WO2010002129A3 - Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same - Google Patents

Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same Download PDF

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Publication number
WO2010002129A3
WO2010002129A3 PCT/KR2009/003324 KR2009003324W WO2010002129A3 WO 2010002129 A3 WO2010002129 A3 WO 2010002129A3 KR 2009003324 W KR2009003324 W KR 2009003324W WO 2010002129 A3 WO2010002129 A3 WO 2010002129A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
photoinitiators
liquid crystal
thin film
Prior art date
Application number
PCT/KR2009/003324
Other languages
French (fr)
Korean (ko)
Other versions
WO2010002129A2 (en
Inventor
이건우
김성현
곽상규
오동궁
이창순
조창호
민경훈
Original Assignee
주식회사 엘지화학
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090054850A external-priority patent/KR101121038B1/en
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to JP2010526836A priority Critical patent/JP2011501816A/en
Priority to CN2009801083066A priority patent/CN101965541A/en
Priority to US12/674,408 priority patent/US8409782B2/en
Publication of WO2010002129A2 publication Critical patent/WO2010002129A2/en
Publication of WO2010002129A3 publication Critical patent/WO2010002129A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

The present invention relates to a photosensitive resin composition containing: a plurality of photoinitiators with different activating wavelengths, a transparent thin film layer for a liquid crystal display prepared using the photosensitive resin composition, and a liquid crystal display prepared using the transparent thin film layer. As a result of use of the photosensitive resin composition containing two or more kinds of photoinitiators wherein the difference of activating wavelengths of the photoinitiators is 20nm or more, sensitivity is increased and thickness is easily controlled according to exposure illumination. Therefore, the present invention provides the photosensitive resin composition capable of easily controlling the thickness when slits or semitransparent masks are used.
PCT/KR2009/003324 2008-07-01 2009-06-22 Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same WO2010002129A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010526836A JP2011501816A (en) 2008-07-01 2009-06-22 Photosensitive resin composition containing a plurality of photoinitiators, transparent thin film layer using the same, and liquid crystal display device
CN2009801083066A CN101965541A (en) 2008-07-01 2009-06-22 Photoresist resin composition containing a number of photo-initiators, transparent thin film layer and liquid crystal display using the same
US12/674,408 US8409782B2 (en) 2008-07-01 2009-06-22 Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2008-0063313 2008-07-01
KR20080063313 2008-07-01
KR1020090054850A KR101121038B1 (en) 2008-07-01 2009-06-19 Photoresist resin composition containing a number of photo-initiators, transparent thin film layer and liquid crystal display using the same
KR10-2009-0054850 2009-06-19

Publications (2)

Publication Number Publication Date
WO2010002129A2 WO2010002129A2 (en) 2010-01-07
WO2010002129A3 true WO2010002129A3 (en) 2010-03-25

Family

ID=41466424

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/003324 WO2010002129A2 (en) 2008-07-01 2009-06-22 Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same

Country Status (1)

Country Link
WO (1) WO2010002129A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102597877A (en) * 2010-07-30 2012-07-18 日立化成工业株式会社 Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, method for producing lead frame, printed wiring board, and method for producing printed wiring board
KR20160002040A (en) 2014-06-30 2016-01-07 주식회사 엘지화학 Photoresist resin composition

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040007700A (en) * 2001-06-11 2004-01-24 시바 스페셜티 케미칼스 홀딩 인크. Oxime ester photoinitiators having a combined structure
KR20050059584A (en) * 2003-12-15 2005-06-21 주식회사 코오롱 Photoresist composition for column spacer of liquid crystal display
KR100736295B1 (en) * 2005-02-09 2007-07-06 다이요 잉키 세이조 가부시키가이샤 Photosensitive resin composition for display panel, cured products thereof and spacer for display panel
KR100793946B1 (en) * 2006-11-17 2008-01-16 제일모직주식회사 Photosensitive resin composition for forming column spacer of liquid crystal device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040007700A (en) * 2001-06-11 2004-01-24 시바 스페셜티 케미칼스 홀딩 인크. Oxime ester photoinitiators having a combined structure
KR20050059584A (en) * 2003-12-15 2005-06-21 주식회사 코오롱 Photoresist composition for column spacer of liquid crystal display
KR100736295B1 (en) * 2005-02-09 2007-07-06 다이요 잉키 세이조 가부시키가이샤 Photosensitive resin composition for display panel, cured products thereof and spacer for display panel
KR100793946B1 (en) * 2006-11-17 2008-01-16 제일모직주식회사 Photosensitive resin composition for forming column spacer of liquid crystal device

Also Published As

Publication number Publication date
WO2010002129A2 (en) 2010-01-07

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