edge guide plate 92 is retracted to the side of the DF header 12 when the telescopic rod 91a is pulled (waiting for coating). In order to avoid interference with the stopper 19 of the curtain stopper device 16 described above (the state where the lower side of the DF header 12 is covered during standby), the curtain stopper device 16 is retracted laterally. On the other hand, as shown in FIG. 5B, the edge guide plate 92 is positioned below the side portion of the DF head 12 in the state where the telescopic rod 91a protrudes (during coating). In this state, the guide surface 92a is an inclined surface that inclines from the side toward the central oblique lower side. As a result, the coating liquid that flows down from the DF head 12 is guided in the center obliquely downward direction by the guide surface 92a of the edge guide plate 92, the length in the width direction of the curtain film 13 is regulated, and the curtain film 13 A more uniform and stable film can be obtained.

Note that the edge guide device 90 is connected to the control device 50 described above by wiring (not shown), and a power source for power and a control signal are sent from the control device 50 to each mechanism.

As shown in FIG. 2, the sample plate guide mechanism 20 is composed of sample

plate guide portions

21 and 21 arranged in parallel with a gap in the width direction of the single-wafer DF testing machine 1. As shown in FIG. 1, the sample

plate guide portions

21 and 21 continuously extend from the upstream side to the downstream side of the single wafer DF testing machine 1, and as shown in FIG. It is symmetrical in the width direction across the central axis in the feeding direction.

The sample

plate guide portions

21 and 21 are constituted by an upper plate 22 and a lower plate 23, and a guide groove 21a is formed between the upper plate 22 and the lower plate 23. This guide groove 21a sandwiches both side portions 82a of the transport plate 82 of the sample plate 80 up and down. Moreover, the sample

plate guide parts

21 and 21 are provided with the side plate 24 which regulates the position in the width direction of the both side parts 82a. That is, the

guide grooves

21 a and 21 a are substantially U-shaped in the cross section of the sample guide portion 21. The U-shape restricts the position of the sample plate 80 in the vertical direction and the width direction. By sandwiching the sample plate 80 in the guide groove 21a, the sample plate 80 extends along the extending direction of the sample plate guide 21. And move smoothly.

The chute pulley 30 includes an upper roller 31 and a lower roller 32 as shown in FIGS.

The upper roller 31 is attached to a rotary shaft 33 extending in the width direction, and two upper rollers 31 are provided at both ends of the rotary shaft 33 in the width direction. Similarly, the lower roller 32 is attached to a drive shaft 34 extending in the width direction, and two lower shafts 32 are provided at both ends in the width direction of the drive shaft 34 with a space therebetween.

The intervals in the width direction of these two upper rollers 31 and lower rollers 32 are the same. As shown in FIG. 2, the upper roller 31 and the lower roller 32 come into contact with the upper surface and the lower surface of both side portions 82 a of the conveyance plate 82 of the sample plate 80, respectively.

The both ends of the drive shaft 34 described above are rotatably supported. The drive shaft 34 is wound around a drive device 33 and a V-belt 35 installed in the gantry 3, and rotates by obtaining a drive force from the drive device 36.

On the other hand, both ends of the rotating shaft 33 are also rotatably supported. The rotation shaft 33 is driven with respect to the drive shaft 34, presses the sample plate 80 downward, and rotates following the movement of the sample plate 80.

As a result, when the sample plate 80 enters between the upper roller 31 and the lower roller 32, the upper roller 31 rotates in synchronization with the driving rotation of the lower roller 32 to accelerate the sample plate 80. .

In addition, the drive device 36 can control the rotation speed by an inverter device arranged in the control device 50, whereby the rotation speed of the lower roller 32 can be variably adjusted. .

With these structures, the sample plate 80 sent to the chute pulley 30 is sandwiched between the upper roller 31 and the lower roller 32, and receives the driving force from the lower roller 32 to be sent out at a maximum speed of 1200 m / min. Can be done.

The sample plate 80 accelerated by the chute pulley 30 passes through the curtain film 13 formed by the curtain coater device 10, and coating is performed. The coated sample plate 80 is sent to the brake mechanism 40 located downstream of the curtain coater 10 at the same speed.

As shown in FIGS. 6 and 7, the brake mechanism 40 includes a brake plate 41, a link mechanism 42 that swings and moves the brake plate 41 up and down, and an air cylinder 43 that is a drive source.

The brake plate 41 is provided in such a manner that the upper plate 22 constituting the sample plate guide portion 21 is extended. The end 41a on the upstream side of the brake plate 41 is attached via the upper plate 22 and a hinge 44, and the downstream side of the brake plate 41 can swing up and down. The downstream end 41 b of the brake plate 41 is supported by the link mechanism 42.

The link mechanism 42 includes an upper link plate 42a and a lower link plate 42b. One end of the upper link plate 42a is connected to the tip of a rod 43a that expands and contracts from the air cylinder 43 toward the downstream side, and the other end is fixed to the main body side of the single wafer DF testing machine 1. The support base 45 is connected. One end of the lower link plate 42b is connected to the tip of the rod 43a, and the other end is rotatably attached to the downstream end of the brake plate 41.

In the state where the air cylinder 43 is operated and the rod 43a protrudes to the downstream side (see FIG. 6), the brake mechanism 40 is in a posture in which the lower link plate 42b stands substantially vertically, and downstream of the brake plate 41. This acts to push down the end portion 41b. As a result, the end 41b on the downstream side of the brake plate 41 moves downward with the hinge 44 as a rotation fulcrum, and narrows the gap (guide groove 21a) between the brake plate 41 and the lower plate 23 of the sample plate guide portion 21. It becomes like this. As a result, the brake plate 41 comes into contact with both side portions 82a of the sample plate 80 that is sent, and acts to decelerate or stop the sample plate 80 that is sent at high speed.

On the other hand, when the rod 43a is pulled upstream (see FIG. 7), the brake mechanism 40 acts so that the lower link plate 42b is inclined and the downstream end 41b of the brake plate 41 is pulled upward. To do. As a result, a gap (guide groove 21a) between the brake plate 41 and the lower plate 23 is secured, and the brake mechanism 40 is in a state in which the brake is released.

The sample plate 80 braked by the brake mechanism 40 is sent to the dryer 60 located on the downstream side at a predetermined speed. The dryer 60 is for drying the coating film applied to the equipment 81. The sample plate 80 dried by the dryer 60 is then discharged from the sample plate discharge portion 70 located further downstream of the dryer 60.

The above-described series of steps of acceleration, coating, deceleration, drying, and discharging of the sample plate 80 is automatically performed based on a signal from the control device 50. For example, by programming the speed condition to the control device 50, the number of rotations of the lower roller 32, coating, deceleration, etc. are programmed so as to be performed at the optimum timing.

According to the single wafer DF testing machine 1 according to the embodiment of the present invention, a coating material for coating is supplied in the form of a curtain film 13, and a substrate 81 for forming a coating film is passed through the curtain film 13 for testing. In order to form a coating film, the sample plate 80 with the substrate 81 attached to the transport plate 82 is guided from the upstream side to the downstream side, and the sample plate 80 is positioned upstream of the guide mechanism 20. A4 is provided with a chute pulley 30 that accelerates and moves the sample plate 80 toward the downstream side, and a brake mechanism 40 that is located downstream of the chute pulley 30 and decelerates or stops the sample plate 80 that has passed through the curtain film 13. A sheet of size or the like can be used as the base material 81. As a result, it is not necessary to use long test paper, and a multi-level / small lot test can be performed, thereby reducing the cost required for the test.

Further, by accelerating the sample plate 80 with the chute pulley 30, the base material 81 can be passed through the curtain film 13 at the speed of paper feed when coating with the actual machine, and the conditions are almost the same as the coating conditions of the actual machine. It is possible to obtain the test results in the state where the coating is applied. Furthermore, since the brake mechanism 40 is provided, the accelerated sample plate 80 can be surely decelerated or stopped. As a result, the distance required for acceleration / deceleration can be minimized, and the overall length of the single-wafer DF testing machine 1 can be suppressed to the minimum necessary length.

In addition, the chute pulley 30 includes an upper roller 31 and a lower roller 32 that is rotationally driven, and the upper and

lower rollers

31 and 32 sandwich and accelerate the conveyance plate 82 up and down. Thus, the sample plate 80 can be accelerated to a predetermined speed.

Further, since the sample plate 80 is composed of a transport plate 81 and a base material 82 for forming a coating film, and the base material 82 is not attached to both side portions 82a of the transport plate 82, the both side portions 82a The sample plate guide mechanism 20, the

rollers

31 and 32 of the chute pulley 30, and the brake mechanism 40 can be brought into contact with each other. Thereby, these

mechanisms

20, 30, and 40 for accelerating and braking the sample plate 80 can be configured with a simple structure.

Furthermore, the brake mechanism 40 includes a brake plate 41 that can be moved up and down by the link mechanism 42, and the sample plate 80 is decelerated or stopped by pressing the transport plate 82 with the brake plate 41, so that the structure is simple. The sample plate 80 can be braked.

In addition, since the end 41a on the upstream side of the brake plate 41 is attached to the upper plate 22 via the hinge 44, the end 41b on the downstream side of the brake plate 41 can be easily swung up and down, The brake plate 41 and the sample plate 80 can be brought into contact with each other with a simple structure. Further, the link mechanism 42 that swings the downstream end portion 41b can also be configured easily.

Furthermore, since the dryer 60 for drying the coating film is provided on the downstream side of the brake mechanism 40, the sample plate 80 can be sent to the dryer 60 at a low speed. Therefore, a necessary drying time can be ensured.

Further, since the chute pulley 30 and the brake mechanism 40 are controlled so as to automatically operate based on the signal from the control device 50, the coating test can be performed by automatic control. In particular, in the present embodiment, the curtain coater device 10, the chute pulley 30, the brake mechanism 40, and the dryer 60 can be automatically controlled based on a signal from the control device 50. Can be performed by automatic control.

On the other hand, the air cut device 14 is provided on the upstream side of the curtain film 13 to reduce the amount of entrained air brought about by the sample plate 80 traveling at high speed. Less paint is repelled. As a result, coating defects caused by entrained air can be prevented.

In addition, since the curtain stopper device 16 that covers the lip tip 12a located at the lower end of the DF head 12 during coating standby and opens the lower side of the DF head 12 during coating is provided, the sample plate The curtain film 13 can be formed only when 80 is running (during coating). Therefore, the amount of paint to be used can be reduced without flowing paint during the coating standby. As a result, the cost required for the test can be reduced.

Further, since the edge guide device 90 for guiding the coating liquid flowing down from the DF head 12 to the center side is provided, there is a possibility that even if a small amount of the coating liquid is flowed down, the liquid droplets may drop in a comb shape. Therefore, a stable and uniform curtain film 13 can be formed. Therefore, the amount of paint used can be reduced, and as a result, the cost required for the test can be reduced.

The single wafer DF testing machine according to the embodiment of the present invention has been described above, but the present invention is not limited to the above-described embodiment, and various modifications and changes can be made based on the technical idea of the present invention. Is possible.

For example, in the present embodiment, the brake plate 41 is arranged so as to extend the upper plate 22 and is movable toward the lower plate 23 side, but may have a reverse structure. . That is, the brake plate 41 can be arranged so as to extend the lower plate 23 and can be moved toward the upper plate 22 side by a link mechanism. Even with this structure, the brake mechanism can be configured with a simple structure.

In addition, although the control device 50 has been described separately from the single wafer DF testing machine 1, a control device portion necessary for the test can be incorporated into the single wafer DF testing machine 1 to be configured integrally.

Furthermore, in this embodiment, the lower roller 32 of the chute pulley 30 is a drive roller and the upper roller 31 is a driven roller, but the upper roller 31 may be a drive roller.

In this embodiment, the curtain stopper device 16 and the edge guide device 90 are provided, but only one of them may be provided. For example, when intermittent operation is not performed in the coating process, the single wafer DF testing machine can be configured without providing the curtain stopper device 16. In this case, the edge guide plate 92 of the edge guide device 90 is configured to be movable in order to avoid interference with the stopper 19 of the curtain stopper device 16, but when the curtain stopper device 16 is not provided, the edge guide plate 92 The plate 92 may be fixed without moving.

Claims

A sheet-fed DF testing machine for supplying a coating material for coating in the form of a curtain film, passing a base material for forming a coating film through the curtain film to form a coating film on a test basis,
A guide mechanism for guiding the sample plate with the substrate attached to the transport plate from the upstream side to the downstream side;
A chute pulley that is positioned upstream of the guide mechanism and that accelerates the sample plate toward the downstream side;
A single wafer DF testing machine comprising a brake mechanism that is positioned downstream of the chute pulley and decelerates or stops the sample plate that has passed through the curtain film.
The single wafer DF testing machine according to claim 1, wherein the chute pulley includes an upper roller and a lower roller, and the upper and lower rollers sandwich the transport plate up and down for acceleration.
2. The single wafer DF according to claim 1, wherein the brake mechanism includes a brake plate movable up and down by a link mechanism, and the sample plate is decelerated or stopped by pressing the transport plate with the brake plate. testing machine.
The single wafer DF testing machine according to any one of claims 1 to 3, further comprising a dryer for drying the coating film on a downstream side of the brake mechanism.
The sheet according to any one of claims 1 to 4, wherein the chute pulley and the brake mechanism are controlled to automatically operate based on a signal from a control device. Leaf DF testing machine.
6. The air cut device according to claim 1, wherein an air cut device is provided on an upstream side of the curtain film to reduce an amount of entrained air brought about by the traveling sample plate. Single wafer DF testing machine.
A curtain stopper device is provided that has a DF head for forming the curtain film, covers the lower side of the DF head during coating standby, and opens the lower side of the DF head during coating. The single wafer DF testing machine according to any one of claims 1 to 6, wherein the single wafer DF testing machine is provided.
The single-wafer DF testing machine according to any one of claims 1 to 7, further comprising an edge guide device that guides the coating liquid flowing down from the DF head to the center side.