WO2005047979A3 - Systeme optique - Google Patents

Systeme optique Download PDF

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Publication number
WO2005047979A3
WO2005047979A3 PCT/EP2004/012113 EP2004012113W WO2005047979A3 WO 2005047979 A3 WO2005047979 A3 WO 2005047979A3 EP 2004012113 W EP2004012113 W EP 2004012113W WO 2005047979 A3 WO2005047979 A3 WO 2005047979A3
Authority
WO
WIPO (PCT)
Prior art keywords
bearing
optical system
stages
gap
lenses
Prior art date
Application number
PCT/EP2004/012113
Other languages
English (en)
Other versions
WO2005047979A2 (fr
Inventor
Erik Sohmen
Paul Kaufmann
Werner Schwarz
Original Assignee
Zeiss Carl Smt Ag
Erik Sohmen
Paul Kaufmann
Werner Schwarz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Erik Sohmen, Paul Kaufmann, Werner Schwarz filed Critical Zeiss Carl Smt Ag
Publication of WO2005047979A2 publication Critical patent/WO2005047979A2/fr
Publication of WO2005047979A3 publication Critical patent/WO2005047979A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Dans le mode de réalisation décrit dans cette invention, un signal optique, plus particulièrement destiné à la microlithographie par projection, présente des éléments optiques, plus particulièrement des miroirs et/ou des lentilles, dans une gaine scellée contenant un gaz inerte ou un vide, et un palier présentant un espace de palier. Le palier est un palier fluide et l'espace de palier comprend des niveaux de restriction et il est pompé de manière différentielle dans au moins deux niveaux.
PCT/EP2004/012113 2003-11-06 2004-10-27 Systeme optique WO2005047979A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US51770603P 2003-11-06 2003-11-06
US60/517,706 2003-11-06

Publications (2)

Publication Number Publication Date
WO2005047979A2 WO2005047979A2 (fr) 2005-05-26
WO2005047979A3 true WO2005047979A3 (fr) 2005-09-09

Family

ID=34590184

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/012113 WO2005047979A2 (fr) 2003-11-06 2004-10-27 Systeme optique

Country Status (1)

Country Link
WO (1) WO2005047979A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006038455A1 (de) 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
US8952342B2 (en) 2009-12-17 2015-02-10 Mapper Lithography Ip B.V. Support and positioning structure, semiconductor equipment system and method for positioning
DE102015220817A1 (de) 2015-10-26 2015-12-24 Carl Zeiss Smt Gmbh Messvorrichtung mit Luftlager

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010038442A1 (en) * 2000-05-03 2001-11-08 Silicon Valley Group, Inc. Method and apparatus for a non-contact scavenging seal
US20020180946A1 (en) * 1999-04-19 2002-12-05 Asml Netherlands B.V. Motion feed-through into a vacuum chamber and its application in lithographic projection apparatus
EP1306592A2 (fr) * 2001-10-24 2003-05-02 Ebara Corporation Etanchéité pour pression differentielle avec fluide pompé
EP1310828A1 (fr) * 2001-11-09 2003-05-14 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
EP1318424A2 (fr) * 2001-12-06 2003-06-11 Nikon Corporation Dispositif de maintien sans contact d'un élément optique

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020180946A1 (en) * 1999-04-19 2002-12-05 Asml Netherlands B.V. Motion feed-through into a vacuum chamber and its application in lithographic projection apparatus
US20010038442A1 (en) * 2000-05-03 2001-11-08 Silicon Valley Group, Inc. Method and apparatus for a non-contact scavenging seal
EP1306592A2 (fr) * 2001-10-24 2003-05-02 Ebara Corporation Etanchéité pour pression differentielle avec fluide pompé
EP1310828A1 (fr) * 2001-11-09 2003-05-14 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
EP1318424A2 (fr) * 2001-12-06 2003-06-11 Nikon Corporation Dispositif de maintien sans contact d'un élément optique

Also Published As

Publication number Publication date
WO2005047979A2 (fr) 2005-05-26

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