WO2009044483A1 - Pellicle pressurization mechanism of pellicle mount system - Google Patents

Pellicle pressurization mechanism of pellicle mount system Download PDF

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Publication number
WO2009044483A1
WO2009044483A1 PCT/JP2007/069593 JP2007069593W WO2009044483A1 WO 2009044483 A1 WO2009044483 A1 WO 2009044483A1 JP 2007069593 W JP2007069593 W JP 2007069593W WO 2009044483 A1 WO2009044483 A1 WO 2009044483A1
Authority
WO
WIPO (PCT)
Prior art keywords
pellicle
pressurization
board
assembly
exposure mask
Prior art date
Application number
PCT/JP2007/069593
Other languages
French (fr)
Japanese (ja)
Inventor
Jun-Ichi Shiokawa
Hideo Takahashi
Original Assignee
Asahi Kasei Emd Corporation
Matsushita Seiki Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Emd Corporation, Matsushita Seiki Co., Ltd. filed Critical Asahi Kasei Emd Corporation
Priority to PCT/JP2007/069593 priority Critical patent/WO2009044483A1/en
Publication of WO2009044483A1 publication Critical patent/WO2009044483A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

In the pellicle pressurization mechanism, the whole pellicle assembly is pressurized uniformly even when a pellicle pressurization board is warped or distorted. The pellicle pressurization mechanism of a pellicle mount system clamps an exposure mask (100) and a pellicle assembly (101) between a mask holding mechanism and the pellicle pressurization mechanism being coupled with a drive mechanism, and presses a rectangular pellicle frame (102) of the pellicle assembly (101) against the exposure mask (100) by the pellicle pressurization surface (4a) of the pellicle pressurization mechanism thus mounting the pellicle assembly on the exposure mask. A pellicle pressurization board (4) having a pellicle pressurization surface (4a), and a member (8) for transmitting pressurization force by the drive mechanism to the pellicle pressurization board (4) are provided, and a cushion sheet (31) is interposed between the pellicle pressurization board (4) and the transmission member (8). For example, a belt-shaped member such as a tape made of silicon rubber of low Young's modulus is preferably employed as the cushion sheet (31).
PCT/JP2007/069593 2007-10-05 2007-10-05 Pellicle pressurization mechanism of pellicle mount system WO2009044483A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/069593 WO2009044483A1 (en) 2007-10-05 2007-10-05 Pellicle pressurization mechanism of pellicle mount system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/069593 WO2009044483A1 (en) 2007-10-05 2007-10-05 Pellicle pressurization mechanism of pellicle mount system

Publications (1)

Publication Number Publication Date
WO2009044483A1 true WO2009044483A1 (en) 2009-04-09

Family

ID=40525916

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/069593 WO2009044483A1 (en) 2007-10-05 2007-10-05 Pellicle pressurization mechanism of pellicle mount system

Country Status (1)

Country Link
WO (1) WO2009044483A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012112998A (en) * 2010-11-19 2012-06-14 Shin Etsu Chem Co Ltd Method and apparatus for sticking pellicle for lithography

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0588358A (en) * 1991-09-27 1993-04-09 Matsushita Electric Ind Co Ltd Pellicle adhering device
JPH1090877A (en) * 1996-09-11 1998-04-10 Nikon Corp Pellicle sticking device
JP2005165170A (en) * 2003-12-05 2005-06-23 Matsushita Seiki Kk Pellicle sticking apparatus for fpd mask

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0588358A (en) * 1991-09-27 1993-04-09 Matsushita Electric Ind Co Ltd Pellicle adhering device
JPH1090877A (en) * 1996-09-11 1998-04-10 Nikon Corp Pellicle sticking device
JP2005165170A (en) * 2003-12-05 2005-06-23 Matsushita Seiki Kk Pellicle sticking apparatus for fpd mask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012112998A (en) * 2010-11-19 2012-06-14 Shin Etsu Chem Co Ltd Method and apparatus for sticking pellicle for lithography
EP2455810A3 (en) * 2010-11-19 2014-08-06 Shin-Etsu Chemical Co., Ltd. Method of adhering a lithographic pellicle and adhering apparatus therefor

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