WO2008129981A1 - Photosensitive lithographic printing plate material - Google Patents

Photosensitive lithographic printing plate material Download PDF

Info

Publication number
WO2008129981A1
WO2008129981A1 PCT/JP2008/057334 JP2008057334W WO2008129981A1 WO 2008129981 A1 WO2008129981 A1 WO 2008129981A1 JP 2008057334 W JP2008057334 W JP 2008057334W WO 2008129981 A1 WO2008129981 A1 WO 2008129981A1
Authority
WO
WIPO (PCT)
Prior art keywords
printing plate
plate material
lithographic printing
photosensitive lithographic
photosensitive
Prior art date
Application number
PCT/JP2008/057334
Other languages
French (fr)
Japanese (ja)
Inventor
Emiko Kataoka
Original Assignee
Konica Minolta Medical & Graphic, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical & Graphic, Inc. filed Critical Konica Minolta Medical & Graphic, Inc.
Publication of WO2008129981A1 publication Critical patent/WO2008129981A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

Disclosed is a photosensitive lithographic printing plate material which has, on a supporting body, a photosensitive layer containing a polymerization initiator, a polymerizable ethylenic double bond-containing compound, a sensitizing dye and a polymer binder. This photosensitive lithographic printing plate material is characterized by containing a compound represented by the general formula (1) below as the sensitizing dye. This photosensitive lithographic printing plate material is suitable to exposure with a laser light having an emission wavelength of 350-450 nm, while having high sensitivity and excellent storage stability. In this photosensitive lithographic printing plate material, sludge is hardly generated during development, and ink stain in a non-image area is suppressed. [chemical formula 1] (1)
PCT/JP2008/057334 2007-04-18 2008-04-15 Photosensitive lithographic printing plate material WO2008129981A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-109159 2007-04-18
JP2007109159 2007-04-18
JP2007220808 2007-08-28
JP2007-220808 2007-08-28

Publications (1)

Publication Number Publication Date
WO2008129981A1 true WO2008129981A1 (en) 2008-10-30

Family

ID=39875509

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057334 WO2008129981A1 (en) 2007-04-18 2008-04-15 Photosensitive lithographic printing plate material

Country Status (1)

Country Link
WO (1) WO2008129981A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016024587A1 (en) * 2014-08-13 2016-02-18 日本曹達株式会社 Diaryl imidazole compound and pest control agent

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074930A2 (en) * 2003-02-21 2004-09-02 Kodak Polychrome Graphics Gmbh Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
JP2005221542A (en) * 2004-02-03 2005-08-18 Konica Minolta Medical & Graphic Inc Photosensitive composition, photosensitive lithographic printing plate and recording method for lithographic printing plate
WO2006008073A2 (en) * 2004-07-16 2006-01-26 Kodak Polychrome Graphics Gmbh Lithographic printing plates with high print run stability
WO2006090623A1 (en) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. Photosensitive lithographic printing plate material
JP2006243365A (en) * 2005-03-03 2006-09-14 Fuji Photo Film Co Ltd Lithographic printing original plate
JP2006259319A (en) * 2005-03-17 2006-09-28 Konica Minolta Medical & Graphic Inc Photosensitive composition, photosensitive lithographic printing plate material, image forming method, and platemaking method for photosensitive lithographic printing plate
JP2007233127A (en) * 2006-03-02 2007-09-13 Konica Minolta Medical & Graphic Inc Photosensitive lithographic printing plate material

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074930A2 (en) * 2003-02-21 2004-09-02 Kodak Polychrome Graphics Gmbh Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
JP2005221542A (en) * 2004-02-03 2005-08-18 Konica Minolta Medical & Graphic Inc Photosensitive composition, photosensitive lithographic printing plate and recording method for lithographic printing plate
WO2006008073A2 (en) * 2004-07-16 2006-01-26 Kodak Polychrome Graphics Gmbh Lithographic printing plates with high print run stability
WO2006090623A1 (en) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. Photosensitive lithographic printing plate material
JP2006243365A (en) * 2005-03-03 2006-09-14 Fuji Photo Film Co Ltd Lithographic printing original plate
JP2006259319A (en) * 2005-03-17 2006-09-28 Konica Minolta Medical & Graphic Inc Photosensitive composition, photosensitive lithographic printing plate material, image forming method, and platemaking method for photosensitive lithographic printing plate
JP2007233127A (en) * 2006-03-02 2007-09-13 Konica Minolta Medical & Graphic Inc Photosensitive lithographic printing plate material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016024587A1 (en) * 2014-08-13 2016-02-18 日本曹達株式会社 Diaryl imidazole compound and pest control agent
KR20170040243A (en) * 2014-08-13 2017-04-12 닛뽕소다 가부시키가이샤 Diaryl imidazole compound and pest control agent
CN106573894A (en) * 2014-08-13 2017-04-19 日本曹达株式会社 Diaryl imidazole compound and pest control agent
JPWO2016024587A1 (en) * 2014-08-13 2017-05-25 日本曹達株式会社 Diarylimidazole compounds and pest control agents
US10021880B2 (en) 2014-08-13 2018-07-17 Nippon Soda Co., Ltd. Diarylimidazole compound and harmful organism control agent
JP2020114827A (en) * 2014-08-13 2020-07-30 日本曹達株式会社 Diaryl imidazole compound and harmful organism control agent
EP3766871A1 (en) * 2014-08-13 2021-01-20 Nippon Soda Co., Ltd. Diarylimidazole compound and pest control agent
KR102447094B1 (en) * 2014-08-13 2022-09-23 닛뽕소다 가부시키가이샤 Diaryl imidazole compound and pest control agent

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