WO2009048262A3 - Polymer for forming organic anti-reflective coating layer and composition including the same - Google Patents

Polymer for forming organic anti-reflective coating layer and composition including the same Download PDF

Info

Publication number
WO2009048262A3
WO2009048262A3 PCT/KR2008/005909 KR2008005909W WO2009048262A3 WO 2009048262 A3 WO2009048262 A3 WO 2009048262A3 KR 2008005909 W KR2008005909 W KR 2008005909W WO 2009048262 A3 WO2009048262 A3 WO 2009048262A3
Authority
WO
WIPO (PCT)
Prior art keywords
polymer
coating layer
reflective coating
organic anti
same
Prior art date
Application number
PCT/KR2008/005909
Other languages
French (fr)
Other versions
WO2009048262A2 (en
Inventor
Sang-Jeoung Kim
Hyo-Jung Rho
Man-Ho Han
Hyun-Jin Kim
Jae-Hyun Kim
Original Assignee
Dongjin Semichem Co Ltd
Sang-Jeoung Kim
Hyo-Jung Rho
Man-Ho Han
Hyun-Jin Kim
Jae-Hyun Kim
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd, Sang-Jeoung Kim, Hyo-Jung Rho, Man-Ho Han, Hyun-Jin Kim, Jae-Hyun Kim filed Critical Dongjin Semichem Co Ltd
Publication of WO2009048262A2 publication Critical patent/WO2009048262A2/en
Publication of WO2009048262A3 publication Critical patent/WO2009048262A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52—Amides or imides
    • C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
    • C08F220/603—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen and containing oxygen in addition to the carbonamido oxygen and nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1092—Polysuccinimides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

A polymer for forming an organic anti-reflective coating layer which has superior adhesiveness to a substrate and high refractive index, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formula 1, wherein R1 is a hydrogen atom or a methyl group(-CH3), R2 is S, O or NH, and R4 is a group having a hydroxy group (-OH).
PCT/KR2008/005909 2007-10-08 2008-10-08 Polymer for forming organic anti-reflective coating layer and composition including the same WO2009048262A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2007-0101033 2007-10-08
KR1020070101033A KR20090035970A (en) 2007-10-08 2007-10-08 Polymer for forming organic anti-reflective coating layer having high refractive index, and composition including the same

Publications (2)

Publication Number Publication Date
WO2009048262A2 WO2009048262A2 (en) 2009-04-16
WO2009048262A3 true WO2009048262A3 (en) 2009-05-28

Family

ID=40549739

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/005909 WO2009048262A2 (en) 2007-10-08 2008-10-08 Polymer for forming organic anti-reflective coating layer and composition including the same

Country Status (3)

Country Link
KR (1) KR20090035970A (en)
TW (1) TW200921281A (en)
WO (1) WO2009048262A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101321417B1 (en) 2009-12-28 2013-10-30 제일모직주식회사 Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same
CN115873176B (en) * 2021-09-28 2023-09-26 上海新阳半导体材料股份有限公司 Bottom anti-reflection coating for DUV lithography and preparation method and application thereof
TW202411187A (en) * 2022-07-01 2024-03-16 日商三菱瓦斯化學股份有限公司 Polyphenol compound, composition for forming film for lithography, underlayer film for lithography, and pattern-forming method
WO2024166869A1 (en) * 2023-02-09 2024-08-15 日産化学株式会社 Resist underlayer film forming composition

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020037442A (en) * 2000-11-14 2002-05-21 마쯔모또 에이찌 An Anti-Reflective Film Forming Composition
KR20040030570A (en) * 2001-04-10 2004-04-09 닛산 가가쿠 고교 가부시키 가이샤 Composition for forming antireflection film for lithography
KR20060046143A (en) * 2004-05-26 2006-05-17 도오꾜오까고오교 가부시끼가이샤 Composition for forming anti-reflective coating film, anti-reflective coating film composed of the composition, and method of forming resist pattern using the composition
US20060199108A1 (en) * 2005-03-02 2006-09-07 Dongjin Semichem Co., Ltd. Polymer for forming anti-reflective coating layer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020037442A (en) * 2000-11-14 2002-05-21 마쯔모또 에이찌 An Anti-Reflective Film Forming Composition
KR20040030570A (en) * 2001-04-10 2004-04-09 닛산 가가쿠 고교 가부시키 가이샤 Composition for forming antireflection film for lithography
KR20060046143A (en) * 2004-05-26 2006-05-17 도오꾜오까고오교 가부시끼가이샤 Composition for forming anti-reflective coating film, anti-reflective coating film composed of the composition, and method of forming resist pattern using the composition
US20060199108A1 (en) * 2005-03-02 2006-09-07 Dongjin Semichem Co., Ltd. Polymer for forming anti-reflective coating layer

Also Published As

Publication number Publication date
TW200921281A (en) 2009-05-16
WO2009048262A2 (en) 2009-04-16
KR20090035970A (en) 2009-04-13

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