WO2006029796A3 - Microlithographic projection exposure apparatus - Google Patents

Microlithographic projection exposure apparatus Download PDF

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Publication number
WO2006029796A3
WO2006029796A3 PCT/EP2005/009804 EP2005009804W WO2006029796A3 WO 2006029796 A3 WO2006029796 A3 WO 2006029796A3 EP 2005009804 W EP2005009804 W EP 2005009804W WO 2006029796 A3 WO2006029796 A3 WO 2006029796A3
Authority
WO
WIPO (PCT)
Prior art keywords
masking
illumination system
image plane
exposure apparatus
objective
Prior art date
Application number
PCT/EP2005/009804
Other languages
French (fr)
Other versions
WO2006029796A2 (en
Inventor
Markus Brotsack
Markus Deguenther
Wilhelm Ulrich
Joachim Wietzorrek
Johannes Wangler
Heiko Feldmann
Andreas Zeiler
Original Assignee
Zeiss Carl Smt Ag
Markus Brotsack
Markus Deguenther
Wilhelm Ulrich
Joachim Wietzorrek
Johannes Wangler
Heiko Feldmann
Andreas Zeiler
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Markus Brotsack, Markus Deguenther, Wilhelm Ulrich, Joachim Wietzorrek, Johannes Wangler, Heiko Feldmann, Andreas Zeiler filed Critical Zeiss Carl Smt Ag
Priority to US11/575,042 priority Critical patent/US20070285644A1/en
Publication of WO2006029796A2 publication Critical patent/WO2006029796A2/en
Publication of WO2006029796A3 publication Critical patent/WO2006029796A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)

Abstract

An illumination system (12) for a microlithographic pro­jection exposure apparatus (10) comprises a masking de­vice (36) and a masking objective (38; 138; 238) which projects the masking device (36) onto an image plane (18). The illumination system further includes an optical correction element (46; 34'; 146a, 146b; 242; 242a, 242b, 242c) having a surface (48; 44; 44'; 148a, 148b) that is either aspherically shaped or supports diffractive struc­tures that have at least substantially the effect of an aspherical surface. This surface is arranged at least ap­proximately in a field plane (40; 140) which precedes the image plane (18) of the masking objective The aspheri­cally acting surface is designed such that a principal ray distribution generated by the illumination system (12; 112; 212) in the image plane matches a principal ray distribution required by a projection objective (16).
PCT/EP2005/009804 2004-09-13 2005-09-13 Microlithographic projection exposure apparatus WO2006029796A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/575,042 US20070285644A1 (en) 2004-09-13 2005-09-13 Microlithographic Projection Exposure Apparatus

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US60939704P 2004-09-13 2004-09-13
US60939804P 2004-09-13 2004-09-13
US60/609,397 2004-09-13
US60/609,398 2004-09-13
US68488805P 2005-05-26 2005-05-26
US60/684,888 2005-05-26

Publications (2)

Publication Number Publication Date
WO2006029796A2 WO2006029796A2 (en) 2006-03-23
WO2006029796A3 true WO2006029796A3 (en) 2006-08-03

Family

ID=35149602

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/009804 WO2006029796A2 (en) 2004-09-13 2005-09-13 Microlithographic projection exposure apparatus

Country Status (1)

Country Link
WO (1) WO2006029796A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2310914B1 (en) 2008-06-30 2018-12-26 Corning Incorporated Telecentricity corrector for microlithographic projection system
CN110068446B (en) * 2018-01-23 2020-11-13 舜宇光学（浙江）研究院有限公司 Diffraction efficiency testing method of image-based diffractive optical element

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4906080A (en) * 1986-05-14 1990-03-06 Canon Kabushiki Kaisha Optical arrangement for projection exposure
US5726741A (en) * 1995-06-30 1998-03-10 Samsung Electronics Co., Ltd. Photolithographic projection systems including grating masks and related methods
EP1118910A2 (en) * 2000-01-20 2001-07-25 Asm Lithography B.V. A microlithography projection apparatus
US6366410B1 (en) * 1996-12-21 2002-04-02 Carl-Zeiss-Stiftung Reticular objective for microlithography-projection exposure installations
US20020171944A1 (en) * 2000-12-14 2002-11-21 Nikon Corporation Condenser optical system and illumination optical apparatus provided with the optical system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4906080A (en) * 1986-05-14 1990-03-06 Canon Kabushiki Kaisha Optical arrangement for projection exposure
US5726741A (en) * 1995-06-30 1998-03-10 Samsung Electronics Co., Ltd. Photolithographic projection systems including grating masks and related methods
US6366410B1 (en) * 1996-12-21 2002-04-02 Carl-Zeiss-Stiftung Reticular objective for microlithography-projection exposure installations
EP1118910A2 (en) * 2000-01-20 2001-07-25 Asm Lithography B.V. A microlithography projection apparatus
US20020171944A1 (en) * 2000-12-14 2002-11-21 Nikon Corporation Condenser optical system and illumination optical apparatus provided with the optical system

Also Published As

Publication number Publication date
WO2006029796A2 (en) 2006-03-23

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