WO2007031317A3 - Verfahren zum aufbringen einer porösen glasschicht - Google Patents
Verfahren zum aufbringen einer porösen glasschicht Download PDFInfo
- Publication number
- WO2007031317A3 WO2007031317A3 PCT/EP2006/008968 EP2006008968W WO2007031317A3 WO 2007031317 A3 WO2007031317 A3 WO 2007031317A3 EP 2006008968 W EP2006008968 W EP 2006008968W WO 2007031317 A3 WO2007031317 A3 WO 2007031317A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- glass layer
- porous glass
- applying
- pvd
- porosity
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 239000005373 porous glass Substances 0.000 title abstract 3
- 239000011148 porous material Substances 0.000 abstract 1
- 238000001556 precipitation Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249961—With gradual property change within a component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249978—Voids specified as micro
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249982—With component specified as adhesive or bonding agent
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Die Erfindung betrifft ein Verfahren zum Aufbringen einer porösen Glasschicht. Es wird vorgeschlagen, eine poröse Glasschicht mittels eines PVD-Verfahrens aufzubringen. Porositätsgrad und mittlere Porengröße können über die Prozessparameter wie Druck und Abscheiderate sowie durch gezieltes Zusetzen von Fremdstoffen variiert werden.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2006800414015A CN101305111B (zh) | 2005-09-16 | 2006-09-14 | 用于施设多孔的玻璃层的方法 |
EP06792064A EP1924720A2 (de) | 2005-09-16 | 2006-09-14 | Verfahren zum aufbringen einer porösen glasschicht |
US12/067,021 US20090011217A1 (en) | 2005-09-16 | 2006-09-14 | Method for applying a porous glass layer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005044522.5 | 2005-09-16 | ||
DE200510044522 DE102005044522B4 (de) | 2005-09-16 | 2005-09-16 | Verfahren zum Aufbringen einer porösen Glasschicht, sowie Verbundmaterial und dessen Verwendung |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007031317A2 WO2007031317A2 (de) | 2007-03-22 |
WO2007031317A3 true WO2007031317A3 (de) | 2007-05-18 |
Family
ID=37451214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2006/008968 WO2007031317A2 (de) | 2005-09-16 | 2006-09-14 | Verfahren zum aufbringen einer porösen glasschicht |
Country Status (5)
Country | Link |
---|---|
US (1) | US20090011217A1 (de) |
EP (1) | EP1924720A2 (de) |
CN (1) | CN101305111B (de) |
DE (1) | DE102005044522B4 (de) |
WO (1) | WO2007031317A2 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007058926B4 (de) | 2007-12-05 | 2010-04-29 | Schott Ag | Solarglas und Verfahren zur Herstellung eines Solarglases sowie dessen Verwendung |
DE102007058927B4 (de) | 2007-12-05 | 2010-04-29 | Schott Ag | Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials sowie dessen Verwendung |
DE102008046579A1 (de) * | 2008-09-10 | 2010-03-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer optischen Wellenleiterschicht |
DE102009034532A1 (de) * | 2009-07-23 | 2011-02-03 | Msg Lithoglas Ag | Verfahren zum Herstellen einer strukturierten Beschichtung auf einem Substrat, beschichtetes Substrat sowie Halbzeug mit einem beschichteten Substrat |
WO2011153369A2 (en) * | 2010-06-02 | 2011-12-08 | University Of Washington Through Its Center For Commercialization | Porous glass articles formed using cold work process |
EP3287109B1 (de) * | 2011-06-10 | 2023-11-29 | The Procter & Gamble Company | Saugfähige struktur für saugfähige artikel |
JP2013127602A (ja) * | 2011-11-18 | 2013-06-27 | Canon Inc | 光学部材、撮像装置、光学部材の製造方法及び撮像装置の製造方法 |
DE102012100288B4 (de) | 2012-01-13 | 2016-03-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines Kunststoffsubstrats mit einer porösen Schicht |
CN104380432A (zh) * | 2012-03-30 | 2015-02-25 | Msg里松格莱斯股份公司 | 半导体器件和用于制造类玻璃层的方法 |
JP6080386B2 (ja) * | 2012-05-23 | 2017-02-15 | キヤノン株式会社 | 光学部材、撮像装置及び光学部材の製造方法 |
FR2992778A1 (fr) * | 2012-06-29 | 2014-01-03 | Commissariat Energie Atomique | Batterie de type lithium-ion avec une cathode a porosite variable et procede correspondant |
US10017849B2 (en) * | 2012-11-29 | 2018-07-10 | Corning Incorporated | High rate deposition systems and processes for forming hermetic barrier layers |
DE102016101013A1 (de) * | 2016-01-21 | 2017-07-27 | Von Ardenne Gmbh | Verfahren, Beschichtungsvorrichtung und Prozessieranordnung |
US10995624B2 (en) * | 2016-08-01 | 2021-05-04 | General Electric Company | Article for high temperature service |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5660611A (en) * | 1992-03-17 | 1997-08-26 | Sumitomo Electric Industries, Ltd. | Method for producing glass thin film |
US20020031917A1 (en) * | 2000-09-11 | 2002-03-14 | Takashi Nire | Method for forming porous film, insulating film for semiconductor element, and method for forming such insulating film |
WO2004065295A1 (en) * | 2003-01-17 | 2004-08-05 | Ciba Specialty Chemicals Holding Inc. | A process for the production of porous inorganic materials or a matrix material containing nanoparticles |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1696110B1 (de) * | 1968-01-23 | 1971-07-01 | Jenaer Glaswerk Schott & Gen | Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlen |
US4001049A (en) * | 1975-06-11 | 1977-01-04 | International Business Machines Corporation | Method for improving dielectric breakdown strength of insulating-glassy-material layer of a device including ion implantation therein |
DE3305854C1 (de) * | 1983-02-19 | 1984-09-06 | Schott Glaswerke, 6500 Mainz | Verfahren zur Herstellung von poroesem Sinterglas mit grossem offenem Porenvolumen |
US5070046A (en) * | 1989-10-19 | 1991-12-03 | E. I. Du Pont De Nemours And Company | Dielectric compositions |
DE4427921C2 (de) * | 1994-08-06 | 2002-09-26 | Forschungszentrum Juelich Gmbh | Chemische Sensoren, insbesondere Biosensoren, auf Siliciumbasis |
JPH08117575A (ja) * | 1994-10-18 | 1996-05-14 | Agency Of Ind Science & Technol | 超微細な細孔を有する多孔質ガラス膜、その製造方法および高選択性ガス分離膜 |
CA2322714A1 (en) * | 1999-10-25 | 2001-04-25 | Ainissa G. Ramirez | Article comprising improved noble metal-based alloys and method for making the same |
DE10222964B4 (de) * | 2002-04-15 | 2004-07-08 | Schott Glas | Verfahren zur Gehäusebildung bei elektronischen Bauteilen sowie so hermetisch verkapselte elektronische Bauteile |
JP2005105244A (ja) * | 2003-01-24 | 2005-04-21 | National Institute Of Advanced Industrial & Technology | 半導体超微粒子及び蛍光体 |
TWI238675B (en) * | 2004-01-19 | 2005-08-21 | Hitachi Displays Ltd | Organic light-emitting display and its manufacture method |
-
2005
- 2005-09-16 DE DE200510044522 patent/DE102005044522B4/de not_active Expired - Fee Related
-
2006
- 2006-09-14 CN CN2006800414015A patent/CN101305111B/zh not_active Expired - Fee Related
- 2006-09-14 WO PCT/EP2006/008968 patent/WO2007031317A2/de active Application Filing
- 2006-09-14 US US12/067,021 patent/US20090011217A1/en not_active Abandoned
- 2006-09-14 EP EP06792064A patent/EP1924720A2/de not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5660611A (en) * | 1992-03-17 | 1997-08-26 | Sumitomo Electric Industries, Ltd. | Method for producing glass thin film |
US20020031917A1 (en) * | 2000-09-11 | 2002-03-14 | Takashi Nire | Method for forming porous film, insulating film for semiconductor element, and method for forming such insulating film |
WO2004065295A1 (en) * | 2003-01-17 | 2004-08-05 | Ciba Specialty Chemicals Holding Inc. | A process for the production of porous inorganic materials or a matrix material containing nanoparticles |
Also Published As
Publication number | Publication date |
---|---|
DE102005044522B4 (de) | 2010-02-11 |
EP1924720A2 (de) | 2008-05-28 |
CN101305111B (zh) | 2012-08-29 |
CN101305111A (zh) | 2008-11-12 |
DE102005044522A1 (de) | 2007-03-22 |
WO2007031317A2 (de) | 2007-03-22 |
US20090011217A1 (en) | 2009-01-08 |
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