WO2006045439A3 - A system and a method for generating periodic and/or quasi-periodic pattern on a sample - Google Patents

A system and a method for generating periodic and/or quasi-periodic pattern on a sample Download PDF

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Publication number
WO2006045439A3
WO2006045439A3 PCT/EP2005/010986 EP2005010986W WO2006045439A3 WO 2006045439 A3 WO2006045439 A3 WO 2006045439A3 EP 2005010986 W EP2005010986 W EP 2005010986W WO 2006045439 A3 WO2006045439 A3 WO 2006045439A3
Authority
WO
WIPO (PCT)
Prior art keywords
periodic
distance
sample
quasi
mask
Prior art date
Application number
PCT/EP2005/010986
Other languages
French (fr)
Other versions
WO2006045439A2 (en
Inventor
Harun H Solak
Original Assignee
Scherrer Inst Paul
Harun H Solak
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36228141&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2006045439(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from EP04025105A external-priority patent/EP1650602A1/en
Application filed by Scherrer Inst Paul, Harun H Solak filed Critical Scherrer Inst Paul
Priority to AT05803386T priority Critical patent/ATE502325T1/en
Priority to US11/665,323 priority patent/US8841046B2/en
Priority to JP2007537166A priority patent/JP4724183B2/en
Priority to DE602005026968T priority patent/DE602005026968D1/en
Priority to EP05803386A priority patent/EP1810085B1/en
Priority to CN2005800362815A priority patent/CN101052921B/en
Publication of WO2006045439A2 publication Critical patent/WO2006045439A2/en
Publication of WO2006045439A3 publication Critical patent/WO2006045439A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)

Abstract

It is the aim of this invention to provide a system and a method to achieve periodic and quasi-periodic patterns with periods in the 5-100 nm range in a cost effective way. Of course, the system has also general applicability to patterns periods outside this range. This aim is achieved by the present invention which discloses a system for generating periodic and/or quasi-periodic pattern on a sample by using an interference lithography technique; the system comprising: a) a photon source; b) a mask having a periodic or quasi-periodic pattern that corresponds to the desired pattern; said mask being disposed at a first distance from the photon source or after intermediate optical elements such as collimators, collectors, mirrors, lenses, filters and apertures; c) a sample holder for holding the sample being disposed in a second distance from the mask on the side opposite to the photon source, thereby the second distance is chosen to be in a range where the intensity distribution is substantially stationary and distance-invariant or the second distance is varied to obtain a desired average intensity distribution on the sample surface.
PCT/EP2005/010986 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample WO2006045439A2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
AT05803386T ATE502325T1 (en) 2004-10-22 2005-10-13 SYSTEM AND METHOD FOR GENERATING A PERIODIC AND/OR NEAR-PERIODIC PATTERN ON A SAMPLE
US11/665,323 US8841046B2 (en) 2004-10-22 2005-10-13 System and a method for generating periodic and/or quasi-periodic pattern on a sample
JP2007537166A JP4724183B2 (en) 2004-10-22 2005-10-13 System and method for generating periodic and / or quasi-periodic patterns on a sample
DE602005026968T DE602005026968D1 (en) 2004-10-22 2005-10-13 SYSTEM AND METHOD FOR PRODUCING A PERIODIC AND / OR FASTER PERIODIC PATTERN ON A SAMPLE
EP05803386A EP1810085B1 (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample
CN2005800362815A CN101052921B (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP04025105.0 2004-10-22
EP04025105A EP1650602A1 (en) 2004-10-22 2004-10-22 A system and a method for generating periodic and /or quasi-periodic pattern on a sample
EP05003271 2005-02-16
EP05003271.3 2005-02-16

Publications (2)

Publication Number Publication Date
WO2006045439A2 WO2006045439A2 (en) 2006-05-04
WO2006045439A3 true WO2006045439A3 (en) 2006-09-14

Family

ID=36228141

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/010986 WO2006045439A2 (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample

Country Status (7)

Country Link
US (1) US8841046B2 (en)
EP (1) EP1810085B1 (en)
JP (1) JP4724183B2 (en)
CN (1) CN101052921B (en)
AT (1) ATE502325T1 (en)
DE (1) DE602005026968D1 (en)
WO (1) WO2006045439A2 (en)

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CN111856636B (en) * 2020-07-03 2021-10-22 中国科学技术大学 Variable-pitch grating mask line density distribution controllable fine adjustment method

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AU2010210169B2 (en) 2009-02-05 2015-04-09 Paul Scherrer Institut Low dose single step grating based X-ray phase contrast imaging
WO2011057835A1 (en) 2009-11-13 2011-05-19 Eulitha Ag Optimized mask design for fabricating periodic and quasi-periodic patterns
US8368871B2 (en) 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US9036133B2 (en) 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US9007566B2 (en) 2010-07-07 2015-04-14 Eulitha Ag Apparatus and method for printing a periodic pattern with a large depth of focus
US8525973B2 (en) * 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns
JP5901643B2 (en) * 2010-11-16 2016-04-13 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ Method and apparatus for printing a high-resolution two-dimensional periodic pattern
CN103403621B (en) 2010-12-23 2015-11-25 尤利塔股份公司 For producing the system and method for nanostructured over a large area
US9280056B2 (en) 2011-01-12 2016-03-08 Eulitha A.G. Method and system for printing high-resolution periodic patterns
EP2711746A4 (en) * 2011-05-19 2015-04-01 Hitachi High Tech Corp Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
WO2012164539A1 (en) 2011-06-01 2012-12-06 Eulitha A.G. Printing periodic patterns using multiple lasers
JP5757413B2 (en) * 2011-06-29 2015-07-29 大日本印刷株式会社 Phase modulation mask, exposure apparatus and exposure method
JP5838622B2 (en) * 2011-07-05 2016-01-06 大日本印刷株式会社 Exposure apparatus and exposure method
EP2976678B1 (en) 2013-03-18 2017-06-14 Eulitha A.G. Methods and systems for printing periodic patterns
WO2015008365A1 (en) * 2013-07-18 2015-01-22 ギガフォトン株式会社 Exposure device
JP5943886B2 (en) * 2013-08-20 2016-07-05 株式会社東芝 Pattern forming method and exposure mask
JP6356510B2 (en) * 2014-07-15 2018-07-11 東芝メモリ株式会社 Exposure method and exposure apparatus
CN107533285B (en) 2014-12-22 2021-02-05 尤利塔股份公司 Method for printing color image
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CN105242500B (en) * 2015-11-10 2017-07-11 中国科学院光电技术研究所 A kind of etching system being imaged certainly based on ultraviolet wide spectrum Taibo
US10394984B2 (en) 2015-11-25 2019-08-27 International Business Machines Corporation Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
JP6768067B2 (en) 2015-12-14 2020-10-14 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ Methods and systems for printing an array of geometric elements
CN106115681A (en) * 2016-07-11 2016-11-16 浙江工业大学 One realizes the patterned method of two-dimensional material
CN106054298B (en) * 2016-08-23 2019-02-26 京东方科技集团股份有限公司 A kind of grating and 3D display device
DE102017115169A1 (en) 2017-07-06 2019-01-10 Temicon Gmbh Generation of exposed structures on a workpiece
KR102467826B1 (en) 2018-04-19 2022-11-18 유리타 아. 게. Method and system for printing large periodic patterns by overlapping exposure fields
US11042098B2 (en) * 2019-02-15 2021-06-22 Applied Materials, Inc. Large area high resolution feature reduction lithography technique
EP3977206A4 (en) * 2019-05-30 2023-06-14 Microtau IP Pty Ltd. Systems and methods for fabricating microstructures
WO2023119224A1 (en) 2021-12-22 2023-06-29 Eulitha A.G. A method and apparatus for improving the uniformity of exposure of a periodic pattern

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111856636B (en) * 2020-07-03 2021-10-22 中国科学技术大学 Variable-pitch grating mask line density distribution controllable fine adjustment method

Also Published As

Publication number Publication date
US8841046B2 (en) 2014-09-23
ATE502325T1 (en) 2011-04-15
CN101052921B (en) 2013-03-27
CN101052921A (en) 2007-10-10
WO2006045439A2 (en) 2006-05-04
EP1810085B1 (en) 2011-03-16
DE602005026968D1 (en) 2011-04-28
JP2008517472A (en) 2008-05-22
JP4724183B2 (en) 2011-07-13
EP1810085A2 (en) 2007-07-25
US20080186579A1 (en) 2008-08-07

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