WO2008120468A1 - Photosensitive resin composition for flexographic printing - Google Patents

Photosensitive resin composition for flexographic printing Download PDF

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Publication number
WO2008120468A1
WO2008120468A1 PCT/JP2008/000767 JP2008000767W WO2008120468A1 WO 2008120468 A1 WO2008120468 A1 WO 2008120468A1 JP 2008000767 W JP2008000767 W JP 2008000767W WO 2008120468 A1 WO2008120468 A1 WO 2008120468A1
Authority
WO
WIPO (PCT)
Prior art keywords
flexographic printing
resin composition
photosensitive resin
photopolymerization initiator
disclosed
Prior art date
Application number
PCT/JP2008/000767
Other languages
French (fr)
Japanese (ja)
Inventor
Yuki Kitani
Toru Wada
Yasuyuki Munekuni
Original Assignee
Toyo Boseki Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Boseki Kabushiki Kaisha filed Critical Toyo Boseki Kabushiki Kaisha
Priority to JP2009507412A priority Critical patent/JPWO2008120468A1/en
Publication of WO2008120468A1 publication Critical patent/WO2008120468A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)

Abstract

Disclosed is a photosensitive resin composition for flexographic printing, which enables to obtain an original plate for flexographic printing which can be sufficiently cured under light of a lamp having an emission peak wavelength of 380-420 nm. Specifically disclosed is a photosensitive resin composition for flexographic printing, which contains a water-dispersed latex (A), a photopolymerizable unsaturated compound (B) having an ethylenic double bond, and a photopolymerization initiator (C). This photosensitive resin composition for flexographic printing is characterized in that the photopolymerization initiator (C) contains benzyldimethylketal and a phosphine-based initiator.
PCT/JP2008/000767 2007-03-29 2008-03-27 Photosensitive resin composition for flexographic printing WO2008120468A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009507412A JPWO2008120468A1 (en) 2007-03-29 2008-03-27 Photosensitive resin composition for flexographic printing

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007087795 2007-03-29
JP2007-087795 2007-03-29

Publications (1)

Publication Number Publication Date
WO2008120468A1 true WO2008120468A1 (en) 2008-10-09

Family

ID=39808054

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/000767 WO2008120468A1 (en) 2007-03-29 2008-03-27 Photosensitive resin composition for flexographic printing

Country Status (2)

Country Link
JP (1) JPWO2008120468A1 (en)
WO (1) WO2008120468A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020516951A (en) * 2017-04-12 2020-06-11 マクダーミッド グラフィックス ソリューションズ エルエルシー How to improve the light stability of flexographic printing plates featuring flat top dots
JPWO2020158778A1 (en) * 2019-01-30 2021-11-25 富士フイルム株式会社 Water-developable flexographic printing plate original plate, flexographic printing plate and photosensitive resin composition
EP3947546B1 (en) * 2019-04-05 2023-04-19 Fina Technology, Inc. Polyenes for curable liquid rubber-based compositions

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10293394A (en) * 1996-12-20 1998-11-04 Basf Drucksyst Gmbh Radiation sensitive mixture, radiation sensitive relief-printing form plate and form plate manufactured using the same
JP2003287887A (en) * 2002-03-28 2003-10-10 Toray Ind Inc Photosensitive resin composition, photosensitive flexographic printing plate precursor using the same and flexographic printing plate
JP2004522194A (en) * 2001-03-30 2004-07-22 ナツプ・システムズ・インコーポレーテツド High performance photoimageable resin composition and printing plate made therefrom
JP2005148587A (en) * 2003-11-19 2005-06-09 Toyobo Co Ltd Photosensitive resin composition and photosensitive resin printing original plate using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10293394A (en) * 1996-12-20 1998-11-04 Basf Drucksyst Gmbh Radiation sensitive mixture, radiation sensitive relief-printing form plate and form plate manufactured using the same
JP2004522194A (en) * 2001-03-30 2004-07-22 ナツプ・システムズ・インコーポレーテツド High performance photoimageable resin composition and printing plate made therefrom
JP2003287887A (en) * 2002-03-28 2003-10-10 Toray Ind Inc Photosensitive resin composition, photosensitive flexographic printing plate precursor using the same and flexographic printing plate
JP2005148587A (en) * 2003-11-19 2005-06-09 Toyobo Co Ltd Photosensitive resin composition and photosensitive resin printing original plate using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020516951A (en) * 2017-04-12 2020-06-11 マクダーミッド グラフィックス ソリューションズ エルエルシー How to improve the light stability of flexographic printing plates featuring flat top dots
JPWO2020158778A1 (en) * 2019-01-30 2021-11-25 富士フイルム株式会社 Water-developable flexographic printing plate original plate, flexographic printing plate and photosensitive resin composition
JP7417553B2 (en) 2019-01-30 2024-01-18 富士フイルム株式会社 Water-developable flexographic printing plate precursor, flexographic printing plate and photosensitive resin composition
EP3947546B1 (en) * 2019-04-05 2023-04-19 Fina Technology, Inc. Polyenes for curable liquid rubber-based compositions

Also Published As

Publication number Publication date
JPWO2008120468A1 (en) 2010-07-15

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