WO2007094849A3 - Antireflective coating material - Google Patents

Antireflective coating material Download PDF

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Publication number
WO2007094849A3
WO2007094849A3 PCT/US2006/046811 US2006046811W WO2007094849A3 WO 2007094849 A3 WO2007094849 A3 WO 2007094849A3 US 2006046811 W US2006046811 W US 2006046811W WO 2007094849 A3 WO2007094849 A3 WO 2007094849A3
Authority
WO
WIPO (PCT)
Prior art keywords
value
antireflective coating
coating material
group
mhsio
Prior art date
Application number
PCT/US2006/046811
Other languages
French (fr)
Other versions
WO2007094849A2 (en
Inventor
Peng-Fei Fu
Eric Scott Moyer
Original Assignee
Dow Corning
Peng-Fei Fu
Eric Scott Moyer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning, Peng-Fei Fu, Eric Scott Moyer filed Critical Dow Corning
Publication of WO2007094849A2 publication Critical patent/WO2007094849A2/en
Publication of WO2007094849A3 publication Critical patent/WO2007094849A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)

Abstract

Silsesquioxane resins useful in forming the antireflective coating having the formula (PhSiO(3-x)/2(OH)x)mHSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p(RSiO(3-x)/2(OH)x)q where Ph is a phenyl group, Me is a methyl group, R is a polyethylene oxide group, x has a value of 0, 1 or 2; m has a value of 0.01 to 0.99, n has a value of 0.01 to 0.99, p has a value of 0.01 to 0.99, q has a value of 0.01 to 0.50 and m + n + p + q ≈ l.
PCT/US2006/046811 2006-02-13 2006-12-07 Antireflective coating material WO2007094849A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77261606P 2006-02-13 2006-02-13
US60/772,616 2006-02-13

Publications (2)

Publication Number Publication Date
WO2007094849A2 WO2007094849A2 (en) 2007-08-23
WO2007094849A3 true WO2007094849A3 (en) 2008-05-22

Family

ID=38371945

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/046811 WO2007094849A2 (en) 2006-02-13 2006-12-07 Antireflective coating material

Country Status (2)

Country Link
TW (1) TW200731015A (en)
WO (1) WO2007094849A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8809482B2 (en) 2008-12-10 2014-08-19 Dow Corning Corporation Silsesquioxane resins

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2238198A4 (en) 2008-01-15 2011-11-16 Dow Corning Silsesquioxane resins
EP2376584B1 (en) * 2008-12-10 2014-07-16 Dow Corning Corporation Wet-etchable antireflective coatings

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020187422A1 (en) * 2000-06-23 2002-12-12 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer
US20030120018A1 (en) * 1999-06-10 2003-06-26 Teresa Baldwin Spin-on-glass anti-reflective coatings for photolithography
US20050282090A1 (en) * 2002-12-02 2005-12-22 Hirayama Kawasaki-Shi Composition for forming antireflection coating
WO2006065321A1 (en) * 2004-12-17 2006-06-22 Dow Corning Corporation Method for forming anti-reflective coating

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030120018A1 (en) * 1999-06-10 2003-06-26 Teresa Baldwin Spin-on-glass anti-reflective coatings for photolithography
US20020187422A1 (en) * 2000-06-23 2002-12-12 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer
US20050282090A1 (en) * 2002-12-02 2005-12-22 Hirayama Kawasaki-Shi Composition for forming antireflection coating
WO2006065321A1 (en) * 2004-12-17 2006-06-22 Dow Corning Corporation Method for forming anti-reflective coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8809482B2 (en) 2008-12-10 2014-08-19 Dow Corning Corporation Silsesquioxane resins

Also Published As

Publication number Publication date
WO2007094849A2 (en) 2007-08-23
TW200731015A (en) 2007-08-16

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