WO2010052693A3 - Deposition of materials - Google Patents
Deposition of materials Download PDFInfo
- Publication number
- WO2010052693A3 WO2010052693A3 PCT/IE2009/000077 IE2009000077W WO2010052693A3 WO 2010052693 A3 WO2010052693 A3 WO 2010052693A3 IE 2009000077 W IE2009000077 W IE 2009000077W WO 2010052693 A3 WO2010052693 A3 WO 2010052693A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- trenches
- nanoparticles
- nanoparticle
- conducting
- allows
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/02—Electrophoretic coating characterised by the process with inorganic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
The method utilises a conducting trench base with non-conducting trench walls to corral charged particles precisely into the trenches. The nanoparticles are close packed in the channels and highly ordered. This approach utilises the charge on the particles to selectively deposit them within the trenches, as all nanoparticles in solution can be charged, and this can be extended to any nanoparticle system beyond gold. Also, this method results in the layer-by-layer growth of the gold nanoparticles. Therefore the depth of the nanoparticle layers within the trenches is controllable. This allows the possibility of heterolayered structures of different nanoparticle layers. Further this method ensures that assembly occurs to fill the void space available provided the back-contacting electrode is more conducting than the trench walls. This allows nanoparticle assemblies to be corralled into any lithographically defined shape, which makes this approach highly adaptable to a range of applications
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/125,377 US8629422B2 (en) | 2008-11-05 | 2009-11-05 | Deposition of materials |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IE20080887 | 2008-11-05 | ||
IE2008/0887 | 2008-11-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2010052693A2 WO2010052693A2 (en) | 2010-05-14 |
WO2010052693A3 true WO2010052693A3 (en) | 2010-08-26 |
Family
ID=42111609
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IE2009/000077 WO2010052693A2 (en) | 2008-11-05 | 2009-11-05 | Deposition of materials |
Country Status (3)
Country | Link |
---|---|
US (1) | US8629422B2 (en) |
IE (1) | IE20090856A1 (en) |
WO (1) | WO2010052693A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3680213A1 (en) * | 2012-06-29 | 2020-07-15 | Northeastern University | Three-dimensional crystalline, homogenous, and hybrid nanostructures fabricated by electric field directed assembly of nanoelements |
CN104458694A (en) * | 2014-11-28 | 2015-03-25 | 中国科学院合肥物质科学研究院 | Method for enhancing Raman signals with nano super-crystal technology to identify microorganisms |
US11499248B2 (en) * | 2017-03-15 | 2022-11-15 | Lawrence Livermore National Security, Llc | Electric field driven assembly of ordered nanocrystal superlattices |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030089611A1 (en) * | 2001-11-15 | 2003-05-15 | The Board Of Trustts Of The University Of Illinois | Elemental silicon nanoparticle plating and method for the same |
WO2005014889A2 (en) * | 2003-07-10 | 2005-02-17 | The University Of North Carolina - Chapel Hill | Deposition method for nanostructure materials |
WO2006008736A1 (en) * | 2004-07-22 | 2006-01-26 | Cerel (Ceramic Technologies) Ltd. | Fabrication of electrical components and circuits by selective electrophoretic deposition (s-epd) and transfer |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6127283A (en) * | 1999-11-02 | 2000-10-03 | Cerel (Ceramic Technologies) Ltd. | Method of electrophoretic deposition of ferroelectric films using a trifunctional additive and compositions for effecting same |
-
2009
- 2009-11-05 US US13/125,377 patent/US8629422B2/en active Active
- 2009-11-05 WO PCT/IE2009/000077 patent/WO2010052693A2/en active Application Filing
- 2009-11-05 IE IE20090856A patent/IE20090856A1/en not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030089611A1 (en) * | 2001-11-15 | 2003-05-15 | The Board Of Trustts Of The University Of Illinois | Elemental silicon nanoparticle plating and method for the same |
WO2005014889A2 (en) * | 2003-07-10 | 2005-02-17 | The University Of North Carolina - Chapel Hill | Deposition method for nanostructure materials |
WO2006008736A1 (en) * | 2004-07-22 | 2006-01-26 | Cerel (Ceramic Technologies) Ltd. | Fabrication of electrical components and circuits by selective electrophoretic deposition (s-epd) and transfer |
Non-Patent Citations (1)
Title |
---|
AHMED S, ET. AL.: "Close-Packed Gold-Nanocrystal Assemblies Deposited with Complete Selectivity into Lithographic Trenches", ADVANCED MATERIALS, vol. 20, no. 24, 22 October 2008 (2008-10-22), pages 4745 - 4750, XP002588133 * |
Also Published As
Publication number | Publication date |
---|---|
US8629422B2 (en) | 2014-01-14 |
IE20090856A1 (en) | 2010-05-12 |
WO2010052693A2 (en) | 2010-05-14 |
US20110193054A1 (en) | 2011-08-11 |
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