WO2005109103A1 - Photopolymer printing plate precursor. - Google Patents
Photopolymer printing plate precursor. Download PDFInfo
- Publication number
- WO2005109103A1 WO2005109103A1 PCT/EP2005/051885 EP2005051885W WO2005109103A1 WO 2005109103 A1 WO2005109103 A1 WO 2005109103A1 EP 2005051885 W EP2005051885 W EP 2005051885W WO 2005109103 A1 WO2005109103 A1 WO 2005109103A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- printing plate
- plate precursor
- poly
- photopolymer printing
- compounds
- Prior art date
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- 238000007639 printing Methods 0.000 title claims abstract description 78
- 239000002243 precursor Substances 0.000 title claims abstract description 51
- 239000000203 mixture Substances 0.000 claims abstract description 72
- 150000001875 compounds Chemical class 0.000 claims abstract description 67
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 56
- -1 poly(vinyl alcohol) Polymers 0.000 claims abstract description 54
- 239000011248 coating agent Substances 0.000 claims abstract description 35
- 238000000576 coating method Methods 0.000 claims abstract description 35
- 239000003381 stabilizer Substances 0.000 claims abstract description 33
- 238000007127 saponification reaction Methods 0.000 claims abstract description 30
- 239000011241 protective layer Substances 0.000 claims abstract description 23
- 239000011230 binding agent Substances 0.000 claims abstract description 16
- 239000011253 protective coating Substances 0.000 claims abstract description 8
- 230000031700 light absorption Effects 0.000 claims abstract description 4
- 150000003254 radicals Chemical class 0.000 claims description 45
- 125000000217 alkyl group Chemical group 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 21
- 125000003545 alkoxy group Chemical group 0.000 claims description 17
- 229920001577 copolymer Polymers 0.000 claims description 17
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 13
- 235000019422 polyvinyl alcohol Nutrition 0.000 claims description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 12
- 150000001412 amines Chemical class 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 9
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 8
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical class OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 claims description 8
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000005282 brightening Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 4
- 150000004982 aromatic amines Chemical class 0.000 claims description 4
- 239000012986 chain transfer agent Substances 0.000 claims description 4
- 150000002443 hydroxylamines Chemical class 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- ACZGCWSMSTYWDQ-UHFFFAOYSA-N 3h-1-benzofuran-2-one Chemical class C1=CC=C2OC(=O)CC2=C1 ACZGCWSMSTYWDQ-UHFFFAOYSA-N 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 150000002596 lactones Chemical class 0.000 claims description 3
- 125000001302 tertiary amino group Chemical group 0.000 claims description 3
- 125000004423 acyloxy group Chemical group 0.000 claims description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 2
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 claims description 2
- 239000003431 cross linking reagent Substances 0.000 claims description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 claims description 2
- 150000002825 nitriles Chemical class 0.000 claims description 2
- 239000011593 sulfur Substances 0.000 claims description 2
- 150000003464 sulfur compounds Chemical class 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 31
- 125000004432 carbon atom Chemical group C* 0.000 description 24
- 231100000489 sensitizer Toxicity 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 17
- 230000001681 protective effect Effects 0.000 description 15
- 230000035945 sensitivity Effects 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 13
- 150000002148 esters Chemical class 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 238000011161 development Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 230000007547 defect Effects 0.000 description 8
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000004372 Polyvinyl alcohol Substances 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 7
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000000975 dye Substances 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 7
- 239000004615 ingredient Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 125000000623 heterocyclic group Chemical group 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000001913 cellulose Substances 0.000 description 5
- 229920002678 cellulose Polymers 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 125000005442 diisocyanate group Chemical group 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 description 5
- 125000004430 oxygen atom Chemical group O* 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 5
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 5
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 229930195734 saturated hydrocarbon Natural products 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 4
- ZURHBENZJDSCRG-UHFFFAOYSA-N [4-(phosphonomethyl)phenyl]methylphosphonic acid Chemical compound OP(O)(=O)CC1=CC=C(CP(O)(O)=O)C=C1 ZURHBENZJDSCRG-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 239000012948 isocyanate Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 230000001235 sensitizing effect Effects 0.000 description 4
- 229920003169 water-soluble polymer Polymers 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 125000004149 thio group Chemical group *S* 0.000 description 3
- 150000003568 thioethers Chemical class 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 3
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- ATOUXIOKEJWULN-UHFFFAOYSA-N 1,6-diisocyanato-2,2,4-trimethylhexane Chemical compound O=C=NCCC(C)CC(C)(C)CN=C=O ATOUXIOKEJWULN-UHFFFAOYSA-N 0.000 description 2
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 2
- GMIUUCWUOPOETN-UHFFFAOYSA-N 2,4,5-triphenyl-1-(2,4,5-triphenylimidazol-2-yl)imidazole Chemical compound C1=CC=CC=C1C1=NC(N2C(=C(N=C2C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C=CC=CC=2)(C=2C=CC=CC=2)N=C1C1=CC=CC=C1 GMIUUCWUOPOETN-UHFFFAOYSA-N 0.000 description 2
- AZUHIVLOSAPWDM-UHFFFAOYSA-N 2-(1h-imidazol-2-yl)-1h-imidazole Chemical compound C1=CNC(C=2NC=CN=2)=N1 AZUHIVLOSAPWDM-UHFFFAOYSA-N 0.000 description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 2
- UPSXAPQYNGXVBF-UHFFFAOYSA-N 2-bromobutane Chemical compound CCC(C)Br UPSXAPQYNGXVBF-UHFFFAOYSA-N 0.000 description 2
- 244000215068 Acacia senegal Species 0.000 description 2
- 241001479434 Agfa Species 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical group OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
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- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
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- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
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- 239000007983 Tris buffer Substances 0.000 description 2
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- 125000003342 alkenyl group Chemical group 0.000 description 2
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- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 125000004093 cyano group Chemical group *C#N 0.000 description 2
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- 125000005843 halogen group Chemical group 0.000 description 2
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- KZKRRZFCAYOXQE-UHFFFAOYSA-N 1$l^{2}-azinane Chemical group C1CC[N]CC1 KZKRRZFCAYOXQE-UHFFFAOYSA-N 0.000 description 1
- 150000000180 1,2-diols Chemical group 0.000 description 1
- XCMDVRAWAIYDEE-UHFFFAOYSA-N 1,2-diphenyl-3h-pyrazole Chemical class C1C=CN(C=2C=CC=CC=2)N1C1=CC=CC=C1 XCMDVRAWAIYDEE-UHFFFAOYSA-N 0.000 description 1
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- 150000000183 1,3-benzoxazoles Chemical class 0.000 description 1
- 150000000185 1,3-diols Chemical group 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL05743030T PL1749240T3 (en) | 2004-05-06 | 2005-04-27 | Photopolymer printing plate precursor. |
ES05743030T ES2381013T3 (en) | 2004-05-06 | 2005-04-27 | Photopolymer printing plate precursor |
AT05743030T ATE553417T1 (en) | 2004-05-06 | 2005-04-27 | PHOTOPOLYMER PRINTING PLATE PRECURSOR |
US11/568,742 US20070224543A1 (en) | 2004-05-06 | 2005-04-27 | Photopolymer Printing Plate Precursor |
EP05743030A EP1749240B1 (en) | 2004-05-06 | 2005-04-27 | Photopolymer printing plate precursor. |
CN2005800226882A CN1981239B (en) | 2004-05-06 | 2005-04-27 | Photopolymer printing plate precursor. |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04101955 | 2004-05-06 | ||
EP04101955.5 | 2004-05-06 | ||
US57767404P | 2004-06-07 | 2004-06-07 | |
US60/577,674 | 2004-06-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005109103A1 true WO2005109103A1 (en) | 2005-11-17 |
Family
ID=34929065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2005/051885 WO2005109103A1 (en) | 2004-05-06 | 2005-04-27 | Photopolymer printing plate precursor. |
Country Status (7)
Country | Link |
---|---|
US (1) | US20070224543A1 (en) |
EP (1) | EP1749240B1 (en) |
CN (1) | CN1981239B (en) |
AT (1) | ATE553417T1 (en) |
ES (1) | ES2381013T3 (en) |
PL (1) | PL1749240T3 (en) |
WO (1) | WO2005109103A1 (en) |
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WO2009011176A1 (en) * | 2007-07-18 | 2009-01-22 | Konica Minolta Medical & Graphic, Inc. | Photosensitive lithographic printing plate material and method of developing the same |
EP2065211A1 (en) | 2007-11-30 | 2009-06-03 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
EP2098376A1 (en) | 2008-03-04 | 2009-09-09 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
EP2106924A1 (en) | 2008-03-31 | 2009-10-07 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
EP2186637A1 (en) | 2008-10-23 | 2010-05-19 | Agfa Graphics N.V. | A lithographic printing plate |
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US8445176B2 (en) | 2007-05-25 | 2013-05-21 | Agfa Graphics Nv | Lithographic printing plate precursor |
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EP4239411A1 (en) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Method and apparatus for processing a lithographic printing plate precursor |
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2005
- 2005-04-27 CN CN2005800226882A patent/CN1981239B/en active Active
- 2005-04-27 WO PCT/EP2005/051885 patent/WO2005109103A1/en active Application Filing
- 2005-04-27 AT AT05743030T patent/ATE553417T1/en active
- 2005-04-27 US US11/568,742 patent/US20070224543A1/en not_active Abandoned
- 2005-04-27 EP EP05743030A patent/EP1749240B1/en active Active
- 2005-04-27 PL PL05743030T patent/PL1749240T3/en unknown
- 2005-04-27 ES ES05743030T patent/ES2381013T3/en active Active
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EP0738929A2 (en) * | 1995-04-19 | 1996-10-23 | Mitsubishi Chemical Corporation | Photopolymerizable sensitive material |
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Also Published As
Publication number | Publication date |
---|---|
US20070224543A1 (en) | 2007-09-27 |
ATE553417T1 (en) | 2012-04-15 |
EP1749240A1 (en) | 2007-02-07 |
PL1749240T3 (en) | 2012-09-28 |
CN1981239A (en) | 2007-06-13 |
CN1981239B (en) | 2011-01-26 |
EP1749240B1 (en) | 2012-04-11 |
ES2381013T3 (en) | 2012-05-22 |
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