WO2009052819A3 - Adaptable optical system - Google Patents
Adaptable optical system Download PDFInfo
- Publication number
- WO2009052819A3 WO2009052819A3 PCT/DE2008/001776 DE2008001776W WO2009052819A3 WO 2009052819 A3 WO2009052819 A3 WO 2009052819A3 DE 2008001776 W DE2008001776 W DE 2008001776W WO 2009052819 A3 WO2009052819 A3 WO 2009052819A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical system
- optical
- adaptable
- temperature
- optical component
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0081—Simple or compound lenses having one or more elements with analytic function to create variable power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/02—Optical objectives with means for varying the magnification by changing, adding, or subtracting a part of the objective, e.g. convertible objective
- G02B15/04—Optical objectives with means for varying the magnification by changing, adding, or subtracting a part of the objective, e.g. convertible objective by changing a part
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
With respect to an adaptable optical system, the task is to provide an active system prone to minimal failures, which can be used to vary different thermally dependent imaging properties in order to compensate for temperature fluctuations within a broad temperature range. The adaptable optical system comprises, in at least one embodiment, at least one optical component made of a material having a thermally dependent refractive index and/or coefficient of expansion, and means for introducing a temperature gradient into the optical system as a temperature difference between optical components, or into at least one optical component, wherein the refractive power or correction state of the optical system can be varied by way of the temperature gradient to be introduced in that a redistribution of the thermal energy takes place directly in an optical component and/or an exchange of the thermal energy takes place between the optical components. An energetically particularly advantageous variant is to combine cooling and heating elements.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200710051291 DE102007051291B4 (en) | 2007-10-24 | 2007-10-24 | Adaptable optical system |
DE102007051291.2 | 2007-10-24 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2009052819A2 WO2009052819A2 (en) | 2009-04-30 |
WO2009052819A3 true WO2009052819A3 (en) | 2009-07-09 |
WO2009052819A9 WO2009052819A9 (en) | 2009-09-24 |
Family
ID=40473914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2008/001776 WO2009052819A2 (en) | 2007-10-24 | 2008-10-24 | Adaptable optical system |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102007051291B4 (en) |
WO (1) | WO2009052819A2 (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011005840A1 (en) * | 2011-03-21 | 2012-09-27 | Carl Zeiss Smt Gmbh | A controllable multi-mirror arrangement, optical system with a controllable multi-mirror arrangement and method for operating a controllable multi-mirror arrangement |
DE102011084117A1 (en) | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Reflective optical element for the EUV wavelength range, method for generating and correcting such an element, projection objective for microlithography with such an element and projection exposure apparatus for microlithography with such a projection objective |
US9606419B2 (en) | 2014-03-21 | 2017-03-28 | Fundació Institut De Ciències Fotòniques | Adaptive photothermal lens |
US10274648B2 (en) | 2014-05-28 | 2019-04-30 | Fundació Institut De Ciències Fotòniques | Adaptive thermal micro lens |
DE102015116962A1 (en) * | 2015-10-06 | 2017-04-06 | Connaught Electronics Ltd. | Camera with a lens and a heating unit for heating the lens, and motor vehicle |
GB201703356D0 (en) * | 2017-03-02 | 2017-04-19 | Cambridge Mechatronics Ltd | SMA actuator for zoom camera OIS |
CN107272188B (en) * | 2017-07-31 | 2020-03-10 | 信利光电股份有限公司 | Zoom lens and electronic equipment |
DE102017217121A1 (en) * | 2017-09-26 | 2019-03-28 | Robert Bosch Gmbh | Arrangement of an optical system and tempering method |
CN107948513A (en) * | 2017-11-30 | 2018-04-20 | 信利光电股份有限公司 | A kind of zoom camera module and its Zooming method |
DE102018211596A1 (en) | 2018-07-12 | 2020-01-16 | Carl Zeiss Smt Gmbh | Method for producing a reflective optical element of a projection exposure system and reflective optical element for a projection exposure system, projection objective and projection exposure system |
DE102019132003A1 (en) * | 2019-04-12 | 2020-10-15 | Jenoptik Optical Systems Gmbh | Optical unit and method for operating an optical unit |
DE102020203750A1 (en) | 2020-03-24 | 2021-09-30 | Carl Zeiss Smt Gmbh | Device for recording a temperature, system for manufacturing an optical element and method for manufacturing an optical element |
DE102022200976A1 (en) | 2022-01-31 | 2023-01-05 | Carl Zeiss Smt Gmbh | Calibration bodies and methods for calibration |
DE102022210037A1 (en) | 2022-09-23 | 2024-03-28 | Carl Zeiss Smt Gmbh | Arrangement for tempering at least a partial area of an optical element |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4872743A (en) * | 1983-04-18 | 1989-10-10 | Canon Kabushiki Kaisha | Varifocal optical element |
EP0678768A2 (en) * | 1994-04-22 | 1995-10-25 | Canon Kabushiki Kaisha | Projection exposure apparatus and microdevice manufacturing method |
EP0965871A1 (en) * | 1998-06-20 | 1999-12-22 | Carl Zeiss | Method for correcting rotationally asymmetric imaging aberrations |
EP1376192A2 (en) * | 2002-06-20 | 2004-01-02 | Nikon Corporation | Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
JP2005140999A (en) * | 2003-11-06 | 2005-06-02 | Nikon Corp | Optical system, adjustment method of optical system, exposure device and exposure method |
DE102005062401A1 (en) * | 2005-12-23 | 2007-06-28 | Carl Zeiss Smt Ag | Mirror`s imaging characteristics variation device for projection exposure system, has actuators formed such that changeable forces are introduced in mirror by variation in temperature, where forces lead to deformation of mirror surface |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4505535A (en) | 1982-02-06 | 1985-03-19 | Barr & Stroud Limited | Infrared objective lens systems |
JPS6197608A (en) | 1984-10-17 | 1986-05-16 | Canon Inc | Lens holding part |
GB9809739D0 (en) | 1998-05-08 | 1998-07-08 | Pilkington Perkin Elmer Ltd | Afocal telescope |
DE19956353C1 (en) * | 1999-11-24 | 2001-08-09 | Zeiss Carl | Optical arrangement |
JP2005062632A (en) | 2003-08-19 | 2005-03-10 | Konica Minolta Opto Inc | Lens system |
DE102006059091B4 (en) * | 2005-12-16 | 2011-03-31 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Micro-optical reflective component and its use |
-
2007
- 2007-10-24 DE DE200710051291 patent/DE102007051291B4/en not_active Expired - Fee Related
-
2008
- 2008-10-24 WO PCT/DE2008/001776 patent/WO2009052819A2/en active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4872743A (en) * | 1983-04-18 | 1989-10-10 | Canon Kabushiki Kaisha | Varifocal optical element |
EP0678768A2 (en) * | 1994-04-22 | 1995-10-25 | Canon Kabushiki Kaisha | Projection exposure apparatus and microdevice manufacturing method |
EP0965871A1 (en) * | 1998-06-20 | 1999-12-22 | Carl Zeiss | Method for correcting rotationally asymmetric imaging aberrations |
EP1376192A2 (en) * | 2002-06-20 | 2004-01-02 | Nikon Corporation | Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
JP2005140999A (en) * | 2003-11-06 | 2005-06-02 | Nikon Corp | Optical system, adjustment method of optical system, exposure device and exposure method |
DE102005062401A1 (en) * | 2005-12-23 | 2007-06-28 | Carl Zeiss Smt Ag | Mirror`s imaging characteristics variation device for projection exposure system, has actuators formed such that changeable forces are introduced in mirror by variation in temperature, where forces lead to deformation of mirror surface |
Also Published As
Publication number | Publication date |
---|---|
DE102007051291B4 (en) | 2010-02-11 |
DE102007051291A1 (en) | 2009-04-30 |
WO2009052819A9 (en) | 2009-09-24 |
WO2009052819A2 (en) | 2009-04-30 |
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