WO2005002979A3 - Canister guard - Google Patents

Canister guard Download PDF

Info

Publication number
WO2005002979A3
WO2005002979A3 PCT/US2004/019900 US2004019900W WO2005002979A3 WO 2005002979 A3 WO2005002979 A3 WO 2005002979A3 US 2004019900 W US2004019900 W US 2004019900W WO 2005002979 A3 WO2005002979 A3 WO 2005002979A3
Authority
WO
WIPO (PCT)
Prior art keywords
canister
guard
canister guard
liquid
oulet
Prior art date
Application number
PCT/US2004/019900
Other languages
French (fr)
Other versions
WO2005002979A2 (en
Inventor
John N Gregg
Donn Naito
Original Assignee
Advanced Tech Materials
John N Gregg
Donn Naito
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Tech Materials, John N Gregg, Donn Naito filed Critical Advanced Tech Materials
Priority to GB0600004A priority Critical patent/GB2419934B/en
Publication of WO2005002979A2 publication Critical patent/WO2005002979A2/en
Publication of WO2005002979A3 publication Critical patent/WO2005002979A3/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402Reduction of impurities in the source gas
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65BMACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B1/00Packaging fluent solid material, e.g. powders, granular or loose fibrous material, loose masses of small articles, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
    • B65B1/04Methods of, or means for, filling the material into the containers or receptacles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65BMACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B3/00Packaging plastic material, semiliquids, liquids or mixed solids and liquids, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
    • B65B3/04Methods of, or means for, filling the material into the containers or receptacles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561Gas plumbing upstream of the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Infusion, Injection, And Reservoir Apparatuses (AREA)
  • Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)

Abstract

A canister guard for preventing liquid contamination of an oulet to a canister containing liquid. The canister guard may include baffles extending from a sidewall. Additionally, the canister guard may be configured to be replacable or for retrofitting to conventional liquid chemical containing canisters.
PCT/US2004/019900 2003-06-26 2004-06-22 Canister guard WO2005002979A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0600004A GB2419934B (en) 2003-06-26 2004-06-22 Canister guard

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/606,520 2003-06-26
US10/606,520 US6880592B2 (en) 2003-06-26 2003-06-26 Canister guard

Publications (2)

Publication Number Publication Date
WO2005002979A2 WO2005002979A2 (en) 2005-01-13
WO2005002979A3 true WO2005002979A3 (en) 2005-09-15

Family

ID=33540087

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/019900 WO2005002979A2 (en) 2003-06-26 2004-06-22 Canister guard

Country Status (3)

Country Link
US (1) US6880592B2 (en)
GB (1) GB2419934B (en)
WO (1) WO2005002979A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006013942A1 (en) * 2006-03-17 2007-09-20 M+W Zander Holding Ag gas cabinet
US9034105B2 (en) * 2008-01-10 2015-05-19 American Air Liquide, Inc. Solid precursor sublimator
US8758515B2 (en) 2010-08-09 2014-06-24 Rohm And Haas Electronic Materials Llc Delivery device and method of use thereof
US8997775B2 (en) 2011-05-24 2015-04-07 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
US8776821B2 (en) 2011-05-24 2014-07-15 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
US9243325B2 (en) 2012-07-18 2016-01-26 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
KR20230040279A (en) * 2021-09-15 2023-03-22 에이에스엠 아이피 홀딩 비.브이. Method and apparatus for controlling a liquid

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4628689A (en) * 1983-08-18 1986-12-16 Charles Jourdan Internal combustion engine exhaust system
US5500116A (en) * 1993-07-19 1996-03-19 Jgc Corporation Liquid-liquid contactor
US6431229B1 (en) * 2001-08-24 2002-08-13 Air Products And Chemicals, Inc. Solventless purgeable diaphragm valved manifold for low vapor pressure chemicals
US6520218B1 (en) * 1998-09-03 2003-02-18 Advanced Technology Materials, Inc. Container chemical guard

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5607002A (en) * 1993-04-28 1997-03-04 Advanced Delivery & Chemical Systems, Inc. Chemical refill system for high purity chemicals
US6916398B2 (en) * 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4628689A (en) * 1983-08-18 1986-12-16 Charles Jourdan Internal combustion engine exhaust system
US5500116A (en) * 1993-07-19 1996-03-19 Jgc Corporation Liquid-liquid contactor
US6520218B1 (en) * 1998-09-03 2003-02-18 Advanced Technology Materials, Inc. Container chemical guard
US6431229B1 (en) * 2001-08-24 2002-08-13 Air Products And Chemicals, Inc. Solventless purgeable diaphragm valved manifold for low vapor pressure chemicals

Also Published As

Publication number Publication date
US20040261896A1 (en) 2004-12-30
US6880592B2 (en) 2005-04-19
GB0600004D0 (en) 2006-02-08
GB2419934B (en) 2007-03-07
WO2005002979A2 (en) 2005-01-13
GB2419934A (en) 2006-05-10

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