WO2009008598A3 - Method of hydrating a ceramic spray-coating layer, method of manufacturing an electrostatic chuck that uses the hydrating method, and substrate structure and electrostatic chuck having the ceramic spray-coating layer formed using the hydrating method - Google Patents

Method of hydrating a ceramic spray-coating layer, method of manufacturing an electrostatic chuck that uses the hydrating method, and substrate structure and electrostatic chuck having the ceramic spray-coating layer formed using the hydrating method Download PDF

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Publication number
WO2009008598A3
WO2009008598A3 PCT/KR2008/003386 KR2008003386W WO2009008598A3 WO 2009008598 A3 WO2009008598 A3 WO 2009008598A3 KR 2008003386 W KR2008003386 W KR 2008003386W WO 2009008598 A3 WO2009008598 A3 WO 2009008598A3
Authority
WO
WIPO (PCT)
Prior art keywords
hydrating
coating layer
ceramic spray
electrostatic chuck
manufacturing
Prior art date
Application number
PCT/KR2008/003386
Other languages
French (fr)
Other versions
WO2009008598A2 (en
Inventor
Kyung-Ic Jang
Kyung-Hwan Ye
Sam-Woong Kim
Hyun-Mi Yuk
Original Assignee
Komico Ltd
Kyung-Ic Jang
Kyung-Hwan Ye
Sam-Woong Kim
Hyun-Mi Yuk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komico Ltd, Kyung-Ic Jang, Kyung-Hwan Ye, Sam-Woong Kim, Hyun-Mi Yuk filed Critical Komico Ltd
Publication of WO2009008598A2 publication Critical patent/WO2009008598A2/en
Publication of WO2009008598A3 publication Critical patent/WO2009008598A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • C23C8/16—Oxidising using oxygen-containing compounds, e.g. water, carbon dioxide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

In a method of hydrating a ceramic spray-coating layer of an electrostatic chuck, water penetrates into pores and/or cracks of the ceramic spray-coating layer, and the penetrated water then reacts with the ceramic spray-coating layer to form hydroxide in the pores and/or cracks. As a result, the electrical characteristics and hydrophobicity of the ceramic spray-coating layer may be improved.
PCT/KR2008/003386 2007-07-10 2008-06-16 Method of hydrating a ceramic spray-coating layer, method of manufacturing an electrostatic chuck that uses the hydrating method, and substrate structure and electrostatic chuck having the ceramic spray-coating layer formed using the hydrating method WO2009008598A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070069033A KR100863932B1 (en) 2007-07-10 2007-07-10 Method of hydrating a ceramic spray-coating layer, method of manufacturing a electrostatic chuck using the method and substrate structure and electrostatic chuck having the ceramic spray-coating layer manufactured by the hydrating method
KR10-2007-0069033 2007-07-10

Publications (2)

Publication Number Publication Date
WO2009008598A2 WO2009008598A2 (en) 2009-01-15
WO2009008598A3 true WO2009008598A3 (en) 2009-03-19

Family

ID=40229234

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/003386 WO2009008598A2 (en) 2007-07-10 2008-06-16 Method of hydrating a ceramic spray-coating layer, method of manufacturing an electrostatic chuck that uses the hydrating method, and substrate structure and electrostatic chuck having the ceramic spray-coating layer formed using the hydrating method

Country Status (3)

Country Link
KR (1) KR100863932B1 (en)
TW (1) TW200903706A (en)
WO (1) WO2009008598A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101817779B1 (en) * 2015-12-31 2018-01-11 (주)코미코 Plasma Resistant Coating Layer, Method of Forming the Same
US20180016678A1 (en) 2016-07-15 2018-01-18 Applied Materials, Inc. Multi-layer coating with diffusion barrier layer and erosion resistant layer

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030007308A1 (en) * 2000-01-21 2003-01-09 Yoshio Harada Electrostatic chuck member and method of producing the same
US20030215484A1 (en) * 2002-03-04 2003-11-20 Niklas Axen Ceramic surface layers and coated devices
JP2006130434A (en) * 2004-11-08 2006-05-25 Tokyo Electron Ltd Washing method of ceramic thermal spray member, program for carrying out the method, storage medium, and ceramic thermal spray member
JP2006131966A (en) * 2004-11-08 2006-05-25 Tokyo Electron Ltd Method for producing ceramic-sprayed member, program for carrying out the method, storage medium and ceramic-sprayed member

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19916403C1 (en) * 1999-04-06 2000-10-12 Hahn Meitner Inst Berlin Gmbh Process for the production of thin, poorly soluble coatings
KR20030044499A (en) * 2001-11-30 2003-06-09 삼성전자주식회사 Electro static chuck and Method of Manufacturing Thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030007308A1 (en) * 2000-01-21 2003-01-09 Yoshio Harada Electrostatic chuck member and method of producing the same
US20030215484A1 (en) * 2002-03-04 2003-11-20 Niklas Axen Ceramic surface layers and coated devices
JP2006130434A (en) * 2004-11-08 2006-05-25 Tokyo Electron Ltd Washing method of ceramic thermal spray member, program for carrying out the method, storage medium, and ceramic thermal spray member
JP2006131966A (en) * 2004-11-08 2006-05-25 Tokyo Electron Ltd Method for producing ceramic-sprayed member, program for carrying out the method, storage medium and ceramic-sprayed member

Also Published As

Publication number Publication date
KR100863932B1 (en) 2008-11-18
TW200903706A (en) 2009-01-16
WO2009008598A2 (en) 2009-01-15

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