WO2009048231A3 - Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same - Google Patents
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same Download PDFInfo
- Publication number
- WO2009048231A3 WO2009048231A3 PCT/KR2008/005707 KR2008005707W WO2009048231A3 WO 2009048231 A3 WO2009048231 A3 WO 2009048231A3 KR 2008005707 W KR2008005707 W KR 2008005707W WO 2009048231 A3 WO2009048231 A3 WO 2009048231A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fluorene
- based polymer
- negative
- photosensitive resin
- resin composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
- C08G18/3802—Low-molecular-weight compounds having heteroatoms other than oxygen having halogens
- C08G18/3804—Polyhydroxy compounds
- C08G18/3812—Polyhydroxy compounds having fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
- C08G18/673—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing two or more acrylate or alkylacrylate ester groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/74—Polyisocyanates or polyisothiocyanates cyclic
- C08G18/75—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic
- C08G18/751—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring
- C08G18/752—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring containing at least one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group
- C08G18/753—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring containing at least one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group containing one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group having a primary carbon atom next to the isocyanate or isothiocyanate group
- C08G18/755—Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic containing only one cycloaliphatic ring containing at least one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group containing one isocyanate or isothiocyanate group linked to the cycloaliphatic ring by means of an aliphatic group having a primary carbon atom next to the isocyanate or isothiocyanate group and at least one isocyanate or isothiocyanate group linked to a secondary carbon atom of the cycloaliphatic ring, e.g. isophorone diisocyanate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Polyurethanes Or Polyureas (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010502041A JP5086424B2 (en) | 2007-10-11 | 2008-09-26 | Fluorene-based oligomer containing urethane group, production method thereof, negative photosensitive resin composition, color filter, and liquid crystal display element |
CN2008800080795A CN101631815B (en) | 2007-10-11 | 2008-09-26 | Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same |
US12/671,348 US8535874B2 (en) | 2007-10-11 | 2008-09-26 | Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2007-0102679 | 2007-10-11 | ||
KR20070102679 | 2007-10-11 | ||
KR10-2008-0094047 | 2008-09-25 | ||
KR1020080094047A KR100965189B1 (en) | 2007-10-11 | 2008-09-25 | Fluorene-based polymer having urethane group and preparation method thereof, and negative photosensitive resin composition containing the fluorene-based polymer |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009048231A2 WO2009048231A2 (en) | 2009-04-16 |
WO2009048231A3 true WO2009048231A3 (en) | 2009-06-04 |
Family
ID=40549724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2008/005707 WO2009048231A2 (en) | 2007-10-11 | 2008-09-26 | Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2009048231A2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101068622B1 (en) * | 2009-12-22 | 2011-09-28 | 주식회사 엘지화학 | The high lightshielding blackmatrix composition having improved adhesion properties |
KR101333696B1 (en) | 2009-12-29 | 2013-11-27 | 제일모직주식회사 | Novel cardo type resin and photosensitive resin composition for color filter including the same |
JP2011170334A (en) * | 2010-01-20 | 2011-09-01 | Fujifilm Corp | Black curable composition for wafer-level lens, and wafer-level lens |
JP6095023B2 (en) * | 2012-05-25 | 2017-03-15 | エルジー・ケム・リミテッド | Photosensitive resin composition, pattern, pattern manufacturing method, bezel pattern manufacturing method, and display panel |
KR102054045B1 (en) * | 2017-03-03 | 2019-12-09 | 주식회사 엘지화학 | Polymer resion compound and photosensitive resin composition for black bank |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06301132A (en) * | 1993-04-16 | 1994-10-28 | Konica Corp | Silver halide photosensitive material |
JP2003113205A (en) * | 2001-10-02 | 2003-04-18 | Nippon Steel Chem Co Ltd | Insulating resin composition and laminate using the same |
JP2004083855A (en) * | 2002-06-28 | 2004-03-18 | Osaka Gas Co Ltd | Fluorene-containing resin |
WO2005049689A2 (en) * | 2003-11-17 | 2005-06-02 | Sumitomo Chemical Company, Limited | Crosslinkable substituted fluorene compounds and conjugated oligomers or polymers based thereon |
-
2008
- 2008-09-26 WO PCT/KR2008/005707 patent/WO2009048231A2/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06301132A (en) * | 1993-04-16 | 1994-10-28 | Konica Corp | Silver halide photosensitive material |
JP2003113205A (en) * | 2001-10-02 | 2003-04-18 | Nippon Steel Chem Co Ltd | Insulating resin composition and laminate using the same |
JP2004083855A (en) * | 2002-06-28 | 2004-03-18 | Osaka Gas Co Ltd | Fluorene-containing resin |
WO2005049689A2 (en) * | 2003-11-17 | 2005-06-02 | Sumitomo Chemical Company, Limited | Crosslinkable substituted fluorene compounds and conjugated oligomers or polymers based thereon |
Also Published As
Publication number | Publication date |
---|---|
WO2009048231A2 (en) | 2009-04-16 |
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