WO2008088559A1 - Procédé et structure de nettoyage de surfaces utilisées pour lier des substrats de transfert de couches - Google Patents

Procédé et structure de nettoyage de surfaces utilisées pour lier des substrats de transfert de couches Download PDF

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Publication number
WO2008088559A1
WO2008088559A1 PCT/US2007/060800 US2007060800W WO2008088559A1 WO 2008088559 A1 WO2008088559 A1 WO 2008088559A1 US 2007060800 W US2007060800 W US 2007060800W WO 2008088559 A1 WO2008088559 A1 WO 2008088559A1
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Prior art keywords
substrate
silicon
surface region
mixture
specific embodiment
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PCT/US2007/060800
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English (en)
Inventor
Francois J. Henley
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Silicon Genesis Corporation
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
    • H01L21/2007—Bonding of semiconductor wafers to insulating substrates or to semiconducting substrates using an intermediate insulating layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond

Definitions

  • the present invention relates to the manufacture of substrates. More particularly, the invention provides a technique including a method and a structure for forming multi- layered substrate structures using cleaning and bonding techniques for the fabrication of semiconductor integrated circuit devices. Such cleaning techniques use at least wet processes to reduce bonding imperfections, defects, and/or other undesirable features according to a specific embodiment. But it will be recognized that the invention has a wider range of applicability; it can also be applied to other types of substrates for three-dimensional packaging of integrated semiconductor devices, photonic devices, piezoelectronic devices, flat panel displays, microelectromechanical systems (“MEMS”), nano-technology structures, sensors, actuators, solar cells, biological and biomedical devices, and the like.
  • MEMS microelectromechanical systems
  • the invention provides a technique including a method and a structure for forming multi-layered substrate structures using cleaning and bonding techniques for the fabrication of semiconductor integrated circuit devices.
  • cleaning techniques use at least wet processes to reduce bonding imperfections, defects, and/or other undesirable features according to a specific embodiment.
  • the invention has a wider range of applicability; it can also be applied to other types of substrates for three-dimensional packaging of integrated semiconductor devices, photonic devices, piezoelectronic devices, flat panel displays, microelectromechanical systems (“MEMS”), nano-technology structures, sensors, actuators, solar cells, biological and biomedical devices, and the like.
  • MEMS microelectromechanical systems
  • the present invention provides a method for manufacturing a film of material using a layer transfer process, e.g., controlled cleaving.
  • the method includes providing a thickness of substrate material having a diameter of 200 millimeter or 300 millimeter comprising a surface region.
  • the method includes forming a cleave region within a depth from the surface region of the substrate material to define a thickness of material to be detached.
  • the method includes subjecting the substrate including the cleave region into a mixture of mixture of sulfuric acid and hydrogen peroxide in an unheated quartz container.
  • the mixture has a trace metal purity of less than 10 parts per billion.
  • the method includes cleaning the surface region of the substrate using at least the mixture of sulfuric acid and hydrogen peroxide, while maintaining a temperature of the mixture of at about 100 Degrees Celsius and greater and joining the surface region to a handle surface region of a handle substrate to cause the surface region to bond to the handle surface region.
  • the method removes the thickness of material using a cleaving process.
  • This cleaving process selectively removes the thin film of material from the substrate while preventing a possibility of damage to the film or a remaining portion of the substrate. Additionally, the present method and structures allow for more efficient processing using a cleave layer provided in a substrate through the course of semiconductor processing, which may occur at higher temperatures, according to a specific embodiment.
  • the cleaved film which is attached to a handle substrate, is subjected to a cleaning process using a wet solution having desired characteristics to firmly engage the cleaved film to the handle substrate without formation of imperfections within a vicinity of an interface region provided between the cleaved film and substrate.
  • the cleaved assembly can be subjected to a smoothing process as taught in U.S. Patent No. 6,287,941 issued September 11, 2001, and in the names of Kang, Sien G. and Malik, Igor J., commonly assigned (the '941 patent), or U.S. Patent Nos. 6,884,696 and 6,962,858, each of which is incorporated by reference herein.
  • the method can be used to prepare a clean and defect-free surface and followed by a single-wafer reactor or furnace anneal operation to effectuate the oxygen dissolution.
  • the present invention achieves these benefits and others in the context of known process technology.
  • an application of this silicon-to-silicon bonded structure can be used where one or more layers are of differing crystal orientations.
  • the base substrate can be silicon (100) orientation and the top transferred film can be silicon (110) orientation.
  • the base substrate can be (110) orientation and the transferred film can be (100) orientation.
  • Other combinations of orientation including (111) orientation with any of the above can also be included according to an embodiment of the present invention.
  • the multi-layer structure can also be formed onto an SOI (i.e., silicon-on-insulator) structure where the top two films are of differing orientation and mounted onto a oxide-coated base substrate.
  • one or more layers may be include global or localized strain or any combination of these, and the like.
  • Figure 1 illustrates an overall simplified method of forming silicon on silicon substrates according to embodiments of the present invention.
  • Figures 2 through 8, 8A, 8B, and 9 illustrate a simplified method for manufacturing a bonded substrate structure using a layer transferred substrate according to embodiments of the present invention.
  • the invention provides a technique including a method and a structure for forming multi-layered substrate structures using cleaning and bonding techniques for the fabrication of semiconductor integrated circuit devices.
  • cleaning techniques use at least wet processes to reduce bonding imperfections, defects, and/or other undesirable features according to a specific embodiment.
  • the invention has a wider range of applicability; it can also be applied to other types of substrates for three-dimensional packaging of integrated semiconductor devices, photonic devices, piezoelectronic devices, flat panel displays, microelectromechanical systems (“MEMS”), nano-technology structures, sensors, actuators, solar cells, biological and biomedical devices, and the like.
  • MEMS microelectromechanical systems
  • a method 100 for cleaning and joining substrates together may be outlined as follows:
  • a first substrate which has a first surface region, a cleave region, and a thickness of material to be removed between the first surface region and the cleave region;
  • step 104 Subject the first substrate (step 104) including the first surface region to a mixture of hydrogen peroxide and sulfuric acid; 4. Provide a second substrate (step 105), which has a second surface region;
  • step 106 Subject the second substrate (step 106) including the second surface region to a mixture of hydrogen peroxide and sulfuric acid;
  • step 107 Maintain (step 107) the second substrate and/or the first substrate in the mixture having a temperature of about 100 Degrees Celsius and greater;
  • step 109 the thickness of material from the first silicon substrate, while the second silicon substrate remains attached to the thickness of material
  • Process (step 1 1 1) at least a portion of one of the substrates using one or more processes to form at least one integrated circuit device onto the portion of the one of the substrates;
  • the above sequence of steps provides a method according to an embodiment of the present invention. More particularly, the invention provides a technique including a method and a structure for forming multi-layered substrate structures using cleaning and bonding techniques for the fabrication of semiconductor integrated circuit devices. Such cleaning techniques use at least wet processes to reduce bonding imperfections, defects, and/or other undesirable features according to a specific embodiment. Other alternatives can also be provided where steps are added, one or more steps are removed, or one or more steps are provided in a different sequence without departing from the scope of the claims herein. Further details of the present method can be found throughout the present specification and more particularly below.
  • Figures 2 through 10 illustrate a simplified method for manufacturing integrated circuits on a layer transferred substrate according to embodiments of the present invention. These diagrams are merely illustrations that should not unduly limit the scope of the claims herein. One of ordinary skill in the art would recognize other variations, modifications, and alternatives.
  • the method includes providing a semiconductor substrate 200, e.g., silicon, germanium, a silicon-germanium alloy, gallium arsenide, any Group II1/V materials, and others.
  • the semiconductor substrate can be made of a single homogenous material, or a combination of various layers, depending upon the specific embodiment.
  • the semiconductor substrate can be made of a single homogenous material, or a combination of various layers, depending upon the specific embodiment.
  • the substrate 200 has a thickness of semiconductor material 205 and a surface region 207.
  • the substrate also has a cleave plane 203 (including a plurality of particles, deposited material, or any combination of these, and the like) provided within the substrate, which defines the thickness of semiconductor material.
  • the thickness of semiconductor material is crystalline silicon (e.g., single crystal silicon), which can include an overlying epitaxial silicon layer.
  • the silicon surface region 207 can have a thin layer of oxide such as silicon dioxide. The silicon dioxide has a thickness of 5 nm and less according to a specific embodiment.
  • the silicon dioxide can be fairly thick to form silicon on insulator structures and the like.
  • the silicon oxide can be silicon dioxide, silicon oxide, silicon rich oxide, or any SiOx species, combinations thereof, and the like.
  • SiOx species combinations thereof, and the like.
  • the cleave region can be formed using a variety of techniques. That is, the cleave region can be formed using any suitable combination of implanted particles, deposited layers, diffused materials, patterned regions, and other techniques.
  • the method introduces certain energetic particles using an implant process through a top surface of the semiconductor substrate, which can be termed a donor substrate, to a selected depth, which defines the thickness of the semiconductor material region, termed the "thin film" of material.
  • a variety of techniques can be used to implant the energetic particles into a single crystal silicon wafer according to a specific embodiment. These techniques include ion implantation using, for example, beam line ion implantation equipment manufactured from companies such as Applied Materials, Inc. and others.
  • implantation occurs using a plasma immersion ion implantation ("PIII") technique, ion shower, and other non-mass specific techniques (e.g., complete mass separate, partial mass separate) can be particularly effective for larger surface regions according to a specific embodiment. Combination of such techniques may also be used. Of course, techniques used depend upon the application.
  • PIII plasma immersion ion implantation
  • other non-mass specific techniques e.g., complete mass separate, partial mass separate
  • Other non-mass specific techniques e.g., complete mass separate, partial mass separate
  • PIII plasma immersion ion implantation
  • the particles can be neutral and or charged particles including ions such as ions of hydrogen and its isotopes, rare gas ions such as helium and its isotopes, and neon, or others depending upon the embodiment.
  • the particles can also be derived from compounds such as gases, e.g., hydrogen gas, water vapor, methane, and hydrogen compounds, and other light atomic mass particles.
  • the particles can be any combination of the above particles, and or ions and or molecular species and or atomic species.
  • the particles generally have sufficient kinetic energy to penetrate through the surface to the selected depth underneath the surface.
  • Implantation dose ranges from about 1E15 to about 1E18 atoms/cm2, and preferably the dose is greater than about IE 16 atoms/cm2.
  • Implantation energy ranges from about 1 KeV to about 1 MeV , and is generally about 50 KeV.
  • Implantation temperature ranges from about -20 to about 600 Degrees Celsius, and is preferably less than about 400 Degrees Celsius to prevent a possibility of a substantial quantity of hydrogen ions from diffusing out of the implanted silicon wafer and annealing the implanted damage and stress.
  • the hydrogen ions can be selectively introduced into the silicon wafer to the selected depth at an accuracy of about +/- 0.03 to +/-0.05 microns.
  • the type of ion used and process conditions depend upon the application.
  • the implanted particles add stress or reduce fracture energy along a plane parallel to the top surface of the substrate at the selected depth.
  • the energies depend, in part, upon the implantation species and conditions. These particles reduce a fracture energy level of the substrate at the selected depth. This allows for a controlled cleave along the implanted plane at the selected depth. Implantation can occur under conditions such that the energy state of the substrate at all internal locations is insufficient to initiate a nonreversible fracture (i.e., separation or cleaving) in the substrate material.
  • implantation does generally cause a certain amount of defects (e.g., micro- detects) in the substrate that can typically at least partially be repaired by subsequent heat treatment, e.g., thermal annealing or rapid thermal annealing.
  • subsequent heat treatment e.g., thermal annealing or rapid thermal annealing.
  • cleave region there may be other techniques for forming a cleave region and/or cleave layer.
  • such cleave region is formed using other processes, such as those using a silicon-germanium cfeave plane developed by Silicon Genesis Corporation of Santa Clara, California and processes such as the SmartCutTM process of Soitec S A of France, and the EltranTM process of Canon Inc. of Tokyo, Japan, any like processes, and others.
  • the cleave region can include a strained/stressed region or be substantially free of strain/stress according to a specific embodiment.
  • the cleave region can also include a deposited region with or without an implanted region according to a specific embodiment.
  • the method includes joining 300 the surface region of the semiconductor substrate to a first handle substrate 301.
  • the handle substrate is made of a suitable material that is also substantially crystalline, e.g., single crystal silicon. That is, the handle substrate can be made of a silicon wafer, an epitaxial silicon wafer, denuded zone wafers (e.g., hydrogen annealed, argon annealed, a MDZTM Product by MEMC Electronic Materials, Inc.) or other crystalline materials (including layer transferred silicon on insulator substrates) according to a specific embodiment.
  • a suitable material that is also substantially crystalline, e.g., single crystal silicon. That is, the handle substrate can be made of a silicon wafer, an epitaxial silicon wafer, denuded zone wafers (e.g., hydrogen annealed, argon annealed, a MDZTM Product by MEMC Electronic Materials, Inc.) or other crystalline materials (including layer transferred silicon on insulator substrates) according to a specific embodiment
  • the handle substrate can be doped (e.g., P-type, N-type) and/or undoped, including nitrogen doped substrates and the like.
  • the silicon wafer has a silicon surface region 301.
  • the silicon surface region can have a thin layer of oxide such as silicon dioxide.
  • the silicon dioxide has a thickness of 5 nm and less according to a specific embodiment.
  • the silicon oxide can be silicon dioxide, silicon oxide, silicon rich oxide, or any SiOx species, combinations thereof, and the like.
  • the first handle substrate has a surface region 305, which will be joined and/or bonded with surface region 207 provided on substrate 200.
  • surface region 305 which will be joined and/or bonded with surface region 207 provided on substrate 200.
  • Like reference numerals are used in this figure has others, but are not intended to be limiting the scope of the claims herein. Further details of the joining process can be found throughout the present specification and more particularly below.
  • the semiconductor substrate and the first handle substrate surfaces are each subjected to a cleaning solution to treat the surfaces of the substrates to clean the substrate surface regions according to a specific embodiment.
  • a solution used to clean the substrate and handle surfaces is a mixture of hydrogen peroxide and sulfuric acid, and other like solutions.
  • the mixture is formed using four bottles 96% Sulfuric Acid (H2SO4), which is CMOS grade from J.T. Baker and is often comes in 15 Ib bottles.
  • the sulfuric acid has a trace metal purity specified ⁇ 10 ppb for each metal according to a specific embodiment.
  • the four bottles of sulfuric acid is mixed with 1 bottle of 30% hydrogen peroxide (H2O2).
  • the bottle of hydrogen peroxide is Fynite 1 grade from J.T. Baker, and often comes in 8 pint bottles in a specific embodiment.
  • the trace metal purity is ⁇ 1 ppb for each metal.
  • the mixture is performed using an unheated quartz bath but becomes heated using the exothermic reaction of the chemical mixture to cause an increase in temperature of the mixture to a desired temperature range.
  • the mixture life in the both is about 4 hours after mixing the solutions together.
  • the bath mixture temperature is greater than about 100 0 C.
  • the temperature is measured using an optical pyrometer. After mixing the bath temperature can reach approximately 120 0 C - 14O 0 C according to a specific embodiment.
  • multiple substrates can be immersed into the bath as long as the temperature is about 100 Degrees Celsius and greater until the temperature is reduced to below 100 Degrees Celsius, where the substrates are taken out.
  • the method includes chemical spiking of hydrogen peroxide using, for example, a 1/2 bottle per spike, to slightly extend bath life according to a specific embodiment.
  • reaction byproducts of the chemical mixture can include water and Caro's acid (H2SO5), and other species.
  • the present cleaning process removes undesirable organic contaminants and/or particles caused by a preceding operation such as implanting, and the like. Such contaminants and/or particles lead to voids, imperfections, defects, etc. during the bonding process in a specific embodiment.
  • a dryer dries the semiconductor substrate and handle surfaces to remove any residual liquids and/or particles from the substrate surfaces.
  • Self- bonding occurs by placing surfaces of cleaned substrates (e.g., semiconductor substrate surface and handle substrate surface) together after an optional plasma activation process depending on the specific layer-transfer process used. If desired, such plasma activated processes clean and/or activate the surfaces of the substrates.
  • the plasma activated processes are provided, for example, using an oxygen or nitrogen bearing plasma at 20 0 C to 40 0 C temperature.
  • the plasma activated processes are preferably carried out in dual frequency plasma activation system manufactured by Silicon Genesis Corporation of San Jose, California. Of course, there can be other variations, modifications, and alternatives, which have been described herein, as well as outside of the present specification.
  • each of these substrates is bonded together according to a specific embodiment.
  • the handle substrate has been bonded to the donor substrate surface region.
  • the substrates are preferably bonded using an EVG 850 bonding tool manufactured by Electronic Vision Group or other like processes for smaller substrate sizes such as 200mm or 300mm diameter wafers. Other types of tools such as those manufactured by Karl Suss may also be used. Of course, there can be other variations, modifications, and alternatives.
  • bonding between the handle substrate and the donor is substantially permanent and has good reliability.
  • the bonded substrate structures are subjected to a bake treatment according to a specific embodiment.
  • the bake treatment maintains the bonded substrate at a predetermined temperature and predetermined time.
  • the temperature ranges from about 200 or 250 Degrees Celsius to about 400 Degrees Celsius and is preferably about 350 Degrees Celsius for about 1 hour or so for a silicon donor substrate and the first handle substrate to attach themselves to each other permanently according to the preferred embodiment.
  • the bake treatment can occur using a furnace, a rapid thermal process, or a hot plate or any combination of these.
  • the substrates are joined or fused together using a low temperature thermal step.
  • the low temperature thermal process generally ensures that the implanted particles do not place excessive stress on the material region, which can produce an uncontrolled cleave action.
  • the low temperature bonding process occurs by a self-bonding process.
  • an adhesive disposed on either or both surfaces of the substrates, which bond one substrate to another substrate.
  • the adhesive includes an epoxy, polyimide-type materials, and the like.
  • Spin-on-glass layers can be used to bond one substrate surface onto the face of another.
  • These spin-on-glass (“SOG”) materials include, among others, siloxanes or silicates, which are often mixed with alcohol- based solvents or the like.
  • SOG can be a desirable material because of the low temperatures (e.g., 150 to 25O.degree. C.) often needed to cure the SOG after it is applied to surfaces of the wafers.
  • a variety of other low temperature techniques can be used to join the donor substrate surface regions to the handle substrate.
  • an electro-static bonding technique can be used to join the two substrates together.
  • one or both substrate surface(s) is charged to attract to the other substrate surface.
  • the donor substrate surface can be fused to the handle wafer using a variety of other commonly known techniques. Of course, the technique used depends upon the application.
  • the method includes initiating a controlled cleaving action using energy 401 provided at a selected portion of the cleave plane to detach the thickness of semiconductor material from the substrate, while the thickness of semiconductor material remains joined to the first handle substrate.
  • the cleaving process can be a controlled cleaving process using a propagating cleave front to selectively free the thickness of material from the donor substrate attached to the handle substrate.
  • Alternative techniques for cleaving can also be used.
  • Such techniques include, but are not limited to those called a NanocleaveTM process of Silicon Genesis Corporation of Santa Clara, California, a SmartCutTM process of Soitec SA of France, and an EltranTM process of Canon Inc. of Tokyo, Japan, any like processes, and others.
  • the method then removes the remaining portion of the semiconductor donor substrate, which provided the thickness of material to the handle substrate according to a specific embodiment.
  • the method provides a resulting handle substrate 500 including an overlying thickness of material 205 according to a preferred embodiment.
  • the thickness of material is provided on the handle substrate using a silicon on silicon bond, which provides electrical coupling between the two structures.
  • the thickness of material includes a cleaved surface region 501.
  • the bonded substrate structure is bonded together, but not suitable for integrated circuit processing. That is, the bonded substrate structure should be subjected to a permanent bond using at least a rapid thermal technique and/or furnace anneal, which will be described in more detail throughout the present specification and more particularly below.
  • a rapid thermal technique and/or furnace anneal which will be described in more detail throughout the present specification and more particularly below.
  • the present method includes subjecting an interface region 601 to a thermal process to cause an increase in temperature from at least a first temperature within a first temperature range of about 100 Degrees Celsius to about 200 Degrees Celsius to at least a second temperature within a second temperature range of about 800 Degrees Celsius and greater.
  • the thermal process causes the increase in temperature from the first temperature to at least the second temperature within a time period of about 2 seconds and less to form a second characteristic at the interface region.
  • the time period can be less than one second.
  • the thermal process can be a suitable rapid thermal process, rapid thermal anneal, rapid thermal process using laser irradiation, or the like.
  • the thermal process comprises irradiating the thickness of material and silicon handle substrate using a monochromatic light source. Further details of the irradiation technique can be found throughout the present specification and more particularly below.
  • the irradiation can occur in a suitable processing tool.
  • the processing tool can include a chamber of a cluster tool or suitable stand alone tool or the like.
  • the cluster tool can also include other chambers for implantation, controlled cleaving, bonding, and other process technologies.
  • the irradiation can occur using an increase in temperature with a suitable increase from an initial temperature to a final temperature. Such increase in temperature can be at a rate of about 1000 Degrees Celsius per minute and greater or include step increases or other variations according to a specific embodiment.
  • the present method maintains the interface region substantially free from one or more voids of a dimension of about 10 microns and greater.
  • the method preferably maintains the interface region free from any and all voids, which can cause reliability and/or processing limitations.
  • These voids may be caused by a plurality of hydrogen species that have been introduced into the cleave region in a preceding process according to a specific embodiment.
  • the thermal processing secures bonding between the thickness of material while preventing accumulation of hydrogen species by diffusion, which can be characterized by a hydrogen diffusion characteristic in the thickness of material.
  • Other impurities that may accumulate at the interface through diffusion include water, hydroxide species, carbon containing species, and others according to a specific embodiment.
  • the interface region is subjected to a high temperature thermal treatment process that substantially frees the interface region from oxide species.
  • the process can include or more rapid thermal and/or furnace annealing techniques. That is, the bond between the thickness of silicon material and silicon substrate is free from silicon dioxide or other oxides according to a specific embodiment.
  • the interface preferably electrically couples the thickness of material to the silicon substrate according to a specific embodiment.
  • the interface can also have a very thin oxide layer, which is about 10 nm and less. Such thin oxide layer causes certain resistance between the thickness of silicon material and silicon substrate according to a specific embodiment.
  • the resistivity is less than about 10 times a resistivity of the surrounding bulk substrates (e.g., crystalline silicon) according to a specific embodiment.
  • the surrounding bulk substrates e.g., crystalline silicon
  • the thermal treatment is provided using an inert gas or reducing gas maintained on the silicon on silicon substrate member.
  • the gas is substantially free from any oxide species.
  • the thermal treatment includes subjecting the interface region to a thermal process to cause a change to the interface region from the first characteristic to a second characteristic, which is free from the silicon oxide material and where an epitaxial silicon material is formed by epitaxial regrowth provided between the thickness of single crystal silicon material and the handle silicon substrate.
  • the method also maintains the interface region free of multiple voids during the thermal process to form the epitaxial silicon material to electrically couple the thickness of single crystal silicon material to the handle silicon substrate.
  • the epitaxial growth is predominantly or substantially single crystal in characterisitic.
  • the thermal process comprises subjects the joined thickness of single crystal silicon material and the handle substrate to an argon, hydrogen, or argon-hydrogen bearing environment at a temperature greater than about 1000 Degrees Celsius, although it can be slightly below depending upon the embodiment. Other types of combinations including argon, hydrogen, nitrogen, or the like can also be used according to a specific embodiment of the present invention.
  • the thermal processes causes oxygen species in the interface region to diffuse out from the interface region, through one or more portions of the substrate member according to a specific embodiment. In a preferred embodiment, the oxygen diffuses out of the bonded substrate members.
  • the interface region changes in characteristic from an oxide material to a crystalline silicon material, which is more effective at electrically coupling the thickness of silicon material to the handle substrate.
  • FIG. 7 an illustration of a silicon substrate 301 and an overlying thickness of silicon material 205 is shown.
  • This diagram is merely an example, which should not unduly limit the scope of the claims herein.
  • One of ordinary skill in the art would recognize many variations, modifications, and alternatives.
  • the thin oxide layer has a concentration illustrated by plot 750.
  • the vertical axis shows oxygen species concentration, which is provided against horizontal axis for spatial position. The spatial position is provided along the thickness from the surface region of the thickness of material to the backside of the silicon substrate, as shown.
  • a high concentration of oxide material is illustrated at the interface region between the thickness of silicon material and silicon substrate.
  • an epitaxial regrowth of the silicon occurs that allows the interface to become of high crystalline quality and of high electrical conductivity.
  • the method subjects the thickness of silicon material and silicon substrate, including the interface region, to a thermal treatment, as illustrated by Figure 8.
  • a thermal treatment as illustrated by Figure 8.
  • the high temperature anneal which representatively includes an argon and/or hydrogen environment, drives out the oxide material from the substrate, as illustrated by plot 850 according to a specific embodiment.
  • the interface region 801 is now crystalline silicon material, which couples the thickness of material to the silicon substrate according to a specific embodiment.
  • Do(T) is an oxygen diffusivity coefficient in silicon.
  • the oxygen concentration operating for purposes of diffusion would be the solid solubility limit Cs(T) at the interface boundary and zero at the crystal surface.
  • the derivative would therefore simplify to Cs(T)/film thickness).
  • the handle substrate is a denuded silicon substrate that is substantially free from impurities such as oxygen precipitates, voids, cops, and other imperfections.
  • the oxygen concentration in the denuded substrate is about 0.5 to about 3El 8 atoms/cm3 and less.
  • Overlying the handle substrate is a thickness of single crystal material 205, which has been layer transferred onto the handle substrate.
  • a first oxide bearing interface region 853 is derived by oxide material on either or both handle or thickness of material to facilitate bonding.
  • the first interface region has a first thickness that may be about 5 nanometers and less in a specific embodiment.
  • a resulting interface 851 forms, which is crystalline silicon that may have different crystal orientations.
  • the resulting interface has about one to five monolayers of silicon material, which electrically couple the thickness of material to the handle substrate.
  • the upper interface region 855 may move faster than the lower interface region 857 since the upper interface region has a thinner solid region 255 that facilitates diffusion of oxygen species from interface region 853, through the thickness of material to an outer region (outside the solid) according to a specific embodiment.
  • the upper interface region 855 may move faster than the lower interface region 857 since the upper interface region has a thinner solid region 255 that facilitates diffusion of oxygen species from interface region 853, through the thickness of material to an outer region (outside the solid) according to a specific embodiment.
  • the resulting handle substrate has suitable characteristics for undergoing one or more processing steps. That is, the handle substrate can be subjected to conventional semiconductor processing techniques, including but not limited to, photolithography, etching, implanting, thermal annealing, chemical mechanical polishing, diffusion, deposition, and other others, which may be known by one of ordinary skill in the art.
  • the handle substrate can also be selectively removed while transferring the thin film of material onto another substrate structure according to a specific embodiment.
  • the present method performs other processes on portions of the thickness of material regions, which have been attached to the handle substrate, according to a specific embodiment of the present invention.
  • the method forms 900 one or more devices on one or more portions of the thin film of material overlying the handle substrate surface.
  • Such devices can include integrated semiconductor devices, photonic and/or optoelectronic devices (e.g., light valves), piezoelectronic devices, microelectromechanical systems ("MEMS"), nano-technology structures, sensors, actuators, solar cells, flat panel display devices (e.g., LCD, AMLCD), biological and biomedical devices, and the like.
  • MEMS microelectromechanical systems
  • nano-technology structures e.g., sensors, actuators, solar cells, flat panel display devices (e.g., LCD, AMLCD), biological and biomedical devices, and the like.
  • Such devices can be made using deposition, etching, implantation, photo masking processes, any combination of these, and the like. Of course, there can be other variations, modifications, and alternatives. Additionally, other steps can also be formed, as desired.
  • the processing includes high temperature semiconductor processing techniques to form conventional integrated circuits thereon.
  • the method forms a planarized surface region overlying the thickness of semiconductor material.
  • the planarized surface region can be formed using one or more suitable techniques. Such techniques include deposition of a dielectric layer, which is later reflowed using thermal treatment.
  • the planarized surface region can also be formed using a chemical mechanical polishing process including a suitable slurry, pad, and process according to a specific embodiment.
  • the planarized surface region can also be formed using any combination of these techniques and others according to a specific embodiment.
  • the planarized surface region preferably has a uniformity of about 0.1% to about 5% end to end, and is within about 15 Angstroms RMS in roughness as measured on a 2 micron by 2 micron atomic-force microscope scan.
  • uniformity of about 0.1% to about 5% end to end, and is within about 15 Angstroms RMS in roughness as measured on a 2 micron by 2 micron atomic-force microscope scan.
  • the method also joins the planarized surface region of the resulting processed handle substrate to a face of a second handle substrate.
  • the processed thickness of material and the second handle substrate surfaces are each subjected to a cleaning solution to treat the surfaces of the substrates to clean the substrate surface regions according to a specific embodiment.
  • a solution used to clean the substrate and handle surfaces is a mixture of hydrogen peroxide and sulfuric acid, and other like solutions.
  • the mixture is formed using four bottles 96% Sulfuric Acid (H2SO4), which is CMOS grade from J.T. Baker and is often comes in 15 Ib bottles.
  • the sulfuric acid has a trace metal purity specified ⁇ 10 ppb for each metal according to a specific embodiment.
  • the four bottles of sulfuric acid is mixed with 1 bottle of 30% hydrogen peroxide (H2O2).
  • the bottle of hydrogen peroxide is Fynite 1 grade from J.T. Baker, and often comes in 8 pint bottles in a specific embodiment.
  • the trace metal purity is ⁇ 1 ppb for each metal.
  • the mixture is performed using an unheated quartz bath but becomes heated using the exothermic reaction of the chemical mixture to cause an increase in temperature of the mixture to a desired temperature range.
  • the mixture life in the both is about 4 hours after mixing the solutions together.
  • the bath mixture temperature is greater than about 100 0 C as measured.
  • the temperature is measured using an optical pyrometer. After mixing the bath temperature can reach approximately 120°C - 140 0 C according to a specific embodiment.
  • multiple substrates can be immersed into the bath until the temperature reduces to below 100 Degrees Celsius.
  • the method includes chemical spiking of hydrogen peroxide using, for example, a 1/2 bottle per spike, to slightly extend bath life according to a specific embodiment.
  • reaction byproducts of the chemical mixture can include water and Caro's acid (H2SO5), and other species.
  • a dryer dries the semiconductor substrate and handle surfaces to remove any residual liquids and/or particles from the substrate surfaces.
  • Self-bonding occurs by placing surfaces of cleaned substrates (e.g., planarized region and handle substrate surface) together after an optional plasma activation process depending on the specific layer-transfer process used. If desired, such plasma activated processes clean and/or activate the surfaces of the processed substrates.
  • the plasma activated processes are provided, for example, using an oxygen or nitrogen bearing plasma at 20 0 C to 4O 0 C temperature.
  • the plasma activated processes are preferably carried out in dual frequency plasma activation system manufactured by Silicon Genesis Corporation of San Jose, California. Of course, there can be other variations, modifications, and alternatives, which have been described herein, as well as outside of the present specification.
  • each of these substrates is bonded together according to a specific embodiment.
  • the handle substrate has been bonded to the planarized surface region.
  • the substrates are preferably bonded using an EVG 850 bonding tool manufactured by Electronic Vision Group or other like processes for smaller substrate sizes such as 200mm or 300mm diameter wafers. Other types of tools such as those manufactured by Karl Suss may also be used. Of course, there can be other variations, modifications, and alternatives.
  • bonding between the handle substrate and the planarized surface is substantially permanent and has good reliability.
  • the bonded substrate structures are subjected to a bake treatment according to a specific embodiment.
  • the bake treatment maintains the bonded substrate at a predetermined temperature and predetermined time.
  • the temperature ranges from about 200 or 250 Degrees Celsius to about 400 Degrees Celsius and is preferably about 350 Degrees Celsius for about 1 hour or so for a planarized substrate region and the second handle substrate to attach themselves to each other permanently according to the preferred embodiment.
  • the substrates are joined or fused together using a low temperature thermal step.
  • the low temperature thermal process generally ensures that the implanted particles do not place excessive stress on the material region, which can produce an uncontrolled cleave action.
  • the low temperature bonding process occurs by a self-bonding process.
  • an adhesive disposed on either or both surfaces of the substrates, which bond one substrate to another substrate.
  • the adhesive includes an epoxy, polyimide-type materials, and the like.
  • Spin-on-glass layers can be used to bond one substrate surface onto the face of another.
  • These spin-on-glass (“SOG”) materials include, among others, siloxanes or silicates, which are often mixed with alcohol- based solvents or the like.
  • SOG can be a desirable material because of the low temperatures (e.g., 150 to 250.degree. C.) often needed to cure the SOG after it is applied to surfaces of the wafers.
  • a variety of other low temperature techniques can be used to join the substrate surface region to the handle substrate.
  • an electro-static bonding technique can be used to join the two substrates together.
  • one or both substrate surface(s) is charged to attract to the other substrate surface.
  • the donor substrate surface can be fused to the handle wafer using a variety of other commonly known techniques.
  • the technique used depends upon the application.
  • the structure includes bulk substrate.
  • the bulk substrate includes an overlying layer, which may be a layer transferred layer.
  • the overlying layer includes layer transferred layer, which has processed and completed device structures thereon.
  • Overlying layer includes one or more layers, which also may be layer transferred, deposited, or any combination of these, according to a specific embodiment.
  • the thermal process can include a single and/or multiple thermal processes, which are the same or different according to a specific embodiment. Of course, there can be other variations, modifications, and alternatives.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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  • Element Separation (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)

Abstract

La présente invention concerne un procédé de production d'un film de matière au moyen d'un processus de transfert de couches, par exemple, uns séparation contrôlée. Le procédé consiste à former une épaisseur de matière de substrat ayant un diamètre de 200 millimètres ou de 300 millimètres comprenant une région de surface. Le procédé consiste à former une région de séparation dans une zone de profondeur partant de la région de surface de la matière de substrat pour définir une épaisseur de la matière à détacher. Le procédé consiste à mettre le substrat comprenant la région de séparation dans un mélange d'acide sulfurique et de peroxyde d'hydrogène dans un contenant en quartz non chauffé. Dans un mode de réalisation spécifique, le mélange présente une pureté en oligo-éléments qui est inférieure à 10 parties par milliard. Dans un mode de réalisation spécifique, le procédé consiste à nettoyer la région de surface du substrat à l'aide tout au moins du mélange d'acide sulfurique et de peroxyde d'hydrogène, tout en maintenant la température du mélange à environ 100 degrés Celsius et plus, puis à lier la région de surface à une région de surface de manipulation d'un substrat de manipulation pour provoquer la liaison de la région de surface à la région de surface de manipulation. Ce procédé permet d'enlever de l'épaisseur d'une matière au moyen d'un processus de séparation.
PCT/US2007/060800 2007-01-18 2007-01-25 Procédé et structure de nettoyage de surfaces utilisées pour lier des substrats de transfert de couches WO2008088559A1 (fr)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9640621B2 (en) 2012-06-29 2017-05-02 Corning Incorporated Glass-ceramic substrates for semiconductor processing
US20220177296A1 (en) * 2019-08-23 2022-06-09 Hewlett-Packard Development Company, L.P. Epitaxial-silicon wafer with a buried oxide layer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5300170A (en) * 1991-10-28 1994-04-05 Corning Incorporated Decal transfer process
US6294145B1 (en) * 1994-11-08 2001-09-25 Texas Instruments Incorporated Piranha etch preparation having long shelf life and method of making same
US20060205180A1 (en) * 2005-02-28 2006-09-14 Silicon Genesis Corporation Applications and equipment of substrate stiffness method and resulting devices for layer transfer processes on quartz or glass

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5300170A (en) * 1991-10-28 1994-04-05 Corning Incorporated Decal transfer process
US6294145B1 (en) * 1994-11-08 2001-09-25 Texas Instruments Incorporated Piranha etch preparation having long shelf life and method of making same
US20060205180A1 (en) * 2005-02-28 2006-09-14 Silicon Genesis Corporation Applications and equipment of substrate stiffness method and resulting devices for layer transfer processes on quartz or glass
US20060211219A1 (en) * 2005-02-28 2006-09-21 Silicon Genesis Corporation Substrate stiffness method and resulting devices for layer transfer process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9640621B2 (en) 2012-06-29 2017-05-02 Corning Incorporated Glass-ceramic substrates for semiconductor processing
US20220177296A1 (en) * 2019-08-23 2022-06-09 Hewlett-Packard Development Company, L.P. Epitaxial-silicon wafer with a buried oxide layer

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