WO2008099717A1 - スクラップウエハ再利用方法および太陽電池用シリコン基板の製造方法 - Google Patents
スクラップウエハ再利用方法および太陽電池用シリコン基板の製造方法 Download PDFInfo
- Publication number
- WO2008099717A1 WO2008099717A1 PCT/JP2008/051877 JP2008051877W WO2008099717A1 WO 2008099717 A1 WO2008099717 A1 WO 2008099717A1 JP 2008051877 W JP2008051877 W JP 2008051877W WO 2008099717 A1 WO2008099717 A1 WO 2008099717A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- scrap
- wafers
- recycling
- silicon
- silicon substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/60—Preparation of carbonates or bicarbonates in general
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/20—Waste processing or separation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Photovoltaic Devices (AREA)
Abstract
再利用する際に資源の無駄を少なくし、シリコンウエハを溶解することなく再生インゴットにすることで、単結晶に近い状態で再利用できるスクラップウエハ再利用方法および太陽電池用シリコン基板の製造方法を提供することを課題とする。
スクラップウエハ再利用方法は、スクラップウエハWに形成された膜を除去する膜除去工程S3と、スクラップウエハの膜を除去した表裏面を鏡面に研磨する鏡面研磨工程S5と、鏡面に研磨されたスクラップウエハの結晶方位を揃えて重ね合わせ、円柱状に整列させる整列工程S8と、円柱状に整列させた前記スクラップウエハを加熱炉に入れて400°C~1350°Cの範囲で加熱することで前記スクラップウエハ同士を拡散接合させ再生インゴットIGを製造する加熱工程S9と、を含む手順とした。
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007030750 | 2007-02-09 | ||
| JP2007-030750 | 2007-11-07 | ||
| JP2008025251A JP2008218993A (ja) | 2007-02-09 | 2008-02-05 | スクラップウエハ再利用方法および太陽電池用シリコン基板の製造方法 |
| JP2008-025251 | 2008-02-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008099717A1 true WO2008099717A1 (ja) | 2008-08-21 |
Family
ID=39689961
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2008/051877 Ceased WO2008099717A1 (ja) | 2007-02-09 | 2008-02-05 | スクラップウエハ再利用方法および太陽電池用シリコン基板の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2008099717A1 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130153018A1 (en) * | 2011-12-16 | 2013-06-20 | Lg Electronics Inc. | Solar cell and method for manufacturing the same |
| CN113471067A (zh) * | 2021-07-28 | 2021-10-01 | 上海申和热磁电子有限公司 | 一种废晶圆表面膜剥离再生处理工艺及其装置 |
| TWI866065B (zh) * | 2022-12-26 | 2024-12-11 | 大陸商西安奕斯偉材料科技股份有限公司 | 矽料處理方法及其裝置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05270814A (ja) * | 1992-03-23 | 1993-10-19 | Kawasaki Steel Corp | 太陽電池用シリコンの製造方法 |
| JP2000174295A (ja) * | 1998-12-04 | 2000-06-23 | Mitsubishi Electric Corp | 太陽電池用シリコン結晶の製造方法 |
| JP2005123541A (ja) * | 2003-10-20 | 2005-05-12 | Teikoku Ion Kk | 使用済シリコン単結晶基板の再生方法 |
| JP2005343781A (ja) * | 2004-06-03 | 2005-12-15 | Iis Materials:Kk | 電子ビームを用いたスクラップシリコンの精錬方法 |
-
2008
- 2008-02-05 WO PCT/JP2008/051877 patent/WO2008099717A1/ja not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05270814A (ja) * | 1992-03-23 | 1993-10-19 | Kawasaki Steel Corp | 太陽電池用シリコンの製造方法 |
| JP2000174295A (ja) * | 1998-12-04 | 2000-06-23 | Mitsubishi Electric Corp | 太陽電池用シリコン結晶の製造方法 |
| JP2005123541A (ja) * | 2003-10-20 | 2005-05-12 | Teikoku Ion Kk | 使用済シリコン単結晶基板の再生方法 |
| JP2005343781A (ja) * | 2004-06-03 | 2005-12-15 | Iis Materials:Kk | 電子ビームを用いたスクラップシリコンの精錬方法 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130153018A1 (en) * | 2011-12-16 | 2013-06-20 | Lg Electronics Inc. | Solar cell and method for manufacturing the same |
| US8969125B2 (en) * | 2011-12-16 | 2015-03-03 | Lg Electronics Inc. | Solar cell and method for manufacturing the same |
| US9634160B2 (en) | 2011-12-16 | 2017-04-25 | Lg Electronics Inc. | Solar cell and method for manufacturing the same |
| CN113471067A (zh) * | 2021-07-28 | 2021-10-01 | 上海申和热磁电子有限公司 | 一种废晶圆表面膜剥离再生处理工艺及其装置 |
| CN113471067B (zh) * | 2021-07-28 | 2022-11-29 | 上海申和投资有限公司 | 一种废晶圆表面膜剥离再生处理工艺及其装置 |
| TWI866065B (zh) * | 2022-12-26 | 2024-12-11 | 大陸商西安奕斯偉材料科技股份有限公司 | 矽料處理方法及其裝置 |
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