WO2009057606A1 - Process for producing transparent electroconductive substrate and film forming precursor liquid for use in the process - Google Patents

Process for producing transparent electroconductive substrate and film forming precursor liquid for use in the process Download PDF

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Publication number
WO2009057606A1
WO2009057606A1 PCT/JP2008/069572 JP2008069572W WO2009057606A1 WO 2009057606 A1 WO2009057606 A1 WO 2009057606A1 JP 2008069572 W JP2008069572 W JP 2008069572W WO 2009057606 A1 WO2009057606 A1 WO 2009057606A1
Authority
WO
WIPO (PCT)
Prior art keywords
transparent electroconductive
precursor liquid
coating
film forming
compound
Prior art date
Application number
PCT/JP2008/069572
Other languages
French (fr)
Japanese (ja)
Inventor
Kunihiko Nakata
Kenichiro Sugawara
Original Assignee
Sumitomo Chemical Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008193871A external-priority patent/JP5255359B2/en
Application filed by Sumitomo Chemical Company, Limited filed Critical Sumitomo Chemical Company, Limited
Publication of WO2009057606A1 publication Critical patent/WO2009057606A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C03C17/256—Coating containing TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/218—V2O5, Nb2O5, Ta2O5
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment

Abstract

This invention provides a process for producing a transparent electroconductive substrate which can form a titanium oxide-type transparent electroconductive film capable of developing excellent electroconductive properties by a simple coating method. This production process comprises coating a precursor liquid containing a reaction product (A) between a titanium compound and hydrogen peroxide and a reaction product (B) between a niobium compound or a tantalum compound and hydrogen peroxide onto a transparent base material, firing the coating, heating the fired coating under a reducing atmosphere to perform annealing to form a transparent electroconductive film of niobium- or tantalum-doped titanium oxide having a specific resistance of not more than 9 x 10-3 Ω·cm on the transparent base material.
PCT/JP2008/069572 2007-10-29 2008-10-28 Process for producing transparent electroconductive substrate and film forming precursor liquid for use in the process WO2009057606A1 (en)

Applications Claiming Priority (16)

Application Number Priority Date Filing Date Title
JP2007-280071 2007-10-29
JP2007280071 2007-10-29
JP2008-043407 2008-02-25
JP2008043407 2008-02-25
JP2008177207 2008-07-07
JP2008-177208 2008-07-07
JP2008177208 2008-07-07
JP2008-177207 2008-07-07
JP2008-179527 2008-07-09
JP2008179527 2008-07-09
JP2008188992 2008-07-22
JP2008-188992 2008-07-22
JP2008-193870 2008-07-28
JP2008-193871 2008-07-28
JP2008193871A JP5255359B2 (en) 2008-07-28 2008-07-28 Precursor solution for film formation
JP2008193870 2008-07-28

Publications (1)

Publication Number Publication Date
WO2009057606A1 true WO2009057606A1 (en) 2009-05-07

Family

ID=40590996

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/069572 WO2009057606A1 (en) 2007-10-29 2008-10-28 Process for producing transparent electroconductive substrate and film forming precursor liquid for use in the process

Country Status (2)

Country Link
TW (1) TW200941506A (en)
WO (1) WO2009057606A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009119273A1 (en) * 2008-03-25 2009-10-01 旭硝子株式会社 Conductor and manufacturing method therefor
JP2009283451A (en) * 2008-04-21 2009-12-03 Kao Corp Coating agent for forming conductive film
WO2011139523A3 (en) * 2010-04-27 2012-02-02 Ppg Industries Ohio, Inc. A method of depositing niobium doped titania film on a substrate and the coated substrate made thereby

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002212463A (en) * 2001-01-12 2002-07-31 Sustainable Titania Technology Inc Titanium oxide-containing conductive film-forming liquid, production method thereof, and structure equipped with titanium oxide-containing film
JP2004006197A (en) * 2002-04-19 2004-01-08 Jsr Corp Conductive film forming composition, conductive film and its forming method
JP2005011737A (en) * 2003-06-20 2005-01-13 Nippon Sheet Glass Co Ltd Transparent conductive substrate, its manufacturing method and photoelectric conversion element
JP2006144052A (en) * 2004-11-17 2006-06-08 Bridgestone Corp METHOD FOR FORMING METAL-DOPED TiO2 FILM
JP2007269507A (en) * 2006-03-30 2007-10-18 Sumitomo Chemical Co Ltd Method for producing titanium oxide precursor and method for producing titanium oxide

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002212463A (en) * 2001-01-12 2002-07-31 Sustainable Titania Technology Inc Titanium oxide-containing conductive film-forming liquid, production method thereof, and structure equipped with titanium oxide-containing film
JP2004006197A (en) * 2002-04-19 2004-01-08 Jsr Corp Conductive film forming composition, conductive film and its forming method
JP2005011737A (en) * 2003-06-20 2005-01-13 Nippon Sheet Glass Co Ltd Transparent conductive substrate, its manufacturing method and photoelectric conversion element
JP2006144052A (en) * 2004-11-17 2006-06-08 Bridgestone Corp METHOD FOR FORMING METAL-DOPED TiO2 FILM
JP2007269507A (en) * 2006-03-30 2007-10-18 Sumitomo Chemical Co Ltd Method for producing titanium oxide precursor and method for producing titanium oxide

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009119273A1 (en) * 2008-03-25 2009-10-01 旭硝子株式会社 Conductor and manufacturing method therefor
JP2009231213A (en) * 2008-03-25 2009-10-08 Kanagawa Acad Of Sci & Technol Conductor and its manufacturing method
JP2009283451A (en) * 2008-04-21 2009-12-03 Kao Corp Coating agent for forming conductive film
WO2011139523A3 (en) * 2010-04-27 2012-02-02 Ppg Industries Ohio, Inc. A method of depositing niobium doped titania film on a substrate and the coated substrate made thereby
US8551609B2 (en) 2010-04-27 2013-10-08 Ppg Industries Ohio, Inc. Method of depositing niobium doped titania film on a substrate and the coated substrate made thereby

Also Published As

Publication number Publication date
TW200941506A (en) 2009-10-01

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