WO2009090098A3 - Method and apparatus for producing a solar cell - Google Patents

Method and apparatus for producing a solar cell Download PDF

Info

Publication number
WO2009090098A3
WO2009090098A3 PCT/EP2009/000279 EP2009000279W WO2009090098A3 WO 2009090098 A3 WO2009090098 A3 WO 2009090098A3 EP 2009000279 W EP2009000279 W EP 2009000279W WO 2009090098 A3 WO2009090098 A3 WO 2009090098A3
Authority
WO
WIPO (PCT)
Prior art keywords
conductor material
silicon substrate
producing
solar cell
laser beam
Prior art date
Application number
PCT/EP2009/000279
Other languages
German (de)
French (fr)
Other versions
WO2009090098A2 (en
Inventor
Christian Buchner
Thomas Sauter
Original Assignee
Schmid Technology Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schmid Technology Gmbh filed Critical Schmid Technology Gmbh
Publication of WO2009090098A2 publication Critical patent/WO2009090098A2/en
Publication of WO2009090098A3 publication Critical patent/WO2009090098A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/048Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Abstract

In a method for producing a solar cell by application of electrically conductive conductor material (21, 25) onto one side (14, 15) of a silicon substrate (13), a conductor material carrier (18) is arranged at a distance from the silicon substrate (13). The conductor material carrier (18) is transparent and has a pasty conductor material (21) on a side (20) facing the silicon substrate (13). A focused laser beam (23) is injected onto that side (19) of the conductor material carrier (18) which is remote from the silicon substrate (13) in order to detach the conductor material (21, 25) in a special form corresponding to the points or lines on which the laser beam (23) impinges. In this case, the detached conductor material (21, 25) is transferred to the opposite surface (14, 15) of the silicon substrate (13). There, a desired structure which is solidified by baking is formed.
PCT/EP2009/000279 2008-01-17 2009-01-17 Method and apparatus for producing a solar cell WO2009090098A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102008005845.9 2008-01-17
DE102008005845 2008-01-17
DE102008057228A DE102008057228A1 (en) 2008-01-17 2008-11-04 Method and device for producing a solar cell
DE102008057228.4 2008-11-04

Publications (2)

Publication Number Publication Date
WO2009090098A2 WO2009090098A2 (en) 2009-07-23
WO2009090098A3 true WO2009090098A3 (en) 2010-03-25

Family

ID=40785517

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2009/000279 WO2009090098A2 (en) 2008-01-17 2009-01-17 Method and apparatus for producing a solar cell

Country Status (2)

Country Link
DE (1) DE102008057228A1 (en)
WO (1) WO2009090098A2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009020774B4 (en) * 2009-05-05 2011-01-05 Universität Stuttgart Method for contacting a semiconductor substrate
DE102009053776A1 (en) * 2009-11-19 2011-06-01 Systaic Cells Gmbh Emitter formation with a laser
DE102009059042A1 (en) 2009-12-10 2011-06-16 Schmid Technology Gmbh Method and device for transferring printing substance from a printing substrate to a substrate
GB201009847D0 (en) * 2010-06-11 2010-07-21 Dzp Technologies Ltd Deposition method, apparatus, printed object and uses
DE102011075025A1 (en) * 2011-04-29 2012-10-31 Schmid Technology Gmbh Method and device for applying printing substance
DE102011103481B4 (en) * 2011-06-03 2017-08-17 Leibniz-Institut für Oberflächenmodifizierung e.V. Selective removal of thin layers by means of pulsed laser radiation for thin-film structuring
DE102011077462A1 (en) * 2011-06-14 2012-12-20 Robert Bosch Gmbh Method, arrangement and process aid for producing a crystalline solar cell
DE102011077450A1 (en) * 2011-06-14 2012-12-20 Robert Bosch Gmbh Method and device for producing a crystalline solar cell
DE102011085714A1 (en) * 2011-11-03 2013-05-08 Boraident Gmbh Method and device for generating a laser-supported electrically conductive contacting of an object surface
EP2731126A1 (en) 2012-11-09 2014-05-14 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method for bonding bare chip dies
CN106687617B (en) * 2014-07-15 2020-04-07 奈特考尔技术公司 Laser transfer IBC solar cell
DE102017110040B4 (en) 2017-05-10 2020-08-27 LPKF SolarQuipment GmbH Printing device and printing method for transferring a printing substance from an endlessly rotating printing substance carrier to a substrate
WO2020152352A1 (en) * 2019-01-25 2020-07-30 Mycronic AB Laser induced forward transfer with high throughput and recycling of donor material on a transparent drum
CN111276566B (en) * 2020-01-21 2022-06-07 中国海洋大学 All-inorganic perovskite solar cell prepared based on liquid phase continuous spin coating direct phase transition method and preparation method and application thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0331022A2 (en) * 1988-03-01 1989-09-06 Texas Instruments Incorporated Radiation induced pattern deposition
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US5935462A (en) * 1994-10-24 1999-08-10 Matsushita Electric Industrial Co., Ltd. Repair of metal lines by electrostatically assisted laser ablative deposition
US6159832A (en) * 1998-03-18 2000-12-12 Mayer; Frederick J. Precision laser metallization

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0331022A2 (en) * 1988-03-01 1989-09-06 Texas Instruments Incorporated Radiation induced pattern deposition
US5935462A (en) * 1994-10-24 1999-08-10 Matsushita Electric Industrial Co., Ltd. Repair of metal lines by electrostatically assisted laser ablative deposition
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US6159832A (en) * 1998-03-18 2000-12-12 Mayer; Frederick J. Precision laser metallization

Also Published As

Publication number Publication date
DE102008057228A1 (en) 2009-07-23
WO2009090098A2 (en) 2009-07-23

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