WO2009048231A3 - Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same - Google Patents

Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same Download PDF

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Publication number
WO2009048231A3
WO2009048231A3 PCT/KR2008/005707 KR2008005707W WO2009048231A3 WO 2009048231 A3 WO2009048231 A3 WO 2009048231A3 KR 2008005707 W KR2008005707 W KR 2008005707W WO 2009048231 A3 WO2009048231 A3 WO 2009048231A3
Authority
WO
WIPO (PCT)
Prior art keywords
fluorene
based polymer
negative
photosensitive resin
resin composition
Prior art date
Application number
PCT/KR2008/005707
Other languages
French (fr)
Other versions
WO2009048231A2 (en
Inventor
Han Soo Kim
Sung Hyun Kim
Dong Chang Choi
Kyung Soo Choi
Ho Chan Ji
Min Young Lim
Geun Young Cha
Yoon Hee Heo
Ji Heum Yoo
Sun Hwa Kim
Original Assignee
Lg Chemical Ltd
Han Soo Kim
Sung Hyun Kim
Dong Chang Choi
Kyung Soo Choi
Ho Chan Ji
Min Young Lim
Geun Young Cha
Yoon Hee Heo
Ji Heum Yoo
Sun Hwa Kim
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020080094047A external-priority patent/KR100965189B1/en
Application filed by Lg Chemical Ltd, Han Soo Kim, Sung Hyun Kim, Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Min Young Lim, Geun Young Cha, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim filed Critical Lg Chemical Ltd
Priority to CN2008800080795A priority Critical patent/CN101631815B/en
Priority to US12/671,348 priority patent/US8535874B2/en
Priority to JP2010502041A priority patent/JP5086424B2/en
Publication of WO2009048231A2 publication Critical patent/WO2009048231A2/en
Publication of WO2009048231A3 publication Critical patent/WO2009048231A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
    • C08G18/3802—Low-molecular-weight compounds having heteroatoms other than oxygen having halogens
    • C08G18/3804—Polyhydroxy compounds
    • C08G18/3812—Polyhydroxy compounds having fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/673—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing two or more acrylate or alkylacrylate ester groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/74—Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/75—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic
    • C08G18/751—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring
    • C08G18/752—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring containing at least one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group
    • C08G18/753—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring containing at least one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group containing one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group having a primary carbon atom next to the isocyanate or isothiocyanate group
    • C08G18/755—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring containing at least one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group containing one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group having a primary carbon atom next to the isocyanate or isothiocyanate group and at least one isocyanate or isothiocyanate group linked to a secondary carbon atom of the cycloaliphatic ring, e.g. isophorone diisocyanate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
PCT/KR2008/005707 2007-10-11 2008-09-26 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same WO2009048231A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2008800080795A CN101631815B (en) 2007-10-11 2008-09-26 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same
US12/671,348 US8535874B2 (en) 2007-10-11 2008-09-26 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same
JP2010502041A JP5086424B2 (en) 2007-10-11 2008-09-26 Fluorene-based oligomer containing urethane group, production method thereof, negative photosensitive resin composition, color filter, and liquid crystal display element

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20070102679 2007-10-11
KR10-2007-0102679 2007-10-11
KR1020080094047A KR100965189B1 (en) 2007-10-11 2008-09-25 Fluorene-based polymer having urethane group and preparation method thereof, and negative photosensitive resin composition containing the fluorene-based polymer
KR10-2008-0094047 2008-09-25

Publications (2)

Publication Number Publication Date
WO2009048231A2 WO2009048231A2 (en) 2009-04-16
WO2009048231A3 true WO2009048231A3 (en) 2009-06-04

Family

ID=40549724

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/005707 WO2009048231A2 (en) 2007-10-11 2008-09-26 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same

Country Status (1)

Country Link
WO (1) WO2009048231A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101068622B1 (en) * 2009-12-22 2011-09-28 주식회사 엘지화학 The high lightshielding blackmatrix composition having improved adhesion properties
KR101333696B1 (en) 2009-12-29 2013-11-27 제일모직주식회사 Novel cardo type resin and photosensitive resin composition for color filter including the same
JP2011170334A (en) * 2010-01-20 2011-09-01 Fujifilm Corp Black curable composition for wafer-level lens, and wafer-level lens
US9341946B2 (en) * 2012-05-25 2016-05-17 Lg Chem, Ltd. Photosensitive resin composition, pattern formed using same and display panel comprising same
KR102054045B1 (en) * 2017-03-03 2019-12-09 주식회사 엘지화학 Polymer resion compound and photosensitive resin composition for black bank

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06301132A (en) * 1993-04-16 1994-10-28 Konica Corp Silver halide photosensitive material
JP2003113205A (en) * 2001-10-02 2003-04-18 Nippon Steel Chem Co Ltd Insulating resin composition and laminate using the same
JP2004083855A (en) * 2002-06-28 2004-03-18 Osaka Gas Co Ltd Fluorene-containing resin
WO2005049689A2 (en) * 2003-11-17 2005-06-02 Sumitomo Chemical Company, Limited Crosslinkable substituted fluorene compounds and conjugated oligomers or polymers based thereon

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06301132A (en) * 1993-04-16 1994-10-28 Konica Corp Silver halide photosensitive material
JP2003113205A (en) * 2001-10-02 2003-04-18 Nippon Steel Chem Co Ltd Insulating resin composition and laminate using the same
JP2004083855A (en) * 2002-06-28 2004-03-18 Osaka Gas Co Ltd Fluorene-containing resin
WO2005049689A2 (en) * 2003-11-17 2005-06-02 Sumitomo Chemical Company, Limited Crosslinkable substituted fluorene compounds and conjugated oligomers or polymers based thereon

Also Published As

Publication number Publication date
WO2009048231A2 (en) 2009-04-16

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