WO2010129459A2 - Carrier for glass substrates - Google Patents
Carrier for glass substrates Download PDFInfo
- Publication number
- WO2010129459A2 WO2010129459A2 PCT/US2010/033355 US2010033355W WO2010129459A2 WO 2010129459 A2 WO2010129459 A2 WO 2010129459A2 US 2010033355 W US2010033355 W US 2010033355W WO 2010129459 A2 WO2010129459 A2 WO 2010129459A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carrier
- elastomer
- glass sheet
- support
- thin glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
- H10P72/7616—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating, a hardness or a material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/48—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/18—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] characterised by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/13613—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit the semiconductor element being formed on a first substrate and thereafter transferred to the final cell substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
Definitions
- This disclosure relates to the manufacture of electronic components on glass substrates (glass sheets) and, in particular, to a carrier for supporting thin substrates during such manufacture.
- glass includes both glass and glass- ceramic materials.
- TFTs thin film transistors
- LCD liquid crystal displays
- OLED organic light emitting diode
- substantially thinner substrates have been produced by glass manufacturers, e.g., substrates having a thickness down to 0.1 millimeters and below.
- substrates having a thickness down to 0.1 millimeters and below In order to be processed, such thin substrates need to be temporarily bonded to a thicker carrier that will release the substrate without damage at the end of the fabrication process.
- the carrier could be reused at least several times without the need for an extensive recycling procedure.
- the carrier/substrate assembly should preferably be suitable for processing using conventional equipment and reagents employed in the manufacture of electronic components, including TFTs. with little or no modification.
- a carrier (31) for a thin glass sheet (7) which has a thickness which is less than or equal to 0.5 millimeters includes:
- the thin glass sheet (7) directly contacts and is releasably bonded to the elastomer's second surface (17);
- an assembly (13) which includes the carrier (31) of the first aspect and a thin glass sheet (7) whose thickness is less than or equal to 0.5 millimeters.
- FIG. 1 is a schematic drawing of an embodiment of a carrier with a thin glass sheet releasably bonded thereto.
- FIG. 2 is a schematic drawing illustrating the removal of a thin glass sheet from the carrier of FIG. 1.
- FTG. 3 is a schematic drawing illustrating experimental apparatus for measuring the adhesion energy between an elastomer and a glass surface.
- FIG. 4 is a graph of carrier failure versus surface roughness for a silicone elastomer having a Shore® A hardness of 10.
- FIG. 5 is a graph of carrier failure versus adhesion energy for the silicone elastomer and Shore A hardness of FIG. 4.
- the adhesion energy was determined for a cylinder composed of polished Pyrex® glass and a cylinder speed of 0.1 metcrs/sccond.
- FIG. 6 is a graph of carrier failure versus surface roughness for a silicone elastomer having a Shore A hardness of 22.
- FIG. 7 is a graph of carrier failure versus adhesion energy for the silicone elastomer and Shore A hardness of FIG. 6. The adhesion energy was determined for a cylinder composed of polished Pyrex glass and a cylinder speed of 0.1 meters/second.
- FIG. 8 is a graph of carrier failure versus surface roughness for a silicone elastomer having a Shore A hardness of 33.
- FIG. 9 is a graph of carrier failure versus adhesion energy for the silicone elastomer and Shore A hardness of FIG. 8. The adhesion energy was determined for a cylinder composed of polished Pyrex glass and a cylinder speed of 0.1 meters/second.
- FIG. 10 is a graph of carrier failure versus surface roughness which combines the data of FIGS. 4, 6, and 8. In this figure, the filled diamonds, open diamonds, and filled triangles represent the 10, 22, and 33 Shore A hardness data, respectively.
- FIG. 11 is a graph of carrier failure versus adhesion energy which combines the data of FIGS. 5, 7, and 9.
- FIGS. 1-3 are not to scale and are not intended to show the relative sizes of the components illustrated.
- the reference numbers used in the figures correspond to the following:
- carrier 31 comprises an elastomer 9 which has a first surface 15 and a second surface 17.
- the first surface 15 is bonded to support 11 and the second surface 17 makes direct contact with glass sheet 7, specifically with surface 25 of glass sheet 7, during use of the carrier.
- electronic components are formed on exposed surface 23 of glass sheet 7.
- Glass sheet 7 can have a variety of compositions. Representative compositions include those used for liquid crystal displays, e.g., Corning Incorporated's EAGLE XG glass, NEG's OA-20 glass, and Asahi's AN-100 glass. Unlike conventional LCD glass, the thickness of glass sheet 7 is less than or equal to 0.5 millimeters, e.g., the thickness can be below 0.1 millimeters.
- the glass can be bare or coated with any polymer or molecule that can provide desired properties, such as, protection from abrasion, modulation of adhesion and/or reduction of fragility. As examples, perfluorooctadecyltrichlorosilane can be used to modulate the glass adhesion to the elastomer and polyimide can be used to reduce glass fragility.
- Support 11 can also have a variety of compositions. Typically, it will be composed of glass, e.g., the same glass as glass sheet 7, but it can also be composed of a different glass or a metal, e.g., stainless steel. Support 11 has a thickness in the range of 1 to 10 times the thickness of glass sheet 7. In one embodiment, support 11 has a thickness in the range of the glass substrates used to manufacture LCD displays, e.g., 0.7 millimeters. Support 11 's length and width can vary widely depending on the size of the thin glass sheet which is to be supported. For reference, Gen 5 substrates used in the manufacture of LCD displays have a surface area for a single side in the range of 1.5 meter 2 .
- Support 11 can have a similar surface area or, depending on the application, a smaller or larger area.
- Elastomer 9 performs the important functions of providing a substantially non- releasable bond with support 11 at surface 15 and a strong but releasable bond with glass sheet 7 at surface 17. Depending on the application, elastomer 9 can cover the entire surface of support 11 or only portions of that surface. Partial coverage can be used to adjust the releasable bond between elastomer 9 and thin glass sheet 7.
- the thickness of elastomer 9 can vary widely, e.g., it can be in the range of 0.1 to several millimeters. The Young's modulus of the elastomer can also be in a broad range.
- the elastomer can be on the order of 1 to 10 MPa, e.g., on the order of 1 to 5 MPa.
- a smooth hydrophobized glass sheet e.g., a glass sheet that has been hydrophobized by vapor deposition of a thin layer of a perfluorosilane (e.g., perfluorodecyltrichlorosilane).
- the elastomer is a non-polar elastomer, examples of which include silicone elastomers, fluorosilicone elastomers and perfluoroelastomers.
- silicone elastomers examples of which include silicone elastomers, fluorosilicone elastomers and perfluoroelastomers.
- perfluoroelastomers are particularly well suited for many applications because of their total replacement of hydrogen atoms by fluorine atoms and their ability to achieve perfect cross- linking, which together lead to low levels of outgassing (e.g., no detectable outgassing after a 1 hour soak at 325 C C) and high levels of thermal and chemical stability, e.g., thermal stability up to 400 0 C and higher chemical durability than silicones and fluorosilicones.
- the perfluoroelastomers can exhibit higher bonding energies to glass than silicone elastomers which can be an additional advantage for some applications depending on the composition of thin glass sheet
- Silicone elastomers have the advantage that their adhesion levels can be simply adjusted by varying the amount of cross-linker used during curing. However, unreacted cross-linker and/or low molecular weight species in the final product may generate unacceptable levels of outgassing during the manufacture of electronic components. As discussed above, perfluoroelastomers are typically free of outgassing issues. [0030] In terms of the substantially non-releasable bond with support 11, depending on the composition of the support, some elastomers can form such a bond by being coated onto the support and cured in place. Adhesion can be promoted by varying the vulcanization rate. See Gent, The Journal of Adhesion, 79, pp315-325, (2003). For other elastomers, an adhesion promoter may be helpful in achieving the requisite level of bonding. See L. Leger, Macromol. Symp. 149, pp 197-205 (2000).
- one or more fluorinated silanes e.g., FDS (perfluorooctadecyltrichlorosilane) may be used as an adhesion promoter.
- FDS perfluorooctadecyltrichlorosilane
- the fluorinated silane can be vapour-deposited on the glass so that the fluorinated chain will penetrate into the perfluoroelastomer and as a result improve adhesion between the elastomer and the glass support.
- An adhesive can also be used to attach the elastomer to the support, but this approach is generally not preferred because of the potential for contamination of electronic components formed on surface 23 of the thin glass sheet 7 during use of the carrier.
- Adhesives differ from adhesion promoters in terms of polymer molecular weight.
- adhesives are generally macromolecular polymers while adhesion promoters are molecular polymers, so that the molecular weights of adhesives are substantially greater than those of adhesion promoters.
- the bond between the elastomer and the support needs to have a peel strength sufficiently high so that the elastomer remains attached to the support as glass sheet 7 is peeled from the elastomer once processing of the carrier/glass sheet assembly has been completed.
- the bond between surface 15 of elastomer 9 and support 11 needs to have a peel strength of at least 0.5 kilonewtons/meter when measured at a peeling speed of 20 millimeters/minute and a peeling angle of 90 degrees to achieve this functionality.
- the peel strength is measured using an INSTRON® machine configured to measure tensile strength. For a given peeling speed and angle, i.e., 20 millimeters/minute and 90 degrees for the interface between elastomer 9 and support 11 , the tensile load is monitored and converted into energy.
- the bond between the elastomer and the thin glass sheet needs to be weaker, but not so weak as to release the glass sheet during processing.
- this challenging balance between, on the one hand, generating enough bonding and, on the other, generating too much bonding can be achieved by ensuring that surface 17 of elastomer 9 has (i) a Shore A hardness in the range of 10-90 and (ii) a roughness less than or equal to 185 nanometers, e.g., a roughness on the order of 100 nanometers or less.
- elastomer 9 can also be characterized by testing under conditions that the carrier/glass sheet assembly will encounter during the manufacture of electronic components and, in particular, the conditions most likely to cause separation between the sheet and the carrier. Those conditions can be effectively approximated by testing samples of the assembly in an ultrasonic (50/60 hertz) acetone bath at 25°C for 20 minutes. The severity of this test is sufficient to distinguish between assemblies that can be used in practice with essentially zero failures and those that cannot. Quantitatively, if more than 45% of the samples survive the test, i.e., if the probability that glass sheet 7 will be retained on surface 17 is greater than 45%, then the failure rate in practice will be essentially zero.
- the bond between thin glass sheet 7 and surface 17 is of the Van der Waals type. Accordingly, removal of the thin glass sheet from surface 17 does little damage to the surface. This, in turn, means that the carrier can be reused, which represents a significant economic advantage since a non-reusable carrier would mean that more material (e.g., more glass in the case where support 11 is made of glass) would be consumed in manufacturing than would end up in the final product (e.g., up to ten times more glass for a support ten times thicker than thin glass sheet 7).
- Apparatus 21 employed in this test includes a plane having an adjustable angle of inclination ⁇ .
- ⁇ layer 27 of the elastomer being tested is affixed to the plane and as shown by the arrow, a cylinder 19 of glass is rolled down the plane.
- This example illustrates the effects of Shore A hardness and surface roughness on the ability of a carrier/glass sheet assembly to withstand the conditions likely to be encountered during the manufacture of electronic components.
- a "robustness" test was performed of the type described above, i.e., samples of the assembly were treated in an ultrasonic (50/60 hertz) acetone bath at 25°C for 20 minutes and the number of samples that failed/survived the test were determined. Due to the severity of the test, a survival probability greater than 45% (failure rate below 55%) was considered acceptable.
- This example compares a silicone elastomer with a perfluoroelastomer in a test intended to simulate the TFT deposition process.
- Carrier/glass sheet assemblies were subjected to two 20 minute exposures to ultrasonic cleaning of the type described in Example 1 above, as well as 5 minutes in concentrated photoresist developer and 14 hours of Au and chrome etching at 27O 0 C. Both the silicone elastomer and the perfluoroelastomer performed well in the ultrasonic cleaning and photoresist tests. The perfluoroelastomer did better than the silicone elastomer in the etching-at-elevated-temperature test, but both were acceptable. After the testing was completed, the glass sheet could be more easily removed from the perfluoroelastomer than from the silicone elastomer.
- silicone elastomers and perfluoroelastomers were compared with regard to thermal stability and outgassing.
- the perfluoroelastomers were stable to temperatures above 425°C, while the silicone elastomers were not.
- an outgassing test no outgassing was observed for a perfluoroelastomer held at 325°C for 1 hour, while a silicone elastomer exhibited outgassing of cyclic siloxanes under the same conditions.
- outgassing from silicone rubber RT622 from Wacker Chemie AG can be drastically reduced by a preheating in a stove (e.g., for 10 hours at 200 0 C). This treatment reduces outgassing during TFT processing.
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Laminated Bodies (AREA)
- Joining Of Glass To Other Materials (AREA)
Abstract
Description
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201080020324.1A CN102422406B (en) | 2009-05-06 | 2010-05-03 | Supports for glass substrates |
| JP2012509867A JP5514302B2 (en) | 2009-05-06 | 2010-05-03 | Carrier for glass substrate |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09305404.7 | 2009-05-06 | ||
| EP09305404 | 2009-05-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2010129459A2 true WO2010129459A2 (en) | 2010-11-11 |
| WO2010129459A3 WO2010129459A3 (en) | 2011-03-03 |
Family
ID=43050795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2010/033355 Ceased WO2010129459A2 (en) | 2009-05-06 | 2010-05-03 | Carrier for glass substrates |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8697228B2 (en) |
| JP (1) | JP5514302B2 (en) |
| KR (1) | KR101561729B1 (en) |
| CN (1) | CN102422406B (en) |
| TW (1) | TWI480153B (en) |
| WO (1) | WO2010129459A2 (en) |
Cited By (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011184284A (en) * | 2009-09-18 | 2011-09-22 | Nippon Electric Glass Co Ltd | Method for producing glass film, method for treating glass film and glass film laminate |
| WO2014133007A1 (en) * | 2013-02-26 | 2014-09-04 | 日本電気硝子株式会社 | Method for manufacturing electronic device |
| WO2014159170A1 (en) | 2013-03-14 | 2014-10-02 | Corning Incorporated | Methods of processing electronic devices |
| EP2932496A4 (en) * | 2012-12-13 | 2016-11-02 | Corning Inc | Glass and methods of making glass articles |
| US9676167B2 (en) | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US9687936B2 (en) | 2013-12-17 | 2017-06-27 | Corning Incorporated | Transparent material cutting with ultrafast laser and beam optics |
| US9701563B2 (en) | 2013-12-17 | 2017-07-11 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US9815730B2 (en) | 2013-12-17 | 2017-11-14 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US9815144B2 (en) | 2014-07-08 | 2017-11-14 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| US9850160B2 (en) | 2013-12-17 | 2017-12-26 | Corning Incorporated | Laser cutting of display glass compositions |
| US9850159B2 (en) | 2012-11-20 | 2017-12-26 | Corning Incorporated | High speed laser processing of transparent materials |
| US10047001B2 (en) | 2014-12-04 | 2018-08-14 | Corning Incorporated | Glass cutting systems and methods using non-diffracting laser beams |
| US10144093B2 (en) | 2013-12-17 | 2018-12-04 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US10173916B2 (en) | 2013-12-17 | 2019-01-08 | Corning Incorporated | Edge chamfering by mechanically processing laser cut glass |
| US10233112B2 (en) | 2013-12-17 | 2019-03-19 | Corning Incorporated | Laser processing of slots and holes |
| US10252931B2 (en) | 2015-01-12 | 2019-04-09 | Corning Incorporated | Laser cutting of thermally tempered substrates |
| US10280108B2 (en) | 2013-03-21 | 2019-05-07 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
| US10335902B2 (en) | 2014-07-14 | 2019-07-02 | Corning Incorporated | Method and system for arresting crack propagation |
| US10421683B2 (en) | 2013-01-15 | 2019-09-24 | Corning Laser Technologies GmbH | Method and device for the laser-based machining of sheet-like substrates |
| US10525657B2 (en) | 2015-03-27 | 2020-01-07 | Corning Incorporated | Gas permeable window and method of fabricating the same |
| US10526234B2 (en) | 2014-07-14 | 2020-01-07 | Corning Incorporated | Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block |
| US10611667B2 (en) | 2014-07-14 | 2020-04-07 | Corning Incorporated | Method and system for forming perforations |
| US11062986B2 (en) | 2017-05-25 | 2021-07-13 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US11097509B2 (en) | 2016-08-30 | 2021-08-24 | Corning Incorporated | Siloxane plasma polymers for sheet bonding |
| US11114309B2 (en) | 2016-06-01 | 2021-09-07 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US11123954B2 (en) | 2014-01-27 | 2021-09-21 | Corning Incorporated | Articles and methods for controlled bonding of thin sheets with carriers |
| US11130701B2 (en) | 2016-09-30 | 2021-09-28 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| US11167532B2 (en) | 2015-05-19 | 2021-11-09 | Corning Incorporated | Articles and methods for bonding sheets with carriers |
| US11186060B2 (en) | 2015-07-10 | 2021-11-30 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| US11192340B2 (en) | 2014-04-09 | 2021-12-07 | Corning Incorporated | Device modified substrate article and methods for making |
| US11331692B2 (en) | 2017-12-15 | 2022-05-17 | Corning Incorporated | Methods for treating a substrate and method for making articles comprising bonded sheets |
| US11535553B2 (en) | 2016-08-31 | 2022-12-27 | Corning Incorporated | Articles of controllably bonded sheets and methods for making same |
| US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
| US11773004B2 (en) | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
| US11774233B2 (en) | 2016-06-29 | 2023-10-03 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| US11905201B2 (en) | 2015-06-26 | 2024-02-20 | Corning Incorporated | Methods and articles including a sheet and a carrier |
| US11999135B2 (en) | 2017-08-18 | 2024-06-04 | Corning Incorporated | Temporary bonding using polycationic polymers |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9601530B2 (en) | 2008-12-02 | 2017-03-21 | Arizona Board Of Regents, A Body Corporated Of The State Of Arizona, Acting For And On Behalf Of Arizona State University | Dual active layer semiconductor device and method of manufacturing the same |
| US9991311B2 (en) | 2008-12-02 | 2018-06-05 | Arizona Board Of Regents On Behalf Of Arizona State University | Dual active layer semiconductor device and method of manufacturing the same |
| US9721825B2 (en) | 2008-12-02 | 2017-08-01 | Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University | Method of providing a flexible semiconductor device and flexible semiconductor device thereof |
| US10543662B2 (en) | 2012-02-08 | 2020-01-28 | Corning Incorporated | Device modified substrate article and methods for making |
| TW201350357A (en) * | 2012-03-21 | 2013-12-16 | Toppan Printing Co Ltd | Thermal transfer recording media, method of manufacturing the same, and thermal transfer recording method |
| US9257339B2 (en) * | 2012-05-04 | 2016-02-09 | Silicon Genesis Corporation | Techniques for forming optoelectronic devices |
| FR2992313B1 (en) * | 2012-06-21 | 2014-11-07 | Eurokera | VITROCERAMIC ARTICLE AND METHOD OF MANUFACTURE |
| TW201402333A (en) * | 2012-07-11 | 2014-01-16 | Cando Corp | Carrier board having release property |
| KR20140023142A (en) | 2012-08-17 | 2014-02-26 | 삼성디스플레이 주식회사 | Method of manufacturing display device and carrier glass |
| KR20140048747A (en) * | 2012-10-16 | 2014-04-24 | 삼성디스플레이 주식회사 | Manufacturing method for display device |
| KR102002959B1 (en) | 2012-11-20 | 2019-07-24 | 삼성디스플레이 주식회사 | Manufacturing method of display panel |
| TWI617437B (en) | 2012-12-13 | 2018-03-11 | 康寧公司 | Facilitated processing for controlling bonding between sheet and carrier |
| US10086584B2 (en) | 2012-12-13 | 2018-10-02 | Corning Incorporated | Glass articles and methods for controlled bonding of glass sheets with carriers |
| US9340443B2 (en) | 2012-12-13 | 2016-05-17 | Corning Incorporated | Bulk annealing of glass sheets |
| US10014177B2 (en) * | 2012-12-13 | 2018-07-03 | Corning Incorporated | Methods for processing electronic devices |
| WO2014151353A1 (en) * | 2013-03-15 | 2014-09-25 | Corning Incorporated | Bulk annealing of glass sheets |
| US20140342148A1 (en) * | 2013-05-15 | 2014-11-20 | Corning Incorporated | Glass structures and methods of creating and processing glass structures |
| KR101500949B1 (en) * | 2013-05-20 | 2015-03-10 | 주식회사 비아트론 | Transportation Module of Glass Substrate |
| KR102038986B1 (en) | 2013-05-28 | 2019-11-01 | 삼성디스플레이 주식회사 | Glass laminate, display panel on carrier glass substrate, display device, method of manufacturing glass laminate, and method for manufacturing display panel |
| JP6246346B2 (en) | 2013-06-20 | 2017-12-13 | ショット グラス テクノロジーズ (スゾウ) カンパニー リミテッドSchott Glass Technologies (Suzhou) Co., Ltd. | Thin glass bonded article on support substrate, method for its production and use thereof |
| KR20150001006A (en) | 2013-06-26 | 2015-01-06 | 삼성디스플레이 주식회사 | Glass film laminate, method of manufacturing the same, and method of manufacturing glass film |
| US9126452B2 (en) * | 2013-07-29 | 2015-09-08 | Xerox Corporation | Ultra-fine textured digital lithographic imaging plate and method of manufacture |
| US10510576B2 (en) | 2013-10-14 | 2019-12-17 | Corning Incorporated | Carrier-bonding methods and articles for semiconductor and interposer processing |
| WO2017034644A2 (en) | 2015-06-09 | 2017-03-02 | ARIZONA BOARD OF REGENTS a body corporate for THE STATE OF ARIZONA for and on behalf of ARIZONA STATE UNIVERSITY | Method of providing an electronic device and electronic device thereof |
| WO2015156891A2 (en) | 2014-01-23 | 2015-10-15 | Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University | Method of providing a flexible semiconductor device and flexible semiconductor device thereof |
| US10381224B2 (en) | 2014-01-23 | 2019-08-13 | Arizona Board Of Regents On Behalf Of Arizona State University | Method of providing an electronic device and electronic device thereof |
| JP6312469B2 (en) * | 2014-03-13 | 2018-04-18 | 株式会社アルバック | Substrate adsorption / detachment mechanism, substrate transfer device, and vacuum device |
| KR102466741B1 (en) | 2014-05-13 | 2022-11-15 | 아리조나 보드 오브 리젠츠 온 비하프 오브 아리조나 스테이트 유니버시티 | Method of providing an electronic device |
| JP6260869B2 (en) * | 2014-06-13 | 2018-01-17 | 日本電気硝子株式会社 | Manufacturing method of glass film and manufacturing method of electronic device including the glass film |
| US10446582B2 (en) | 2014-12-22 | 2019-10-15 | Arizona Board Of Regents On Behalf Of Arizona State University | Method of providing an imaging system and imaging system thereof |
| US9741742B2 (en) | 2014-12-22 | 2017-08-22 | Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University | Deformable electronic device and methods of providing and using deformable electronic device |
| JP6938543B2 (en) | 2016-05-06 | 2021-09-22 | コーニング インコーポレイテッド | Laser cutting and removal of contoured shapes from transparent substrates |
| KR20190035805A (en) | 2016-07-29 | 2019-04-03 | 코닝 인코포레이티드 | Apparatus and method for laser processing |
| KR102423775B1 (en) | 2016-08-30 | 2022-07-22 | 코닝 인코포레이티드 | Laser processing of transparent materials |
| US10752534B2 (en) | 2016-11-01 | 2020-08-25 | Corning Incorporated | Apparatuses and methods for laser processing laminate workpiece stacks |
| US10688599B2 (en) | 2017-02-09 | 2020-06-23 | Corning Incorporated | Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines |
| US10626040B2 (en) | 2017-06-15 | 2020-04-21 | Corning Incorporated | Articles capable of individual singulation |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4395451A (en) * | 1980-07-14 | 1983-07-26 | Althouse Victor E | Semiconductor wafer and die handling method and means |
| JP3081122B2 (en) | 1994-07-18 | 2000-08-28 | シャープ株式会社 | Jig for transporting substrate and method of manufacturing liquid crystal display element using the same |
| US6687969B1 (en) | 1997-05-16 | 2004-02-10 | Micron Technology, Inc. | Methods of fixturing flexible substrates and methods of processing flexible substrates |
| US5972152A (en) | 1997-05-16 | 1999-10-26 | Micron Communications, Inc. | Methods of fixturing flexible circuit substrates and a processing carrier, processing a flexible circuit and processing a flexible circuit substrate relative to a processing carrier |
| US6451396B1 (en) * | 1998-02-13 | 2002-09-17 | Gore Enterprise Holdings, Inc. | Flexure endurant composite elastomer compositions |
| KR20010109278A (en) * | 1999-01-11 | 2001-12-08 | 추후기재 | polymer-coated thin glass film substrates |
| EP1048628A1 (en) * | 1999-04-30 | 2000-11-02 | Schott Glas | Polymer coated glassfoil substrate |
| DE10117880B4 (en) | 2001-04-10 | 2009-01-29 | Mühlbauer Ag | Method for separating electronic components from a composite |
| US6934001B2 (en) | 2001-08-13 | 2005-08-23 | Sharp Laboratories Of America, Inc. | Structure and method for supporting a flexible substrate |
| TWI250190B (en) | 2001-10-03 | 2006-03-01 | Dow Corning Toray Silicone | Adhesive sheet of cross-linked silicone, method of manufacturing thereof, and device |
| US6634686B2 (en) | 2001-10-03 | 2003-10-21 | Applied Materials, Inc. | End effector assembly |
| JP2003195246A (en) * | 2001-12-14 | 2003-07-09 | Internatl Business Mach Corp <Ibm> | Fixing device, method for fixing substrate, and apparatus and method for manufacturing liquid crystal display panel using the same |
| US6801940B1 (en) * | 2002-01-10 | 2004-10-05 | Networks Associates Technology, Inc. | Application performance monitoring expert |
| JP4134907B2 (en) | 2002-03-05 | 2008-08-20 | 株式会社日立プラントテクノロジー | Substrate holding method in vacuum, liquid crystal display device manufacturing method, substrate holding device, liquid crystal display device manufacturing apparatus |
| US6596569B1 (en) * | 2002-03-15 | 2003-07-22 | Lucent Technologies Inc. | Thin film transistors |
| US20050136625A1 (en) | 2002-07-17 | 2005-06-23 | Debora Henseler | Ultra-thin glass devices |
| JP2004186201A (en) * | 2002-11-29 | 2004-07-02 | Sekisui Chem Co Ltd | How to handle thin glass panels |
| FR2850390B1 (en) | 2003-01-24 | 2006-07-14 | Soitec Silicon On Insulator | METHOD FOR REMOVING A PERIPHERAL GLUE ZONE WHEN MANUFACTURING A COMPOSITE SUBSTRATE |
| JP2006522475A (en) | 2003-04-02 | 2006-09-28 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Flexible electronic device and method of manufacturing a flexible device |
| DE10348946B4 (en) * | 2003-10-18 | 2008-01-31 | Schott Ag | Machining compound for a substrate |
| GB0326537D0 (en) * | 2003-11-14 | 2003-12-17 | Koninkl Philips Electronics Nv | Flexible devices |
| US7698730B2 (en) * | 2004-03-16 | 2010-04-13 | Riverbed Technology, Inc. | Service detection |
| US10284571B2 (en) * | 2004-06-28 | 2019-05-07 | Riverbed Technology, Inc. | Rule based alerting in anomaly detection |
| DE102004037902A1 (en) * | 2004-08-05 | 2006-03-16 | Robert Bosch Gmbh | Method for depositing an anti-adhesion layer |
| JP4535937B2 (en) * | 2005-05-27 | 2010-09-01 | 大日本印刷株式会社 | Substrate housing |
| CN101242951B (en) | 2005-08-09 | 2012-10-31 | 旭硝子株式会社 | Sheet glass laminate and method of manufacturing display device using the sheet glass laminate |
| JP2007251080A (en) | 2006-03-20 | 2007-09-27 | Fujifilm Corp | Fixing method of plastic substrate, circuit board and manufacturing method thereof |
| KR100831562B1 (en) * | 2006-03-23 | 2008-05-21 | 주식회사 엘지화학 | Adhesive composition for conveying flexible substrate |
| CN101437772B (en) | 2006-05-08 | 2011-09-07 | 旭硝子株式会社 | Thin plate glass laminate, process for producing display device using thin plate glass laminate, and support glass substrate |
| KR20090037856A (en) | 2006-07-12 | 2009-04-16 | 아사히 가라스 가부시키가이샤 | Method for manufacturing display device using glass substrate with protective glass, glass substrate with protective glass and silicone for release paper |
| WO2008111361A1 (en) | 2007-03-12 | 2008-09-18 | Asahi Glass Company, Limited | Glass substrate provided with protection glass and method for manufacturing display device using glass substrate provided with protection glass |
| JP5336051B2 (en) * | 2007-04-16 | 2013-11-06 | スリーエム イノベイティブ プロパティズ カンパニー | Perfluoroelastomer composition and sealing material |
| US7627572B2 (en) * | 2007-05-02 | 2009-12-01 | Mypoints.Com Inc. | Rule-based dry run methodology in an information management system |
| KR20120059512A (en) | 2009-08-27 | 2012-06-08 | 아사히 가라스 가부시키가이샤 | Multilayer structure with flexible base material and support, panel for use in electronic device provided with support and production method for panel for use in electronic device |
| US9847243B2 (en) * | 2009-08-27 | 2017-12-19 | Corning Incorporated | Debonding a glass substrate from carrier using ultrasonic wave |
| JP5562597B2 (en) | 2009-08-28 | 2014-07-30 | 荒川化学工業株式会社 | SUPPORT, GLASS SUBSTRATE LAMINATE, DISPLAY DEVICE PANEL WITH SUPPORT AND METHOD FOR PRODUCING DISPLAY DEVICE PANEL |
| CN102202994B (en) | 2009-08-31 | 2014-03-12 | 旭硝子株式会社 | Peeling device |
-
2010
- 2010-05-03 CN CN201080020324.1A patent/CN102422406B/en not_active Expired - Fee Related
- 2010-05-03 JP JP2012509867A patent/JP5514302B2/en not_active Expired - Fee Related
- 2010-05-03 WO PCT/US2010/033355 patent/WO2010129459A2/en not_active Ceased
- 2010-05-03 US US12/772,416 patent/US8697228B2/en not_active Expired - Fee Related
- 2010-05-03 KR KR1020117029212A patent/KR101561729B1/en not_active Expired - Fee Related
- 2010-05-06 TW TW099114552A patent/TWI480153B/en not_active IP Right Cessation
Cited By (60)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011184284A (en) * | 2009-09-18 | 2011-09-22 | Nippon Electric Glass Co Ltd | Method for producing glass film, method for treating glass film and glass film laminate |
| US9850159B2 (en) | 2012-11-20 | 2017-12-26 | Corning Incorporated | High speed laser processing of transparent materials |
| EP2932496A4 (en) * | 2012-12-13 | 2016-11-02 | Corning Inc | Glass and methods of making glass articles |
| US11028003B2 (en) | 2013-01-15 | 2021-06-08 | Corning Laser Technologies GmbH | Method and device for laser-based machining of flat substrates |
| US11345625B2 (en) | 2013-01-15 | 2022-05-31 | Corning Laser Technologies GmbH | Method and device for the laser-based machining of sheet-like substrates |
| US10421683B2 (en) | 2013-01-15 | 2019-09-24 | Corning Laser Technologies GmbH | Method and device for the laser-based machining of sheet-like substrates |
| WO2014133007A1 (en) * | 2013-02-26 | 2014-09-04 | 日本電気硝子株式会社 | Method for manufacturing electronic device |
| JP2014194541A (en) * | 2013-02-26 | 2014-10-09 | Nippon Electric Glass Co Ltd | Manufacturing method of electronic device |
| WO2014159170A1 (en) | 2013-03-14 | 2014-10-02 | Corning Incorporated | Methods of processing electronic devices |
| EP2974534A4 (en) * | 2013-03-14 | 2017-04-05 | Corning Incorporated | Methods of processing electronic devices |
| US10280108B2 (en) | 2013-03-21 | 2019-05-07 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
| US11713271B2 (en) | 2013-03-21 | 2023-08-01 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
| US10179748B2 (en) | 2013-12-17 | 2019-01-15 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US10293436B2 (en) | 2013-12-17 | 2019-05-21 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US10144093B2 (en) | 2013-12-17 | 2018-12-04 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US10173916B2 (en) | 2013-12-17 | 2019-01-08 | Corning Incorporated | Edge chamfering by mechanically processing laser cut glass |
| US9676167B2 (en) | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US10183885B2 (en) | 2013-12-17 | 2019-01-22 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US10233112B2 (en) | 2013-12-17 | 2019-03-19 | Corning Incorporated | Laser processing of slots and holes |
| US11148225B2 (en) | 2013-12-17 | 2021-10-19 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US9687936B2 (en) | 2013-12-17 | 2017-06-27 | Corning Incorporated | Transparent material cutting with ultrafast laser and beam optics |
| US9850160B2 (en) | 2013-12-17 | 2017-12-26 | Corning Incorporated | Laser cutting of display glass compositions |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US9815730B2 (en) | 2013-12-17 | 2017-11-14 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US10442719B2 (en) | 2013-12-17 | 2019-10-15 | Corning Incorporated | Edge chamfering methods |
| US9701563B2 (en) | 2013-12-17 | 2017-07-11 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US10611668B2 (en) | 2013-12-17 | 2020-04-07 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US10597321B2 (en) | 2013-12-17 | 2020-03-24 | Corning Incorporated | Edge chamfering methods |
| US11123954B2 (en) | 2014-01-27 | 2021-09-21 | Corning Incorporated | Articles and methods for controlled bonding of thin sheets with carriers |
| US11192340B2 (en) | 2014-04-09 | 2021-12-07 | Corning Incorporated | Device modified substrate article and methods for making |
| US9815144B2 (en) | 2014-07-08 | 2017-11-14 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| US11697178B2 (en) | 2014-07-08 | 2023-07-11 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| US10611667B2 (en) | 2014-07-14 | 2020-04-07 | Corning Incorporated | Method and system for forming perforations |
| US10526234B2 (en) | 2014-07-14 | 2020-01-07 | Corning Incorporated | Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block |
| US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
| US10335902B2 (en) | 2014-07-14 | 2019-07-02 | Corning Incorporated | Method and system for arresting crack propagation |
| US10047001B2 (en) | 2014-12-04 | 2018-08-14 | Corning Incorporated | Glass cutting systems and methods using non-diffracting laser beams |
| US11014845B2 (en) | 2014-12-04 | 2021-05-25 | Corning Incorporated | Method of laser cutting glass using non-diffracting laser beams |
| US10252931B2 (en) | 2015-01-12 | 2019-04-09 | Corning Incorporated | Laser cutting of thermally tempered substrates |
| US11773004B2 (en) | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
| US10525657B2 (en) | 2015-03-27 | 2020-01-07 | Corning Incorporated | Gas permeable window and method of fabricating the same |
| US11167532B2 (en) | 2015-05-19 | 2021-11-09 | Corning Incorporated | Articles and methods for bonding sheets with carriers |
| US11660841B2 (en) | 2015-05-19 | 2023-05-30 | Corning Incorporated | Articles and methods for bonding sheets with carriers |
| US11905201B2 (en) | 2015-06-26 | 2024-02-20 | Corning Incorporated | Methods and articles including a sheet and a carrier |
| US11186060B2 (en) | 2015-07-10 | 2021-11-30 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| US11114309B2 (en) | 2016-06-01 | 2021-09-07 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US11774233B2 (en) | 2016-06-29 | 2023-10-03 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| US12122138B2 (en) | 2016-08-30 | 2024-10-22 | Corning Incorporated | Siloxane plasma polymers for sheet bonding |
| US11097509B2 (en) | 2016-08-30 | 2021-08-24 | Corning Incorporated | Siloxane plasma polymers for sheet bonding |
| US11535553B2 (en) | 2016-08-31 | 2022-12-27 | Corning Incorporated | Articles of controllably bonded sheets and methods for making same |
| US12344548B2 (en) | 2016-08-31 | 2025-07-01 | Corning Incorporated | Methods for making controllably bonded sheets |
| US11130701B2 (en) | 2016-09-30 | 2021-09-28 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
| US11062986B2 (en) | 2017-05-25 | 2021-07-13 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US11972993B2 (en) | 2017-05-25 | 2024-04-30 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US11999135B2 (en) | 2017-08-18 | 2024-06-04 | Corning Incorporated | Temporary bonding using polycationic polymers |
| US11331692B2 (en) | 2017-12-15 | 2022-05-17 | Corning Incorporated | Methods for treating a substrate and method for making articles comprising bonded sheets |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI480153B (en) | 2015-04-11 |
| US20110111194A1 (en) | 2011-05-12 |
| TW201107131A (en) | 2011-03-01 |
| CN102422406B (en) | 2014-07-09 |
| WO2010129459A3 (en) | 2011-03-03 |
| CN102422406A (en) | 2012-04-18 |
| KR101561729B1 (en) | 2015-10-19 |
| JP5514302B2 (en) | 2014-06-04 |
| KR20120023063A (en) | 2012-03-12 |
| US8697228B2 (en) | 2014-04-15 |
| JP2012526393A (en) | 2012-10-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8697228B2 (en) | Carrier for glass substrates | |
| US9847243B2 (en) | Debonding a glass substrate from carrier using ultrasonic wave | |
| KR101502792B1 (en) | Releasing sheet, polarizing plate having the releasing sheet attached thereto, and substrateless double-sided adhesive sheet | |
| US7955703B2 (en) | Silicone rubber based pressure sensitive adhesive sheet | |
| JP2832084B2 (en) | Flexible polysiloxane with pressure sensitive adhesive | |
| JP5835214B2 (en) | LAMINATE MANUFACTURING METHOD AND LAMINATE | |
| JP4289630B2 (en) | Wafer support glass | |
| CN1684796A (en) | Adhesive tape and edging method using same | |
| TWI799618B (en) | Adhesive tape for dicing and method of manufacturing semiconductor wafer | |
| JP2020531926A (en) | Hard coating film with multi-layer structure and polyimide film containing it | |
| KR102841521B1 (en) | Adhesive tape for dicing and method for manufacturing semiconductor chips | |
| US6581446B1 (en) | Determination of adhesion strength of HVOF coating by spherical indentation | |
| TWI536490B (en) | Wafer support glass substrate | |
| KR101989905B1 (en) | Silicon based coating composition and silicon based release film | |
| WO2023181648A1 (en) | Composition for temporary fixation, adhesive for temporary fixation, and method for producing thin wafer | |
| CN104419341B (en) | The manufacturing method of cutting adhesive tape and semiconductor chip | |
| TW202003736A (en) | Adhesive sheet | |
| KR101924445B1 (en) | Silicon-based adhesive tape and method of preparing the same | |
| TWI655682B (en) | Adhesive tape for dicing and manufacturing method of semiconductor wafer | |
| JP7387111B2 (en) | Substrate-free adhesive tape with different adhesive properties on both sides and method for manufacturing the same | |
| JP2022531879A (en) | Silicon-based adhesive protective film and optical members including it | |
| CN117203297A (en) | bring | |
| US11193208B2 (en) | Wafer/support arrangement, method for producing the arrangement, and use of the arrangement in the processing of the wafer | |
| US20210269610A1 (en) | Silicone rubber molded body and production method for the same | |
| US20230192957A1 (en) | Modified polybenzoxazole, modified polybenzoxazole sheet, cleaning sheet, and transfer member provided with cleaning function |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WWE | Wipo information: entry into national phase |
Ref document number: 201080020324.1 Country of ref document: CN |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10772639 Country of ref document: EP Kind code of ref document: A2 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2012509867 Country of ref document: JP |
|
| ENP | Entry into the national phase |
Ref document number: 20117029212 Country of ref document: KR Kind code of ref document: A |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 10772639 Country of ref document: EP Kind code of ref document: A2 |


