WO2006131517A3 - Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage - Google Patents

Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage Download PDF

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Publication number
WO2006131517A3
WO2006131517A3 PCT/EP2006/062929 EP2006062929W WO2006131517A3 WO 2006131517 A3 WO2006131517 A3 WO 2006131517A3 EP 2006062929 W EP2006062929 W EP 2006062929W WO 2006131517 A3 WO2006131517 A3 WO 2006131517A3
Authority
WO
WIPO (PCT)
Prior art keywords
light
illuminating device
projection exposure
microlithographic projection
exposure system
Prior art date
Application number
PCT/EP2006/062929
Other languages
English (en)
French (fr)
Other versions
WO2006131517A2 (de
Inventor
Damian Fiolka
Michael Totzeck
Ralf Scharnweber
Joerg Zenke
Original Assignee
Zeiss Carl Smt Ag
Damian Fiolka
Michael Totzeck
Ralf Scharnweber
Joerg Zenke
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Damian Fiolka, Michael Totzeck, Ralf Scharnweber, Joerg Zenke filed Critical Zeiss Carl Smt Ag
Publication of WO2006131517A2 publication Critical patent/WO2006131517A2/de
Publication of WO2006131517A3 publication Critical patent/WO2006131517A3/de

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polarising Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Die vorliegende Erfindung betrifft eine Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, in welcher eine Vorzugsrichtung der Polarisation weitgehend oder vollständig eliminiert werden kann. Die Beleuchtungseinrichtung weist eine Lichtquelle (135), welche entlang einer Lichtausbreitungsrichtung sich ausbreitendes, im Wesentlichen linear polarisiertes Licht erzeugt, ein Lichtmischsystem (148), einen Depolarisator (10, 30, 40), welcher in Lichtausbreitungsrichtung vor dem Lichtmischsystem (148) angeordnet ist und in Verbindung mit dem Lichtmischsystem (148) in einer Beleuchtungsebene zumindest zum Teil eine effektive Depolarisation bewirkt, und eine Lambda/4-Platte (20), welche in der Lichtausbreitungsrichtung nach dem Depolarisator (10, 30, 40) angeordnet ist, auf.
PCT/EP2006/062929 2005-06-07 2006-06-06 Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage WO2006131517A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US68793705P 2005-06-07 2005-06-07
US60/687,937 2005-06-07

Publications (2)

Publication Number Publication Date
WO2006131517A2 WO2006131517A2 (de) 2006-12-14
WO2006131517A3 true WO2006131517A3 (de) 2007-05-03

Family

ID=36764237

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2006/062929 WO2006131517A2 (de) 2005-06-07 2006-06-06 Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage

Country Status (1)

Country Link
WO (1) WO2006131517A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007010650A1 (de) 2007-03-02 2008-09-04 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102007019831B4 (de) 2007-04-25 2012-03-01 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102007055063A1 (de) 2007-11-16 2009-05-28 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102007055567A1 (de) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
DE102011080614A1 (de) 2010-09-27 2012-04-26 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
JP5926953B2 (ja) * 2011-12-28 2016-05-25 日本分光株式会社 偏光解消板およびこれを用いた円二色性分光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19829612A1 (de) * 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
WO2005050718A1 (ja) * 2003-11-20 2005-06-02 Nikon Corporation 光束変換素子、照明光学装置、露光装置、および露光方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19829612A1 (de) * 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
WO2005050718A1 (ja) * 2003-11-20 2005-06-02 Nikon Corporation 光束変換素子、照明光学装置、露光装置、および露光方法
EP1693885A1 (de) * 2003-11-20 2006-08-23 Nikon Corporation Lichtfluss-umsetzungselement, optische beleuchtungseinrichtung, belichtungssystem und belichtungsverfahren

Also Published As

Publication number Publication date
WO2006131517A2 (de) 2006-12-14

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