WO2009021988A1 - Procédé de dépôt de nanoparticules sur un support - Google Patents
Procédé de dépôt de nanoparticules sur un support Download PDFInfo
- Publication number
- WO2009021988A1 WO2009021988A1 PCT/EP2008/060676 EP2008060676W WO2009021988A1 WO 2009021988 A1 WO2009021988 A1 WO 2009021988A1 EP 2008060676 W EP2008060676 W EP 2008060676W WO 2009021988 A1 WO2009021988 A1 WO 2009021988A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nanoparticles
- support
- plasma
- gold
- deposition
- Prior art date
Links
- 239000002105 nanoparticle Substances 0.000 title claims abstract description 119
- 238000000034 method Methods 0.000 title claims abstract description 74
- 238000000151 deposition Methods 0.000 title claims abstract description 50
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 46
- 230000008569 process Effects 0.000 claims description 20
- 239000000725 suspension Substances 0.000 claims description 17
- 238000002663 nebulization Methods 0.000 claims description 15
- 229910052799 carbon Inorganic materials 0.000 claims description 11
- 239000007789 gas Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000002041 carbon nanotube Substances 0.000 claims description 9
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 9
- 230000004913 activation Effects 0.000 claims description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 239000002086 nanomaterial Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 4
- 229910052723 transition metal Inorganic materials 0.000 claims description 4
- 150000003624 transition metals Chemical class 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910021536 Zeolite Inorganic materials 0.000 claims description 2
- 230000003213 activating effect Effects 0.000 claims description 2
- 239000003570 air Substances 0.000 claims description 2
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000010457 zeolite Substances 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 239000010931 gold Substances 0.000 description 53
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 48
- 229910052737 gold Inorganic materials 0.000 description 46
- 230000008021 deposition Effects 0.000 description 40
- 239000000243 solution Substances 0.000 description 40
- 229910002804 graphite Inorganic materials 0.000 description 26
- 239000010439 graphite Substances 0.000 description 26
- 239000000523 sample Substances 0.000 description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 23
- 238000001228 spectrum Methods 0.000 description 17
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 12
- 229910052697 platinum Inorganic materials 0.000 description 11
- 239000010948 rhodium Substances 0.000 description 10
- 229910052703 rhodium Inorganic materials 0.000 description 9
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000004506 ultrasonic cleaning Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000001239 high-resolution electron microscopy Methods 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- 238000004630 atomic force microscopy Methods 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 229920001903 high density polyethylene Polymers 0.000 description 4
- 239000004700 high-density polyethylene Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 230000005495 cold plasma Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000001493 electron microscopy Methods 0.000 description 3
- 239000002048 multi walled nanotube Substances 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000004627 transmission electron microscopy Methods 0.000 description 3
- 238000002525 ultrasonication Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005518 electrochemistry Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 239000001509 sodium citrate Substances 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000001636 atomic emission spectroscopy Methods 0.000 description 1
- 238000000089 atomic force micrograph Methods 0.000 description 1
- 230000004071 biological effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000010415 colloidal nanoparticle Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000004628 non contact atomic force microscopy Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical group O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 1
- 229940038773 trisodium citrate Drugs 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/14—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying for coating elongate material
- C23C4/16—Wires; Tubes
Definitions
- the present invention relates to a method of depositing and fixing nanoparticles on any support.
- nanoparticle describes an aggregate of small molecules, or an assembly of a few tens to a few thousand atoms, forming a particle whose dimensions are of the order of one nanometer. that is less than 1000 ⁇ m (l ⁇ ), preferably less than 100 nm. Because of their size, these particles possess particular physical, electrical, chemical and magnetic properties and give the supports on which they are applied new physical, electrical, chemical, magnetic and mechanical properties.
- Nanoparticles have a growing interest because of their involvement in the development of many devices used in very different fields, such as for example the detection of biological or chemical compounds, the detection of gas or chemical vapors, the elaboration fuel cells or hydrogen storage devices, the production of electronic or optical nanostructures, new chemical catalysts, bio-sensors, or so-called intelligent coatings, such as self-cleaning coatings or which have a particular biological activity, antibacterial for example.
- intelligent coatings such as self-cleaning coatings or which have a particular biological activity, antibacterial for example.
- the deposition of nanoparticles usually comprises a step of activation of the support, which, in the techniques described above, requires a pretreatment which is often complex and may take several hours or even days.
- all these techniques pose environmental problems for solution chemistry and electrochemistry, particularly because of the use of solvents and chemical pollutants, and problems of high energy consumption, as regards the vacuum techniques using a plasma.
- the document WO2007 / 122256 describes the deposition of nanoporous layers by spraying a colloidal solution in a jet of thermal plasma, a plasma whose neutral species, ionized species and electrons have the same temperature.
- the particles of the colloidal solution are at least partially melted in order to adhere to the substrate.
- the plasma jet described has a gas temperature of between 5000 ° K and 15000 ° K. A not insignificant thermal effect will therefore be noted on both the substrate and the soil particles.
- the present invention provides a method of depositing nanoparticles on a support which does not have the disadvantages of the state of the art.
- the present invention provides a rapid process, inexpensive and easy implementation.
- the present invention also proposes to minimize the thermal stresses both on the substrate and on the nanoparticles.
- the present invention also provides a deposition method which improves the homogeneity of the deposit, and, more particularly, the dispersion of the nanoparticles on the substrate.
- the present invention discloses a method using a colloidal solution (or suspension) of nanoparticles for the deposition of nanoparticles on a support, and using an atmospheric plasma for the deposition of nanoparticles on a support.
- the present invention relates to a method for depositing nanoparticles on a support comprising the following steps:
- nanoparticle an aggregate of small molecules, or an assembly of a few hundred to a few thousand atoms, forming a particle whose dimensions are of the order of one nanometer, generally less than 100 nm.
- colloidal solution means a homogeneous suspension of particles in which the solvent is a liquid and the solute a solid homogeneously disseminated in the form of very fine particles.
- Colloidal solutions can take various forms, liquid, gel or paste. Colloidal solutions are intermediate between suspensions, which are heterogeneous media comprising microscopic particles dispersed in a liquid, and true solutions, in which the solute or solutes are in the state of molecular division in the solvent. In liquid form, colloidal solutions are sometimes also called "soil”.
- the atmospheric plasma is an atmospheric non-thermal plasma.
- non-thermal plasma or “cold plasma” a partially or totally ionized gas which comprises electrons, ions (molecular or atomic), atoms or molecules, and radicals, outside the thermodynamic equilibrium, whose electron temperature (temperature of several thousands or tens of thousands of Kelvin) is significantly higher than that of ions and neutrons (temperature close to room temperature up to a few hundred Kelvin).
- Atmospheric plasma or “non-thermal atmospheric plasma” or “atmospheric cold plasma” means a partially or totally ionized gas which comprises electrons, ions (molecular or atomic), atoms or molecules , and radicals, out of thermodynamic equilibrium, whose electron temperature is significantly higher than that of ions and neutrals (the temperatures are similar to those described for a "cold plasma"), and whose pressure is between about 1 mbar and about 1200 mbar, preferably between about 800 and about 1200 mbar.
- the method comprises one or more of the following characteristics: the plasma comprises a plasmagenic gas and the macroscopic temperature of said plasma gas in said plasma can vary between about -20 0 C and about 600 0 C, preferably between -10 0 C and about 400 0 C and preferably between room temperature and about 400 0 C; the method further comprises a step of activating the surface of the support by subjecting said surface of said support to atmospheric plasma; the activation of the surface of the support and the nebulization of the colloidal solution are concomitant; activation of the surface of the support is preceded by a step of cleaning said surface of said support; the nebulization of the colloidal solution of nanoparticles is done in the discharge zone or in the post-discharge zone of the atmospheric plasma; the plasma is generated by an atmospheric plasma torch; the nebulization of the colloidal solution of nanoparticles is in a direction substantially parallel to the surface of the support;
- the nanoparticles are nanoparticles of a metal, of a metal oxide, of a metal alloy or of their mixture;
- the nanoparticles are nanoparticles of at least one transition metal, its corresponding oxide, a transition metal alloy or a mixture thereof; the nanoparticles are chosen from the group formed by magnesium (Mg), strontium (Sr), titanium (Ti), zirconium (Zr), lanthanum (La), vanadium (V), niobium (Nb) ), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), manganese (Mn), rhenium (Re), iron (Fe), ruthenium (Ru), osmium (Os), cobalt
- the nanoparticles are chosen from the group formed by titanium dioxide (titanium (TiO 2 )), copper oxide (CuO), ferrous oxide (FeO), ferric oxide (Fe 2 O 3), oxide iron (Fe3 ⁇ 4), iridium dioxide (IrO 2), zirconium dioxide (ZrO 2), aluminum oxide (Al2O3);
- the nanoparticles are chosen from the group formed by a gold / platinum (AuPt), platinum / ruthenium (PtRu), cadmium / sulfur (CdS) or lead / sulfur (PbS) alloy;
- the support is a solid support, a gel or a nano-structured material;
- the support is selected from the group consisting of a carbon support, carbon nanotubes, a metal, a metal alloy, a metal oxide, a zeolite, a semiconductor, a polymer, glass and / or ceramic;
- the support is silica, carbon, titanium, alumina or multi-walled carbon nanotubes;
- the atmospheric plasma is generated from a plasmagenic gas chosen from the group formed by argon, helium, nitrogen, hydrogen, oxygen, carbon dioxide, air or their mixed ;
- the colloidal solution comprises a surfactant.
- surfactant a compound modifying the surface tension between two surfaces.
- the surfactant compounds are amphiphilic molecules, that is to say that they have two parts of different polarity, one lipophilic and apolar, and the other, hydrophilic and polar. This type of molecule helps stabilize colloids.
- cationic surfactants anionic, amphoteric or nonionic.
- An example of such a surfactant is sodium citrate.
- the present invention also discloses the use of a colloidal solution of nanoparticles for depositing nanoparticles on a support using an atmospheric plasma.
- the use of the colloidal nanoparticle solution comprises one or more of the following characteristics: the colloidal solution is nebulized in the discharge or post-discharge zone of the atmospheric plasma; the atmospheric plasma is generated by an atmospheric plasma torch.
- the present invention also describes the use of an atmospheric plasma for the deposition of nanoparticles on a support, said nanoparticles being in the form of a colloidal solution of nanoparticles, and said colloidal solution being nebulized on the surface of said support in said atmospheric plasma.
- FIG. 1 represents the size distribution of the gold particles of a colloidal solution.
- FIG. 2 represents an image obtained by transmission electron microscopy (TEM) of a colloidal solution of the gold particles.
- Figure 3 schematically shows an atmospheric plasma torch.
- FIG. 4 represents X-ray photoelectron spectroscopy (XPS) spectra of the HOPG graphite surface after plasma gold nanoparticle deposition according to the process of the present invention, (a) spectrum. global, (b) deconvolved spectrum of the Au 4f level, (c) deconvolved spectrum of the Is level, (d) deconvolved spectrum of the C Is level.
- XPS X-ray photoelectron spectroscopy
- FIG. 5 represents atomic force microscopy (AFM) images of a HOPG graphite sample a) before, and b) after deposition of gold nanoparticles according to the method of the present invention.
- FIG. 6 represents high-resolution electron microscopy images of secondary electrons (FEG-SEM) of a HOPG graphite sample a) before, b) and c) after deposition of gold nanoparticles according to the method of FIG. the present invention, (a) magnification x 2000, (b) magnification x 25000, (c) magnification x 80000.
- EDS Energy dispersive analysis
- FIG. 7 represents the comparison of the experimental XPS spectrum of the Au 4f level presented in FIG. 4 (b) and of the modeled spectrum using a Volmer-Weber type growth model.
- FIG. 8 represents an X-ray photoelectron spectroscopy spectrum (XPS) of the HOPG graphite surface after deposition of gold nanoparticles without the use of a plasma (comparative).
- FIG. 9 represents a high-resolution electron microscopy image of the secondary electrons (FEG-SEM) of a HOPG graphite sample after the deposition of gold nanoparticles without the use of a plasma (comparative).
- FIG. 8 represents an X-ray photoelectron spectroscopy spectrum (XPS) of the HOPG graphite surface after deposition of gold nanoparticles without the use of a plasma (comparative).
- FIG. 9 represents a high-resolution electron microscopy image of the secondary electrons (FEG-SEM) of a HOPG graphite sample after
- FIG. 10 represents an image (magnification x 100000) obtained by high resolution electron microscopy of the secondary electrons (FEG-SEM) of a steel sample after deposition of gold nanoparticles according to the method of the present invention.
- FIG. 11 represents an image (magnification ⁇ 3000) obtained by high-resolution electron microscopy of the secondary electrons (FEG-SEM) of a glass sample after deposition of gold nanoparticles according to the process of the present invention.
- FIG. 12 represents an image (magnification ⁇ 50000) obtained by high-resolution electron microscopy of the secondary electrons (FEG-SEM) of a sample of PVC polymer after deposition of gold nanoparticles according to the process of the present invention. .
- FIG. 13 represents an image (magnification x 10000) obtained by high-resolution electron microscopy of secondary electrons (FEG-SEM) of a sample of HDPE polymer after deposition of gold nanoparticles according to the method of the present invention. .
- FIG. 14 represents an image (magnification ⁇ 10000) obtained by high resolution electron microscopy of the secondary electrons.
- FIG. 15 represents an image obtained by transmission electron microscopy (TEM) of a sample of carbon nanotubes before (a) and after deposition of gold nanoparticles according to the process of the present invention (b).
- TEM transmission electron microscopy
- FIG. 16 represents an X-ray photoelectron spectroscopy (XPS) spectrum of the surface of the carbon nanotubes after deposition of gold nanoparticles according to the process of the present invention.
- XPS X-ray photoelectron spectroscopy
- FIG. 17 represents an image obtained by transmission electron microscopy (TEM) of a sample of carbon nanotubes after deposit of platinum nanoparticles according to the process of the present invention.
- TEM transmission electron microscopy
- FIG. 18 represents an X-ray photoelectron spectroscopy (XPS) spectrum of the surface of the carbon nanotubes after deposition of platinum nanoparticles according to the process of the present invention.
- XPS X-ray photoelectron spectroscopy
- FIG. 19 represents an image
- FIG. 20 represents an X-ray photoelectron spectroscopy (XPS) spectrum of the HOPG graphite surface after deposition of rhodium nanoparticles according to the method of the present invention.
- XPS X-ray photoelectron spectroscopy
- FIG. 21 represents an image (magnification x 100000) of secondary electron electron microscopy (FEG-SEM) of a steel sample after the deposition of platinum nanoparticles according to the process of the present invention.
- FEG-SEM secondary electron electron microscopy
- FIG. 22 represents an image (magnification x 100000) of secondary electron electron microscopy (FEG-SEM) of a PVC sample after the deposition of rhodium nanoparticles according to the process of the present invention.
- FEG-SEM secondary electron electron microscopy
- FIG. 23 represents an image (magnification x 100000) of secondary electron electron microscopy (FEG-SEM) of a sample of HDPE after the deposition of rhodium nanoparticles according to the method of the present invention.
- FEG-SEM secondary electron electron microscopy
- the nanoparticle deposition method according to the invention involves a colloidal solution or suspension of nanoparticles which is deposited on any support with the aid of an atmospheric plasma, said atmospheric plasma being able to be generated by any device adequate use of an atmospheric plasma.
- This method has many advantages. For example, it allows a so-called “clean” deposit, that is to say without the use of solvents called “pollutant”.
- the deposition of nanoparticles according to the invention uses only a low energy consumption.
- the deposition of nanoparticles is rapid because the activation of the support and the nebulization of the nanoparticles, and possibly also the prior cleaning of the support, are carried out in the atmospheric plasma, or in the flow of the atmospheric plasma, in a single step or one continuous process.
- the method according to the invention allows a strong adhesion of the nanoparticles to the support.
- This technique makes it possible to control the properties of the interface and to adjust the deposition of the nanoparticles on the support.
- this method does not require expensive installations and is easily implemented industrially.
- the colloidal solution of nanoparticles can be prepared by any technique and / or any suitable means.
- the support, on which the colloidal solution of nanoparticles is deposited is any suitable material that can be covered with nanoparticles, any material whatever its nature and / or its shape.
- he it is a solid support, a gel or a nano-structured material.
- the plasma is any suitable atmospheric plasma. It is a plasma generated at a pressure of between about 1 mbar and about 1200 mbar, preferably between 800 and 1200 mbar. Preferably, it is an atmospheric plasma whose macroscopic temperature of the gas can vary for example between room temperature and about 400 ° C. Preferably, the plasma is generated by an atmospheric plasma torch.
- An atmospheric plasma does not use vacuum, which can be inexpensive and easy maintenance.
- the atmospheric plasma makes it possible to clean and activate the surface of the support, either by functionalizing it, for example by creating oxygen, nitrogen, sulfur, and / or hydrogenated groups, or by creating surface defects, for example gaps, steps, and / or stings.
- These surface groups can for example comprise very reactive radicals and having a short life.
- the nanoparticles themselves can be activated by plasma, either directly by radical formation from the water of hydration, or by reactions with a surfactant attached to the surface of the nanoparticle.
- the activation of the support and the nebulization of the colloidal solution are concomitant, namely in the plasma, or in the plasma flow, generated by a device use of an atmospheric plasma.
- the nebulization of the colloidal solution occurs at the same time, or immediately after, the activation of the support by the atmospheric plasma.
- the nebulization of the colloidal solution can be done either in the discharge zone or in the post-discharge zone of the atmospheric plasma.
- the nebulization of the colloidal solution is in the post-discharge area of the plasma because, in some cases, this may have additional advantages. This may not contaminate the device generating the plasma. This may make it possible to facilitate the treatment of polymeric supports, to avoid the degradation of the support to be coated, and also, for example, not to cause melting, oxidation, degradation and / or aggregation of the nanoparticles.
- the nebulization of the colloidal solution is any nebulization and can be done in any direction (orientation) relative to the surface of the support.
- the nebulization is in a direction substantially parallel to the support, but it can also be done for example at an angle of about 45 °, or for example at an angle of about 75 ° relative to the surface of the support treat.
- EXAMPLE 1 Gold nanoparticles were deposited on highly oriented pyrolytic graphite (HOPG), a support which has chemical properties similar to those of multiwall carbon nanotubes (MWCNTs).
- HOPG highly oriented pyrolytic graphite
- MWCNTs multiwall carbon nanotubes
- Highly oriented pyrolytic graphite (HOPG) is commercially available (MikroMasch
- this graphite With a ZYB quality, this graphite, with a size of 10 mm x 10 mm x 1 mm, has an angle called "mosaic spread angle" of 0.8 ° ⁇ 0.2 ° and a size of "lateral grain” greater than 1 mm. Few layers of The surface of the graphite is previously detached with adhesive tape, before the graphite sample is immersed in an ethanol solution for 5 minutes, under ultrasonication. The colloidal suspension is prepared for example by the method of thermal reduction of citrate as described in the article by Turkevich et al. J. Faraday Discuss. Chem. Soc.
- This method of thermal reduction of the citrate makes it possible to obtain a stable dispersion of gold particles, whose gold concentration is 134 mM, and whose particles have an average diameter of approximately 10 nm and approximately 10% of polydispersity (Figure 1).
- the diffuser of the plasma torch comprises two perforated aluminum electrodes 33 mm in diameter and separated by a gap of 1.6 mm wide.
- the diffuser is placed inside an airtight chamber, under argon atmosphere at room temperature.
- the upper electrode 1 of the plasma source is connected to a radio frequency generator, for example 13.56 MHz, while the lower electrode 2 is grounded.
- the plasma torch operates at 80 W and the plasma 3 is formed by feeding the torch upstream of the electrodes with argon 4 at a rate of 30 L / min.
- the space between the sample of graphite HOPG resting on a sample holder 7 and the lower electrode 2 is 6 ⁇ 1 mm. This space is under atmospheric pressure.
- the graphite support Before the deposition of the nanoparticles, the graphite support is subjected to the plasma stream of the plasma torch, for example about 2 minutes, which allows to clean and activate the support.
- 3 to 5 ml of colloidal suspension is nebulized in the post-discharge area of the plasma torch and in a direction 6 substantially parallel to the sample ( Figure 3).
- the colloidal suspension is injected for about 5 minutes, by periodic pulsations of about one second, spaced about 15 seconds apart.
- the samples are then washed in ethanol solution under ultrasonication for about 5 minutes.
- X-ray photoelectron spectroscopy (XPS) analysis of the surface of the HOPG graphite coated with nanoparticles was carried out on a ThermoVG Microlab 350 apparatus, with an analytical chamber at a pressure of 10 -9 mbar and a radiation source.
- X Al Ka (h ⁇ 1486.6 eV) operating at 300 W.
- the spectra were measured with a recording angle of 90 ° and were recorded with a passing energy in the analyzer of 100 eV and a beam size of X-rays of 2 mm x 5 mm.
- the determination of the chemical state was made, with a passing energy in the analyzer of 20 eV.
- FIG. 4 a shows the presence of carbon at a percentage of 77.8%, oxygen at a percentage of 14, 9%, potassium at a percentage of 3.2% and gold at a percentage of 1.0%. Traces of silica were also detected; these are impurities incorporated in the HOPG graphite samples.
- the graphite samples are previously deposited on a copper strip of a sample holder before being introduced into the analysis chamber under a pressure of about 10 ⁇ 8 mbar.
- Figure 6a in the initial state, several steps are observable at a magnification of 20000 times.
- Figure 6 b) many clusters, represented by bright spots, and having a homogeneous distribution, are present on the surface of the graphite after the deposition of nanoparticles according to the method of the invention.
- a larger magnification (80000 times, Figure 6c) it is easy to see isolated aggregates and nanoparticles with a diameter of about 10 nm.
- the growth mode is of the Volmer-Weber type (3D structure in islands) Table 1:
- the height of the gold islands (h) varies between 9.2 and 10.6 nm, values substantially identical to the average diameter of the nanoparticles of the colloidal suspension ( Figure 1).
- a gold coverage percentage of about 10% is in agreement with the recovery rate determined by atomic force microscopy and scanning electron microscopy.
- the analysis of the Au 4f spectral curve by the QUASES software shows a good correlation between experimental and theoretical data.
- a deposit of gold nanoparticles on HOPG according to the method of Example 1 is carried out, with the exception of the step of nanoparticle deposition that is carried out without the use of an atmospheric plasma ( Figures 8 and 9). After the deposition of the nanoparticles and before analysis, the samples obtained are washed with ethanol for about 5 minutes with ultrasound.
- Example 4 the method used is that described in Example 1, only the supports (substrates) used and the nature of the colloidal solutions are different.
- Example 4 the method used is that described in Example 1, only the supports (substrates) used and the nature of the colloidal solutions are different.
- Gold nanoparticles were deposited on a steel support according to the method described in Example 1, with ultrasonic cleaning. Note in Figure 10 the presence of nanoparticles.
- Example 5
- Gold nanoparticles were deposited on a glass support according to the method described in Example 1. It can be seen from Figure 11 the presence of nanoparticles after ultrasonic cleaning.
- Gold nanoparticles were deposited on a PVC support according to the method described in Example 1, with ultrasonic cleaning.
- the microscopy image of FIG. 12 was obtained after covering the sample with a metal layer. Note in Figure 12 the presence of nanoparticles.
- Gold nanoparticles were deposited on an HDPE support (FIG. 13) according to the method described in example 1, with ultrasonic cleaning.
- the microscopy image of FIG. 13 was obtained after covering the sample with a metal layer. Note in Figure 13 the presence of nanoparticles.
- Gold nanoparticles were deposited on a carbon nanotube support according to the method described in Example 1, with ultrasonic cleaning. Note in Figure 15 the presence of spherical nanoparticles of about 10 nm after ultrasonic cleaning. This presence of gold is confirmed by the XPS spectrum in FIG. 16.
- colloidal solutions of platinum and rhodium provided by GA Somorjai provided by GA Somorjai (Department of Chemistry, University of California, Berkeley (USA) ) were used (RM Rioux, H. Song, JD Hoefelmeyer, Yang P. and GA Somorjai, J. Phys Chem B 2005, 109, 2192-2202, Yuan Wang, Jiawen Ren, Kai Deng, Lin Gui, and Youqi Tang, Chem Materials 2000, 12, 1622-1627.).
- Platinum nanoparticles were deposited on a carbon nanotube support according to the method described in US Pat. Example 1. It is noted in Figure 17 the presence of spherical nanoparticles of about 10 nm. This presence of platinum is confirmed by the XPS spectrum in FIG. 18.
- Example 10 Rhodium nanoparticles were deposited on a HOPG carbon support according to the process described in Example 1. It is noted in FIG. presence of spherical nanoparticles of around 10 nm after ultrasonic cleaning. This presence of rhodium is confirmed by the XPS spectrum in Figure 20.
- Rhodium nanoparticles were deposited on a PVC support according to the method described in Example 1, with ultrasonic cleaning.
- the microscopy image of FIG. 22 was obtained after covering the sample with a metal layer. Note in Figure 22 the presence of nanoparticles.
- the microscopy image of FIG. 23 was obtained after covering 1 sample with a metal layer. Note in Figure 23 the presence of nanoparticles.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08787216.4A EP2179071B1 (fr) | 2007-08-14 | 2008-08-14 | Procédé de dépôt de nanoparticules sur un support |
US12/673,437 US20120003397A1 (en) | 2007-08-14 | 2008-08-14 | Method for depositing nanoparticles on a support |
JP2010520582A JP2010535624A (ja) | 2007-08-14 | 2008-08-14 | 支持体上にナノ粒子を付着するための方法 |
CA2696081A CA2696081A1 (fr) | 2007-08-14 | 2008-08-14 | Procede de depot de nanoparticules sur un support |
CN200880111576A CN101821421A (zh) | 2007-08-14 | 2008-08-14 | 在载体上沉积纳米微粒的方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07114344 | 2007-08-14 | ||
EP07114344.0 | 2007-08-14 | ||
EP08151463A EP2093305A1 (fr) | 2008-02-14 | 2008-02-14 | Procédé de dépôt de nanoparticules sur un support |
EP08151463.0 | 2008-02-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009021988A1 true WO2009021988A1 (fr) | 2009-02-19 |
Family
ID=39800555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2008/060676 WO2009021988A1 (fr) | 2007-08-14 | 2008-08-14 | Procédé de dépôt de nanoparticules sur un support |
Country Status (7)
Country | Link |
---|---|
US (1) | US20120003397A1 (fr) |
EP (1) | EP2179071B1 (fr) |
JP (1) | JP2010535624A (fr) |
KR (1) | KR20100072184A (fr) |
CN (1) | CN101821421A (fr) |
CA (1) | CA2696081A1 (fr) |
WO (1) | WO2009021988A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101840852A (zh) * | 2010-04-02 | 2010-09-22 | 中国科学院半导体研究所 | 在图形化的半导体衬底上制作有序半导体纳米结构的方法 |
WO2011020851A1 (fr) * | 2009-08-18 | 2011-02-24 | Siemens Aktiengesellschaft | Revêtements remplis de particules, procédé de production et utilisations |
WO2012028695A3 (fr) * | 2010-09-01 | 2013-03-28 | Facultes Universitaires Notre-Dame De La Paix | Procédé de dépôt de nanoparticules sur des substrats |
WO2016099013A1 (fr) * | 2014-12-19 | 2016-06-23 | (주)바이오니아 | Membrane nanoporeuse de nanostructure de carbone couplée à un liant et son procédé de fabrication |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100983224B1 (ko) * | 2008-04-10 | 2010-09-20 | 김선휘 | 흑연의 미세입자 및 흑연 콜로이드 제조방법 |
KR101127121B1 (ko) * | 2009-06-12 | 2012-03-20 | 한국과학기술원 | 공기 분사를 이용하여 목표 기판에 금속 나노입자층을 형성시키는 방법 |
CN102258921A (zh) * | 2011-05-27 | 2011-11-30 | 安徽南风环境工程技术有限公司 | 一种油烟吸附过滤网及其制备方法 |
EP2736837B1 (fr) * | 2011-07-26 | 2021-09-29 | OneD Material, Inc. | Procédé pour produire des nanofils de silicium |
US9963345B2 (en) * | 2013-03-15 | 2018-05-08 | The United States Of America As Represented By The Administrator Of Nasa | Nanoparticle hybrid composites by RF plasma spray deposition |
WO2015016638A1 (fr) * | 2013-08-01 | 2015-02-05 | 주식회사 엘지화학 | Procédé pour produire un complexe de nanoparticules de métal-porteur carbone et complexe de nanoparticules de métal-porteur carbone produit au moyen du procédé |
EP2937890B1 (fr) * | 2014-04-22 | 2020-06-03 | Europlasma nv | Appareil de revêtement au plasma avec un diffuseur de plasma et procédé prévenant la décoloration d'un substrat |
CN104711568B (zh) * | 2015-02-27 | 2017-11-14 | 南京邮电大学 | 一种在金属丝上包裹碳纳米材料的制备方法及其装置 |
US20180248199A1 (en) * | 2015-08-27 | 2018-08-30 | Osaka University | Method for manufacturing metal nanoparticles, method for manufacturing metal nanoparticle-loaded carrier, and metal nanoparticle-loaded carrier |
CN105369180A (zh) * | 2015-12-02 | 2016-03-02 | 广州有色金属研究院 | 一种致密氧离子-电子混合导体氧化物涂层的制备方法 |
ES2913682T3 (es) | 2016-07-15 | 2022-06-03 | Oned Mat Inc | Procedimiento de fabricación para la fabricación de nanocables de silicio en polvos a base de carbono para su uso en baterías |
KR101957234B1 (ko) * | 2017-03-10 | 2019-06-19 | 경북대학교 산학협력단 | 플라즈마 발생장치 |
MX2021004744A (es) * | 2018-10-24 | 2021-08-24 | Atmospheric Plasma Solutions Inc | Fuente de plasma y método para preparar y recubrir superficies usando ondas de presión de plasma atmosférico. |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004035496A2 (fr) * | 2002-07-19 | 2004-04-29 | Ppg Industries Ohio, Inc. | Article a structure nano-proportionnee et procede de fabrication associe |
US20050031876A1 (en) * | 2003-07-18 | 2005-02-10 | Songwei Lu | Nanostructured coatings and related methods |
FR2877015A1 (fr) * | 2004-10-21 | 2006-04-28 | Commissariat Energie Atomique | Revetement nanostructure et procede de revetement. |
DE102006005775A1 (de) * | 2006-02-07 | 2007-08-09 | Forschungszentrum Jülich GmbH | Thermisches Spritzverfahren mit kolloidaler Suspension |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5141017B2 (fr) * | 1972-12-26 | 1976-11-08 | ||
JPH0941251A (ja) * | 1995-07-28 | 1997-02-10 | Kyodo Kumiai Zou Shudan | 撥水布に合成樹脂立体模様の形成付着方法 |
JP3511128B2 (ja) * | 1998-03-02 | 2004-03-29 | 日立造船株式会社 | 金属微粒子の製造方法および同微粒子の多孔質担体への担持方法 |
JP3256741B2 (ja) * | 1998-07-24 | 2002-02-12 | 独立行政法人産業技術総合研究所 | 超微粒子成膜法 |
JP2002237480A (ja) * | 2000-07-28 | 2002-08-23 | Sekisui Chem Co Ltd | 放電プラズマ処理方法 |
JP2002121024A (ja) * | 2000-10-12 | 2002-04-23 | Seiko Epson Corp | 酸化チタン膜の製造方法、酸化チタン膜および太陽電池 |
JP2003007497A (ja) * | 2001-06-19 | 2003-01-10 | Pearl Kogyo Kk | 大気圧プラズマ処理装置 |
DE10211701A1 (de) * | 2002-03-16 | 2003-09-25 | Studiengesellschaft Kohle Mbh | Verfahren zur in situ Immobilisierung von wasserlöslichen nanodispergierten Metalloxid-Kolloiden |
GB0208263D0 (en) * | 2002-04-10 | 2002-05-22 | Dow Corning | Protective coating composition |
JP2006515708A (ja) * | 2003-01-31 | 2006-06-01 | ダウ・コーニング・アイルランド・リミテッド | プラズマ発生アセンブリ |
JP2004356558A (ja) * | 2003-05-30 | 2004-12-16 | Toshio Goto | コーティング装置およびコーティング方法 |
CH696811A5 (de) * | 2003-09-26 | 2007-12-14 | Michael Dvorak Dr Ing Dipl Phy | Verfahren zur Beschichtung einer Substratoberfläche unter Verwendung eines Plasmastrahles. |
JP2005163117A (ja) * | 2003-12-03 | 2005-06-23 | Ainobekkusu Kk | 金属コロイドの製造方法及びこの方法によって製造された金属コロイド |
JP4177244B2 (ja) * | 2003-12-15 | 2008-11-05 | 日信工業株式会社 | 多孔質複合金属材料の製造方法 |
JP4300105B2 (ja) * | 2003-12-19 | 2009-07-22 | 株式会社コーセー | 抗酸化剤 |
WO2006048650A1 (fr) * | 2004-11-05 | 2006-05-11 | Dow Corning Ireland Limited | Systeme a plasma |
-
2008
- 2008-08-14 CA CA2696081A patent/CA2696081A1/fr not_active Abandoned
- 2008-08-14 JP JP2010520582A patent/JP2010535624A/ja active Pending
- 2008-08-14 EP EP08787216.4A patent/EP2179071B1/fr not_active Not-in-force
- 2008-08-14 CN CN200880111576A patent/CN101821421A/zh active Pending
- 2008-08-14 US US12/673,437 patent/US20120003397A1/en not_active Abandoned
- 2008-08-14 WO PCT/EP2008/060676 patent/WO2009021988A1/fr active Application Filing
- 2008-08-14 KR KR1020107005411A patent/KR20100072184A/ko not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004035496A2 (fr) * | 2002-07-19 | 2004-04-29 | Ppg Industries Ohio, Inc. | Article a structure nano-proportionnee et procede de fabrication associe |
US20050031876A1 (en) * | 2003-07-18 | 2005-02-10 | Songwei Lu | Nanostructured coatings and related methods |
FR2877015A1 (fr) * | 2004-10-21 | 2006-04-28 | Commissariat Energie Atomique | Revetement nanostructure et procede de revetement. |
DE102006005775A1 (de) * | 2006-02-07 | 2007-08-09 | Forschungszentrum Jülich GmbH | Thermisches Spritzverfahren mit kolloidaler Suspension |
Non-Patent Citations (2)
Title |
---|
DE-QUANG Y. , EDWARD SACHER: "PLATINUM NANOPARTICLE INTERACTION WITH CHEMICALLY MODIFIED HIGHLY ORIENTED PYROLITC GRAPHITE SURFACES", CHEMISTRY OF MATERIALS, vol. 18, no. 7, 2006, XP002504556 * |
XIANGHUI H. , KWANG-LEONG C.: "PROCESSING AND APPLICATIONS OF AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITION", CHEMICAL VAPOR DEPOSITION, vol. 12, 1 December 2006 (2006-12-01), pages 583 - 596, XP002504382 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011020851A1 (fr) * | 2009-08-18 | 2011-02-24 | Siemens Aktiengesellschaft | Revêtements remplis de particules, procédé de production et utilisations |
CN101840852A (zh) * | 2010-04-02 | 2010-09-22 | 中国科学院半导体研究所 | 在图形化的半导体衬底上制作有序半导体纳米结构的方法 |
WO2012028695A3 (fr) * | 2010-09-01 | 2013-03-28 | Facultes Universitaires Notre-Dame De La Paix | Procédé de dépôt de nanoparticules sur des substrats |
WO2016099013A1 (fr) * | 2014-12-19 | 2016-06-23 | (주)바이오니아 | Membrane nanoporeuse de nanostructure de carbone couplée à un liant et son procédé de fabrication |
Also Published As
Publication number | Publication date |
---|---|
US20120003397A1 (en) | 2012-01-05 |
KR20100072184A (ko) | 2010-06-30 |
CN101821421A (zh) | 2010-09-01 |
JP2010535624A (ja) | 2010-11-25 |
EP2179071A1 (fr) | 2010-04-28 |
EP2179071B1 (fr) | 2016-04-13 |
CA2696081A1 (fr) | 2009-02-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2179071B1 (fr) | Procédé de dépôt de nanoparticules sur un support | |
CN107313046B (zh) | 一种sers基底及其制备方法 | |
Achour et al. | Influence of plasma functionalization treatment and gold nanoparticles on surface chemistry and wettability of reactive-sputtered TiO2 thin films | |
Luo et al. | Catalytic activation of core-shell assembled gold nanoparticles as catalyst for methanol electrooxidation | |
US20040129570A1 (en) | Method of forming a nano-supported catalyst on a substrate for nanotube growth | |
Dudin et al. | Electro-oxidation of hydrazine at gold nanoparticle functionalised single walled carbon nanotube network ultramicroelectrodes | |
Ahmad et al. | Self-assembly and wetting properties of gold nanorod–CTAB molecules on HOPG | |
Zhu et al. | Two-dimensional surface enhanced Raman mapping of differently prepared gold substrates with an azobenzene self-assembled monolayer | |
EP3180810B1 (fr) | Procédé de synthèse de nanocomposites à base de tio2 et de nanostructures carbonées | |
Chen et al. | Sonochemical and mechanical stirring synthesis of liquid metal nanograss structures for low‐cost SERS substrates | |
EP2396447A1 (fr) | Procede de traitement par un faisceau d'ions d'une couche metallique deposee sur un substrat | |
Kobiela et al. | The influence of gas phase composition on the process of Au–Hg amalgam formation | |
EP2093305A1 (fr) | Procédé de dépôt de nanoparticules sur un support | |
EP2850223B1 (fr) | Procede de fabrication d'un materiau composite | |
Rao et al. | Reversal and control the tip-enhanced Raman scattering efficiency of rough plasmonic probes fabricated using UV-ozone and hydrazine | |
Tabet-Aoul et al. | Rhodium thin film-carbon nanotube nanostructures: Synthesis, characterization and electron transfer properties | |
Kordás et al. | Room temperature chemical deposition of palladium nanoparticles in anodic aluminium oxide templates | |
US20190217382A1 (en) | Methods for synthesizing silver nanowires | |
Yoshida et al. | The patterned Au oxide layer formation on Au surfaces by F2 laser irradiation under the atmospheric conditions | |
Xu et al. | Detection of layer‐by‐layer self‐assembly multilayer films by low‐temperature plasma mass spectrometry | |
Gatin et al. | Effect of the electric potential on the interaction of gold nanoparticles deposited on a graphite substrate with molecular hydrogen | |
FR2918214A1 (fr) | Dispersion de materiaux composites, notamment pour des piles a combustible | |
Bao et al. | Nanoscale chemical characterization of materials and interfaces by tip-enhanced Raman spectroscopy | |
Lkhamsuren et al. | Fabrication of mechanically stable Au-coatings on probes of atomic force microscopes for nano-mechanical and-optical measurements | |
Chen et al. | Large-scale Uniformly Hybrid Micro-nano Structure Wetting Solid Substrate for Surface-enhanced Raman Spectroscopy |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200880111576.8 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08787216 Country of ref document: EP Kind code of ref document: A1 |
|
DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) | ||
DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2696081 Country of ref document: CA |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2010520582 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2008787216 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: 20107005411 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 12673437 Country of ref document: US |