WO2008091139A1 - Source scanning x-ray microscope system - Google Patents

Source scanning x-ray microscope system Download PDF

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Publication number
WO2008091139A1
WO2008091139A1 PCT/KR2008/000487 KR2008000487W WO2008091139A1 WO 2008091139 A1 WO2008091139 A1 WO 2008091139A1 KR 2008000487 W KR2008000487 W KR 2008000487W WO 2008091139 A1 WO2008091139 A1 WO 2008091139A1
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WO
WIPO (PCT)
Prior art keywords
ray
laser beam
condenser
sample
laser
Prior art date
Application number
PCT/KR2008/000487
Other languages
French (fr)
Inventor
Ki-Ho Kim
Original Assignee
Korea Electro-Optics Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Electro-Optics Co., Ltd. filed Critical Korea Electro-Optics Co., Ltd.
Publication of WO2008091139A1 publication Critical patent/WO2008091139A1/en

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material

Definitions

  • the present invention relates to an x-ray microscope system, and more particularly, to an x-ray microscope system which can observe a sample by using an x-ray without ultra precisely moving the sample, and without using an expensive charge coupled device (CCD).
  • CCD charge coupled device
  • the microscope system includes an electron microscope system using electrons as a light source, and an optical microscope system using visible light as a light source.
  • a sample is placed in a vacuum, and the sample should be physically and chemically preprocessed. Accordingly, a bio-sample, such as a cell of a living organism, cannot be observed.
  • the optical microscope system a bio-sample can be observed, but since visible light is used as a light source, the resolution is limited to approximately 200 ran due to the diffraction limitation of the light source used in the existing technology.
  • a water window a difference of absorbing an x-ray between water and protein forming a bio-sample is large, and thus the protein can be observed through a water layer having a thickness of several microns. Also, according to a penetration property of an x-ray, the internal parts of the bio-sample can be observed.
  • FIG. 1 is a diagram illustrating a conventional x-ray microscope system.
  • the x-ray microscope system of FIG. 1 generates an x-ray by using a liquid target.
  • the x-ray microscope system includes a table 10, a housing 20 formed on the table 10, a light source chamber 30 formed inside the downward of the housing 20, a mirror chamber 40 formed above the light source chamber 30, and an imaging chamber 50 formed on the top of the housing 20.
  • the housing 20 is in an empty cylindrical form, and includes a separator 22 at a predetermined depth.
  • the light source chamber 30 is formed below the housing 20 based on the separator 22, and the housing 20 is closed by a first base plate 44 of the mirror chamber 30.
  • the bottom surface of the housing 20 is closed by a light source vacuum pump 34, and thus the housing 20, in which the light source chamber 30 is formed, can maintain a vacuum state.
  • the light source chamber 30 includes a nozzle 31 on one side and an outlet 32 i directly in line with the nozzle 31.
  • a light source unit 33 which irradiates a light source, is installed between the nozzle 31 and the outlet 32.
  • the nozzle 31 forms a liquid target by ejecting high pressurized liquid, such as liquid nitrogen, and the light source unit 33 outputs a high power laser beam, such as a diode-pumped solid-state (DPSS) laser, on the liquid target so as to generate plasma that emits a soft x-ray having a wavelength domain of 2.3 to 4.4 nm.
  • DPSS diode-pumped solid-state
  • the mirror chamber 40 is disposed above the housing 20 based on the separator 22.
  • the mirror chamber 40 includes the first base plate 44 tightened on the top of the separator 22, a laser condensing lens 41 on the top of the first base plate 44, a second base plate 45 above the laser condensing lens 41 , a holder on the top surface of the second base plate 45, and an x-ray condensing mirror 43 installed on the top surface of the second base plate 45 and above the holder.
  • a filter 47 is formed below a penetration hole of the bottom surface of the first base plate 44, and filters light having a wavelength other than that of an x-ray.
  • the laser condensing lens 41 is installed on the top surface of the base plate 44, amplifies an x-ray wavelength obtained via the plasma generated in the light source chamber 30, and includes a condenser mirror, which is a type of illumination mirror, that illuminates a bio-sample by using the amplified x-ray wavelength.
  • a shielding film means 48 is installed below a penetration hole of the center of the second base plate 45 so as to be used as a focus blocking plate that blocks a direct ray of light.
  • the bio-sample is placed on the penetration hole of the second base plate 45, and the x-ray condensing mirror 43, which includes a diffraction zone plate generally called a zone plate, is placed on the bio-sample.
  • the imaging chamber 50 is formed of a light amplifying plate, an imaging device
  • a vacuum chamber 53 for maintaining a space between the light amplifying plate and the diffraction zone plate.
  • the liquid target is formed by jetting liquefied nitrogen gas through the nozzle 31 of the light source chamber 30, a laser beam is irradiated onto the liquid target so as to generate plasma that emits a soft x-ray.
  • the wavelength of the generated soft x-ray is filtered by the filter 47 on the bottom surface of the first base plate 44, and then passes through the condenser mirror of the first base plate 44.
  • the light amplified accordingly irradiates the bio-sample placed on the second base plate 45.
  • the light irradiating the bio-sample is amplified and enlarged by the diffraction zone plate on the x-ray condensing mirror 43, and thus the bio-sample is obtained as a light image in the imaging chamber 50.
  • the imaging chamber 50 converts the light image enlarged through the diffraction zone plate into an electric signal by using a device such as a charge coupled device (CCD). Accordingly, the light image can be viewed on an external screen or outputted.
  • an x-ray is irradiated onto an entire part corresponding to one screen domain of a sample that is to be observed, and an image is obtained by forming an image thereof on the surface of a 2D CCD that detects the x-ray by using a coupled device, such as a zone plate. Accordingly, an expensive 2D CCD that can detect an x-ray is required, and the size of the conventional x-ray microscope system increases.
  • the present invention provides an x-ray microscope system which can be used to precisely observe a sample without using an expensive 2D charge coupled device
  • CCD that can detect an x-ray
  • position determining transporter that has the precision required for measuring a sample, and an observing method using the x-ray microscope system.
  • an x-ray microscope system including: a laser generator, which generates a laser beam; a scanner, which outputs the laser beam by changing an output angle of the laser beam incident from the laser generator in a predetermined angle according to time; a laser condenser, which condenses the laser beam outputted from the scanner on a point on a focus surface determined according to an incident angle of the laser beam; an x-ray generator, which includes a predetermined x-ray generating target for generating an x-ray on the focus surface so as to generate an x-ray when the laser beam outputted from the laser condenser is irradiated; an x-ray condenser, which condenses the x-ray generated by the x-ray generator on different locations of the focus surface according to locations of the generated x-ray; a sample installer, which is disposed on the focus surface of the x-ray condenser and on which a sample to be observed is placed; an x-ray measure
  • an x-ray microscope system including: a laser generator, which generates a laser beam; a first axis scanner, which outputs the laser beam by changing an output angle of the laser beam incident from the laser generator by a predetermined angle towards a first axis direction according to time; a laser condenser, which condenses the laser beam outputted from the first axis scanner on a point on a focus surface determined according to an incident angle of the laser beam; an x-ray generator, which includes a predetermined x-ray generating target for generating an x-ray on the focus surface so as to generate an x-ray when the laser beam outputted from the laser condenser is irradiated; an x-ray condenser, which condenses the x-ray generated by the x-ray generator on different locations of the focus surface according to locations of the generated x-ray; a sample installer, which is disposed on the focus surface of the x-ray condenser and on
  • the x-ray generator may include a PIN photodiode, which measures the strength of the x-ray generated from the x-ray generating target, wherein the x-ray image former may convert the electric signal to the spatial image signal by using a relative value obtained by comparing the strength of the x-ray measured by the PIN photodiode and the strength of the x-ray measured by the x-ray measurer.
  • the x-ray microscope system may further include a visible light source 2D charge coupled device (CCD), which detects a location of the generated x-ray by using a visible light generated together with the x-ray by the x-ray generator, wherein the scanner may compensate the output angle of the laser beam by using the location detected by the visible light source 2D CCD.
  • CCD visible light source 2D charge coupled device
  • the x-ray microscope system may further include a filter, which is installed between the x-ray generating target and the x-ray condenser and only transmits an x-ray in a predetermined wavelength.
  • ADVANTAGEOUS EFFECTS According to a high-resolution x-ray microscope of the present invention, an expensive 2D charge coupled device (CCD) that can detect an x-ray, or a high precision transporter are not required, and the size of the x-ray microscope can be minimized.
  • CCD charge coupled device
  • FIG. 1 is a diagram illustrating a conventional x-ray microscope system
  • FIG. 2 is a block diagram illustrating an x-ray microscope system according to an embodiment of the present invention
  • FIG. 3 is a diagram for describing a function of a relay lens according to an embodiment of the present invention
  • FIG. 4 is a diagram illustrating an embodiment (using a galvano mirror) of an X-Y scanner of the present invention
  • FIG. 5 is a diagram illustrating change of a condensing location according to an incidence angle of a laser condenser of the present invention
  • FIG. 6 is a perspective view of a structure of a laser condenser, an x-ray generator, and an x-ray condenser according to an embodiment of the present invention
  • FIG. 7 is a diagram illustrating change of a condensing location according to an incidence angle of an x-ray condenser of the present invention
  • FIG. 8 is a diagram illustrating a sample used according to an embodiment of the present invention
  • FIG. 9 is a diagram illustrating a wavelength of a signal measured via an x-ray measurer after observing the sample illustrated in FIG. 8;
  • FIG. 10 is a diagram illustrating an embodiment of the present invention
  • FIG. 11 is a block diagram illustrating another embodiment of the present invention.
  • FIG. 12 is a flowchart illustrating an observing method according to an embodiment of the present invention.
  • FIG. 2 is a block diagram illustrating an x-ray microscope system according to an embodiment of the present invention.
  • the x-ray microscope system according to the current embodiment of the present invention includes a laser generator 110, a scanner 120, a laser condenser 130, an x-ray generator 140, an x-ray condenser 150, a sample installer 160, an x-ray measurer 170, and an x-ray image former 180.
  • the laser generator 110 outputs a laser beam for generating an x-ray.
  • the type of the laser beam may vary according to a wavelength of the x-ray that is to be generated and a target used to generate the x-ray.
  • An example of the laser beam that can be generated by the laser generator 110 is Nd:YAG.
  • the scanner 120 is disposed on a path of the laser beam generated by the laser generator 110, and outputs the laser beam after changing an output angle of the laser beam incident from the laser generator 110 by a predetermined angle according to time.
  • FIG. 3 is a diagram illustrating the scanner 120 according to an embodiment of the present invention.
  • the scanner 120 includes an X-Y scanner 121 and relay lenses 122-1 and 122-2.
  • the X-Y scanner 121 changes an angle of the laser beam incident from the laser generator 110 to an X-axis and a Y-axis.
  • the X-Y scanner 121 illustrated in FIG. 3 may be an acousto-optic deflector
  • the AOD is a device for changing a diffraction angle of light by changing a medium to a sound wave or an ultrasonic wave.
  • the AOD changes a diffraction angle of the laser beam by using an electric signal, and thus changes the output angle of the incident laser beam.
  • the relay lenses 122-1 and 122-2 moves the laser beam deflected from the X-Y scanner 121 within a predetermined domain so that the deflected laser beam does not deviate from an opening of a lens forming the laser condenser 130.
  • the number of relay lenses 122-1 and 122-2 is not limited to two as shown in the current embodiment, and can be determined according to a distance between the X-Y scanner 121 and the laser condenser 130 and a refractive index of the relay lenses 122-1 and 122-2.
  • the relay lenses 122-1 and 122-2 may not be included.
  • a galvano mirror may be used as the X-Y scanner 121 , instead of the AOD. As illustrated in FIG. 4, the galvano mirror changes the output angle of the incident laser beam to the X-axis and Y-axis by adjusting an angle of a reflection surface that is moved mechanically.
  • FIG. 4 is a diagram illustrating two galvano mirrors 123-1 and 123-2, which form the X-Y scanner 121 , according to an embodiment of the present invention. As illustrated in FIG. 4, by using the galvano mirrors 123-1 and 123-2, the laser beam generated by the laser generator 110 is refracted in a predetermined angle towards an X-axis and a Y-axis.
  • the X-Y scanner 121 may change an angle of the laser beam automatically outputted at predetermined periodic intervals by using a self timer (not shown). Alternatively, the X-Y scanner 121 may change an angle of the laser beam by being coupled with the x-ray measurer 170 or the x-ray image former 180.
  • a device that can be used as the X-Y scanner 121 is not limited to the above described examples, and any device can be used that can change an output angle of an incident laser beam.
  • the relay lenses 122-1 and 122-2 prevents the laser beam outputted from the X-Y scanner 121 from being proceeded to somewhere other than the laser condenser 130. That is, the relay lenses 122-1 and 122-2 enable the laser beam outputted from the X-Y scanner
  • the laser condenser 130 is disposed on a path of the laser beam outputted by the scanner 120, and has the same function as a conventional object lens.
  • the laser condenser 130 is a mirror or a lens formed of a material having durability against a laser beam, and condenses the laser beam outputted from the scanner 120 on one point of a focus surface.
  • the laser condenser 130 may be an object lens formed of at least one lens, or a mirror, such as a Wolter mirror.
  • FIG. 5 illustrates an object lens that can be used as the laser condenser 130 according to an embodiment of the present invention. As illustrated in FIG. 5, a condensing location of the laser beam on the focus surface changes according to an angle of the laser beam incident on the laser condenser 130.
  • a laser beam incident on an A direction is condensed on an A' location
  • a laser beam incident on a B direction is condensed on a B' location
  • the x-ray generator 140 includes an x-ray generating target (not shown) on the focus surface of the laser condenser 130.
  • an x-ray generating target (not shown) on the focus surface of the laser condenser 130.
  • the x-ray generating target may be a liquid target, such as liquid nitrogen, or a solid target, such as Mylar (a brand name of polyethylene terephthalate).
  • a wavelength of the generated x-ray may vary according to an element forming the x-ray generating target, and a metal target may be used so as to generate an x-ray having a wide bandwidth.
  • the laser condenser 130 and the x-ray condenser 150 may be installed in a straight line or so as to form a predetermined angle according to characteristics of the x-ray generating target used in the x-ray generator 140.
  • the laser condenser 130 and the x-ray condenser 150 may be formed in a straight line.
  • the x-ray condenser 150 may be installed so as to have a predetermined angle, which may be 90°, with the laser condenser 130 so that the x-ray generated from the x-ray generating target can be incident on the x-ray condenser 150.
  • the predetermined angle between the laser condenser 130 and the x-ray condenser 150 may vary as long as the x-ray generated by the x-ray generator 140 can be incident on the x-ray condenser 150. Referring to FIG.
  • the x-ray generated by an x-ray generating target 141 can be condensed on the x-ray condenser 150 as long as a an angle between the x-ray condenser 150 and a surface of the x-ray generating target 141 installed in the x-ray generator 140 is smaller than an angle between the laser condenser 130 and the same surface of the x-ray generating target 141. Accordingly, a microscope system according to the present invention can operate normally.
  • the generated x-ray should penetrate the x-ray generating target 141.
  • the quantity of the x-ray decreases, and thus the laser condenser 130 and the x-ray condenser may be installed so as to have a predetermined angle.
  • the x-ray condenser 150 is disposed at a location where the x-ray generated by the x-ray generator 140 can be incident thereon, and condenses the generated x-ray on any one point of the focus surface of the x-ray condenser 150.
  • a mirror used in the x-ray condenser 150 is a type of mirror that can condense the incident x-ray on one point, and may be a Wolter mirror, an ellipsoid mirror, or the like.
  • the condensing location of the x-ray on the focus surface can vary according to the generation location of a light source generated in the x-ray generating target as illustrated in FIG. 7, and its principle is the same as the principle used in the laser condenser 130. In other words, an x-ray generated in an A location is condensed on an A 1 location and an x-ray generated in a B location is condensed on a B location.
  • the condensing location of the laser beam condensed by the laser condenser 130 varies according to an angle of the laser beam outputted from the scanner 120
  • the x-ray is generated by interaction of the laser beam and the x-ray generating target at the condensing location of the laser beam
  • the condensing location of the x-ray condensed by the x-ray condenser 150 varies according to the generating location of the generated x-ray.
  • the total magnification i.e. the resolution of an x-ray microscope system, is determined according to the size of the light source generated by irradiating the laser beam on the x-ray generating target of the x-ray generator 140, the size of the corresponding plasma, and the magnification of the mirror used in the x-ray condenser 1 50.
  • the diameter of the x-ray condensed on the focus surface of the mirror used in the x-ray condenser 150 is 50 nm.
  • a sample can be observed in units of 50 nm. (That is, x-ray transmittance information of a part of the sample corresponding to 50 nm on the focus surface can be obtained.) Accordingly, the sample can be observed with a 50 nm resolution by moving the x-ray condensed to 50 nm in intervals of 50 nm on the sample.
  • the x-ray condenser 150 such as a Wolter mirror, penetrates the light source of the x-ray in 5 ⁇ m after reducing 5 ⁇ m to 50 nm, and the X-Y scanner 121 such as an AOD or a galvano mirror, moves the location of the laser beam condensed on the x-ray generator 140 by 5 ⁇ m. As a result, the location of the x-ray on the sample is moved by 50 nm.
  • the laser beam deviates from an optical axis while the laser beam reaches the opening of the lens of the laser condenser 130. Accordingly, a relay lens is used so that the laser beam uniformly reaches the opening while not changing the incident angle.
  • a lens used as the condensing lens is called an f-theta lens.
  • the sample installer 160 is disposed in such a way that the sample is installed on the focus surface of the x-ray condenser 150, and fixes the sample. A method of fixing and installing the sample is equal to a conventional method used in an x-ray microscope system, and thus a detailed description thereof is omitted herein.
  • the x-ray measurer 170 is disposed on the opposite side of the x-ray condenser 150 based on the sample installer 160, and measures the quantity of the x-ray that passes through the sample installed on the sample installer 160.
  • Examples of the x-ray measurer 170 include a photodiode having high sensitivity in an x-ray and a first channel light detection amplifier, such as the combination of a phosphor plate and a photo multiplier tube (PMT).
  • a photodiode only converts a signal in the visible light domain to an electric signal and cannot detect an x-ray, and thus a photodiode for detecting a signal having a wavelength of an x-ray should be used as the x-ray measurer 170.
  • a PIN photodiode is a photodiode having a structure where a layer of an intrinsic (i-type) semiconductor is combined between a p-domain and an n-domain. By adjusting the thickness of an i-domain, the PIN photodiode can have the optimum sensitivity and a frequency reaction characteristic. Accordingly, the PIN photodiode is suitable for use as a photodiode for detecting an x-ray.
  • the generating location of the x-ray generated in the x-ray generator 140 by irradiating the laser beam on the x-ray generating target varies according to the output angle of the laser beam from the scanner 120. According to the generating location of the x-ray, an irradiating location of the x-ray that passed through the x-ray condenser 150 on the sample changes. Accordingly, when an angle changed in the scanner 120 is changed little by little so that an interval of the x-ray on the sample is equal to the resolution, the sample can be scanned using the suitable resolution.
  • FIG. 8 is a diagram illustrating a sample used according to an embodiment of the present invention
  • FIG. 9 is a diagram illustrating a wavelength of a signal measured via the x-ray measurer 170 after observing the sample illustrated in FIG. 8.
  • a side of each cell of the sample is 50 nm, and black cells are parts where an x-ray cannot easily penetrate, and white cells are parts where the x-ray can penetrate.
  • the quantity of light according to time i.e. the quantity of light changed to an electric signal by a PIN photodiode, can be as shown in FIG. 9.
  • the quantity of the penetrated x-ray is low, but when the x-ray is irradiated onto next three cells 206 through 208, the quantity of the penetrated x-ray is high.
  • the sample is classified into two areas, an area with high transmittance and an area with low transmittance for convenience of description, but an actual bio-sample may have various transmittances according to characteristics of elements of the bio-sample.
  • the x-ray image former 180 converts the values of the transmittance measured in the x-ray measurer 170 into a spatial image signal.
  • a pattern of scanning the sample is pre-registered in the x-ray image former 180, or the pattern is received from the scanner 120.
  • the pattern and the quantity of the x-ray as illustrated in FIG. 9 are used to form an image from the transmittance in each part of the sample.
  • the formed image may be displayed on a monitor or printed by a printer.
  • FIG. 10 is a diagram illustrating an embodiment of the present invention.
  • a laser beam generated by a laser generator 310 is incident on a laser condenser 330, whose incident angle is changed to a predetermined angle by an X-Y scanner 321 , formed of an AOD or a galvano mirror, and relay lenses 322-1 and 322-2.
  • the laser beam is condensed on a focus surface by moving the laser beam a predetermined distance via the laser condenser 330.
  • the laser beam condensed by the laser condenser 330 is irradiated on different locations of an x-ray generating target 341 of an x-ray generator 340 according to the incident angle, and an x-ray is generated at the location where the laser beam is irradiated.
  • a visible light is also generated.
  • the generated visible light is inversely output through the laser condenser 330.
  • the outputted visible light passes through a beam splitter 323, which reflects the visible light separately from the laser beam, and a lens unit, and is incident on a charge coupled device (CCD) 325. Accordingly, the location of an imaged punctiform on the CCD 325 changes according to a scanning method. By using this information, the generation location of an x-ray on the x-ray generating target 341 can be detected, and location information calculated by using a scan angle is compensated accordingly.
  • CCD charge coupled device
  • a photodiode 324 is used to additionally obtain information about the strength of the laser beam by using the beam splitter 323, which penetrates most condensed laser beams and reflects very small parts of the laser beam.
  • the information about the strength of the laser beam is used to manage a conversion efficiency of an x-ray.
  • the CCD 325 detects the location of a light source generated in an x-ray generator 340 by using the visible light generated with the x-ray in the x-ray generator 340.
  • the CCD 325 can only detect the visible light, and a function of detecting the x-ray is not necessary.
  • the location of the light source detected in the CCD 325 is transmitted to the X-Y scanner 321.
  • the CCD 325 determines whether the X-Y scanner 321 outputs the laser beam in an accurate angle so as to generate the light source in the accurate location, and compensate an output angle of the laser beam in the X-Y scanner 321.
  • the x-ray generating target 341 is disposed on the focus surface of the laser condenser 330.
  • the x-ray generating target 341 used in FIG. 10 is a solid target.
  • the x-ray generating target 341 is of a strip type, and thus is continuously replaced so as to prevent the solid target, which can get damaged since the laser beam is continuously irradiated onto one point, from being continuously used.
  • An x-ray generating type in the form of a strip type is disclosed in U.S. Patent No. 4,700,371 , and thus a detailed description thereof is omitted herein.
  • a PIN photodiode 342 is installed in the x-ray generator 340, and measures the strength of the generated x-ray.
  • the PIN photodiode 342 determines whether the strength of the generated x-ray is uniform, and may be used to compensate the strength of the laser beam generated by the laser generator 310 as in the case of the photodiode 342, or used to compensate the quantity of transmitted x-ray measured by a x-ray measurer 370.
  • the x-ray generated by the x-ray generator 340 is not outputted towards one direction but towards all directions. Accordingly, the PIN photodiode 342 may be installed anywhere as long as there is no object that stands between the light source and the PIN photodiode 342. Meanwhile, the x-ray generated from the light source may be incident on an x-ray condenser 350 through a filter 343.
  • the filter is used to block all signals that have a wavelength other than that of the x-ray, and may be formed of titanium (Ti) or aluminum.
  • the wavelength of the x-ray may vary according to a material forming the x-ray generating target 341.
  • An x-ray near 3.37 nm wavelength may be generated by using a solid target including a carbon element
  • an x-ray in a wavelength band between 2.87 nm and 3.37 nm may be generated by using a target including nitrogen and carbon
  • an x-ray in a wide bandwidth may be generated by using a metal target.
  • the filter 343 selects an x-ray of a certain wavelength.
  • the visible light is blocked by using aluminum in approximately 200 ⁇ m thickness, and a suitable wavelength of the x-ray is selected by using a metal such as Ti.
  • the x-ray that passed through the filter 343 is condensed on a certain location of a sample installed on a sample installer 360 through the x-ray condenser 350, formed of a Wolter mirror.
  • the x-ray that penetrates the sample is converted into an electric signal by a PIN photodiode 370 at the condensed location, and then converted to a spatial image by an x-ray image former (not shown).
  • the strength of the x-ray measured by the PIN photodiode 370 is relative to the strength of the x-ray measured by the PIN photodiode 342, and the quantity of the x-ray can be standardized accordingly. In this case, even if the strength of the laser beam or the x-ray changes in the middle, an accurate result can be obtained.
  • the quantity of the x-ray that penetrates the sample can be sufficiently detected by the PIN photodiode 370, but when the detected quantity is too low to increase the repetition rate of the laser beam, an amplifier (not shown), which amplifies the x-ray can be further included.
  • the sample and the PIN photodiode 370 may be placed in a vacuum so as to prevent the absorption of the x-ray, or may be placed in a helium gas after being separated from the x-ray generator 340 by using a thin layer formed of silicon nitride.
  • two axes i.e. an X-axis and a Y-axis
  • the X-Y scanner 121 such as an AOD or a galvano mirror.
  • the X-Y scanner 121 such as an AOD or a galvano mirror.
  • only one axis can be scanned by using an AOD or a galvano mirror, and another axis can be instrumentally scanned.
  • a distance between the surface forming the x-ray generating target 141 and the laser condenser 130 is not uniform, and thus only a part of the x-ray generating target 141 is located on the focus surface of the laser condenser 130.
  • the x-ray may not be generated in sufficient quantity.
  • FIG. 6 such a problem is solved by scanning the Y-axis by using an AOD, and by scanning the X-axis by moving the laser condenser 130 and the x-ray generator 140 mechanically.
  • the laser condenser 130 and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis direction by a predetermined distance
  • the scanner 120 (only scans the Y-axis), the laser condenser 130, and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis direction by a predetermined distance
  • the laser generator 110, the scanner 120 (only scans the Y-axis), the laser condenser 130, and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis direction by a predetermined distance.
  • the X-axis and the Y-axis may be scanned by a mechanical method as the laser condenser 130 and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis and the Y-axis without the AOD, or the laser generator 110, the laser condenser 130, and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis and the Y-axis.
  • the scanning may be performed by mechanically moving the sample installer 160 only, but in this case, moving the sample installer 160 should be very precise, and thus expensive equipment is required, and a possibility of error occurrence increases.
  • the sample installer 160 should be moved by 50 nm, but such precise movement is very difficult and the sample installer 160 becomes very weak and is vulnerable to even to a small vibration.
  • elements in front of the x-ray condenser 150 are moved instead of moving the sample installer 160, and thus only the precision of several microns of multiplying the final resolution by the magnification of the x-ray condenser 150 is required. Accordingly, the precision of the entire x-ray microscope system does not need to be increased and is robust in terms of the vibration.
  • the x-ray condenser 150 and coupled elements have to move only 2.5 ⁇ m so that the scanning is performed in a 50 nm unit in the sample installer 160. Accordingly, the x-ray condenser 150 and the coupled elements are not required to mechanically move in a 50 nm unit.
  • FIG. 11 is a block diagram illustrating an x-ray microscope system for performing the mechanical scanning in one axis direction as described above according to an embodiment of the present invention.
  • the x-ray microscope system of FIG. 11 includes a laser generator 410, a scanner 420, a laser condenser 430, an x-ray generator 440, an x-ray condenser 450, a sample installer 460, an x-ray measurer 470, and an x-ray image former 480 like the x-ray microscope system of FIG. 3, and functions of the elements excluding the scanner
  • the scanner 420 includes a first axis scanner 421 and a second axis scanner 422.
  • the first axis scanner 421 is disposed on a path of a laser beam generated in the laser generator 410, and outputs the laser beam after changing an output angle of the incident laser beam by a predetermined angle to a first axis direction according to time.
  • the first scanner 421 may be an AOD or a galvano mirror, and a relay lens may be further added so that the deflected light does not deviate from an opening of the laser condenser 430.
  • the second axis scanner 422 performs mechanical scanning in a second axis direction, perpendicular to the first axis direction.
  • the laser condenser 43 and the x-ray generator 440 may be coupled and move together, the first axis scanner
  • the laser condenser 430, and the x-ray generator 440 may be coupled and move together, or the laser generator 410, the first axis scanner 421 , the laser condenser 430, and the x-ray generator 440 may be coupled and move together.
  • the second axis scanner 422 controls the coupled elements to move in an axis direction so as to perform the instrumental scanning by a predetermined distance.
  • the laser generator 410, the first axis scanner 421 , the laser condenser 430, and the x-ray generator 440 are coupled and move together, and the second axis scanner 422 controls the movement of the coupled elements.
  • FIG. 12 is a flowchart illustrating an observing method according to an embodiment of the present invention. The method will be described with reference to the elements illustrated in FIG. 10 or FIG 2.
  • the laser generator 310 outputs a laser beam for generating an x-ray in operation 501.
  • the laser generator 310 may output the laser beam while determining whether the laser beam is outputted in a uniform strength by using a value outputted from the photodiode 324 or the PIN photodiode 342.
  • the scanner 120 outputs the incident laser beam generated by the laser generator 310 after changing the output angle of the laser beam by a predetermined angle according to time in operation 502.
  • the output angle of the laser beam may be changed according to a predetermined period, or by receiving a signal to change the output angle from the x-ray measurer 370 or the x-ray image former.
  • the x-ray measurer 370 or the x-ray image former may proceed to observe the sample by waiting until it is determined that the strength of an x-ray passed through a certain point of the sample is steady, and when the strength is determined to be steady, transmitting the signal to change the output angle of the laser beam to the scanner 120 so as to move to a next observing point of the sample.
  • the scanner 120 is fed back with information about a location of a light source detected by the CCD 325, and compensates the output angle of the laser beam so that the light source is generated at an accurate pre-set location.
  • the scanning is performed in an X-axis direction and a
  • one axis is scanned by refracting the laser beam by using the first axis scanner 421
  • another axis is scanned by changing the irradiating location of the x-ray on the sample fixed on the sample installer 460 by moving elements mechanically by using the second axis scanner 422.
  • the laser condenser 330 condenses the laser beam outputted from the scanner 120 on a point on the focus surface of the laser condenser 330 in which the x-ray generating target 341 is installed, in operation 503.
  • the condensing location of the laser beam varies as an irradiating angle of the laser beam changes due to the scanner 120.
  • the condensing location of the laser beam on the X-axis is determined by multiplying the incident angle on the X-axis and a focus distance
  • the condensing location of the laser beam on the Y- axis is determined by multiplying the incident angle on the Y-axis and the focus distance.
  • a plasma phenomenon occurs in a part of the x-ray generating target 341 where the condensed laser beam is irradiated, and an x-ray is generated in operation 504.
  • the x-ray is generated on the condensing location of the laser beam.
  • the strength of the generated x-ray is measured by the PIN photodiode 342 installed in the x-ray generator 340.
  • the measured strength may be used to compensate the strength of the laser beam generated in the laser generator 310 or the penetration quantity of the x-ray measured by the x-ray measurer 370.
  • the generated x-ray is incident on the x-ray condenser 350, formed of a Wolter mirror, or the like, and then is condensed on one point of the sample located on the focus surface of the x-ray condenser 350.
  • the condensing location of the x-ray varies according to the location of the generated light source.
  • the reduction magnification of the Wolter mirror used as the x-ray condenser 350 is M and the location of the x-ray generated on the X-axis is Xx, and the location of the x-ray generated on the Y-axis is Yy
  • the location of the x-ray condensed on the sample on the X-axis is Xx/M
  • on the Y-axis is Yy/M.
  • the x-ray that penetrates the sample is incident on the x-ray measurer 370, and the quantity of the transmitted x-ray is measured as an electric signal in operation 506.
  • the measured quantity can be compensated by the value measured by the PIN photodiode 342 or the photodiode 324. It is determined whether the entire sample is observed in operation 507, and if not, the scanner 120 adjusts the output angle of the laser beam or moves the location of the elements that generates the laser beam or the laser beam and the x-ray so that the x-ray can be irradiated onto a next observing location of the sample.
  • the x-ray image former converts the quantity measured by the x-ray measurer 370 to a spatial image in operation 508.
  • the spatial image may be formed at once after observing the entire sample, or every time a part of the sample is observed.

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Abstract

Provided is an x-ray microscope system which does not use an expensive charge coupled device (CCD), and can be used to observe a sample by using an x-ray without ultra precisely moving the sample. The x-ray microscope system includes: a laser generator, which generates a laser beam; a scanner, which outputs the laser beam by changing an output angle of the laser beam incident from the laser generator in a predetermined angle according to time; a laser condenser, which condenses the laser beam outputted from the scanner on a point on a focus surface determined according to an incident angle of the laser beam; an x-ray generator, which includes a predetermined x-ray generating target for generating an x-ray on the focus surface so as to generate an x-ray when the laser beam outputted from the laser condenser is irradiated; an x-ray condenser, which condenses the x-ray generated by the x-ray generator on different locations of the focus surface according to locations of the generated x-ray; a sample installer, which is disposed on the focus surface of the x-ray condenser and on which a sample to be observed is placed; an x-ray measurer, which is installed at a backend of the sample installer and converts the quantity of the x-ray that is condensed and penetrates the sample on the sample installer, into an electric signal; and an x-ray image former, which converts the electric signal.

Description

SOURCE SCANNING X-RAY MICROSCOPE SYSTEM
TECHNICAL FIELD
The present invention relates to an x-ray microscope system, and more particularly, to an x-ray microscope system which can observe a sample by using an x-ray without ultra precisely moving the sample, and without using an expensive charge coupled device (CCD).
BACKGROUND ART A conventional microscope system enlarges a minute portion of an object
(hereinafter, referred to as a sample) allowing a user to observe the enlarged minute portion. The microscope system includes an electron microscope system using electrons as a light source, and an optical microscope system using visible light as a light source. In the case of the electron microscope system, a sample is placed in a vacuum, and the sample should be physically and chemically preprocessed. Accordingly, a bio-sample, such as a cell of a living organism, cannot be observed. In the case of the optical microscope system, a bio-sample can be observed, but since visible light is used as a light source, the resolution is limited to approximately 200 ran due to the diffraction limitation of the light source used in the existing technology.
Recently, an x-ray microscope system has been developed, which uses an x-ray wavelength domain called a water window (λ=2.3-4.4 ran). In the water window, a difference of absorbing an x-ray between water and protein forming a bio-sample is large, and thus the protein can be observed through a water layer having a thickness of several microns. Also, according to a penetration property of an x-ray, the internal parts of the bio-sample can be observed.
FIG. 1 is a diagram illustrating a conventional x-ray microscope system. The x-ray microscope system of FIG. 1 generates an x-ray by using a liquid target. The x-ray microscope system includes a table 10, a housing 20 formed on the table 10, a light source chamber 30 formed inside the downward of the housing 20, a mirror chamber 40 formed above the light source chamber 30, and an imaging chamber 50 formed on the top of the housing 20.
The housing 20 is in an empty cylindrical form, and includes a separator 22 at a predetermined depth. The light source chamber 30 is formed below the housing 20 based on the separator 22, and the housing 20 is closed by a first base plate 44 of the mirror chamber 30. The bottom surface of the housing 20 is closed by a light source vacuum pump 34, and thus the housing 20, in which the light source chamber 30 is formed, can maintain a vacuum state.
The light source chamber 30 includes a nozzle 31 on one side and an outlet 32 i directly in line with the nozzle 31. A light source unit 33, which irradiates a light source, is installed between the nozzle 31 and the outlet 32. The nozzle 31 forms a liquid target by ejecting high pressurized liquid, such as liquid nitrogen, and the light source unit 33 outputs a high power laser beam, such as a diode-pumped solid-state (DPSS) laser, on the liquid target so as to generate plasma that emits a soft x-ray having a wavelength domain of 2.3 to 4.4 nm.
The mirror chamber 40 is disposed above the housing 20 based on the separator 22. The mirror chamber 40 includes the first base plate 44 tightened on the top of the separator 22, a laser condensing lens 41 on the top of the first base plate 44, a second base plate 45 above the laser condensing lens 41 , a holder on the top surface of the second base plate 45, and an x-ray condensing mirror 43 installed on the top surface of the second base plate 45 and above the holder.
A filter 47 is formed below a penetration hole of the bottom surface of the first base plate 44, and filters light having a wavelength other than that of an x-ray. The laser condensing lens 41 is installed on the top surface of the base plate 44, amplifies an x-ray wavelength obtained via the plasma generated in the light source chamber 30, and includes a condenser mirror, which is a type of illumination mirror, that illuminates a bio-sample by using the amplified x-ray wavelength.
A shielding film means 48 is installed below a penetration hole of the center of the second base plate 45 so as to be used as a focus blocking plate that blocks a direct ray of light.
Meanwhile, the bio-sample is placed on the penetration hole of the second base plate 45, and the x-ray condensing mirror 43, which includes a diffraction zone plate generally called a zone plate, is placed on the bio-sample. The imaging chamber 50 is formed of a light amplifying plate, an imaging device
51 , and a vacuum chamber 53 for maintaining a space between the light amplifying plate and the diffraction zone plate.
When the liquid target is formed by jetting liquefied nitrogen gas through the nozzle 31 of the light source chamber 30, a laser beam is irradiated onto the liquid target so as to generate plasma that emits a soft x-ray. The wavelength of the generated soft x-ray is filtered by the filter 47 on the bottom surface of the first base plate 44, and then passes through the condenser mirror of the first base plate 44. The light amplified accordingly irradiates the bio-sample placed on the second base plate 45. The light irradiating the bio-sample is amplified and enlarged by the diffraction zone plate on the x-ray condensing mirror 43, and thus the bio-sample is obtained as a light image in the imaging chamber 50. The imaging chamber 50 converts the light image enlarged through the diffraction zone plate into an electric signal by using a device such as a charge coupled device (CCD). Accordingly, the light image can be viewed on an external screen or outputted.
According to the conventional x-ray microscope system, an x-ray is irradiated onto an entire part corresponding to one screen domain of a sample that is to be observed, and an image is obtained by forming an image thereof on the surface of a 2D CCD that detects the x-ray by using a coupled device, such as a zone plate. Accordingly, an expensive 2D CCD that can detect an x-ray is required, and the size of the conventional x-ray microscope system increases.
DETAILED DESCRIPTION OF THE INVENTION TECHNICAL PROBLEM
The present invention provides an x-ray microscope system which can be used to precisely observe a sample without using an expensive 2D charge coupled device
(CCD) that can detect an x-ray, and a position determining transporter that has the precision required for measuring a sample, and an observing method using the x-ray microscope system.
TECHNICAL SOLUTION
According to an aspect of the present invention, there is provided an x-ray microscope system including: a laser generator, which generates a laser beam; a scanner, which outputs the laser beam by changing an output angle of the laser beam incident from the laser generator in a predetermined angle according to time; a laser condenser, which condenses the laser beam outputted from the scanner on a point on a focus surface determined according to an incident angle of the laser beam; an x-ray generator, which includes a predetermined x-ray generating target for generating an x-ray on the focus surface so as to generate an x-ray when the laser beam outputted from the laser condenser is irradiated; an x-ray condenser, which condenses the x-ray generated by the x-ray generator on different locations of the focus surface according to locations of the generated x-ray; a sample installer, which is disposed on the focus surface of the x-ray condenser and on which a sample to be observed is placed; an x-ray measurer, which is installed at a backend of the sample installer and converts the quantity of the x-ray that is condensed and penetrates the sample on the sample installer, into an electric signal; and an x-ray image former, which converts the electric signal measured by the x-ray measurer according to time into a spatial image signal.
According to another aspect of the present invention, there is provided an x-ray microscope system including: a laser generator, which generates a laser beam; a first axis scanner, which outputs the laser beam by changing an output angle of the laser beam incident from the laser generator by a predetermined angle towards a first axis direction according to time; a laser condenser, which condenses the laser beam outputted from the first axis scanner on a point on a focus surface determined according to an incident angle of the laser beam; an x-ray generator, which includes a predetermined x-ray generating target for generating an x-ray on the focus surface so as to generate an x-ray when the laser beam outputted from the laser condenser is irradiated; an x-ray condenser, which condenses the x-ray generated by the x-ray generator on different locations of the focus surface according to locations of the generated x-ray; a sample installer, which is disposed on the focus surface of the x-ray condenser and on which a sample to be observed is placed; an x-ray measurer, which is installed at a backend of the sample installer and converts the quantity of the x-ray that is condensed and penetrates the sample on the sample installer, into an electric signal; an x-ray image former, which converts the electric signal measured by the x-ray measurer according to time to a spatial image signal; and a second axis scanner, which moves the laser condenser and the x-ray generator to a second axis direction that is perpendicular to the first axis, wherein the laser condenser and the x-ray generator are tied and move together.
The x-ray generator may include a PIN photodiode, which measures the strength of the x-ray generated from the x-ray generating target, wherein the x-ray image former may convert the electric signal to the spatial image signal by using a relative value obtained by comparing the strength of the x-ray measured by the PIN photodiode and the strength of the x-ray measured by the x-ray measurer.
The x-ray microscope system may further include a visible light source 2D charge coupled device (CCD), which detects a location of the generated x-ray by using a visible light generated together with the x-ray by the x-ray generator, wherein the scanner may compensate the output angle of the laser beam by using the location detected by the visible light source 2D CCD.
The x-ray microscope system may further include a filter, which is installed between the x-ray generating target and the x-ray condenser and only transmits an x-ray in a predetermined wavelength.
ADVANTAGEOUS EFFECTS According to a high-resolution x-ray microscope of the present invention, an expensive 2D charge coupled device (CCD) that can detect an x-ray, or a high precision transporter are not required, and the size of the x-ray microscope can be minimized.
DESCRIPTION OF THE DRAWINGS FIG. 1 is a diagram illustrating a conventional x-ray microscope system;
FIG. 2 is a block diagram illustrating an x-ray microscope system according to an embodiment of the present invention;
FIG. 3 is a diagram for describing a function of a relay lens according to an embodiment of the present invention; FIG. 4 is a diagram illustrating an embodiment (using a galvano mirror) of an X-Y scanner of the present invention;
FIG. 5 is a diagram illustrating change of a condensing location according to an incidence angle of a laser condenser of the present invention; FIG. 6 is a perspective view of a structure of a laser condenser, an x-ray generator, and an x-ray condenser according to an embodiment of the present invention;
FIG. 7 is a diagram illustrating change of a condensing location according to an incidence angle of an x-ray condenser of the present invention; FIG. 8 is a diagram illustrating a sample used according to an embodiment of the present invention;
FIG. 9 is a diagram illustrating a wavelength of a signal measured via an x-ray measurer after observing the sample illustrated in FIG. 8;
FIG. 10 is a diagram illustrating an embodiment of the present invention; FIG. 11 is a block diagram illustrating another embodiment of the present invention; and
FIG. 12 is a flowchart illustrating an observing method according to an embodiment of the present invention.
BEST MODE
Hereinafter, exemplary embodiments of the present invention will be described with reference to the attached drawings.
FIG. 2 is a block diagram illustrating an x-ray microscope system according to an embodiment of the present invention. The x-ray microscope system according to the current embodiment of the present invention includes a laser generator 110, a scanner 120, a laser condenser 130, an x-ray generator 140, an x-ray condenser 150, a sample installer 160, an x-ray measurer 170, and an x-ray image former 180.
The laser generator 110 outputs a laser beam for generating an x-ray. The type of the laser beam may vary according to a wavelength of the x-ray that is to be generated and a target used to generate the x-ray. An example of the laser beam that can be generated by the laser generator 110 is Nd:YAG.
A method of generating a laser beam is well known to one of ordinary skill in the art, and thus a detailed description thereof is omitted herein. The scanner 120 is disposed on a path of the laser beam generated by the laser generator 110, and outputs the laser beam after changing an output angle of the laser beam incident from the laser generator 110 by a predetermined angle according to time.
According to the changed output angle, the condensing location of the laser beam condensed on the x-ray generator 140 via the laser condenser 130 changes. Accordingly, the generating location of the x-ray generated by the x-ray generator 140 and irradiated on a sample placed on the sample installer 160 changes. The size of the changed output angle is determined according to the type of a mirror and a focus distance used in the laser condenser 130 and the x-ray condenser 150. FIG. 3 is a diagram illustrating the scanner 120 according to an embodiment of the present invention. Referring to FIG. 3, the scanner 120 includes an X-Y scanner 121 and relay lenses 122-1 and 122-2.
The X-Y scanner 121 changes an angle of the laser beam incident from the laser generator 110 to an X-axis and a Y-axis. The X-Y scanner 121 illustrated in FIG. 3 may be an acousto-optic deflector
(AOD). The AOD is a device for changing a diffraction angle of light by changing a medium to a sound wave or an ultrasonic wave. In the current embodiment, the AOD changes a diffraction angle of the laser beam by using an electric signal, and thus changes the output angle of the incident laser beam. The relay lenses 122-1 and 122-2 moves the laser beam deflected from the X-Y scanner 121 within a predetermined domain so that the deflected laser beam does not deviate from an opening of a lens forming the laser condenser 130.
The number of relay lenses 122-1 and 122-2 is not limited to two as shown in the current embodiment, and can be determined according to a distance between the X-Y scanner 121 and the laser condenser 130 and a refractive index of the relay lenses 122-1 and 122-2. When the distance between the X-Y scanner 121 and the laser condenser 130 are short, and thus the deflected laser beam does not deviate from the opening of the laser condenser 130, the relay lenses 122-1 and 122-2 may not be included. A galvano mirror may be used as the X-Y scanner 121 , instead of the AOD. As illustrated in FIG. 4, the galvano mirror changes the output angle of the incident laser beam to the X-axis and Y-axis by adjusting an angle of a reflection surface that is moved mechanically..
FIG. 4 is a diagram illustrating two galvano mirrors 123-1 and 123-2, which form the X-Y scanner 121 , according to an embodiment of the present invention. As illustrated in FIG. 4, by using the galvano mirrors 123-1 and 123-2, the laser beam generated by the laser generator 110 is refracted in a predetermined angle towards an X-axis and a Y-axis.
The X-Y scanner 121 may change an angle of the laser beam automatically outputted at predetermined periodic intervals by using a self timer (not shown). Alternatively, the X-Y scanner 121 may change an angle of the laser beam by being coupled with the x-ray measurer 170 or the x-ray image former 180.
A device that can be used as the X-Y scanner 121 is not limited to the above described examples, and any device can be used that can change an output angle of an incident laser beam.
When the X-Y scanner 121 changes the output angle of the laser beam, the relay lenses 122-1 and 122-2 prevents the laser beam outputted from the X-Y scanner 121 from being proceeded to somewhere other than the laser condenser 130. That is, the relay lenses 122-1 and 122-2 enable the laser beam outputted from the X-Y scanner
121 to be incident on the laser condenser 130 without changing the angle of the scanner.
The laser condenser 130 is disposed on a path of the laser beam outputted by the scanner 120, and has the same function as a conventional object lens. The laser condenser 130 is a mirror or a lens formed of a material having durability against a laser beam, and condenses the laser beam outputted from the scanner 120 on one point of a focus surface.
The laser condenser 130 may be an object lens formed of at least one lens, or a mirror, such as a Wolter mirror. FIG. 5 illustrates an object lens that can be used as the laser condenser 130 according to an embodiment of the present invention. As illustrated in FIG. 5, a condensing location of the laser beam on the focus surface changes according to an angle of the laser beam incident on the laser condenser 130.
In other words, a laser beam incident on an A direction is condensed on an A' location, and a laser beam incident on a B direction is condensed on a B' location.
The x-ray generator 140 includes an x-ray generating target (not shown) on the focus surface of the laser condenser 130. When the laser beam condensed on the tocus surface of the laser condenser 130 is irradiated onto the x-ray generating target, an x-ray in a plasma state is generated. A material for the x-ray generating target may vary. As described in FIG. 1 , the x-ray generating target may be a liquid target, such as liquid nitrogen, or a solid target, such as Mylar (a brand name of polyethylene terephthalate). A wavelength of the generated x-ray may vary according to an element forming the x-ray generating target, and a metal target may be used so as to generate an x-ray having a wide bandwidth. The laser condenser 130 and the x-ray condenser 150 may be installed in a straight line or so as to form a predetermined angle according to characteristics of the x-ray generating target used in the x-ray generator 140.
For example, if the x-ray generating target can penetrate light, and thus can form plasma by gathering the laser beam on the opposite side of the x-ray generating target, the laser condenser 130 and the x-ray condenser 150 may be formed in a straight line.
If the x-ray generating target is formed of a material that cannot penetrate light, the x-ray condenser 150 may be installed so as to have a predetermined angle, which may be 90°, with the laser condenser 130 so that the x-ray generated from the x-ray generating target can be incident on the x-ray condenser 150. The predetermined angle between the laser condenser 130 and the x-ray condenser 150 may vary as long as the x-ray generated by the x-ray generator 140 can be incident on the x-ray condenser 150. Referring to FIG. 6, the x-ray generated by an x-ray generating target 141 can be condensed on the x-ray condenser 150 as long as a an angle between the x-ray condenser 150 and a surface of the x-ray generating target 141 installed in the x-ray generator 140 is smaller than an angle between the laser condenser 130 and the same surface of the x-ray generating target 141. Accordingly, a microscope system according to the present invention can operate normally.
When the laser condenser 130 and the x-ray condenser 150 are installed so as to be located in a straight line, the generated x-ray should penetrate the x-ray generating target 141. In this case, the quantity of the x-ray decreases, and thus the laser condenser 130 and the x-ray condenser may be installed so as to have a predetermined angle.
The x-ray condenser 150 is disposed at a location where the x-ray generated by the x-ray generator 140 can be incident thereon, and condenses the generated x-ray on any one point of the focus surface of the x-ray condenser 150.
A mirror used in the x-ray condenser 150 is a type of mirror that can condense the incident x-ray on one point, and may be a Wolter mirror, an ellipsoid mirror, or the like. Here, the condensing location of the x-ray on the focus surface can vary according to the generation location of a light source generated in the x-ray generating target as illustrated in FIG. 7, and its principle is the same as the principle used in the laser condenser 130. In other words, an x-ray generated in an A location is condensed on an A1 location and an x-ray generated in a B location is condensed on a B location. In short, the condensing location of the laser beam condensed by the laser condenser 130 varies according to an angle of the laser beam outputted from the scanner 120, the x-ray is generated by interaction of the laser beam and the x-ray generating target at the condensing location of the laser beam, and the condensing location of the x-ray condensed by the x-ray condenser 150 varies according to the generating location of the generated x-ray.
Meanwhile, the total magnification, i.e. the resolution of an x-ray microscope system, is determined according to the size of the light source generated by irradiating the laser beam on the x-ray generating target of the x-ray generator 140, the size of the corresponding plasma, and the magnification of the mirror used in the x-ray condenser 1 50.
For example, when the diameter of the light source generated in the x-ray generating target is 5 μm and the magnification of the mirror used in the x-ray condenser 150 is 100, the diameter of the x-ray condensed on the focus surface of the mirror used in the x-ray condenser 150 is 50 nm. In other words, a sample can be observed in units of 50 nm. (That is, x-ray transmittance information of a part of the sample corresponding to 50 nm on the focus surface can be obtained.) Accordingly, the sample can be observed with a 50 nm resolution by moving the x-ray condensed to 50 nm in intervals of 50 nm on the sample. In other words, the x-ray condenser 150, such as a Wolter mirror, penetrates the light source of the x-ray in 5 μm after reducing 5 μm to 50 nm, and the X-Y scanner 121 such as an AOD or a galvano mirror, moves the location of the laser beam condensed on the x-ray generator 140 by 5 μm. As a result, the location of the x-ray on the sample is moved by 50 nm. Here, since the angle of the laser beam is changed as the laser beam is scanned by the X-Y scanner 121 , which may be in the form of an AOD or a galvano mirror, the laser beam deviates from an optical axis while the laser beam reaches the opening of the lens of the laser condenser 130. Accordingly, a relay lens is used so that the laser beam uniformly reaches the opening while not changing the incident angle. When the laser beam condensed to 5 μm on the x-ray generating target by a condensing lens (whose focus distance is f) is scanned by a scanner (whose scan angle is theta radian), an image having a 5 μm diameter always exists on the x-ray generating target at the location of ftheta. Thus, a lens used as the condensing lens is called an f-theta lens. The sample installer 160 is disposed in such a way that the sample is installed on the focus surface of the x-ray condenser 150, and fixes the sample. A method of fixing and installing the sample is equal to a conventional method used in an x-ray microscope system, and thus a detailed description thereof is omitted herein.
The x-ray measurer 170 is disposed on the opposite side of the x-ray condenser 150 based on the sample installer 160, and measures the quantity of the x-ray that passes through the sample installed on the sample installer 160.
Examples of the x-ray measurer 170 include a photodiode having high sensitivity in an x-ray and a first channel light detection amplifier, such as the combination of a phosphor plate and a photo multiplier tube (PMT). A conventional photodiode only converts a signal in the visible light domain to an electric signal and cannot detect an x-ray, and thus a photodiode for detecting a signal having a wavelength of an x-ray should be used as the x-ray measurer 170.
A PIN photodiode is a photodiode having a structure where a layer of an intrinsic (i-type) semiconductor is combined between a p-domain and an n-domain. By adjusting the thickness of an i-domain, the PIN photodiode can have the optimum sensitivity and a frequency reaction characteristic. Accordingly, the PIN photodiode is suitable for use as a photodiode for detecting an x-ray.
The generating location of the x-ray generated in the x-ray generator 140 by irradiating the laser beam on the x-ray generating target varies according to the output angle of the laser beam from the scanner 120. According to the generating location of the x-ray, an irradiating location of the x-ray that passed through the x-ray condenser 150 on the sample changes. Accordingly, when an angle changed in the scanner 120 is changed little by little so that an interval of the x-ray on the sample is equal to the resolution, the sample can be scanned using the suitable resolution.
FIG. 8 is a diagram illustrating a sample used according to an embodiment of the present invention, and FIG. 9 is a diagram illustrating a wavelength of a signal measured via the x-ray measurer 170 after observing the sample illustrated in FIG. 8.
Referring to FIG. 8, a side of each cell of the sample is 50 nm, and black cells are parts where an x-ray cannot easily penetrate, and white cells are parts where the x-ray can penetrate.
When the resolution of the x-ray microscope system is 50 nm and the scanning is performed from left to right and top to bottom of the sample, the quantity of light according to time, i.e. the quantity of light changed to an electric signal by a PIN photodiode, can be as shown in FIG. 9.
As illustrated in FIGS. 8 and 9, when the x-ray is irradiated onto five first cells, i.e. four first cells 201 through 204 on the top and a first cell 205 on the second row, the quantity of the penetrated x-ray is low, but when the x-ray is irradiated onto next three cells 206 through 208, the quantity of the penetrated x-ray is high. As described above, while the x-ray is scanning the sample, a part where the x-ray penetrates generates a high electric signal, and a part where the x-ray does not penetrate generates a low electric signal. In FIGS. 8 and 9, the sample is classified into two areas, an area with high transmittance and an area with low transmittance for convenience of description, but an actual bio-sample may have various transmittances according to characteristics of elements of the bio-sample.
When the transmittance of the x-ray, i.e. the quantity of the penetrated x-ray, is measured for each part of the sample by using the x-ray measurer 170, the x-ray image former 180 converts the values of the transmittance measured in the x-ray measurer 170 into a spatial image signal. A pattern of scanning the sample is pre-registered in the x-ray image former 180, or the pattern is received from the scanner 120. The pattern and the quantity of the x-ray as illustrated in FIG. 9 are used to form an image from the transmittance in each part of the sample.
The formed image may be displayed on a monitor or printed by a printer. FIG. 10 is a diagram illustrating an embodiment of the present invention.
A laser beam generated by a laser generator 310 is incident on a laser condenser 330, whose incident angle is changed to a predetermined angle by an X-Y scanner 321 , formed of an AOD or a galvano mirror, and relay lenses 322-1 and 322-2. The laser beam is condensed on a focus surface by moving the laser beam a predetermined distance via the laser condenser 330.
The laser beam condensed by the laser condenser 330 is irradiated on different locations of an x-ray generating target 341 of an x-ray generator 340 according to the incident angle, and an x-ray is generated at the location where the laser beam is irradiated.
When the x-ray is generated, a visible light is also generated. The generated visible light is inversely output through the laser condenser 330. The outputted visible light passes through a beam splitter 323, which reflects the visible light separately from the laser beam, and a lens unit, and is incident on a charge coupled device (CCD) 325. Accordingly, the location of an imaged punctiform on the CCD 325 changes according to a scanning method. By using this information, the generation location of an x-ray on the x-ray generating target 341 can be detected, and location information calculated by using a scan angle is compensated accordingly.
A photodiode 324 is used to additionally obtain information about the strength of the laser beam by using the beam splitter 323, which penetrates most condensed laser beams and reflects very small parts of the laser beam. The information about the strength of the laser beam is used to manage a conversion efficiency of an x-ray.
The CCD 325 detects the location of a light source generated in an x-ray generator 340 by using the visible light generated with the x-ray in the x-ray generator 340. Here, the CCD 325 can only detect the visible light, and a function of detecting the x-ray is not necessary.
The location of the light source detected in the CCD 325 is transmitted to the X-Y scanner 321. The CCD 325 determines whether the X-Y scanner 321 outputs the laser beam in an accurate angle so as to generate the light source in the accurate location, and compensate an output angle of the laser beam in the X-Y scanner 321.
In the x-ray generator 340, the x-ray generating target 341 is disposed on the focus surface of the laser condenser 330.
The x-ray generating target 341 used in FIG. 10 is a solid target. The x-ray generating target 341 is of a strip type, and thus is continuously replaced so as to prevent the solid target, which can get damaged since the laser beam is continuously irradiated onto one point, from being continuously used. An x-ray generating type in the form of a strip type is disclosed in U.S. Patent No. 4,700,371 , and thus a detailed description thereof is omitted herein.
Meanwhile, a PIN photodiode 342 is installed in the x-ray generator 340, and measures the strength of the generated x-ray.
The PIN photodiode 342 determines whether the strength of the generated x-ray is uniform, and may be used to compensate the strength of the laser beam generated by the laser generator 310 as in the case of the photodiode 342, or used to compensate the quantity of transmitted x-ray measured by a x-ray measurer 370. The x-ray generated by the x-ray generator 340 is not outputted towards one direction but towards all directions. Accordingly, the PIN photodiode 342 may be installed anywhere as long as there is no object that stands between the light source and the PIN photodiode 342. Meanwhile, the x-ray generated from the light source may be incident on an x-ray condenser 350 through a filter 343. The filter is used to block all signals that have a wavelength other than that of the x-ray, and may be formed of titanium (Ti) or aluminum.
The wavelength of the x-ray may vary according to a material forming the x-ray generating target 341. An x-ray near 3.37 nm wavelength may be generated by using a solid target including a carbon element, an x-ray in a wavelength band between 2.87 nm and 3.37 nm may be generated by using a target including nitrogen and carbon, and an x-ray in a wide bandwidth may be generated by using a metal target. Here, the filter 343 selects an x-ray of a certain wavelength.
Accordingly, the visible light is blocked by using aluminum in approximately 200 μm thickness, and a suitable wavelength of the x-ray is selected by using a metal such as Ti.
The x-ray that passed through the filter 343 is condensed on a certain location of a sample installed on a sample installer 360 through the x-ray condenser 350, formed of a Wolter mirror. The x-ray that penetrates the sample is converted into an electric signal by a PIN photodiode 370 at the condensed location, and then converted to a spatial image by an x-ray image former (not shown).
While converting the electric signal to the spatial image, the strength of the x-ray measured by the PIN photodiode 370 is relative to the strength of the x-ray measured by the PIN photodiode 342, and the quantity of the x-ray can be standardized accordingly. In this case, even if the strength of the laser beam or the x-ray changes in the middle, an accurate result can be obtained.
The quantity of the x-ray that penetrates the sample can be sufficiently detected by the PIN photodiode 370, but when the detected quantity is too low to increase the repetition rate of the laser beam, an amplifier (not shown), which amplifies the x-ray can be further included.
The sample and the PIN photodiode 370 may be placed in a vacuum so as to prevent the absorption of the x-ray, or may be placed in a helium gas after being separated from the x-ray generator 340 by using a thin layer formed of silicon nitride.
According to the scanner 120 of FIG. 2 in the x-ray microscope system described above, two axes, i.e. an X-axis and a Y-axis, are scanned by using the X-Y scanner 121 , such as an AOD or a galvano mirror. However, only one axis can be scanned by using an AOD or a galvano mirror, and another axis can be instrumentally scanned.
Specifically referring to FIG. 6, when the laser condenser 130 and the x-ray condenser 150 are not in a straight line but have a predetermined angle, i.e. when the surface forming the x-ray generating target 141 is not perpendicular to the laser condenser 130, scanning the Y-axis by using an AOD is not a problem. However, when the X-axis is scanned by using the AOD, the x-ray generating target 141 may not exist on the focus surface where the laser beam is condensed. In other words, a distance between the surface forming the x-ray generating target 141 and the laser condenser 130 is not uniform, and thus only a part of the x-ray generating target 141 is located on the focus surface of the laser condenser 130. In this case, if the laser beam is condensed on a part that is not located on the focus surface of the x-ray generating target 141 , the x-ray may not be generated in sufficient quantity. In FIG. 6, such a problem is solved by scanning the Y-axis by using an AOD, and by scanning the X-axis by moving the laser condenser 130 and the x-ray generator 140 mechanically.
At this time, only the laser condenser 130 and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis direction by a predetermined distance, the scanner 120 (only scans the Y-axis), the laser condenser 130, and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis direction by a predetermined distance, the laser generator 110, the scanner 120 (only scans the Y-axis), the laser condenser 130, and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis direction by a predetermined distance.
Alternatively the X-axis and the Y-axis may be scanned by a mechanical method as the laser condenser 130 and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis and the Y-axis without the AOD, or the laser generator 110, the laser condenser 130, and the x-ray generator 140 may be coupled together and moved mechanically to the X-axis and the Y-axis.
The scanning may be performed by mechanically moving the sample installer 160 only, but in this case, moving the sample installer 160 should be very precise, and thus expensive equipment is required, and a possibility of error occurrence increases. In other words, when the scanning is to be performed in a 50 nm unit, the sample installer 160 should be moved by 50 nm, but such precise movement is very difficult and the sample installer 160 becomes very weak and is vulnerable to even to a small vibration.
However in the present invention, elements in front of the x-ray condenser 150 are moved instead of moving the sample installer 160, and thus only the precision of several microns of multiplying the final resolution by the magnification of the x-ray condenser 150 is required. Accordingly, the precision of the entire x-ray microscope system does not need to be increased and is robust in terms of the vibration.
For example, when the sample is scanned in a 50 nm unit and the magnification of the x-ray condenser 150 is 50, the x-ray condenser 150 and coupled elements have to move only 2.5 μm so that the scanning is performed in a 50 nm unit in the sample installer 160. Accordingly, the x-ray condenser 150 and the coupled elements are not required to mechanically move in a 50 nm unit.
FIG. 11 is a block diagram illustrating an x-ray microscope system for performing the mechanical scanning in one axis direction as described above according to an embodiment of the present invention.
The x-ray microscope system of FIG. 11 includes a laser generator 410, a scanner 420, a laser condenser 430, an x-ray generator 440, an x-ray condenser 450, a sample installer 460, an x-ray measurer 470, and an x-ray image former 480 like the x-ray microscope system of FIG. 3, and functions of the elements excluding the scanner
420 are equal to those of FIG. 3.
In the current embodiment, the scanner 420 includes a first axis scanner 421 and a second axis scanner 422.
The first axis scanner 421 is disposed on a path of a laser beam generated in the laser generator 410, and outputs the laser beam after changing an output angle of the incident laser beam by a predetermined angle to a first axis direction according to time.
The first scanner 421 may be an AOD or a galvano mirror, and a relay lens may be further added so that the deflected light does not deviate from an opening of the laser condenser 430. The second axis scanner 422 performs mechanical scanning in a second axis direction, perpendicular to the first axis direction.
As described above, to perform mechanical scanning, the laser condenser 43 and the x-ray generator 440 may be coupled and move together, the first axis scanner
421 , the laser condenser 430, and the x-ray generator 440 may be coupled and move together, or the laser generator 410, the first axis scanner 421 , the laser condenser 430, and the x-ray generator 440 may be coupled and move together.
The second axis scanner 422 controls the coupled elements to move in an axis direction so as to perform the instrumental scanning by a predetermined distance.
In FIG. 11 , the laser generator 410, the first axis scanner 421 , the laser condenser 430, and the x-ray generator 440 are coupled and move together, and the second axis scanner 422 controls the movement of the coupled elements.
FIG. 12 is a flowchart illustrating an observing method according to an embodiment of the present invention. The method will be described with reference to the elements illustrated in FIG. 10 or FIG 2. First, the laser generator 310 outputs a laser beam for generating an x-ray in operation 501.
At this time, the laser generator 310 may output the laser beam while determining whether the laser beam is outputted in a uniform strength by using a value outputted from the photodiode 324 or the PIN photodiode 342. The scanner 120 outputs the incident laser beam generated by the laser generator 310 after changing the output angle of the laser beam by a predetermined angle according to time in operation 502.
The output angle of the laser beam may be changed according to a predetermined period, or by receiving a signal to change the output angle from the x-ray measurer 370 or the x-ray image former.
The x-ray measurer 370 or the x-ray image former may proceed to observe the sample by waiting until it is determined that the strength of an x-ray passed through a certain point of the sample is steady, and when the strength is determined to be steady, transmitting the signal to change the output angle of the laser beam to the scanner 120 so as to move to a next observing point of the sample.
Meanwhile, the scanner 120 is fed back with information about a location of a light source detected by the CCD 325, and compensates the output angle of the laser beam so that the light source is generated at an accurate pre-set location. In FIG. 2 or FIG. 10, the scanning is performed in an X-axis direction and a
Y-axis direction as the scanner 120 refracts a laser beam so as to change an incident angle and an incident location of the laser beam incident on the laser condenser 130 or
330. However in FIG. 11 , one axis is scanned by refracting the laser beam by using the first axis scanner 421 , and another axis is scanned by changing the irradiating location of the x-ray on the sample fixed on the sample installer 460 by moving elements mechanically by using the second axis scanner 422.
The laser condenser 330 condenses the laser beam outputted from the scanner 120 on a point on the focus surface of the laser condenser 330 in which the x-ray generating target 341 is installed, in operation 503. The condensing location of the laser beam varies as an irradiating angle of the laser beam changes due to the scanner 120. In detail, the condensing location of the laser beam on the X-axis is determined by multiplying the incident angle on the X-axis and a focus distance, and the condensing location of the laser beam on the Y- axis is determined by multiplying the incident angle on the Y-axis and the focus distance. A plasma phenomenon occurs in a part of the x-ray generating target 341 where the condensed laser beam is irradiated, and an x-ray is generated in operation 504. In other words, the x-ray is generated on the condensing location of the laser beam.
The strength of the generated x-ray is measured by the PIN photodiode 342 installed in the x-ray generator 340. The measured strength may be used to compensate the strength of the laser beam generated in the laser generator 310 or the penetration quantity of the x-ray measured by the x-ray measurer 370.
The generated x-ray is incident on the x-ray condenser 350, formed of a Wolter mirror, or the like, and then is condensed on one point of the sample located on the focus surface of the x-ray condenser 350. The condensing location of the x-ray varies according to the location of the generated light source. For example, when the reduction magnification of the Wolter mirror used as the x-ray condenser 350 is M and the location of the x-ray generated on the X-axis is Xx, and the location of the x-ray generated on the Y-axis is Yy, the location of the x-ray condensed on the sample on the X-axis is Xx/M, and on the Y-axis is Yy/M.
The x-ray that penetrates the sample is incident on the x-ray measurer 370, and the quantity of the transmitted x-ray is measured as an electric signal in operation 506.
Here, the measured quantity can be compensated by the value measured by the PIN photodiode 342 or the photodiode 324. It is determined whether the entire sample is observed in operation 507, and if not, the scanner 120 adjusts the output angle of the laser beam or moves the location of the elements that generates the laser beam or the laser beam and the x-ray so that the x-ray can be irradiated onto a next observing location of the sample.
When it is determined that the entire sample is observed in operation 507, the x-ray image former converts the quantity measured by the x-ray measurer 370 to a spatial image in operation 508. The spatial image may be formed at once after observing the entire sample, or every time a part of the sample is observed.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims.

Claims

1. An x-ray microscope system comprising: a laser generator, which generates a laser beam; a scanner, which outputs the laser beam by changing an output angle of the laser beam incident from the laser generator in a predetermined angle according to time; a laser condenser, which condenses the laser beam outputted from the scanner on a point on a focus surface determined according to an incident angle of the laser beam; an x-ray generator, which includes a predetermined x-ray generating target for generating an x-ray on the focus surface so as to generate an x-ray when the laser beam outputted from the laser condenser is irradiated; an x-ray condenser, which condenses the x-ray generated by the x-ray generator on different locations of the focus surface according to locations of the generated x-ray; a sample installer, which is disposed on the focus surface of the x-ray condenser and on which a sample to be observed is placed; an x-ray measurer, which is installed at a backend of the sample installer and converts the quantity of the x-ray that is condensed and penetrates the sample on the sample installer, into an electric signal; and an x-ray image former, which converts the electric signal measured by the x-ray measurer according to time into a spatial image signal.
2. An x-ray microscope system comprising: a laser generator, which generates a laser beam; a first axis scanner, which outputs the laser beam by changing an output angle of the laser beam incident from the laser generator by a predetermined angle towards a first axis direction according to time; a laser condenser, which condenses the laser beam outputted from the first axis scanner on a point on a focus surface determined according to an incident angle of the laser beam; an x-ray generator, which includes a predetermined x-ray generating target for generating an x-ray on the focus surface so as to generate an x-ray when the laser beam outputted from the laser condenser is irradiated; an x-ray condenser, which condenses the x-ray generated by the x-ray generator on different locations of the focus surface according to locations of the generated x-ray; a sample installer, which is disposed on the focus surface of the x-ray condenser and on which a sample to be observed is placed; an x-ray measurer, which is installed at a backend of the sample installer and converts the quantity of the x-ray that is condensed and penetrates the sample on the sample installer, into an electric signal; an x-ray image former, which converts the electric signal measured by the x-ray measurer according to time to a spatial image signal; and a second axis scanner, which moves the laser condenser and the x-ray generator to a second axis direction that is perpendicular to the first axis, wherein the laser condenser and the x-ray generator are tied and move together.
3. The x-ray microscope system of claim 1 , wherein the x-ray generator comprises a PIN photodiode, which measures the strength of the x-ray generated from the x-ray generating target, wherein the x-ray image former converts the electric signal to the spatial image signal by using a relative value obtained by comparing the strength of the x-ray measured by the PIN photodiode and the strength of the x-ray measured by the x-ray measurer.
4. The x-ray microscope system of claim 2, wherein the x-ray generator comprises a PIN photodiode, which measures the strength of the x-ray generated from the x-ray generating target, wherein the x-ray image former converts the electric signal to the spatial image signal by using a relative value obtained by comparing the strength of the x-ray measured by the PIN photodiode and the strength of the x-ray measured by the x-ray measurer.
5. The x-ray microscope system of claim 1 , further comprising a visible light source 2D charge coupled device (CCD), which detects a location of the generated x-ray by using a visible light generated together with the x-ray by the x-ray generator, wherein the scanner compensates the output angle of the laser beam by using the location detected by the visible light source 2D CCD.
6. The x-ray microscope system of claim 1 , further comprising a filter, which is installed between the x-ray generating target and the x-ray condenser and only transmits an x-ray in a predetermined wavelength.
7. The x-ray microscope system of claim 2, further comprising a filter, which is installed between the x-ray generating target and the x-ray condenser and only transmits an x-ray in a predetermined wavelength.
PCT/KR2008/000487 2007-01-26 2008-01-25 Source scanning x-ray microscope system WO2008091139A1 (en)

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JPH0855598A (en) * 1994-08-11 1996-02-27 Hitachi Ltd Scanning photoelectron microscope
JP2004212807A (en) * 2003-01-07 2004-07-29 Nikon Corp Laser scanning microscope
KR100651055B1 (en) * 2005-08-30 2006-12-01 학교법인 원광학원 X-ray transmission microscope apparatus

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JPH0855598A (en) * 1994-08-11 1996-02-27 Hitachi Ltd Scanning photoelectron microscope
JP2004212807A (en) * 2003-01-07 2004-07-29 Nikon Corp Laser scanning microscope
KR100651055B1 (en) * 2005-08-30 2006-12-01 학교법인 원광학원 X-ray transmission microscope apparatus

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