WO2008044763A1 - Tab lead material and process for producing the same - Google Patents

Tab lead material and process for producing the same Download PDF

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Publication number
WO2008044763A1
WO2008044763A1 PCT/JP2007/069939 JP2007069939W WO2008044763A1 WO 2008044763 A1 WO2008044763 A1 WO 2008044763A1 JP 2007069939 W JP2007069939 W JP 2007069939W WO 2008044763 A1 WO2008044763 A1 WO 2008044763A1
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WO
WIPO (PCT)
Prior art keywords
tab lead
lead material
film
plating
nickel plating
Prior art date
Application number
PCT/JP2007/069939
Other languages
French (fr)
Japanese (ja)
Inventor
Satoshi Yamazaki
Ikuo Tabata
Original Assignee
Kyoritsu Chemical & Co., Ltd.
Nets Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyoritsu Chemical & Co., Ltd., Nets Co., Ltd. filed Critical Kyoritsu Chemical & Co., Ltd.
Publication of WO2008044763A1 publication Critical patent/WO2008044763A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/008Terminals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/50Current conducting connections for cells or batteries
    • H01M50/531Electrode connections inside a battery casing
    • H01M50/534Electrode connections inside a battery casing characterised by the material of the leads or tabs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M50/00Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
    • H01M50/50Current conducting connections for cells or batteries
    • H01M50/531Electrode connections inside a battery casing
    • H01M50/536Electrode connections inside a battery casing characterised by the method of fixing the leads to the electrodes, e.g. by welding
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T10/00Road transport of goods or passengers
    • Y02T10/60Other road transportation technologies with climate change mitigation effect
    • Y02T10/70Energy storage systems for electromobility, e.g. batteries

Definitions

  • the present invention relates to a tab lead material and a manufacturing method thereof, and more particularly to a tab lead material suitable for use in a nonaqueous electrolyte battery or a capacitor and a manufacturing method thereof.
  • a film-like positive electrode and a negative electrode are opposed to each other via a separator, and a non-aqueous electrolyte is interposed therebetween to transmit lithium ions to enable charging / discharging.
  • These power generation elements are covered with a highly airtight exterior material, and electricity can be taken out from the negative electrode and the positive electrode by a tab lead material (see Patent Document 1). .
  • lithium-based nonaqueous electrolyte batteries contain a fluorine atom such as LiPF.
  • Lithium salt dissolved in the organic solvent is used as an electrolyte.
  • this fluorine-containing electrolyte such as LiPF chemically decomposes and generates HF when it comes into contact with water.
  • This HF is a highly corrosive substance, which erodes the metal such as aluminum that constitutes the tab lead material and reduces the adhesive strength with the insulating film adhered to the surface, causing peeling. It was.
  • the above-mentioned problem is a problem in a film exterior type non-aqueous electrolyte battery. It is used in an extremely severe situation because it is used in an automobile, and moreover in a vibration or temperature environment. Therefore, there is a strong demand for the solution of the above problems.
  • Patent Document 1 JP-A-11 224652
  • the present invention was made to eliminate the drawbacks of the prior art in the tab lead material.
  • the tab lead material made of a thin metal plate material is used in a laminate package type battery or capacitor, this tab lead material is used.
  • the purpose is to improve the reliability of the battery or capacitor by improving the adhesion between the film and the film material adhered to it.
  • a first aspect of the present invention is a tab lead material comprising a thin metal plate and a nickel sulfamate coating formed on the surface thereof.
  • a thin metal plate a nickel sulfamate sulfamate coating formed on the surface thereof, and a polymer film including chitosan or a derivative thereof formed on the surface thereof. I prefer to do it.
  • the metal thin plate is preferably subjected to heat treatment.
  • the thickness of the plating film is preferably 1. O ⁇ m or more and 3.0 m or less, and a nickel plating film is preferably formed on the entire surface of the metal thin plate.
  • the metal it is possible to use the same or an anorium.
  • the second aspect of the present invention includes a step of applying nickel sulfamate plating to the surface of a metal thin plate, and a step of forming a primer film containing chitosan or a derivative thereof on the surface of the plating film. This is a method for producing a tab lead material.
  • the metal thin plate is annealed.
  • the annealing treatment may be performed after the nickel plating treatment.
  • the chemical resistance of the tab lead material using the metal thin plate is improved by applying nickel sulfamate to the surface of the metal thin plate.
  • the surface By forming the limer layer, the adhesiveness with the plastic film heat-sealed to the surface is improved and the reliability is improved.
  • FIG. 1 is a cross-sectional view of a tab lead material of the present invention.
  • FIG. 1 A cross-sectional view of the tab lead material of the present embodiment is shown in FIG.
  • this tab lead material 10 has a nickel sulfamate plating layer 12 formed on the surface of a thin metal plate 11, and a primer layer 13 containing chitosan or a derivative thereof is formed on the surface. It is.
  • the tab lead material will be described below.
  • the metal thin plate forming the tab lead material of the present embodiment copper or aluminum is suitable because of its electrical conductivity.
  • copper material rolled oxygen-free copper is preferable.
  • the metal thin plate may be a metal foil made of these alone, or a laminated thin plate with these materials or other metal materials! /.
  • the metal sheet material is preferably subjected to annealing treatment. This will be described later.
  • the thickness is preferably in the range of 0.;! To 0.5 mm.
  • the width is preferably 10 to 100 mm and the length is 40 to 100 mm.
  • matte nickel plating is applied to the surface of the thin metal plate. This can improve the chemical resistance of the tab lead material, particularly the resistance to hydrogen fluoride, which is expected to occur in the electrolyte solution in a non-aqueous electrolyte battery.
  • a method for forming a dull nickel plating film a plating method using a known dull nickel plating bath such as a nickel sulfamate plating bath or a Watt bath can be adopted, but the stress of the nickel plating film is 1 to A method of forming a film of about 7 kg ⁇ mm 2 is preferable. Matte nickel plating means that the fineness of the crystal of the coating film is normal in nickel plating. Without adding brighteners such as aromatic sulfonates, aromatic sulfonamides, aromatic sulfonimides, aldehydes, aryl compounds, acetylene compound nitriles, etc. It is a method of applying a texture.
  • the nickel plating film to be formed has low stress and excellent flexibility, and the nickel plating film can be prevented from being damaged when the electrode is formed by press molding at the time of assembling a battery or the like. In addition, handling during use of the battery becomes easy.
  • a general nickel plating (glossy plating) cannot be used because it cracks when a metal sheet with a hard coating is bent at an angle of 180 degrees.
  • 0.2 mmt x 8 mm wide x 60 mm long lead material with electroless Ni plating will crack once and will not withstand actual use.
  • the nickel plating film formed by the nickel sulfamate plating method did not generate cracks even if it was bent four times by the same method (partial cracks occurred at the fifth time).
  • the tab lead material of the present invention it is indispensable to bend the terminal lead when assembling a battery or the like, and a material that is predicted to generate cracks cannot withstand actual use and cannot be used.
  • the thickness of the nickel plating film of the present embodiment is preferably in the range of 1.0 ⁇ m to 3.0 ⁇ m. If the thickness of the nickel plating film falls below this range, the surface of the thin metal sheet will be exposed due to scratching of the plating film when handling the tab coating material with the coating film, and the chemical resistance of the tab lead material will be greatly increased. The reliability of the battery or capacitor decreases. On the other hand, in order to make the thickness of the nickel plating film beyond this range, only a long time is required for the plating, and no improvement in characteristics corresponding to this is seen, which is economically disadvantageous. A more preferable range of the thickness of the plating film is 2.0 ⁇ 2.5 to 01.
  • the nickel plating film may be a single film! /, But it can also be formed into a multilayer plating film by a plurality of plating processes. This makes it possible to obtain a reliable film free from defects such as pinholes in the plating film.
  • the surface of the nickel sulfamate coating should be coated with other metal materials such as gold, silver, and cobalt to form a multilayer film. You can also.
  • the thickness of each plating layer is not particularly limited, as long as the entire multilayer plating film can sufficiently cover the entire surface of the thin metal sheet.
  • the total film thickness is preferably the same as that of a single film.
  • the nickel plating film is preferably formed on the entire surface of the thin metal plate. That is, it is preferable to form a textured film not only on the main surface but also on the side surfaces of the thin plate.
  • a primer (primer) film is formed on the surface of the tab lead material of the present invention in order to improve the adhesion with the insulating film adhered to the surface.
  • This primer is made of a material composed of chitosan or a derivative thereof described in detail below.
  • the thickness of the primer is preferably about 2001 111 to 5 111.
  • the thickness force is less than 200 nm, the force S for improving the adhesiveness between the tab lead material and the insulating film on the surface cannot be achieved, and it is easily peeled off.
  • the film thickness exceeds ⁇ , if a force for peeling the tab lead material and the insulating film is applied, the primer itself causes cohesive failure and breaks, so that the adhesive strength decreases.
  • Chitosan the main component of this primer, is chicken, which is a naturally occurring polymer obtained from shells or mushrooms such as shrimp, shrimp and insects, ie, / 3-polypolyacetyl-D-darcosamine It is a substance obtained by deacetylation and is a polysaccharide containing an amino group with 2-amino-2-deoxy-D-glucose as a structural unit. It is a material that forms a salt with various acids and becomes cationic when dissolved in water. is there. Since it is a compound having such a high reactivity, it is possible to adhere to both surfaces of the hydrophilic material surface and the hydrophobic material surface!
  • Chitosan or a derivative thereof used in the present invention may be a polymer substance composed of only 2-amino-2-deoxy D-glucose, or a co-polymer in which this is polymerized with other glucose. They can be combined. Further, it may be a derivative in which another substituent is introduced into a part of the functional group of glucosamine constituting this polymer. Specifically, those represented by the following chemical formula can be used. [0024] [Chemical 1]
  • R -CH 2 — CH— CH 2 — OH or ⁇
  • Such chitosan is produced industrially, is supplied in various grades, and is commercially available.
  • chitosan and derivatives thereof having a degree of deacetylation of 80% or more are suitable.
  • the degree of deacetylation is lower than the above range, it is difficult to dissolve in water because it dissolves in water to form an aqueous solution, which is inappropriate for the present invention.
  • the weight average molecular weight is more preferably in the range of 10,000 to 1,000,000, preferably 1,000 to 2,000,000. If the molecular weight is below this range, it is inappropriate for use in the present invention in terms of forming a film of the adhesive layer. On the other hand, if the molecular weight exceeds this range, the viscosity of the solution becomes too high. In view of handling such as workability, it is inappropriate for use in the present invention.
  • Preferred chitosan derivatives include chitosan, chitosan pyrrolidone carboxylate, hydroxypropyl chitosan, glycerylated chitosan, cationized chitosan, chitosan lactate, chitosan adipate, etc. It is preferable that the chitosan derivative further contains an organic compound having at least one carboxyl group in the molecule.
  • the tab lead material of the present embodiment is provided with a nickel plating process on the surface of the metal thin plate, and can be performed by adding a subsequent primer film forming process.
  • Nickel plating is applied to the surface of the thin metal plate constituting the tab lead material.
  • This metal thin plate is preferably annealed. This annealing process will be described later.
  • the nickel plating treatment of the present embodiment is preferably performed by the electrolytic plating using a nickel sulfamate plating bath, in addition to the ability of the resulting coating film to have low stress and flexibility.
  • An example of the composition of the nickel sulfamate plating bath used in the present embodiment is shown.
  • NiCl6 ⁇ O 10-50g / 1
  • the conditions for performing nickel sulfamate plating can be appropriately determined according to the composition of the plating solution used, but in the case of the nickel sulfamate plating bath described above, the liquid temperature is 30 to 60 °. C, Cathode current density 0.;! ⁇ 50A / dm 2 , preferably liquid temperature 50 ⁇ 60 ° C, Cathode current density 0.4 ⁇ ; lOA / dm 2
  • a primer film is formed on the surface of the thin metal plate subjected to the nickel plating.
  • This primer film improves the adhesion between the metal thin plate and the film disposed on the surface thereof.
  • a primer containing chitosan or a derivative thereof is used as the primer layer material. Use.
  • This primer is preferably used as an aqueous solution of the aforementioned chitosan or a derivative thereof, or an organic solvent solution.
  • the concentration is preferably in the range of 0.;! To 20% by mass.
  • concentration of chitosans is less than 0.1% by mass, the effect of improving adhesiveness is improved. It is not practical.
  • concentration of chitosan exceeds the above range, the viscosity of the chitosan solution increases and handling becomes difficult.
  • this primer includes an organic compound having at least one carboxyl group in the molecule, a trivalent chelate-forming metal compound, a rheo-mouth property improving agent, and a xotropy improving agent. It is possible to use additives such as oxidants and antioxidants in combination. In particular, when a chelate-forming compound is used in combination, a chelate compound is formed together with the amino group of chitosan, and the film formability is improved.
  • Formation of this primer film is preferably carried out by immersing a metal thin plate in a primer solution and drying it.
  • the primer film is preferably formed on the surface and side surfaces of the metal thin plate.
  • the metal thin plate used in the present invention may have high rigidity due to the effects of residual stress and the like due to various machining during the manufacturing process.
  • cracks may occur or break at the stage of handling.
  • the annealing treatment is a technique commonly known as annealing treatment, and is preferably performed in the range of 100 ° C to 500 ° C in an inert or reducing atmosphere.
  • the treatment time is related to the treatment temperature, it can usually be carried out in about 1 minute to 1 hour.
  • the tab lead material has improved chemical resistance to chemicals such as hydrofluoric acid, and the adhesiveness to a film or the like that is bonded to the surface by a method such as heat fusion is remarkably improved. Therefore, this tab lead material may come into contact with chemicals such as hydrofluoric acid, and is preferably applied to the field where it is used as an assembly with a film.
  • Such fields include, but are not limited to, non-aqueous electrolyte secondary batteries and non-aqueous electrolyte capacitors.
  • the tab lead material of the present invention is extremely excellent in adhesiveness, and can be used in HEVs (Hybrid Electric Vehicles) that can be used in harsh conditions. Suitable for use!
  • HEVs Hybrid Electric Vehicles
  • a plating treatment is performed at a bath temperature of 50 ° C. under a current density of 1 OA / dm 2 and a thickness of 1.
  • Three types of test samples were prepared with a coating film of O ⁇ m, 2. ,, m, and 3.0 ⁇ m.
  • a primer in which glyceryl chitosan was dissolved in water was applied to the surface of these test samples to a thickness of 1 ⁇ m or less, and dried to prepare a tab lead material sample.
  • a test sample was prepared by heat-sealing maleic anhydride-modified polypropylene phenolic (thickness 0.1 mm, width 10 mm, length 12 mm) on the surface of the obtained tab lead material sample.
  • a test sample as Comparative Example 1 was prepared in the same manner as in the above example, except that the nickel sulfamate plating treatment was not performed.
  • a test sample as Comparative Example 2 was prepared in the same manner as in the above example, except that the primer layer forming treatment containing chitosan or its derivative was not performed.
  • test sample to be used in Comparative Example 3 was prepared in the same manner except that the nickel sulfamate treatment and the primer layer formation treatment containing chitosan or its derivative were not affected. Created.
  • test samples prepared in the above Examples and Comparative Examples 1, 2, and 3 were immersed in 1% HF aqueous solution for 90 minutes, corrosiveness by HF, and reliability of film and tab material welding (hydrofluoric acid resistance test) Evaluated.
  • test piece of this example that had been subjected to the plating treatment and the primer treatment was The welded film with no discoloration due to oxidation did not peel off.
  • the copper material of Comparative Example 1 that was not subjected to the plating treatment was discolored to brown, and the film welding interface also peeled 4 to 6 mm from the welding part where the film edge was 10 mm.
  • Comparative Example 2 and Comparative Example 3 which are film-welded tabs that were not subjected to primer treatment, the PP film on which both were deposited all peeled off in 30 minutes.
  • the tab lead material used for HEV applications is important for improving Ni resistance and chemical resistance and adhesion by performing Ni plating and primer treatment. .

Abstract

A tab lead material which comprises a thin metal sheet material and which, when used in a laminate package type cell or capacitor, has improved adhesion to a film material to be bonded to this tab lead material. It is intended to thus heighten the reliability of the cell or capacitor. This tab lead material (10) comprises a thin metal sheet (11) and a nickel sulfamate deposit film (12) formed by plating on the surface thereof. It may further have, formed on the surface of the deposit film, a primer film (13) comprising chitosan or a derivative thereof. In this tab lead material, the thin metal sheet preferably is one which has undergone a heat treatment and the deposit film has a thickness of preferably 1.0-3.0 µm. The metal may be copper or aluminum.

Description

明 細 書  Specification
タブリード材及びその製造方法  Tab lead material and manufacturing method thereof
技術分野  Technical field
[0001] 本発明は、タブリード材及びその製造方法に関し、特に非水電解質電池もしくはキ ャパシタに用いるのに適したタブリード材及びその製造方法に関する。  TECHNICAL FIELD [0001] The present invention relates to a tab lead material and a manufacturing method thereof, and more particularly to a tab lead material suitable for use in a nonaqueous electrolyte battery or a capacitor and a manufacturing method thereof.
背景技術  Background art
[0002] 近年、自動車の排気ガスを低減化するために、駆動動力源として電池を利用した 自動車が検討されてレ、る。この電池としてはエネルギー容量が大きレ、ことが要求され 、このような電池としては、リチウム二次電池や燃料電池などが有力である。  In recent years, in order to reduce the exhaust gas of automobiles, automobiles using batteries as driving power sources have been studied. This battery is required to have a large energy capacity, and as such a battery, a lithium secondary battery, a fuel cell, or the like is prominent.
[0003] リチウム二次電池は、フィルム状の正極と負極がセパレータを介して相対しており、 その間に非水電解質が介在してリチウムイオンを伝達し充放電を可能にするもので ある。これらの発電要素は、気密性の高い外装材で被覆されており、そして、前記負 極および正極からは、タブリード材によって外部に電気を取り出すことができるように なっている(特許文献 1参照)。  [0003] In a lithium secondary battery, a film-like positive electrode and a negative electrode are opposed to each other via a separator, and a non-aqueous electrolyte is interposed therebetween to transmit lithium ions to enable charging / discharging. These power generation elements are covered with a highly airtight exterior material, and electricity can be taken out from the negative electrode and the positive electrode by a tab lead material (see Patent Document 1). .
[0004] この電池内部に収容されている電解質においては、主として炭酸塩系溶媒が電解 液の溶媒として用いられている力、このような溶媒が外装材から外部に漏出すると、 電池が機能しなくなるば力、りでなぐ材料によっては引火等のおそれがあり、好ましく ない。そのためには上記自動車用の電池の過酷な使用形態においても、上記電池 のタブリード材とこれと接触する部材との密封性の向上が強く求められている。  [0004] In the electrolyte accommodated in the battery, when the carbonate-based solvent is mainly used as a solvent for the electrolytic solution, and such a solvent leaks outside from the exterior material, the battery does not function. Depending on the power and the materials used, there is a risk of ignition, which is not preferable. For this purpose, even in the severe usage mode of the battery for automobiles, improvement in the sealing property between the tab lead material of the battery and the member in contact with the battery is strongly demanded.
[0005] さらに、リチウム系非水電解質電池においては、 LiPFのようなフッ素原子を含有し  [0005] Furthermore, lithium-based nonaqueous electrolyte batteries contain a fluorine atom such as LiPF.
6  6
たリチウム塩が電解質として上記有機溶媒に溶解されて用いられている。ところで、こ の LiPFのようなフッ素含有電解質は、水と接触すると、化学的に分解し、 HFを発生 Lithium salt dissolved in the organic solvent is used as an electrolyte. By the way, this fluorine-containing electrolyte such as LiPF chemically decomposes and generates HF when it comes into contact with water.
6 6
する。この HFは、極めて腐食性の強い物質であり、タブリード材を構成しているアル ミニゥムなどの金属を浸食し、その表面に接着している絶縁フィルムとの接着力を低 下させ、剥離の原因となっていた。  To do. This HF is a highly corrosive substance, which erodes the metal such as aluminum that constitutes the tab lead material and reduces the adhesive strength with the insulating film adhered to the surface, causing peeling. It was.
[0006] 上記課題は、フィルム外装型の非水電解液電池における課題である力 自動車の 用途にぉレ、ては、振動あるいは温度環境にぉレ、てきわめて過酷な状況で用いられる ことから、上記課題の解決を強く要求されている。 [0006] The above-mentioned problem is a problem in a film exterior type non-aqueous electrolyte battery. It is used in an extremely severe situation because it is used in an automobile, and moreover in a vibration or temperature environment. Therefore, there is a strong demand for the solution of the above problems.
特許文献 1 :特開平 11 224652号公報  Patent Document 1: JP-A-11 224652
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0007] この発明は、前記タブリード材における従来技術の欠点を解消するためになされた もので、金属薄板材料からなるタブリード材をラミネートパッケージタイプの電池ある いはキャパシタに用いる際に、このタブリード材とこれに接着されるフィルム材料との 接着性を改善して、電池あるいはキャパシタの信頼性を向上させることを目的として いる。 [0007] The present invention was made to eliminate the drawbacks of the prior art in the tab lead material. When the tab lead material made of a thin metal plate material is used in a laminate package type battery or capacitor, this tab lead material is used. The purpose is to improve the reliability of the battery or capacitor by improving the adhesion between the film and the film material adhered to it.
課題を解決するための手段  Means for solving the problem
[0008] 第 1の本発明は、金属薄板と、その表面に形成されたスルファミン酸ニッケルメツキ 被膜とを備えたことを特徴とするタブリード材である。 [0008] A first aspect of the present invention is a tab lead material comprising a thin metal plate and a nickel sulfamate coating formed on the surface thereof.
[0009] 第 1の本発明においては、金属薄板と、その表面に形成されたスルファミン酸ニッケ ノレメツキ被膜と、さらにその表面に形成されたキトサンもしくはその誘導体を含むブラ イマ一膜を備えたものとすることが好ましレ、。 [0009] In the first aspect of the present invention, there is provided a thin metal plate, a nickel sulfamate sulfamate coating formed on the surface thereof, and a polymer film including chitosan or a derivative thereof formed on the surface thereof. I prefer to do it.
[0010] 前記タブリード材において、前記金属薄板は、熱処理を施されたものであることが 好ましい。また、前記メツキ皮膜の厚さは、 1. O ^ m以上 3. 0 m以下であることが好 ましぐニッケルメツキ皮膜が、前記金属薄板の全表面に形成されていることが好まし い。前記金属としては、 同、もしくはァノレミニゥムを用いること力 Sできる。 [0010] In the tab lead material, the metal thin plate is preferably subjected to heat treatment. The thickness of the plating film is preferably 1. O ^ m or more and 3.0 m or less, and a nickel plating film is preferably formed on the entire surface of the metal thin plate. As the metal, it is possible to use the same or an anorium.
[0011] 第 2の本発明は、金属薄板の表面に、スルファミン酸ニッケルメツキを施す工程と、 前記メツキ皮膜の表面にキトサンもしくはその誘導体を含むプライマー膜を形成す る工程とを、備えたことを特徴とするタブリード材の製造方法である。 [0011] The second aspect of the present invention includes a step of applying nickel sulfamate plating to the surface of a metal thin plate, and a step of forming a primer film containing chitosan or a derivative thereof on the surface of the plating film. This is a method for producing a tab lead material.
[0012] 前記第 2の本発明において、前記金属薄板がァニール処理されたものであることが 好ましい。また、ァニール処理は、ニッケルメツキ処理を行った後、施してもよい。 発明の効果 [0012] In the second aspect of the present invention, it is preferable that the metal thin plate is annealed. The annealing treatment may be performed after the nickel plating treatment. The invention's effect
[0013] この発明によれば、金属薄板表面にスルファミン酸ニッケルメツキを施すことによつ て、この金属薄板を用いたタブリード材耐薬品性が改善される。また、その表面にプ ライマー層を形成することによって、その表面に熱融着されるプラスチックフィルムと の接着性が改善され、信頼性が向上する。 [0013] According to the present invention, the chemical resistance of the tab lead material using the metal thin plate is improved by applying nickel sulfamate to the surface of the metal thin plate. In addition, the surface By forming the limer layer, the adhesiveness with the plastic film heat-sealed to the surface is improved and the reliability is improved.
図面の簡単な説明  Brief Description of Drawings
[0014] [図 1]本発明のタブリード材の断面図である。 FIG. 1 is a cross-sectional view of a tab lead material of the present invention.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0015] [第 1の実施の形態:タブリード材] [0015] [First embodiment: Tab lead material]
本実施の形態のタブリード材の断面図を図 1に示す。  A cross-sectional view of the tab lead material of the present embodiment is shown in FIG.
図 1に見られるように、このタブリード材 10は、金属薄板 11の表面に、スルファミン酸 ニッケルメツキ層 12が形成され、その表面にキトサンもしくはその誘導体を含むプライ マー層 13が形成されているものである。以下このタブリード材について説明する。  As shown in FIG. 1, this tab lead material 10 has a nickel sulfamate plating layer 12 formed on the surface of a thin metal plate 11, and a primer layer 13 containing chitosan or a derivative thereof is formed on the surface. It is. The tab lead material will be described below.
[0016] (金属薄板) [0016] (Metal sheet)
本実施の形態のタブリード材を形成する金属薄板としては、その電気伝導性から、 銅もしくはアルミニウムが適している。銅材料としては、圧延無酸素銅が好ましい。 この金属薄板としては、これらの単独からなる金属箔でもよいし、これらの材料もしく はその他の金属材料との積層薄板であってもよ!/、。  As the metal thin plate forming the tab lead material of the present embodiment, copper or aluminum is suitable because of its electrical conductivity. As the copper material, rolled oxygen-free copper is preferable. The metal thin plate may be a metal foil made of these alone, or a laminated thin plate with these materials or other metal materials! /.
この金属薄板材としては、ァニール処理を施したものであることが好ましい。これに ついては後述する。  The metal sheet material is preferably subjected to annealing treatment. This will be described later.
金属薄板材は、タブリード材として用いることから、厚さ 0.;!〜 0. 5mmの範囲が好 ましい。また、その巾は、 10〜; 100mm、長さは 40〜100mmの範囲のものが好まし い。  Since the metal sheet material is used as a tab lead material, the thickness is preferably in the range of 0.;! To 0.5 mm. The width is preferably 10 to 100 mm and the length is 40 to 100 mm.
[0017] (無光沢ニッケルメツキ皮膜)  [0017] (matte nickel plating film)
本実施の形態において、上記金属薄板表面に無光沢ニッケルメツキを施す。これ によって、タブリード材の耐薬品性、特に、非水電解質電池において電解液中に発 生することが予測されるフッ化水素に対する耐性を向上させることができる。  In this embodiment, matte nickel plating is applied to the surface of the thin metal plate. This can improve the chemical resistance of the tab lead material, particularly the resistance to hydrogen fluoride, which is expected to occur in the electrolyte solution in a non-aqueous electrolyte battery.
[0018] 無光沢ニッケルメツキ皮膜形成方法としては、スルファミン酸ニッケルメツキ浴、ワット 浴など公知の無光沢ニッケルメツキ浴を用いたメツキ方法を採用することができるが、 ニッケルメツキ被膜の応力が 1〜 7kg · mm2程度の被膜を形成する方法が好ましい。 無光沢ニッケルメツキとは、通常ニッケルメツキにおいて、メツキ被膜の結晶を微細化 して光沢を付与するために用いている芳香族スルホン酸塩類、芳香族スルホンアミド 類、芳香族スルホンイミド類、アルデヒド類、ァリル化合物、アセチレン化合物二トリル 類などの光沢剤を添加せずにニッケルメツキを施す方法である。 [0018] As a method for forming a dull nickel plating film, a plating method using a known dull nickel plating bath such as a nickel sulfamate plating bath or a Watt bath can be adopted, but the stress of the nickel plating film is 1 to A method of forming a film of about 7 kg · mm 2 is preferable. Matte nickel plating means that the fineness of the crystal of the coating film is normal in nickel plating. Without adding brighteners such as aromatic sulfonates, aromatic sulfonamides, aromatic sulfonimides, aldehydes, aryl compounds, acetylene compound nitriles, etc. It is a method of applying a texture.
このようなメツキ方法としては、スルファミン酸ニッケルメツキ浴を用いた電解メツキが 好ましい。この方法によれば、形成されるニッケルメツキ皮膜が低応力となり柔軟性に 優れ、電池などの組み立て時のプレス成形などで電極を成形する際にニッケルメツキ 皮膜の破損を防ぐことができる。また、電池などの使用時における取り扱いが容易に なる。  As such a plating method, electrolytic plating using a nickel sulfamate plating bath is preferred. According to this method, the nickel plating film to be formed has low stress and excellent flexibility, and the nickel plating film can be prevented from being damaged when the electrode is formed by press molding at the time of assembling a battery or the like. In addition, handling during use of the battery becomes easy.
すなわち、一般のニッケルメツキ(光沢メツキ)は、硬ぐメツキ被膜を形成した金属薄 板を 180度の角度で折り曲げるとクラックが発生し、使用することができない。また、無 電解 Niメツキを施した 0. 2mmt X 8mm巾 X 60mm長のリード材は、 180度折り曲げ ると、 1回でクラックが発生しこれも実使用に耐えない。一方、スルファミン酸ニッケル メツキ法によって形成したニッケルメツキ皮膜は、同様の方法で、 4回折り曲げてもクラ ックの発生は、生じなかった(5回目で一部クラックが発生した)。  In other words, a general nickel plating (glossy plating) cannot be used because it cracks when a metal sheet with a hard coating is bent at an angle of 180 degrees. In addition, 0.2 mmt x 8 mm wide x 60 mm long lead material with electroless Ni plating will crack once and will not withstand actual use. On the other hand, the nickel plating film formed by the nickel sulfamate plating method did not generate cracks even if it was bent four times by the same method (partial cracks occurred at the fifth time).
本発明のタブリード材は、電池などの組み立て時には端子リードを折り曲げることが 不可欠で、クラックの発生が予測される材料は、実使用には耐えられず、使用するこ とができないものである。  In the tab lead material of the present invention, it is indispensable to bend the terminal lead when assembling a battery or the like, and a material that is predicted to generate cracks cannot withstand actual use and cannot be used.
[0019] 本実施の形態のニッケルメツキ皮膜の膜厚は 1. 0 μ m〜3. 0 μ mの範囲が好ましい 。ニッケルメツキ皮膜の膜厚がこの範囲を下回ると、メツキ被膜を施したタブリード材の 取り扱いにおいて、メツキ被膜にキズがっくことによって金属薄板の表面が露出しや すぐタブリード材の耐薬品性が大幅に低下し、電池あるいはキャパシタの信頼性が 低下する。一方、ニッケルメツキ被膜の膜厚をこの範囲を超える膜厚とするためには、 メツキに長時間を要するのみで、これに見合う特性の向上が見られず、経済的に不 利である。メツキ被膜の膜厚のより好ましい範囲は、 2· 0〜2. 5 01である。  [0019] The thickness of the nickel plating film of the present embodiment is preferably in the range of 1.0 μm to 3.0 μm. If the thickness of the nickel plating film falls below this range, the surface of the thin metal sheet will be exposed due to scratching of the plating film when handling the tab coating material with the coating film, and the chemical resistance of the tab lead material will be greatly increased. The reliability of the battery or capacitor decreases. On the other hand, in order to make the thickness of the nickel plating film beyond this range, only a long time is required for the plating, and no improvement in characteristics corresponding to this is seen, which is economically disadvantageous. A more preferable range of the thickness of the plating film is 2.0 · 2.5 to 01.
[0020] また、上記ニッケルメツキ被膜は、単一の膜であってもよ!/、が、複数回のメツキ処理 によって、多層のメツキ皮膜とすることもできる。これによつて、メツキ皮膜にピンホー ル等の欠陥のない信頼性のある膜とすることができる。また、スルファミン酸ニッケルメ ツキの皮膜表面に、金、銀、コバルトなど他の金属材料をメツキして多層膜とすること もできる。 [0020] The nickel plating film may be a single film! /, But it can also be formed into a multilayer plating film by a plurality of plating processes. This makes it possible to obtain a reliable film free from defects such as pinholes in the plating film. In addition, the surface of the nickel sulfamate coating should be coated with other metal materials such as gold, silver, and cobalt to form a multilayer film. You can also.
多層メツキ皮膜を形成する場合にも、各メツキ層の膜厚については特に限定はなく 、多層メツキ皮膜全体として金属薄板全表面を十分に被覆できる厚さであればょレ、。 多層メツキの場合、合計膜厚は、単独被膜と同等の膜厚とすることが好ましい。  Even when forming a multilayer plating film, the thickness of each plating layer is not particularly limited, as long as the entire multilayer plating film can sufficiently cover the entire surface of the thin metal sheet. In the case of multilayer plating, the total film thickness is preferably the same as that of a single film.
ニッケルメツキ被膜は、金属薄板の全表面に形成することが好ましい。すなわち、主 表面のみならず、薄板の側面にもメツキ被膜を形成することが好ましい。  The nickel plating film is preferably formed on the entire surface of the thin metal plate. That is, it is preferable to form a textured film not only on the main surface but also on the side surfaces of the thin plate.
[0021] (プライマー膜) [0021] (Primer film)
本発明のタブリード材表面には、その表面に接着する絶縁フィルムとの接着性を向 上させるために、プライマー(下塗り剤)膜が形成されている。このプライマーは、下記 に詳述する力、キトサンもしくはその誘導体からなる材料で形成する。  A primer (primer) film is formed on the surface of the tab lead material of the present invention in order to improve the adhesion with the insulating film adhered to the surface. This primer is made of a material composed of chitosan or a derivative thereof described in detail below.
上記プライマーの膜厚は、 2001 111〜5 111程度であることが好ましい。この厚さ力 200nmを下回ると、タブリード材と、その表面の絶縁フィルムとの接着性を向上させ ること力 Sできず、容易に剥離してしまう。一方、膜厚が δ πιを越えると、タブリード材と 絶縁フィルムとを剥離する力をかけると、プライマー自体が凝集破壊を生起し破断し てしまうため、却って接着強度が低下する。  The thickness of the primer is preferably about 2001 111 to 5 111. When the thickness force is less than 200 nm, the force S for improving the adhesiveness between the tab lead material and the insulating film on the surface cannot be achieved, and it is easily peeled off. On the other hand, when the film thickness exceeds δπι, if a force for peeling the tab lead material and the insulating film is applied, the primer itself causes cohesive failure and breaks, so that the adhesive strength decreases.
[0022] (プライマー材料) [0022] (Primer material)
このプライマーの主成分であるキトサンは、力二、ェビ、昆虫などの甲殻あるいはキ ノコなどから得られる天然由来の高分子物質であるチキン、すなわち /3—ポリ Ν— ァセチル -D-ダルコサミンを脱ァセチル化して得られる物質であり、 2—アミノー 2 ーデォキシー D グルコースを構成単位とするアミノ基を含む多糖類であり、各種の 酸と塩を形成し、水に溶解するとカチオン性を示す材料である。このように高い反応 性を有する化合物であるところから、親水性材料表面および疎水性材料表面の!/、ず れの面とも接着が可能である。  Chitosan, the main component of this primer, is chicken, which is a naturally occurring polymer obtained from shells or mushrooms such as shrimp, shrimp and insects, ie, / 3-polypolyacetyl-D-darcosamine It is a substance obtained by deacetylation and is a polysaccharide containing an amino group with 2-amino-2-deoxy-D-glucose as a structural unit. It is a material that forms a salt with various acids and becomes cationic when dissolved in water. is there. Since it is a compound having such a high reactivity, it is possible to adhere to both surfaces of the hydrophilic material surface and the hydrophobic material surface!
[0023] 本発明において用いるキトサンもしくはその誘導体は、この 2—アミノー 2—デォキ シ D—グルコースのみからなる高分子物質であってもよいし、これと他のグルコース とが重合している共重合体であっても差し支えない。また、この重合体を構成するグ ルコサミンの官能基の一部に他の置換基を導入した誘導体であってもよい。具体的 には、下記化学式で表されるものを用いることができる。 [0024] [化 1] [0023] Chitosan or a derivative thereof used in the present invention may be a polymer substance composed of only 2-amino-2-deoxy D-glucose, or a co-polymer in which this is polymerized with other glucose. They can be combined. Further, it may be a derivative in which another substituent is introduced into a part of the functional group of glucosamine constituting this polymer. Specifically, those represented by the following chemical formula can be used. [0024] [Chemical 1]
Figure imgf000008_0001
Figure imgf000008_0001
R= -CH2— CH— CH2— OH or Π R = -CH 2 — CH— CH 2 — OH or Π
OH  OH
[0025] このようなキトサンは、工業的に生産されていて、種々のグレードのものが供給され ており、市場で入手可能である。 [0025] Such chitosan is produced industrially, is supplied in various grades, and is commercially available.
本発明においては、キトサンおよびその誘導体としては、脱ァセチル化度 80%以 上のものが適している。脱ァセチル化度が、前記範囲を下回った場合、水に溶解し て水溶液とする点で、水に溶解しにくくなり、本発明には不適切である。  In the present invention, chitosan and derivatives thereof having a degree of deacetylation of 80% or more are suitable. When the degree of deacetylation is lower than the above range, it is difficult to dissolve in water because it dissolves in water to form an aqueous solution, which is inappropriate for the present invention.
また、重量平均分子量は、 1000以上〜 200万以下が好ましぐ 1万〜 100万の範 囲であることがより好ましい。分子量が、この範囲を下回った場合、接着層の皮膜形 成の点で本発明で用いるには不適切であり、一方、分子量が、この範囲を上回った 場合、溶液の粘度が高くなりすぎるため、作業性などの取り扱い上の点で本発明で 用いるには不適切である。  The weight average molecular weight is more preferably in the range of 10,000 to 1,000,000, preferably 1,000 to 2,000,000. If the molecular weight is below this range, it is inappropriate for use in the present invention in terms of forming a film of the adhesive layer. On the other hand, if the molecular weight exceeds this range, the viscosity of the solution becomes too high. In view of handling such as workability, it is inappropriate for use in the present invention.
前記キトサンの誘導体としては、キトサン、キトサンのピロリドンカルボン酸塩、ヒドロ キシプロピルキトサン、グリセリル化キトサン、カチオン化キトサン、キトサン乳酸塩、キ トサンアジピン酸塩などが好ましく、プライマーとして使用するには、これらキトサンの 誘導体に、さらに分子内にカルボキシル基を少なくとも 1個有する有機化合物を含有 することが好ましい。  Preferred chitosan derivatives include chitosan, chitosan pyrrolidone carboxylate, hydroxypropyl chitosan, glycerylated chitosan, cationized chitosan, chitosan lactate, chitosan adipate, etc. It is preferable that the chitosan derivative further contains an organic compound having at least one carboxyl group in the molecule.
[0026] 上記プライマーは、上記範囲の厚さで使用する限り、タブリード材表面に形成しても はんだ付け性を損なうことがないため、電気的接続に簡便なはんだ付け法を採用す ること力 Sでき、有利である。  [0026] As long as the primer is used in a thickness within the above range, it does not impair the solderability even if it is formed on the surface of the tab lead material. Therefore, it is possible to employ a simple soldering method for electrical connection. S can be advantageous.
[0027] [第 2の実施の形態:タブリード材の製造方法]  [Second Embodiment: Method for Manufacturing Tab Lead Material]
以下本実施の形態のタブリード材の製造方法について、製造工程を追って説明す る。本実施のタブリード材は、金属薄板表面へのニッケルメツキ工程を備えたもので あり、その後のプライマー膜形成工程を付加して実施することもできる。 Hereinafter, the manufacturing method of the tab lead material of the present embodiment will be described in accordance with the manufacturing process. The The tab lead material of the present embodiment is provided with a nickel plating process on the surface of the metal thin plate, and can be performed by adding a subsequent primer film forming process.
[0028] (ニッケルメツキ工程) [0028] (Nickel plating process)
[0029] タブリード材を構成する金属薄板の表面にニッケルメツキを施す。この金属薄板は、 ァニール処理されたものであることが好ましい。このァニール処理については、後述 する。  [0029] Nickel plating is applied to the surface of the thin metal plate constituting the tab lead material. This metal thin plate is preferably annealed. This annealing process will be described later.
[0030] 本実施の形態のニッケルメツキ処理は、得られるメツキ被膜が低応力で柔軟性があ ること力、ら、スルファミン酸ニッケルメツキ浴を用いた電解メツキで行うことが好ましい。 本実施の形態で使用するスルファミン酸ニッケルメツキ浴の組成の一例を示す。  [0030] The nickel plating treatment of the present embodiment is preferably performed by the electrolytic plating using a nickel sulfamate plating bath, in addition to the ability of the resulting coating film to have low stress and flexibility. An example of the composition of the nickel sulfamate plating bath used in the present embodiment is shown.
Ni (NH SO ) ·4Η O : 250〜780g/1  Ni (NH SO) 4Η O: 250 ~ 780g / 1
2 3 2 2  2 3 2 2
NiCl · 6Η O : 10〜50g/1  NiCl6Η O: 10-50g / 1
2 2  twenty two
H BO : 30〜60g/l  H BO: 30-60g / l
3 3  3 3
高級アルコール系界面活性剤: 1〜; 10ml/l  Higher alcohol surfactant: 1 to 10ml / l
これらの成分を水、より好ましくは、純水に溶解してメツキ浴を構成する。  These components are dissolved in water, more preferably pure water, to constitute a plating bath.
[0031] スルファミン酸ニッケルメツキを行う条件については、使用するメツキ液の組成に応 じて、適宜決定することができるが、前述のスルファミン酸ニッケルメツキ浴の場合に は、液温 30〜60°C程度、陰極電流密度 0. ;!〜 50A/dm2程度、好ましくは液温 50 〜60°C程度、陰極電流密度 0. 4〜; lOA/dm2程度とすればよい。 [0031] The conditions for performing nickel sulfamate plating can be appropriately determined according to the composition of the plating solution used, but in the case of the nickel sulfamate plating bath described above, the liquid temperature is 30 to 60 °. C, Cathode current density 0.;! ~ 50A / dm 2 , preferably liquid temperature 50 ~ 60 ° C, Cathode current density 0.4 ~; lOA / dm 2
[0032] 金属薄板表面に、上記メツキ皮膜を形成する前に、金属薄板表面を公知の方法に よって脱脂、酸洗等の前処理を行なうことが好ましレ、。 [0032] Prior to the formation of the coating film on the surface of the thin metal plate, it is preferable to perform pretreatment such as degreasing and pickling on the surface of the thin metal plate by a known method.
[0033] (プライマー膜形成工程) [0033] (Primer film forming step)
次いで、上記ニッケルメツキを施した金属薄板表面に、プライマー膜を形成する。こ のプライマー膜は、金属薄板と、その表面に配置するフィルムとの接着性を向上させ るものであり、本実施の形態においては、プライマー層材料として、キトサンもしくはそ の誘導体を含有するプライマーを用いる。  Next, a primer film is formed on the surface of the thin metal plate subjected to the nickel plating. This primer film improves the adhesion between the metal thin plate and the film disposed on the surface thereof. In this embodiment, a primer containing chitosan or a derivative thereof is used as the primer layer material. Use.
このプライマーとしては、前述したキトサンもしくはその誘導体の水溶液、あるいは 有機溶剤溶液として用いることが好ましい。その濃度は、 0. ;!〜 20質量%の範囲が 好ましい。キトサン類の濃度が、 0. 1質量%を下回ると、接着性改善の効果が上がら ず、実用的ではない。一方キトサン類の濃度が上記範囲を上回った場合、キトサン溶 液の粘度が上昇して取り扱いが困難になる。 This primer is preferably used as an aqueous solution of the aforementioned chitosan or a derivative thereof, or an organic solvent solution. The concentration is preferably in the range of 0.;! To 20% by mass. When the concentration of chitosans is less than 0.1% by mass, the effect of improving adhesiveness is improved. It is not practical. On the other hand, when the concentration of chitosan exceeds the above range, the viscosity of the chitosan solution increases and handling becomes difficult.
また、このプライマーとして、上記キトサン類に加えて、分子内にカルボキシル基を 少なくとも 1個有する有機化合物、 3価のキレート形成性金属化合物、レオ口ジー特 性改善剤げキソトロピー性改善剤)、防腐剤、酸化防止剤等の添加剤を併用するこ と力できる。特にキレート形成性化合物を併用することによって、キトサンが有するアミ ノ基とともにキレート化合物を形成し、成膜性が改善される。  In addition to the above chitosans, this primer includes an organic compound having at least one carboxyl group in the molecule, a trivalent chelate-forming metal compound, a rheo-mouth property improving agent, and a xotropy improving agent. It is possible to use additives such as oxidants and antioxidants in combination. In particular, when a chelate-forming compound is used in combination, a chelate compound is formed together with the amino group of chitosan, and the film formability is improved.
このプライマー膜の形成は、種々の方法を採用することができる力 特に、プライマ 一溶液中に金属薄板を浸漬し乾燥させることによって、行うことが好ましい。プライマ 一膜は、金属薄板の表面および側面に形成することが好ましい。  Formation of this primer film is preferably carried out by immersing a metal thin plate in a primer solution and drying it. The primer film is preferably formed on the surface and side surfaces of the metal thin plate.
[0034] (ァニール処理工程)  [0034] (Annealing process)
前述のように、本発明で用いる金属薄板は、その製造過程で、各種機械加工による 残留応力等の影響で、剛性が高い場合がある。このような金属薄板を用いると、その 取り扱いの段階で、クラックが発生したり割れたりすることがある。このような不具合を 解消するために、ァニール処理を施すことが好ましい。このァニール処理は、ニッケ ルメツキを施す前に行ってもよいし、ニッケルメツキを施した後、実施してもよい。  As described above, the metal thin plate used in the present invention may have high rigidity due to the effects of residual stress and the like due to various machining during the manufacturing process. When such a thin metal plate is used, cracks may occur or break at the stage of handling. In order to eliminate such problems, it is preferable to perform annealing. This annealing treatment may be performed before the nickel plating or after the nickel plating.
[0035] ァニール処理は、通常焼き鈍し処理として公知の技術であり、不活性又は還元性 雰囲気中で、 100°C〜500°Cの範囲で行うことが好ましい。処理時間は、処理温度と も関係があるが、通常 1分間乃至 1時間程度で行うことができる。  [0035] The annealing treatment is a technique commonly known as annealing treatment, and is preferably performed in the range of 100 ° C to 500 ° C in an inert or reducing atmosphere. Although the treatment time is related to the treatment temperature, it can usually be carried out in about 1 minute to 1 hour.
[0036] [タブリード材の用途]  [0036] [Use of tab lead material]
上記タブリード材は、フッ酸などの薬剤に対する耐薬品性が向上し、また、その表 面に熱融着などの方法によって接着されるフィルムなどとの接着性が顕著に改善さ れる。従って、このタブリード材は、フッ酸などの薬剤に接するおそれがあり、フィルム との接合体として用いられる分野に適用することが好ましい。このような分野としては、 特に限定されるものではないが、非水電解質二次電池や、非水電解質キャパシタな どが上げられる。  The tab lead material has improved chemical resistance to chemicals such as hydrofluoric acid, and the adhesiveness to a film or the like that is bonded to the surface by a method such as heat fusion is remarkably improved. Therefore, this tab lead material may come into contact with chemicals such as hydrofluoric acid, and is preferably applied to the field where it is used as an assembly with a film. Such fields include, but are not limited to, non-aqueous electrolyte secondary batteries and non-aqueous electrolyte capacitors.
特に、非水電解質二次電池として、本発明のタブリード材は、接着性にきわめて優 れており、過酷な状況での使用が考えられる HEV (Hybrid Electric Vehicle)に お!/、て用いるのに適して!/、る。 In particular, as a non-aqueous electrolyte secondary battery, the tab lead material of the present invention is extremely excellent in adhesiveness, and can be used in HEVs (Hybrid Electric Vehicles) that can be used in harsh conditions. Suitable for use!
実施例  Example
[0037] 以下、本発明の実施例について説明する。  Hereinafter, examples of the present invention will be described.
(実施例)  (Example)
厚さ 0. 2mm、巾 8. Omm、長さ 60mmの、ァニール処理を施した銅薄板を用意す る。これを、 Ni (NH SO ) ·4Η O : 500g/1、 NiCl · 6Η O : 30g/1、 H BO : 50g  Prepare an annealed copper sheet with a thickness of 0.2 mm, a width of 8. Omm, and a length of 60 mm. Ni (NH SO) 4Η O: 500g / 1, NiCl6Η O: 30g / 1, H BO: 50g
2 3 2 2 2 2 3 3 2 3 2 2 2 2 3 3
/1、及び高級アルコール系界面活性剤: 5ml/lの組成を有するメツキ浴を用いて、 浴温 50°Cで、電流密度 1 OA/dm2の条件で、メツキ処理し、厚さ 1. O ^ m, 2. Ο , m、及び 3· 0 mのメツキ被膜を有する 3種類のテストサンプルを作成した。 / 1, and higher alcohol surfactant: Using a plating bath having a composition of 5 ml / l, a plating treatment is performed at a bath temperature of 50 ° C. under a current density of 1 OA / dm 2 and a thickness of 1. Three types of test samples were prepared with a coating film of O ^ m, 2. ,, m, and 3.0 · m.
次いで、これらのテストサンプルの表面に、グリセリルキトサンを水に溶解したプライ マーを 1 μ m以下の厚さに塗布し、乾燥してタブリード材サンプルを作成した。  Next, a primer in which glyceryl chitosan was dissolved in water was applied to the surface of these test samples to a thickness of 1 μm or less, and dried to prepare a tab lead material sample.
得られたタブリード材サンプルの表面に、無水マレイン酸変性ポリプロピレンフィノレ ム(厚さ 0. lmm、巾 10mm、長さ 12mm)を熱融着して試験サンプルを作成した。  A test sample was prepared by heat-sealing maleic anhydride-modified polypropylene phenolic (thickness 0.1 mm, width 10 mm, length 12 mm) on the surface of the obtained tab lead material sample.
[0038] (比較例 1) [0038] (Comparative Example 1)
上記実施例において、スルファミン酸ニッケルメツキ処理を行わな力、つたこと以外は 、同様の方法で、比較例 1となる試験サンプルを作成した。  A test sample as Comparative Example 1 was prepared in the same manner as in the above example, except that the nickel sulfamate plating treatment was not performed.
[0039] (比較例 2) [0039] (Comparative Example 2)
上記実施例において、キトサンもしくはその誘導体を含むプライマー層形成処理を 行わな力、つたこと以外は、同様の方法で、比較例 2となる試験サンプルを作成した。  A test sample as Comparative Example 2 was prepared in the same manner as in the above example, except that the primer layer forming treatment containing chitosan or its derivative was not performed.
[0040] (比較例 3) [0040] (Comparative Example 3)
上記実施例において、スルファミン酸ニッケルメツキ処理、及びキトサンもしくはその 誘導体を含むプライマー層形成処理のレ、ずれも行わな力、つたこと以外は、同様の方 法で、比較例 3となる試験サンプルを作成した。  In the above examples, the test sample to be used in Comparative Example 3 was prepared in the same manner except that the nickel sulfamate treatment and the primer layer formation treatment containing chitosan or its derivative were not affected. Created.
[0041] (評価) [0041] (Evaluation)
上記実施例及び比較例 1、 2、 3で作成した試験サンプルを、 1 %の HF水溶液中に 90分間浸漬し、 HFによる腐食性、及びフィルムとタブ材の溶着信頼性(耐フッ酸性 テスト)を評価した。  The test samples prepared in the above Examples and Comparative Examples 1, 2, and 3 were immersed in 1% HF aqueous solution for 90 minutes, corrosiveness by HF, and reliability of film and tab material welding (hydrofluoric acid resistance test) Evaluated.
その結果、メツキ処理及びプライマー処理を施した本実施例の試験片は、表面の 酸化による変色がなぐ溶着したフィルムも剥離が生じなかった。 As a result, the test piece of this example that had been subjected to the plating treatment and the primer treatment was The welded film with no discoloration due to oxidation did not peel off.
一方、メツキ処理しない比較例 1の銅材は、表面が褐色に変色し、フィルム溶着界 面もフィルム端部が 10mmの溶着部分に対し、 4〜6mmの剥離を生じた。  On the other hand, the copper material of Comparative Example 1 that was not subjected to the plating treatment was discolored to brown, and the film welding interface also peeled 4 to 6 mm from the welding part where the film edge was 10 mm.
また、プライマー処理をしないフィルム溶着タブである比較例 2及び比較例 3は、い ずれも溶着した PPフィルムが 30分にてすベて剥離した。  In Comparative Example 2 and Comparative Example 3, which are film-welded tabs that were not subjected to primer treatment, the PP film on which both were deposited all peeled off in 30 minutes.
上記の結果から、金属薄板表面にスルファミン酸ニッケルメツキ被膜を形成すること によって、金属薄板の耐薬品性が改善され、さらにその表面にプライマー膜を形成 することによって接着性が改善されることが明らかとなった。  From the above results, it is clear that the chemical resistance of the metal thin plate is improved by forming a nickel sulfamate plating film on the surface of the metal thin plate, and the adhesion is improved by forming a primer film on the surface. It became.
この結果から、 HEV用途に用いるタブリード材、特に負極に用いるタブリード材に おいては、 Niメツキ及びプライマー処理を行うこと力 S、耐薬品性及び接着性向上にと つて重要であることが判明した。  From these results, it was found that the tab lead material used for HEV applications, particularly the tab lead material used for the negative electrode, is important for improving Ni resistance and chemical resistance and adhesion by performing Ni plating and primer treatment. .

Claims

請求の範囲 The scope of the claims
[I] 金属薄板と、その表面に形成された無光沢ニッケルメツキ被膜とを備えたことを特 徴とするタブリード材。  [I] A tab lead material characterized by comprising a thin metal plate and a matte nickel plating film formed on the surface thereof.
[2] 前記無光沢ニッケルメツキ被膜が、スルファミン酸ニッケルメツキ被膜であることを特 徴とする請求項 1に記載のタブリード材。  [2] The tab lead material according to [1], wherein the matte nickel plating film is a nickel sulfamate plating film.
[3] 金属薄板と、その表面に形成された無光沢ニッケルメツキ被膜と、さらにその表面に 形成されたキトサンもしくはその誘導体を含むプライマー膜を備えたことを特徴とする タブリード材。 [3] A tab lead material comprising a thin metal plate, a matte nickel plating film formed on the surface thereof, and a primer film containing chitosan or a derivative thereof formed on the surface thereof.
[4] 前記無光沢ニッケルメツキ被膜が、スルファミン酸ニッケルメツキ被膜であることを特 徴とする請求項 3に記載のタブリード材。  [4] The tab lead material according to [3], wherein the matte nickel plating film is a nickel sulfamate coating.
[5] 前記金属薄板が、熱処理を施されたものであることを特徴とする請求項 1または請 求項 3に記載のタブリード材。 [5] The tab lead material according to claim 1 or claim 3, wherein the metal thin plate is heat-treated.
[6] 前記メツキ皮膜の厚さ力 1. 0 m以上 3· 0 m以下であることを特徴とする請求 項 1に記載のタブリード材。 6. The tab lead material according to claim 1, wherein the thickness force of the plating film is 1.0 m or more and 3.0 m or less.
[7] 前記ニッケルメツキ皮膜が、前記金属薄板の全表面に形成されていることを特徴と する請求項 1に記載のタブリード材。 7. The tab lead material according to claim 1, wherein the nickel plating film is formed on the entire surface of the metal thin plate.
[8] 前記金属が、銅、もしくはアルミニウムであることを特徴とする請求項 1に記載のタブ リード材。 8. The tab lead material according to claim 1, wherein the metal is copper or aluminum.
[9] 金属薄板の表面に、無光沢ニッケルメツキを施す工程を備えたことを特徴とするタ ブリード材の製造方法。  [9] A method for producing a tab lead material, comprising a step of applying a matte nickel plating to the surface of a thin metal plate.
[10] 前記無光沢ニッケルメツキ力 スルファミン酸ニッケルメツキであることを特徴とする 請求項 9に記載のタブリード材の製造方法。 10. The method for producing a tab lead material according to claim 9, wherein the matte nickel plating strength is nickel sulfamate plating.
[I I] 金属薄板の表面に、無光沢ニッケルメツキを施す工程と、  [I I] A step of applying a matte nickel plating to the surface of a thin metal plate;
前記メツキ皮膜の表面にキトサンもしくはその誘導体を含むプライマー膜を形成す る工程とを、  Forming a primer film containing chitosan or a derivative thereof on the surface of the plating film,
備えたことを特徴とするタブリード材の製造方法。  A method for producing a tab lead material, comprising:
[12] 前記無光沢ニッケルメツキ力 スルファミン酸ニッケルメツキであることを特徴とする 請求項 11に記載のタブリード材の製造方法。 12. The method for producing a tab lead material according to claim 11, wherein the matte nickel plating power is nickel sulfamate plating.
[13] 前記金属薄板がァニール処理されたものであることを特徴とする請求項 9または請 求項 11に記載のタブリード材の製造方法。 13. The method for producing a tab lead material according to claim 9 or claim 11, wherein the metal thin plate is annealed.
[14] 金属薄板の表面に、無光沢ニッケルメツキを施す工程と、 [14] applying a matte nickel plating to the surface of the thin metal plate;
前記スルファミン酸ニッケルメツキを施した金属薄板を熱処理する工程と、 前記メツキ層の表面にキトサンもしくはその誘導体を含むプライマー膜を形成する 工程とを、  A step of heat-treating the metal thin plate subjected to the nickel sulfamate plating, and a step of forming a primer film containing chitosan or a derivative thereof on the surface of the plating layer.
備えたことを特徴とするタブリード材の製造方法。  A method for producing a tab lead material, comprising:
[15] 前記無光沢ニッケルメツキ力 スルファミン酸ニッケルメツキであることを特徴とする 請求項 14に記載のタブリード材の製造方法。 15. The method for producing a tab lead material according to claim 14, wherein the matte nickel plating strength is nickel sulfamate plating.
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