WO2008129965A1 - Colored composition and color filter therefrom - Google Patents

Colored composition and color filter therefrom Download PDF

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Publication number
WO2008129965A1
WO2008129965A1 PCT/JP2008/057188 JP2008057188W WO2008129965A1 WO 2008129965 A1 WO2008129965 A1 WO 2008129965A1 JP 2008057188 W JP2008057188 W JP 2008057188W WO 2008129965 A1 WO2008129965 A1 WO 2008129965A1
Authority
WO
WIPO (PCT)
Prior art keywords
colored composition
color filter
colored
organic solvent
filter therefrom
Prior art date
Application number
PCT/JP2008/057188
Other languages
French (fr)
Japanese (ja)
Inventor
Kazumichi Haraguchi
Takashi Kanoh
Kohei Matsui
Original Assignee
Toyo Ink Mfg. Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg. Co., Ltd. filed Critical Toyo Ink Mfg. Co., Ltd.
Priority to CN2008800115671A priority Critical patent/CN101652712B/en
Priority to KR1020097016886A priority patent/KR101431499B1/en
Publication of WO2008129965A1 publication Critical patent/WO2008129965A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

A colored composition comprising (A) compound with an ethylenically unsaturated double bond, (B) pigment, (C) pigment dispersant, (D) photopolymerization initiator and (E) organic solvent containing 25 wt.% or more of organic solvent (S) of over 7.0 wt.% water solubility. The water content of the colored composition is in the range of 0.3 to 2.0 wt.% based on the total weight of the colored composition. There is provided a color filter comprising a substratum and, superimposed thereon, a colored pixel consisting of the colored composition.
PCT/JP2008/057188 2007-04-16 2008-04-11 Colored composition and color filter therefrom WO2008129965A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2008800115671A CN101652712B (en) 2007-04-16 2008-04-11 Colored composition and color filter therefrom
KR1020097016886A KR101431499B1 (en) 2007-04-16 2008-04-11 Colored composition and color filter therefrom

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-106742 2007-04-16
JP2007106742A JP5142579B2 (en) 2007-04-16 2007-04-16 Coloring composition and color filter using the same

Publications (1)

Publication Number Publication Date
WO2008129965A1 true WO2008129965A1 (en) 2008-10-30

Family

ID=39875493

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057188 WO2008129965A1 (en) 2007-04-16 2008-04-11 Colored composition and color filter therefrom

Country Status (5)

Country Link
JP (1) JP5142579B2 (en)
KR (1) KR101431499B1 (en)
CN (1) CN101652712B (en)
TW (1) TWI443455B (en)
WO (1) WO2008129965A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244408A (en) * 2008-03-28 2009-10-22 Fujifilm Corp Photosensitive resin composition, light shielding color filter and production process therefor, and solid-state image sensor

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5083520B2 (en) * 2007-07-17 2012-11-28 Ｊｓｒ株式会社 Radiation sensitive resin composition, liquid crystal display spacer and liquid crystal display element
TWI443458B (en) * 2010-04-21 2014-07-01 Toyo Ink Sc Holdings Co Ltd Red-coloring composition for color filter and color filter
JP4873101B2 (en) * 2010-04-21 2012-02-08 東洋インキＳｃホールディングス株式会社 Coloring composition for color filter, and color filter
JP5741141B2 (en) * 2010-08-27 2015-07-01 東洋インキＳｃホールディングス株式会社 Black resin composition and black matrix
JP5664171B2 (en) * 2010-11-25 2015-02-04 凸版印刷株式会社 Resist adjusting method and resist adjusting apparatus
JP5301596B2 (en) * 2011-03-11 2013-09-25 富士フイルム株式会社 Blue photosensitive composition, color filter, method for producing color filter, liquid crystal display device, and organic EL display device
JP5789847B2 (en) * 2011-10-12 2015-10-07 東洋インキＳｃホールディングス株式会社 Coloring composition for color filter, and color filter
JP6054824B2 (en) 2013-08-01 2016-12-27 富士フイルム株式会社 Coloring composition, cured film, color filter, method for producing color filter, solid-state imaging device, and image display device
JP6147134B2 (en) * 2013-08-01 2017-06-14 富士フイルム株式会社 Coloring composition, cured film, color filter, method for producing color filter, solid-state imaging device, and image display device
JP6147133B2 (en) 2013-08-01 2017-06-14 富士フイルム株式会社 Coloring composition, cured film, color filter, method for producing color filter, solid-state imaging device, and image display device
TWI731895B (en) * 2015-12-08 2021-07-01 日商富士軟片股份有限公司 Radiation-sensitive resin composition, cured film, pattern forming method, solid-state imaging device, and image display device
JP6852474B2 (en) * 2017-03-10 2021-03-31 東洋インキＳｃホールディングス株式会社 A method for manufacturing a coloring composition for a color filter, a color filter for a solid-state image sensor, and a solid-state image sensor.
JP7263856B2 (en) * 2019-03-14 2023-04-25 東洋インキＳｃホールディングス株式会社 Photosensitive coloring composition, and color filter and liquid crystal display device using the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10146806A (en) * 1996-11-19 1998-06-02 Showa Highpolymer Co Ltd Wood treating composition
JP2003295427A (en) * 2002-03-29 2003-10-15 Fuji Photo Film Co Ltd Colored photosensitive resin composition and color filter using the same and method for producing the same
JP2006343648A (en) * 2005-06-10 2006-12-21 Mitsubishi Chemicals Corp Color material dispersion liquid for color filter, curable resin composition for color filter, method for producing the same, color filter, and liquid crystal display device
JP2007256684A (en) * 2006-03-23 2007-10-04 Fujifilm Corp Photosensitive composition and material for forming light shielding film for display device
JP2007270147A (en) * 2006-03-10 2007-10-18 Mitsubishi Chemicals Corp Curable composition, color filter, and liquid crystal display device
JP2008007775A (en) * 2006-06-02 2008-01-17 Fujifilm Corp Pigment dispersion composition, colored photosensitive composition, photosensitive resin transfer material, inkjet ink using the same and, color filter, liquid crystal display and ccd device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003156842A (en) * 2001-11-22 2003-05-30 Sumitomo Chem Co Ltd Colored photosensitive resin composition
WO2007105649A1 (en) * 2006-03-10 2007-09-20 Mitsubishi Chemical Corporation Curable composition, color filters, and liquid crystal displays

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10146806A (en) * 1996-11-19 1998-06-02 Showa Highpolymer Co Ltd Wood treating composition
JP2003295427A (en) * 2002-03-29 2003-10-15 Fuji Photo Film Co Ltd Colored photosensitive resin composition and color filter using the same and method for producing the same
JP2006343648A (en) * 2005-06-10 2006-12-21 Mitsubishi Chemicals Corp Color material dispersion liquid for color filter, curable resin composition for color filter, method for producing the same, color filter, and liquid crystal display device
JP2007270147A (en) * 2006-03-10 2007-10-18 Mitsubishi Chemicals Corp Curable composition, color filter, and liquid crystal display device
JP2007256684A (en) * 2006-03-23 2007-10-04 Fujifilm Corp Photosensitive composition and material for forming light shielding film for display device
JP2008007775A (en) * 2006-06-02 2008-01-17 Fujifilm Corp Pigment dispersion composition, colored photosensitive composition, photosensitive resin transfer material, inkjet ink using the same and, color filter, liquid crystal display and ccd device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
THE CHEMICAL SOCIETY OF JAPAN: "kagaku Benran Kisohen II, revisted edition no. 4", 30 September 1993, MARUZEN CO., LTD., pages: 184 - 185 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244408A (en) * 2008-03-28 2009-10-22 Fujifilm Corp Photosensitive resin composition, light shielding color filter and production process therefor, and solid-state image sensor

Also Published As

Publication number Publication date
CN101652712B (en) 2012-09-05
KR101431499B1 (en) 2014-08-20
JP2008268242A (en) 2008-11-06
KR20100014779A (en) 2010-02-11
CN101652712A (en) 2010-02-17
TW200905385A (en) 2009-02-01
JP5142579B2 (en) 2013-02-13
TWI443455B (en) 2014-07-01

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