WO2010054969A1 - Apparatus and method for optically measuring by interferometry the thickness of an object - Google Patents
Apparatus and method for optically measuring by interferometry the thickness of an object Download PDFInfo
- Publication number
- WO2010054969A1 WO2010054969A1 PCT/EP2009/064608 EP2009064608W WO2010054969A1 WO 2010054969 A1 WO2010054969 A1 WO 2010054969A1 EP 2009064608 W EP2009064608 W EP 2009064608W WO 2010054969 A1 WO2010054969 A1 WO 2010054969A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radiations
- radiation source
- radiation
- external surface
- reflected
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200980145096.8A CN102209878B (en) | 2008-11-13 | 2009-11-04 | Apparatus and method for optically measuring by interferometry the thickness of an object |
JP2011535968A JP2012508869A (en) | 2008-11-13 | 2009-11-04 | Apparatus and method for optically measuring the thickness of an object by interferometry |
EP09744692.6A EP2366092B1 (en) | 2008-11-13 | 2009-11-04 | Apparatus and method for optically measuring by interferometry the thickness of an object |
ES09744692.6T ES2545107T3 (en) | 2008-11-13 | 2009-11-04 | Apparatus and procedure for measuring optically by means of interferometry the thickness of an object |
US13/127,467 US20110222072A1 (en) | 2008-11-13 | 2009-11-04 | Apparatus and method for optically measuring by interferometry the thickness of an object |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITBO2008A000691 | 2008-11-13 | ||
ITBO2008A000691A IT1391718B1 (en) | 2008-11-13 | 2008-11-13 | EQUIPMENT AND METHOD FOR THE OPTICAL MEASUREMENT BY INTERFEROMETRY OF THE THICKNESS OF AN OBJECT |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2010054969A1 true WO2010054969A1 (en) | 2010-05-20 |
Family
ID=41210642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/064608 WO2010054969A1 (en) | 2008-11-13 | 2009-11-04 | Apparatus and method for optically measuring by interferometry the thickness of an object |
Country Status (7)
Country | Link |
---|---|
US (1) | US20110222072A1 (en) |
EP (1) | EP2366092B1 (en) |
JP (1) | JP2012508869A (en) |
CN (1) | CN102209878B (en) |
ES (1) | ES2545107T3 (en) |
IT (1) | IT1391718B1 (en) |
WO (1) | WO2010054969A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI624862B (en) * | 2012-06-11 | 2018-05-21 | 應用材料股份有限公司 | Melt depth determination using infrared interferometric technique in pulsed laser annealing |
DE102012111008B4 (en) | 2012-11-15 | 2014-05-22 | Precitec Optronik Gmbh | Optical measuring method and optical measuring device for detecting a surface topography |
US10234265B2 (en) | 2016-12-12 | 2019-03-19 | Precitec Optronik Gmbh | Distance measuring device and method for measuring distances |
DE102017126310A1 (en) | 2017-11-09 | 2019-05-09 | Precitec Optronik Gmbh | Distance measuring device |
DE102018130901A1 (en) | 2018-12-04 | 2020-06-04 | Precitec Optronik Gmbh | Optical measuring device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005017489A2 (en) * | 2003-07-11 | 2005-02-24 | Svt Associates, Inc. | Film mapping system |
DE102006016131A1 (en) * | 2005-09-22 | 2007-03-29 | Robert Bosch Gmbh | Interferometric measuring device |
US20080151253A1 (en) * | 2005-02-03 | 2008-06-26 | Universitat Stuttgart | Method and Assembly for Confocal, Chromatic, Interferometric and Spectroscopic Scanning of Optical, Multi-Layer Data Memories |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3234353B2 (en) * | 1993-06-15 | 2001-12-04 | 富士写真フイルム株式会社 | Tomographic information reader |
US5856871A (en) * | 1993-08-18 | 1999-01-05 | Applied Spectral Imaging Ltd. | Film thickness mapping using interferometric spectral imaging |
US5914785A (en) * | 1998-02-04 | 1999-06-22 | The University Of Tennesee Research Corporation | Method and apparatus for making absolute range measurements |
US6437868B1 (en) * | 1999-10-28 | 2002-08-20 | Agere Systems Guardian Corp. | In-situ automated contactless thickness measurement for wafer thinning |
US6847454B2 (en) * | 2001-07-16 | 2005-01-25 | Scimed Life Systems, Inc. | Systems and methods for processing signals from an interferometer by an ultrasound console |
JP3944693B2 (en) * | 2001-10-04 | 2007-07-11 | オムロン株式会社 | Film thickness measuring device |
JP3834789B2 (en) * | 2002-05-17 | 2006-10-18 | 独立行政法人科学技術振興機構 | Autonomous ultra-short optical pulse compression, phase compensation, waveform shaping device |
JP3852386B2 (en) * | 2002-08-23 | 2006-11-29 | 株式会社島津製作所 | Film thickness measuring method and film thickness measuring apparatus |
US7139081B2 (en) * | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
JP2004226178A (en) * | 2003-01-21 | 2004-08-12 | Susumu Nakatani | Spectroscopic thickness measuring apparatus |
JP4202841B2 (en) * | 2003-06-30 | 2008-12-24 | 株式会社Sumco | Surface polishing equipment |
US7589843B2 (en) * | 2005-09-27 | 2009-09-15 | Verity Instruments, Inc. | Self referencing heterodyne reflectometer and method for implementing |
JP4919860B2 (en) * | 2007-03-30 | 2012-04-18 | 東京エレクトロン株式会社 | Gas analyzer and substrate processing apparatus |
CN101294795B (en) * | 2007-04-25 | 2011-02-16 | 横河电机株式会社 | Apparatus and method for measuring film thickness |
US7884946B2 (en) * | 2008-04-28 | 2011-02-08 | Lumetrics, Inc. | Apparatus for measurement of the axial length of an eye |
-
2008
- 2008-11-13 IT ITBO2008A000691A patent/IT1391718B1/en active
-
2009
- 2009-11-04 CN CN200980145096.8A patent/CN102209878B/en not_active Expired - Fee Related
- 2009-11-04 EP EP09744692.6A patent/EP2366092B1/en not_active Not-in-force
- 2009-11-04 WO PCT/EP2009/064608 patent/WO2010054969A1/en active Application Filing
- 2009-11-04 ES ES09744692.6T patent/ES2545107T3/en active Active
- 2009-11-04 US US13/127,467 patent/US20110222072A1/en not_active Abandoned
- 2009-11-04 JP JP2011535968A patent/JP2012508869A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005017489A2 (en) * | 2003-07-11 | 2005-02-24 | Svt Associates, Inc. | Film mapping system |
US20080151253A1 (en) * | 2005-02-03 | 2008-06-26 | Universitat Stuttgart | Method and Assembly for Confocal, Chromatic, Interferometric and Spectroscopic Scanning of Optical, Multi-Layer Data Memories |
DE102006016131A1 (en) * | 2005-09-22 | 2007-03-29 | Robert Bosch Gmbh | Interferometric measuring device |
Also Published As
Publication number | Publication date |
---|---|
JP2012508869A (en) | 2012-04-12 |
CN102209878B (en) | 2013-07-17 |
US20110222072A1 (en) | 2011-09-15 |
EP2366092B1 (en) | 2015-06-10 |
ITBO20080691A1 (en) | 2010-05-14 |
ES2545107T3 (en) | 2015-09-08 |
IT1391718B1 (en) | 2012-01-27 |
EP2366092A1 (en) | 2011-09-21 |
CN102209878A (en) | 2011-10-05 |
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