WO2006114764A3 - Position measuring system - Google Patents
Position measuring system Download PDFInfo
- Publication number
- WO2006114764A3 WO2006114764A3 PCT/IB2006/051283 IB2006051283W WO2006114764A3 WO 2006114764 A3 WO2006114764 A3 WO 2006114764A3 IB 2006051283 W IB2006051283 W IB 2006051283W WO 2006114764 A3 WO2006114764 A3 WO 2006114764A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radiation
- emitting element
- position measuring
- emitting
- measuring system
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/4255—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application for alignment or positioning purposes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
Abstract
Known position measuring systems must be well aligned to provide the necessary resolution for applications such as lithography. The proposed position measuring system (1) comprises a radiation emitting element (2) emitting a radiation beam (3). The radiation beam (3) is diffracted by a diffraction grating (7). First and second diffracted beams (10, 11) having symmetric diffraction orders are reflected back to the radiation-emitting element (2). Meanwhile, the actual frequency of the radiation beam (3) emitting from the radiation-emitting element (2) has been changed so that a beat pattern is produced in the radiation-emitting element (2). By means of a measuring beam (23) this beat pattern is detected in a detector (25).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05103425 | 2005-04-27 | ||
EP05103425.4 | 2005-04-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006114764A2 WO2006114764A2 (en) | 2006-11-02 |
WO2006114764A3 true WO2006114764A3 (en) | 2007-03-08 |
Family
ID=37215141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2006/051283 WO2006114764A2 (en) | 2005-04-27 | 2006-04-25 | Position measuring system |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW200643369A (en) |
WO (1) | WO2006114764A2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114112075B (en) * | 2021-11-18 | 2024-07-23 | 西安邮电大学 | Analytical dual-wavelength phase decoupling method |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5164789A (en) * | 1990-11-09 | 1992-11-17 | Hitachi, Ltd. | Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference |
US5214489A (en) * | 1990-04-25 | 1993-05-25 | Nikon Corporation | Aligning device for exposure apparatus |
US5500734A (en) * | 1993-05-21 | 1996-03-19 | Dr. Johannes Heidenhain Gmbh | Photoelectric position measuring system with integral optical circuit having phase shifted interference gratings |
US5506684A (en) * | 1991-04-04 | 1996-04-09 | Nikon Corporation | Projection scanning exposure apparatus with synchronous mask/wafer alignment system |
EP0947833A1 (en) * | 1998-03-09 | 1999-10-06 | OTM Technologies, Ltd. | Optical translation measurement |
-
2006
- 2006-04-25 TW TW095114731A patent/TW200643369A/en unknown
- 2006-04-25 WO PCT/IB2006/051283 patent/WO2006114764A2/en not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5214489A (en) * | 1990-04-25 | 1993-05-25 | Nikon Corporation | Aligning device for exposure apparatus |
US5164789A (en) * | 1990-11-09 | 1992-11-17 | Hitachi, Ltd. | Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference |
US5506684A (en) * | 1991-04-04 | 1996-04-09 | Nikon Corporation | Projection scanning exposure apparatus with synchronous mask/wafer alignment system |
US5500734A (en) * | 1993-05-21 | 1996-03-19 | Dr. Johannes Heidenhain Gmbh | Photoelectric position measuring system with integral optical circuit having phase shifted interference gratings |
EP0947833A1 (en) * | 1998-03-09 | 1999-10-06 | OTM Technologies, Ltd. | Optical translation measurement |
Non-Patent Citations (1)
Title |
---|
SUHURA T ET AL: "MONOLITHIC INTEGRATED-OPTIC POSITION/DISPLACEMENT SENSOR USING WAVEGUIDE GRATINGS AND QW-DFB LASER", IEEE PHOTONICS TECHNOLOGY LETTERS, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, vol. 7, no. 10, 1 October 1995 (1995-10-01), pages 1195 - 1197, XP000537235, ISSN: 1041-1135 * |
Also Published As
Publication number | Publication date |
---|---|
TW200643369A (en) | 2006-12-16 |
WO2006114764A2 (en) | 2006-11-02 |
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