WO2010077845A2 - Method for laser processing glass with a chamfered edge - Google Patents
Method for laser processing glass with a chamfered edge Download PDFInfo
- Publication number
- WO2010077845A2 WO2010077845A2 PCT/US2009/067988 US2009067988W WO2010077845A2 WO 2010077845 A2 WO2010077845 A2 WO 2010077845A2 US 2009067988 W US2009067988 W US 2009067988W WO 2010077845 A2 WO2010077845 A2 WO 2010077845A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser
- laser beam
- workpiece
- chamfer
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/042—Automatically aligning the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/04—Cutting or splitting in curves, especially for making spectacle lenses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/08—Severing cooled glass by fusing, i.e. by melting through the glass
- C03B33/082—Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
Definitions
- the field of the technical subject matter relates to laser machining glass or glass- like articles.
- it relates to laser machining an article with a chamfer on an edge that adjoins the top or bottom surface of the article or on a feature laser machined into the article.
- it relates to laser machining glass or glass-like article with a chamfer in a single manufacturing operation
- chamfered features in glass or glass-like articles such as sapphire, ceramic or glass ceramics is desirable because adding a chamfer to an edge makes the edge safer, in the sense that it is less likely to cause cuts or scratches when handled, makes it less likely to chip or crack and in general, makes the edge stronger.
- chamfered edges are desirable, no methods exist for creating an article with a chamfered edge in one manufacturing operation.
- Prior art methods of producing chamfered edges involve creating a feature such as a through cut or trench in one operation and then producing a chamfer in one or more additional steps.
- a chamfer is a bevel created on an edge formed by two adjoining surfaces.
- FIG 1 shows a schematic cross-section of an article 10 produced without a chamfer.
- the sides 24, 26 have been formed by machining the article from the top surface 20 to the bottom surface 22. Note the edges 12, 14, 16 and 18 where the top surface 20 and the bottom surface 22 adjoin the sides 24, 26.
- Fig 2 shows the same article 10 except with chamfers 32, 34 applied to the edges where the top surface 20 adjoins the sides 24, 26. Note that chamfers could also be applied to the edges 18, 16 where the bottom surface 22 adjoins the sides 24, 26 in the place of or in addition to the top surface chamfers 32, 34. In addition to straight beveled chamfers as shown in Fig 2, rounded chamfers are sometimes desirable.
- Fig 3 shows the same article 10 with rounded chamfers 52, 54 where the top surface 20 adjoins the sides 24, 26.
- Glass cutting has been traditionally realized by a mechanical saw approach, which scribes the glass and follows this step with a mechanical breaking process step.
- laser technology has been adopted for glass cutting, which typically employs a laser as a localized heating source, sometimes accompanied by a cooling nozzle, to generate stress and microcracks along the trajectories described by the passage of the laser beam to cut the glass.
- Such resultant stress and microcracks may either be sufficient to cause the glass to fracture and separate along the designed trajectories or may require a follow-up breaking step to separate the glass.
- US Patent 6,143,382 Glass Substrate Having Fine Holes describes a method of drilling fine holes in glass but this method requires doping the glass with silver atoms to promote absorption of the laser energy.
- Another US patent, No. 6,756,563 System and Method for Forming Holes in Substrates Containing Glass describes a method of forming holes in glass substrates. Neither of these approaches discusses forming a chamfer on the finished hole.
- US patent application 2006/0127640 Glass Substrate With Fine Holes And Method For Producing The Same discusses drilling holes in a glass substrate with a laser and subsequently using a wet etch with strong acid to form rounded edges on the holes, but this involves adding one or more operations which add additional operations and equipment to the manufacturing process.
- the instant invention is a method for forming chamfered features in glass or glass-like materials in one manufacturing operation.
- one manufacturing operation we mean the article being processed is f ⁇ xtured on a laser processing machine, the desired feature is laser machined into the article and one or more of the resultant feature edges are chamfered using the same laser processing equipment that formed the feature prior to the article being removed from the machine. While adding the chamfer in this fashion necessarily adds a step to the manufacturing operation, the additional time required is minimized because the chamfer is added while the article is still fixtured on the laser processing machine, thereby eliminating the need to remove the article from the machine, fixture the part on a different machine and then produce the chamfer.
- Producing a feature and chamfer in one operation eliminates the need to refixture the article and eliminate the need for an additional machine to perform the operation, thereby reducing the time and expense required to produce an article with chamfered edges.
- the laser parameters can be varied to produce chamfers of different sizes and shapes without changing the equipment or f ⁇ xturing.
- a desired level of surface smoothness and finish can be achieved without additional manufacturing operations or equipment.
- FIG 4 An embodiment of the instant invention is shown in Fig 4, a top-down view of an article 60 being laser machined from a blank 62 of glass or glass-like material.
- the dotted lines 64, 66, 68 are three representative paths to be followed by a laser beam.
- the laser beam would trace up to N paths, where N can vary between 1 and typically less than 100, around the article 60 to be machined between lines 64 and 68, varying the laser parameters to vary the depth of cut and thereby create a chamfer.
- the actual number of paths would depend on the desired size and finish of the chamfer.
- the laser parameters would be adjusted to enable the laser to cut completely through the blank 62 to achieve complete separation of the article 60 from the blank 62.
- Fig 5 shows a cross sectional view of the article 60 being laser machined from a blank 62, showing a cross section taken along line 70 from Fig 4.
- Fig 5 shows multiple laser beams 72, 74, 76 representing three of N possible paths impinging the blank 62 perpendicular to the top surface 78.
- Figs 6a, b, c and d show the progression of cuts made by the laser beams in the blank 62.
- Fig 6a shows the beginning chamfer 90 in the blank 62 after the first one or more laser cuts by the laser following paths as shown in Figs 4 and 5.
- Figure 6b shows the chamfer 92 after more laser cuts along paths.
- Figure 6c shows the completed chamfer 94.
- the laser beam has cut through the blank 62 to form the article 60 with appropriate chamfers on the edges.
- the chamfer in this case is asymmetric, with the bevel towards the article 60.
- the chamfer can be made symmetric, or made smaller or larger or curved as desired. This method works with materials that are transparent or opaque to the wavelength of laser radiation used to machine the materials.
- Figs 12a and b show an embodiment of the current invention being used to form chamfers in materials transparent to laser radiation of the wavelength used.
- the laser beam 142 is focused so as to concentrate laser energy sufficient to ablate material initially at the surface 143 of the bulk material 146 at a constant angle ⁇ (alpha).
- the laser beam is angled with respect to the surface but kept perpendicular to the path 140.
- the focal point is set to be a constant distance from the bottom of the kerf as it progresses through the material being machined, rather than at the machining surface. Since the material is transparent to laser radiation, only the material at the focal point is ablated.
- Fig 7a shows the beginning chamfer 100 made by focusing the laser beam at the surface of the transparent material 108.
- Fig 7b shows the chamfer 102 being cut more deeply into the material by focusing the laser beam below the surface of the material and moving along a path as in Figs 4 and 5.
- Fig 7c the chamfer 104 is complete.
- Fig 7d the laser is moved along a path directly one or more times over the cut 107 beginning at the end of chamfer 104. The laser is focused more deeply with each pass over the cut 107 until the article 109 is separated from the bulk material 108.
- the chamfer could be machined into the bottom surface of the article. This is accomplished by adjusting the laser beam focal spot to be within the material being machined. By adjusting the laser parameters so that the fluence of the laser beam is lower than the ablation threshold of the material except at the focal spot, where the fluence of the beam in J/cm 2 is greater than the ablation threshold.
- FIGs 8a and b A further embodiment of the instant invention is shown in Figs 8a and b.
- the laser beam is moved along paths as shown in Fig 4, however, the angle at which the laser impinges the material is varied with the location of the path on or in the material.
- Fig 8a shows three representative laser beams and angles, with laser beam 110 at angle ⁇ l, laser beam 112 at angle ⁇ 2 and laser beam 114 at angle ⁇ N, where N is an integer and angle ⁇ N > ⁇ 2 > ⁇ l .
- Fig 8b shows a top-down view with one representative path 116 shown on the bulk material 118.
- the arrows, one of which is indicated 119, on the path indicate that the angle that the laser beam impinges the material 118 is always perpendicular to the path 116 as the article 117 is machined from the bulk material 118.
- the advantage of this approach is that it permits better control over the quality of the finish of the chamfer with fewer passes, but requires an apparatus that is able to control the angle of the laser beam with respect to the workpiece.
- Fig 9 shows a further embodiment of the instant invention.
- Fig 9 is a side view showing laser beams 120, 122, and 124 impinging on bulk material 128.
- the mechanism (not shown) moving the laser beam along a path with respect to the material does not change its path, rather the angle at which the laser beam is directed to the material is altered.
- the laser beam is pivoted about point 126 as it travels around a path on the bulk material 128, but only in a plane perpendicular to the path. This allows more control over the shape and size of the chamfer, but at the cost of slightly more complex mechanism.
- Fig 10 shows a chamfer 130 machined into bulk material 128 using this method.
- Fig 11 shows an article 129 separated from bulk material 128 by machining cuts 132 which extend from the bottom of the chamfer to the bottom of the material 128 by machining the material with a laser beam 121 which is perpendicular to the surface.
- FIG 12a shows another embodiment of the instant invention. This embodiment works with materials that are transparent to the wavelengths of light used to machine the material.
- the laser beam (not shown) is moved along a path 140 on the bulk material 146.
- the arrows indicate that the angle the laser beam has with respect to the material is always perpendicular to the path.
- Fig 12b shows the laser beam 142 at an angle ⁇ with respect to the material.
- Figs 7a-d show a chamfer 100, 102, and 104 laser machined into the material by focusing the laser more and more deeply with each pass along the path, thereby ablating material and machining the chamfer.
- the chamfer could be machined into either the top surface 143 or the bottom surface 144.
- Fig 1 shows an article following laser machining.
- Fig 2 (Prior Art) shows an article following laser machining and chamfering.
- Fig 3 shows an article following laser machining and chamfering with a rounded chamfer.
- Fig 4 shows exemplary paths for laser machining chamfers in one manufacturing step.
- Fig 5 shows laser beams impinging perpendicularly on material to be laser machined.
- Fig 6a shows the beginning of a laser machined chamfer.
- Fig 6b shows further laser machining of a chamfer.
- Fig 6c shows a complete laser machined chamfer.
- Fig 6d shows a laser machined chamfer with final separating cuts.
- Fig 7a shows the beginning of a chamfer laser machined into transparent material.
- Fig 7b shows further laser machining of a chamfer in transparent material.
- Fig 7c shows completed laser machining of a chamfer in transparent material.
- Fig 7d shows a laser machined chamfer in transparent material with final separating cuts.
- Fig 8a shows a further embodiment of the instant invention using angled laser beams.
- Fig 8b shows how angled laser beams are arranged with respect to the laser beam paths.
- Fig 9 shows another embodiment of the instant invention using angled laser beams that share a single path.
- Fig 10 shows laser machined chamfers.
- Fig 11 shows laser machined chamfers with a final cut.
- Fig 12a shows another embodiment using an angled laser beam along a single path to machine chamfers.
- Fig 12b shows an example angle used in the embodiment from Fig 12a.
- One of the goals of the instant invention is to permit laser machining of chamfered features in glass or glass-like materials in one manufacturing operation.
- An exemplary machine that can produce a and control a laser beam capable of ablating glass and glass-like materials, fixture the materials and move the laser beam(s) with respect to the material is the MM5800 laser micromachining system produced by Electro Scientific Industries, Inc., Portland, OR, the assignee of the instant invention.
- the laser beam can be either continuous wave (CW) or pulsed.
- Laser parameters which are controlled to provide the desired ablation rate include wavelength, average power, spatial distribution, spot size and speed of travel. In the case of pulsed lasers, pulse width, pulse energy, pulse temporal distribution and repetition rate can be controlled to provide the desired ablation.
- Laser wavelengths can range from infrared (IR), such as 10.6 micron wavelengths emitted by CO2 lasers down to frequency tripled or quadrupled solid state laser which operate in the ultraviolet (UV) range below 355 nm. Average power can range up to tens of Watts. Spatial distribution can either be Gaussian, modified or clipped Gaussian or shaped distributions such as "top hat” or annular. See for example US Patent 6,791,060 Beam Shaping and Projection Imaging with Solid State UV Gaussian Beam to Form Vias, assigned to the assignee of the instant invention. Spot sizes can typically range from a few microns to more than 100 microns.
- Exemplary rates of travel for the laser beam with respect to the material surface being ablated can range from a few mm/s to 500 mm/s depending upon the amount of material to be removed.
- pulse width can range from femtosecond pulses up to tens of nanoseconds.
- Pulse energy can range from a few microJoules per pulse to hundreds of milliJoules, depending upon the pulse width.
- Pulses can have Gaussian temporal distribution or be shaped or sliced to have faster rise and/or fall time. Pulses can also be produced with more complex tailored temporal distribution.
- an article 60 is to be machined from a blank 62 of glass or glass-like material.
- the assumption is that this material is opaque to the wavelength of laser light used.
- a laser beam 72 is directed perpendicular to the top surface 78 of a blank 62 and focused so that the laser power exceeds the ablation threshold of the material to be machined at the point where the laser beam impinges the material.
- the laser beam is then directed to begin ablating material along a path 64 parallel to the final through-cut which will separate the article 60 from the blank 62.
- the laser beam is directed to follow this path one or more times until the desired amount of material is ablated.
- Fig 6a begins chamfers 90.
- the laser beam is the directed to follow a path adjacent to the one previously followed, for example path 66, to ablate more material.
- the laser parameters are adjusted to ablate more material with each adjacent pass. For example, the laser power could be increased, the pulse width could be increased, or the number of passes around the path could be increased or some combination of these or other parameter changes could be controlled to form the chamfer.
- Fig 6b intermediate chamfer 92. This is repeated until a path such as path 68 is reached, yielding the result shown in Fig 6c as completed chamfer 94.
- Figs 12a and b illustrate another embodiment of the instant invention.
- This embodiment requires that the glass or glass-like material be transparent to the wavelength of laser radiation used to ablate the material 146.
- the laser follows a single path 140 around the article 147 to be chamfered.
- the laser beam 142 is angled to match the angle ⁇ of the desired chamfer with respect to the surface 143 of the bulk material 146.
- the arrows, one of which is indicated 145, on the path 140 indicate that the laser beam is held to be perpendicular to the path 140 while being angled with respect to a surface 143 of the bulk material 146. Machining a chamfer may require several passes around the path by the laser beam 142. This embodiment requires that the laser beam parameters be adjusted so as to make the laser beam fluence, measured in J/cm 2 , greater than the ablation threshold of the material only at the focal spot and not elsewhere within the beam. With each pass the laser focal point is adjusted to be deeper in the material as the material is removed so as to ablate material at the bottom of the kerf.
- Figs 7a-d illustrate this process. In Fig 7a the first pass has begun machining the chamfer 100.
- the focal point of the laser beam 142 is adjusted to move the ablation point deeper into the material as more passes around the path 140 are taken to machine more material from the bottom of the kerf 102 that will form the chamfer.
- the kerf 104 forming the chamfer is complete.
- the laser beam focal spot (not shown) is adjusted to move perpendicular to the surface 143 of the material 109 to form the cut 107 which separates the article 109 from the bulk material 108 as the laser beam is focused deeper into the material 109 with each pass. Note that in the case of material that is transparent to the wavelength of laser radiation used, the cuts may form a chamfer (not shown) on the bottom surface 144 of the article 109.
- a laser beam makes multiple passes along multiple adjacent paths to form a chamfer, changing the angle at which the laser beam impinges the material as the path changes.
- laser beams 110, 112 and 114 show how the angle with which the laser beam impinges the bulk material 118 changes with respect to the top surface 115.
- Fig 8a shows a top view of this embodiment, showing a sample path 116 separating the bulk material 118 from the article to be machined 117, with the arrows indicating that the laser beam is at an angle to the top surface 115 but perpendicular to the path 116.
- This embodiment can make it easier to form curved or multiple beveled chamfers but requires additional equipment to vary the angle of the laser beam with respect to the workpiece in a controlled fashion.
- the laser beam angle is varied with respect to the workpiece.
- the equipment that changes the angle of the laser beam with respect to the workpiece is designed to change the angle of the laser beam in a plane about a point at a fixed distance from the workpiece.
- the equipment that changes the angle will rotate to keep the plane within which the laser beam changes angle perpendicular to the path that the laser beam follows on the workpiece. This arrangement will be made clearer by referring to Fig 9.
- the laser beam 120, 122, 124 changes angle about a point 126.
- the point 126 is moved with respect to the bulk material 128 along a path (not shown), maintaining a fixed relationship between the point 126 and the surface of the material 125 so that the point 126 is directly above the path.
- Several passes are then made, with the laser beam 120, 122, 124 changing angle as the chamfer is machined.
- the laser beam focal point is changed as material is removed to maintain the focal point at the surface of the bulk material 128.
- Figs 10 and 11 show a chamfer 130 machined with this embodiment.
- the cut that separates the article 129 from the bulk material 128 is made by holding the laser beam 121 perpendicular to the surface of the material 125 and making passes around the path until the article 129 is separated from the bulk material 128 by a cut 132.
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- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
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- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
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- Laser Beam Processing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011542322A JP5432285B2 (en) | 2008-12-17 | 2009-12-15 | Method of laser processing glass into a shape with chamfered edges |
| SG2011044591A SG172237A1 (en) | 2008-12-17 | 2009-12-15 | Method for laser processing glass with a chamfered edge |
| CN200980153523.7A CN102271860B (en) | 2008-12-17 | 2009-12-15 | Method for laser processing glass with chamfered edges |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/336,609 US9346130B2 (en) | 2008-12-17 | 2008-12-17 | Method for laser processing glass with a chamfered edge |
| US12/336,609 | 2008-12-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2010077845A2 true WO2010077845A2 (en) | 2010-07-08 |
| WO2010077845A3 WO2010077845A3 (en) | 2010-09-30 |
Family
ID=42239280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2009/067988 Ceased WO2010077845A2 (en) | 2008-12-17 | 2009-12-15 | Method for laser processing glass with a chamfered edge |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9346130B2 (en) |
| JP (1) | JP5432285B2 (en) |
| KR (1) | KR20110120862A (en) |
| CN (1) | CN102271860B (en) |
| SG (1) | SG172237A1 (en) |
| TW (1) | TWI561483B (en) |
| WO (1) | WO2010077845A2 (en) |
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| WO2013011877A1 (en) * | 2011-07-20 | 2013-01-24 | 旭硝子株式会社 | Plate glass, manufacturing method therefor, and device for manufacturing said plate glass |
| WO2015018425A1 (en) | 2013-08-07 | 2015-02-12 | Trumpf Laser- Und Systemtechnik Gmbh | Method for processing a plate-like workpiece having a transparent, glass, glass-like, ceramic, and/or crystalline layer, severing device for such a workpiece, and product from such a workpiece |
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| US11927988B2 (en) | 2020-03-28 | 2024-03-12 | Apple Inc. | Glass cover member for an electronic device enclosure |
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| US8706288B2 (en) * | 2009-05-21 | 2014-04-22 | Electro Scientific Industries, Inc. | Apparatus and method for non-contact sensing of transparent articles |
| JP5770446B2 (en) * | 2010-09-30 | 2015-08-26 | 株式会社ディスコ | Split method |
| JP5758116B2 (en) * | 2010-12-16 | 2015-08-05 | 株式会社ディスコ | Split method |
| DE102011000529B3 (en) * | 2011-02-07 | 2012-04-05 | Lpkf Laser & Electronics Ag | Introducing through hole in substrate by electromagnetic radiation, comprises predetermining cutting line for cutting polygonal surface along through hole, which is introduced by corner points of connected side lines in substrate |
| US10357850B2 (en) | 2012-09-24 | 2019-07-23 | Electro Scientific Industries, Inc. | Method and apparatus for machining a workpiece |
| JP2015511571A (en) | 2012-02-28 | 2015-04-20 | エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド | Method and apparatus for the separation of tempered glass and products produced thereby |
| US9828278B2 (en) | 2012-02-28 | 2017-11-28 | Electro Scientific Industries, Inc. | Method and apparatus for separation of strengthened glass and articles produced thereby |
| WO2013130608A1 (en) * | 2012-02-29 | 2013-09-06 | Electro Scientific Industries, Inc. | Methods and apparatus for machining strengthened glass and articles produced thereby |
| US10052848B2 (en) | 2012-03-06 | 2018-08-21 | Apple Inc. | Sapphire laminates |
| JP5991860B2 (en) * | 2012-06-19 | 2016-09-14 | 三星ダイヤモンド工業株式会社 | Glass substrate processing method |
| US9221289B2 (en) * | 2012-07-27 | 2015-12-29 | Apple Inc. | Sapphire window |
| WO2014022681A1 (en) * | 2012-08-01 | 2014-02-06 | Gentex Corporation | Assembly with laser induced channel edge and method thereof |
| KR101355807B1 (en) * | 2012-09-11 | 2014-02-03 | 로체 시스템즈(주) | Curve cutting method for non-metallic materials |
| WO2014079478A1 (en) | 2012-11-20 | 2014-05-30 | Light In Light Srl | High speed laser processing of transparent materials |
| WO2014097885A1 (en) * | 2012-12-18 | 2014-06-26 | 住友化学株式会社 | Manufacturing method for optical display device and manufacturing system for optical display device |
| US20140175684A1 (en) * | 2012-12-20 | 2014-06-26 | Apple Inc. | Methods and Equipment for Trimming Polarizers in Displays |
| EP2754524B1 (en) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Method of and apparatus for laser based processing of flat substrates being wafer or glass element using a laser beam line |
| WO2014130830A1 (en) * | 2013-02-23 | 2014-08-28 | Raydiance, Inc. | Shaping of brittle materials with controlled surface and bulk properties |
| US20140263211A1 (en) * | 2013-03-15 | 2014-09-18 | Apple Inc. | Methods for Trimming Display Polarizers Using Lasers |
| EP2781296B1 (en) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Device and method for cutting out contours from flat substrates using a laser |
| JP6233407B2 (en) * | 2013-03-26 | 2017-11-22 | 旭硝子株式会社 | Glass plate processing method and glass plate processing apparatus |
| DE102013005136A1 (en) * | 2013-03-26 | 2014-10-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for removing brittle-hard material by means of laser radiation |
| US20150059411A1 (en) * | 2013-08-29 | 2015-03-05 | Corning Incorporated | Method of separating a glass sheet from a carrier |
| KR101399838B1 (en) * | 2013-10-08 | 2014-05-29 | 주식회사 고려반도체시스템 | Method of finishing side surfaces of transparent substrate for display device and finishing apparatus using same |
| US9154678B2 (en) | 2013-12-11 | 2015-10-06 | Apple Inc. | Cover glass arrangement for an electronic device |
| US10442719B2 (en) | 2013-12-17 | 2019-10-15 | Corning Incorporated | Edge chamfering methods |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US9676167B2 (en) | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US20150165560A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Laser processing of slots and holes |
| US9701563B2 (en) | 2013-12-17 | 2017-07-11 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US9850160B2 (en) | 2013-12-17 | 2017-12-26 | Corning Incorporated | Laser cutting of display glass compositions |
| WO2015113026A2 (en) * | 2014-01-27 | 2015-07-30 | Corning Incorporated | Edge chamfering by mechanically processing laser cut glass |
| US9815730B2 (en) | 2013-12-17 | 2017-11-14 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US10293436B2 (en) | 2013-12-17 | 2019-05-21 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| JP6324719B2 (en) * | 2013-12-27 | 2018-05-16 | 三星ダイヤモンド工業株式会社 | Glass substrate chamfering method and laser processing apparatus |
| US9776906B2 (en) * | 2014-03-28 | 2017-10-03 | Electro Scientific Industries, Inc. | Laser machining strengthened glass |
| TWI730945B (en) | 2014-07-08 | 2021-06-21 | 美商康寧公司 | Methods and apparatuses for laser processing materials |
| EP3169479B1 (en) | 2014-07-14 | 2019-10-02 | Corning Incorporated | Method of and system for arresting incident crack propagation in a transparent material |
| CN107073641B (en) | 2014-07-14 | 2020-11-10 | 康宁股份有限公司 | Interface blocks; systems and methods for dicing substrates transparent in the wavelength range using such interface blocks |
| WO2016010949A1 (en) | 2014-07-14 | 2016-01-21 | Corning Incorporated | Method and system for forming perforations |
| KR20170028943A (en) * | 2014-07-14 | 2017-03-14 | 코닝 인코포레이티드 | System for and method of processing transparent materials using laser beam focal lines adjustable in length and diameter |
| CN107148324A (en) * | 2014-08-28 | 2017-09-08 | Ipg光子公司 | Multiple laser systems and methods for dicing and post-dicing machining of hard dielectric materials |
| JP6303950B2 (en) * | 2014-09-19 | 2018-04-04 | 旭硝子株式会社 | Glass plate processing method |
| US10047001B2 (en) | 2014-12-04 | 2018-08-14 | Corning Incorporated | Glass cutting systems and methods using non-diffracting laser beams |
| CN107406293A (en) | 2015-01-12 | 2017-11-28 | 康宁股份有限公司 | The substrate through heat tempering is cut by laser using Multiphoton Absorbtion method |
| US20160232438A1 (en) * | 2015-02-06 | 2016-08-11 | American Express Travel Related Services Company, Inc. | Ceramic-containing transaction cards |
| US11773004B2 (en) | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
| KR20170131638A (en) | 2015-03-27 | 2017-11-29 | 코닝 인코포레이티드 | Gas Permeable Glass Window and Method of Making the Same |
| JP6654813B2 (en) * | 2015-06-02 | 2020-02-26 | 川崎重工業株式会社 | Chamfering apparatus and chamfering method |
| TW201704177A (en) * | 2015-06-10 | 2017-02-01 | 康寧公司 | Method for etching glass substrate and glass substrate |
| US10406634B2 (en) * | 2015-07-01 | 2019-09-10 | Apple Inc. | Enhancing strength in laser cutting of ceramic components |
| WO2017011296A1 (en) | 2015-07-10 | 2017-01-19 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| US10442720B2 (en) * | 2015-10-01 | 2019-10-15 | AGC Inc. | Method of forming hole in glass substrate by using pulsed laser, and method of producing glass substrate provided with hole |
| JP6938543B2 (en) | 2016-05-06 | 2021-09-22 | コーニング インコーポレイテッド | Laser cutting and removal of contoured shapes from transparent substrates |
| US10410883B2 (en) | 2016-06-01 | 2019-09-10 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US10794679B2 (en) | 2016-06-29 | 2020-10-06 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| KR20190035805A (en) | 2016-07-29 | 2019-04-03 | 코닝 인코포레이티드 | Apparatus and method for laser processing |
| KR102423775B1 (en) | 2016-08-30 | 2022-07-22 | 코닝 인코포레이티드 | Laser processing of transparent materials |
| US10730783B2 (en) | 2016-09-30 | 2020-08-04 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| KR102428350B1 (en) | 2016-10-24 | 2022-08-02 | 코닝 인코포레이티드 | Substrate processing station for laser-based machining of sheet-like glass substrates |
| US10752534B2 (en) | 2016-11-01 | 2020-08-25 | Corning Incorporated | Apparatuses and methods for laser processing laminate workpiece stacks |
| US10688599B2 (en) | 2017-02-09 | 2020-06-23 | Corning Incorporated | Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US10580725B2 (en) | 2017-05-25 | 2020-03-03 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| JP7006022B2 (en) * | 2017-05-29 | 2022-01-24 | 株式会社アイシン | Chamfering method |
| US10626040B2 (en) | 2017-06-15 | 2020-04-21 | Corning Incorporated | Articles capable of individual singulation |
| MX2020003516A (en) * | 2017-10-04 | 2020-10-28 | Saint Gobain | Composite glass pane having chamfered through-hole. |
| EP3470936B1 (en) * | 2017-10-16 | 2020-06-03 | The Swatch Group Research and Development Ltd | Method for cutting timepiece glass |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| TW201946882A (en) | 2018-05-07 | 2019-12-16 | 美商康寧公司 | Laser-induced separation of transparent oxide glass |
| DE102018216873A1 (en) * | 2018-10-01 | 2020-04-02 | Trumpf Werkzeugmaschinen Gmbh + Co. Kg | Method and device for machining a workpiece |
| TWI678342B (en) * | 2018-11-09 | 2019-12-01 | 財團法人工業技術研究院 | Cutting method for forming chamfered corners |
| CN109570778B (en) * | 2018-12-29 | 2021-05-04 | 大族激光科技产业集团股份有限公司 | A kind of laser processing method and laser processing system of hard and brittle material |
| EP3685954B1 (en) * | 2019-01-22 | 2024-01-24 | Synova S.A. | Method for cutting a workpiece with a complex fluid-jet-guided laser beam |
| WO2020173970A1 (en) * | 2019-02-25 | 2020-09-03 | Wsoptics Technologies Gmbh | Process for the blasting machining of a plate-like or tubular workpiece |
| WO2020262702A1 (en) * | 2019-06-28 | 2020-12-30 | Hoya株式会社 | Method for manufacturing glass plate and method for manufacturing magnetic disk |
| JP6822699B1 (en) * | 2019-09-24 | 2021-01-27 | フェニックス電機株式会社 | Laser irradiation device and surface roughening treatment method using it |
| CN111085730A (en) * | 2019-12-18 | 2020-05-01 | 成都四威高科技产业园有限公司 | Fillet machining method for precision assembly part |
| DE102020100051A1 (en) | 2020-01-03 | 2021-07-08 | Schott Ag | Process for processing hard, brittle materials |
| KR102286402B1 (en) * | 2020-02-04 | 2021-08-05 | 주식회사 이코니 | manufacturing method of ultra thin glass |
| EP4200101B1 (en) * | 2020-08-21 | 2025-02-19 | TRUMPF Werkzeugmaschinen SE + Co. KG | Method for producing at least one workpiece part and a residual workpiece from a workpiece |
| WO2022203983A1 (en) * | 2021-03-24 | 2022-09-29 | Applied Materials, Inc. | Methods to dice optical devices with optimization of laser pulse spatial distribution |
| KR102897959B1 (en) * | 2021-04-01 | 2025-12-10 | 삼성디스플레이 주식회사 | Method of manufacturing a window and manufacturing apparatus of the same |
| DE102021116398A1 (en) * | 2021-06-24 | 2022-12-29 | Schott Ag | Element of brittle material with textured edge, intermediate product and method of making the element |
| DE112022005605T5 (en) * | 2021-11-25 | 2024-10-17 | Nippon Electric Glass Co., Ltd. | METHOD FOR PRODUCING A TRANSPARENT ELEMENT, TRANSPARENT ELEMENT AND WINDOW COMPONENT FOR OPTICAL ELEMENT |
| DE102022104791A1 (en) * | 2022-03-01 | 2023-09-07 | TRUMPF Werkzeugmaschinen SE + Co. KG | Process for processing a plate or tube-shaped workpiece |
| CN114473218A (en) * | 2022-04-01 | 2022-05-13 | 深圳光远智能装备股份有限公司 | Silicon wafer chamfering process for photovoltaic industry |
| CN115494659B (en) * | 2022-08-10 | 2025-07-08 | 北京兆维电子(集团)有限责任公司 | Detection method and system for liquid crystal display panel |
| CN116652406A (en) * | 2023-06-07 | 2023-08-29 | 苏州光盾信息技术有限公司 | A kind of glass processing method and glass product thereof |
| CN119870764B (en) * | 2025-01-14 | 2026-03-03 | 西安中科微精光子科技股份有限公司 | Laser-based method, apparatus, equipment, and medium for machining valve sleeve throttling square holes. |
Family Cites Families (87)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4702042A (en) | 1984-09-27 | 1987-10-27 | Libbey-Owens-Ford Co. | Cutting strengthened glass |
| US4828900A (en) | 1987-12-23 | 1989-05-09 | Ppg Industries, Inc. | Discrete glass cutting and edge shaping |
| GB2227965B (en) * | 1988-10-12 | 1993-02-10 | Rolls Royce Plc | Apparatus for drilling a shaped hole in a workpiece |
| DE69133169D1 (en) | 1990-05-09 | 2003-01-16 | Canon Kk | Method for creating a structure and method for preparing a semiconducting device using this method |
| RU2024441C1 (en) | 1992-04-02 | 1994-12-15 | Владимир Степанович Кондратенко | Process of cutting of nonmetal materials |
| US5637244A (en) * | 1993-05-13 | 1997-06-10 | Podarok International, Inc. | Method and apparatus for creating an image by a pulsed laser beam inside a transparent material |
| JPH08108287A (en) * | 1994-10-07 | 1996-04-30 | Seiji Ishibe | Chamfering method |
| US5665134A (en) | 1995-06-07 | 1997-09-09 | Hughes Missile Systems Company | Laser machining of glass-ceramic materials |
| US6373026B1 (en) | 1996-07-31 | 2002-04-16 | Mitsubishi Denki Kabushiki Kaisha | Laser beam machining method for wiring board, laser beam machining apparatus for wiring board, and carbonic acid gas laser oscillator for machining wiring board |
| DE69629704T2 (en) | 1995-08-31 | 2004-07-08 | Corning Inc. | METHOD AND DEVICE FOR BREAKING BRITTLE MATERIAL |
| US6820330B1 (en) | 1996-12-13 | 2004-11-23 | Tessera, Inc. | Method for forming a multi-layer circuit assembly |
| US5973290A (en) | 1997-02-26 | 1999-10-26 | W. L. Gore & Associates, Inc. | Laser apparatus having improved via processing rate |
| JP3957010B2 (en) | 1997-06-04 | 2007-08-08 | 日本板硝子株式会社 | Glass substrate with micropores |
| US6577472B2 (en) | 1997-07-24 | 2003-06-10 | Hitachi, Ltd. | Glass substrate for a magnetic disk, a magnetic disk which can be formed with a stable texture |
| DE19741329C1 (en) | 1997-09-19 | 1998-10-22 | Fraunhofer Ges Forschung | Treatment of materials with high energy radiation inducing a plasma |
| JPH11134645A (en) | 1997-10-30 | 1999-05-21 | Hoya Corp | Glass substrate for information record medium and its production |
| JP3449201B2 (en) | 1997-11-28 | 2003-09-22 | 日亜化学工業株式会社 | Method for manufacturing nitride semiconductor device |
| DE19905571C1 (en) * | 1999-02-11 | 2000-11-16 | Bosch Gmbh Robert | Process for creating conical holes using a laser beam |
| DE10029110B4 (en) | 1999-06-15 | 2006-05-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for material processing and use thereof |
| US6795274B1 (en) | 1999-09-07 | 2004-09-21 | Asahi Glass Company, Ltd. | Method for manufacturing a substantially circular substrate by utilizing scribing |
| AU2001228239A1 (en) | 2000-01-27 | 2001-08-07 | National Research Council Of Canada | Method and apparatus for repair of defects in materials with short laser pulses |
| JP4627893B2 (en) * | 2000-03-07 | 2011-02-09 | 株式会社アマダエンジニアリングセンター | Laser processing method and apparatus |
| JP2001274441A (en) | 2000-03-23 | 2001-10-05 | Mitsubishi Heavy Ind Ltd | Method for collectively cutting solar battery panel |
| US20010035447A1 (en) | 2000-05-05 | 2001-11-01 | Andreas Gartner | Methods for laser cut initiation |
| JP2001354439A (en) | 2000-06-12 | 2001-12-25 | Matsushita Electric Ind Co Ltd | Glass substrate processing method and high frequency circuit manufacturing method |
| JP4786783B2 (en) | 2000-08-18 | 2011-10-05 | 日本板硝子株式会社 | Method for cutting glass plate and glass disk for recording medium |
| JP4659300B2 (en) | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | Laser processing method and semiconductor chip manufacturing method |
| JP3722731B2 (en) | 2000-09-13 | 2005-11-30 | 浜松ホトニクス株式会社 | Laser processing method |
| US20020033558A1 (en) | 2000-09-20 | 2002-03-21 | Fahey Kevin P. | UV laser cutting or shape modification of brittle, high melting temperature target materials such as ceramics or glasses |
| JP4150155B2 (en) | 2000-10-10 | 2008-09-17 | 株式会社日立製作所 | Information recording medium, information recording method, reproducing method, recording / recording apparatus, and information reproducing apparatus |
| US6962279B1 (en) | 2000-10-18 | 2005-11-08 | Ge Medical Systems Global Technology Company, Llc | Apparatus and method for glass separation for flat panel displays |
| JP4512786B2 (en) | 2000-11-17 | 2010-07-28 | 独立行政法人産業技術総合研究所 | Glass substrate processing method |
| JP3802442B2 (en) | 2000-12-01 | 2006-07-26 | エルジー電子株式会社 | Glass cutting method and apparatus |
| US20030044539A1 (en) | 2001-02-06 | 2003-03-06 | Oswald Robert S. | Process for producing photovoltaic devices |
| JP2002241141A (en) | 2001-02-08 | 2002-08-28 | Nippon Steel Techno Research Corp | Working method for glass by means of laser and device therefor |
| JP4631196B2 (en) | 2001-04-04 | 2011-02-16 | ソニー株式会社 | Glass substrate manufacturing method and glass substrate manufacturing apparatus |
| WO2003002289A1 (en) | 2001-06-28 | 2003-01-09 | Electro Scientific Industries, Inc. | Multistep laser processing of wafers supporting surface device layers |
| US6642476B2 (en) * | 2001-07-23 | 2003-11-04 | Siemens Automative Corporation | Apparatus and method of forming orifices and chamfers for uniform orifice coefficient and surface properties by laser |
| US6521862B1 (en) | 2001-10-09 | 2003-02-18 | International Business Machines Corporation | Apparatus and method for improving chamfer quality of disk edge surfaces with laser treatment |
| US6642477B1 (en) | 2001-10-23 | 2003-11-04 | Imra America, Inc. | Method for laser drilling a counter-tapered through-hole in a material |
| KR100633488B1 (en) | 2001-11-08 | 2006-10-13 | 샤프 가부시키가이샤 | Method and device for parting glass substrate, and liquid crystal panel manufacturing device |
| JP2003160348A (en) | 2001-11-21 | 2003-06-03 | Nippon Sheet Glass Co Ltd | Glass substrate for information recording medium and its manufacturing method |
| US6720519B2 (en) | 2001-11-30 | 2004-04-13 | Matsushita Electric Industrial Co., Ltd. | System and method of laser drilling |
| JP2003226551A (en) | 2002-02-05 | 2003-08-12 | Nippon Sheet Glass Co Ltd | Glass substrate having fine pore and production method therefor |
| JP4267240B2 (en) | 2002-02-22 | 2009-05-27 | 日本板硝子株式会社 | Manufacturing method of glass structure |
| US6756563B2 (en) | 2002-03-07 | 2004-06-29 | Orbotech Ltd. | System and method for forming holes in substrates containing glass |
| FR2839508B1 (en) | 2002-05-07 | 2005-03-04 | Saint Gobain | GLAZING CUTTING WITHOUT RIPPING |
| KR100497820B1 (en) | 2003-01-06 | 2005-07-01 | 로체 시스템즈(주) | Glass-plate cutting machine |
| US7023001B2 (en) | 2003-03-31 | 2006-04-04 | Institut National D'optique | Method for engraving materials using laser etched V-grooves |
| JP2004299969A (en) | 2003-03-31 | 2004-10-28 | Toshiba Ceramics Co Ltd | How to slice silica glass |
| JP2004343008A (en) | 2003-05-19 | 2004-12-02 | Disco Abrasive Syst Ltd | Workpiece division method using laser beam |
| US6949449B2 (en) | 2003-07-11 | 2005-09-27 | Electro Scientific Industries, Inc. | Method of forming a scribe line on a ceramic substrate |
| US20050087522A1 (en) * | 2003-10-24 | 2005-04-28 | Yunlong Sun | Laser processing of a locally heated target material |
| JP2005268752A (en) | 2004-02-19 | 2005-09-29 | Canon Inc | Laser cleaving method, member to be cleaved, and semiconductor element chip |
| FI120082B (en) | 2004-03-18 | 2009-06-30 | Antti Salminen | Process for processing materials with high power frequency electromagnetic radiation |
| DE102004020737A1 (en) | 2004-04-27 | 2005-11-24 | Lzh Laserzentrum Hannover E.V. | Device for cutting components from brittle materials with stress-free component mounting |
| DE102004024475A1 (en) | 2004-05-14 | 2005-12-01 | Lzh Laserzentrum Hannover E.V. | Method and device for separating semiconductor materials |
| US7060933B2 (en) * | 2004-06-08 | 2006-06-13 | Igor Troitski | Method and laser system for production of laser-induced images inside and on the surface of transparent material |
| MX2007001159A (en) | 2004-07-30 | 2007-09-25 | Mitsuboshi Diamond Ind Co Ltd | Vertical crack forming method and vertical crack forming device in substrate. |
| US7598167B2 (en) | 2004-08-24 | 2009-10-06 | Micron Technology, Inc. | Method of forming vias in semiconductor substrates without damaging active regions thereof and resulting structures |
| US7378342B2 (en) | 2004-08-27 | 2008-05-27 | Micron Technology, Inc. | Methods for forming vias varying lateral dimensions |
| US7528342B2 (en) | 2005-02-03 | 2009-05-05 | Laserfacturing, Inc. | Method and apparatus for via drilling and selective material removal using an ultrafast pulse laser |
| US20070012665A1 (en) | 2005-07-12 | 2007-01-18 | Hewlett-Packard Development Company Lp | Laser ablation |
| JP2007290011A (en) | 2006-04-26 | 2007-11-08 | Seiko Epson Corp | Substrate and substrate cutting method, electro-optical device, electronic apparatus |
| US8394301B2 (en) | 2006-06-02 | 2013-03-12 | Electro Scientific Industries, Inc. | Process for forming panel with an optically transmissive portion and products related thereto |
| US20080093775A1 (en) | 2006-08-19 | 2008-04-24 | Colorado State University Research Foundation | Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light |
| DE102006046313B3 (en) | 2006-09-29 | 2008-01-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for structuring fiber optic line along longitudinal axis e.g., for telecommunications, involves passing laser beam through focusing optics onto surface of fiber |
| US8530784B2 (en) | 2007-02-01 | 2013-09-10 | Orbotech Ltd. | Method and system of machining using a beam of photons |
| DE102007009786B4 (en) | 2007-02-27 | 2013-09-05 | Schott Ag | Coated toughened glass, process for its manufacture and its use |
| US7982162B2 (en) | 2007-05-15 | 2011-07-19 | Corning Incorporated | Method and apparatus for scoring and separating a brittle material with a single beam of radiation |
| US20080290077A1 (en) | 2007-05-22 | 2008-11-27 | Demeritt Jeffery Alan | Separation of transparent glasses and systems and methods therefor |
| US8710402B2 (en) * | 2007-06-01 | 2014-04-29 | Electro Scientific Industries, Inc. | Method of and apparatus for laser drilling holes with improved taper |
| US20090020511A1 (en) | 2007-07-17 | 2009-01-22 | Kommera Swaroop K | Ablation |
| US20090045179A1 (en) | 2007-08-15 | 2009-02-19 | Ellen Marie Kosik Williams | Method and system for cutting solid materials using short pulsed laser |
| CN101610870B (en) | 2007-10-16 | 2013-09-11 | 三星钻石工业股份有限公司 | U-groove processing method of brittle material substrate and removal processing method, drilling processing method and chamfering method using the method |
| WO2009078406A1 (en) | 2007-12-18 | 2009-06-25 | Hoya Corporation | Cover glass for portable terminal, method for manufacturing cover glass for portable terminal, and portable terminal apparatus |
| US20090212030A1 (en) | 2008-02-25 | 2009-08-27 | Optisolar, Inc., A Delaware Corporation | Autofocus for Ablation Laser |
| JP5826027B2 (en) | 2008-03-21 | 2015-12-02 | イムラ アメリカ インコーポレイテッド | Laser-based material processing method and system |
| TWI414383B (en) * | 2008-06-25 | 2013-11-11 | Mitsuboshi Diamond Ind Co Ltd | Angle processing device |
| JP5670901B2 (en) | 2008-08-08 | 2015-02-18 | コーニング インコーポレイテッド | Tempered glass article and manufacturing method thereof |
| WO2010074091A1 (en) | 2008-12-25 | 2010-07-01 | 旭硝子株式会社 | Method and device for cutting brittle-material plate, and window glass for vehicle |
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2008
- 2008-12-17 US US12/336,609 patent/US9346130B2/en not_active Expired - Fee Related
-
2009
- 2009-12-15 CN CN200980153523.7A patent/CN102271860B/en not_active Expired - Fee Related
- 2009-12-15 KR KR1020117013883A patent/KR20110120862A/en not_active Withdrawn
- 2009-12-15 SG SG2011044591A patent/SG172237A1/en unknown
- 2009-12-15 WO PCT/US2009/067988 patent/WO2010077845A2/en not_active Ceased
- 2009-12-15 JP JP2011542322A patent/JP5432285B2/en not_active Expired - Fee Related
- 2009-12-16 TW TW098143094A patent/TWI561483B/en not_active IP Right Cessation
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| US11460892B2 (en) | 2020-03-28 | 2022-10-04 | Apple Inc. | Glass cover member for an electronic device enclosure |
| US11927988B2 (en) | 2020-03-28 | 2024-03-12 | Apple Inc. | Glass cover member for an electronic device enclosure |
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| US12065372B2 (en) | 2020-12-17 | 2024-08-20 | Apple Inc. | Fluid forming a glass component for a portable electronic device |
| US12195379B2 (en) | 2020-12-17 | 2025-01-14 | Apple Inc. | Forming and bonding of glass components for portable electronic devices |
| WO2022140541A1 (en) * | 2020-12-23 | 2022-06-30 | Apple Inc. | Laser-based cutting of transparent components for an electronic device |
| US11945048B2 (en) | 2020-12-23 | 2024-04-02 | Apple Inc. | Laser-based cutting of transparent components for an electronic device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI561483B (en) | 2016-12-11 |
| US9346130B2 (en) | 2016-05-24 |
| TW201033144A (en) | 2010-09-16 |
| CN102271860A (en) | 2011-12-07 |
| KR20110120862A (en) | 2011-11-04 |
| JP5432285B2 (en) | 2014-03-05 |
| US20100147813A1 (en) | 2010-06-17 |
| SG172237A1 (en) | 2011-07-28 |
| WO2010077845A3 (en) | 2010-09-30 |
| JP2012512131A (en) | 2012-05-31 |
| CN102271860B (en) | 2016-08-31 |
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