WO2010052712A1 - Ensemble d'émission de particules chargées - Google Patents

Ensemble d'émission de particules chargées Download PDF

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Publication number
WO2010052712A1
WO2010052712A1 PCT/IL2009/001038 IL2009001038W WO2010052712A1 WO 2010052712 A1 WO2010052712 A1 WO 2010052712A1 IL 2009001038 W IL2009001038 W IL 2009001038W WO 2010052712 A1 WO2010052712 A1 WO 2010052712A1
Authority
WO
WIPO (PCT)
Prior art keywords
charged particle
module
particle beam
emitting assembly
electrode
Prior art date
Application number
PCT/IL2009/001038
Other languages
English (en)
Inventor
Sagi Daren
Original Assignee
El-Mul Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by El-Mul Technologies Ltd filed Critical El-Mul Technologies Ltd
Publication of WO2010052712A1 publication Critical patent/WO2010052712A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T23/00—Apparatus for generating ions to be introduced into non-enclosed gases, e.g. into the atmosphere

Definitions

  • This invention relates generally to a charged particle beam column and more specifically to electron emitting assemblies for use in electron beam columns employed in electron microscopes.
  • Electron microscopes are the most commonly used analytical tool for the semi- conductor industry as well as for Nanotechnology research and general science.
  • One of the core components of such an instrument, determining its final resolution, is the electron source.
  • PCT publication WO 01/84130 and US patent 6,512,235 assigned to the assignee of the present application describes a field emission source based on a single electron emitting fiber, such as a Carbon Nanotube (CNT), incorporated inside a micro-structure, on a silicon substrate.
  • CNT Carbon Nanotube
  • Such an electron source provides enhanced beam properties such as cold field emission, low turn-on voltage, small source size and high brightness.
  • a charged particle emitting assembly which is configured to be easily integrated with a charged particle beam column, e.g. a charged particle emitting assembly which can be sized and operative with conventional sockets of conventional charged particle beam systems/columns and does not require any structural or wiring modification to a conventional charged particle beam system.
  • a charged particle beam system includes a charged particle emitting assembly and a charged particle beam column, which is configured and operable to create an appropriate charged particle beam (e.g. the beam shape, energy, direction of propagation, etc.).
  • the present invention satisfies the aforementioned need by providing a novel charged particle emitting assembly for use in a charged particle beam column. More specifically, the present invention is described as an electron emitting assembly used with an electron beam column, and is therefore described below with reference to this specific application. However, the invention is not limited to electron emitting assemblies, and the principles of the invention can be used in an ion emitting assembly as well.
  • the charged particle emitting assembly comprises a charged particle emitting module, an electrode module and an electrical interface module operative to provide mechanical connection and electrical communication between the charged particle emitting assembly and the charged particle beam column.
  • the charged particle emitting module includes a charged particle source, which in turn comprises one or more emitters of the charged particles.
  • the electrode module comprises an apertured electrode located in front of the charged particle source and arranged such that the aperture is concentrically aligned with the charged particle source thus the charged particles emitted by the source pass through the aperture towards the charged particles beam column.
  • front and rear orientation relationships are construed hi relation to a direction of the charged particle beam propagation towards a target, typically a sample.
  • the charged particle emitting module comprises a substrate supporting the charged particle source (i.e. one or more emitters), where at least a portion of the substrate, in proximity to the charged particle source, is electrically conductive, e.g. a conductive layer overlays at least a portion of a front surface of the substrate.
  • the charged particle source can, for example, include one or more electron emission nano-tubes, which can be arranged on a substrate, for example as disclosed in the above-mentioned PCT publication WO 01/84130 and US patent 6,512,235, assigned to the assignee of the present application, which are incorporated herein by reference with respect to this specific example.
  • the charged particle emitting module comprises a connector (e.g.
  • a charged particle emitting assembly for use in a charged particle beam system, wherein the charged particle emitting assembly is configured to be integrated with a charged particle beam column of the charged particle beam system, the charged particle emitting assembly includes a charged particle emitting module including a charged particle source operative to emit charged particles, an electrode module including an apertured electrode having an electrode module aperture which is concentrically aligned with the charged particle source along a beam propagation axis, and an electrical interface module configured and operative to enable mechanical connection and electrical communication of the charged particle emitting assembly with the charged particle beam column.
  • the mechanical connection and electrical communication is such that the electrode module aperture is aligned along the beam propagation axis with an aperture defined in an extractor electrode of the charged particle beam column.
  • the charged particle emitting module includes a substrate supporting the charged particle source, at least a portion of the substrate being in proximity to the charged particle source and being electrically conductive, and an electrically conductive member electrically coupled to the electrically conductive portion of the substrate to provide an electrical potential thereto from the charged particle beam column.
  • the charged particle emitting module includes the substrate having a front surface and a rear surface, and a conductive layer overlaying at least a portion of the front surface in proximity to the charged particle source, the electrically conductive member electrically coupled to the conductive layer to provide a gate potential thereto from the charged particle beam column.
  • the charged particle source includes an electron source including at least one electron emitter.
  • the at least one electron emitter includes one or more nano-tubes.
  • the charged particle emitting assembly includes a support module defining an interior cavity and being configured for supporting the charged particle emitting module thereon.
  • the support module includes a support lateral wall, a support front surface, and a support rear portion, which define together the ulterior cavity.
  • the electrode module includes a housing, which is constructed of a housing lateral wall and a front wall including the apertured electrode.
  • the electrode module includes a housing, which is constructed from a housing lateral wall and a front wall including the apertured electrode, and configured for holding the support module within the housing.
  • the apertured electrode of the electrode module is a separate element spaced apart from the electron beam source.
  • the support module is attachable to the housing and to the charged particle beam column.
  • the apertured electrode of the electrode module is a separate element spaced apart from the electron beam source and includes a planar disk mounted on the front surface of the support module. Additionally, the electrode module is connected to a connecting member protruding from the support front surface for mounting the planar disk thereon. Moreover, the electrical interface module includes at least two connecting elements configured for the mechanical connection and electrical communication with matching connectors of the charged particle beam column. Furthermore, the electrical interface module includes an interface body having a body front surface, a body lateral portion, and a body rear surface, the at least two connecting elements extend through the interface body and protruding from the body rear surface to form contact prongs configured for the mechanical connection and electrical communication with matching female sockets of the charged particle beam column.
  • the at least two connecting elements protrude from the body front surface in the form of connector pins for providing the electrical communication with the charged particle emitting module.
  • the electrical interface module includes a heater for heating the charged particle source in the charged particle emitting module by power from the charged particle beam column.
  • the electrical interface module includes a heater coupled to the connector pins and configured for heating the charged particle source by receiving power from the charged particle beam column.
  • the apertured electrode is configured for the electrical communication with the charged particle beam column to transfer a gate potential via a first annular conductive ring and a second annular conductive ring and being in electrical contact with an electrically conductive flange of the charged particle beam column.
  • the charged particle emitting assembly is configured as an electron emitting assembly to be integrated with an electron beam column.
  • the charged particle emitting assembly is configured as an electron emitting assembly to be integrated with an electron beam column of an electron microscope.
  • an electron microscope including an electron beam column having connectors configured for the mechanical connection and electrical communication with matching connecting elements of the electrical interface module, the electron beam emitting assembly being configured as the charged particle emitting assembly.
  • a charged particle beam system including a charged particle beam column, and a charged particle emitting assembly for use in the charged particle beam system, wherein the charged particle emitting assembly is configured to be integrated with the charged particle beam column of the charged particle beam system, the charged particle emitting assembly including a charged particle emitting module including a charged particle source operative to emit charged particles, an electrode module including an apertured electrode having an electrode module aperture which is concentrically aligned with the charged particle source along a beam propagation axis, and an electrical interface module configured and operative to enable mechanical connection and electrical communication of the charged particle emitting assembly with the charged particle beam column.
  • a charged particle emitting module including a charged particle source operative to emit charged particles
  • an electrode module including an apertured electrode having an electrode module aperture which is concentrically aligned with the charged particle source along a beam propagation axis
  • an electrical interface module configured and operative to enable mechanical connection and electrical communication of the charged particle emitting assembly with the charged particle beam column.
  • Fig. 1 is a simplified exploded view of a disassembled electron emitting assembly constructed and operative in accordance with an embodiment of the present invention
  • Fig. 2 is a simplified pictorial illustration of an assembled state of the electron emitting assembly shown in Fig. 1 ;
  • Fig. 3 is a simplified cross-sectional view of the charged particle emitting assembly shown in Fig. 2 taken along lines III— III;
  • Fig. 4 is a simplified cross-sectional view of the electron emitting assembly of Figs. 1-3 integrated within an electron beam column;
  • Fig. 5 is a simplified exploded view of a disassembled electron emitting assembly constructed and operative in accordance with another embodiment of the present invention;
  • Fig. 6 is a simplified cross-sectional view of the electron emitting assembly of Fig. 5 integrated within an electron beam column
  • Fig. 7 is a simplified schematic illustration of a 2D simulation of a beam emitted by the electron emitting assembly of Figs. 1-3 and accelerated by an extractor electrode of the electron beam column biased at a predetermined potential
  • Fig. 8 is a simplified schematic illustration of a 2D simulation of a beam emitted by the electron emitting assembly of Figs. 1-3 and accelerated by an extractor electrode of the electron beam column biased at a potential greater than the potential of the simulation shown in Fig. 7.
  • an electron emitting assembly 100 constituting a charged particle emitting assembly for use with an electron beam column (310 in Fig. 4) to form together an electron beam system constituting a charged particle beam system.
  • the charged particle beam system include, but are not limited to, an ion microscope, electron microscope (EM), typically a scanning electron microscope (SEM) and/or a transmission electron microscope (TEM), and/or an electron-beam lithography (EBL) system.
  • the electron ernitting assembly 100 is configured to be integrated with a conventional electron beam column.
  • the electron emitting assembly 100 of the invention is to be integrated with an electron beam system.
  • the electron emitting assembly 100 is thus sized, shaped and operative with conventional sockets of the conventional electron beam system and does not require any structural or wiring modification to such system. It is appreciated that various configurations and sizes of the charged particle emitting assembly may be provided so as to fit various charged particle beam systems.
  • the electron emitting assembly 100 includes an electron emitting module 116 having an electron source 154 operative to emit electrons.
  • the electron source 154 includes one or more electron emitters, e.g. nanotube emitter(s).
  • the electron emitting assembly 100 also includes an electrode module 102 configured and operable to create, together with the electron emitter(s), an electron propagation cavity 124 and a required electrical field for creating an output electron beam directed towards the electron beam column (310 in Fig. 4).
  • the electrode module 102 configured and operable to create, together with the electron emitter(s), an electron propagation cavity 124 and a required electrical field for creating an output electron beam directed towards the electron beam column (310 in Fig. 4).
  • the 102 has an apertured electrode, which as shown in the present example, is configured as a cap-shape electrode serving also as the electrode module housing 103.
  • the apertured electrode has a front wall 104 with an aperture 170 concentrically aligned with the electron source 154, and a lateral wall 106 integrated with the housing front wall 104.
  • the housing 103 can, for example, be of a cap-shape or U-shape configuration, or a tubular- or cylindrical-like configuration with a substantially planar front wall 104 and tubular lateral wall 106 extending from the front wall 104.
  • the housing 103 can be constructed of a suitable metal, or any suitable electrically conductive material.
  • the housing 103 can be made of stainless steel.
  • the electron emitting assembly 100 also includes an electrical interface module 200.
  • This module 200 is configured and operative to provide mechanical connection and electrical communication between the electron emitting assembly 100 and the electron beam column (310 in Fig. 4).
  • the electron emitting module 116 comprises a substrate 150 having a front surface 158 and a rear surface 264.
  • the substrate can include a silicon layer, and possibly also additional layers (not shown) overlaying the silicon layer.
  • the substrate 150 supports the electron source 154, i.e. one or more electron emitters.
  • the charged particle source 154 may be any suitable device operative to emit charged particles, such as electrons, ions, etc. therefrom.
  • the charged particle source 154 can, for example, include one or more electron emitting fibers extending upwardly from the front surface 158 of the substrate 150.
  • a carbon electron emission nano-tube (CNT) such as the CNT disclosed in the above referenced PCT patent publication WO 01/84130 and US patent 6,512,235 of the same assignee as the present application can, for example, be employed.
  • the electron emitting module 116 is configured such that at least a portion of the substrate in proximity to the electron source 154 is electrically conductive, for example a conductive layer coating 160 is provided on at least a portion of the front surface 158 of the substrate in proximity to the electron source 154.
  • the electron source 154 can be positioned upon the surface of the conductive layer 160 overlaying the substrate 150 at any suitable location thereon.
  • the conductive surface 160 may be formed of any suitable conducting material, such as stainless steel, copper, etc.
  • the electron emitting module 116 further includes a conductive connector (e.g. pin-like member) 180 that is electrically coupled to the conductive portion of the substrate (e.g. conductive layer 160 overlaying the substrate 150) to provide a gate potential thereto from the electron beam column (310 in Fig. 4).
  • the connecting pin 180 may extend from an inner surface (188 in Fig. 3) of the front wall 104 of the housing 103 or from any suitable location thereof.
  • the pin 180 can be operative to provide electrical communication between the module 116 and the electron beam column.
  • the pin 180 may be formed of any suitable conducting material, such as stainless steel, copper, etc.
  • the electron emitting assembly 100 comprises a support module 110 having a lateral wall 122 extending between an upper, front surface 120 and a bottom, rear portion 274 defining together the electron propagation cavity comprising the interior cavity 124.
  • a shape of the lateral wall 122 can, for example, be tubular- or cylindrical-like. The geometry, Le. shape and dimensions of the lateral wall 122 conforms to that of the inner cavity of the housing 103. Accordingly, the housing 103 is configured for holding the support module 110 within the housing 103.
  • a generally central rectangular recess 130 may be formed on the front surface 120 of the support module 110 with a plurality of mutually spaced aligning grooves 138 extending therefrom along the front surface 120. Seated within each groove 138 can be an electrical contact pad 142. The electrical contact pads 142 can be connected therebetween by a generally rectangular electrical conductor 144. The conductor 144 can be seated within the recess 130 and extend downwardly from surface 120 into the interior cavity 124. The conductor 144 and the electrical contact pads 142 may be formed of any suitable conducting material(s), such as stainless steel, for example.
  • the surface 120 and the lateral wall 122 of the support module 110 can be formed of any suitable material(s), such as insulating material(s), typically a ceramic material, such as alumina, for example.
  • the support module 110 is configured for supporting the electron emitting module 116 thereon.
  • housing alignment apertures 176 can be formed in the lateral wall 106 of the housing 103 or in any other suitable location therein.
  • support alignment apertures 178 can be formed within the lateral wall 122 of the support module 110 or in any suitable location therein.
  • the housing alignment apertures 176 correspond to the support alignment apertures 178 such that the substrate 150 may be positioned within the grooves 138, to thereby ensure that the electron source 154 is aligned generally concentrically with the aperture 170, and the module 116 and the housing 103 can be mounted on the support module 110.
  • the electrical interface module 200 can be mounted within the interior cavity 124 and is operative to provide electrical communication between the electron emitting assembly 100 and the electron beam column.
  • the electrical interface module 200 has an interface body 220 having a cylindrical-like geometry, namely having a body front surface 238 and a body rear surface 228. At least two connecting elements 201 and 202 are provided in the module 200 extending through the interface body 220 and protruding from the body rear surface 228 to form contact prongs 210 and 212.
  • the contact prongs 210 and 212 are configured for mechanical and electrical connection to matching connectors comprising female sockets (314, 316 in Fig. 4) of the electron beam column (310 in Fig. 4).
  • the connecting elements 201 and 202 can be formed of any suitable conducting material(s), such as stainless steel, copper, etc.
  • the interface body 220 can be formed of any suitable insulating material(s), such as alumina, ceramics, etc.
  • connecting elements can be utilized to provide electrical communication between the electron emitting assembly 100 and the electron beam column.
  • the connecting elements can be provided in any location along the interface body 220 of the electrical interface module 200.
  • the connecting elements 201 and 202 can protrude from the body front surface 238 in the form of connector pins 234 for providing electrical communication with the electrode module 102 and the electron emitting module 116.
  • electrical communication between the electron beam column and the electron emitting module 116 can be provided by any one of the connecting elements 201 and 202 via an electrically conductive protrusion 260 extending downwardly from the conductor 144 and being in electrical contact with one of the connecting elements 201 and 202.
  • an electrically conductive protrusion 260 extending downwardly from the conductor 144 and being in electrical contact with one of the connecting elements 201 and 202.
  • the protrusion 260 is electrically connected to connecting element 202.
  • the protrusion 260 conducts electrical signals therethrough from the connecting element 202 to the conductor 144, which in turn conducts to the pads 142 onto the rear surface 264 of the substrate 150 of the module 116.
  • the electrical interface module 200 can further include a heater 250 coupled to the connector pins 234.
  • the heater 250 can be configured for heating the electron source 154 by receiving power from the electron beam column 310.
  • the heater 250 can, for example, be a filament heater, formed of any suitable wire.
  • a tungsten wire may be inserted between connector pins 234 or at any other suitable location, and be coupled to the connector pins 234 by any suitable connection, such as welding, brazing, soldering, etc. It should be understood that the provision of the heater 250 can be aimed at enhancing the emission of electrons from the electron source 154 upon heating thereof.
  • the filament heater can, for example, be operated by voltage supplied thereto by the connecting elements 201 and 202 from the electron beam column via the contact prongs 210 and 212. It should be noted that the electron emitting assembly 100 can be further provided with an appropriate attachment mechanism for securing the housing 103 to the support module 110 and to the electron beam column.
  • a plurality of recesses 270 may be formed and peripherally located around the support rear surface 274 and thus may be engaged with a plurality of corresponding generally circular protrusions 280, which may protrude from a body lateral portion 284 of the interface body 220.
  • the protrusions 280 may be inserted within corresponding apertures 290 formed in the housing 103.
  • a plurality of screws (292 in Fig. 4) may be engaged with corresponding bores 294 formed within a rear portion 296 of the housing 103.
  • the screws 292 can be provided to press upon the support rear surface 274 so as to further secure the housing 103 to the support 110. It should be appreciated that when desired, the housing 103 may be secured to the support 110 and to the electrical interface module 200 in any other suitable manner.
  • a peripheral recess 298 may be formed on the rear portion 296 of the housing 103 to receive a first annular conductive ring (300 in Fig. 4), which presses upon a second annular conductive ring 304 attached to the electron beam column 310, thereby securing the electron emitting assembly 100 to the electron beam column 310. It should be appreciated that when desired, the electron emitting assembly 100 may be secured to the electron beam column 310 in any other suitable manner.
  • electrical communication between the electron emitting module 116 and the electron beam column 310 can, for example, be provided via the prong 212 and the protrusion 260, which can provide electrical potential to the substrate 150 of the module 116 on the rear surface 264 thereof.
  • the electrical potential such as ground potential, is supplied to the prong 212 from an appropriate voltage supply utility in the electron beam column 310 via the socket 316.
  • An electrical gate potential can be provided to the module 116 via the pin 180 which transmits electrical signals supplied from the electron beam column 310 through the housing 103.
  • the housing 103 can be in electrical communication with the electron beam column 310 to transfer a gate potential via the first annular conductive ring 300 surrounding a portion of the housing 103, and the second annular conductive ring 304 surrounding another portion of the housing and being in electrical contact with an electrically conductive flange 318 of the electron beam column 310.
  • the electrical communication between the electron emitting assembly 100 and the electron beam column 310 may be provided in any other suitable manner.
  • an electrical gate potential may be provided via any conductor being in electrical communication with the module 116 and in electrical communication with the electron beam column 310.
  • further electrical potential typically ground potential, may be provided via any other conductor being in electrical communication with the module 116 and in electrical communication with electron beam column 310.
  • the prong 212 can be fed with a ground potential related to the substrate 150.
  • the electrical gate potential can be in the range of about OV to about +400 V, typically in the range of about +20V to about +300V.
  • the heater 250 can be fed with a potential of about OV to about +10V for heating the filaments of the heater 250, thus extracting an electron beam current from the electron source 154 in the range of about nano-Amperes to about tens of micro-Amperes.
  • the electrical potential provided through the prongs 210 and 212, and/or pin 180 can be determined in any suitable manner. For example, these potentials can be evaluated by a human operator during operation of the electron beam column 310.
  • an electronic feedback circuit (not shown) can be utilized for measuring the current of the electrons emitted from the source 154, and thus accordingly adjusting, by a human operator or automatically, the electrical potential fed to the prongs 210 and 212 and/or the pin 180, so as to obtain a desired electron beam emitted from the electron source 154.
  • the electron beam column 310 has an extractor electrode 320 which is an apertured electrode formed with aperture 324.
  • the electron emitting assembly 100 of the invention is configured such that when integrated with the electron beam column 310, the aperture 170 of the electrode module 102 is aligned with the aperture 324 of the electron beam column 310 along an axis 330 of the electron beam propagation from the electron source 154 towards a target.
  • the apertures 170 and 324 have appropriate geometries, i.e. shapes and dimensions, to meet the requirements of the electrical field to be created in the electron beam system to attract the emitted electrons towards the target.
  • the electrode module aperture 170 can have a cross sectional dimension, typically a diameter of about 0.1-2 millimeters and the extractor electrode aperture 324 can have a diameter of about 0.4 milUmeters.
  • the extractor electrode 320 can be positioned over said assembly 100, e.g., at a longitudinal distance in the range of about 0.2 — 1 millimeters, such that extractor electrode aperture 324 is concentrically aligned with the electrode module aperture 170 along the electron beam propagation axis 330, thereby allowing passage of the electron beam produced by said electron emitting module 116 to a target (not shown).
  • the extractor electrode 320 may be biased at various positive voltages so as to accelerate and attract the electrons emitted from electron source 154 thereto, thus ensuring that the emitted electrons travel along the beam propagation axis 330 to a desired target, typically a sample (not shown) and do not scatter to other directions. It should be understood that the voltage supply to the extractor electrode 320 and/or provision of additional electrode(s) in the electron beam column, typically located upstream of the extractor electrode 320, can be used to create an appropriately accelerating electrical field and when needed, create a retarding field in the vicinity of the target.
  • an electron emitting assembly 400 that can be used in a charged particle beam column (310 in Fig. 6).
  • the electron emitting assembly 400 of the present example is generally similar to the above described assembly 100 and differs therefrom in that it has no cap-like housing 103 (Figs. 1—3).
  • an apertured electrode 422 of an electrode module 410 (corresponding to front wall 104 of housing 103 in assembly 100) is a substantially planar separate element (e.g. a disk- like plate) and is spaced-apart from the electron beam source a certain distance.
  • An electrode module aperture 420 is concentrically aligned with the electron source 154.
  • the apertured electrode 422 of the electrode module 410 is configured as a planar disk mounted on the front surface 120 of the support module 110.
  • the planar disk 410 can be mounted on an elongated rod-like member 430 protruding from the support front surface 120.
  • the planar disk 410 can be attached to the rod 430 by any suitable means, such as by welding, brazing and/or soldering a rear surface 428 of the electrode 410 to the member 430. All other elements of the electron emitting assembly 400 may be similar to the corresponding components of the assembly 100 of Figs. 1-4.
  • the electrode module 410 can be in electrical contact with a first annular conductive ring 440 which is in turn in electrical contact with the second annular conductive ring 304.
  • the electrode module 410 can be in electrical communication with the electron beam column 310 via these first and second annular conductive rings 440 and 304, where the ring 304 is in electrical contact with the electrically conductive flange 318 of the electron beam column 310.
  • Figs. 7 and 8 illustrate schematically 2D simulations of an electron beam, which is emitted by the electron emitting assembly of the present invention configured similar to the example of Figs. 1-4 and which is accelerated by the extractor electrode 320 of the electron beam column 310 biased at two predetermined potentials, correspondingly.
  • the heater 250 was not utilized.
  • electrons emitted from the source 154 pass through the aperture 170 of the electrode module 102 of the electron emitting assembly 100 and propagate to the aperture 324 of the extractor electrode 320 of the electron beam column along the beam propagation axis 330.
  • the simulation corresponding to Fig. 7 the extractor electrode 320 was biased to +500V
  • the extractor electrode 320 was biased to +1000V.
  • Figs. 7 and 8 illustrate that focusing of the electron beam emitted from the source 154 is enhanced by a combined operation of the extractor electrode 320 of the electron beam column 310 and the electron emitting assembly 100. This combined operation creates an electrostatic-lens effect, assisting in transportation of electrons to a desired target, such as a sample, placed on a sample support stage in the vicinity of a distal portion of the electron beam column 310.

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  • Electron Beam Exposure (AREA)

Abstract

L'invention concerne un ensemble d'émission de particules chargées (100, 400) destiné à être utilisée dans un système de faisceau de particules chargées, l'ensemble d'émission de particules chargées étant configuré pour être intégré avec une colonne de faisceau de particules chargées (310) du système de faisceau de particules chargées, l'ensemble d'émission de particules chargées comprenant un module d'émission de particules chargées (116) comprenant une source de particules chargées (154) fonctionnant pour émettre des particules chargées, un module d'électrode (102, 410) comprenant une électrode ouverte (104, 422) comportant une ouverture de module d'électrode (170, 420) alignée concentriquement avec la source de particules chargées le long d'un axe de propagation de faisceau, et un module d'interface électrique (200) configuré et pouvant être utilisé pour permettre un raccordement mécanique et une communication électrique de l'ensemble d'émission de particules chargées avec la colonne de faisceau de particules chargées.
PCT/IL2009/001038 2008-11-05 2009-11-05 Ensemble d'émission de particules chargées WO2010052712A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11153208P 2008-11-05 2008-11-05
US61/111,532 2008-11-05

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WO2010052712A1 true WO2010052712A1 (fr) 2010-05-14

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6512235B1 (en) * 2000-05-01 2003-01-28 El-Mul Technologies Ltd. Nanotube-based electron emission device and systems using the same
US6617587B2 (en) * 1999-11-23 2003-09-09 Multibeam Systems, Inc. Electron optics for multi-beam electron beam lithography tool
US6710338B2 (en) * 2000-10-18 2004-03-23 Fei Company Focused ion beam system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6617587B2 (en) * 1999-11-23 2003-09-09 Multibeam Systems, Inc. Electron optics for multi-beam electron beam lithography tool
US6512235B1 (en) * 2000-05-01 2003-01-28 El-Mul Technologies Ltd. Nanotube-based electron emission device and systems using the same
US6710338B2 (en) * 2000-10-18 2004-03-23 Fei Company Focused ion beam system

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