WO2005002979A3 - Canister guard - Google Patents
Canister guard Download PDFInfo
- Publication number
- WO2005002979A3 WO2005002979A3 PCT/US2004/019900 US2004019900W WO2005002979A3 WO 2005002979 A3 WO2005002979 A3 WO 2005002979A3 US 2004019900 W US2004019900 W US 2004019900W WO 2005002979 A3 WO2005002979 A3 WO 2005002979A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- canister
- guard
- canister guard
- liquid
- oulet
- Prior art date
Links
- 239000007788 liquid Substances 0.000 abstract 3
- 238000011109 contamination Methods 0.000 abstract 1
- 238000009420 retrofitting Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4402—Reduction of impurities in the source gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B1/00—Packaging fluent solid material, e.g. powders, granular or loose fibrous material, loose masses of small articles, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
- B65B1/04—Methods of, or means for, filling the material into the containers or receptacles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B3/00—Packaging plastic material, semiliquids, liquids or mixed solids and liquids, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
- B65B3/04—Methods of, or means for, filling the material into the containers or receptacles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Infusion, Injection, And Reservoir Apparatuses (AREA)
- Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0600004A GB2419934B (en) | 2003-06-26 | 2004-06-22 | Canister guard |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/606,520 | 2003-06-26 | ||
US10/606,520 US6880592B2 (en) | 2003-06-26 | 2003-06-26 | Canister guard |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005002979A2 WO2005002979A2 (en) | 2005-01-13 |
WO2005002979A3 true WO2005002979A3 (en) | 2005-09-15 |
Family
ID=33540087
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/019900 WO2005002979A2 (en) | 2003-06-26 | 2004-06-22 | Canister guard |
Country Status (3)
Country | Link |
---|---|
US (1) | US6880592B2 (en) |
GB (1) | GB2419934B (en) |
WO (1) | WO2005002979A2 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006013942A1 (en) * | 2006-03-17 | 2007-09-20 | M+W Zander Holding Ag | gas cabinet |
US9034105B2 (en) * | 2008-01-10 | 2015-05-19 | American Air Liquide, Inc. | Solid precursor sublimator |
US8758515B2 (en) | 2010-08-09 | 2014-06-24 | Rohm And Haas Electronic Materials Llc | Delivery device and method of use thereof |
US8997775B2 (en) | 2011-05-24 | 2015-04-07 | Rohm And Haas Electronic Materials Llc | Vapor delivery device, methods of manufacture and methods of use thereof |
US8776821B2 (en) | 2011-05-24 | 2014-07-15 | Rohm And Haas Electronic Materials Llc | Vapor delivery device, methods of manufacture and methods of use thereof |
US9243325B2 (en) | 2012-07-18 | 2016-01-26 | Rohm And Haas Electronic Materials Llc | Vapor delivery device, methods of manufacture and methods of use thereof |
KR20230040279A (en) * | 2021-09-15 | 2023-03-22 | 에이에스엠 아이피 홀딩 비.브이. | Method and apparatus for controlling a liquid |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4628689A (en) * | 1983-08-18 | 1986-12-16 | Charles Jourdan | Internal combustion engine exhaust system |
US5500116A (en) * | 1993-07-19 | 1996-03-19 | Jgc Corporation | Liquid-liquid contactor |
US6431229B1 (en) * | 2001-08-24 | 2002-08-13 | Air Products And Chemicals, Inc. | Solventless purgeable diaphragm valved manifold for low vapor pressure chemicals |
US6520218B1 (en) * | 1998-09-03 | 2003-02-18 | Advanced Technology Materials, Inc. | Container chemical guard |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5607002A (en) * | 1993-04-28 | 1997-03-04 | Advanced Delivery & Chemical Systems, Inc. | Chemical refill system for high purity chemicals |
US6916398B2 (en) * | 2001-10-26 | 2005-07-12 | Applied Materials, Inc. | Gas delivery apparatus and method for atomic layer deposition |
-
2003
- 2003-06-26 US US10/606,520 patent/US6880592B2/en not_active Expired - Lifetime
-
2004
- 2004-06-22 WO PCT/US2004/019900 patent/WO2005002979A2/en active Application Filing
- 2004-06-22 GB GB0600004A patent/GB2419934B/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4628689A (en) * | 1983-08-18 | 1986-12-16 | Charles Jourdan | Internal combustion engine exhaust system |
US5500116A (en) * | 1993-07-19 | 1996-03-19 | Jgc Corporation | Liquid-liquid contactor |
US6520218B1 (en) * | 1998-09-03 | 2003-02-18 | Advanced Technology Materials, Inc. | Container chemical guard |
US6431229B1 (en) * | 2001-08-24 | 2002-08-13 | Air Products And Chemicals, Inc. | Solventless purgeable diaphragm valved manifold for low vapor pressure chemicals |
Also Published As
Publication number | Publication date |
---|---|
US20040261896A1 (en) | 2004-12-30 |
US6880592B2 (en) | 2005-04-19 |
GB0600004D0 (en) | 2006-02-08 |
GB2419934B (en) | 2007-03-07 |
WO2005002979A2 (en) | 2005-01-13 |
GB2419934A (en) | 2006-05-10 |
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