WO2006035403A3 - Cleaning device and process for scanning tunneling microscopy (stm) tip - Google Patents
Cleaning device and process for scanning tunneling microscopy (stm) tip Download PDFInfo
- Publication number
- WO2006035403A3 WO2006035403A3 PCT/IB2005/053195 IB2005053195W WO2006035403A3 WO 2006035403 A3 WO2006035403 A3 WO 2006035403A3 IB 2005053195 W IB2005053195 W IB 2005053195W WO 2006035403 A3 WO2006035403 A3 WO 2006035403A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- tip
- stm
- cleaning device
- scanning tunneling
- conducting filament
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/50—Repairing or regenerating used or defective discharge tubes or lamps
- H01J9/505—Regeneration of cathodes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/08—Means for establishing or regulating a desired environmental condition within a sample chamber
- G01Q30/16—Vacuum environment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/10—STM [Scanning Tunnelling Microscopy] or apparatus therefor, e.g. STM probes
- G01Q60/16—Probes, their manufacture, or their related instrumentation, e.g. holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/02—Probe holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/017—Cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/02—Manufacture of cathodes
- H01J2209/022—Cold cathodes
- H01J2209/0223—Field emission cathodes
- H01J2209/0226—Sharpening or resharpening of emitting point or edge
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/82—Recycling of waste of electrical or electronic equipment [WEEE]
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITRM20040464 ITRM20040464A1 (en) | 2004-09-29 | 2004-09-29 | POINT CLEANING DEVICE FOR A TUNNEL SCAN MICROSCOPE (STM), TUNNEL SCAN MICROSCOPE AND RELATED CLEANING PROCEDURE. |
ITRM2004A000464 | 2004-09-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006035403A2 WO2006035403A2 (en) | 2006-04-06 |
WO2006035403A3 true WO2006035403A3 (en) | 2006-08-24 |
Family
ID=35744824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2005/053195 WO2006035403A2 (en) | 2004-09-29 | 2005-09-28 | Cleaning device and process for scanning tunneling microscopy (stm) tip |
Country Status (2)
Country | Link |
---|---|
IT (1) | ITRM20040464A1 (en) |
WO (1) | WO2006035403A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008048710A2 (en) * | 2006-04-26 | 2008-04-24 | The Board Of Trustees Of The University Of Illinois | Nanometer-scale sharpening of conductor tips |
US7569112B2 (en) * | 2007-03-16 | 2009-08-04 | International Business Machines Corporation | Scanning probe apparatus with in-situ measurement probe tip cleaning capability |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3763346A (en) * | 1970-07-31 | 1973-10-02 | Anvar | Methods of shaping resharpening or cleaning tips |
US4717855A (en) * | 1985-03-04 | 1988-01-05 | U.S. Philips Corporation | Dual-cathode electron emission device |
JPH03185302A (en) * | 1989-12-15 | 1991-08-13 | Hikari Gijutsu Kenkyu Kaihatsu Kk | Scanning tunnel microscope |
-
2004
- 2004-09-29 IT ITRM20040464 patent/ITRM20040464A1/en unknown
-
2005
- 2005-09-28 WO PCT/IB2005/053195 patent/WO2006035403A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3763346A (en) * | 1970-07-31 | 1973-10-02 | Anvar | Methods of shaping resharpening or cleaning tips |
US4717855A (en) * | 1985-03-04 | 1988-01-05 | U.S. Philips Corporation | Dual-cathode electron emission device |
JPH03185302A (en) * | 1989-12-15 | 1991-08-13 | Hikari Gijutsu Kenkyu Kaihatsu Kk | Scanning tunnel microscope |
Non-Patent Citations (3)
Title |
---|
AUCIELLO O ET AL: "Ion bombardment sharpening of field emitter arrays", VACUUM MICROELECTRONICS CONFERENCE, 1995. IVMC., 1995 INTERNATIONAL PORTLAND, OR, USA 30 JULY-3 AUG. 1995, NEW YORK, NY, USA,IEEE, US, 30 July 1995 (1995-07-30), pages 192 - 196, XP010155604, ISBN: 0-7803-2143-X * |
NAGAI M ET AL: "SHARPENING PROCESSES OF SCANNING TUNNELING MICROSCOPY/SCANNING TUNNELING SPECTROSCOPY TIPS BY THERMAL FIELD TREATMENT", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO, JP, vol. 36, no. 6B, June 1997 (1997-06-01), pages 3844 - 3849, XP000741472, ISSN: 0021-4922 * |
PATENT ABSTRACTS OF JAPAN vol. 015, no. 439 (P - 1273) 8 November 1991 (1991-11-08) * |
Also Published As
Publication number | Publication date |
---|---|
ITRM20040464A1 (en) | 2004-12-29 |
WO2006035403A2 (en) | 2006-04-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100543905C (en) | A kind of field emission apparatus and preparation method thereof | |
Thong et al. | Field-emission induced growth of nanowires | |
ATE374729T1 (en) | MASS PRODUCTION OF LONG NANOTUBE FROM TRANSITION METAL CHALCOGENIDES | |
EP1830367A3 (en) | Carbon nanotube probe | |
WO2006035403A3 (en) | Cleaning device and process for scanning tunneling microscopy (stm) tip | |
WO2004076049A3 (en) | Method and apparatus for fabricating nanoscale structures | |
JP2010047461A (en) | Aligned nanostructure on tip | |
JP4730686B2 (en) | Carbon fiber cutting and processing methods | |
Ernst et al. | Tip preparation for usage in an ultra-low temperature UHV scanning tunneling microscope | |
CN106383250A (en) | Scanning tunneling microscope probe with use of two-dimensional atomic crystal material | |
KR20110070031A (en) | Nanoneedle tip for atomic force microscope and method for fabricating the same | |
US6943356B2 (en) | Tip for nanoscanning electron microscope | |
CA2342157A1 (en) | Scanning tunneling microscope, probe for the same, method of treating the probe, and method of fabricating nano-structure | |
Oon et al. | High-resolution atomic force microscope nanotip grown by self-field emission | |
KR101448199B1 (en) | Method for cleaning sharp tip under ultra-high vacuum | |
JP2001198896A (en) | Micro-manipulator for electron microscope | |
Nishimura et al. | Electrochemical etching of metal wires in low-stress electric contact using a liquid metal electrode to fabricate tips for scanning tunneling microscopy | |
CN104528635B (en) | A kind of method preparing ultra-fine vertical orientated nano wire | |
Song et al. | Fabrication of co-axial field emitter tips for scanning probe energy loss spectroscopy | |
Pupeter et al. | Comparative studies on enhanced field emission from mechanically and chemically polished broad-area Nb, Cu, and Al cathodes | |
JP2020119762A (en) | Electron source stabilization method and electron beam apparatus | |
Burda et al. | Field emission properties of sharp tungsten cathodes coated with a thin resilient oxide barrier | |
EP4159670A1 (en) | Functionalized carbon nanocone tip and preparation method therefor | |
CN104253002A (en) | Pinpoint for use in hyperfine nano-processing | |
Golubok et al. | Thermofield tip formation in UHV/STM combined with field-emission microscope |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV LY MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |