WO2007108514A1 - Glass plate having antibacterial film, method of producing the same and article having the glass plate - Google Patents
Glass plate having antibacterial film, method of producing the same and article having the glass plate Download PDFInfo
- Publication number
- WO2007108514A1 WO2007108514A1 PCT/JP2007/055915 JP2007055915W WO2007108514A1 WO 2007108514 A1 WO2007108514 A1 WO 2007108514A1 JP 2007055915 W JP2007055915 W JP 2007055915W WO 2007108514 A1 WO2007108514 A1 WO 2007108514A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- antibacterial
- glass plate
- film
- antibacterial film
- glass
- Prior art date
Links
- 230000000844 anti-bacterial effect Effects 0.000 title claims abstract description 194
- 239000011521 glass Substances 0.000 title claims abstract description 155
- 238000000034 method Methods 0.000 title claims abstract description 47
- 239000007789 gas Substances 0.000 claims description 47
- 239000010936 titanium Substances 0.000 claims description 37
- 241000894006 Bacteria Species 0.000 claims description 36
- 238000004519 manufacturing process Methods 0.000 claims description 34
- 229910052719 titanium Inorganic materials 0.000 claims description 31
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 27
- 241000588724 Escherichia coli Species 0.000 claims description 22
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 22
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 21
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 20
- 241000191967 Staphylococcus aureus Species 0.000 claims description 20
- 238000005229 chemical vapour deposition Methods 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 15
- -1 nitrogen-containing compound Chemical class 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 11
- 229910021529 ammonia Inorganic materials 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000012528 membrane Substances 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 239000002683 reaction inhibitor Substances 0.000 claims description 7
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 7
- 230000002378 acidificating effect Effects 0.000 claims description 6
- 238000006124 Pilkington process Methods 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 238000005816 glass manufacturing process Methods 0.000 claims description 2
- 238000005192 partition Methods 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 120
- 239000002994 raw material Substances 0.000 description 20
- 239000010409 thin film Substances 0.000 description 19
- 239000000047 product Substances 0.000 description 18
- 229940023064 escherichia coli Drugs 0.000 description 13
- 230000000845 anti-microbial effect Effects 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 238000011056 performance test Methods 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000000156 glass melt Substances 0.000 description 6
- 239000003513 alkali Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 244000005700 microbiome Species 0.000 description 5
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 239000001569 carbon dioxide Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005755 formation reaction Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000001699 photocatalysis Effects 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000010583 slow cooling Methods 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 241000233866 Fungi Species 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 238000010574 gas phase reaction Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 241000191940 Staphylococcus Species 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 150000003839 salts Chemical group 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 235000001674 Agaricus brunnescens Nutrition 0.000 description 1
- 241000193830 Bacillus <bacterium> Species 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 241000192125 Firmicutes Species 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- 240000004808 Saccharomyces cerevisiae Species 0.000 description 1
- 241000607142 Salmonella Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 241000219094 Vitaceae Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000009395 breeding Methods 0.000 description 1
- 230000001488 breeding effect Effects 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009503 electrostatic coating Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 235000021021 grapes Nutrition 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- BAQNULZQXCKSQW-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[Ti+4].[Ti+4] BAQNULZQXCKSQW-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/02—Antibacterial glass, glaze or enamel
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/71—Photocatalytic coatings
Definitions
- the present invention relates to a glass plate with an antibacterial film, a manufacturing method thereof, and an article having the glass plate.
- the present invention relates to a glass plate with an antibacterial film and a method for producing the same, and further relates to an article having the glass plate.
- Japanese Patent Application Laid-Open No. 2001-72438 discloses an antibacterial processed plate glass material that can form an antibacterial effect by forming a coating film made of a resin composition containing acid titanium or the like as an antibacterial agent.
- the antibacterial strength plate glass material is selected from roll coating, dip coating, spray coating, electrostatic coating, electrodeposition coating, wire coating, flow coating, doctor coating, etc. Since the coating film was formed by this method, the thickness of the coating film became 10-50 / ⁇ ⁇ and a micron unit, and a film thinner than these could not be formed uniformly.
- an antibacterial film a film formed on the surface of a member in order to impart antibacterial properties to the member is referred to as an “antibacterial film”.
- the antibacterial film metal materials such as silver, zinc and copper and photocatalytic materials such as titanium oxide are used.
- Titanium oxide is widely used as a photocatalytic material because of its high photocatalytic activity and excellent chemical stability. When titanium oxide is irradiated with ultraviolet rays, electrons and holes are generated.
- WO94Z11092 pamphlet discloses a technique in which powdered titanium oxide titanium is sintered on a glass plate. Although this technique can be used to obtain a plate-like antibacterial member, when coating particulate glass titanium oxide on a glass plate, the acidity is reduced. Tan particles aggregate to inevitably increase the particle size of titanium oxide. When the particle diameter of the acid titanium is increased, the thickness of the antibacterial film containing the acid titanium is increased. As a result, there was a problem that the reflectance of the antibacterial film increased and the interference color of the reflection became conspicuous.
- the method of International Publication No. 94Z11092 pamphlet has another problem that the antibacterial film is low in mechanical durability because the antibacterial film is formed using powdered titanium oxide. Furthermore, it is not only difficult to form an antibacterial film uniformly on a large-area glass substrate, but it is also necessary to carry out a baking process and a coating process. It is unsuitable for continuous mass production of large area glass plates.
- the method for producing a nitrogen-doped titanium oxide film disclosed in WO 01/10552 is an invention relating to a method for producing a glass plate having an antibacterial film formed on the surface thereof, and a sputtering method. After forming the TiO film with the atmosphere containing ammonia and nitrogen
- the present invention has been completed by paying attention to the above-described problems. Its purpose is to provide a glass plate with an antibacterial film, which has an antibacterial film, which has produced interference colors of reflection. It is another object of the present invention to provide a method for manufacturing a large-sized glass plate with an antibacterial film formed thereon, which is a large area glass plate with improved mechanical durability.
- the glass plate with an antibacterial film of the present invention is a glass plate with an antibacterial film comprising an antibacterial film directly or via a base film on the glass plate, and the film thickness of the antibacterial film is 2 nm or more and lOOnm or less. is there.
- the antimicrobial performance of the antimicrobial film is antimicrobial product technology Council irradiation film adhesion method 10 ⁇ WZcm 2 of the ultraviolet light quantity irradiation 24 hours based on the stipulated Antibacterial performance that reduces the number of Staphylococcus aureus or Escherichia coli after irradiation to less than lZio 0 relative to the number of bacteria before irradiation.
- the antibacterial performance of the antibacterial film is such that the yellow grapes are irradiated with ultraviolet light having a light intensity of 10 ⁇ WZcm 2 for 8 hours based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council. Antibacterial performance that reduces the number of cocci or E. coli to 1Z100 or less with respect to the number of bacteria before light irradiation.
- the antibacterial performance of the antibacterial film is based on a light irradiation film adhesion method stipulated by the Antibacterial Product Technical Council, and after irradiating a white fluorescent lamp with an amount of lOOOLx for 24 hours.
- Antibacterial performance to reduce the number of Staphylococcus aureus or Escherichia coli to 1Z100 or less with respect to the number of bacteria before light irradiation.
- the antibacterial performance of the antibacterial film is yellow after irradiating a white fluorescent lamp with a light quantity of 500Lx for 24 hours based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council.
- Antibacterial performance that reduces the number of Staphylococcus or Escherichia coli to 1Z100 or less compared to the number of bacteria before light irradiation.
- the antibacterial performance of the antibacterial film is yellow after irradiating a white fluorescent lamp with a light quantity of 250Lx for 24 hours based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council.
- Antibacterial performance that reduces the number of Staphylococcus or Escherichia coli to 1Z100 or less compared to the number of bacteria before light irradiation.
- the antibacterial performance is an antibacterial performance that reduces the number of Staphylococcus aureus or Escherichia coli to 1 Z 10,000 or less.
- the film thickness of the antibacterial film is 5 nm or more and 80 nm or less, and in a further preferred embodiment, the film thickness of the antibacterial film is more than 25 nm and less than 70 nm.
- the main component of the antibacterial film is one selected from the group force consisting of titanium oxide, nitrogen-doped titanium oxide, titanium oxynitride, and titanium nitride power.
- the main component of the antibacterial film is nitrogen-doped titanium oxide.
- a method for producing a glass plate with an antibacterial film is provided. This For the manufacturing method, the antibacterial film is formed by a thermal decomposition method.
- the film forming gas is supplied to the surface of the glass plate in which the antibacterial film is maintained at a temperature higher than the temperature at which the film forming gas is decomposed or the glass ribbon surface in the glass plate manufacturing process. To form.
- the film forming gas contains a titanium-containing compound, a nitrogen-containing compound, and an oxidizing gas.
- the film-forming gas further includes a reaction inhibitor that suppresses a chemical reaction between the titanium-containing compound and the nitrogen-containing compound.
- the nitrogen-containing compound is ammonia.
- the acidic gas is oxygen
- the molar specific power of the acidic gas such as oxygen to the nitrogen-containing compound such as ammonia in the coating forming gas is 0.05 or more. is there.
- the reaction inhibitor is salt hydrogen.
- the thermal decomposition method is a CVD method performed in a nose for forming a molten glass ribbon into a plate shape in a glass manufacturing process by a float method.
- a glass window for a building has the above glass plate with antibacterial film.
- living windows or glass windows in medical facilities, indoor glass, etc. are provided.
- a glass partition in a building has the above glass plate with antibacterial film.
- furniture has the above-mentioned glass plate with an antibacterial film.
- glass tables, glass shelves, glass showcases or glass food cases are provided.
- a glass window for a transport machine has the above glass plate with antibacterial film.
- vehicle, ship or aircraft glass windows are provided.
- an information display glass panel is provided. They have the above glass plate with antibacterial film.
- display panels and touch panels are provided.
- the thickness of the antibacterial film is set in a range of 2 nm or more and lOOnm or less, generation of reflection interference colors is suppressed even when a titanium compound having a relatively high refractive index is used.
- An antibacterial film-coated glass plate comprising an antibacterial film is provided.
- a large area is obtained by performing a pyrolysis method in a bath for forming a molten glass ribbon into a plate shape.
- a method for producing a glass plate with an antibacterial film in which the mechanical durability of the antibacterial film is enhanced in large quantities at a low cost.
- an article having an antibacterial film-coated glass is provided.
- FIG. 1 is a cross-sectional view showing an example of a glass plate with an antibacterial film of the present invention.
- FIG. 1 (a) shows an example in which the antibacterial film is directly formed on the glass plate. Shows an example in which a base film is interposed between the glass plate and the antibacterial film.
- FIG. 2 This is a schematic diagram of the equipment used for the on-line CVD method.
- antibacterial means that the growth of bacteria or microorganisms attached to an object is suppressed, and the viable number of bacteria or microorganisms decreases with the passage of time.
- main component means a component that occupies 50% by weight or more.
- light irradiation film adhesion method defined by the Antibacterial Product Technology Council means the light irradiation film adhesion method (2003 version) established by the Antibacterial Product Technology Council. Antibacterial performance is evaluated based on the conditions stipulated in the dressing law. This measurement method was one of the most common measurement methods for assessing the antibacterial properties of products for those skilled in the art until JIS R1702: 2006 was issued after the basic application of this application was filed. .
- FIG. 1 is a schematic cross-sectional view illustrating two forms of the antibacterial film-coated glass plate 4 according to the present invention. .
- an antibacterial film 2 is formed on the glass plate 1 as shown in FIG.
- the base film 3 it is preferable to configure the base film 3 so as to have one or more layers between the glass plate 1 and the antibacterial film 2.
- This base film preferably has a role such as an alkali barrier function.
- the glass plate 1 is a glass plate containing an alkali component, for example, when the alkali component moves to the antibacterial membrane 2 during the film formation process of the antibacterial membrane 2, the crystallinity of the antibacterial membrane deteriorates and the antibacterial performance deteriorates. In that case, if the base film is sandwiched, adverse effects due to the movement of the alkali component can be prevented.
- the thickness of the antibacterial film is preferably in the range of 2 nm to lOOnm and more preferably in the range of 5 nm to 80 nm. Furthermore, the range of more than 20 nm and less than 70 nm is most preferable.
- the antibacterial performance of the antibacterial film of the present invention is as follows: after the irradiation with ultraviolet light of 10 ⁇ WZcm 2 for 24 hours in the light irradiation film adhesion method (2003 version) established by the Antibacterial Product Technical Council.
- Antibacterial performance that reduces the number of Staphylococcus aureus or Escherichia coli to 1Z100 or less with respect to the number of bacteria before light irradiation is preferred. More preferably, the antibacterial performance is to reduce the number of Staphylococcus aureus or Escherichia coli after irradiation with ultraviolet light of 10 / z WZcm 2 for 8 hours to 1Z100 or less with respect to the number of bacteria before light irradiation. .
- the number of Staphylococcus aureus or Escherichia coli after 24 hours of irradiation with a white fluorescent lamp with a light intensity of lOOOLx is measured before light irradiation.
- Antibacterial performance that reduces the number of bacteria to 1Z100 or less is preferable. More preferably, the antibacterial performance is to reduce the number of Staphylococcus aureus or Escherichia coli after irradiation with a white fluorescent lamp with a light quantity of 500 Lx for 24 hours to 1Z100 or less with respect to the number of bacteria before light irradiation.
- a staphylococcus aureus or Escherichia coli after being irradiated with a white fluorescent lamp with a light intensity of 25 OLx for 24 hours.
- Antibacterial performance that reduces the number to less than ⁇ against the number of bacteria before light irradiation. Since antibacterial performance evaluation is a test using microorganisms, the evaluation test error is larger than other physical property evaluations. If the number of bacteria after light irradiation is 1Z100 or less (the sterilization rate is 99% or more), it can be said that there is clearly an advantageous effect on antibacterial performance that is not within the error range.
- the bacteria survival rate is 1% or less (the number of bacteria is reduced to 1Z100 or less), the difference between antibacterial processed products and unprocessed products Can be judged significantly.
- the number of bacteria after light irradiation is 1 Ziooo or less.
- the number of bacteria after light irradiation is 1Z10000 or less.
- the intensity of the ultraviolet light to be irradiated and the illuminance of the white fluorescent lamp are typified by the following locations.
- Ultraviolet light WZcm 2 ⁇ ⁇ 'In the daytime room about 1.5m away from the window where sunlight enters.
- the intensity of the ultraviolet light in the fluorescent lamp lOOOLx is, 4 / z WZcm 2 about.
- the intensity of ultraviolet light in fluorescent lamp 1000 Lx is about 2 / z WZcm 2 .
- the bacteria to be reduced by the present invention is not particularly limited, but the present invention can be used for the following fungi.
- examples include bacteria of Gram-positive bacteria (S. aureus, Bacillus, etc.) or Gram-negative bacteria (E. coli, Salmonella, etc.), fungi such as fungi, mushrooms, yeasts, other viruses, and protists.
- the main component of the antibacterial film of the present invention is preferably one selected from the group power of titanium oxide, nitrogen-doped titanium oxide, titanium oxynitride, and titanium nitride power. This is because an antibacterial film containing these as main components has high antibacterial performance and excellent chemical stability.
- the main component is preferably nitrogen-doped acid titanium.
- nitrogen-doped acid Titanium fluoride is a photocatalytic material that responds to the light of visible light, so it is preferable in that it can use light in the visible light region that is often contained in sunlight and fluorescent lamps.
- the raw material for the antibacterial membrane of the present invention contains at least one titanium-containing compound, at least one nitrogen-containing compound, and at least one acid gas. is required.
- the titanium-containing compound is preferably a titanium chloride, a titanium alkoxide or a titanium chelate compound. These titanium-containing compounds are preferably in the form of a gas or liquid at room temperature, and when they are liquid at room temperature, the lower boiling point is preferable. These preferable titanium-containing compounds can be vaporized as they are or by heating a little, and can be used as components of the raw material gas. In addition, a titanium-containing compound that sublimes even if it is solid at room temperature, or a titanium-containing compound that can be dissolved in an organic solvent such as alcohol or toluene can be used.
- titanium-containing compounds include, for example, tetrasalt-titanium (TiCl), titanium ethoxy
- Ti Titanium Isoproxide
- Ti Titanium Normal Butoxide
- TiCl titanium isoproxide
- Ti (OC H) titanium isoproxide
- N-butanol (Ti (OCH)) is preferably used.
- ammonia NH
- amines NH
- hydrazine derivatives are preferable.
- ammonia easily liquefies by compression and is a gas at room temperature and normal pressure, and is particularly preferable in that it can be obtained in a large amount at a preferred low cost because it can be easily introduced into the raw material gas.
- Aminyahydrazine derivatives are excellent in that they can easily produce high quality films because of their high reactivity. On the other hand, it is disadvantageous in that it is expensive.
- the acidic gas it is preferable to use oxygen (O 2). Carbon dioxide (CO 2), acid
- liquid raw materials such as O
- esters When liquid raw materials such as O) and esters are used, facilities for vaporizing the liquid raw materials are required. In addition, the amount of vaporization tends to be unstable. It is preferable to use a gas raw material whose supply amount is easy to control. Of these, it is particularly preferable to use oxygen. Air can also be used. When air is used as an acidic gas, nitrogen (N) contained in the air can act as a reaction diluent.
- N nitrogen
- the molar ratio of oxygen to ammonia is preferably 0.05 or more.
- the crystallinity of the film can be improved by setting the molar ratio of oxygen to air to 0.05 or more.
- the recombination of the generated electrons and holes is thought to occur at the crystal defect site. Therefore, by improving the crystallinity, that is, by reducing the defect sites of the crystal, the rate of successful recombination with electrons can be reduced and antibacterial properties can be enhanced.
- the raw material of the antibacterial membrane of the present invention preferably further contains a reaction inhibitor that suppresses a chemical reaction between the titanium-containing compound and the nitrogen-containing compound.
- reaction inhibitor it is preferable to use salt hydrogen.
- the gas phase reaction may proceed before the raw material gas reaches the glass plate.
- a solid reaction product is generated in the raw gas piping.
- This reaction product may block the piping.
- this reaction product is transported to the surface of the glass plate by the flow of the raw material gas, is taken into the film to be formed, and causes defects such as pinholes.
- the manufacturing method of the antibacterial film is not particularly limited, but a known thermal decomposition method such as a thermal CVD method or a spray method is used.
- a fine powder of the antibacterial film is attached to the glass surface, and then the entire glass. Examples thereof include a method of agglomerating the fine powder by heating.
- the antibacterial film may be crystal-grown by the thermal decomposition method using the agglomerated fine powder as a nucleus.
- the thermal decomposition method particularly the thermal CVD method, can easily form a film with high mechanical durability.
- the film formation by the thermal CVD method uses, for example, a glass plate as a substrate and a glass having a predetermined size. This can be done by heating the glass plate and spraying a gaseous raw material on the surface of the heated glass plate.
- this can be performed as follows.
- the glass plate is transported on a mesh belt and passed through a tunnel-shaped heating furnace.
- the glass plate is conveyed into a heating furnace and heated to a temperature at which the film-forming gas decomposes (hereinafter abbreviated as “film-forming gas decomposition temperature”).
- film-forming gas decomposition temperature a temperature at which the film-forming gas decomposes
- the source gas is supplied into the heating furnace.
- the source gas reacts with the heat of the surface of the glass plate, and an antibacterial film having antibacterial action is formed on the glass plate.
- the film-forming gas decomposition temperature is preferably 500 ° C or higher from the viewpoint of obtaining high crystallinity and high film formation rate. That is, it is preferable to form an antibacterial film on the surface of a glass plate at 500 ° C or higher. TiNCl, TiCl ⁇ ⁇ , etc. when the temperature is below 500 ° C
- the glass plate in the glass plate manufacturing process, the glass plate is heated at a high temperature in the step of forming the glass melt into the glass plate or in the slow cooling step after the glass plate is formed. It is preferable to utilize that. This is because if a raw material gas is supplied onto a high-temperature glass plate, a thin film can be formed without using a separate heating facility. In addition, in this way, a thin film can be formed at high speed on a glass plate having a large area, and a glass plate with a thin film can be produced for applications that require a large area such as buildings, vehicles, and display panels. it can. As described above, the method of forming a film on a high-temperature glass plate in the middle of the manufacturing process is called an online CVD method.
- the above-described process of forming the glass melt and the glass plate is performed in a molten tin tank (referred to as a float bath) in the glass plate manufacturing process by the float process.
- the glass melt melted in the melting furnace (called the float kiln) flows into the float bath.
- the glass melt is drawn into a long strip without interruption and is called a glass ribbon.
- a method in which the online CVD method is performed in a float bath is called an in-bus CVD method.
- the intra-CVD method has the following advantages. First, the atmosphere inside the float bath is controlled so that air does not enter. Therefore, pinhole etc. It is possible to suppress defects.
- the temperature of the glass ribbon in the float bath is very high. The temperature depends on the strength of the glass ribbon. In the case of ordinary soda lime silicate glass, the temperature is, for example, in the range of 650 to 1150 ° C.
- the crystallinity of the thin film having antibacterial performance can be improved and the antibacterial performance can be improved.
- the raw material gas exhibits sufficient reactivity, a thin film having a sufficient thickness of antibacterial performance can be easily formed on the glass ribbon without lowering the conveyance speed of the glass ribbon. As a result, productivity can be expected to increase, and it becomes possible to manufacture a large number of glass plates with antibacterial films at low cost.
- Fig. 2 shows an embodiment of an apparatus for forming a film on a glass ribbon by the in-bus CVD method in the float method.
- the surface force of the glass ribbon 10 that flows out from the float kiln 11 into the float bath 12 and moves in a strip shape on the molten tin 15 is also separated by a predetermined distance, and a predetermined number of coaters 16 Is arranged in the float bath.
- three coaters 16a, 16b and 16c are shown. The number of coaters can be appropriately designed according to the design of the membrane configuration.
- the on-line CVD method can also be performed in a slow cooling step (called “rare”) after being formed into a glass plate.
- the raw material gas is introduced at the inlet of the rare (slow cooling kiln) and Z or inside the rare.
- this method is referred to as a rare-layer CVD method.
- the glass ribbon near the rare entrance or the rare entrance in the rare is at a lower temperature than in the bath, it has a sufficiently high temperature for the film formation reaction.
- the rare CVD method has the following features, unlike the chemical CVD method. First of all, it is not suitable for bus CVD method.
- a raw material whose reaction rate is too high at the glass ribbon temperature of the CVD method in the bath, or a raw material that may have an unfavorable effect on the float bath can be used. It can also be applied to glass plate manufacturing processes that do not have a float bath. For example, it can be applied to a glass plate manufacturing process by a roll-out method, and a plate glass, a netted glass, and a wire glass having an antibacterial film having an antibacterial action can be manufactured.
- a non-alkali glass plate having a thickness of 0.7 mm was cut into a square having a side of 10 cm, washed, and then dried.
- a nitrogen-doped titanium oxide film was formed by atmospheric pressure CVD using a transfer furnace of an atmospheric pressure thermal CVD apparatus.
- the above glass plate was placed on a mesh belt and conveyed in the above furnace to heat the glass plate.
- a nitrogen-doped titanium oxide film was formed by supplying a source gas to the surface of the glass plate.
- This source gas includes titanium tetrachloride (TiCl), oxygen (O), ammonia (NH), and hydrogen chloride as a reaction inhibitor.
- HC1 HC1
- a gas diluted with nitrogen gas to a predetermined concentration was used.
- a nitrogen-doped titanium oxide film was formed by adjusting the concentration of the source gas and the conveying speed.
- a thin film was formed on the surface of the glass ribbon by the CVD method in the bus. Specifically, it is as follows.
- the first coater (16a in Fig. 2) formed an SiO film with a thickness of 50 nm on the glass ribbon as a base film.
- the raw material gases include tetrasalt ⁇ titanium (TiCl), ethyl acetate (CHO
- a titanium oxide film was formed by adjusting the conveyance speed.
- Example 14 a nitrogen-doped titanium oxide film was formed using the same source gas as in Examples 1 to 12 and the comparative example.
- the cross section of the glass plate on which the thin film was formed was measured by observing it with a scanning electron microscope (SEM).
- the antibacterial properties of the obtained films were evaluated by the light irradiation film adhesion method established by the Antibacterial Product Technical Council.
- the number of Staphylococcus aureus after 24 hours of ultraviolet irradiation is reduced to 1Z100 or less, and has good antibacterial properties.
- the number of E. coli after 24 hours of ultraviolet irradiation was reduced to 1Z100 or less, and had good antibacterial properties.
- the UV intensity was adjusted to 10 / z WZcm 2 and the irradiation time of ultraviolet rays was set to 8 hours, as in (Antibacterial performance test 1) above. Test gave.
- the test strain was evaluated using Staphylococcus aureus NBRC12732.
- Example 3 For Examples 3, 5, and 8-14, based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council, using a white fluorescent lamp, adjusting the illuminance to lOOOLx, the white fluorescent lamp The test was conducted in the same manner as the above (Antibacterial performance test 1) except that the irradiation time was 24 hours.
- the test bacteria were evaluated using Staphylococcus aureus NBRC12732 and Escherichia coli NBRC3972.
- the white fluorescent lamp was adjusted so that the illuminance was 500 Lx.
- the test was conducted in the same manner as the above (Antibacterial performance test 1) except that the irradiation time was 24 hours.
- the test bacteria were evaluated using Staphylococcus aureus NBRC12732.
- the white fluorescent lamp was adjusted so that the illuminance was 250 Lx, and the white fluorescent lamp was irradiated.
- the test was conducted in the same manner as (Antibacterial performance test 1) except that the time was 24 hours.
- the test bacteria were evaluated using Staphylococcus aureus NBRC12732.
- the thin films of Examples 1 to 14 had a thickness in the range of 5 to 80 nm, and thus had no interference color. On the other hand, an interference color occurred in the comparative thin film having a thickness of 150 nm.
- the glass plate with an antibacterial film of the present invention is different from conventional ones in the fields of glass windows for buildings, glass windows for transportation machinery, glass panels for information display, etc. It has a great utility value in that it can provide a glass plate with an antibacterial film with improved mechanical durability.
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
It is intended to provide a glass plate having an antibacterial film which is equipped with an antibacterial film scarcely showing an interference color due to reflection. It is also intended to provide a method of producing a glass plate, which is a large-sized glass plate having an antibacterial film formed thereon and shows an improved mechanical durability of the antibacterial film, in a large amount at a low cost. This glass plate having an antibacterial film is produced by forming an antibacterial film having a film thickness of 2 nm or more but not more than 100 nm on a glass plate either directly or via an undercoat film. The antibacterial film is formed by the heat decomposition method which comprises supplying a film-forming gas onto the surface of a glass plate, which has been maintained at such a temperature as allowing the decomposition of the film-forming gas or higher, or onto the surface of a glass ribbon in the course of producing a glass plate.
Description
明 細 書 Specification
抗菌膜付きガラス板とその製造方法、及びそのガラス板を有する物品 技術分野 TECHNICAL FIELD The present invention relates to a glass plate with an antibacterial film, a manufacturing method thereof, and an article having the glass plate.
[0001] 本発明は、抗菌膜付きガラス板とその製造方法に関し、さらにはそのガラス板を有 する物品に関する。 The present invention relates to a glass plate with an antibacterial film and a method for producing the same, and further relates to an article having the glass plate.
背景技術 Background art
[0002] 快適な生活空間に対するニーズはきわめて高ぐ高温多湿の環境下では細菌、微 生物等の繁殖が活発になる。このような細菌、微生物等は、人体に悪影響のあること も多ぐこれらの繁殖を効果的に阻害するために、生活空間の構成部材として使用可 能な板状の抗菌性部材および安価で大量生産可能な当該部材の製造方法が求め られている。 [0002] The need for a comfortable living space is extremely high. In a hot and humid environment, breeding of bacteria, microorganisms, etc. becomes active. Such bacteria, microorganisms, etc. often have adverse effects on the human body, and in order to effectively inhibit their reproduction, plate-like antibacterial members that can be used as components of living spaces and inexpensive, large-scale There is a need for a method for producing such parts that can be produced.
[0003] 例えば、特開 2001— 72438号公報には、抗菌剤として酸ィ匕チタン等を含む榭脂 組成物による塗膜を形成し、抗菌効果を発揮し得る抗菌性加工板硝子材が開示され ている。し力しながら、当該抗菌性力卩工板硝子材では、ロールコーティング、ディップ コーテング、スプレー塗布、静電塗装、電着塗装、ワイヤーコート、フローコート、ドク ターコート等の中から選ばれたいずれかの方法により塗膜を形成するので、塗膜の 厚みは、 10〜50 /ζ πιとミクロン単位となってしまい、これらより更に薄い膜を均一に成 膜することはできなかった。本明細書においては、部材に抗菌性を付与するために 部材表面に形成する膜を、「抗菌膜」と称する。抗菌膜としては、銀、亜鉛、銅などの 金属材料や、酸化チタンなどの光触媒材料が用いられる。 [0003] For example, Japanese Patent Application Laid-Open No. 2001-72438 discloses an antibacterial processed plate glass material that can form an antibacterial effect by forming a coating film made of a resin composition containing acid titanium or the like as an antibacterial agent. ing. However, the antibacterial strength plate glass material is selected from roll coating, dip coating, spray coating, electrostatic coating, electrodeposition coating, wire coating, flow coating, doctor coating, etc. Since the coating film was formed by this method, the thickness of the coating film became 10-50 / ζ πι and a micron unit, and a film thinner than these could not be formed uniformly. In this specification, a film formed on the surface of a member in order to impart antibacterial properties to the member is referred to as an “antibacterial film”. As the antibacterial film, metal materials such as silver, zinc and copper and photocatalytic materials such as titanium oxide are used.
[0004] 酸化チタンは光触媒活性が高ぐ化学的安定性に優れていることから、光触媒材料 として、広く用いられている。酸化チタンに紫外線を照射すると、電子と正孔が生成し[0004] Titanium oxide is widely used as a photocatalytic material because of its high photocatalytic activity and excellent chemical stability. When titanium oxide is irradiated with ultraviolet rays, electrons and holes are generated.
、光誘起分解反応や光誘起親水反応を示すようになる。これらの反応を利用した抗 菌タイル等が既に商品化されている。 , It shows a photoinduced decomposition reaction and a photoinduced hydrophilic reaction. Antibacterial tiles using these reactions have already been commercialized.
[0005] 国際公開第 94Z11092号パンフレットには、粉末の酸ィ匕チタンをガラス板上に焼 結させた技術が開示されている。当該技術を用いれば、板状の抗菌性部材を得るこ とができるものの、粒子状の酸ィ匕チタンをガラス板上にコーティングする際に、酸ィ匕チ
タン粒子が凝集して、酸ィ匕チタンの粒径が不可避的に大きくなる。酸ィ匕チタンの粒径 が大きくなると、酸ィ匕チタンを含む抗菌膜の膜厚が大きくなつてしまう。この結果、抗 菌膜の反射率が高くなり、反射の干渉色が目立つようになるという問題があった。 [0005] WO94Z11092 pamphlet discloses a technique in which powdered titanium oxide titanium is sintered on a glass plate. Although this technique can be used to obtain a plate-like antibacterial member, when coating particulate glass titanium oxide on a glass plate, the acidity is reduced. Tan particles aggregate to inevitably increase the particle size of titanium oxide. When the particle diameter of the acid titanium is increased, the thickness of the antibacterial film containing the acid titanium is increased. As a result, there was a problem that the reflectance of the antibacterial film increased and the interference color of the reflection became conspicuous.
[0006] また、国際公開第 94Z11092号パンフレットの方法では、粉末状の酸化チタンを 用いて抗菌膜を形成するので、抗菌膜の機械的耐久性も低 、と 、つた問題がある。 さらに、大面積のガラス基板に均一に抗菌膜を形成することが困難であるばかりか、 焼成処理やコーティング処理を施す必要があり、製造工程が多くなつた結果、製造コ ストが高くなる問題もあり、大面積のガラス板の連続大量生産には不向きであった。 [0006] In addition, the method of International Publication No. 94Z11092 pamphlet has another problem that the antibacterial film is low in mechanical durability because the antibacterial film is formed using powdered titanium oxide. Furthermore, it is not only difficult to form an antibacterial film uniformly on a large-area glass substrate, but it is also necessary to carry out a baking process and a coating process. It is unsuitable for continuous mass production of large area glass plates.
[0007] 更に、国際公開第 01/10552号パンフレットに開示された窒素ドープ酸ィ匕チタン 膜の製造方法は、抗菌膜をその表面に成膜したガラス板の製造方法に関する発明 であり、スパッタリング法で TiO膜を成膜した後に、アンモニアや窒素を含む雰囲気 [0007] Further, the method for producing a nitrogen-doped titanium oxide film disclosed in WO 01/10552 is an invention relating to a method for producing a glass plate having an antibacterial film formed on the surface thereof, and a sputtering method. After forming the TiO film with the atmosphere containing ammonia and nitrogen
2 2
で焼成処理する方法である。し力しながら、国際公開第 01Z10552号パンフレットの 方法では、板状の抗菌性部材を得ることができるものの、大がかりな真空装置が必要 であり、成膜装置に莫大な費用が力かる場合が多い。また、焼成処理を施す必要が あり、製造工程が多くなり、製造コストが高くなる問題があった。このように国際公開第 01/10552号パンフレットに開示された窒素ドープ酸ィ匕チタン膜の製造方法は、大 面積のガラス板の連続大量生産には不向きであった。 It is a method of baking treatment. However, the method disclosed in the pamphlet of International Publication No. 01Z10552 can obtain a plate-like antibacterial member, but requires a large-scale vacuum apparatus, and the deposition apparatus is often very expensive. . In addition, there is a problem in that the firing process is required, and the number of manufacturing steps increases and the manufacturing cost increases. As described above, the method for producing a nitrogen-doped titanium oxide film disclosed in WO 01/10552 is not suitable for continuous mass production of a large area glass plate.
発明の開示 Disclosure of the invention
[0008] 本発明は、上述のような問題点に着目して完成されたものである。その目的とすると ころは、反射の干渉色が生じがた ヽ抗菌膜を備える抗菌膜付きガラス板を提供する ことにある。また、抗菌膜が成膜された大面積のガラス板であり、抗菌膜の機械的耐 久性が高められたガラス板を、大量に安価に製造する方法を提供することを目的とす る。 [0008] The present invention has been completed by paying attention to the above-described problems. Its purpose is to provide a glass plate with an antibacterial film, which has an antibacterial film, which has produced interference colors of reflection. It is another object of the present invention to provide a method for manufacturing a large-sized glass plate with an antibacterial film formed thereon, which is a large area glass plate with improved mechanical durability.
[0009] 本発明の抗菌膜付きガラス板は、ガラス板上に、直接または下地膜を介した抗菌膜 を備える抗菌膜付きガラス板であって、前記抗菌膜の膜厚が 2nm以上 lOOnm以下 である。 [0009] The glass plate with an antibacterial film of the present invention is a glass plate with an antibacterial film comprising an antibacterial film directly or via a base film on the glass plate, and the film thickness of the antibacterial film is 2 nm or more and lOOnm or less. is there.
[0010] 好ま 、実施形態にぉ 、ては、上記抗菌膜の抗菌性能が、抗菌製品技術協議会 が定める光照射フィルム密着法に基づき 10 μ WZcm2の光量の紫外光を 24時間照
射した後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して lZio 0以下に減少させる抗菌性能である。 [0010] preferred, embodiment Nio, Te, the antimicrobial performance of the antimicrobial film is antimicrobial product technology Council irradiation film adhesion method 10 μ WZcm 2 of the ultraviolet light quantity irradiation 24 hours based on the stipulated Antibacterial performance that reduces the number of Staphylococcus aureus or Escherichia coli after irradiation to less than lZio 0 relative to the number of bacteria before irradiation.
[0011] 好ましい実施形態においては、上記抗菌膜の抗菌性能が、抗菌製品技術協議会 が定める光照射フィルム密着法に基づき 10 μ WZcm2の光量の紫外光を 8時間照 射した後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z10 0以下に減少させる抗菌性能である。 [0011] In a preferred embodiment, the antibacterial performance of the antibacterial film is such that the yellow grapes are irradiated with ultraviolet light having a light intensity of 10 μWZcm 2 for 8 hours based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council. Antibacterial performance that reduces the number of cocci or E. coli to 1Z100 or less with respect to the number of bacteria before light irradiation.
[0012] 好ま 、実施形態にぉ 、ては、上記抗菌膜の抗菌性能が、抗菌製品技術協議会 が定める光照射フィルム密着法に基づき lOOOLxの光量の白色蛍光灯を 24時間照 射した後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z10 0以下に減少させる抗菌性能である。 [0012] Preferably, according to the embodiment, the antibacterial performance of the antibacterial film is based on a light irradiation film adhesion method stipulated by the Antibacterial Product Technical Council, and after irradiating a white fluorescent lamp with an amount of lOOOLx for 24 hours. Antibacterial performance to reduce the number of Staphylococcus aureus or Escherichia coli to 1Z100 or less with respect to the number of bacteria before light irradiation.
[0013] 好ま 、実施形態にぉ 、ては、上記抗菌膜の抗菌性能が、抗菌製品技術協議会 が定める光照射フィルム密着法に基づき 500Lxの光量の白色蛍光灯を 24時間照射 した後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z100 以下に減少させる抗菌性能である。 [0013] Preferably, according to the embodiment, the antibacterial performance of the antibacterial film is yellow after irradiating a white fluorescent lamp with a light quantity of 500Lx for 24 hours based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council. Antibacterial performance that reduces the number of Staphylococcus or Escherichia coli to 1Z100 or less compared to the number of bacteria before light irradiation.
[0014] 好ま 、実施形態にぉ 、ては、上記抗菌膜の抗菌性能が、抗菌製品技術協議会 が定める光照射フィルム密着法に基づき 250Lxの光量の白色蛍光灯を 24時間照射 した後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z100 以下に減少させる抗菌性能である。 [0014] Preferably, according to the embodiment, the antibacterial performance of the antibacterial film is yellow after irradiating a white fluorescent lamp with a light quantity of 250Lx for 24 hours based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council. Antibacterial performance that reduces the number of Staphylococcus or Escherichia coli to 1Z100 or less compared to the number of bacteria before light irradiation.
[0015] 好ましい実施形態においては、上記抗菌性能が、黄色ブドウ球菌又は大腸菌の菌 数を、 1 Z 10000以下に減少させる抗菌性能である。 In a preferred embodiment, the antibacterial performance is an antibacterial performance that reduces the number of Staphylococcus aureus or Escherichia coli to 1 Z 10,000 or less.
[0016] 好ましい実施形態においては、上記抗菌膜の膜厚が、 5nm以上 80nm以下であり 、更に好ましい実施形態においては、上記抗菌膜の膜厚が、 25nmを超え 70nm未 満である。 In a preferred embodiment, the film thickness of the antibacterial film is 5 nm or more and 80 nm or less, and in a further preferred embodiment, the film thickness of the antibacterial film is more than 25 nm and less than 70 nm.
[0017] 好ましい実施形態においては、上記抗菌膜の主成分が、酸化チタン、窒素ドープ 酸化チタン、酸窒化チタンおよび窒化チタン力 なる群力 選択される 1種である。 In a preferred embodiment, the main component of the antibacterial film is one selected from the group force consisting of titanium oxide, nitrogen-doped titanium oxide, titanium oxynitride, and titanium nitride power.
[0018] 好ましい実施形態においては、上記抗菌膜の主成分が、窒素ドープ酸化チタンで ある。 [0018] In a preferred embodiment, the main component of the antibacterial film is nitrogen-doped titanium oxide.
[0019] 本発明の別の局面によれば、抗菌膜付きガラス板の製造方法が提供される。この
製造方法にお!ヽては、上記抗菌膜を熱分解法により形成する。 [0019] According to another aspect of the present invention, a method for producing a glass plate with an antibacterial film is provided. this For the manufacturing method, the antibacterial film is formed by a thermal decomposition method.
[0020] 好ま 、実施形態にぉ ヽては、上記抗菌膜を、被膜形成ガスが分解する温度以上 に保持されたガラス板表面またはガラス板製造工程におけるガラスリボン表面に、被 膜形成ガスを供給することによって形成する。 [0020] Preferably, for the embodiment, the film forming gas is supplied to the surface of the glass plate in which the antibacterial film is maintained at a temperature higher than the temperature at which the film forming gas is decomposed or the glass ribbon surface in the glass plate manufacturing process. To form.
[0021] 好ましい実施形態においては、上記被膜形成ガスが、チタン含有化合物、窒素含 有化合物および酸化性ガスを含む。 In a preferred embodiment, the film forming gas contains a titanium-containing compound, a nitrogen-containing compound, and an oxidizing gas.
[0022] 好ま 、実施形態にぉ ヽては、上記被膜形成ガスが、前記チタン含有化合物と前 記窒素含有化合物との化学反応を抑制する反応抑制剤をさらに含む。 [0022] Preferably, for the embodiment, the film-forming gas further includes a reaction inhibitor that suppresses a chemical reaction between the titanium-containing compound and the nitrogen-containing compound.
[0023] 好ましい実施形態においては、上記窒素含有化合物が、アンモニアである。 [0023] In a preferred embodiment, the nitrogen-containing compound is ammonia.
[0024] 好ま 、実施形態にぉ 、ては、上記酸ィ匕性ガスが、酸素である。 [0024] Preferably, in the embodiment, the acidic gas is oxygen.
[0025] 好まし 、実施形態にぉ 、ては、上記被覆形成ガス中における、上記アンモニアなど の窒素含有ィ匕合物に対する上記酸素などの酸ィ匕性ガスのモル比力 0. 05以上で ある。 [0025] Preferably, according to the embodiment, the molar specific power of the acidic gas such as oxygen to the nitrogen-containing compound such as ammonia in the coating forming gas is 0.05 or more. is there.
[0026] 好ま 、実施形態にぉ 、ては、上記反応抑制剤が、塩ィ匕水素である。 [0026] Preferably, in the embodiment, the reaction inhibitor is salt hydrogen.
[0027] 好ましい実施形態においては、上記熱分解法が、フロート法によるガラスの製造ェ 程における、熔融状態のガラスリボンを板状に成形するためのノ ス内で行う CVD法 である。 [0027] In a preferred embodiment, the thermal decomposition method is a CVD method performed in a nose for forming a molten glass ribbon into a plate shape in a glass manufacturing process by a float method.
[0028] 本発明の更に別の局面によれば、建築物のガラス窓が提供される。それらは、上記 抗菌膜付きガラス板を有する。例えば、居住空間もしくは医療施設内のガラス窓、室 内ガラスなどが提供される。 [0028] According to yet another aspect of the present invention, a glass window for a building is provided. They have the above glass plate with antibacterial film. For example, living windows or glass windows in medical facilities, indoor glass, etc. are provided.
[0029] 本発明の更に別の局面によれば、建築物内のガラス間仕切りが提供される。それら は、上記抗菌膜付きガラス板を有する。 [0029] According to still another aspect of the present invention, a glass partition in a building is provided. They have the above glass plate with antibacterial film.
[0030] 本発明の更に別の局面によれば、家具が提供される。それらは、上記抗菌膜付き ガラス板を有する。例えば、ガラステーブル、ガラス棚、ガラスショーケースまたはガラ ス食品ケースなどが提供される。 [0030] According to still another aspect of the present invention, furniture is provided. They have the above-mentioned glass plate with an antibacterial film. For example, glass tables, glass shelves, glass showcases or glass food cases are provided.
[0031] 本発明の更に別の局面によれば、輸送機械のガラス窓が提供される。それらは、上 記抗菌膜付きガラス板を有する。例えば、車輛、船舶又は航空機のガラス窓などが提 供される。
[0032] 本発明の更に別の局面によれば、情報表示用ガラスパネルが提供される。それら は、上記抗菌膜付きガラス板を有する。例えば、ディスプレイパネル、タツチパネルな どが提供される。 [0031] According to yet another aspect of the invention, a glass window for a transport machine is provided. They have the above glass plate with antibacterial film. For example, vehicle, ship or aircraft glass windows are provided. [0032] According to still another aspect of the present invention, an information display glass panel is provided. They have the above glass plate with antibacterial film. For example, display panels and touch panels are provided.
[0033] 上記本発明によれば、抗菌膜の厚さを 2nm以上 lOOnm以下といった範囲に設定 するので、比較的高!、屈折率を有するチタン化合物を用いても反射の干渉色の発生 が抑制された、抗菌膜を備える抗菌膜付きガラス板が提供される。 [0033] According to the present invention, since the thickness of the antibacterial film is set in a range of 2 nm or more and lOOnm or less, generation of reflection interference colors is suppressed even when a titanium compound having a relatively high refractive index is used. An antibacterial film-coated glass plate comprising an antibacterial film is provided.
[0034] また、本発明によれば、フロートガラスの製造工程にお 、て、熔融状態のガラスリボ ンを板状に成形するためのバス内で熱分解法を行うことにより、大面積であり、抗菌 膜の機械的耐久性が高められた抗菌膜付きガラス板を大量に安価に製造する方法 が提供される。 [0034] Further, according to the present invention, in the manufacturing process of the float glass, a large area is obtained by performing a pyrolysis method in a bath for forming a molten glass ribbon into a plate shape. There is provided a method for producing a glass plate with an antibacterial film in which the mechanical durability of the antibacterial film is enhanced in large quantities at a low cost.
[0035] また、本発明によれば、抗菌膜付きガラスを有する物品が提供される。 [0035] Further, according to the present invention, an article having an antibacterial film-coated glass is provided.
図面の簡単な説明 Brief Description of Drawings
[0036] [図 1]本発明の抗菌膜付きガラス板の一例を示す断面図であり、図 1 (a)は抗菌膜が ガラス板上に直接形成されている例を、図 1 (b)はガラス板と抗菌膜との間に下地膜 が介在している例を示す。 [0036] FIG. 1 is a cross-sectional view showing an example of a glass plate with an antibacterial film of the present invention. FIG. 1 (a) shows an example in which the antibacterial film is directly formed on the glass plate. Shows an example in which a base film is interposed between the glass plate and the antibacterial film.
[図 2]オンライン CVD法に使用する装置の略図である。 [Fig. 2] This is a schematic diagram of the equipment used for the on-line CVD method.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0037] 以下、本発明の好ましい実施形態について図面を参照しながら説明する力 本発 明はこれらの実施形態には限定されない。 Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. The present invention is not limited to these embodiments.
[0038] 本明細書において、用語「抗菌」とは、物体に付着する細菌または微生物の増殖を 抑制し、細菌または微生物の生菌数が時間の経過とともに減少することを意味する。 用語「主成分」とは、 50重量%以上を占める成分を意味する。用語「抗菌製品技術 協議会が定める光照射フィルム密着法」とは、抗菌製品技術協議会により定められた 光照射フィルム密着法 (2003年度版)を意味し、特に注記しない場合には、当該密 着法に定められた条件に基づき、抗菌性能の評価を行う。この測定方法は、本件出 願の基礎出願の出願後に JIS R1702 : 2006が発行されるまでは、当業者にとって 、製品の抗菌特性を評価するための最も一般的な測定方法の一つであった。 [0038] In the present specification, the term "antibacterial" means that the growth of bacteria or microorganisms attached to an object is suppressed, and the viable number of bacteria or microorganisms decreases with the passage of time. The term “main component” means a component that occupies 50% by weight or more. The term “light irradiation film adhesion method defined by the Antibacterial Product Technology Council” means the light irradiation film adhesion method (2003 version) established by the Antibacterial Product Technology Council. Antibacterial performance is evaluated based on the conditions stipulated in the dressing law. This measurement method was one of the most common measurement methods for assessing the antibacterial properties of products for those skilled in the art until JIS R1702: 2006 was issued after the basic application of this application was filed. .
[0039] 図 1は、本発明による抗菌膜付きガラス板 4の二形態を説明する断面模式図である
。本発明によるガラス板では、第一の形態として、図 1 (a)に示すように、ガラス板 1上 に、抗菌膜 2が形成されている。 FIG. 1 is a schematic cross-sectional view illustrating two forms of the antibacterial film-coated glass plate 4 according to the present invention. . In the glass plate according to the present invention, as a first embodiment, an antibacterial film 2 is formed on the glass plate 1 as shown in FIG.
[0040] また、第二の形態として、図 1 (b)に示すように、ガラス板 1と抗菌膜 2との間に、 1層 以上の下地膜 3を挟むように構成することが好ましい。この下地膜は、アルカリバリア 機能などの役割を持っていると好ましい。ガラス板 1がアルカリ成分を含むガラス板で ある場合、例えば、抗菌膜 2の成膜工程中にアルカリ成分が抗菌膜 2に移動すると、 抗菌膜の結晶性が悪くなり、抗菌性能が劣化する。その場合、下地膜を挟むように構 成しておけば、アルカリ成分が移動することによる悪影響を防止することができる。 [0040] Further, as the second embodiment, as shown in Fig. 1 (b), it is preferable to configure the base film 3 so as to have one or more layers between the glass plate 1 and the antibacterial film 2. This base film preferably has a role such as an alkali barrier function. When the glass plate 1 is a glass plate containing an alkali component, for example, when the alkali component moves to the antibacterial membrane 2 during the film formation process of the antibacterial membrane 2, the crystallinity of the antibacterial membrane deteriorates and the antibacterial performance deteriorates. In that case, if the base film is sandwiched, adverse effects due to the movement of the alkali component can be prevented.
[0041] [膜厚の好ましい範囲] 抗菌膜の膜厚が大きいと反射干渉色を示し、外観品質を著しく低下させる。一方、 膜厚が小さすぎると、反射干渉色は抑制されるものの抗菌性能が低下してしまう。こ のため、抗菌膜の膜厚としては、 2nm以上 lOOnm以下の範囲が望ましぐさらには 5 nm以上 80nm以下の範囲が好ましい。さらに 20nmを超え 70nm未満の範囲が最も 好ましい。 [Preferable Range of Film Thickness] When the film thickness of the antibacterial film is large, a reflection interference color is exhibited, and the appearance quality is remarkably deteriorated. On the other hand, if the film thickness is too small, the reflection interference color is suppressed, but the antibacterial performance deteriorates. For this reason, the thickness of the antibacterial film is preferably in the range of 2 nm to lOOnm and more preferably in the range of 5 nm to 80 nm. Furthermore, the range of more than 20 nm and less than 70 nm is most preferable.
[0042] [抗菌性能] [0042] [Antimicrobial performance]
本発明の抗菌膜の抗菌性能としては、抗菌製品技術協議会が定める光照射フィル ム密着法(2003年度版)にお 、て、 10 μ WZcm2の光量の紫外光を 24時間照射し た後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z100以 下に減少させる抗菌性能が好ましい。より好ましくは、 10 /z WZcm2の光量の紫外光 を 8時間照射した後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対 して 1Z100以下に減少させる抗菌性能である。また、抗菌製品技術協議会が定め る光照射フィルム密着法(2003年度版)において、 lOOOLxの光量の白色蛍光灯を 24時間照射した後の黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対 して 1Z100以下に減少させる抗菌性能が好ましい。より好ましくは、 500Lxの光量 の白色蛍光灯を 24時間照射した後の黄色ブドウ球菌または大腸菌の菌数を、光照 射前の菌数に対して 1Z100以下に減少させる抗菌性能である。より好ましくは、 25 OLxの光量の白色蛍光灯を 24時間照射した後の黄色ブドウ球菌または大腸菌の菌
数を、光照射前の菌数に対して ΐΖΐοο以下に減少させる抗菌性能である。抗菌性 能評価は微生物を使用した試験であることから、他の物性評価などに比べ、評価試 験誤差が大きくなる。光照射後の菌数が 1Z100以下 (減菌率 99%以上)であれば、 誤差範囲ではなぐ明らかに抗菌性能に関する有利な効果があると言える。社団法 人日本建材 ·住宅設備産業協会においても、抗菌性能評価において、細菌の生存 率が 1%以下 (菌数が 1Z100以下に減少)であれば、抗菌加工品と未加工品との相 違が有意に判定できるとされている。より好ましい範囲としては、光照射後の菌数が 1 Ziooo以下である。更に好ましい範囲としては、光照射後の菌数が 1Z10000以下 である。 The antibacterial performance of the antibacterial film of the present invention is as follows: after the irradiation with ultraviolet light of 10 μWZcm 2 for 24 hours in the light irradiation film adhesion method (2003 version) established by the Antibacterial Product Technical Council. Antibacterial performance that reduces the number of Staphylococcus aureus or Escherichia coli to 1Z100 or less with respect to the number of bacteria before light irradiation is preferred. More preferably, the antibacterial performance is to reduce the number of Staphylococcus aureus or Escherichia coli after irradiation with ultraviolet light of 10 / z WZcm 2 for 8 hours to 1Z100 or less with respect to the number of bacteria before light irradiation. . In addition, according to the light irradiation film adhesion method (2003 version) established by the Antibacterial Product Technology Council, the number of Staphylococcus aureus or Escherichia coli after 24 hours of irradiation with a white fluorescent lamp with a light intensity of lOOOLx is measured before light irradiation. Antibacterial performance that reduces the number of bacteria to 1Z100 or less is preferable. More preferably, the antibacterial performance is to reduce the number of Staphylococcus aureus or Escherichia coli after irradiation with a white fluorescent lamp with a light quantity of 500 Lx for 24 hours to 1Z100 or less with respect to the number of bacteria before light irradiation. More preferably, a staphylococcus aureus or Escherichia coli after being irradiated with a white fluorescent lamp with a light intensity of 25 OLx for 24 hours. Antibacterial performance that reduces the number to less than ΐΖΐοο against the number of bacteria before light irradiation. Since antibacterial performance evaluation is a test using microorganisms, the evaluation test error is larger than other physical property evaluations. If the number of bacteria after light irradiation is 1Z100 or less (the sterilization rate is 99% or more), it can be said that there is clearly an advantageous effect on antibacterial performance that is not within the error range. In Japan Antibacterial Performance Evaluation, if the bacteria survival rate is 1% or less (the number of bacteria is reduced to 1Z100 or less), the difference between antibacterial processed products and unprocessed products Can be judged significantly. As a more preferable range, the number of bacteria after light irradiation is 1 Ziooo or less. As a more preferable range, the number of bacteria after light irradiation is 1Z10000 or less.
[0043] 抗菌性能評価において、照射する紫外光の強度および白色蛍光灯の照度は、使 用される状況に応じて設定する必要がある。紫外光の強度および白色蛍光灯の照度 は、以下の使用場所に代表される。 [0043] In the antibacterial performance evaluation, it is necessary to set the intensity of the ultraviolet light to be irradiated and the illuminance of the white fluorescent lamp according to the usage conditions. The intensity of ultraviolet light and the illuminance of white fluorescent lamps are typified by the following locations.
紫外光 WZcm2 · · '昼間の室内で、太陽光の入る窓から 1. 5m程度離れ た場所。 Ultraviolet light WZcm 2 · · 'In the daytime room, about 1.5m away from the window where sunlight enters.
蛍光灯 lOOOLx · · ·蛍光灯のみが点灯した室内の床から lm程度の高さの場 所。なお、蛍光灯 lOOOLx中の紫外光の強度は、 4 /z WZcm2程度。 Fluorescent lamp lOOOLx · · · A place about lm above the indoor floor where only the fluorescent lamp is lit. The intensity of the ultraviolet light in the fluorescent lamp lOOOLx is, 4 / z WZcm 2 about.
蛍光灯 500Lx · · ·蛍光灯のみが点灯した室内の床面。なお、蛍光灯 1000 Lx中の紫外光の強度は、 2 /z WZcm2程度。 Fluorescent light 500Lx · · · Indoor floor with only fluorescent light on. The intensity of ultraviolet light in fluorescent lamp 1000 Lx is about 2 / z WZcm 2 .
[0044] 本発明により減少させる菌については、特に制限はないが、以下のような菌類に対 して、本発明を用いることができる。例えば、グラム陽性菌 (黄色ブドウ球菌、バチル ス菌など)もしくはグラム陰性菌(大腸菌、サルモネラ菌など)の細菌類、またはカビ、 キノコ、酵母などの真菌類、その他ウィルス、原生生物などがある。 [0044] The bacteria to be reduced by the present invention is not particularly limited, but the present invention can be used for the following fungi. Examples include bacteria of Gram-positive bacteria (S. aureus, Bacillus, etc.) or Gram-negative bacteria (E. coli, Salmonella, etc.), fungi such as fungi, mushrooms, yeasts, other viruses, and protists.
[0045] [抗菌膜の成分] [0045] [Antimicrobial component]
本発明の抗菌膜の主成分としては、酸化チタン、窒素ドープ酸ィ匕チタン、酸窒化チ タンおよび窒化チタン力 なる群力 選択される 1種であることが好ま 、。これらを主 成分とする抗菌膜であれば、抗菌性能が高ぐ化学的安定性に優れているからであ る。 The main component of the antibacterial film of the present invention is preferably one selected from the group power of titanium oxide, nitrogen-doped titanium oxide, titanium oxynitride, and titanium nitride power. This is because an antibacterial film containing these as main components has high antibacterial performance and excellent chemical stability.
[0046] 特に、主成分が窒素ドープ酸ィ匕チタンであることが好ま 、。特に、窒素ドープ酸
化チタンは可視光城の光に応答する光触媒材料であるため、太陽光や蛍光灯に多 く含まれる可視光域の光を利用できる点で好ましい。 [0046] In particular, the main component is preferably nitrogen-doped acid titanium. In particular, nitrogen-doped acid Titanium fluoride is a photocatalytic material that responds to the light of visible light, so it is preferable in that it can use light in the visible light region that is often contained in sunlight and fluorescent lamps.
[0047] [原料] [0047] [Raw material]
(抗菌膜の原料) (Raw material of antibacterial film)
本発明の抗菌膜の原料には、少なくとも 1種以上のチタン含有ィ匕合物と、少なくとも 1種以上の窒素含有ィヒ合物と、少なくとも 1種以上の酸ィヒ性ガスとを含むことが必要 である。 The raw material for the antibacterial membrane of the present invention contains at least one titanium-containing compound, at least one nitrogen-containing compound, and at least one acid gas. is required.
[0048] チタン含有化合物としては、チタン塩化物、チタンアルコキシドゃチタンキレートイ匕 合物などが好ましい。これらチタン含有化合物は、常温では気体または液体であるこ と力 子ましく、常温で液体である場合は、沸点が低い方が好ましい。これら好ましいチ タン含有化合物は、そのまま、あるいは少し加熱するだけで気化し、原料ガスの成分 とすることができる。また、常温で固体であっても、昇華するチタン含有化合物や、ァ ルコールやトルエンなど有機溶媒に溶解できるチタン含有ィ匕合物も用いることができ る。 [0048] The titanium-containing compound is preferably a titanium chloride, a titanium alkoxide or a titanium chelate compound. These titanium-containing compounds are preferably in the form of a gas or liquid at room temperature, and when they are liquid at room temperature, the lower boiling point is preferable. These preferable titanium-containing compounds can be vaporized as they are or by heating a little, and can be used as components of the raw material gas. In addition, a titanium-containing compound that sublimes even if it is solid at room temperature, or a titanium-containing compound that can be dissolved in an organic solvent such as alcohol or toluene can be used.
[0049] このようなチタン含有ィ匕合物として、例えば、四塩ィ匕チタン (TiCl ) ,チタンエトキシ [0049] Examples of such titanium-containing compounds include, for example, tetrasalt-titanium (TiCl), titanium ethoxy
4 Four
ド(Ti(OCH) ),チタンイソプロキシド (Ti(OCH) ),チタンノルマルブトキシド (Ti (Ti (OCH)), Titanium Isoproxide (Ti (OCH)), Titanium Normal Butoxide (Ti
2 5 4 3 7 4 2 5 4 3 7 4
(OC H ) ),チタンァセチルァセトナート((C HO) Ti(CHO) )などを例示でき (OC H)), titanium acetyl cetate ((C HO) Ti (CHO)), etc.
4 9 4 3 7 2 2 5 7 2 2 4 9 4 3 7 2 2 5 7 2 2
る。特に、四塩ィ匕チタン (TiCl ),チタンイソプロキシド (Ti(OC H) ),あるいはチタ The In particular, tetrasalt 匕 titanium (TiCl), titanium isoproxide (Ti (OC H)), or titanium
4 3 7 4 4 3 7 4
ンノルマルブトキシド(Ti(OCH) ),が好適に用いられる。 N-butanol (Ti (OCH)) is preferably used.
4 9 4 4 9 4
[0050] 窒素含有ィ匕合物としては、アンモニア (NH )、アミン類およびヒドラジン誘導体が好 [0050] As the nitrogen-containing compound, ammonia (NH), amines, and hydrazine derivatives are preferable.
3 Three
適であると例示できる。この中でも、アンモニアは、圧縮することにより容易に液ィ匕し、 常温常圧では気体であるため、原料ガスへの導入が容易である点で好ましぐ安価 に大量に入手できる点で特に好ましい。アミンゃヒドラジン誘導体は、反応性が高い ため、品質の良い膜を容易に製造できる点が優れている。一方、高価である点が短 所である。 It can be exemplified as appropriate. Among these, ammonia easily liquefies by compression and is a gas at room temperature and normal pressure, and is particularly preferable in that it can be obtained in a large amount at a preferred low cost because it can be easily introduced into the raw material gas. . Aminyahydrazine derivatives are excellent in that they can easily produce high quality films because of their high reactivity. On the other hand, it is disadvantageous in that it is expensive.
[0051] 酸ィ匕性ガスとしては、酸素(O )を用いることが好ましぐ二酸化炭素(CO ),—酸 [0051] As the acidic gas, it is preferable to use oxygen (O 2). Carbon dioxide (CO 2), acid
2 2 化炭素 (CO),水蒸気 (H O)など、酸素を含む化合物を用いることができる。水 (H Compounds containing oxygen such as carbon dioxide (CO) and water vapor (H 2 O) can be used. Water (H
2 2 twenty two
O)やエステルなどの液体原料を用いた場合、液体原料を気化するための設備が必
要であり、さらに、気化量が不安定になり易い。供給量の制御が容易である気体原料 を用いることが好ましい。これらのうち、酸素を用いることが特に好ましい。また、空気 を用いることもできる。空気を酸ィ匕性ガスとして用いた場合、空気中に含まれる窒素( N )は反応希釈剤として作用させることができる。 When liquid raw materials such as O) and esters are used, facilities for vaporizing the liquid raw materials are required. In addition, the amount of vaporization tends to be unstable. It is preferable to use a gas raw material whose supply amount is easy to control. Of these, it is particularly preferable to use oxygen. Air can also be used. When air is used as an acidic gas, nitrogen (N) contained in the air can act as a reaction diluent.
2 2
[0052] 窒素含有ィ匕合物としてアンモニアを、酸ィ匕性ガスとして酸素を用いた場合、アンモ ユアに対する酸素のモル比(O ZNH比)を 0. 05以上とすることが好ましい。アンモ [0052] When ammonia is used as the nitrogen-containing compound and oxygen is used as the acidic gas, the molar ratio of oxygen to ammonia (O ZNH ratio) is preferably 0.05 or more. Ammo
2 3 twenty three
ユアに対する酸素のモル比を 0. 05以上とすることにより、膜の結晶性を向上させるこ とができるからである。生成した電子と正孔の再結合は、結晶の欠陥部位で起こると 考えられる。従って、結晶性を向上させる、すなわち結晶の欠陥部位を低減させるこ とにより、電子と成功の再結合される割合が減少し、抗菌性を高めることができる。 This is because the crystallinity of the film can be improved by setting the molar ratio of oxygen to air to 0.05 or more. The recombination of the generated electrons and holes is thought to occur at the crystal defect site. Therefore, by improving the crystallinity, that is, by reducing the defect sites of the crystal, the rate of successful recombination with electrons can be reduced and antibacterial properties can be enhanced.
[0053] 本発明の抗菌膜の原料には、チタン含有化合物と、窒素含有化合物との化学反応 を抑制する反応抑制剤をさらに含むことが好ましい。 [0053] The raw material of the antibacterial membrane of the present invention preferably further contains a reaction inhibitor that suppresses a chemical reaction between the titanium-containing compound and the nitrogen-containing compound.
[0054] 反応抑制剤としては、塩ィ匕水素を用いることが好ま 、。 [0054] As the reaction inhibitor, it is preferable to use salt hydrogen.
[0055] チタン含有化合物に四塩化チタンを、窒素含有ィ匕合物にアンモニアを用いた場合 、原料ガスのガラス板への到達までに、気相反応が進行してしまうことがある。この気 相反応が進行すると、原料ガス配管中で固体の反応生成物が生じる。この反応生成 物によって、配管が閉塞することがある。また、この反応生成物は、原料ガスの流れ によってガラス板表面まで輸送され、成膜される膜に取り込まれ、ピンホールなどの 欠点の原因になる。この気相反応を防止するため、反応抑制として塩化水素を用い ることが好ましい。 [0055] When titanium tetrachloride is used as the titanium-containing compound and ammonia is used as the nitrogen-containing compound, the gas phase reaction may proceed before the raw material gas reaches the glass plate. As this gas phase reaction proceeds, a solid reaction product is generated in the raw gas piping. This reaction product may block the piping. In addition, this reaction product is transported to the surface of the glass plate by the flow of the raw material gas, is taken into the film to be formed, and causes defects such as pinholes. In order to prevent this gas phase reaction, it is preferable to use hydrogen chloride as reaction suppression.
[0056] [抗菌膜付きガラス板の製造方法] [0056] [Method for producing glass plate with antibacterial film]
上記の抗菌膜の製造方法は、とくに限定されるものではなぐ熱 CVD法もしくはス プレー法などの公知の熱分解法の他、ガラス表面に上記の抗菌膜の微粉末を付着 させ、その後ガラスごと加熱して前記微粉末を凝集させる方法などが例示される。ま た、この微粉末を凝集させた後に熱分解法により、凝集した微粉末を核として、抗菌 膜を結晶成長させてもよい。これらの中でも、熱分解法とくに熱 CVD法によれば、機 械的耐久性の高 、膜を容易に形成することができる。 The manufacturing method of the antibacterial film is not particularly limited, but a known thermal decomposition method such as a thermal CVD method or a spray method is used. In addition, a fine powder of the antibacterial film is attached to the glass surface, and then the entire glass. Examples thereof include a method of agglomerating the fine powder by heating. Further, after the fine powder is agglomerated, the antibacterial film may be crystal-grown by the thermal decomposition method using the agglomerated fine powder as a nucleus. Among these, the thermal decomposition method, particularly the thermal CVD method, can easily form a film with high mechanical durability.
[0057] 熱 CVD法による成膜は、例えば、ガラス板を基板として用い、所定の大きさのガラ
ス板を加熱し、その加熱したガラス板の表面に、ガス状の原料を吹き付けることによつ て行なうことができる。 [0057] The film formation by the thermal CVD method uses, for example, a glass plate as a substrate and a glass having a predetermined size. This can be done by heating the glass plate and spraying a gaseous raw material on the surface of the heated glass plate.
[0058] 具体的には、以下のようにして行なうことができる。ガラス板をメッシュベルトに載せ て搬送し、トンネル状の加熱炉内を通過させる。ガラス板は加熱炉内に搬送され、被 膜形成ガスが分解する温度 (以下、「被膜形成ガス分解温度」と略す。)まで加熱され る。ガラス板が被膜形成ガス分解温度に加熱されているときに、原料ガスを加熱炉内 に供給する。原料ガスはガラス板の表面の熱によって反応し、ガラス板上に抗菌作用 を有する抗菌膜が形成される。 Specifically, this can be performed as follows. The glass plate is transported on a mesh belt and passed through a tunnel-shaped heating furnace. The glass plate is conveyed into a heating furnace and heated to a temperature at which the film-forming gas decomposes (hereinafter abbreviated as “film-forming gas decomposition temperature”). When the glass plate is heated to the film forming gas decomposition temperature, the source gas is supplied into the heating furnace. The source gas reacts with the heat of the surface of the glass plate, and an antibacterial film having antibacterial action is formed on the glass plate.
[0059] 被膜形成ガス分解温度は、高 ヽ結晶性が得られ、高 ヽ成膜速度が得られる、との 観点から、 500°C以上であることが好ましい。即ち 500°C以上のガラス板の表面に抗 菌膜を形成することが好ましい。 500°C未満の場合には、 TiNCl、 TiCl ·ηΝΗなど [0059] The film-forming gas decomposition temperature is preferably 500 ° C or higher from the viewpoint of obtaining high crystallinity and high film formation rate. That is, it is preferable to form an antibacterial film on the surface of a glass plate at 500 ° C or higher. TiNCl, TiCl · ηΝΗ, etc. when the temperature is below 500 ° C
4 3 の低温生成物ができやすくなるからである。 This is because a low temperature product of 4 3 is easily formed.
[0060] また、熱 CVD法では、ガラス板の製造工程にお 、て、ガラス融液がガラス板に成形 される工程、あるいはガラス板に成形された後の徐冷工程で、ガラス板が高温である ことを利用することが好ましい。なぜなら、高温のガラス板上に原料ガスを供給すれば 、別段の加熱設備を用いることなぐ薄膜を形成できるからである。また、このようにす れば、大きな面積のガラス板に高速で薄膜を形成することができ、建物、車両、デイス プレイパネルなど大面積を必要とする用途の薄膜付きガラス板を製造することができ る。なお、上述のように、製造工程途中の高温のガラス板に成膜する方法は、オンラ イン CVD法と呼ばれる。 [0060] Further, in the thermal CVD method, in the glass plate manufacturing process, the glass plate is heated at a high temperature in the step of forming the glass melt into the glass plate or in the slow cooling step after the glass plate is formed. It is preferable to utilize that. This is because if a raw material gas is supplied onto a high-temperature glass plate, a thin film can be formed without using a separate heating facility. In addition, in this way, a thin film can be formed at high speed on a glass plate having a large area, and a glass plate with a thin film can be produced for applications that require a large area such as buildings, vehicles, and display panels. it can. As described above, the method of forming a film on a high-temperature glass plate in the middle of the manufacturing process is called an online CVD method.
[0061] (バス内 CVD法) [0061] (In-bus CVD method)
上述したガラス融液カゝらガラス板に成形される工程は、フロート法によるガラス板製 造工程においては、熔融スズ槽 (フロートバスと呼ぶ)にて行なわれる。熔融炉 (フロ ート窯と呼ぶ)で融解したガラス融液は、フロートバスに流入する。そのガラス融液は 、途切れることなく長い帯状の板に引き伸ばされており、ガラスリボンと呼ばれる。 The above-described process of forming the glass melt and the glass plate is performed in a molten tin tank (referred to as a float bath) in the glass plate manufacturing process by the float process. The glass melt melted in the melting furnace (called the float kiln) flows into the float bath. The glass melt is drawn into a long strip without interruption and is called a glass ribbon.
[0062] オンライン CVD法をフロートバス内で行なう方法は、バス内 CVD法と呼ばれる。ノ ス内 CVD法には、上述した利点の他に、以下の長所がある。まず、フロートバスの内 部は、大気が侵入しないように雰囲気を制御されている。そのため、ピンホールなど
欠点の抑制が可能である。また、フロートバスにおけるガラスリボンの温度は、非常に 高温である。その温度は、ガラスリボンの糸且成に依存する力 通常のソーダライムシリ ケートガラスの場合、例えば 650〜1150°Cの範囲である。 [0062] A method in which the online CVD method is performed in a float bath is called an in-bus CVD method. In addition to the advantages described above, the intra-CVD method has the following advantages. First, the atmosphere inside the float bath is controlled so that air does not enter. Therefore, pinhole etc. It is possible to suppress defects. The temperature of the glass ribbon in the float bath is very high. The temperature depends on the strength of the glass ribbon. In the case of ordinary soda lime silicate glass, the temperature is, for example, in the range of 650 to 1150 ° C.
[0063] このような温度範囲であれば、抗菌性能を有する薄膜の結晶性を向上させ、抗菌 性能を高めることができる。また、原料ガスが十分な反応性を示すことから、ガラスリボ ンの搬送速度を落さなくとも、そのガラスリボン上に十分な厚さの抗菌性能を有する 薄膜を容易に形成できるようになる。その結果、生産性の向上を見込めるので、抗菌 膜付きガラス板を大量に安価に製造することが可能となる。 [0063] Within such a temperature range, the crystallinity of the thin film having antibacterial performance can be improved and the antibacterial performance can be improved. In addition, since the raw material gas exhibits sufficient reactivity, a thin film having a sufficient thickness of antibacterial performance can be easily formed on the glass ribbon without lowering the conveyance speed of the glass ribbon. As a result, productivity can be expected to increase, and it becomes possible to manufacture a large number of glass plates with antibacterial films at low cost.
[0064] フロート法において、ガラスリボン上にバス内 CVD法で成膜するための装置の一形 態を図 2に示す。図 2に示したように、この装置では、フロート窯 11からフロートバス 1 2内に流れ出し、熔融スズ 15上を帯状に移動するガラスリボン 10の表面力も所定距 離を隔て、所定個数のコータ 16がフロートバス内に配置されている。なお、図 2には 3 つのコータ 16a, 16b, 16cが示されている力 コータの数は膜構成などの設計により 適切に設計し得る。これらのコータからは、抗菌作用を有する抗菌膜、下地膜の原料 がガス状態で供給され、ガラスリボン 10上に連続的に各薄膜が形成されていく。また 、複数のコータを利用すれば、ガラスリボン 10上に、薄膜を積層することができる。ガ ラスリボンの温度は、コータ 16の直前で所定温度となるように、フロートバス内に配置 されたヒータおよびクーラ(図示省略)により調整される。薄膜が形成されたガラスリボ ン 10は、ローラ 17により引き上げられてレア (徐冷窯) 13へと送り込まれる。なお、レ ァ 13で徐冷されたガラス板は、図示を省略する汎用の切断装置により、所定の大き さのガラス板へと切断される。 [0064] Fig. 2 shows an embodiment of an apparatus for forming a film on a glass ribbon by the in-bus CVD method in the float method. As shown in FIG. 2, in this apparatus, the surface force of the glass ribbon 10 that flows out from the float kiln 11 into the float bath 12 and moves in a strip shape on the molten tin 15 is also separated by a predetermined distance, and a predetermined number of coaters 16 Is arranged in the float bath. In FIG. 2, three coaters 16a, 16b and 16c are shown. The number of coaters can be appropriately designed according to the design of the membrane configuration. From these coaters, raw materials for the antibacterial film having an antibacterial action and the base film are supplied in a gas state, and each thin film is continuously formed on the glass ribbon 10. If a plurality of coaters are used, a thin film can be laminated on the glass ribbon 10. The temperature of the glass ribbon is adjusted by a heater and a cooler (not shown) arranged in the float bath so as to reach a predetermined temperature just before the coater 16. The glass ribbon 10 on which the thin film has been formed is pulled up by a roller 17 and fed into a rare (slow cooling kiln) 13. The glass plate slowly cooled by the layer 13 is cut into a glass plate of a predetermined size by a general-purpose cutting device (not shown).
[0065] (レア内 CVD法) [0065] (Rare CVD method)
また、上述した通り、オンライン CVD法を、ガラス板に成形された後の徐冷工程 (レ ァと呼ばれる)で行なうこともできる。この場合、原料ガスの導入は、レア (徐冷窯)の 入り口および Zまたはレアの内部で行なわれる。以下、この方法をレア内 CVD法と 呼ぶ。レア入り口あるいはレア内のレア入り口近傍のガラスリボンは、バス内と比較し て低温ではあるが、成膜反応には充分な高い温度を有している。レア内 CVD法では 、ノ ス内 CVD法とは異なり、以下の特長がある。まず、バス内 CVD法に適さない原
料、例えば、バス内 CVD法のガラスリボン温度では反応速度が速すぎるような原料 や、フロートバスに好ましくない影響を及ぼす懸念のあるような原料であっても、採用 することができる。また、フロートバスを持たないガラス板製造工程に適用することが できる。例えば、ロールアウト法によるガラス板製造工程に適用して、抗菌作用を有 する抗菌膜を形成した型板ガラスや網入りガラス,線入りガラスを製造することができ る。 Further, as described above, the on-line CVD method can also be performed in a slow cooling step (called “rare”) after being formed into a glass plate. In this case, the raw material gas is introduced at the inlet of the rare (slow cooling kiln) and Z or inside the rare. Hereinafter, this method is referred to as a rare-layer CVD method. Although the glass ribbon near the rare entrance or the rare entrance in the rare is at a lower temperature than in the bath, it has a sufficiently high temperature for the film formation reaction. The rare CVD method has the following features, unlike the chemical CVD method. First of all, it is not suitable for bus CVD method. For example, a raw material whose reaction rate is too high at the glass ribbon temperature of the CVD method in the bath, or a raw material that may have an unfavorable effect on the float bath can be used. It can also be applied to glass plate manufacturing processes that do not have a float bath. For example, it can be applied to a glass plate manufacturing process by a roll-out method, and a plate glass, a netted glass, and a wire glass having an antibacterial film having an antibacterial action can be manufactured.
実施例 Example
[0066] 以下、実施例により本発明をさらに詳細に説明するが、本発明は以下の実施例に より制限されるものではない。 [0066] Hereinafter, the present invention will be described in more detail by way of examples. However, the present invention is not limited to the following examples.
[0067] (実施例 1〜12、比較例) [0067] (Examples 1 to 12, comparative example)
厚さ 0. 7mmの無アルカリガラス板を、一辺が 10cmの正方形となるように切断し、 洗浄した後に乾燥させた。このガラス板の一方の表面に、常圧熱 CVD装置の搬送 炉を用いて、常圧熱 CVD法により窒素ドープ酸ィ匕チタン膜を成膜した。具体的には A non-alkali glass plate having a thickness of 0.7 mm was cut into a square having a side of 10 cm, washed, and then dried. On one surface of this glass plate, a nitrogen-doped titanium oxide film was formed by atmospheric pressure CVD using a transfer furnace of an atmospheric pressure thermal CVD apparatus. In particular
、以下の通りである。 Is as follows.
[0068] 前述のガラス板をメッシュベルトに載せ、前述の炉内を搬送してガラス板を加熱した 。ガラス板の温度が約 850°Cに達する炉内の領域において、ガラス板の表面に原料 ガスを供給することによって、窒素ドープ酸ィ匕チタン膜を成膜した。この原料ガスには 、四塩化チタン (TiCl )、酸素(O )、アンモニア (NH )、反応抑制剤として塩化水素 [0068] The above glass plate was placed on a mesh belt and conveyed in the above furnace to heat the glass plate. In the region in the furnace where the temperature of the glass plate reached about 850 ° C, a nitrogen-doped titanium oxide film was formed by supplying a source gas to the surface of the glass plate. This source gas includes titanium tetrachloride (TiCl), oxygen (O), ammonia (NH), and hydrogen chloride as a reaction inhibitor.
4 2 3 4 2 3
(HC1)を採用し、窒素ガスで所定濃度に希釈したガスを用いた。原料ガスの濃度お よび搬送速度を調節することによって、窒素ドープ酸ィ匕チタン膜を形成した。 (HC1) was employed, and a gas diluted with nitrogen gas to a predetermined concentration was used. A nitrogen-doped titanium oxide film was formed by adjusting the concentration of the source gas and the conveying speed.
[0069] (実施例 13〜14) [0069] (Examples 13 to 14)
図 2に示した装置を用いて、バス内 CVD法により、ガラスリボン表面に薄膜を形成し た。具体的には、以下のとおりである。 Using the equipment shown in Fig. 2, a thin film was formed on the surface of the glass ribbon by the CVD method in the bus. Specifically, it is as follows.
[0070] フロート窯で熔融し、温度を 1150〜: L 100°Cに制御したガラス融液を、フロートバス に流入させた。フロートバスにおいて、ガラス融液は冷却されつつガラスリボンに成形 された。ガラスリボンは厚さが 4. Ommになるように成形した。第 1のコータ(図 2中 16a )により、ガラスリボン上に下地膜として SiO膜を、 50nmの厚みとなるように形成した [0070] A glass melt melted in a float kiln and controlled at a temperature of 1150-: L 100 ° C was allowed to flow into the float bath. In the float bath, the glass melt was formed into a glass ribbon while being cooled. The glass ribbon was molded to a thickness of 4. Omm. The first coater (16a in Fig. 2) formed an SiO film with a thickness of 50 nm on the glass ribbon as a base film.
2 2
。その後、第 2のコータ(図 2中 16b)から、原料ガスを吹き付けて薄膜を形成した。
[0071] 実施例 13においては、原料ガスには、四塩ィ匕チタン (TiCl )、酢酸ェチル (C H O . Thereafter, a raw material gas was sprayed from the second coater (16b in FIG. 2) to form a thin film. [0071] In Example 13, the raw material gases include tetrasalt 匕 titanium (TiCl), ethyl acetate (CHO
4 4 8 4 4 8
)を採用し、窒素ガスで所定濃度に希釈したガスを用いた。原料ガスの濃度および) And a gas diluted to a predetermined concentration with nitrogen gas was used. Source gas concentration and
2 2
搬送速度を調節することによって、酸化チタン膜を形成した。 A titanium oxide film was formed by adjusting the conveyance speed.
[0072] 実施例 14においては、実施例 1〜 12および比較例同様の原料ガスを用い、窒素ド ープ酸化チタン膜を形成した。 In Example 14, a nitrogen-doped titanium oxide film was formed using the same source gas as in Examples 1 to 12 and the comparative example.
[0073] (抗菌膜の膜厚) [0073] (Antimicrobial film thickness)
薄膜を形成したガラス板の断面を走査型電子顕微鏡 (SEM)で観察することにより 測定した。 The cross section of the glass plate on which the thin film was formed was measured by observing it with a scanning electron microscope (SEM).
[0074] (干渉色) [0074] (Interference color)
目視観察にて干渉色の有無を判断した。 The presence or absence of interference colors was judged by visual observation.
[0075] (抗菌性能) [0075] (Antimicrobial performance)
得られた膜の抗菌特性を、抗菌製品技術協議会が定める光照射フィルム密着法に より評価した。 The antibacterial properties of the obtained films were evaluated by the light irradiation film adhesion method established by the Antibacterial Product Technical Council.
[0076] (抗菌性能試験 1) [0076] (Antimicrobial performance test 1)
上記、抗菌製品技術協議会が定める光照射フィルム密着法に基づき、ブラックライ ト蛍光ランプ (東芝ライテック製 FL20S 'BLB'JET20W)を用い、紫外線強度計(ト プコン製 UVR— 2、受光部 UD— 36)にて測定した紫外線強度が 10 WZcm2とな るように調節し、湿度 95%、温度 25°Cの条件下で、紫外線を 24時間照射させた。試 験菌には黄色ブドウ菌種(Staphylococcus aureus NBRC12732)を用いた評価を実 施した。また、実施例 3、 5、 8〜14については、試験菌に大腸菌(Escherichiacoli N BRC3972)を用いた評価も実施した。 Based on the light irradiation film adhesion method stipulated by the antibacterial product technology council above, using a black light fluorescent lamp (FL20S 'BLB'JET20W manufactured by Toshiba Lighting & Technology Corporation), an ultraviolet intensity meter (UVR-2 manufactured by Topcon, light receiving unit UD— The ultraviolet intensity measured in 36) was adjusted to 10 WZcm 2 and irradiated with ultraviolet rays for 24 hours under the conditions of 95% humidity and 25 ° C. The test bacteria were evaluated using Staphylococcus aureus NBRC12732. Moreover, about Example 3, 5, 8-14, evaluation using Escherichia coli (Escherichiacoli N BRC3972) as a test microbe was also implemented.
[0077] 実施例 1〜14および比較例のいずれの薄膜についても、紫外線照射 24時間後の 黄色ブドウ球菌の数は、 1Z100以下に減少しており、良好な抗菌性を有している。 また、実施例 3、 5、 8〜14の薄膜においては、紫外線照射 24時間後の大腸菌の数 は、 1Z100以下に減少しており、良好な抗菌性を有していた。 [0077] In any of the thin films of Examples 1 to 14 and the comparative example, the number of Staphylococcus aureus after 24 hours of ultraviolet irradiation is reduced to 1Z100 or less, and has good antibacterial properties. In addition, in the thin films of Examples 3, 5, and 8 to 14, the number of E. coli after 24 hours of ultraviolet irradiation was reduced to 1Z100 or less, and had good antibacterial properties.
[0078] (抗菌性能試験 2) [0078] (Antimicrobial performance test 2)
実施例 3、 5、 8〜14について、紫外線強度を 10 /z WZcm2となるように調節し、紫 外線の照射時間を 8時間とした以外は、上記の (抗菌性能試験 1)と同様に試験を実
施した。試験菌には黄色ブドウ菌種(Staphylococcus aureus NBRC12732)を用いた 評価を実施した。 For Examples 3, 5, and 8-14, the UV intensity was adjusted to 10 / z WZcm 2 and the irradiation time of ultraviolet rays was set to 8 hours, as in (Antibacterial performance test 1) above. Test gave. The test strain was evaluated using Staphylococcus aureus NBRC12732.
[0079] 実施例 3、 5、 8〜14のいずれの薄膜についても、紫外線照射 8時間後の細菌数は 、 1Z100以下に減少しており、良好な抗菌性を有していた。 [0079] In any of the thin films of Examples 3, 5, and 8 to 14, the number of bacteria after 8 hours of ultraviolet irradiation was reduced to 1Z100 or less and had good antibacterial properties.
[0080] (抗菌性能試験 3) [0080] (Antimicrobial performance test 3)
実施例 3、 5、 8〜14について、上記、抗菌製品技術協議会が定める光照射フィル ム密着法に基づき、白色蛍光灯を用い、照度が lOOOLxとなるように調節し、白色蛍 光灯の照射時間を 24時間とした以外は、上記の (抗菌性能試験 1)と同様に試験を 実施した。試験菌には黄色ブドウ菌種(Staphylococcus aureus NBRC12732)および 大腸菌(Escherichia coli NBRC3972)を用いた評価を実施した。 For Examples 3, 5, and 8-14, based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council, using a white fluorescent lamp, adjusting the illuminance to lOOOLx, the white fluorescent lamp The test was conducted in the same manner as the above (Antibacterial performance test 1) except that the irradiation time was 24 hours. The test bacteria were evaluated using Staphylococcus aureus NBRC12732 and Escherichia coli NBRC3972.
[0081] 実施例 3、 5、 8〜14のいずれの薄膜についても、紫外線照射 24時間後の細菌数 は、 1Z100以下に減少しており、良好な抗菌性を有していた。 [0081] In any of the thin films of Examples 3, 5, and 8 to 14, the number of bacteria after 24 hours of ultraviolet irradiation was reduced to 1Z100 or less and had good antibacterial properties.
[0082] (抗菌性能試験 4) [0082] (Antimicrobial performance test 4)
実施例 3、 5、 9〜14について、上記、抗菌製品技術協議会が定める光照射フィル ム密着法に基づき、白色蛍光灯を用い、照度が 500Lxとなるように調節し、白色蛍 光灯の照射時間を 24時間とした以外は、上記の (抗菌性能試験 1)と同様に試験を 実施した。試験菌には黄色ブドウ菌種(Staphylococcus aureus NBRC12732)を用 いた評価を実施した。 For Examples 3, 5, and 9-14, based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council, the white fluorescent lamp was adjusted so that the illuminance was 500 Lx. The test was conducted in the same manner as the above (Antibacterial performance test 1) except that the irradiation time was 24 hours. The test bacteria were evaluated using Staphylococcus aureus NBRC12732.
[0083] 実施例 3、 5、 9〜14のいずれの薄膜についても、紫外線照射 24時間後の細菌数 は、 1Z100以下に減少しており、良好な抗菌性を有していた。 [0083] In any of the thin films of Examples 3, 5, and 9 to 14, the number of bacteria after 24 hours of ultraviolet irradiation decreased to 1Z100 or less, and had good antibacterial properties.
[0084] (抗菌性能試験 5) [0084] (Antimicrobial performance test 5)
実施例 4、 9、 12〜13について、上記、抗菌製品技術協議会が定める光照射フィ ルム密着法に基づき、白色蛍光灯を用い、照度が 250Lxとなるように調節し、白色 蛍光灯の照射時間を 24時間とした以外は、上記の (抗菌性能試験 1)と同様に試験 を実施した。試験菌には黄色ブドウ菌種(Staphylococcus aureus NBRC12732)を用 いた評価を実施した。 For Examples 4, 9, and 12-13, based on the light irradiation film adhesion method defined by the Antibacterial Product Technical Council, the white fluorescent lamp was adjusted so that the illuminance was 250 Lx, and the white fluorescent lamp was irradiated. The test was conducted in the same manner as (Antibacterial performance test 1) except that the time was 24 hours. The test bacteria were evaluated using Staphylococcus aureus NBRC12732.
[0085] 実施例 4、 9、 12〜13のいずれの薄膜についても、紫外線照射 24時間後の細菌 数は、 1Z100以下に減少しており、良好な抗菌性を有していた。
[0086] 以上の結果を表に示す。 [0085] In any of the thin films of Examples 4, 9, and 12 to 13, the number of bacteria after 24 hours of ultraviolet irradiation was reduced to 1Z100 or less and had good antibacterial properties. [0086] The above results are shown in the table.
[0087] [表 1]
[0087] [Table 1]
[0088] 表に示すように、実施例 1〜14の薄膜は、膜厚が 5〜80nmの範囲にあるので、干 渉色は生じていな力つた。他方、膜厚が 150nmである比較例の薄膜には、干渉色が 生じていた。 [0088] As shown in the table, the thin films of Examples 1 to 14 had a thickness in the range of 5 to 80 nm, and thus had no interference color. On the other hand, an interference color occurred in the comparative thin film having a thickness of 150 nm.
産業上の利用可能性 Industrial applicability
[0089] 本発明の抗菌膜付きガラス板は、建築物のガラス窓、輸送機械のガラス窓、情報表 示用ガラスパネル等の分野において、従来と異なり、反射の干渉色が生じがたぐ機 械的耐久性が高められた抗菌膜付きガラス板を提供できるという点で大きな利用価 値を有する。
[0089] The glass plate with an antibacterial film of the present invention is different from conventional ones in the fields of glass windows for buildings, glass windows for transportation machinery, glass panels for information display, etc. It has a great utility value in that it can provide a glass plate with an antibacterial film with improved mechanical durability.
Claims
[1] ガラス板上に、直接又は下地膜を介した抗菌膜を備える抗菌膜付きガラス板であつ て、前記抗菌膜の膜厚が 2nm以上 lOOnm以下である抗菌膜付きガラス板。 [1] An antibacterial film-attached glass plate comprising an antibacterial film directly or via a base film on a glass plate, wherein the antibacterial film has a film thickness of 2 nm or more and lOOnm or less.
[2] 前記抗菌膜の抗菌性能が、抗菌製品技術協議会が定める光照射フィルム密着法 に基づき 10 μ WZcm2の光量の紫外光を 24時間照射した後の黄色ブドウ球菌また は大腸菌の菌数を、光照射前の菌数に対して 1Z100以下に減少させる抗菌性能で ある請求項 1に記載の抗菌膜付きガラス板。 [2] The antibacterial performance of the antibacterial membrane is the number of Staphylococcus aureus or Escherichia coli after irradiation with ultraviolet light of 10 μWZcm 2 for 24 hours based on the light irradiation film adhesion method established by the Antibacterial Product Technical Council. The glass plate with an antibacterial film according to claim 1, which has an antibacterial performance that reduces the number of bacteria to 1Z100 or less with respect to the number of bacteria before light irradiation.
[3] 前記抗菌膜の抗菌性能が、抗菌製品技術協議会が定める光照射フィルム密着法 に基づき 10 μ WZcm2の光量の紫外光を 8時間照射した後の黄色ブドウ球菌または 大腸菌の菌数を、光照射前の菌数に対して 1Z100以下に減少させる抗菌性能であ る請求項 1に記載の抗菌膜付きガラス板。 [3] The antibacterial performance of the antibacterial film is the number of Staphylococcus aureus or Escherichia coli after irradiation with ultraviolet light of 10 μWZcm 2 for 8 hours based on the light irradiation film adhesion method established by the Antibacterial Product Technical Council. 2. The glass plate with an antibacterial film according to claim 1, which has antibacterial performance that reduces the number of bacteria before light irradiation to 1Z100 or less.
[4] 前記抗菌膜の抗菌性能が、 lOOOLxの光量の白色蛍光灯を 24時間照射した後の 黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z100以下に減 少させる抗菌性能である請求項 1に記載の抗菌膜付きガラス板。 [4] The antibacterial performance of the antibacterial membrane reduces the number of Staphylococcus aureus or Escherichia coli after irradiation with a white fluorescent lamp with a light quantity of lOOOLx for 24 hours to 1Z100 or less compared to the number of bacteria before light irradiation. The glass plate with an antibacterial film according to claim 1, which has antibacterial performance.
[5] 前記抗菌膜の抗菌性能が、 500Lxの光量の白色蛍光灯を 24時間照射した後の 黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z100以下に減 少させる抗菌性能である請求項 1に記載の抗菌膜付きガラス板。 [5] The antibacterial performance of the antibacterial membrane reduces the number of Staphylococcus aureus or Escherichia coli after irradiation with a white fluorescent lamp with a light quantity of 500Lx for 24 hours to 1Z100 or less with respect to the number of bacteria before light irradiation. The glass plate with an antibacterial film according to claim 1, which has antibacterial performance.
[6] 前記抗菌膜の抗菌性能が、 250Lxの光量の白色蛍光灯を 24時間照射した後の 黄色ブドウ球菌または大腸菌の菌数を、光照射前の菌数に対して 1Z100以下に減 少させる抗菌性能である請求項 1に記載の抗菌膜付きガラス板。 [6] The antibacterial performance of the antibacterial membrane reduces the number of Staphylococcus aureus or Escherichia coli after irradiation with a white fluorescent lamp with a light intensity of 250 Lx for 24 hours to 1Z100 or less with respect to the number of bacteria before light irradiation. The glass plate with an antibacterial film according to claim 1, which has antibacterial performance.
[7] 前記抗菌性能が、黄色ブドウ球菌又は大腸菌の菌数を、 1Z10000以下に減少さ せる抗菌性能である請求項 1に記載の抗菌膜付きガラス板。 7. The glass plate with an antibacterial film according to claim 1, wherein the antibacterial performance is an antibacterial performance that reduces the number of Staphylococcus aureus or Escherichia coli to 1Z10000 or less.
[8] 前記抗菌膜の膜厚が、 5nm以上 80nm以下である請求項 1に記載の抗菌膜付きガ ラス板。 8. The glass plate with an antibacterial film according to claim 1, wherein the antibacterial film has a thickness of 5 nm or more and 80 nm or less.
[9] 前記抗菌膜の膜厚が、 25nmを超え 70nm未満である請求項 1に記載の抗菌膜付 きガラス板。 [9] The glass plate with an antibacterial film according to [1], wherein the film thickness of the antibacterial film is more than 25 nm and less than 70 nm.
[10] 前記抗菌膜の主成分が、酸化チタン、窒素ドープ酸ィ匕チタン、酸窒化チタンおよび 窒化チタン力 なる群力 選択される 1種である請求項 1に記載の抗菌膜付きガラス
板。 [10] The glass with an antibacterial film according to claim 1, wherein the main component of the antibacterial film is one selected from the group force of titanium oxide, nitrogen-doped titanium oxide, titanium oxynitride, and titanium nitride power. Board.
[11] 前記抗菌膜の主成分が、窒素ドープ酸ィ匕チタンである請求項 10に記載の抗菌膜 付きガラス板。 11. The glass plate with an antibacterial film according to claim 10, wherein a main component of the antibacterial film is nitrogen-doped titanium dioxide.
[12] 請求項 1に記載の抗菌膜付きガラス板の製造方法であって、前記抗菌膜を熱分解 法により形成する抗菌膜付きガラス板の製造方法。 12. The method for producing a glass plate with an antibacterial film according to claim 1, wherein the antibacterial film is formed by a thermal decomposition method.
[13] 前記抗菌膜を、被膜形成ガスが分解する温度以上に保持されたガラス板表面また はガラス板製造工程におけるガラスリボン表面に、被膜形成ガスを供給することによ つて形成する請求項 12記載の抗菌膜付きガラス板の製造方法。 [13] The antibacterial film is formed by supplying a film-forming gas to a glass plate surface maintained at a temperature higher than a temperature at which the film-forming gas decomposes or a glass ribbon surface in the glass plate manufacturing process. The manufacturing method of the glass plate with an antibacterial film of description.
[14] 前記被膜形成ガスが、チタン含有化合物、窒素含有化合物および酸化性ガスを含 む請求項 13に記載の抗菌膜付きガラス板の製造方法。 14. The method for producing a glass plate with an antibacterial film according to claim 13, wherein the film-forming gas contains a titanium-containing compound, a nitrogen-containing compound, and an oxidizing gas.
[15] 前記被膜形成ガスが、前記チタン含有ィ匕合物と前記窒素含有ィ匕合物との化学反 応を抑制する反応抑制剤をさらに含む請求項 14に記載の抗菌膜付きガラス板の製 造方法。 [15] The glass plate with an antibacterial film according to [14], wherein the film-forming gas further includes a reaction inhibitor that suppresses a chemical reaction between the titanium-containing compound and the nitrogen-containing compound. Production method.
[16] 前記窒素含有ィ匕合物が、アンモニアである請求項 14に記載の抗菌膜付きガラス板 の製造方法。 16. The method for producing a glass plate with an antibacterial film according to claim 14, wherein the nitrogen-containing compound is ammonia.
[17] 前記酸ィ匕性ガスが、酸素である請求項 14に記載の抗菌膜付きガラス板の製造方 法。 17. The method for producing a glass plate with an antibacterial film according to claim 14, wherein the acidic gas is oxygen.
[18] 前記被覆形成ガス中における、窒素含有化合物に対する酸化性ガスのモル比が、 0. 05以上である請求項 14に記載の抗菌膜付きガラス板の製造方法。 18. The method for producing a glass plate with an antibacterial film according to claim 14, wherein a molar ratio of the oxidizing gas to the nitrogen-containing compound in the coating forming gas is 0.05 or more.
[19] 前記反応抑制剤が、塩ィ匕水素である請求項 15に記載の抗菌膜付きガラス板の製 造方法。 19. The method for producing a glass plate with an antibacterial film according to claim 15, wherein the reaction inhibitor is salty hydrogen.
[20] 前記熱分解法が、フロート法によるガラスの製造工程における、熔融状態のガラスリ ボンを板状に成形するためのバス内で行う CVD法である請求項 12に記載の抗菌膜 付きガラス板の製造方法。 [20] The glass plate with an antibacterial film according to [12], wherein the thermal decomposition method is a CVD method performed in a bath for forming a glass ribbon in a molten state into a plate shape in a glass manufacturing process by a float method. Manufacturing method.
[21] 請求項 1に記載の抗菌膜付きガラス板を有する、建築物のガラス窓。 [21] A glass window of a building having the glass plate with an antibacterial film according to claim 1.
[22] 請求項 1に記載の抗菌膜付きガラス板を有する、建築物内のガラス間仕切り。 [22] A glass partition in a building having the glass plate with an antibacterial film according to claim 1.
[23] 請求項 1に記載の抗菌膜付きガラス板を有する、家具。 [23] A furniture comprising the glass plate with an antibacterial film according to claim 1.
[24] 請求項 1に記載の抗菌膜付きガラス板を有する、輸送機械のガラス窓。
[25] 請求項 1に記載の抗菌膜付きガラス板を有する、情報表示用ガラスパネル。
[24] A glass window for a transport machine, comprising the glass plate with an antibacterial film according to claim 1. [25] An information display glass panel comprising the antibacterial film-coated glass plate according to [1].
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006078818A JP2007254192A (en) | 2006-03-22 | 2006-03-22 | Glass plate with antibacterial film, its producing method, and article having the glass plate |
JP2006-078818 | 2006-03-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2007108514A1 true WO2007108514A1 (en) | 2007-09-27 |
Family
ID=38522540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/055915 WO2007108514A1 (en) | 2006-03-22 | 2007-03-22 | Glass plate having antibacterial film, method of producing the same and article having the glass plate |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2007254192A (en) |
WO (1) | WO2007108514A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012246213A (en) * | 2011-05-02 | 2012-12-13 | Hoya Corp | Glass substrate of cover glass for electronic equipment and method for manufacturing the same |
DE102014013528A1 (en) | 2014-09-12 | 2016-03-17 | Schott Ag | Coated glass or glass-ceramic substrate with stable multifunctional surface properties, process for its preparation and its use |
GB202011249D0 (en) | 2020-07-21 | 2020-09-02 | Pilkington Group Ltd | Antimicrobial substrate |
WO2022090708A1 (en) | 2020-10-26 | 2022-05-05 | Pilkington Group Limited | Use of coated substrates |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022048048A (en) * | 2020-09-14 | 2022-03-25 | 日本板硝子株式会社 | Display device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08187604A (en) * | 1994-12-28 | 1996-07-23 | Mitsubishi Materials Corp | Cutting tool of surface coated tungsten carbide based cemented carbide with its hard coating layer having excellent inter-layer adhesion |
JP2000143299A (en) * | 1998-11-10 | 2000-05-23 | Nippon Sheet Glass Co Ltd | Window glass having photocatalytic function |
WO2002004376A1 (en) * | 2000-07-12 | 2002-01-17 | Nippon Sheet Glass Co., Ltd. | Photocatalytic member |
JP2003190809A (en) * | 2001-10-15 | 2003-07-08 | Jfe Steel Kk | Method for manufacturing composite material formed with photocatalyst film |
JP2004105904A (en) * | 2002-09-20 | 2004-04-08 | Toto Ltd | Method for decomposition of basic substance by photocatalyst and photocatalyst used for the decomposition |
-
2006
- 2006-03-22 JP JP2006078818A patent/JP2007254192A/en active Pending
-
2007
- 2007-03-22 WO PCT/JP2007/055915 patent/WO2007108514A1/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08187604A (en) * | 1994-12-28 | 1996-07-23 | Mitsubishi Materials Corp | Cutting tool of surface coated tungsten carbide based cemented carbide with its hard coating layer having excellent inter-layer adhesion |
JP2000143299A (en) * | 1998-11-10 | 2000-05-23 | Nippon Sheet Glass Co Ltd | Window glass having photocatalytic function |
WO2002004376A1 (en) * | 2000-07-12 | 2002-01-17 | Nippon Sheet Glass Co., Ltd. | Photocatalytic member |
JP2003190809A (en) * | 2001-10-15 | 2003-07-08 | Jfe Steel Kk | Method for manufacturing composite material formed with photocatalyst film |
JP2004105904A (en) * | 2002-09-20 | 2004-04-08 | Toto Ltd | Method for decomposition of basic substance by photocatalyst and photocatalyst used for the decomposition |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012246213A (en) * | 2011-05-02 | 2012-12-13 | Hoya Corp | Glass substrate of cover glass for electronic equipment and method for manufacturing the same |
DE102014013528A1 (en) | 2014-09-12 | 2016-03-17 | Schott Ag | Coated glass or glass-ceramic substrate with stable multifunctional surface properties, process for its preparation and its use |
DE102014013528B4 (en) | 2014-09-12 | 2022-06-23 | Schott Ag | Coated glass or glass-ceramic substrate with stable multifunctional surface properties, method for its production and its use |
WO2021260370A1 (en) | 2020-06-23 | 2021-12-30 | Pilkington Group Limited | Antimicrobial substrate |
GB202011249D0 (en) | 2020-07-21 | 2020-09-02 | Pilkington Group Ltd | Antimicrobial substrate |
WO2022090708A1 (en) | 2020-10-26 | 2022-05-05 | Pilkington Group Limited | Use of coated substrates |
Also Published As
Publication number | Publication date |
---|---|
JP2007254192A (en) | 2007-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2069252B1 (en) | Low-maintenance coating technology | |
US6228502B1 (en) | Material having titanium dioxide crystalline orientation film and method for producing the same | |
US7211513B2 (en) | Process for chemical vapor desposition of a nitrogen-doped titanium oxide coating | |
CN105517968B (en) | Heat treatable coated glass pane | |
SK287462B6 (en) | Photocatalytically-activated self-cleaning article and method of making same | |
EP2817433B1 (en) | Chemical vapor deposition process for depositing a silica coating on a glass substrate | |
EP2563734B1 (en) | A method of depositing niobium doped titania film on a substrate and the coated substrate made thereby | |
US20120258858A1 (en) | Method for deposition by sputtering, resulting product, and sputtering target | |
EP2758350B1 (en) | Process for forming a silica coating on a glass substrate | |
JP5607180B2 (en) | Silicon thin-film solar cell with improved haze and method for manufacturing the same | |
JPWO2006054730A1 (en) | Manufacturing method of glass plate with thin film | |
EP1608793B1 (en) | Titania coatings | |
WO2007108514A1 (en) | Glass plate having antibacterial film, method of producing the same and article having the glass plate | |
TW201313946A (en) | Deposition of silicon oxide by atmospheric pressure chemical vapor deposition | |
JP5886832B2 (en) | Method for producing coated articles having antibacterial and / or antifungal coatings and products produced therefrom | |
EP1730087B1 (en) | Process for the deposition of aluminium oxide coatings | |
NL9400329A (en) | Coated glass and process for its manufacture. | |
EP2714607B1 (en) | Method and device for coating a float glass strip | |
EP3162773B1 (en) | Substrate provided with low-reflection coating, method for its production and photoelectric conversion device containing it. | |
JP2012020936A (en) | Vapor deposition of iron oxide coating onto glass substrate | |
EP3417088B1 (en) | Chemical vapor deposition process for depositing a coating | |
JP2003238205A (en) | Thin film deposition method and substrate provided with thin film deposited by the method | |
EP3191423B1 (en) | Chemical vapour deposition process for depositing a titanium oxide coating | |
GB2466805A (en) | Deposition of an antibacterial coating using flame assisted chemical vapour deposition | |
JP2007185641A (en) | Plate glass having photocatalytic film and its manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 07739358 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 07739358 Country of ref document: EP Kind code of ref document: A1 |