WO2011018466A1 - Process for the manufacture of sevoflurane - Google Patents

Process for the manufacture of sevoflurane Download PDF

Info

Publication number
WO2011018466A1
WO2011018466A1 PCT/EP2010/061645 EP2010061645W WO2011018466A1 WO 2011018466 A1 WO2011018466 A1 WO 2011018466A1 EP 2010061645 W EP2010061645 W EP 2010061645W WO 2011018466 A1 WO2011018466 A1 WO 2011018466A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
och
substituted
halogen atom
equal
Prior art date
Application number
PCT/EP2010/061645
Other languages
French (fr)
Inventor
Max Braun
Original Assignee
Solvay Fluor Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solvay Fluor Gmbh filed Critical Solvay Fluor Gmbh
Priority to EP10739653A priority Critical patent/EP2464619A1/en
Priority to JP2012524225A priority patent/JP2013501750A/en
Priority to US13/389,449 priority patent/US8987524B2/en
Priority to CN2010800404931A priority patent/CN102498085A/en
Priority to CA2769797A priority patent/CA2769797A1/en
Publication of WO2011018466A1 publication Critical patent/WO2011018466A1/en
Priority to IN972DEN2012 priority patent/IN2012DN00972A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
    • C07C41/01—Preparation of ethers
    • C07C41/18—Preparation of ethers by reactions not forming ether-oxygen bonds
    • C07C41/22—Preparation of ethers by reactions not forming ether-oxygen bonds by introduction of halogens; by substitution of halogen atoms by other halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/15—Preparation of carboxylic acids or their salts, halides or anhydrides by reaction of organic compounds with carbon dioxide, e.g. Kolbe-Schmitt synthesis
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/235—Saturated compounds containing more than one carboxyl group
    • C07C59/305—Saturated compounds containing more than one carboxyl group containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/235—Saturated compounds containing more than one carboxyl group
    • C07C59/305—Saturated compounds containing more than one carboxyl group containing ether groups, groups, groups, or groups
    • C07C59/315—Saturated compounds containing more than one carboxyl group containing ether groups, groups, groups, or groups containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/31—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by introduction of functional groups containing oxygen only in singly bound form

Definitions

  • the present invention relates to a process for preparing Sevoflurane, CF 3 - CH(OCH 2 F)-CF 3 . It also relates to certain substituted malonic acid derivative compounds, to a process for the synthesis of said substituted malonic acid derivative compounds and to the use of said substituted malonic acid derivative compounds as a synthetic intermediate in different reactions, in particular in the synthesis of Sevoflurane.
  • Sevoflurane is an important volatile anesthetic agent particularly suited for administration to patients during outpatient surgery. Sevoflurane is known to provide patients with a rapid rate of recovery from the anesthesia.
  • An additional advantage of this anesthetic agent is that it can be used as an induction agent since it is not pungent and allows a rapid and smooth induction without breath holding or laryngospasm as may occur with other inhalation agents. A smooth uneventful induction is especially valuable for pediatric anesthesia where the use of intravenous induction agents can result in numerous problems and is often contraindicated.
  • the total manufacturing cost is mainly based on the material cost for HFIP which is expensive.
  • WO 2004/065340 discloses a process for the purification of crude Sevoflurane which had been produced by reacting HFIP, formaldehyde and hydrogen fluoride (HF).
  • HF formaldehyde
  • Other more complicated methods of Sevoflurane synthesis are described in U.S. Pat. No. 5,969,193 and U.S. Pat. No. 6,100,434 wherein said methods avoid this difficult Sevoflurane/HFPI separation.
  • the invention consequently relates to a process for the manufacture of Sevoflurane, CF 3 -CH(OCH 2 F)-CF 3 , which comprises fiuorination of a substituted malonic acid derivative of formula (I) or (II):
  • - X is OH or a leaving group which can be substituted by nucleophilic
  • substitution and which is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
  • R 2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • aryl group refers to an aromatic ring group such as phenyl and napthyl, and phenyl and napthyl substituted by at least 1 halogen atom.
  • aralkyl group refers to an aromatic ring group substituted with alkyl groups such as tolyl, biphenylyl, etc.
  • the process according to the invention makes it possible that the purification of Sevoflurane can be simplified, loss of material and need for disposal of by-products can be reduced and production time can be reduced.
  • R 1 , R 2 , R 3 and R 4 equal to or different from each other, are often independently selected from H, a C1-C4 alkyl group, optionally substituted by at least 1 halogen atom, an aryl group, for example, phenyl.
  • Ri, R 2 , R 3 and R 4 equal to or different from each other, are independently from each other H, a linear or branched C1-C4 alkyl group optionally substituted by at least 1 halogen atom, and particularly preferably R 1 , R 2 , R 3 and R 4 are independently from each other H, methyl, ethyl, n-propyl or isopropyl each optionally substituted by at least 1 halogen atom, very preferably H, a methyl or an ethyl group each optionally substituted by at least 1 halogen atom.
  • R j , R2 are H.
  • X is preferably selected from bromine, chlorine, iodine, OH, OTos or OTMS; more preferably X is chlorine or OH, most preferably X is chlorine or fluorine.
  • R j , R2 are H and X is OH.
  • R j , R2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH 2 Cl)-COOH and HOOC-CH (OCH 2 F)-COOH.
  • R j and R 2 are an ethyl group and X is chlorine or fluorine, and the compounds of formula (I) are EtOOC-CH (OCH 2 Cl)-COOEt and EtOOC-CH (OCH 2 F)-COOEt.
  • reaction is performed in the liquid phase.
  • the fluorination is generally carried out with fluorinating agents.
  • Said fiuorinating agents preferably allow fluorinating a halogen, a hydroxyl group, a carboxyl group and other oxygen containing functional groups, in particular substituting carbon-oxygen functionality with carbon-fluorine groups.
  • Typical examples of said fluorinating agents are for example SF4 (sulfur tetrafluoride); diethylaminosulfur trifluoride (DAST), dimethylaminosulfur trifluoride (DMAST) and bis (2- methoxyethyl)aminosulfur trifluoride (Deoxofluor).
  • SF 4 is most preferred as fluorinating agent.
  • the production of SF 4 can be realized according to the procedure described in the GB Pat. No. 1374054.
  • the fluorination with SF 4 is carried out in the presence of anhydrous HF.
  • HF is often used in an amount of about 1 to about 1000 moles, and preferably about 1 to about 500 moles, per mole of SF 4 .
  • the fluorination can be carried out in the presence of a solvent.
  • the solvent to be used may also, for example, be an aromatic hydrocarbon such as benzene, toluene or xylene, an aliphatic hydrocarbon such as pentane or hexane; a halogenated hydrocarbon such as methylene chloride, chloroform, ethylene dichloride,
  • hydrofluorocarbons e.g. 1,1,1,3,3-pentafluorobutane (Solkane®365 mfc) or perfluorocarbons, e.g. perfluorocyclohexane; or an ether such as diethyl ether, dibutyl ether or tetrahydrofuran.
  • the halogenated hydrocarbons are preferred. Methylene chloride is most preferred.
  • solvents may be used alone or in combination as a mixture. If appropriate, the solvent is used usually in an amount of from 50 to 99 % by weight, preferably from 60 to 99 % by weight, more preferably from 75 to 99% by weight of the solvent relative to the total weight of the reaction medium.
  • reaction mixture is a liquid under the reaction conditions, a solvent is not needed. If desired, starting compounds or reaction products could be used as solvent. Particularly preferred is the use of Sevoflurane as solvent. Preferably, if Sevoflurane is used as a solvent, it is present in the reaction mixture from the start.
  • the pressure and the temperature are selected as such that the reaction mixture remains in the liquid phase.
  • the process according to the present invention generally comprises carrying out the fluorination at a temperature equal to or higher than 30 0 C, preferably equal to or higher than 40°, more preferably equal to or higher than 50 0 C. It is generally carried out at a temperature equal to or lower than 90 0 C, preferably at a temperature equal to or lower than 80 0 C, more preferably a temperature equal to or lower than 7O 0 C. A temperature ranging from 50 to 70 0 C is most preferred.
  • the process according to the present invention generally comprises carrying out the fluorination under pressure.
  • the pressure of the fluorination is advantageously equal to or greater than about 5 bar (abs), preferably about 10 bar (abs) to equal to or less than about 25 bar (abs).
  • the transformation of 1 C(O) group to a CF2 group consumes one molecule of SF4.
  • the transformation of a C-ORj or C-OR2 group to a C-F group consumes half a molecule of SF 4 , as well as the transformation of a OCH 2 X group to form a OCH 2 F group.
  • the range of the molar ratio of substituted malonic acid derivative to SF 4 preferably is from 1:3 to 1:5 , and particularly preferably from 1:3,5 to 1:4.5.
  • the fluorination can be carried out in 2 or even 3 steps.
  • any hydroxyl groups are transformed.
  • the other groups e.g. the carbonyl groups, are transformed.
  • the first step often is performed at a lower temperature range, e.g. at - 8O 0 C to 0 0 C.
  • the second step is preferably performed at the temperature given above.
  • the invention also relates to the manufacture of a substituted malonic acid derivative of formula (I) or (II):
  • the manufacture can principally be performed in two alternatives: according to one embodiment, the synthesis is performed with an O-nucleophile, and according to another embodiment, the synthesis is performed with a CH 2 - electrophile.
  • the invention relates to a process for the manufacture of a substituted malonic acid derivative of formula (I) or (II):
  • - X is OH or a leaving group which can be substituted by nucleophilic
  • Said leaving group is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS
  • R 2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; by reaction of a malonic acid derivative of formula (III) or (IV):
  • Y is a leaving group which can be substituted by nucleophilic substitution.
  • Y is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS,
  • R 1 , R 2 , R 3 and R 4 are as defined above,
  • O-nucleopliiles are fo ⁇ naldehyde and formaldehyde derivatives.
  • Fo ⁇ naldehyde and formaldehyde derivatives are preferred O-nucleophiles.
  • formaldehyde derivative refers to a class of molecules which are formed from fo ⁇ naldehyde by polymerization, trimerisation or addition reactions such as paraformaldehyde, trioxane, hydrated formaldehyde, hemiacetalic structures of formaldehyde of formula (V): HO-CH 2 -X wherein X is a leaving group which can be substituted by nucleophilic substitution and which is preferably selected from halogens or oxygen containing functional groups.
  • Typical examples of said hemiacetalic compounds are for instance HO-CH 2 -OToS and HO-CH 2 OTMS.
  • the parafo ⁇ naldehyde or trioxane is cracked, e.g. the ⁇ rially or chemically, to form the monomeric formaldehyde.
  • the process according to the present invention generally comprises carrying out the reaction with the O-nucleophile in the presence of a solvent.
  • the solvent to be used may, for example, be a polar solvent such as dimethyl formamide, dimethyl acetamide, dimethylsulfoxide, sulfolane, Sevoflurane, tetrahydrofuran, acetonitrile, dioxane, a halogenated hydrocarbon such as methylene chloride, chlorofomi or ethylene dichloride; or an ether such as diethyl ether, dibutyl ether or tetrahydrofuran.
  • a polar solvent is preferred.
  • dimethyl formamide, sulfolane or Sevoflurane is dimethyl formamide, sulfolane or Sevoflurane.
  • solvents may be used alone or in combination as a mixture. If appropriate, the solvent is used usually in an amount of from 50 to 99 by weight, preferably from 60 to 99 % by weight, more preferably from 75 to 99% by weight of the solvent relative to the total weight of the reaction medium.
  • the reaction with the O-nucleophile optionally may be carried out in the presence of a base.
  • a base may be an inorganic base or an organic base.
  • the inorganic base may be selected from the group consisting of alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, lithium hydroxide, cesium hydroxide, alkaline earth metal hydroxides such as calcium hydroxide, barium hydroxide, magnesium hydroxide, strontium hydroxide, and basic alkali metal salts such as sodium carbonate, sodium hydrogencarbonate, potassium carbonate and potassium hydrogencarbonate.
  • alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, lithium hydroxide, cesium hydroxide
  • alkaline earth metal hydroxides such as calcium hydroxide, barium hydroxide, magnesium hydroxide, strontium hydroxide
  • basic alkali metal salts such as sodium carbonate, sodium hydrogencarbonate, potassium carbonate and potassium hydrogencarbonate.
  • Preferred bases are sodium hydroxide and
  • the organic base may be selected from the group consisting of nitrogen-containing heterocyclic compounds such as pyridine, quinoline or picoline; and tertiary bases such as triethylamine, dimethylaniline, diethylaniline and 4-dimethylaminopyridine. Among them, pyridine, triethylamine, dimethylaniline, diethylaniline and 4-dimethylaminopyridine are preferred. Among them, pyridine is particularly preferred. These bases may be used alone or in combination as a mixture.
  • the base can be applied in the form of an aqueous solution or a solution of the base in water and an organic solvent.
  • the organic solvent is in particular a solvent as described above.
  • aqueous solution refers to solutions of water soluble compounds in water, for example salt water or any other aqueous mineral salt solution.
  • the molar ratio of the base to O-nucleophile is advantageously from 0.5:1 to 2:1, preferably from 0.7:1 to 1.5:1, and more preferably from 0.8:1 to 1.2:1. Most preferably, the molar ratio is about 1.
  • the present invention concerns a process for the manufacture of a hydroxyl substituted malonic acid derivative of formula (VI) or (VII):
  • Ri, R 2 R 3 and R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms optionally substituted by at least one halogen atom, an aralkyl group or an aryl group, comprising the reaction of a hydroxyl malonic acid derivative of formula (VIII) or (IX): R 1 OOC-CH(OH)-COOR 2 (VIII) or R 3 HNOC-CH (OH)-CONHR 4 (IX) wherein R 1 , R 2 R 3 and R 4 are as defined above, with a CH ⁇ electrophile.
  • Formaldehyde is most preferred CH2-electrophile.
  • the hydroxyl malonic acid derivative of formula (VI) or (VII): R, 0OC-CH(OCH 2 OH)-COOR 2 (VI) or R 3 HNOC-CH (OCH 2 OH)-CONHR 4 (VII) can be converted to the substituted malonic acid derivative of formula (I) or (II):
  • the conversion can be realized by reaction of said hydroxyl substituted malonic acid derivative with PCl 3 , PCl 5 , TosOH, MesOH or amine-nHCl like PyHCl.
  • the present invention concerns a process for the manufacture of a substituted malonic acid derivative of formula (I) or (II):
  • - X is a leaving group which can be substituted by nucleophilic substitution.
  • Said leaving group is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS
  • R 2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; comprising the reaction of a hydroxyl malonic acid derivative of formula (VIII) or (IX): R, 0OC-CH(OH)-COOR 2 (VIII) Or R 3 HNOC-CH (OH)-CONHR 4 (IX) wherein R 1 , R 2 R 3 and R 4 are as defined above, with a CH 2 -electrophile in the presence of a leaving group transfer agent.
  • leaving group transfer agent refers to a class of compounds that are able to transfer their leaving group to another compound.
  • Typical examples of leaving group transfer agents are for example a chlorinating agent selected from the group consisting of oxalyl chloride, phosphorus trichloride, phosphorus pentachloride or phosphorus oxychloride, a thionyl compound such as thionyl chloride and thionyl fluoride; a sulfuryl compound such as sulfuryl chloride and sulfuryl fluoride; a tosylating agent such as p-toluenesulfonyl chloride (tosyl chloride) and p-toluenesulfonyl fluoride (tosyl fluoride), or a mesylating agent, such as methanesulfonyl chloride (mesyl chloride) and methanesulfonyl fluoride (mesyl)
  • a chlorinating agent selected from
  • Preferred leaving group transfer agents are thionyl and sulfuryl compounds. Most preferred leaving group transfer agents are thionyl compounds. Preferred thionyl compounds are thionyl chloride and thionyl fluoride.
  • the reaction of the hydroxyl malonic acid derivative of formula (VIII) or (IX): R 1 OOC-CH(OH)-COOR 2 (VIII) or R 3 HNOC-CH (OH)-CONHR 4 (IX) wherein R 1 , R 2 R 3 and R 4 are as defined above, with a CH 2 -electrophile in the presence of a leaving group transfer agent may be carried out additionally in the presence of a strong acid.
  • the strong acid may be selected for example from the group consisting of fuming sulfuric acid, fuming nitric acid and hydrogen halides such as in particular hydrogen chloride, hydrogen fluoride.
  • the strong acid is a fuming sulfuric acid.
  • the strong acid is hydrogen chloride or hydrogen fluoride.
  • Rj, R 2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH 2 Cl)-COOH and HOOC-CH (OCH 2 F)-COOH.
  • the invention also relates to a process for the manufacture of Sevoflurane CF 3 -CH(OCH 2 F)-CF 3 which comprises the steps of
  • - X is OH or a leaving group which can be substituted by nucleophilic substitution.
  • Said leaving group is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
  • R 2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; according to the process according to the invention as described above, and
  • the manufacture of Sevoflurane CF 3 -CH(OCH 2 F)-CF 3 comprises the steps of
  • - X is a leaving group which can be substituted by nucleophilic substitution.
  • Said leaving group is selected from halogens, in particular chlorine
  • R 1 , R 2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; according to the most preferred embodiment of the process according to the invention as described above, and
  • R j , R 2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH 2 Cl)-COOH and HOOC-CH (OCH 2 F)-COOH.
  • R j , R2 are an ethyl group and X is chlorine or fluorine, and the compounds of formula (I) are EtOOC-CH
  • the process according to the invention further comprises separating Sevoflurane from the reaction mixture which is obtained in accordance with any of the processes disclosed herein before or a combination thereof, by known methods, e.g. by distillation, precipitation and/or
  • a distillation, in particular a fractional distillation, is preferred as separation technique to separate the Sevoflurane from the reaction mixture from hydrogen fluoride, from unreacted reactants such as the malonic acid derivative and the substituted derivative thereof and unreacted hemiacetalic compounds, from by products such as SOF 2 , alcoholic compounds or alkyl halide byproducts. Typical examples are for instance EtOH or EtCl.
  • the by products may eliminate H2O or HCl and may be separated out of the liquid mixtures as ethylene.
  • the invention also relates to a substituted malonic acid derivative of formula (I) or (II):
  • - X is OH or a leaving group which can be substituted by nucleophilic
  • substitution and which is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
  • R 2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • Preferred substituted malonic acid derivatives are HOOC-CH (OCH 2 Cl)- COOH and HOOC-CH (OCH 2 F)-COOH.
  • the invention also relates to the use of a substituted malonic acid derivative of formula (I) or (II):
  • - X is OH or a leaving group which can be substituted by nucleophilic
  • substitution and which is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
  • R 2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
  • - R 3 , R 4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; as an intermediate for the manufacture of Sevoflurane.
  • HOOC-CH (OCH 2 Cl)-COOH or HOOC-CH (OCH 2 F)-COOH is used.
  • the invention provides a process for the manufacture of Sevoflurane wherein a substituted malonic acid derivative of formula (I) or (II):
  • Ri, R 2, R 3 , R 4 equal to or different from each other, are often independently selected from H, a C1-C4 alkyl group, optionally substituted by at least 1 halogen atom, an aryl group, for example, phenyl.
  • Ri, R 2 , R 3 and R 4 are independently from each other H, a linear or branched C1-C4 alkyl group optionally substituted by at least 1 halogen atom, and particularly preferably Ri, R 2 , R 3 and R 4 are independently from each other H, methyl, ethyl, n-propyl or isopropyl each optionally substituted by at least 1 halogen atom, very preferably H, a methyl or an ethyl group each optionally substituted by at least 1 halogen atom. Most preferably, Ri, R 2 are H.
  • X is preferably selected from bromine, chlorine, iodine, OH, OTos or OTMS; more preferably X is chlorine or OH.
  • R j , R ? are H and X is OH.
  • R j , R 2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH 2 Cl)-COOH and HOOC-CH (OCH 2 F)-COOH.
  • Procedure A Into an ice-cooled suspension of paraformaldehyde (1.82g; 1.2 eq.) and diethyl 2-hydroxymalonate (1Og; 1 eq.) , 5.7 ml (1.75 eq.) thionyl chloride and subsequently, 3.6 ml (1.6 eq.) concentrated sulfuric acid were added drop- wise. After 3 hours, the reaction mixture was added to ice and neutralized with NaHCO 3 . The extraction was performed with diethyl ether, and the resulting solution was dried with Na 2 SO 4 . After removal of the solvent, about 8g of the raw product were obtained.
  • Procedure B Procedure A was repeated but using instead
  • Table 1 shows the influence of different parameters; e.g. purity of the diethyl 2- hydroxymalonate on the selectivity of the reaction, using procedure A.
  • Example 2 is repeated but using instead a liquid medium containing HOOC-CH (OCH 2 OH)-COOH (example 3a) or HOOC-CH (OCH 2 Cl)-COOH (example 3b) dissolved in Solkane®365mfc.
  • the GC analysis shows for both examples 3a and 3b that the product gases contain Sevoflurane.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A process for the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 which comprises (a) manufacturing a substituted malonic acid derivative of formula (I) or (II): R1OOC-CH(OCH2X)-COOR2 (I) or R3HNOC-CH (OCH2X)-CONHR4 (II) wherein X is OH or a leaving group which can be substituted by nucleophilic substitution and R1, R2, R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom,, an aralkyl group or an aryl group, (b) further reacting said malonic acid derivative as intermediate for the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3

Description

Process for the manufacture of Sevoflurane
This application claims priority to EP - 09167529.8 filed on August 10th, 2009, the whole content of this application being incorporated herein by reference for all purposes.
The present invention relates to a process for preparing Sevoflurane, CF3- CH(OCH2F)-CF3. It also relates to certain substituted malonic acid derivative compounds, to a process for the synthesis of said substituted malonic acid derivative compounds and to the use of said substituted malonic acid derivative compounds as a synthetic intermediate in different reactions, in particular in the synthesis of Sevoflurane.
Sevoflurane is an important volatile anesthetic agent particularly suited for administration to patients during outpatient surgery. Sevoflurane is known to provide patients with a rapid rate of recovery from the anesthesia. An additional advantage of this anesthetic agent is that it can be used as an induction agent since it is not pungent and allows a rapid and smooth induction without breath holding or laryngospasm as may occur with other inhalation agents. A smooth uneventful induction is especially valuable for pediatric anesthesia where the use of intravenous induction agents can result in numerous problems and is often contraindicated.
Many of the commercial processes for the preparation of Sevoflurane make use of the chemical intermediate CF3-CH(OH)-CF3 (HFIP), as starting material. In most of these processes, unreacted HFIP may remain in the product mixture. It is known in the art that HFIP is difficult to remove from the crude Sevoflurane product.
The total manufacturing cost is mainly based on the material cost for HFIP which is expensive.
In view of the disadvantages of using HFIP, a process for recovery of HFIP from the waste stream which allows for a more efficient use of HFIP has been described in WO 2004/065340. WO 2009/085247 discloses a process for the purification of crude Sevoflurane which had been produced by reacting HFIP, formaldehyde and hydrogen fluoride (HF). Other more complicated methods of Sevoflurane synthesis are described in U.S. Pat. No. 5,969,193 and U.S. Pat. No. 6,100,434 wherein said methods avoid this difficult Sevoflurane/HFPI separation.
It has now been found a process for the manufacture of Sevoflurane, CF3- CH(OCH2F)-CF3 which allows for improved yield, high efficiency and lower manufacturing cost in particular compared to the known processes whereby HFIP is used as chemical intermediate.
The invention consequently relates to a process for the manufacture of Sevoflurane, CF3-CH(OCH2F)-CF3, which comprises fiuorination of a substituted malonic acid derivative of formula (I) or (II):
R1OOC-CH (OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II)
wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution and which is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
For the purpose of the present invention, the term "aryl group" refers to an aromatic ring group such as phenyl and napthyl, and phenyl and napthyl substituted by at least 1 halogen atom.
For the purpose of the present invention, the term "aralkyl group" refers to an aromatic ring group substituted with alkyl groups such as tolyl, biphenylyl, etc.
Surprisingly, the process according to the invention makes it possible that the purification of Sevoflurane can be simplified, loss of material and need for disposal of by-products can be reduced and production time can be reduced.
Preferably, in the process according to the invention, R1, R2, R3 and R4 equal to or different from each other, are often independently selected from H, a C1-C4 alkyl group, optionally substituted by at least 1 halogen atom, an aryl group, for example, phenyl. More preferably, Ri, R2, R3 and R4 equal to or different from each other, are independently from each other H, a linear or branched C1-C4 alkyl group optionally substituted by at least 1 halogen atom, and particularly preferably R1, R2 , R3 and R4 are independently from each other H, methyl, ethyl, n-propyl or isopropyl each optionally substituted by at least 1 halogen atom, very preferably H, a methyl or an ethyl group each optionally substituted by at least 1 halogen atom. Most preferably, Rj, R2 are H.
X is preferably selected from bromine, chlorine, iodine, OH, OTos or OTMS; more preferably X is chlorine or OH, most preferably X is chlorine or fluorine.
In a preferred aspect, Rj, R2 are H and X is OH.
In a particularly preferred aspect, Rj, R2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH2Cl)-COOH and HOOC-CH (OCH2F)-COOH.
In another particularly preferred aspect, Rj and R2 are an ethyl group and X is chlorine or fluorine, and the compounds of formula (I) are EtOOC-CH (OCH2Cl)-COOEt and EtOOC-CH (OCH2F)-COOEt.
In general, the reaction is performed in the liquid phase.
In the process according to the invention, the fluorination is generally carried out with fluorinating agents. Said fiuorinating agents preferably allow fluorinating a halogen, a hydroxyl group, a carboxyl group and other oxygen containing functional groups, in particular substituting carbon-oxygen functionality with carbon-fluorine groups. Typical examples of said fluorinating agents are for example SF4 (sulfur tetrafluoride); diethylaminosulfur trifluoride (DAST), dimethylaminosulfur trifluoride (DMAST) and bis (2- methoxyethyl)aminosulfur trifluoride (Deoxofluor).
SF4 is most preferred as fluorinating agent. The production of SF4 can be realized according to the procedure described in the GB Pat. No. 1374054.
According to one embodiment, the fluorination with SF4 is carried out in the presence of anhydrous HF. HF is often used in an amount of about 1 to about 1000 moles, and preferably about 1 to about 500 moles, per mole of SF4.
In the process according to the present invention, the fluorination can be carried out in the presence of a solvent. The solvent to be used may also, for example, be an aromatic hydrocarbon such as benzene, toluene or xylene, an aliphatic hydrocarbon such as pentane or hexane; a halogenated hydrocarbon such as methylene chloride, chloroform, ethylene dichloride,
hydrofluorocarbons, e.g. 1,1,1,3,3-pentafluorobutane (Solkane®365 mfc) or perfluorocarbons, e.g. perfluorocyclohexane; or an ether such as diethyl ether, dibutyl ether or tetrahydrofuran. Among them, the halogenated hydrocarbons are preferred. Methylene chloride is most preferred. These solvents may be used alone or in combination as a mixture. If appropriate, the solvent is used usually in an amount of from 50 to 99 % by weight, preferably from 60 to 99 % by weight, more preferably from 75 to 99% by weight of the solvent relative to the total weight of the reaction medium.
If the reaction mixture is a liquid under the reaction conditions, a solvent is not needed. If desired, starting compounds or reaction products could be used as solvent. Particularly preferred is the use of Sevoflurane as solvent. Preferably, if Sevoflurane is used as a solvent, it is present in the reaction mixture from the start.
The pressure and the temperature are selected as such that the reaction mixture remains in the liquid phase.
The process according to the present invention generally comprises carrying out the fluorination at a temperature equal to or higher than 300C, preferably equal to or higher than 40°, more preferably equal to or higher than 500C. It is generally carried out at a temperature equal to or lower than 900C, preferably at a temperature equal to or lower than 800C, more preferably a temperature equal to or lower than 7O0C. A temperature ranging from 50 to 70 0C is most preferred.
The process according to the present invention generally comprises carrying out the fluorination under pressure. The pressure of the fluorination is advantageously equal to or greater than about 5 bar (abs), preferably about 10 bar (abs) to equal to or less than about 25 bar (abs).
Stoichiometrically, the transformation of 1 C(O) group to a CF2 group consumes one molecule of SF4. The transformation of a C-ORj or C-OR2 group to a C-F group consumes half a molecule of SF4, as well as the transformation of a OCH2X group to form a OCH2F group. Consequently, in the process according to the invention, the range of the molar ratio of substituted malonic acid derivative to SF4 preferably is from 1:3 to 1:5 , and particularly preferably from 1:3,5 to 1:4.5.
If desired, the fluorination can be carried out in 2 or even 3 steps. In the 1st step, any hydroxyl groups are transformed. In a second step, the other groups, e.g. the carbonyl groups, are transformed. The first step often is performed at a lower temperature range, e.g. at - 8O0C to 00C. The second step is preferably performed at the temperature given above. The invention also relates to the manufacture of a substituted malonic acid derivative of formula (I) or (II):
R1OOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein X is OH or a leaving group which can be substituted by nucleophilic substitution. The manufacture can principally be performed in two alternatives: according to one embodiment, the synthesis is performed with an O-nucleophile, and according to another embodiment, the synthesis is performed with a CH2- electrophile.
Thus, according to one embodiment, the invention relates to a process for the manufacture of a substituted malonic acid derivative of formula (I) or (II):
Ri 0OC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution. Said leaving group is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; by reaction of a malonic acid derivative of formula (III) or (IV):
RIOOC-CH(Y)-COOR2 (III)
R3HNOC-CH (Y)-CONHR4 (IV) wherein
- Y is a leaving group which can be substituted by nucleophilic substitution. Y is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS,
- R1, R2, R3 and R4 are as defined above,
with an O-nucleophile.
The definitions and preferences described above for the process for the manufacture of Sevoflurane according to the invention equally apply to the process for the manufacture of said substituted malonic acid derivative. Typical examples of O-nucleopliiles are foπnaldehyde and formaldehyde derivatives.
Foπnaldehyde and formaldehyde derivatives are preferred O-nucleophiles.
For the purpose of the present invention, the term "formaldehyde derivative" refers to a class of molecules which are formed from foπnaldehyde by polymerization, trimerisation or addition reactions such as paraformaldehyde, trioxane, hydrated formaldehyde, hemiacetalic structures of formaldehyde of formula (V): HO-CH2-X wherein X is a leaving group which can be substituted by nucleophilic substitution and which is preferably selected from halogens or oxygen containing functional groups. Typical examples of said hemiacetalic compounds are for instance HO-CH2-OToS and HO-CH2OTMS.
In general, the parafoπnaldehyde or trioxane is cracked, e.g. theπrially or chemically, to form the monomeric formaldehyde.
The process according to the present invention generally comprises carrying out the reaction with the O-nucleophile in the presence of a solvent. The solvent to be used may, for example, be a polar solvent such as dimethyl formamide, dimethyl acetamide, dimethylsulfoxide, sulfolane, Sevoflurane, tetrahydrofuran, acetonitrile, dioxane, a halogenated hydrocarbon such as methylene chloride, chlorofomi or ethylene dichloride; or an ether such as diethyl ether, dibutyl ether or tetrahydrofuran. Among them, a polar solvent is preferred. Particularly preferred among them, is dimethyl formamide, sulfolane or Sevoflurane. These solvents may be used alone or in combination as a mixture. If appropriate, the solvent is used usually in an amount of from 50 to 99 by weight, preferably from 60 to 99 % by weight, more preferably from 75 to 99% by weight of the solvent relative to the total weight of the reaction medium.
If desired, the reaction with the O-nucleophile optionally may be carried out in the presence of a base. If a base is used, it may be an inorganic base or an organic base. The inorganic base may be selected from the group consisting of alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, lithium hydroxide, cesium hydroxide, alkaline earth metal hydroxides such as calcium hydroxide, barium hydroxide, magnesium hydroxide, strontium hydroxide, and basic alkali metal salts such as sodium carbonate, sodium hydrogencarbonate, potassium carbonate and potassium hydrogencarbonate. Preferred bases are sodium hydroxide and potassium hydroxide. Most preferred base is sodium hydroxide .The organic base may be selected from the group consisting of nitrogen-containing heterocyclic compounds such as pyridine, quinoline or picoline; and tertiary bases such as triethylamine, dimethylaniline, diethylaniline and 4-dimethylaminopyridine. Among them, pyridine, triethylamine, dimethylaniline, diethylaniline and 4-dimethylaminopyridine are preferred. Among them, pyridine is particularly preferred. These bases may be used alone or in combination as a mixture.
If desired, the base can be applied in the form of an aqueous solution or a solution of the base in water and an organic solvent. The organic solvent is in particular a solvent as described above.
For the purpose of the present invention, the term "aqueous solution" refers to solutions of water soluble compounds in water, for example salt water or any other aqueous mineral salt solution.
In the process according to the invention, the molar ratio of the base to O-nucleophile is advantageously from 0.5:1 to 2:1, preferably from 0.7:1 to 1.5:1, and more preferably from 0.8:1 to 1.2:1. Most preferably, the molar ratio is about 1.
According to the other embodiment, the present invention concerns a process for the manufacture of a hydroxyl substituted malonic acid derivative of formula (VI) or (VII):
RiOOC-CH(OCH2OH)-COOR2 (VI)
R3HNOC-CH (OCH2X)-CONHR4 (VII)
wherein Ri, R2 R3 and R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms optionally substituted by at least one halogen atom, an aralkyl group or an aryl group, comprising the reaction of a hydroxyl malonic acid derivative of formula (VIII) or (IX): R1OOC-CH(OH)-COOR2 (VIII) or R3HNOC-CH (OH)-CONHR4 (IX) wherein R1, R2 R3 and R4 are as defined above, with a CH^electrophile.
Formaldehyde is most preferred CH2-electrophile.
Optionally, the hydroxyl malonic acid derivative of formula (VI) or (VII): R, 0OC-CH(OCH2OH)-COOR2 (VI) or R3HNOC-CH (OCH2OH)-CONHR4 (VII) can be converted to the substituted malonic acid derivative of formula (I) or (II):
RiOOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein X is in particular a leaving group, as described above. The conversion can be realized by reaction of said hydroxyl substituted malonic acid derivative with PCl3, PCl5, TosOH, MesOH or amine-nHCl like PyHCl. According to the most preferred embodiment, the present invention concerns a process for the manufacture of a substituted malonic acid derivative of formula (I) or (II):
R1OOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is a leaving group which can be substituted by nucleophilic substitution.
Said leaving group is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; comprising the reaction of a hydroxyl malonic acid derivative of formula (VIII) or (IX): R, 0OC-CH(OH)-COOR2 (VIII) Or R3HNOC-CH (OH)-CONHR4 (IX) wherein R1, R2 R3 and R4 are as defined above, with a CH2-electrophile in the presence of a leaving group transfer agent.
For the purpose of the present invention, the term "leaving group transfer agent" refers to a class of compounds that are able to transfer their leaving group to another compound. Typical examples of leaving group transfer agents are for example a chlorinating agent selected from the group consisting of oxalyl chloride, phosphorus trichloride, phosphorus pentachloride or phosphorus oxychloride, a thionyl compound such as thionyl chloride and thionyl fluoride; a sulfuryl compound such as sulfuryl chloride and sulfuryl fluoride; a tosylating agent such as p-toluenesulfonyl chloride (tosyl chloride) and p-toluenesulfonyl fluoride (tosyl fluoride), or a mesylating agent, such as methanesulfonyl chloride (mesyl chloride) and methanesulfonyl fluoride (mesyl fluoride).
Preferred leaving group transfer agents are thionyl and sulfuryl compounds. Most preferred leaving group transfer agents are thionyl compounds. Preferred thionyl compounds are thionyl chloride and thionyl fluoride.
In a particular aspect of this embodiment, the reaction of the hydroxyl malonic acid derivative of formula (VIII) or (IX): R1OOC-CH(OH)-COOR2 (VIII) or R3HNOC-CH (OH)-CONHR4 (IX) wherein R1, R2 R3 and R4 are as defined above, with a CH2-electrophile in the presence of a leaving group transfer agent may be carried out additionally in the presence of a strong acid. The strong acid may be selected for example from the group consisting of fuming sulfuric acid, fuming nitric acid and hydrogen halides such as in particular hydrogen chloride, hydrogen fluoride.
In a first specific embodiment, the strong acid is a fuming sulfuric acid.
In a second specific embodiment, the strong acid is hydrogen chloride or hydrogen fluoride.
In a preferred aspect, Rj, R2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH2Cl)-COOH and HOOC-CH (OCH2F)-COOH.
The invention also relates to a process for the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 which comprises the steps of
(a) manufacturing a substituted malonic acid derivative of formula (I) or (II):
Ri 0OC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic substitution. Said leaving group is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; according to the process according to the invention as described above, and
(b) further reacting said malonic acid derivative as intermediate for the
manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 under the reaction conditions according to the process according to the invention, as described above.
In a preferred embodiment of this process of the present invention, the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 comprises the steps of
(a) manufacturing a substituted malonic acid derivative of formula (I) or (II):
R1OOC-CH(OCH2X)-COOR2 (I) R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is a leaving group which can be substituted by nucleophilic substitution. Said leaving group is selected from halogens, in particular chlorine
- R1, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; according to the most preferred embodiment of the process according to the invention as described above, and
(c) further reacting said malonic acid derivative as intermediate for the
manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 under the reaction conditions according to the process according to the invention, as described above.
In a particularly preferred aspect, Rj, R2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH2Cl)-COOH and HOOC-CH (OCH2F)-COOH.
In another particularly preferred aspect, Rj, R2 are an ethyl group and X is chlorine or fluorine, and the compounds of formula (I) are EtOOC-CH
(OCH2Cl)-COOEt and EtOOC-CH (OCH2F)-COOEt.
The processes according to the invention for the manufacture of the intermediate substituted malonic acid derivative and for the reaction of said intermediate to form Sevoflurane and the particular embodiments thereof can be carried out batchwise or continuously.
Said processes according to the invention and the particular embodiments thereof can be performed in any suitable reactor, e.g. in an autoclave.
In a specific embodiment, the process according to the invention further comprises separating Sevoflurane from the reaction mixture which is obtained in accordance with any of the processes disclosed herein before or a combination thereof, by known methods, e.g. by distillation, precipitation and/or
crystallization.
A distillation, in particular a fractional distillation, is preferred as separation technique to separate the Sevoflurane from the reaction mixture from hydrogen fluoride, from unreacted reactants such as the malonic acid derivative and the substituted derivative thereof and unreacted hemiacetalic compounds, from by products such as SOF2, alcoholic compounds or alkyl halide byproducts. Typical examples are for instance EtOH or EtCl. The by products may eliminate H2O or HCl and may be separated out of the liquid mixtures as ethylene.
The invention also relates to a substituted malonic acid derivative of formula (I) or (II):
RiOOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution and which is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
The definitions and preferences described above for the process for the manufacture of the substituted malonic acid derivative according to the invention equally apply here.
Preferred substituted malonic acid derivatives are HOOC-CH (OCH2Cl)- COOH and HOOC-CH (OCH2F)-COOH.
The invention also relates to the use of a substituted malonic acid derivative of formula (I) or (II):
Ri 0OC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution and which is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; - R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; as an intermediate for the manufacture of Sevoflurane. Preferably, HOOC-CH (OCH2Cl)-COOH or HOOC-CH (OCH2F)-COOH is used.
Thus, the invention provides a process for the manufacture of Sevoflurane wherein a substituted malonic acid derivative of formula (I) or (II):
R1OOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein Rj, R2, R3 and R4 and X have the meanings given above, is used as starting material.
Preferably, in the process according to the invention, Ri, R2, R3, R4 equal to or different from each other, are often independently selected from H, a C1-C4 alkyl group, optionally substituted by at least 1 halogen atom, an aryl group, for example, phenyl. More preferably, Ri, R2, R3 and R4 equal to or different from each other, are independently from each other H, a linear or branched C1-C4 alkyl group optionally substituted by at least 1 halogen atom, and particularly preferably Ri, R2, R3 and R4 are independently from each other H, methyl, ethyl, n-propyl or isopropyl each optionally substituted by at least 1 halogen atom, very preferably H, a methyl or an ethyl group each optionally substituted by at least 1 halogen atom. Most preferably, Ri, R2 are H.
X is preferably selected from bromine, chlorine, iodine, OH, OTos or OTMS; more preferably X is chlorine or OH.
In a preferred aspect, Rj, R? are H and X is OH.
In another preferred aspect, Rj, R2 are H and X is chlorine or fluorine, and the compounds of formula (I) are HOOC-CH (OCH2Cl)-COOH and HOOC-CH (OCH2F)-COOH.
The examples here after are intended to illustrate the invention without however limiting it.
Example 1: General procedure for the preparation of the compound of formula (I): EtOOC-CH (OCH2Cl)-COOEt.
Procedure A: Into an ice-cooled suspension of paraformaldehyde (1.82g; 1.2 eq.) and diethyl 2-hydroxymalonate (1Og; 1 eq.) , 5.7 ml (1.75 eq.) thionyl chloride and subsequently, 3.6 ml (1.6 eq.) concentrated sulfuric acid were added drop- wise. After 3 hours, the reaction mixture was added to ice and neutralized with NaHCO3. The extraction was performed with diethyl ether, and the resulting solution was dried with Na2SO4. After removal of the solvent, about 8g of the raw product were obtained.
Procedure B: Procedure A was repeated but using instead
Solkane®365mfc for performing the extraction. Comparable results were obtained.
Table 1 shows the influence of different parameters; e.g. purity of the diethyl 2- hydroxymalonate on the selectivity of the reaction, using procedure A.
Figure imgf000014_0001
Example 2: Manufacture of Sevoflurane
10,0 g (0,045 mol) EtOOC-CH (OCH2Cl)-COOEt obtained according to the procedure in example 1 is dissolved in 12,5 g (0,08 mol) Solkane®365mfc, 1,6 g (0,08 mol) HF, 21,8 g (0,202 mol) of SF4 gas is introduced into the liquid medium in an Roth autoclave (high grade stainless steel 1.4571). The temperature is increased from 230C to 28°C while introducing the SF4. The autoclave is heated to 1000C over night reaching a final pressure of 60 bar. After cooling down the autoclave content is expanded and poured out into ice water. The GC analysis of the organic phase shows the presence of Sevoflurane.
Examples 3a and 3b: Manufacture of Sevoflurane
Example 2 is repeated but using instead a liquid medium containing HOOC-CH (OCH2OH)-COOH (example 3a) or HOOC-CH (OCH2Cl)-COOH (example 3b) dissolved in Solkane®365mfc. The GC analysis shows for both examples 3a and 3b that the product gases contain Sevoflurane.

Claims

C L A I M S
1. A process for the manufacture of Sevoflurane (CF3-CH(OCH2F)-CF3) which comprises fiuorination of a substituted malonic acid derivative of formula (I) or (II):
R1OOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution and which is preferably selected from halogens or oxygen containing functional groups.
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group.
2. The process according to claim 1 , wherein R1, R2 are H.
3. The process according to claims 1 and 2, wherein X is chlorine, fluorine or OH.
4. The process according to claim 3, wherein X is chlorine or fluorine and R1, R2 are H.
5. The process according to claim 3, wherein R1, R2 are H and X is OH.
6. The process according to claim 1, wherein Ri and R2 are an ethyl group and X is chlorine or fluorine.
7. The process according to anyone of claims 1 to 6, wherein the fluorinating agent is SF4.
8. The process according to claim 7, wherein the range of the molar ratio of substituted malonic acid derivative to SF4 is from 1:3,5 to 1 :4.5.
9. The process according to any one of Claims 1 to 8, wherein the fluorination is carried out at a temperature in the range from 50 to 70 0C.
10. The process according to any one of Claims 1 to 9, wherein the pressure of the fluorination is from 5 bar to 25 bar.
11. A process for the manufacture of a substituted malonic acid derivative of formula (I) or (II):
RiOOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution. Said leaving group is preferably selected from halogens or oxygen containing functional groups.
- R1, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom,, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; by reaction of a malonic acid derivative of formula (III) or (IV):
R1OOC-CH(Y)-COOR2 (III)
R3HNOC-CH (Y)-CONHR4 (IV) wherein
- Y is a leaving group which can be substituted by nucleophilic substitution. Y is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS, - R1, R2 R3 and R4 are as defined above, with an O-nucleophile.
12. The process according to claim 11, wherein the O-nucleophile is formaldehyde or a formaldehyde derivative.
13. The process according to anyone of claims 11 or 12, wherein the reaction is carried out in the presence of a base.
14. A process for the manufacture of a hydroxyl substituted malonic acid derivative of formula (VI) or (VII): R1OOC-CH(OCH2OH)-COOR2 (VI) or R3HNOC-CH (OCH2OH)-CONHR4 (VII), wherein R1, R2 R3 and R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group, comprising the reaction of a hydroxyl malonic acid derivative of formula (VIII) or (IX): R1OOC-CH(OH)- COOR2 (VIII) or R3HNOC-CH (OH)-CONHR4 (IX) wherein R1, R2 R3 and R4 are as defined above, with a CH2-electrophile.
15. A process for the manufacture of a substituted malonic acid derivative of formula (I) or (II):
R1OOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is a leaving group which can be substituted by nucleophilic substitution.
Said leaving group is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS
- R1, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; comprising the reaction of a hydroxyl malonic acid derivative of formula (VIII) or (IX): RiOOC-CH(OH)-COOR2 (VIII) or R3HNOC-CH (OH)-CONHR4 (IX) wherein R1, R2 R3 and R4 are as defined above, with a CH2-electrophile in the presence of a leaving group transfer agent.
16. The process according to claim 14 or 15, wherein the CH2~electrophile is formaldehyde.
17. The process according to claim 15, wherein the leaving group transfer agent is a thionyl compound, preferably thionyl chloride or thionyl fluoride.
18. A process for the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 which comprises the steps of
(a) manufacturing a substituted malonic acid derivative of formula (I) or (II):
Ri 0OC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution. Said leaving group is preferably selected from halogens or oxygen containing functional groups.
- R1, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom,, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; according to the process according to the claims 11 to 14, and
(b) further reacting said malonic acid derivative as intermediate for the
manufacture of Sevoflurane CF3 -CH(OCH2F)-CF3 under the reaction conditions according to the process according to the claims 1 to 10.
19. A process for the manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 which comprises the steps of
(a) manufacturing a substituted malonic acid derivative of formula (I) or (II):
RiOOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is a leaving group which can be substituted by nucleophilic substitution.
Said leaving group is selected from halogens, in particular chlorine or fluorine
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; according to claims 15 to 17, and
(b) further reacting said malonic acid derivative as intermediate for the
manufacture of Sevoflurane CF3-CH(OCH2F)-CF3 under the reaction conditions according to the process according to the claims 1 to 10.
20. A substituted malonic acid derivative of formula (I) or (II): R1OOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic
substitution and which is preferably selected from halogens or oxygen containing functional groups. - Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom,, an aralkyl group or an aryl group.
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group;
21. A use of a substituted malonic acid derivative of formula (I) or (II): R1OOC-CH(OCH2X)-COOR2 (I)
R3HNOC-CH (OCH2X)-CONHR4 (II) wherein
- X is OH or a leaving group which can be substituted by nucleophilic substitution and which is preferably selected from halogens or oxygen containing functional groups such as OTos and OTMS.
- Ri, R2 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group,
- R3, R4 equal to or different from each other, are independently selected from H, an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom, an aralkyl group or an aryl group; as an intermediate for the manufacture of Sevoflurane.
PCT/EP2010/061645 2009-08-10 2010-08-10 Process for the manufacture of sevoflurane WO2011018466A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP10739653A EP2464619A1 (en) 2009-08-10 2010-08-10 Process for the manufacture of sevoflurane
JP2012524225A JP2013501750A (en) 2009-08-10 2010-08-10 Method for producing sevoflurane
US13/389,449 US8987524B2 (en) 2009-08-10 2010-08-10 Process for the manufacture of Sevoflurane
CN2010800404931A CN102498085A (en) 2009-08-10 2010-08-10 Process for the manufacture of sevoflurane
CA2769797A CA2769797A1 (en) 2009-08-10 2010-08-10 Process for the manufacture of sevoflurane
IN972DEN2012 IN2012DN00972A (en) 2009-08-10 2012-02-02

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP09167529 2009-08-10
EP09167529.8 2009-08-10

Publications (1)

Publication Number Publication Date
WO2011018466A1 true WO2011018466A1 (en) 2011-02-17

Family

ID=41395993

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2010/061645 WO2011018466A1 (en) 2009-08-10 2010-08-10 Process for the manufacture of sevoflurane

Country Status (8)

Country Link
US (1) US8987524B2 (en)
EP (1) EP2464619A1 (en)
JP (1) JP2013501750A (en)
KR (1) KR20120050474A (en)
CN (1) CN102498085A (en)
CA (1) CA2769797A1 (en)
IN (1) IN2012DN00972A (en)
WO (1) WO2011018466A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012107438A1 (en) 2011-02-10 2012-08-16 Solvay Sa Process for the manufacture of fluoromethoxymalonic acid derivatives
EP2607342A1 (en) 2011-12-21 2013-06-26 Solvay Sa Process for the manufacture of substituted malonic acid derivative compounds and of Sevoflurane
EP2626341A1 (en) 2012-02-10 2013-08-14 Solvay Sa Manufacture of hexafluoroisopropanol

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1374054A (en) 1972-04-14 1974-11-13 Kali Chemie Ag Process for the continuous production of sulphur tetrafluoride
DE2449899A1 (en) * 1974-03-04 1975-09-11 Henkel & Cie Gmbh PROCESS FOR THE PREPARATION OF ETHERPOLYCARBONIC ACIDS
US4228300A (en) * 1972-05-15 1980-10-14 Monsanto Company Polycarboxylate ethers
EP0792878A2 (en) * 1996-02-27 1997-09-03 Dompé S.P.A. Geminal carboxylic acids and esters thereof, pharmaceutical formulations containing them useful in the treatment of bone dysmetabolism
US5705710A (en) * 1997-01-15 1998-01-06 University Of Iowa Research Foundation Process for the synthesis of hexafluoroisopropyl ethers
US5969193A (en) 1997-08-18 1999-10-19 Medeva Pharmaceuticals Pa, Inc. Method for the preparation of sevoflurane
US6100434A (en) 1999-03-26 2000-08-08 Abbott Laboratories Method for synthesizing sevoflurane and an intermediate thereof
US20030144538A1 (en) * 2000-02-10 2003-07-31 Johannes Bartek Method for producing alkoxy malonic acid dinitriles
WO2004065340A1 (en) 2003-01-14 2004-08-05 Baxter International Inc. Process for recovery of 1,1,1,3,3,3-hexafluoroisopropanol from the waste stream of sevoflurane synthesis
EP2039675A1 (en) * 2006-07-06 2009-03-25 Daikin Industries, Ltd. Novel alpha -fluoromethoxycarboxylic ester, process for producing the alpha -fluoromethoxycarboxylic ester, and process for producing sevoflurane
WO2009063783A1 (en) * 2007-11-13 2009-05-22 Daikin Industries, Ltd. Novel carboxylic acid ester, use of the same, and method for producing the same
WO2009085247A2 (en) 2007-12-27 2009-07-09 Halocarbon Products Corporation Process for the purification of fluromethyl 1,1,1,3,3,3,-hexafluoroisopropyl ether (sevoflurane)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3096344A (en) * 1961-05-09 1963-07-02 Research Corp Perfluoroalkyloxetanes
US3911024A (en) 1966-12-08 1975-10-07 Louise S Croix Fluorinated isopropyl derivatives
US4250334A (en) 1979-12-26 1981-02-10 Baxter Travenol Laboratories, Inc. Method of synthesizing fluoromethylhexafluoroisopropyl ether
US6329529B1 (en) 1997-08-06 2001-12-11 Mitsui Chemicals, Inc. Nitrogen-based halogenating agents and process for preparing halogen-containing compounds
US5886239A (en) 1997-11-21 1999-03-23 Baxter International Inc. Method of preparing monofluoromethyl ethers
DE10104663A1 (en) 2001-02-02 2002-08-08 Solvay Fluor & Derivate Production of fluorine compounds
EP2066609B1 (en) 2006-09-29 2016-01-06 Cristália Produtos Químicos Farmacêuticos Ltda. Process for the preparation of fluoromethyl 2,2,2-trifluoro-1-(trifluoromethyl) ethyl ether
CN101337863B (en) * 2007-07-06 2012-04-25 江苏恒瑞医药股份有限公司 Method for preparing sevoflurane

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1374054A (en) 1972-04-14 1974-11-13 Kali Chemie Ag Process for the continuous production of sulphur tetrafluoride
US4228300A (en) * 1972-05-15 1980-10-14 Monsanto Company Polycarboxylate ethers
DE2449899A1 (en) * 1974-03-04 1975-09-11 Henkel & Cie Gmbh PROCESS FOR THE PREPARATION OF ETHERPOLYCARBONIC ACIDS
EP0792878A2 (en) * 1996-02-27 1997-09-03 Dompé S.P.A. Geminal carboxylic acids and esters thereof, pharmaceutical formulations containing them useful in the treatment of bone dysmetabolism
US5705710A (en) * 1997-01-15 1998-01-06 University Of Iowa Research Foundation Process for the synthesis of hexafluoroisopropyl ethers
US5969193A (en) 1997-08-18 1999-10-19 Medeva Pharmaceuticals Pa, Inc. Method for the preparation of sevoflurane
US6100434A (en) 1999-03-26 2000-08-08 Abbott Laboratories Method for synthesizing sevoflurane and an intermediate thereof
US20030144538A1 (en) * 2000-02-10 2003-07-31 Johannes Bartek Method for producing alkoxy malonic acid dinitriles
WO2004065340A1 (en) 2003-01-14 2004-08-05 Baxter International Inc. Process for recovery of 1,1,1,3,3,3-hexafluoroisopropanol from the waste stream of sevoflurane synthesis
EP2039675A1 (en) * 2006-07-06 2009-03-25 Daikin Industries, Ltd. Novel alpha -fluoromethoxycarboxylic ester, process for producing the alpha -fluoromethoxycarboxylic ester, and process for producing sevoflurane
WO2009063783A1 (en) * 2007-11-13 2009-05-22 Daikin Industries, Ltd. Novel carboxylic acid ester, use of the same, and method for producing the same
WO2009085247A2 (en) 2007-12-27 2009-07-09 Halocarbon Products Corporation Process for the purification of fluromethyl 1,1,1,3,3,3,-hexafluoroisopropyl ether (sevoflurane)

Non-Patent Citations (8)

* Cited by examiner, † Cited by third party
Title
ANETA BOGDANOVA AND VLADIMIR V POPIK: "Experimental and Theoretical Analysis of the Photochemistry and Thermal Reactivity of Ethyl Diazomalonate and Its Diazirino Isomer. The Role of Molecular Geometry in the Decomposition of Diazocarbonyl Compounds", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, AMERICAN CHEMICAL SOCIETY, US, vol. 126, no. 36, 15 September 2004 (2004-09-15), pages 11293 - 11302, XP009142779, ISSN: 0002-7863, [retrieved on 20040820], DOI: DOI:10.1021/JA047824R *
CRUTCHFIELD M M: "Organic builders: A review of worldwide efforts to find organic replacements for detergent phosphates", 1 January 1978, JOURNAL OF THE AMERICAN OIL CHEMISTS' SOCIETY, SPRINGER, BERLIN, DE, PAGE(S) 58 - 65, ISSN: 0003-021X, XP009142725 *
DATABASE BEILSTEIN BEILSTEIN INSTITUTE FOR ORGANIC CHEMISTRY, FRANKFURT-MAIN, DE; 1933, XP002559898, Database accession no. BRN1773052 *
HENRY LEDON ET AL: "Réactivité des carbènes et carbénoides issus de la décomposition du diazomalonate de diméthyle", 1 January 1973, BULLETIN DE LA SOCIETE CHIMIQUE DE FRANCE, SOCIETE FRANCAISE DE CHIMIE. PARIS, FRANCE, PAGE(S) 2065 - 2071, ISSN: 0037-8968, XP009142780 *
JULIUS A VIDA ET AL: "Analgesics. 2.Selected 5-Substituted 5-(1-Phenylethyl)barbituric Acids", 1 January 1974, JOURNAL OF MEDICINAL CHEMISTRY, AMERICAN CHEMICAL SOCIETY, WASHINGTON, US, PAGE(S) 1194 - 1197, ISSN: 0022-2623, XP009142849 *
PRYDE, WILLIAMS, JOURNAL OF THE CHEMICAL SOCIETY, 1933, pages 1628 *
RYOICHI KUWANO AND YUTAKA KONDO: "Palladium-Catalyzed Benzylation of Active Methine Compounds without Additional Base: Remarkable Effect of 1,5-Cyclooctadiene", 30 September 2004, ORGANIC LETTERS, AMERICAN CHEMICAL SOCIETY, US, PAGE(S) 3545 - 3547, ISSN: 1523-7060, XP009142778 *
ZASOSOV V A ET AL: "SYNTHESIS OF 4-(P-AMINOBENZENESULFAMIDO)-5,6-DIMETHOXYPYRIMIDINE", PHARMACEUTICAL CHEMISTRY JOURNAL, SPRINGER NEW YORK LLC, US, vol. 6, no. 3, 1 January 1972 (1972-01-01), pages 160 - 164, XP009019218, ISSN: 0091-150X, DOI: DOI:10.1007/BF00771132 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012107438A1 (en) 2011-02-10 2012-08-16 Solvay Sa Process for the manufacture of fluoromethoxymalonic acid derivatives
US20130317251A1 (en) * 2011-02-10 2013-11-28 Solvay Sa Process for the manufacture of fluoromethoxymalonic acid derivatives
EP2607342A1 (en) 2011-12-21 2013-06-26 Solvay Sa Process for the manufacture of substituted malonic acid derivative compounds and of Sevoflurane
EP2626341A1 (en) 2012-02-10 2013-08-14 Solvay Sa Manufacture of hexafluoroisopropanol

Also Published As

Publication number Publication date
JP2013501750A (en) 2013-01-17
US20120157708A1 (en) 2012-06-21
CA2769797A1 (en) 2011-02-17
IN2012DN00972A (en) 2015-04-10
EP2464619A1 (en) 2012-06-20
US8987524B2 (en) 2015-03-24
KR20120050474A (en) 2012-05-18
CN102498085A (en) 2012-06-13

Similar Documents

Publication Publication Date Title
US10584089B2 (en) Fluorination of acrylate esters and derivatives
US5886239A (en) Method of preparing monofluoromethyl ethers
JP2001514636A (en) An improved method for producing cyclopropylacetylene
EP2137135A1 (en) Process for preparing 2,6-dichloro-4-(trifluoromethyl)phenylhydrazine using mixtures of dichloro-fluoro-trifluoromethylbenzenes
JP6574209B2 (en) Process for producing 2-halogen-acrylates
JP4550458B2 (en) Process for producing hydrofluoroethers
CN107406374A (en) Process for preparing 3-chloro-2-vinylphenyl sulfonate
EP2069278A2 (en) Process for the preparation of chloromethyl 2,2,2-trifluoro-1-(trifluoromethyl) ethyl ether
US8987524B2 (en) Process for the manufacture of Sevoflurane
CN113024359B (en) Process for preparing alkoxymethyl alkynyl ether compounds having terminal triple bonds
JP5659658B2 (en) Process for producing α, α-difluoroesters
CN113735785B (en) Preparation method of 3, 6-dichloropyrazine-2-carbonitrile
EP2673256B1 (en) Process for the manufacture of fluoromethoxymalonic acid derivatives
EP2626341A1 (en) Manufacture of hexafluoroisopropanol
JP4423717B2 (en) Method for the synthesis of 3-substituted-3-halomethyloxetane compounds
TW201245133A (en) Process for the manufacture of fluoromethoxymalonic acid derivatives
EP2607342A1 (en) Process for the manufacture of substituted malonic acid derivative compounds and of Sevoflurane
WO2005073182A1 (en) Method for producing fluorine-containing unsaturated sulfonyl fluoride
WO2007020816A1 (en) Process for producing difluoroacetic acid salt

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201080040493.1

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10739653

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2010739653

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2769797

Country of ref document: CA

WWE Wipo information: entry into national phase

Ref document number: 972/DELNP/2012

Country of ref document: IN

WWE Wipo information: entry into national phase

Ref document number: 13389449

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 2012524225

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20127006247

Country of ref document: KR

Kind code of ref document: A