WO2009114193A3 - Bare reticle storage chamber and stocker - Google Patents

Bare reticle storage chamber and stocker Download PDF

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Publication number
WO2009114193A3
WO2009114193A3 PCT/US2009/001630 US2009001630W WO2009114193A3 WO 2009114193 A3 WO2009114193 A3 WO 2009114193A3 US 2009001630 W US2009001630 W US 2009001630W WO 2009114193 A3 WO2009114193 A3 WO 2009114193A3
Authority
WO
WIPO (PCT)
Prior art keywords
reticle
storage chamber
stocker
reticle storage
transfer area
Prior art date
Application number
PCT/US2009/001630
Other languages
French (fr)
Other versions
WO2009114193A2 (en
Inventor
Kung Chris Wu
Richard Morgan
Yuan-Yu Huang
Shih-Chi Liu
Wei-Shiang Chang
Hung-Kun Ko
Original Assignee
Fortrend Engineering Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fortrend Engineering Corporation filed Critical Fortrend Engineering Corporation
Publication of WO2009114193A2 publication Critical patent/WO2009114193A2/en
Publication of WO2009114193A3 publication Critical patent/WO2009114193A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6732—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775—Docking arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance

Abstract

A bare reticle storage chamber and stocker (30) includes a reticle input /output -port pod opener (36) for: 1. accessing a reticle (68) carried within a pod; while 2. maintaining a clean environment around the reticle (68). A reticle transfer area (42) that abuts the pod opener (30) and houses a reticle handling robot (44) that includes an end-effector (162) adapted for receiving and retaining at least one reticle (68). A bare reticle storage chamber (52) also abuts the reticle transfer area (42). The reticle storage chamber (52) houses: 1. a reticle cabinet (62) having reticle storage slots (64) that receive reticles (68); and 2. a plenum (102) that provides a flow of gas about and through the reticle cabinet (62). Abutting the reticle transfer area (42), the reticle storage chamber (52) has an openable and closeable robot access door (74) through which the end-effector (162) of the reticle handling robot (44) accesses the reticle storage slot that is then juxtaposed with the robot access door (74).
PCT/US2009/001630 2008-03-13 2009-03-13 Bare reticle storage chamber and stocker WO2009114193A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6944408P 2008-03-13 2008-03-13
US61/069,444 2008-03-13

Publications (2)

Publication Number Publication Date
WO2009114193A2 WO2009114193A2 (en) 2009-09-17
WO2009114193A3 true WO2009114193A3 (en) 2009-12-30

Family

ID=41065735

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/001630 WO2009114193A2 (en) 2008-03-13 2009-03-13 Bare reticle storage chamber and stocker

Country Status (2)

Country Link
TW (1) TW200946422A (en)
WO (1) WO2009114193A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8956098B2 (en) * 2011-05-02 2015-02-17 Murata Machinery, Ltd. Automated warehouse
JP6099945B2 (en) * 2012-11-22 2017-03-22 東京エレクトロン株式会社 Lid opening / closing mechanism, shielding mechanism and internal purging method of container
US9618857B2 (en) 2015-02-28 2017-04-11 Kla-Tencor Corporation End effectors and reticle handling at a high throughput
US9786536B2 (en) * 2015-12-07 2017-10-10 Microchip Technology Incorporated Reticle rack system
CN112198755A (en) * 2020-10-20 2021-01-08 江苏高光半导体材料有限公司 Mask version storage uses integrative box that loads

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6690993B2 (en) * 2000-10-12 2004-02-10 R. Foulke Development Company, Llc Reticle storage system
US20040091341A1 (en) * 2002-07-29 2004-05-13 Jakob Blattner Reticle manipulating device
US20080041694A1 (en) * 2006-08-19 2008-02-21 Dynamic Micro Systems Buffer station for stocker system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6690993B2 (en) * 2000-10-12 2004-02-10 R. Foulke Development Company, Llc Reticle storage system
US20040091341A1 (en) * 2002-07-29 2004-05-13 Jakob Blattner Reticle manipulating device
US20080041694A1 (en) * 2006-08-19 2008-02-21 Dynamic Micro Systems Buffer station for stocker system

Also Published As

Publication number Publication date
TW200946422A (en) 2009-11-16
WO2009114193A2 (en) 2009-09-17

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