WO2006044688A1 - Wide bandgap material and method of making it - Google Patents

Wide bandgap material and method of making it Download PDF

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Publication number
WO2006044688A1
WO2006044688A1 PCT/US2005/037060 US2005037060W WO2006044688A1 WO 2006044688 A1 WO2006044688 A1 WO 2006044688A1 US 2005037060 W US2005037060 W US 2005037060W WO 2006044688 A1 WO2006044688 A1 WO 2006044688A1
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Prior art keywords
wide bandgap
silicon carbide
boule
semiconductor material
bandgap semiconductor
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PCT/US2005/037060
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French (fr)
Inventor
Narsingh Bahadur Singh
Andre Berghmans
Tracy Ann Waite
Mike Aumer
Hong Zhang
Darren Thomson
David Kahler
Abigail Kirschenbaum
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Northrop Grumman Corp
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Northrop Grumman Corp
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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/27—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using selective deposition, e.g. simultaneous growth of monocrystalline and non-monocrystalline semiconductor materials
    • H10P14/271—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using selective deposition, e.g. simultaneous growth of monocrystalline and non-monocrystalline semiconductor materials characterised by the preparation of substrate for selective deposition
    • H10P14/274—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using selective deposition, e.g. simultaneous growth of monocrystalline and non-monocrystalline semiconductor materials characterised by the preparation of substrate for selective deposition using seed materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2902—Materials being Group IVA materials
    • H10P14/2904—Silicon carbide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
    • H10P14/3408—Silicon carbide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
    • H10P14/3411—Silicon, silicon germanium or germanium

Definitions

  • the invention in general relates to semiconductors and more particularly to a semiconductor material having a wide bandgap and high mobility.
  • SiC silicon carbide
  • SiC is a wide bandgap semiconductor having excellent properties for high power applications such as in power generation, power distribution, switches, filters, and broadband power RF transmitters, to name a few.
  • Devices of SiC exhibit high efficiency, high linearity as well as low noise and are operable at x-band (around 8- 12 GHz) in addition to Ku-band (12- 18 GHz) and Ka-band (27-40 GHz).
  • a wide bandgap semiconductor in general exhibits desirable thermal properties, has high power capability, radiation insensitivity with high temperature high frequency and low noise operation.
  • SiC has a relatively higher mobility than these other materials. Mobility basically is an indication of charge carrier (holes or electrons) scattering. In a high mobility semiconductor these charge carriers move with less scattering resulting in a higher current per unit of electric field.
  • a wide bandgap semiconductor material is fabricated and is comprised of Silicon carbide containing a predetermined portion of germanium. With the wide bandgap semiconductor material having a formula of Si(i -X )Ge( X )C, 0 ⁇ x ⁇ .05. The material is preferably grown by the physical vapor transport process.
  • Fig. 1 is a simplified presentation of a PVT growth system.
  • novel wide bandgap material of the present invention may be fabricated by a number of well-known processes, however it will be described, by way of example, with respect to the PVT (physical vapor transport) growth process.
  • PVT physical vapor transport
  • a seed crystal of silicon carbide is positioned within a furnace system which also includes a source, or feedstock, generally in powder form.
  • the feedstock is heated to a particular temperature, with the seed crystal maintained at a different, and lower, temperature whereby the silicon carbide sublimes, forming various molecular species such as Si, Si2C and SiC2.
  • silicon carbide is deposited upon the seed crystal, forming and growing a boule. After the boule is grown to a desired size, it is removed from the furnace system and then prepared and sliced into wafers which may be used as semiconductor device substrates.
  • Fig. 1 shows, in rudimentary form, a typical apparatus for growing silicon carbide boules by the aforementioned PVT method.
  • the apparatus includes a furnace system 10 having a vacuum tight enclosure formed by coaxial quartz cylinders 12 and 13, with a cooling water flow between them.
  • a silicon carbide seed crystal 16 is mounted on a seed holder 18 having a hollow portion 20 directly behind the seed crystal 16 for cooling purposes.
  • a crystal growth structure surrounds the seed crystal 15 and includes a porous graphite wall 22 surrounded by a graphite susceptor 24 and defining an interior growth cavity 26 for boule 28.
  • a thermal insulation 30 surrounds the components.
  • feedstock 38 Disposed axially below seed crystal 16 is a feedstock 38, containing silicon carbide powder, within feedstock container 40.
  • germanium is also added to the feedstock in the proportion of around 1: 1 for growing a silicon germanium carbide boule 28 of a composition Si(i -X )Ge( X )C, where 0 ⁇ x ⁇ 0.05.
  • the required temperature for growth of the resulting silicon germanium carbide boule 28 is provided by a heating system such as an RF coil 42, which may be inside or outside of the enclosure formed by cylinders 12 and 13.
  • feedstock container 40, and its contents may also be heated by a resistance, or ladder heater 44, which surrounds the container 40 and is supplied with electrical energy at terminals 47 and 47.
  • the silicon carbide seed crystal 16 and silicon carbide /germanium feedstock 38 are placed in position surrounded by the thermal insulation 30 and the furnace system is brought down to a near vacuum pressure of, for example, 10" 7 Torr by means of pressure control unit 50.
  • the heater system is then activated to drive off any adsorbed gases in order to reduce any electrically active impurities which may be present.
  • the interior pressure is then increased to near atmospheric pressure and then reduced to operating pressure and the temperatures for boule growth are established.
  • This gas is introduced via gas passageway 52 leading into the furnace interior.
  • a typical PVT-type SiGeC boule grown as described herein was determined to have a bandgap of around 3.68 eV with a mobility of 110 cm 2 /Vs.
  • Source temperature - 2190° C
  • the SiGeC material is the described PVT process, other processes are also possible.
  • the material may be made by the CVD (chemical vapor deposition) process or the
  • MOCVD metal organic chemical vapor deposition

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

A wide bandgap semiconductor material comprised of Silicon carbide containing a predetermined portion of germanium.

Description

WIDE BANDGAP MATERIAL AND METHOD OF MAKING IT
BACKGROUND OF THE INVENTION
Field of the invention
[0001] The invention in general relates to semiconductors and more particularly to a semiconductor material having a wide bandgap and high mobility.
Description of related art
[0002] SiC (silicon carbide) is a wide bandgap semiconductor having excellent properties for high power applications such as in power generation, power distribution, switches, filters, and broadband power RF transmitters, to name a few. Devices of SiC exhibit high efficiency, high linearity as well as low noise and are operable at x-band (around 8- 12 GHz) in addition to Ku-band (12- 18 GHz) and Ka-band (27-40 GHz).
[0003] A wide bandgap semiconductor (bandgap energy > 2 eV) in general exhibits desirable thermal properties, has high power capability, radiation insensitivity with high temperature high frequency and low noise operation. Although other semiconductor materials may exhibit a higher bandgap value than SiC, SiC has a relatively higher mobility than these other materials. Mobility basically is an indication of charge carrier (holes or electrons) scattering. In a high mobility semiconductor these charge carriers move with less scattering resulting in a higher current per unit of electric field.
[0004] It is a primary object of the present invention to provide a novel SiC- based semiconductor with higher a higher bandgap and higher mobility than conventional SiC. SUMMARY OF THE INVENTION
[0005] A wide bandgap semiconductor material is fabricated and is comprised of Silicon carbide containing a predetermined portion of germanium. With the wide bandgap semiconductor material having a formula of Si(i-X)Ge(X)C, 0<x≤.05. The material is preferably grown by the physical vapor transport process.
[0006] Further scope of applicability of the present invention will become apparent from the detailed description provided hereinafter. It should be understood, however, that the detailed description and specific example, while disclosing the preferred embodiment of the invention, is provided by way of illustration only, since various changes and modifications within the spirit and scope of the invention will become apparent to those skilled in the art, from the detailed description.
BRIEF DESCRIPTION OF THE DRAWINGS
[0007] The present invention will become more fully understood from the detailed description provided hereinafter and the accompanying drawing, which is not necessarily to scale, and is given by way of illustration only, and wherein:
[0008] Fig. 1 is a simplified presentation of a PVT growth system.
DESCRIPTION OF THE PREFERRED EMBODIMENT
[0009] The novel wide bandgap material of the present invention may be fabricated by a number of well-known processes, however it will be described, by way of example, with respect to the PVT (physical vapor transport) growth process.
[0010] Basically, In the PVT process, a seed crystal of silicon carbide is positioned within a furnace system which also includes a source, or feedstock, generally in powder form. The feedstock is heated to a particular temperature, with the seed crystal maintained at a different, and lower, temperature whereby the silicon carbide sublimes, forming various molecular species such as Si, Si2C and SiC2. As a result of this, silicon carbide is deposited upon the seed crystal, forming and growing a boule. After the boule is grown to a desired size, it is removed from the furnace system and then prepared and sliced into wafers which may be used as semiconductor device substrates.
[0011] Fig. 1 shows, in rudimentary form, a typical apparatus for growing silicon carbide boules by the aforementioned PVT method. The apparatus includes a furnace system 10 having a vacuum tight enclosure formed by coaxial quartz cylinders 12 and 13, with a cooling water flow between them. A silicon carbide seed crystal 16 is mounted on a seed holder 18 having a hollow portion 20 directly behind the seed crystal 16 for cooling purposes.
[0012] A crystal growth structure surrounds the seed crystal 15 and includes a porous graphite wall 22 surrounded by a graphite susceptor 24 and defining an interior growth cavity 26 for boule 28. A thermal insulation 30 surrounds the components.
[0013] Disposed axially below seed crystal 16 is a feedstock 38, containing silicon carbide powder, within feedstock container 40. In the present invention germanium is also added to the feedstock in the proportion of around 1: 1 for growing a silicon germanium carbide boule 28 of a composition Si(i-X)Ge(X)C, where 0<x<0.05. The required temperature for growth of the resulting silicon germanium carbide boule 28 is provided by a heating system such as an RF coil 42, which may be inside or outside of the enclosure formed by cylinders 12 and 13. In addition, feedstock container 40, and its contents, may also be heated by a resistance, or ladder heater 44, which surrounds the container 40 and is supplied with electrical energy at terminals 47 and 47.
[0014] To grow the silicon germanium carbide boule 28, the silicon carbide seed crystal 16 and silicon carbide /germanium feedstock 38 are placed in position surrounded by the thermal insulation 30 and the furnace system is brought down to a near vacuum pressure of, for example, 10"7 Torr by means of pressure control unit 50. The heater system is then activated to drive off any adsorbed gases in order to reduce any electrically active impurities which may be present. The interior pressure is then increased to near atmospheric pressure and then reduced to operating pressure and the temperatures for boule growth are established. [0015] It is conventional to provide the interior of the furnace system 10 with an inert gas such as argon or nitrogen to maintain pressure conditions.
This gas is introduced via gas passageway 52 leading into the furnace interior.
[0016] Actual SiGeC boules have been fabricated using the PVT growth process described herein and as an added advantage it has been determined that undesired micropipe defects which may be present in conventional SiC boule growth have been significantly reduced, if not eliminated. In addition the tendency to grow more than one desired polytype crystal has also been significantly reduced.
[0017] A typical PVT-type SiGeC boule grown as described herein was determined to have a bandgap of around 3.68 eV with a mobility of 110 cm2/Vs.
Growth parameters included:
[0018] Operating pressure:- 20 Torr in an Argon atmosphere
[0019] Source temperature:- 2190° C
[0020] ΔT between source and seed:- 80° C
[0021] Amount of SiC : - 11.9 gms
[0022] Amount of Ge : - 10.2 gms
[0023] Growth time:- 66 hrs
[0024] Length of resulting boule:- 7 mm
[0025] It is to be noted that although almost equal amounts of SiC and Ge are used, most of the vaporized Ge exits the system via a path including the pressure control unit 50 and very little Ge is incorporated in the growing boule
28. Accordingly, in the formula Si(i-X)Ge(X)C for the resulting boule, the average x was determined to be around 0.04 (4%).
[0026] Although a preferred method of fabrication of the SiGeC material is the described PVT process, other processes are also possible. For example the material may be made by the CVD (chemical vapor deposition) process or the
MOCVD (metal organic chemical vapor deposition) process using (CH3)δSi2
(hexamethyldisilane) and GeH4 (germain gas) .
[0027] The foregoing detailed description merely illustrates the principles of the invention. It will thus be appreciated that those skilled in the art will be able to devise various arrangements which, although not explicitly described or shown herein, embody the principles of the invention and are thus within its spirit and scope.

Claims

What is claimed is:
1. A wide bandgap semiconductor material, comprising:
Silicon carbide containing a predetermined portion of germanium.
2. A wide bandgap semiconductor material according to claim 1 wherein:
the formula for said wide bandgap semiconductor material is Si(i-X)Ge(X)C; and
where 0<x≤.05.
3. A method of making a wide bandgap semiconductor material, comprising the steps of:
growing a Silicon carbide structure by a predetermined growth process;
adding a predetermined amount of germanium to said growth process.
4. A method according to claim 3 which includes:
growing said silicon carbide structure as a boule by the physical vapor transport process.
PCT/US2005/037060 2004-10-18 2005-10-17 Wide bandgap material and method of making it Ceased WO2006044688A1 (en)

Applications Claiming Priority (2)

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US10/965,840 US20060081856A1 (en) 2004-10-18 2004-10-18 Novel wide bandgap material and method of making
US10/965,840 2004-10-18

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105568385A (en) * 2016-01-22 2016-05-11 山东大学 Growth method of germanium-doped SiC body single-crystal material
CN115161762B (en) * 2022-07-28 2023-12-19 浙江大学杭州国际科创中心 Method for solid growth of silicon carbide ingot by using germanium-silicon-carbon ternary alloy

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Publication number Priority date Publication date Assignee Title
EP1439570A1 (en) * 2003-01-14 2004-07-21 Interuniversitair Microelektronica Centrum ( Imec) SiGe strain relaxed buffer for high mobility devices and a method of fabricating it

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
D. GIRGINOUDI ET AL.: "Amorphous (SiC)xGe1-x:H films prepared by rf sputtering: Optical and electrical properties", JOURNAL OF APPLIED PHYSICS, vol. 62, no. 8, 15 October 1987 (1987-10-15), pages 3353 - 3359, XP009062900 *
GUEDJ C ET AL: "Substitutional Ge in 3C–SiC", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 74, no. 5, 1 February 1999 (1999-02-01), pages 691 - 693, XP012023162, ISSN: 0003-6951 *
H. INAI ET AL.: "Thermoelectric Properties of Sintered SiC Doped with Ge", MATERIALS SCIENCE FORUM, vol. 308-311, 1999, pages 659 - 664, XP009062902 *
M. DIANI ET AL.: "Experimental study of Si substitution of Ge in Ge-alloyed SiC epitaxial growth on 6H-SiC(0001)", PHYSICAL REVIEW B, vol. 67, no. 125316, 2003, pages 1 - 8, XP009062921 *
N. SAITO ET AL.: "Properties of amorphous ternary alloy films a-SixCyGez:H prepared by magnetron co-sputtering", APPLIED SURFACE SCIENCE, vol. 169-170, 2001, pages 472 - 475, XP009062897 *

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