WO2008009559A3 - Device and method for producing and/ or confining a plasma - Google Patents

Device and method for producing and/ or confining a plasma Download PDF

Info

Publication number
WO2008009559A3
WO2008009559A3 PCT/EP2007/056760 EP2007056760W WO2008009559A3 WO 2008009559 A3 WO2008009559 A3 WO 2008009559A3 EP 2007056760 W EP2007056760 W EP 2007056760W WO 2008009559 A3 WO2008009559 A3 WO 2008009559A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
confining
producing
lining
recipient
Prior art date
Application number
PCT/EP2007/056760
Other languages
French (fr)
Other versions
WO2008009559A9 (en
WO2008009559A2 (en
Inventor
Jacques Pelletier
Ana Lacoste
Stephane Bechu
Original Assignee
Centre Nat Rech Scient
Univ Grenoble 1
Jacques Pelletier
Ana Lacoste
Stephane Bechu
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Nat Rech Scient, Univ Grenoble 1, Jacques Pelletier, Ana Lacoste, Stephane Bechu filed Critical Centre Nat Rech Scient
Priority to US12/374,478 priority Critical patent/US8324814B2/en
Priority to ES07765802.9T priority patent/ES2589109T3/en
Priority to EP07765802.9A priority patent/EP2044816B1/en
Publication of WO2008009559A2 publication Critical patent/WO2008009559A2/en
Publication of WO2008009559A9 publication Critical patent/WO2008009559A9/en
Publication of WO2008009559A3 publication Critical patent/WO2008009559A3/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The invention concerns a device for producing and/ or confining a plasma (10), comprising a recipient (13) within the volume of which the plasma is produced or confined, wherein said recipient comprises a wall (1) defining a lining (15) at the inside of the recipient and encompassing the volume, characterized in that it comprises at least one annular magnet (30), centered around a normal (14) with respect to the lining, having radial magnetization direction, such that the magnetization direction is significantly perpendicular to said normal to the lining. The invention also concerns a method for producing and/ or confining a plasma.
PCT/EP2007/056760 2006-07-21 2007-07-04 Device and method for producing and/ or confining a plasma WO2008009559A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/374,478 US8324814B2 (en) 2006-07-21 2007-07-04 Device and method for producing and/or confining a plasma
ES07765802.9T ES2589109T3 (en) 2006-07-21 2007-07-04 Device and procedure for the production and / or confinement of a plasma
EP07765802.9A EP2044816B1 (en) 2006-07-21 2007-07-04 Device and method for producing and/ or confining a plasma

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0606680 2006-07-21
FR0606680A FR2904178B1 (en) 2006-07-21 2006-07-21 DEVICE AND METHOD FOR PRODUCTION AND / OR CONTAINMENT OF PLASMA

Publications (3)

Publication Number Publication Date
WO2008009559A2 WO2008009559A2 (en) 2008-01-24
WO2008009559A9 WO2008009559A9 (en) 2008-05-08
WO2008009559A3 true WO2008009559A3 (en) 2009-03-05

Family

ID=37709764

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/056760 WO2008009559A2 (en) 2006-07-21 2007-07-04 Device and method for producing and/ or confining a plasma

Country Status (7)

Country Link
US (1) US8324814B2 (en)
EP (1) EP2044816B1 (en)
ES (1) ES2589109T3 (en)
FR (1) FR2904178B1 (en)
HU (1) HUE032512T2 (en)
PL (1) PL2044816T3 (en)
WO (1) WO2008009559A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2938150B1 (en) * 2008-10-30 2010-12-17 Centre Nat Rech Scient DEVICE AND METHOD FOR PRODUCTION AND / OR CONTAINMENT OF PLASMA
FR2993429B1 (en) * 2012-07-11 2016-08-05 Centre Nat De La Rech Scient (Cnrs) COAXIAL MICROWAVE APPLICATOR FOR PLASMA PRODUCTION
EP2784175A1 (en) * 2013-03-28 2014-10-01 NeoCoat SA Device for depositing diamond in vapour phase
FR3019708B1 (en) * 2014-04-04 2016-05-06 Hydromecanique & Frottement CIPO - Patent
CN105590824B (en) * 2014-10-20 2017-11-03 中微半导体设备(上海)有限公司 A kind of plasma processing device
CN107316729B (en) * 2017-06-15 2019-08-30 中国科学院近代物理研究所 The method of magnetic ring component and manufacture magnetic ring component
CN108776129B (en) * 2018-07-06 2023-12-08 中国科学院西安光学精密机械研究所 Multifunctional annular magnet array laser plasma restraint device and application system thereof
WO2023178004A1 (en) * 2022-03-14 2023-09-21 The Trustees Of Princeton University Planar coil stellarator

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6022446A (en) * 1995-08-21 2000-02-08 Shan; Hongching Shallow magnetic fields for generating circulating electrons to enhance plasma processing
FR2840451A1 (en) * 2002-06-04 2003-12-05 Centre Nat Rech Scient DEVICE FOR PRODUCING A PLASMA TABLECLOTH
US20050194910A1 (en) * 2004-03-05 2005-09-08 Tokyo Electron Limited Magnetically enhanced capacitive plasma source for ionized physical vapor deposition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53147217A (en) * 1977-05-26 1978-12-21 Matsushita Electric Ind Co Ltd Cylindrical shape field magnet for small direct current motor
US5370765A (en) * 1989-03-09 1994-12-06 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source and method of operation
US5133826A (en) * 1989-03-09 1992-07-28 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source
US5767628A (en) * 1995-12-20 1998-06-16 International Business Machines Corporation Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel
US5975014A (en) * 1996-07-08 1999-11-02 Asm Japan K.K. Coaxial resonant multi-port microwave applicator for an ECR plasma source
FR2797372B1 (en) 1999-08-04 2002-10-25 Metal Process METHOD FOR PRODUCING ELEMENTARY PLASMAS WITH A VIEW TO CREATING A UNIFORM PLASMA FOR A USING SURFACE AND DEVICE FOR PRODUCING SUCH A PLASMA
FR2838020B1 (en) 2002-03-28 2004-07-02 Centre Nat Rech Scient PLASMA CONTAINMENT DEVICE
US7551265B2 (en) * 2004-10-01 2009-06-23 Nikon Corporation Contact material and system for ultra-clean applications

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6022446A (en) * 1995-08-21 2000-02-08 Shan; Hongching Shallow magnetic fields for generating circulating electrons to enhance plasma processing
FR2840451A1 (en) * 2002-06-04 2003-12-05 Centre Nat Rech Scient DEVICE FOR PRODUCING A PLASMA TABLECLOTH
US20050194910A1 (en) * 2004-03-05 2005-09-08 Tokyo Electron Limited Magnetically enhanced capacitive plasma source for ionized physical vapor deposition

Also Published As

Publication number Publication date
WO2008009559A9 (en) 2008-05-08
FR2904178A1 (en) 2008-01-25
PL2044816T3 (en) 2017-01-31
EP2044816B1 (en) 2016-06-01
HUE032512T2 (en) 2017-09-28
US8324814B2 (en) 2012-12-04
US20100109532A1 (en) 2010-05-06
EP2044816A2 (en) 2009-04-08
FR2904178B1 (en) 2008-11-07
ES2589109T3 (en) 2016-11-10
WO2008009559A2 (en) 2008-01-24

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