WO2010135105A1

WO2010135105A1 - Quantitative measurement of gas phase process intermediates using raman spectroscopy

Info

Publication number: WO2010135105A1
Application number: PCT/US2010/034352
Authority: WO
Inventors: Greg Harms; Douglas Kreszowski; David Licht; Elmer Lipp; Mike Molnar; Marc Pinet
Original assignee: Dow Corning Corporation; Hemlock Semiconductor Corporation
Priority date: 2009-05-22
Filing date: 2010-05-11
Publication date: 2010-11-25
Also published as: US20120070362A1; EP2514716A2; JP2012527615A; SG176590A1; CA2760935A1; KR20120031014A; CN102439421A; SG193845A1; EP2799396A1; SG193844A1; EP2433113A1; EP2514716A3; EP2433113B1

Abstract

A method for quantitatively monitoring gas phase materials in a chemical process is provided and includes, providing a gaseous feed stream containing one or more reactant gases of interest; exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components; and displaying the results of the analysis. In one embodiment, the method is useful for quantitatively monitoring gas phase materials in a process for making high purity silicon.

Description

QUANTITATIVE MEASUREMENT OF GAS PHASE PROCESS INTERMEDIATES USING RAMAN SPECTROSCOPY

The subject matter described herein relates to the quantitative measurement of gas phase intermediates in chemical production processes using Raman spectroscopy. In one embodiment, the gas phase reactants in a process for the production of high purity polysilicon are quantitatively measured in real time to provide a dynamic assessment of process equilibria.

High-purity semiconductor grade silicon is typically prepared by one of a number of known processes including the so-called "Siemens process." In the Siemens process, a mixture comprising hydrogen and silane (SiH₄) or a mixture comprising hydrogen and trichlorosilane (HSiCl₃) is fed to a decomposition reactor containing substrate rods which are maintained at a temperature of more than 1000° C. The following chemical equilibria and kinetics control the reactions as follows:

4 HSiC^ »- Sipoiyc_jystaii_Lαe + 3 S1CI4 + 2 Hi

H₂ + SiCl₄ " _», HSiCl₃ + HCl

Silicon is deposited on the substrate, and by-product gas mixtures exit in a vent stream. When a mixture comprising hydrogen and trichlorosilane is used, the vent stream may include hydrogen, hydrogen chloride, chlorosilanes, silane, and silicon powder. The vent stream is passed through a complex recovery process where condensations, scrubbing, absorption and adsorption are unit operations often used to facilitate the capture of feed material trichlorosilane and hydrogen for recycle.

One alternate process is to feed a gaseous mixture comprising hydrogen and silane or a mixture comprising hydrogen and trichlorosilane to a fluidized bed containing silicon beads that are maintained at a high temperature. The silicon beads grow in size during the reaction process, and when large enough, are passed out the bottom of the fluidized bed reactor as product. The vent gases exit the top of the reactor and are sent through a recovery process similar to that used in the Siemens process. More recently, aspects of the Siemens process have been combined with a fruidized bed process to provide improved efficiency in the production of high-purity silicon. See, Arvidson et al., U.S. Pub. No. 2008/0056979, where vent gases from a Siemens process reactor were used as feed gases in a fruidized bed reactor in a process for producing high purity silicon.

Because the yield and purity of the silicon product is dependent upon many factors including reactant gas feed rates and concentrations, temperatures, and pressures, deviations, even small deviations, from optimal values may cause a drop in the yield of the product and/or introduce undesirable contaminants into the product. Accordingly, it would be desirable to be able to monitor all of the reactants involved in substantially real time so that deviations from optimal values could be detected and corrected quickly. However, existing test methods have drawbacks in monitoring gas phase intermediates for polysilicon production processes. Gas chromatography has been used in the past to monitor concentrations of various gases in feed or product streams. However, the results from gas chromatography sampling are relatively slow, taking on average several minutes for analysis. While Fourier transform infrared spectroscopy (FTIR) has also been utilized as a monitoring methodology, hydrogen gas is invisible to FTIR instruments. Thus, known methodologies suffer from several drawbacks such as an inability to produce real time results, lack the necessary sensitivity, lack needed repeatability, or are unable to measure all of the gases of interest simultaneously.

Accordingly, there remains a need for a monitoring and control method that can quantitatively and simultaneously measure all of the gases used in chemical manufacturing processes such as polycrystalline silicon production processes and provide substantially real time results with the desired sensitivity and repeatability. Those needs are addressed by embodiments of the present invention which provide quantitative, repeatable, accurate, real-time measurements of gases and mixtures of gases used in chemical manufacturing processes such as the production of high purity polysilicon.

In accordance with one embodiment of the present invention, a method for quantitatively monitoring gas phase materials in a chemical process is provided and comprises providing a gaseous feed stream containing one or more reactant gases of interest, and exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device which has been previously calibrated.

The calibration may be performed by selecting peaks in a Raman spectrum for each gas of interest in said gaseous feed stream, each peak including a low frequency point and a high frequency point, and collecting Raman spectra for known concentrations for each gas of interest. The peak areas of the selected peaks are then calculated. A reference peak in a Raman spectrum for a reference material in the Raman spectroscopic device is selected, with the reference peak also including a low frequency point and a high frequency point. Raman spectra is collected for the reference material, and a reference peak area for the reference material is calculated. Any peak area adjustments due to peak overlap from the selected peaks and the reference peak are determined, and the contribution to the peak area of the selected peak of the reference peak is removed. The ratios of the selected peak areas for each gas of interest are determined with the reference peak area to establish calibration constants for each gas of interest. A Raman spectroscopic signal from each of the gaseous components in the feed stream is acquired, and the spectroscopic signal is analyzed to determine the presence and concentration of each of said gaseous components. The results of the analysis may be displayed. In embodiments of the invention, the relative amounts of the gaseous components of the feed stream may be adjusted based on the analysis of the spectrographic signal.

In this embodiment, the peak area adjustment may be determined by spectral subtraction, spectral deconvolution, or spectral peak area ratios. For the latter technique, the peak area adjustment is determined by selecting a second peak area in the Raman spectra of the reference material that has no overlap with the selected peak, calculating the ratio of the area of the reference peak with the second reference peak to determine a peak area ratio adjustment factor; and applying the peak area adjustment factor to selected peak areas for the gases of interest. In one embodiment, the calibration constants for each gas of interest are determined by calculating the ratios of the selected peak areas with a selected reference peak area, wherein

Peak Area of Selected Gas - Peak Area of Reference Material x Area Adjustment Factor

Ratio = -

Peak Area of Reference Material -A-

and plotting calculated ratios against known concentration values for the selected gas of interest to create a linear regression model.

In accordance with another embodiment of the present invention, a method for quantitatively monitoring gas phase materials in a process for making high purity silicon is provided and comprises, providing a gaseous feed stream containing one or more of H₂, HCl, SiH₄, H₃SiCl, HSiCl₃, H₂SiCl₂, SiCl₄Or N₂, exposing the gaseous feed stream to radiation from a Raman spectroscopic device, acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream, analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components; and displaying the results of the analysis. The method may include adjusting the relative amounts of the gaseous components of the feed stream based on the analysis of the spectrographic signal.

The Raman spectroscopic device may be calibrated by selecting peaks in a Raman spectrum for each gas of interest in the gaseous feed stream, each peak including a low frequency point and a high frequency point; collecting Raman spectra for known concentrations for each gas of interest; and calculating the peak areas of the selected peaks. A reference peak is selected in a Raman spectrum for a reference material in said Raman spectroscopic device, with the reference peak including a low frequency point and a high frequency point. Raman spectrum is collected for the reference material, and a reference peak area for the reference material is calculated.

Any peak area adjustments due to peak overlap from the selected peaks and the reference peak are identified and the contribution to the peak area of the selected peak of the reference peak is removed. In one embodiment, this may be accomplished by calculating the ratios of the selected peak areas for each gas of interest with the reference peak area to establish calibration constants for each gas of interest. The peak area adjustment may be determined by spectral subtraction, spectral deconvolution, or spectral peak area ratios.

In one embodiment, the peak area adjustment is determined by selecting a second peak area in the Raman spectra of the reference material that has no overlap with the selected peak, and calculating the ratio of the area of the reference peak with the second reference peak to determine a peak area ratio adjustment factor. The peak area adjustment factor is applied to selected peak areas for the gases of interest.

In this embodiment, the calibration constants for each gas of interest are determined by calculating the ratios of the selected peak areas with a selected reference peak area, wherein

_ .. Peak Area of Selected Gas - Peak Area of Reference Material x Area Adjustment Factor

Ratio =

Peak Area of Reference Material

and plotting the calculated ratios against known concentration values for the selected gas of interest to create a linear regression model. In another embodiment, a method for producing high purity polycrystalline silicon is provided and comprises providing a gaseous feed stream containing H₂, and at least one silane selected from SiH₄, HSiCl₃, H₂SiCl₂, or SiCl₄ and reacting the components of the gaseous feed stream to form high purity polycrystalline silicon. Contemporaneously with the reaction, the gases in said gaseous feed stream are monitored by exposing the gaseous feed stream to coherent laser radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components and to detect any deviations from predetermined values for each of the gaseous components; and adjusting the feed rate of any of the gaseous components that deviate from such predetermined values.

In other embodiments, gas feed stream components for other chemical processed may be quantitatively measured to provide a dynamic assessment of process equilibria. For example, gas feed stream components, including H₂ and SiCl₄, used in the process of hydrogenating silicon tetrachloride to form, for example, trichloro silane (HSiCl₃) and dichlorosilane (H₂SiCl₂) may be monitored and measured. Thus, a method for hydrogenating silicon tetrachloride is provided and comprises providing a gaseous feed stream containing H₂ and SiCl₄ and reacting the components of the gaseous feed stream to form at least one of trichloro silane and dichlorosilane. Contemporaneously with the reaction, the gases in said gaseous feed stream are monitored by exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components and to detect any deviations from predetermined values for each of the gaseous components; and adjusting the feed rate of any of the gaseous components that deviate from such predetermined values.

Accordingly, it is a feature of the present invention to provide quantitative, repeatable, accurate, real-time measurements of gases and mixtures of gases used in chemical manufacturing processes such as the production of high purity polysilicon. Other features and advantages of the present invention will be apparent from the following detailed description, the accompanying drawings, and the appended claims.

The following detailed description of specific embodiments of the present invention can be best understood when read in conjunction with the following drawings, where like structure is indicated with like reference numerals and in which: Fig. 1 is a schematic illustration of one embodiment of the quantitative monitoring apparatus used in the practice of embodiments of the present invention; and Fig. 2 is a schematic flow diagram of one process for the manufacture of high purity polycrystalline silicon which can utilize the quantitative monitoring process of the present invention. Embodiments of the present invention provide quantitative measurement of gaseous substances used in chemical manufacturing processes. Although one embodiment of the invention is directed to processes for the manufacture of polycrystalline silicon, it will be understood that the techniques described herein may be applied to any chemical manufacturing process that utilizes gaseous phase reactants whose relative concentrations need to be monitored and controlled in substantially realtime.

Embodiments of the present invention utilize Raman spectrometry. Raman spectrometry is a form of vibrational spectrometry which utilizes a laser to illuminate a sample and analyzes the reflected or backscattered radiation. Single wavelength lasers are commercially available for use in Raman spectrometry. Examples include, but are not limited to, a 785nm red laser and a 532nm green laser. The energy shift between the measured reflected radiation and the laser line, i.e., the wavelength of the laser, is equal to the vibrational frequencies of the bonds in the molecules being illuminated. The vibrational frequencies depend on the masses of the atoms in the molecules and on the strength of the interatomic bonds within the molecule, with different bonds being characterized by specific frequencies. The vibrational frequency may also depend on the geometric arrangement of atoms in the molecules.

A Raman spectrum generally comprises a plot of the intensity by the energy shift, i.e., Raman shift, of the scattered radiation. In particular, each observation or data point at a wavelength shift from the incident laser line, which herein are referenced as wavenumbers (measured in cm^"1) so to be consistent with common spectroscopy references for vibrational and rotational structure of molecules, comprises a count at that wavelength shift. A plot of the aggregated counts at each wavenumber yields the Raman spectrum for the sample during the measured time period. For pure samples, the spectrum may be used to directly identify the sample. For complex mixtures or solutions, the frequency composition may be broken down by statistical analyses using known techniques to determine the composition of the sample. In practice, the peak distribution associated with a chemical may serve as a known signature or fingerprint for recognizing that chemical within a mixture or solution. In addition to these quantitative and qualitative advantages, Raman spectrometry has the additional advantages of being spatially resolved, i.e., resolvable at a depth within a sample, and of providing rapid, near-instantaneous response because sample preparation is generally not required.

A Raman spectroscopic system suitable for use in the practice of the described embodiments herein is depicted in FIG. 1. As depicted the system 10 may include a laser source 12 which generates laser radiation of one or more specified wavelengths and a detector 13 which detects reflected wavelengths from reactant gases flowing through a sample line 11 diverted from a feed stream 15. The laser radiation is transmitted to a Raman probe 14 via a fiber optic cable 16. The cable 16 may be connected to the probe 14 via an optical connector at the end of the probe or may be integrally connected to the probe. The cable 16 is typically comprised of two or more fiber optic strands with a portion of the strands, such as the core strands 14a, configured to carry the laser radiation from laser source 12 to the probe 14 and the remainder of the strands, i.e. the periphery strands 14b, being configured to carry the scattered radiation back to detector 13. The laser radiation passes to and from the sample via a lens 20 at the tip of the probe 14 which is substantially transparent to the incoming and outgoing wavelengths of light.

Detector 13 may process the scattered radiation to form one or more spectra associated with the sample. Detector 13 typically provides scattered radiation data or spectra to a workstation 22 or computer, for further processing. Workstation or computer 22 may be configured to control the activities of detector 13 and may communicate with other processor-based systems, such as one or more remote computers which are utilized to control the chemical process. In a preferred form, the workstation may be a RamanRXN3™ Analyzer, commercially available from Kaiser Optical

Systems, Inc. While an exemplary Raman spectrographic system has been depicted, it will be apparent to those skilled in the art that various modifications may be made.

The probe and lens may incorporate various features designed to protect the probe from potentially corrosive environments in the gaseous feed stream. Suitable probe designs for use in the described embodiments herein are Pilot E and Pilot S- probes and AirHead™ probes, all commercially available from Kaiser Optical Systems, Inc. Such probes include a sapphire lens. Such probes are designed to be immersed into gaseous streams that may be at elevated temperatures and/or contain corrosive gases. Other commercially available probes may also be utilized. Calibration of the Spectrographic System

Probe 14 and the associated instrumentation of the Raman spectrographic system are typically calibrated to provide consistent Raman shift and intensity responses in any acquired spectral data. In a preferred embodiment, calibration is accomplished by selecting the desired set of gaseous reactants to be monitored in the feed stream, measuring the peak area counts for given band frequencies at known concentrations, and applying a linear regression fit. To insure that the system will reliably and repeatably identify such gases and their respective concentrations, the peak area counts for each gas are ratioed to a sapphire reference vibration peak. The sapphire area count is measured simultaneously with the gases flowing in the feed stream. This ratioing technique provides a process in which the method detection limits are between about 0.1% to about 0.8% with a repeatability between about 0.05% to about 0.2%. The method detection limits for H₂, N₂, HCl, SiH₄, H₃SiCl, H₂SiCl₂, HSiCl₃, and SiCl₄ were estimated by taking a three standard deviation of a set of twenty measurements performed in the absence of these gas components. Different gas components provided different detection limits. The repeatability was also estimated for some of the gas components (H₂, N₂, HCl, H₂SiCl₂, HSiCl₃, and SiCl₄) through use of 95% confidence intervals. Confidence intervals about a population mean were calculated for six of the gas components run at "expected" operating concentrations. These confidence intervals imply a repeatability for given test results from the Raman equipment between +0.05% to +0.2% about the mean percent composition value. The method detection limits and the confidence interval results are contingent upon many factors such as the particular molecule being monitored, the gas stream vibration being monitored, instrument operating conditions, and the associated fiber optics and sample probe assembly.

Initially, the need for any peak area adjustments must be identified and defined. First, the peaks to be used in the Raman spectrum which will be used to measure each molecular component of interest must be determined. For a gas feed stream in a process for the manufacture of polycrystalline silicon, the gases will include one or more of silicon tetrachloride, trichlorosilane, dichlorosilane, monochlorosilane, hydrogen chloride, hydrogen, and nitrogen. The vibrational peak from the sapphire window in the probe that will be used as a reference peak must also be selected. Each selected peak will have a low frequency point and a high frequency point defined for calculating the peak area for each given peak wavelength.

Any additional peak area adjustments that need to be made on the selected peak area measurements must be identified. Peak area adjustments may be needed because of peak overlap from interference bands. For example, in a gaseous system for the manufacture of polycrystalline silicon, a sapphire peak centered at 416 cm^"1 partially overlaps with a silicon tetrachloride peak that is centered at 424 cm ^defined by a high=435 cm^"1, and a low=409 cm^"1). Because accurate measurement of only the silicon tetrachloride peak is needed, a Raman response between 409 cm^and 435 cm^"1, the contribution to peak area from the sapphire peak centered at 416 cm^"1 must be removed. There exist multiple techniques for spectrally manipulation to address this problem, including, but not limited to spectral subtraction and deconvolution of spectra. A preferred technique is to define a peak area ratio between the 416 cm^"1 sapphire band, with the same high and low frequency points as used to identify the 424 cm^"1, and a different sapphire reference peak that is centered at 749 cm^"1. This ratio is then applied to subtract a scaled value of the 749 cm^"1 peak area from all future measurements in the 424 cm^"1 region.

Peak area adjustment values are created as follows. The Raman spectrographic instrument is operated using the provided instrument software to collect a Raman spectrum of only the reference sapphire. The collected spectral data can then be analyzed and processed using any of several available software tools, such as, for example, GRAMS Spectroscopy Software, commercially available from Galactic

Industries Corporation. Any necessary peak area adjustment factors are calculated by using known techniques such as, for example, spectral subtraction, spectral deconvolution, or peak area ratios. The area is integrated for all selected peaks, and the peak area adjustment factor may be calculated for each instrument probe. For example, one Peak Area Adjustment Factor = Peak Area (at 416 cm^"1) ÷ Peak Area (at 749 cm^"1). Once any peak area adjustments have been identified and defined, the Raman spectrographic system is calibrated as follows. The Raman spectrographic instrument is operated using a set of known concentrations of reactant gases for each molecular component of interest and collected in the form of Raman spectra. For each molecular component to be measured, a linear regression model is created that plots the ratio of the integral area of a vibrational band from this molecular component over the integral area of the reference sapphire band, allowing for potential peak area adjustments. This calculation is:

(Area of molecular component band-Area of Reference bandxArea Adjustment factor)

Area of Reference band

The determined ratios are plotted against known concentration values to create a linear regression model that is stored and used for quantitative measurement of production samples. The integrated area between these regions is typically chosen to maximize signal response for each molecular component of interest. The value of the slope from the regression curve is retained and stored as the calibration constant for that molecular component. Other forms of regression are equally applicable. The data acquisition is repeated for all of the other molecular components and for other probes that are to be used.

The components of interest are calibrated for each Pilot™-E probe (or other probe) using sample sets of known concentration for each substance of interest. Any other identification parameters, such as sample identity or sensor (probe) identity, that may be used in the operation of the instrument are also collected.

Determining calibration constants for a particular instrument setup will require calibrating each of the desirable gas components at set pressures and temperatures for a given probe, fiber optics, and Raman instrument. One established approach would be to use a linear regression (or other suitable regression) fit over the desirable concentration range. Gas standards were prepared with different, known concentrations of various components at a set temperature and pressure. Each gas standard was exposed to the

Raman probe and heated to maintain vaporization while pressure was measured with a certified pressure gauge. The spectra obtained were used to perform the appropriate regression fit. Selected vibrational or rotational peaks for each component was measured and used to perform the appropriate regression fit.

For example, in one calibration of a Pilot-E™ probe, a 500 mW, 785 nm diode laser with a 3 m fiber optic cable at 85 psig and 120⁰C was used. These calibration constants were determined for an E probe.

Components Selected Vibration/Rotation CCaalliibl ration Constant

Peak (I/cm)

Tetrachlorosilane (STC) 424 0.04

Dichlorosilane (DCS) 2225 0.04

Hydrogen 1034 0.91

Trichlorosilane (TCS) 2260 0.05

Nitrogen (N₂) 2328 0.40

HCl 2883 0.21

Monochloro silane 2201 0.02

Silane (SiH₄) 2187 0.01 Measuring Chemical Concentrations

Once the instrument is calibrated, it may be used to collect a Raman spectrum of the gases in the feed stream. Peak area ratios for each peak of interest from the Raman spectrum are calculated in accordance with the equation: Peak Area Ratio(i) = (Area of substance band(i)- Area of Reference band x Area Adjustment factor) ÷Area of Reference band. The percent composition of each gas is based on derived calibration constants, where, Output Value (i) = 10Ox Peak Area Ratio(i) x Calibration Constant(i). If normalization of the results is desired, a normalization factor is utilized such that: (Output Value (i) = Output Value(i) ^Normalization Factor). Display, collect, and store quantification data as desired. Calculation of area integrations for each peak was done using available integration techniques. In a preferred embodiment, commercially available GRAMS software (Galactic Industries Corp.) is used, and the trapezoidal rule for integration and a linear baseline correction is used. Other established techniques for area integration can also be applicable. The same integration technique for both the calibration and the monitoring of production runs should be used.

The quantitative monitoring technique described herein may be used to monitor the concentrations of gases in feed streams for a number of chemical processes. In one embodiment, the monitoring technique is useful to monitor and analyze the gases used in a process for the production of high purity polycrystalline silicon. An example of such a process is illustrated in Fig. 2 and described in greater detail in Arvidson et al., US Pub. No. 2008/0056979. In the Arvidson et al. process, a fluidized bed reactor and a Siemens reactor are used to produce polycrystalline silicon.

As shown in Fig. 2, a Siemens feed gas stream 101 is fed to a Siemens reactor 102 containing a U-rod 103. The Siemens feed gas stream may comprise trichlorosilane or other halogenated silanes. The U-rod may comprise two polycrystalline silicon seed rods connected together by a polycrystalline silicon bridge. Polycrystalline silicon is deposited from the feed gas stream 101 onto the U-rod to produce polycrystalline silicon product in rod form 103. The product in rod form 103 is removed from the Siemens reactor 102 at the end of a batch. The vent gas stream 104 from the Siemens reactor may comprise trichlorosilane, silicon tetrachloride, hydrogen, hydrogen chloride and silicon powder.

The vent gas stream 104 is fed into a fruidized bed reactor 105 containing silicon seed particles. This vent gas stream 104 may optionally be supplemented with additional feed gases, with additional inert gases, or both, in supplement stream 106. The supplement stream 106 may comprise additional chlorosilanes. The additional chlorosilanes may comprise trichlorosilane, silicon tetrachloride, or combinations thereof. Polycrystalline silicon is deposited from the feed gas stream(s) 104, 106 onto the silicon seed particles. Polycrystalline silicon product in bead form is removed from the fruidized bed reactor 105 in product stream 107. A vent gas stream 108 may comprise hydrogen, hydrogen chloride, and chlorosilanes, e.g. trichlorosilane and silicon tetrachloride, is removed from the fruidized bed reactor 105 and sent to recovery system

109. Hydrogen may be recovered and sent back to the Siemens reactor 102 through line

110. Chlorosilanes may be recovered through line 111 and recycled or sold. Hydrogen chloride may be recovered and sold. Silicon tetrachloride may be hydrogenated or otherwise converted to trichlorosilane, and the resulting trichlorosilane may be recycled to the Siemens reactor 102.

The quantitative monitoring process as described herein may be used to monitor gases in either or both of the gaseous streams 101 and 106. Each gaseous component should be present in a predetermined concentration to provide a high purity silicon product. Adjustments in the amounts (feed rates) of gaseous components in these feed streams can be made contemporaneously so that any deviations from optimal values can be addressed and corrected.

Having described the invention in detail and by reference to specific embodiments thereof, it will be apparent that modifications and variations are possible without departing from the scope of the invention defined in the appended claims. More specifically, although some aspects of the present invention are identified herein as preferred or particularly advantageous, it is contemplated that the present invention is not necessarily limited to these preferred aspects of the invention.

Claims

1. A method for quantitatively monitoring gas phase materials in a chemical process comprising: providing a gaseous feed stream containing one or more reactant gases of interest; exposing said gaseous feed stream to coherent radiation from a Raman spectroscopic device which has been previously calibrated by selecting peaks in a Raman spectrum for each gas of interest in said gaseous feed stream, each peak including a low frequency point and a high frequency point; collecting Raman spectra for known concentrations for each gas of interest; calculating the peak areas of the selected peaks; selecting a reference peak in a Raman spectrum for a reference material in said Raman spectroscopic device, said reference peak including a low frequency point and a high frequency point; collecting Raman spectra for said reference material; calculating a reference peak area for said reference material; identifying any peak area adjustments due to peak overlap from the selected peaks and said reference peak and removing the contribution to the peak area of said selected peak of said reference peak; calculating the ratios of the selected peak areas for each gas of interest with the reference peak area to establish calibration constants for each gas of interest; acquiring a Raman spectroscopic signal from each of the gaseous components in said feed stream; analyzing said spectroscopic signal to determine the presence and concentration of each of said gaseous components; and displaying the results of said analysis.

2. A method as claimed in claim 1 including adjusting the relative amounts of the gaseous components of said feed stream based on the analysis of said spectrographic signal.

3. A method as claimed in claim 1 in which said peak area adjustment is determined by spectral subtraction, spectral deconvolution, or spectral peak area ratios.

4. A method as claimed in claim 1 in which said peak area adjustment is determined by, selecting a second peak area in the Raman spectra of said reference material that has no overlap with the selected peak, calculating the ratio of the area of said reference peak with said second reference peak to determine a peak area ratio adjustment factor; and applying said peak area adjustment factor to selected peak areas for the gases of interest.

5. A method as claimed in claim 4 in which the calibration constants for each gas of interest are determined by calculating the ratios of the selected peak areas with a selected reference peak area, wherein

Ratio = (Peak Area of Selected Gas - Peak Area of Reference Material x Area Adjustment Factor) ÷ Peak Area of Reference Material; and plotting calculated ratios against known concentration values for the selected gas of interest to create a linear regression model.

6. A method for quantitatively monitoring gas phase materials in a process for making high purity silicon comprising: providing a gaseous feed stream containing one or more of H₂, SiH₄, H₃SiCl, HSiCl₃, H₂SiCl₂, HCl, SiCl₄ or N₂; exposing said gaseous feed stream to radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in said feed stream; analyzing said spectroscopic signal to determine the presence and concentration of each of said gaseous components; and displaying the results of said analysis.

7. A method as claimed in claim 6 including adjusting the relative amounts of the gaseous components of said feed stream based on the analysis of said spectrographic signal.

8. A method as claimed in claim 6 including calibrating said Raman spectroscopic device by: selecting peaks in a Raman spectrum for each gas of interest in said gaseous feed stream, each peak including a low frequency point and a high frequency point; collecting Raman spectra for known concentrations for each gas of interest; calculating the peak areas of the selected peaks; selecting a reference peak in a Raman spectrum for a reference material in said

Raman spectroscopic device, said reference peak including a low frequency point and a high frequency point; collecting Raman spectra for said reference material; calculating a reference peak area for said reference material; identifying any peak area adjustments due to peak overlap from the selected peaks and said reference peak and removing the contribution to the peak area of said selected peak of said reference peak; and calculating the ratios of the selected peak areas for each gas of interest with the reference peak area to establish calibration constants for each gas of interest.

9. A method as claimed in claim 8 in which said peak area adjustment is determined by spectral subtraction, spectral deconvolution, or spectral peak area ratios.

10. A method as claimed in claim 8 in which said peak area adjustment is determined by, selecting a second peak area in the Raman spectra of said reference material that has no overlap with the selected peak, calculating the ratio of the area of said reference peak with said second reference peak to determine a peak area ratio adjustment factor; and applying said peak area adjustment factor to selected peak areas for the gases of interest.

11. A method as claimed in claim 10 in which the calibration constants for each gas of interest are determined by calculating the ratios of the selected peak areas with a selected reference peak area, wherein

Ratio = (Peak Area of Selected Gas - Peak Area of Reference Material x Area

Adjustment Factor) ÷ Peak Area of Reference Material; and plotting calculated ratios against known concentration values for the selected gas of interest to create a linear regression model.

12. A method for producing high purity polycrystalline silicon comprising, providing a gaseous feed stream containing H₂, and at least one silane selected from SiH₄, H₃SiCl, HSiCl₃, H₂SiCl₂, or SiCl₄; reacting the components of said gaseous feed stream to form high purity polycrystalline silicon; contemporaneously with the reaction, monitoring the gases in said gaseous feed stream by, exposing said gaseous feed stream to radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in said feed stream; analyzing said spectroscopic signal to determine the presence and concentration of each of said gaseous components and to detect any deviations from predetermined values for each of said gaseous components; and adjusting the feed rate of any of said gaseous components that deviate from said predetermined values.

13. A method as claimed in claim 12 including adjusting the relative amounts of the gaseous components of said feed stream based on the analysis of said spectrographic signal.

14. A method as claimed in claim 12 including calibrating said Raman spectroscopic device by: selecting peaks in a Raman spectrum for each gas of interest in said gaseous feed stream, each peak including a low frequency point and a high frequency point; collecting Raman spectra for known concentrations for each gas of interest; calculating the peak areas of the selected peaks; selecting a reference peak in a Raman spectrum for a reference material in said Raman spectroscopic device, said reference peak including a low frequency point and a high frequency point; collecting Raman spectra for said reference material; calculating a reference peak area for said reference material; identifying any peak area adjustments due to peak overlap from the selected peaks and said reference peak and removing the contribution to the peak area of said selected peak of said reference peak; and calculating the ratios of the selected peak areas for each gas of interest with the reference peak area to establish calibration constants for each gas of interest.

15. A method as claimed in claim 14 in which said peak area adjustment is determined by spectral subtraction, spectral deconvolution, or spectral peak area ratios.

16. A method as claimed in claim 14 in which said peak area adjustment is determined by, selecting a second peak area in the Raman spectra of said reference material that has no overlap with the selected peak, calculating the ratio of the area of said reference peak with said second reference peak to determine a peak area ratio adjustment factor; and applying said peak area adjustment factor to selected peak areas for the gases of interest.

17. A method as claimed in claim 16 in which the calibration constants for each gas of interest are determined by calculating the ratios of the selected peak areas with a selected reference peak area, wherein

18. A method for quantitatively monitoring gas phase materials in a process for hydrogenating silicon tetrachloride to form at least one of trichlorosilane and dichlorosilane comprising: providing a gaseous feed stream containing H₂ and SiCU; exposing said gaseous feed stream to radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in said feed stream;

analyzing said spectroscopic signal to determine the presence and concentration of each of said gaseous components; and displaying the results of said analysis.

19. A method as claimed in claim 18 including adjusting the relative amounts of the gaseous components of said feed stream based on the analysis of said spectrographic signal.

20. A method as claimed in claim 18 including calibrating said Raman spectroscopic device by: selecting peaks in a Raman spectrum for each gas of interest in said gaseous feed stream, each peak including a low frequency point and a high frequency point; collecting Raman spectra for known concentrations for each gas of interest; calculating the peak areas of the selected peaks; selecting a reference peak in a Raman spectrum for a reference material in said Raman spectroscopic device, said reference peak including a low frequency point and a high frequency point; collecting Raman spectra for said reference material; calculating a reference peak area for said reference material; identifying any peak area adjustments due to peak overlap from the selected peaks and said reference peak and removing the contribution to the peak area of said selected peak of said reference peak; and calculating the ratios of the selected peak areas for each gas of interest with the reference peak area to establish calibration constants for each gas of interest.

21. A method as claimed in claim 20 in which said peak area adjustment is determined by spectral subtraction, spectral deconvolution, or spectral peak area ratios.

22. A method as claimed in claim 20 in which said peak area adjustment is determined by, selecting a second peak area in the Raman spectra of said reference material that has no overlap with the selected peak, calculating the ratio of the area of said reference peak with said second reference peak to determine a peak area ratio adjustment factor; and applying said peak area adjustment factor to selected peak areas for the gases of interest. -Il-

IS. A method as claimed in claim 22 in which the calibration constants for each gas of interest are determined by calculating the ratios of the selected peak areas with a selected reference peak area, wherein