WO2006020469A3 - Mask for vapor deposition - Google Patents

Mask for vapor deposition Download PDF

Info

Publication number
WO2006020469A3
WO2006020469A3 PCT/US2005/027515 US2005027515W WO2006020469A3 WO 2006020469 A3 WO2006020469 A3 WO 2006020469A3 US 2005027515 W US2005027515 W US 2005027515W WO 2006020469 A3 WO2006020469 A3 WO 2006020469A3
Authority
WO
WIPO (PCT)
Prior art keywords
vapor deposition
mask
vapor
workpiece
deposited
Prior art date
Application number
PCT/US2005/027515
Other languages
French (fr)
Other versions
WO2006020469A2 (en
Inventor
Tsutomu Miura
Nobuyuki Mori
Original Assignee
Eastman Kodak Co
Tsutomu Miura
Nobuyuki Mori
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co, Tsutomu Miura, Nobuyuki Mori filed Critical Eastman Kodak Co
Publication of WO2006020469A2 publication Critical patent/WO2006020469A2/en
Publication of WO2006020469A3 publication Critical patent/WO2006020469A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

A thin plate-like mask for vapor deposition, formed with openings corresponding to a pattern for vapor deposition to a workpiece to be vapor-deposited on, is disclosed, wherein projections are formed on opposite faces opposite to vapor deposition target faces of the workpiece to be vapor-deposited on.
PCT/US2005/027515 2004-08-11 2005-08-01 Mask for vapor deposition WO2006020469A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004-234318 2004-08-11
JP2004234318A JP2006052438A (en) 2004-08-11 2004-08-11 Mask for vapor deposition

Publications (2)

Publication Number Publication Date
WO2006020469A2 WO2006020469A2 (en) 2006-02-23
WO2006020469A3 true WO2006020469A3 (en) 2006-05-04

Family

ID=35448178

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/027515 WO2006020469A2 (en) 2004-08-11 2005-08-01 Mask for vapor deposition

Country Status (2)

Country Link
JP (1) JP2006052438A (en)
WO (1) WO2006020469A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10090467B2 (en) * 2014-10-15 2018-10-02 Sharp Kabushiki Kaisha Deposition mask, deposition device, deposition method, and deposition mask manufacturing method
CN106119773B (en) 2016-08-03 2018-10-26 京东方科技集团股份有限公司 Mask plate and its manufacturing method, vapor deposition mask plate component and its manufacturing method
KR101955454B1 (en) * 2018-05-10 2019-03-08 풍원정밀(주) Separate mask used at deposition step of tv oled and the manufacturing methode thereof
WO2023247443A1 (en) * 2022-06-21 2023-12-28 University Of Copenhagen Stencil mask and use thereof in lithography fabrication

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3286690A (en) * 1963-05-09 1966-11-22 Bell Telephone Labor Inc Vapor deposition mask
JP2002038254A (en) * 2000-07-24 2002-02-06 Toray Ind Inc Mask for patterning electro-conductive film
US20030180474A1 (en) * 2002-03-01 2003-09-25 Sanyo Electric Co., Ltd. Evaporation method and manufacturing method of display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3286690A (en) * 1963-05-09 1966-11-22 Bell Telephone Labor Inc Vapor deposition mask
JP2002038254A (en) * 2000-07-24 2002-02-06 Toray Ind Inc Mask for patterning electro-conductive film
US20030180474A1 (en) * 2002-03-01 2003-09-25 Sanyo Electric Co., Ltd. Evaporation method and manufacturing method of display device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2002, no. 06 4 June 2002 (2002-06-04) *

Also Published As

Publication number Publication date
WO2006020469A2 (en) 2006-02-23
JP2006052438A (en) 2006-02-23

Similar Documents

Publication Publication Date Title
USD538050S1 (en) Substrate with camouflage pattern
USD560915S1 (en) Substrate with camouflage pattern
USD518646S1 (en) Camouflage pattern applied to a substrate
USD655094S1 (en) Substrate with a camouflage pattern
WO2006127946A3 (en) Multi-functional coatings on microporous substrates
USD602258S1 (en) Substrate with camouflage pattern
WO2005103134A3 (en) Roll-to-roll embossing tools and processes
USD557069S1 (en) Cook-top for gas oven range
USD541188S1 (en) Watch dial
USD518963S1 (en) Camouflage pattern applied to a substrate
USD526477S1 (en) Knitting needle
NO20055966L (en) Process for preparing a composite material
WO2009145798A3 (en) Methods for modifying features of a workpiece using a gas cluster ion beam
WO2008081904A1 (en) Engraved plate and base material having conductor layer pattern using the engraved plate
WO2006036297A3 (en) Organic electroluminescence device and method of production of same
WO2009075793A3 (en) Controlling thickness of residual layer
WO2010114823A3 (en) Sputtering target for pvd chamber
WO2006020469A3 (en) Mask for vapor deposition
TW200634901A (en) A method for fabricating a low dielectric layer
USD715566S1 (en) Substrate with camouflage pattern
UA88515C2 (en) Method for priming and covering
WO2009099775A3 (en) Modified sputtering target and deposition components, methods of production and uses thereof
USD715565S1 (en) Substrate with camouflage pattern
USD529382S1 (en) Actuator cap
TW200710565A (en) Method for manufacturing a mask and an organic EL element and an organic EL printer

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase